RE: Photoresist Adhesion problem

From: Garry J. Bordonaro, CNF Photolithography (bordonaro@cnf.cornell.edu)
Date: Mon Oct 16 1995 - 10:20:01 EDT

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Franco,

To improve adhesion on GaAs, you can try ammonium hydroxide:H20 1:10
dip before coating. We do it to improve photoresist adhesion. General receipe
is 10 sec. in solution, N2 dry, coat within 5 min. Some people bake the sample
first to dehydrate, some vapor prime in a vacuum oven after.

Garry

********************************************************************************

      _/_/_/_/_/ _/_/_/ _/_/ _/_/_/_/_/ Garry J. Bordonaro
     _/_/_/_/_/ _/_/ _/ _/_/ _/_/ Photolithographic
    _/_/ _/_/ _/ _/_/ _/_/_/_/_/ Process Engineer
   _/_/_/_/_/ _/_/ _/_/_/ _/_/ Ph: (607) 255-2329 ext.111
  _/_/_/_/_/ _/_/ _/_/ _/_/ Fax: (607) 255-8601

         Cornell Nanofabrication Facility at Cornell University
           G02 Knight Laboratory, Ithaca, New York 14853-5403

E-mail: bordonaro@cnf.cornell.edu URL: http://www.cnf.cornell.edu/
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