The Center for X-ray Lithography has a position for Laboratory Manager
open. The succesful candidate will have several years of experience in
lithography, with particular emphasys on resist process development
and optimization. An MS degree is required, or a BS with several years
of experience. Knowledge of advanced resist systems (SAL 605,
APEX-E, and other chemically amplified resists) a plus. Intimate
knowledge of clean room procedures and processes is a prerequiste.
The tasks will involve:
1. The development of processes for X-ray lithography exposure systems
in the range of 0.25-0.1 um, based on the exposure systems at
CXrL. These include 3 X-ray steppers (one of which is the newest Suss
Americal Lithography system, a 0.18 um machine), e-beam lithography
(Leica 10.51), AFM and excimer exposure systems.
2. Lead the new SAL Mod-4 stepper qualification, interfacing with the
SAL engineers on-site.
3. Supervision and development of metrology (CD control, overlay)
methodologies.
4. Supervision of general clean rooms operation and stepper operations.
5. Interface with external customers
6. Interface with internal customers
The position has a great deal of autonomy and latitude. The succesful
candidate should be a self-starter. Knowledge of X-ray or E-beam
lithography a definite plus.
CXrL has full photofab capabilities, including resist coat, bake,
expose, develop and inspection (JEOL Field emission and AFM), wafer
tracks and automated systems. We support both 4-6" Silicon processes
as well as 2-4" GaAs. Two clean rooms support exposure and resist
processing systems.
Salary is commensurate to experience. The University is an equal
opportunities employer. The position provides full benefits. Madison
has been consistently ranked as one of the "best places to live" in
the U.S.
For further information, contact Franco Cerrina (cerrina@ece.wisc.edu)
or James W. Taylor (jwtaylor@xraylith.wisc.edu)
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