> Hello,
>
> I'm building a laboratory, and was wondering if anyone has a recommendation
> regarding, or any experience of, the two mask aligners we're considering
> buying.
>
> We have looked at the Karl-Suss, and the OAI units. We're convinced that
> the Suss is probably the nicer, but at significantly higher cost. Do you
> have any experience of either of these?
>
> Thanks in advance...
>
> Dave Haas (david.haas@alliedsignal.com)
Dave, and other interested parties,
We use a Suss MA-6 here at NJIT for all of our photo work. This is a
contact print model, capable of using wafer/mask vacuum mode for high
resolution, able to handle 100, 125, 150mm wafer sizes, and using IR
illumination to do through the wafer alignments for backside patterning. I
have no complaints in terms of downtime and P.M. necessary on the tool, as
both are minimal. We are able to get 1.5 um resolutions printed with the
aligner using vacuum mode and our resist coat/develop process, which is good
enough for the type of work we take on. Alignments are manual operation, but
easy enough for the minimally trained to handle (a bonus for academic
settings), and uniformities/repeatabilities in process settings were more
than satisfactory for our CMOS/MEMS work.
I don't know which models you are looking at, but this may clarify some
things for this and similar models to the MA-6. This is a rough and rugged
tool, to be sure, for single wafer lower volume production work. However, it
can serve its purpose in certain types of environments and do the job well.
John
-- ---------------------------------------------------------- John M. Koons *NJIT Microelectronics Research Center* Research Engineer e-mail: jmk4336@hertz.njit.edu phone (201) 596-8450 fax (201) 642-4848 ----------------------------------------------------------
This archive was generated by hypermail 2b29 : Tue Mar 09 2004 - 07:48:58 EST