I am working in the field of integrated optics and I need to deposit
thick layers (typically 10-15 microns) of SiO2 on silicon. I have a
feeling that high pressure oxidation (HIPOX) is the most cost efficient way
to do that. For some time I have been trying to locate a facility
(company or university) that will do this type of depositions on a
commercial basis, but I haven't had much luck.
If you have any suggestions I would be very happy to hear about it.
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