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Reactive Ion Etching Workshop
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Hosted by the National Nanofabrication Users' Network at the University of
California, Santa Barbara.
Sponsored by the National Science Foundation
Serving the U.S. Science and Engineering Community
The emphasis of this workshop will be reactive ion etching of semiconductor
materials. The topics of discussion are: relationships between process
parameters and etched profiles, in-situ process monitoring, RIE-induced
damage, system installation and safety considerations. The format of the
workshop will emphasize short presentations and extensive discussions
focused on etching problems / experiences at university research center
facilities. In addition, we would like volunteers to present short talks
with an emphasis on lab scale tools and problems.
The workshop will be held on March 20-21, 1997
Registration Fee: $50.00
Registration Deadline: February 28, 1997
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Thursday March 20, 1997
8:15 - 9:00 Refreshments
9:00 - 12:00 Workshop
12:00 - 1:30 Lunch (Included in registration fee)
1:30 - 5:00 Workshop
Thursday March 21, 1997
8:15 - 9:00 Refreshments
9:00 - 12:00 Workshop-Lab Tours
The workshop flyer, registration form, lodging and weather information
can be found at http://www.quest.ucsb.edu/nnun/workshop.html.
Organized as an outreach effort by the Network Access Committee on NNUN
For additional help, you may contact Brian Wolf at the address below.
Brian Wolf, Center Assistant
National Nanofabrication Users' Network
Electrical and Computer Engineering
University of California
Santa Barbara, CA 93106-9560
Phone: (805) 893-4130
Fax: (805) 893-8170
E-mail: wolf@ece.ucsb.edu
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Brian Wolf
Center Assistant
National Nanofabrication Users' Network (NNUN)
Electrical and Computer Engineering
University of California
Santa Barbara, CA 93106-9560
Phone: (805) 893-4130
Fax (805) 893-8170
Brian Wolf
Center Assistant
National Nanofabrication Users' Network (NNUN)
Electrical and Computer Engineering
University of California
Santa Barbara, CA 93106-9560
Phone: (805) 893-4130
Fax (805) 893-8170
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