Forwarded message:
> From Steven_Chen-G10842@email.mot.com Thu Jun 26 18:28:23 1997
> Reply-To: Steven_Chen-G10842@email.mot.com
> Date: Thu, 26 Jun 1997 16:59:00 -0500
> From: Steven Chen-G10842 <Steven_Chen-G10842@email.mot.com>
> Subject: Papers regarding Junction Stain
> To: hoang
> Message-Id: <M4957801.006.em01m.1.970626222331Z.CC-MAIL*/OU=XNBCC/OU=ILBA/PRMD=MOT/ADMD=MOT/C=US/@MHS>
> X-Mailer: Worldtalk (4.1)/STREAM
>
>
>
> I read your Web page and the standard operating procedure for Philtec.
> I am with Motorola and working on MEMS. Lately we have a staining
> problem: after cavity forming in KOH and the subsequent removal of
> nitride mask, we found stain on (100) p-type Si at the end of oxide
> removal in HF. No stain was observed on (111) sidewall and n-type
> etchstop.
>
> I have been looking for old staining papers (probably prior to 1975) to
> understand the mechanism of the staining. To my surprise it is not easy
> job. It seems it is lost art !! I will appreciate very much if you can
> help me, or redirect the e-mail to the people who may know about junction
> stain (or Bell stain - I guess it was originally discovered in Bell labs
> in 60s).
>
> Thank you very much in advance,
>
> Steven Chen
>
>
> ---------------------------------------------------------------------
> Name: Steven Chen, Ph.D. Phone: (847)205-2823
> Title: Senior Staff Engineer Fax: (847)205-3883
> Group: Motorola/AECS/AIEG/Sensor Products Internet:G10842@email.mot.com
> Addr: 4000 Commercial Ave. Location/Mail Stop: IL08/60
> Northbrook, IL 60062
> ---------------------------------------------------------------------
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