Suitable Dielectric.

From: shiwalkar amit (amits@cc.iitb.ernet.in)
Date: Wed Apr 22 1998 - 18:45:17 EDT

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Hello,
I would be grateful if anybody could tell me about dielectric
materials that can be deposited (or grown) using Standard Planar Process.
(CVD,LPCVD, PVD , MBE , Sputtering etc) , apart from Si3N4 & SiO2.
The material must posses a very high dielectric constant ( greater
than SiO2 , Si3N4 , Ta2O5 and IrOx ).If possible please include the
approximate values of dielectric constant.

Regards
Amit Shiwalkar

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Amit Shiwalkar Dept. Of Bio-Medical Engineering.
3,Vasant, IIT Bombay.
Carter Road, Powai, Bombay-400076
Khar,
Bombay(Mumbai)-400052
INDIA.
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In reply to: shott@snf.stanford.edu: "Re: Poly silicon as etch mask"
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