contact lithography for patterning and production of designer particles

From: Ruoff (ruoff@wuphys.wustl.edu)
Date: Wed May 13 1998 - 16:49:06 EDT


We are interested in a donation to our University of a simple single
level exposure tool for contact lithography. We do not need to have
alignment. This will be used for producing a new type of metal particle
which we call "designer particles" which may be useful in the future for,
among other things, delivery of DNA vaccines*. We are hoping the
semiconductor community will respond to this request, because at this
time we are not yet funded to buy equipment to produce such particles (we
have been doing so at the Cornell Nanofab Facility).

*designer particles are described at
http://bucky5.wustl.edu/Science/DP/DP0.HTM

Please contact Rod Ruoff with suggestions for such a piece of equipment.
Thankyou.
 

*********************************************************************
Rod Ruoff, Director
Laboratory for the Study of Novel Carbon Materials
Dept of Physics
Washington University
CB 1105, One Brookings Drive
St. Louis, Missouri, USA 63130-4899
(for UPS, express mail, etc: replace "CB 1105" with "Compton 242")

phone:314 935 8746
fax: 314 935 5258
ruoff@wuphys.wustl.edu
http://bucky5.wustl.edu/



This archive was generated by hypermail 2b29 : Tue Mar 09 2004 - 07:49:00 EST