Hello,
I am currently working at the University of Minnesota Microtechnology Lab
and am trying to set up an LPCVD poly process that is in-situ Boron doped. Do
you have any idea where I might find information about flow rates/ratios,
doping densities, etc? I've worked quite a bit with in-situ Phos doped films,
and am familiar with the basics of this technique. We have Silane (SiH4) and
diborane (B2H6) plumbed into the LPCVD furnace, and just have to figure out
the flow rates. If there is some reference you can tell me about that would be
a big help.
Thanks for your help,
John Snyder
jpsnyder31@aol.com
This archive was generated by hypermail 2b29 : Tue Mar 09 2004 - 07:49:02 EST