High temperature annealing

From: Bahram Jalali (jalali_bahram@hotmail.com)
Date: Tue Aug 20 2002 - 16:57:25 EDT


The OECS laboratory at UCLA (www.ee.ucla.edu/labs/oecs) is interested in
annealing silicon wafers at up to 1300C temperature for formation of SIMOX.
Any help on identifying a facility with a proper furnace will be highly
appreciated.

Bahram Jalali
Professor,
UCLA

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