Dear Sir/Madam,
My name is Ivan Jankov and I am a PhD student at Physics Institute, University of São Paulo, Brazil. Although I belong to a group which studies the technological application of plasma torches (plasma generators) in various industrial processes (such as: treatment of toxic wastes, refining of silicon, treatment of oil contaminated soil etc.), my work is oriented more towards surface science.
I study changes of the surface properties of polycrystalline copper (thin film deposited on silicon wafer) induced by low energy (30-50keV) ion implantation, with the special emphasis on the changes of the work function (WF). For my work, the implantation of alkali and rare-earth metals is particularly interested since even small doses of these elements on the surface can decrease significantly the WF value. So far I have been using mostly Auger Electron Spectroscopy (AES) to obtain the surface composition and Scanning Potential Microscopy (or Kelvin Probe Force Microscopy) technique for obtaining the WF changes (only WF differences between implanted and non-implanted copper samples are measured). Unfortunately, these two equipment are not joint in one chamber (moreover, the WF measurements are performed in air), which can sometimes cause serious problems with sample contamination. I am also familiar with other techniques such as RBS, XrD, SIMS, etc.
On web-site I saw that various techniques are available at you laboratory, but I was wondering if you have (in operation) the apparatus with (the following 3 items should be within one chamber):
1. AES or X-ray Photon Spectroscopy (i.e. ESCA) or some other technique for measuring the surface composition;
2. Kelvin Probe or Scanning Tunneling Microscopy or some other technique for measuring the WF;
3. Ion gun or plasma for sputtering of the surface in order to obtain the depth profile.
It is not necessary that the WF is measured at the same time as surface composition, but that both information (WF and surface composition) can be obtained under UHV condition.
Also, I would like to know if the samples can be heated and if yes, in which temperature range.
In case you do not have such apparatus, would you happen to know a laboratory which does.
Thank you in advance. I am looking forward to your answer.
Sincerely,
Ivan Jankov
-
You are subscribed to labnetwork@mtl.mit.edu
To unsubscribe from this list, send a message with the message body
"unsubscribe labnetwork" to majordomo@mtl.mit.edu
This archive was generated by hypermail 2b29 : Tue Mar 09 2004 - 07:49:07 EST