Could someone please tell me the best RIE etch chemistry for selectively
etching TaN over SiO2? My understanding is that CF4/O2 is not as selective
as a ClF3 chemistry. Does someone have any information on this?
You are subscribed to firstname.lastname@example.org
To unsubscribe from this list, send a message with the message body
"unsubscribe labnetwork" to email@example.com
This archive was generated by hypermail 2b29 : Tue Mar 09 2004 - 07:49:08 EST