Paper: "Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat."
These scanning electron microscope images show the sequence of fabrication of fine lines by the team's new method. First, an array of lines is produced by a conventional electron beam process (top). The addition of a block copolymer material and a topcoat result in a quadrupling of the number of lines (center). Then the topcoat is etched away, leaving the new pattern of fine lines exposed (bottom).
Courtesy of the researchers
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