Using MTL » Fabrication

Machine Charge Chart

This chart explains how tool usage in MTL's fabrication facilities will be billed to the user. Units of measure vary by tool. This list is updated several times a year. It is organized by lab (ICL, TRL, and EML). Please note that Javascript must be enabled to make use of all chart functionalities.

Download the chart as an Excel spreadsheet and PDF:
machinechargechart.xls | PDF machinechargechart.pdf

Filter:

ID Lab Process Area Where CORAL Name It is: It does: Maker/Model Units per:(self-run) if staff
1 EML wet pecvd-rie acid-hood-EML fume hood acid wet etch   8 hr 12
2 EML metal dep metal dep SputtererAJA sputterer Al, Cr, Cu, etc AJA Orion 5 8 hr + mat 12
3 EML diffusion metal dep anneal-furnace tube furnace for annealing, sintering, etc   8 hr 12
4 EML photo photo asher-EML plasma photoresist stripper     8 hr 12
5 EML metal dep metal dep BalzerSputterer sputterer Au Balzer 8 hr + mat 12
6 EML diffusion   Box-Furnace furnace anneals, bakes   8 hr 12
7 EML photo photo coater-EML spinner coats PR Solitec 8 hr 12
8 EML metrology hall dektak-EML profilometer measures surface roughness Sloan Dektak II 8 hr 12
9 EML metal dep metal dep eBeam-EML metal evaporator Au, Ag, Al, Cr, AuGe, Co, Pt, Si, Ti, Zr, W, Er, Mo, SiO2, Ta, Pd, Ni, Ge, Sn Sloan 8 hr + mat 12
10 EML metrology   ellipsometer-EML ellipsometer measures film thickness & dielectric constant Gaertner L116BLC-26A 8 hr 12
11 EML metrology   filmetrics thin film measurement system measures film thickness Filmetrics 8 hr 12
12 EML Photo-EML   hotpress hydraulic press applies loads ~100 kN, electrically heats to ~340 C; used on thermoplastic films (eg, PMMA) Carver 4386 8 hr 12
13 EML photo photo MA4 mask aligner contact lithography Karl Suss MA-4 8 hr 12
14 EML photo photo MJB3-BroadBand mask aligner contact lithography Karl Suss MJB-3 8 hr 12
15 EML diffusion   OxidationTube tube furnace wet & dry ox, anneals, bakes Lindberg 8 hr 12
16 EML metrology metrology parametric-tester parametric-tester measures device characteristics Hewlett-Packard 8 hr 12
17 EML wet photo photo-hood-EML fume hood solvent wet etch   8 hr 12
18 EML pecvd-rie pecvd-rie plasmatherm dual chamber PECVD-RIE etches & deposits dielectrics; heated chuck Plasmatherm 8 hr 12
19 EML diffusion metrology RTA-EML rapid thermal annealer   AG Associates Heatpulse 410 8 hr 12
20 EML metal dep metal dep ThermalEvap metal evaporator Al, Cr, Cu, etc CVC 8 hr + mat 12
21 EML metrology metrology wykoEML non-contact profiler surface topology; up to 500um vertical scan Wyko RST 8 hr 12
22 ICL metrology metrology 4-pt-probe resistivity measurement system     2 hr 4
23 ICL diffusion diffusion 5A-GateOx atmosph. diffusion tube for gate oxide, CMOS only Thermco 10K 25 run+steam 39
24 ICL diffusion diffusion 5B-Anneal atmosph. diffusion tube for annealing, including Concept1 films Thermco 10K 25 run+steam 39
25 ICL diffusion diffusion 5C-FieldOx atmosph. diffusion tube for oxidation Thermco 10K 25 run+steam 39
26 ICL diffusion diffusion 5D-ThickOx atmosph. diffusion tube for oxidation, CMOS only Thermco 10K 25 run+steam 39
27 ICL diffusion diffusion 6A-nPoly low P diffusion tube LPCVD plysilicon; CMOS only Thermco 10K 65 run+70/um 74
28 ICL diffusion diffusion 6B-Poly low P diffusion tube LPCVD thick & P-doped polysilicon Thermco 10K 65 run+70/um 74
29 ICL diffusion diffusion 6C-LTO low P diffusion tube LPCVD Low Temperature Oxide Thermco 10K 65 run+70/um 74
30 ICL diffusion diffusion 6D-Nitride low P diffusion tube LPCVD stoichiometric Si nitride Thermco 10K 65 run+70/um 74
31 ICL metrology photo AFM Atomic Force Microscope surface topology Veeco D3100 9 hr 12
32 ICL MOCVD deposition ALD metallorganic chem vapor dep deposits hi-K dielectric layers: Hf & Hf oxide Cambridge Nanotech 7 wafer+thickness 14
33 ICL plasma etch metallizat'n AME5000 plasma etcher Chamber A: SiO2, BPSG, LTO; Chamber B: Si nitride, poly AMAT Precision 5000 0 wafer 14
34 ICL photo photo asher-ICL plasma asher strip PR Matrix 106 5 run 7
35 ICL plasma etch AME rm centura plasma etcher high density plasma dielectric etcher AMAT Centura 5300 7 wafer 14
36 ICL photo photo coater6 wafer track coats PR SVG 8860 2 wafer 4
37 ICL pecvd deposition concept1 dielectric plasma dep deposits oxide, nitride, TEOS Novellus Concept 1 7 wafer 14
38 ICL CMP packaging Cu-CMP chemo-mechanical polisher for metals   Strasbaugh Harmony 6EG 7 wafer+slurry 14
39 ICL metrology metrology cv CV bridge measures capacitance vs voltage Boonton 1 wafer 3
40 ICL pecvd diffusion DCVD dielectric plasma dep deposits oxide, nitride AMAT Centura 5200 7 wafer+thickness 14
41 ICL pkg packaging diesaw diesaw dices wafers Disco DAD-2H/6T 3 wafer+cut 6
42 ICL metal dep metallizat'n eBeamCMOS metal evaporator Al, Ir, Pt, Co, W, Er, Ti, Mo, SiO2, Si, Ta Temescal 30 run+mat 37
43 ICL metrology metrology ellipsometer-ICL ellipsometer measures film thickness & dielectric constant Gaertner L116BLC-26A 2 hr 4
44 ICL metal dep AME rm endura metal sputtering system sputters Ti, TiN, Al, AlSi AMAT Endura 7 wafer+mat 14
45 ICL UHCVD 39-528 epi-Centura Ultra Hi-vac chem vapor dep grows Si & SiGe epilayers AMAT Centura 5200 18 hr 18
46 ICL CMP CMP GnP chemo-mechanical polisher (BPSG, LTO, thermal oxide,nitride, Si)   GnP Poli-400L 7 wafer+slurry 14
47 ICL pkg EML Metro goldwire gold-ball wire bonder   Kulicke&Soffa 4124 7 hr 14
48 ICL photo photo HMDS-ICL bake oven for hexamethyldisilazane (an adhesion promoter) Yield.Eng.Syst.3/10 0 wafer 10
49 ICL photo photo i-stepper wafer stepper patterns wafers, 5x reduction, 0.5 um resolution Nikon NSR-2005i9 i-line(365nm) 6 wafer 9
50 ICL wet packaging KOH-Au wet station Au-bearing KOH & Cu plating Semifab WPS-400 25 run 32
51 ICL plasma etch etching LAM490B plasma etcher for Si & nitride [gases=SF6,CCl4,He,O2,N2] LAM 490B 7 wafer 14
52 ICL metrology photo microscope-ICL inspection microscope   Nikon Optiphot 88 2 hr 4
53 ICL wet photo nitrEtch-HotPhos wet station wet etches nitride (1st tank) Semifab WPS-400 25 run 32
54 ICL wet photo oxEtch-BOE wet station wet etch oxide Semifab WPS-400 25 run 32
55 ICL metrology metrology P10 profilometer measures surface roughness Tencor/Prometrix P-10 5 hr 10
56 ICL wet packaging plating-bench wet station Au, Ni & Cu plating Semifab WPS-400 25 run 32
57 ICL wet near AME premetal-Piranha wet station for piranha & HF dip Semifab WPS-400 25 run 32
58 ICL plasma etch etching rainbow plasma etcher for metal (Al, Ti) [gases=SF6,Cl2,BCl3,CHCl3,N2] LAM 9600 7 wafer 14
59 ICL diffusion diffusion rca-ICL wet station RCA clean   25 run 39
60 ICL diffusion diffusion RTA2 rapid thermal annealer   AG Associates Heatpulse 410 4 wafer 5
61 ICL diffusion diffusion RTP rapid thermal annealer   AG Associates 8108 4 wafer 5
62 ICL diffusion diffusion RTP-Si rapid thermal annealer   AG Associates 8108 4 wafer 5
63 ICL diffusion diffusion SCA surface charge analyzer measures surface charge, carrier lifetime Semitest 2 hr 4
64 ICL metrology photo semZeiss low-V scanning electron microscope   Zeiss Supra 40 9 hr 12
65 ICL metrology CMP SM-300 film thickness measurement system; used to characterize CMP results   Tencor/Prometrix SM-300 5 hr 10
66 ICL metrology metallizat'n Surfscan wafer inspection   KLA-Tencor Surfscan 5 hr 10
67 ICL pkg EML Metro TMAH-KOHhood wet bath KOH & TMAH etching fume hood 25 run 32
68 ICL metrology metrology UV1280 spectroscopic ellipsometer measures film thickness (single, stacks, PR) Tencor/Prometrix UV-1280 5 hr 10
69 ICL diffusion diffusion VTR vertical thermal reactor low-stress nitride SVG/Thermco 7000 65 run+70/um 65
70 ICL metrology metrology wykoICL non-contact profiler surface topology; up to 500um vertical scan Wyko NT3300 5 hr 10
71 TRL diffusion diffusion A1-GateOx atmosph. diffusion tube for gate oxide MRL 718 25 run+steam 39
72 TRL diffusion diffusion A2-WetOxBond atmosph. diffusion tube wafer bonding MRL 718 25 run+steam 39
73 TRL diffusion diffusion A3-Sinter atmosph. diffusion tube CMOS metal sintering MRL 718 25 run 39
74 TRL diffusion diffusion A4-Polyimide atmosph. diffusion tube polyimide cure MRL 718 25 run 39
75 TRL wet Etch-room acid-hood wet station wet etch Laminaire 25 run 32
76 TRL wet ROXNOX acid-hood2 wet station wet etching in 6.152J   25 run 32
77 TRL photo metal'n asherMatrix-TRL plasma photoresist stripper (single-wafer)   Matrix 106 5 run 7
78 TRL photo Etch-room asher-TRL plasma photoresist stripper (2 chambers)   Branson 5 run 7
79 TRL diffusion diffusion B1-Au atmosph. diffusion tube gold exposure MRL 718 25 run+steam 39
80 TRL diffusion diffusion B2-Ox-alloy-Poly low pressure diffusion tube diffusion MRL 718 65 run+70/um 74
81 TRL diffusion diffusion B3-DryOx atmosph. diffusion tube annealing MRL 718 25 run 39
82 TRL diffusion diffusion B4-Poly low pressure diffusion tube LPCVD polysilicon MRL 718 65 run+70/um 74
83 TRL pecvd 39-428 CCNT plasma dep chamber deposits carbon nanotubes from acetylene Cambridge Nano Instruments 7 wafer 14
84 TRL pecvd EML pecvd-rie CNT plasma dep chamber deposits carbon nanotubes from acetylene Home-built 7 wafer 14
85 TRL photo photo coater spinner coats PR Solitec 5110 2 wafer+mat 10
86 TRL metrology ROXNOX dek-NoAu profilometer measures surface roughness, no-gold wafers only Sloan Dektak 2 hr 4
87 TRL metrology ROXNOX dektak profilometer measures surface roughness Sloan Dektak II 2 hr 4
88 TRL metal dep metal'n eBeamAu metal evaporator Au, Ag, Al, Cr, AuGe, Co, Pt, Si, Ti, Zr, W, Er, Mo, SiO2, Ta, Pd, Ni, Ge, Sn Temescal VES2550 30 run+mat. 37
89 TRL metal'n 39-428 eBeamFP metal evaporator Au, Al,Cr,Pt,Ti, Temescal FC2000 30 run+mat. 37
90 TRL metrology ROXNOX ellipsometer-TRL ellipsometer measures film thickness & index Gaertner 2 hr 4
91 TRL photo photo EV1 mask aligner contact, w/IR Electronic Visions 620 6 wafer 9
92 TRL photo photo EV-LC mask aligner contact, w/IR Electronic Visions 620 6 wafer 9
93 TRL photo photo EV501-620 wafer aligner/bonder aligns & bonds wafers (fusion,anodic,thermo-compression) Electronic Visions 6 wafer 9
94 TRL photo photo fluoroscope to check for photoresist after developing     1 wafer 3
95 TRL metrology Etch-room FLX non-contact profiler measures wafer bow KLA-Tencor FLX 5 hr 10
96 TRL photo 39-430 Heidelberg direct-write laser laser-writes on photoresist Heidelberg DWL-66 6 hr 9
97 TRL photo photo hotplate1 hotplate for post & pre-baking SU8 & PZT at ²300oC   1 wafer 2
98 TRL photo photo hotplate2 hotplate for post & pre-baking SU8 & PZT at ²300oC   1 wafer 2
99 TRL photo photo hotplate300 hi-T hotplate for post & pre-baking SU8 & PZT at ²400oC   1 wafer 2
100 TRL photo photo HMDS-TRL bake oven for hexamethyldisilazane (an adhesion promoter)   0 wafer 10
101 TRL metrology test area hp-probe prober-tester electrical characterization Rucker/Kolls 1032-HP4062B 2 hr 4
102 TRL metrology Etch-room IV-probe curve tracer w/probe measures IV characteristics Tektronics 2 hr 4
103 TRL metrology test area keithley parametric tester electrical characterization Keithley 450S 2 hr 4
104 TRL photo photo MA-6 mask aligner contact, w/IR Karl Suss MA-6 6 wafer 9
105 TRL metrology photo microscope-TRL inspection microscope w/Nomarski interference contrast Nikon 2 hr 4
106 TRL metrology ROXNOX nanospec thin film measurement system measures film thickness Nanometrics AFT 010-0180 2 hr 4
107 TRL deposition Etch-room parylene parylene coater coats wafers w/parylene   5 wafer 10
108 TRL metal dep metal'n perkin-elmer sputterer Al, Cr, Cu, AlN PE 4450 30 run+mat. 37
109 TRL wet photo photo-wet-Au wet station wet etch photoresist Semifab WPS-800 25 run 32
110 TRL wet photo photo-wet-l wet station wet etch photoresist Semifab WPS-800 25 run 32
111 TRL wet photo photo-wet-r wet station wet etch photoresist Semifab WPS-800 25 run 32
112 TRL photo photo pispinner polyimide spinner coats wafers w/polyimide Headway Research 3 wafer 6
113 TRL pecvd-rie Etch-room plasmaquest ECR-RIE etches & deposits dielectrics on III-Vs Plasmaquest Series 11 Model 145 7 wafer+thickness 14
114 TRL photo photo PMMAspinner PMMA spinner coats wafers w/PMMA   3 wafer 6
115 TRL photo photo postbake oven to bake photoresist after developing Blue DDC-146C 0 wafer 3
116 TRL photo photo prebakeovn oven to bake photoresist before exposure   0 wafer 3
117 TRL spin dep Etch-room PZTcoater PZT coater deposits PZT Specialty Coating Systems, Spin Coater 6700 Series 5 wafer 10
118 TRL spin dep Etch-room PZTfurnace PZT furnace anneals PZT Thermolyne Furnace, 6000 5 run 7
119 TRL diffusion Etch-room rca-TRL wet station RCA clean   25 run 39
120 TRL photo EMLmetrology Resonetics laser ablation system laser-writes on photoresist, glass, plastic Resonetics 10 hr 14
121 TRL diffusion Etch-room rta rapid thermal annealer not CMOS-compatible AG Associates 210T-02 4 wafer 5
122 TRL diffusion Etch-room rta35 rapid thermal annealer for III-Vs AG Associates Heatpulse 410 4 wafer 5
123 TRL wet DUV Solvent-noAu wet station wet solvent for non-Au wafers   25 run 32
124 TRL wet DUV Solvent-hood wet station wet solvent for non-Au wafers   25 run 32
125 TRL plasma etch Etch-room sts1 Si deep trench etcher etches deep features in Si (4" wafers) STS/Multiplex ICP non-MESC 15 wafer+thickness 30
126 TRL plasma etch Etch-room sts2 Si deep trench etcher etches deep features in Si (6" wafers) STS/Multiplex ICP MESC 15 wafer+thickness 30
127 TRL plasma etch Etch-room sts3 Si deep trench etcher etches deep features in Si (6" wafers) STS/Multiplex ICP MESC 15 wafer+thickness 30
128 TRL pecvd diffusion sts-CVD dielectric plasma dep deposits oxide, nitride, Si carbide STS/Multiplex PECVD 7 wafer+thickness 14
129 TRL photo photo SU8oven oven to bake SU8   0 wafer 0
130 TRL photo photo SU8spinner oven to coat with SU8   3 wafer+mat 6
131 TRL metrology ROXNOX TBM-8 alignment measurement tool   Electronic Visions 2 hr 4
132 TRL Etch Etch-room UVozone-Au ozone clean plate removes organics w/ozone created by UV light   2 hr 4
133 TRL Etch Etch-room UVozone-noAu ozone clean plate removes organics w/ozone created by UV light   2 hr 4
134 TRL photo photo varTemp oven to bake photoresist; temp can be cahnged   0 wafer 0
135 TRL metrology Etch-room WYKO non-contact profiler surface topology; up to 500um vertical scan Wyko NT9800 5 hr 10
136 TRL Etch Etch-room XeF2 XeF2 vapor system etches Si w/XeF2 for structural release   20 hr 25

Fabrication

MTL Annual Research Report 2011: View Online