Using MTL » Fabrication » Standard Operating Procedures

Acid-hood
STANDARD OPERATING PROCEDURE
CORAL Name: acid-hood
Model Number: Laminaire wet hood
Location: TRL
What it does: General-purpose chemical hood that is used for the processing of acids/bases
Introduction:

The acid hood is a general-purpose chemical hood that is used for the processing of acids/bases only. These chemicals should be aspirated into the water drain after use. The acid-hood station supports numerous acid/base wafer cleaning and etching wafer cleaning and etching processes.

Currently stocked chemicals include:
• sulfuric acid
• "Nano-Strip"
• hydrochloric acid
• hydrofluoric acid
• "CR-7" chrome etchant
• Al etchant
• BOE 7:1
• acetic acid
• nitric acid
• phosphoric acid
• hydrogen peroxide
• ammonium hydroxide

The MSDS sheets for all chemicals can be found in the yellow MSDS binders on the 1st and 4th floors by the elevator. Users should become familiar with the appropriate sheet before working with any of these chemicals.

Safety:

Acid protective gear MUST be worn when working at this sink and when transporting or handling chemicals. An acid-proof apron, sleeve guards, acid-proof gloves (atop the normal clean room gloves), and an acid face mask (with the face shield DOWN) worn over safety glasses, are all required. ALWAYS know the location of the nearest eye wash and safety shower.

Before using the acid-hood, verify that the exhaust is working. The louvers must be open, and the plastic shields must be down. Note: The louvers have been set for proper flow, and must not be adjusted. Never, for any reason, put your head inside the acid-hood1s working area.

Chemicals must be transported to and from the acid hood using the chemical cart. Handling of chemical bottles, beakers, or other vessels must always be done with dry acid-gloved hands. Typically, acids should be added last to solutions.

The chemicals used in the acid-hood are all dangerous to touch or inhale. HF acid is very dangerous and HF burns are particularly hazardous. An insidious aspect of HF burns is that there may not be any discomfort until long after exposure. These burns are extremely serious and may result in bone tissue damage. If you contact HF, flush the area well and be sure to work under and around your fingernails, then apply calcium glutamate to skin burn. Fingernails and cuticles are the classic areas where people receive burns, having washed off the HF without washing under their nails. If washed off within a few minutes of exposure, immediately followed by application of the gel, HF may do no harm. Remember, HF may not produce any burning sensation until after it has already done damage. A physician should look at all HF burns.

In case of chemical exposure, call for help to the person nearest you and tell them to call the MIT campus police (dial 100). While you are speaking to the person nearest you, get to the nearest shower or eyewash as fast as possible. Exposure of the eyes requires flushing with water for at least 15 minutes. As a precaution, all exposures to the eye will require a visit to an emergency room for a check up. Contact a staff member as soon as possible for assistance or call 100. Exposure of the skin requires immediate removal of all contaminated clothing. Rinse under the shower for 15 minutes. Contact a staff member as soon as possible for assistance or call 100.

 

Procedure:

NOTE: Operation will be demonstrated using the "Piranha" cleaning Process, in a "CMOS" contamination category.

  1. Check Equipment Reservations in CORAL to insure that you reserved the correct machine in the correct facility for the correct date. Another user may have reservations; it is your responsibility to honor them, if this is the case.

  2. Use the "Engage" command in CORAL for the equipment that you are about to use; use this command BEFORE you start the operation. Insure that the correct facility is set (TRL) and that your lot name is entered correctly.
    NOTE: Contamination control is of extreme importance in all TRL equipment. You must know what contamination level your wafers classify into, and use labware and equipment of the same classification. Broadly, the lab and this machine are separated into "GOLD" (red-tagged) and "CMOS" contamination categories. Wafers and labware classified as "GOLD"
    are not allowed in the dump-rinse, so you will need to rinse your wafers inside a separate bath of DI water in the acid-hood. There is a dedicated "GOLD" spin-rinse-dry and aspirator, and you need use dedicated "GOLD" tweezers and wands when handling these wafers.

  3. Place wafers in the appropriately marked teflon wafer carrier; use the correct teflon handle for the process you are about to perform.

  4. Gown up with apron, face shield, arm protectors and rubber gloves. Thin vinyl gloves and clean room suits do not provide protection against corrosive and hazardous chemicals.

    Never touch the inside of a process tank or a teflon wafer carrier with your hands, especially if wearing the rubber gloves, as these gloves are extremely dirty by processing standards, and would contaminate your lot and those following you. Instead, use the vertical or horizontal teflon handles.

  5. Get chemicals from the chemical "pass-through" and use the cart to transport them to the acid-hood. Note: Use the small amounts of chemicals left in the bottles by previous users before proceeding to open a new bottle.

  6. Place the appropriate quartz tank, which matches the contamination level of your wafers and teflon labware inside the acid-hood. A piranha is always processed in a quartz tank, since it would destroy most polypropylene or polyethylene plastic tanks and contaminate your wafers (conversely, all HF processes, such as BOE, must be done in plastic as they would etch a glass tank). You may process in the sink or on a solid surface inside the hood, but you may not process within one foot of the front edge of the hood for both spill and exhaust flow safety reasons.

  7. Add hydrogen peroxide. In a piranha, the ratio of hydrogen peroxide to sulfuric acid is 1:3, which can be approximated. Due to dangers inherent in pouring these chemicals, we don't normally measure this ratio exactly. Always open and close ALL chemical bottles within the confines of the acid-hood, as most spilling of chemicals occurs in the transfer of chemical bottles. When pouring, keep the bottom of the bottle from protruding out of the hood enclosure, so any drips do not land on you or on the floor. If you need to measure critical chemical volumes, graduated cylinders are stored above the hood. Processing is not allowed in these dedicated measuring vessels, and they MUST be cleaned and returned immediately after use.

  8. Add sulfuric acid to a level that would cover the wafers. Let the solution stand for several minutes.

  9. Place wafers inside the beaker. Typically, we leave wafers in piranhas for10 minutes, although you may need more time if your wafers are not completely clean at the end of this time. If your wafers appear to need more than 20 minutes in piranha, you may need to aspirate out the solution and start again with a new mixture. You must never end a piranha before your wafers are completely clean. If you do so, you would be leaving the tank in a dirty, unclean, state, and your wafers would contaminate all following equipment such as the dump-rinse and the SPIN-DRYER.

  10. Before you remove carrier/wafers from acid mixture for rinsing, press the RESET then START buttons on the dump rinse tank. The rinse tank has been set for 3 cycles. After two cycles, or after the water resistively has exceeded 1 mega-ohm, place your wafers inside the dump rinse tank and press RESET then START again. Do not remove the wafers until either 3 cycles have completed or until the resistively is above 1 mega-ohm again.

  11. Wash and dry gloved hands while wafers are rinsing to avoid dragging chemical to other areas.

  12. An audio/visual warning (flashing digital readout) will sound at the end of the third rinse cycle. Press RESET and STOP buttons twice to reset the rinse tank and silence the alarm.

  13. Remove the wafer carrier from the tank. Avoid dropping any acidic/other contamination from the glove onto your clean wafers, and proceed directly into a SPIN DRYER to prevent the wafers from air-drying.

  14. Dry wafers in the appropriate SPIN DRYER next to the acid-hood. (140 sec rinse, 240 sec dry). If you do not use the "rinse" cycle in any MTL SPIN DRYER, you must do a rinse and dry run with dummy wafers, after removing your wafers, to rinse out any contamination or corrosives which may have been deposited while drying your wafers.

  15. Remove wafers from carrier and return all carriers and holders to their proper shelf.

  16. Aspirate acids from the beaker in the acid hood.

  17. Rinse and aspirate the interior of the beaker at least 3 times. Rinse the outside of the beaker and place upside-down on fabwipes on the counter to briefly dry. Return all labware to the original shelf location before you leave the area.

  18. Rinse the tip of the aspirator with DI Water and put it away.

  19. Inspect bottles for chemical drips and wash if necessary.

  20. Rinse counter with DI water from the water gun.

  21. Return all chemicals to the "pass-through".

  22. Wash acid gloves and hang up to dry.

  23. Remove safety attire and place it in its proper location.

  24. "DISENGAGE MACHINE" in CORAL.


Author: Kurt Broderick, 2/00

Fabrication

MTL Annual Research Report 2012: View Online