Figure 1
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Figure 1: (a) Fabrication process of templated QDs. PMMA was spin coated to a thickness of 40 nm on Si, followed by EBL. Then, 6 nm of CdSe QDs were spin coated. The PMMA lift off was done with acetone, leaving small clusters of CdSe QDs. (b) Scanning-electron micrographs of optimized PMMA templates with a minimum feature size of 8 nm for development at 6 °C.