manfrinato_lithography_02

Figure 2: The point-spread function (PSF) for 10-nm-thick HSQ at 30 keV and 200 keV on top of Si3N4 menbrane. (A) shows the method to measure the PSF by using single pixel exposures. Given a constant threshold of dose density, as the pixel dose increases the radius increases. This series of dots probe the energy density distribution into the resist at different radii, leading to the PSF. (B) Experimental PSFs at 30 and 200 keV. It is clear that the 200keV PSF has a narrower spread than the 30keV one.

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