liu_integration_01

Figure 1: The optical pictures of ohmic metal surfaces for AlGaN/GaN HEMTs. (a) Ti/Al/Ni/Au with RTA at 800°C; (b) Ti/Al/Ni/Pt with RTA at 950°C; and (c) Ti/Al/Ni/Pt with 20-nm recess and RTA at 950°C.

  • Tags

    ahmed al-obeidi akintunde akinwande anantha chandrakasan brian wardle carl thompson caroline ross center for excitonics charles sodini clifton fonstad dana weinstein dimitri antoniadis duane boning eugene fitzgerald farnaz niroui frances hill gallium nitride gang chen graphene hae-seung lee harry tuller healthcare iii-v materials jeffrey lang jesús del alamo jing kong joel voldman jongyoon han judy l. hoyt karl berggren lionel kimerling luca daniel luis velasquez-garcia marc baldo mildred dresselhaus pablo jarillo-herrero pao lin patrick brown qing hu sang-gook kim silvija gradecak tomas palacios vladimir bulovic vladimir stojanovic yu-chung hsiao zohaib mahmood