Our laboratory consists of 1500 ft2 of newly-renovated space on the 1st floor of Building 66 (room 125) on the MIT main campus. This space includes an exterior wet lab and an interior environment-controlled laser lab with two large optical bays. Click on a picture below to interact.


Wet lab
- Three new fume hoods
- Schlenk line
- Large glove box with integrated spin coater, centrifuge, and freezer
- Plasma cleaner, oven, inspection microscope
- High-purity nitrogen distribution system
Laser Lab
The near-field bay features:
- 14’ x 5’ x 24” floating optical table (Newport RS4000) for vibration isolation
- Acoustic panels on the walls and ceiling for noise minimization
- Temperature, humidity, and dust controlled environment
- Black-out conditions
- Custom Nanonics MV2000 atomic force microscope
- Nikon Ti-U inverted optical microscope with SLWD and high-NA oil immersion objectives, CCD camera
- Time-correlated single photon counting (TCSPC) system with <30 ps time resolution
- CCD spectrograph configured for photoluminescence and Raman
- 405 nm and 785 nm laser lines
- Volume holographic grating (VHG) filter system for simultaneous Stokes/anti-Stokes Raman scattering down to 15 cm-1
- Associated optics and low-noise signal acquisition electronics
The ultrafast bay features:
- 15’ x 9’ x 18” L-shaped floating optical table system (Newport ST-UT2)
- Temperature, humidity, and dust controlled environment
- Black-out conditions
- Short-pulse ultrafast OPO laser system (Coherent) [Verdi V18 (18 W, 532 nm, CW); Mira HP (>3.5 W, 700-980 nm, <100 fs); Mira OPO (>200 mW, 515-725/1000-1500/1750-4000 nm, <100 fs)]
- Extra-cavity pulse compression and dispersion compensation
- Associated ultrafast optics, computer controlled optical delay line, and signal acquisition electronics
Immediately adjacent to our lab is the Olsen Lab, which contains a suite of complementary capabilities in organic polymer synthesis and cell culture.
Other facilities around campus that we regularly use:
- Center for Materials Science and Engineering (AFM, SEM, TEM, XRD, ALD, ellipsometry)
- ONE Lab growth facility (thermal evaporation, sputtering, optoelectronic device fabrication and testing)
- eni-MIT Nanomaterials Metrology Lab (thermal evaporation, spectrophotometry, AFM)
- eni-MIT Nanomaterials Spectroscopy Lab (1 kHz ultrafast laser system with OPA, transient absorption, optical Kerr-gated photoluminescence, streak camera, near IR spectrometer, near IR single photon counting, supercontinuum pulsed light source)
- Microsystems Technology Laboratory (lithography, nanofabrication)
- RLE Scanning Electron Beam Lithography facility