Tisdale Lab @ MIT

nanoscale energy transport



Our laboratory consists of 1500 ft2 of newly-renovated space on the 1st floor of Building 66 (room 125) on the MIT main campus. This space includes an exterior wet lab and an interior environment-controlled laser lab with two large optical bays. Click on a picture below to interact.

Wet Lab Fume Hoods Glove Box

Near-Field Bay Ultrafast Bay Ultrafast Bay

Wet lab

  • Three new fume hoods
  • Schlenk line
  • Large glove box with integrated spin coater, centrifuge, and freezer
  • Plasma cleaner, oven, inspection microscope
  • High-purity nitrogen distribution system

Laser Lab

The near-field bay features:

  • 14’ x 5’ x 24” floating optical table (Newport RS4000) for vibration isolation
  • Acoustic panels on the walls and ceiling for noise minimization
  • Temperature, humidity, and dust controlled environment
  • Black-out conditions
  • Custom Nanonics MV2000 atomic force microscope
  • Nikon Ti-U inverted optical microscope with SLWD and high-NA oil immersion objectives, CCD camera
  • Time-correlated single photon counting (TCSPC) system with <30 ps time resolution
  • CCD spectrograph configured for photoluminescence and Raman
  • 405 nm and 785 nm laser lines
  • Associated optics and low-noise signal acquisition electronics

The ultrafast bay features:

  • 15’ x 9’ x 18” L-shaped floating optical table system (Newport ST-UT2)
  • Temperature, humidity, and dust controlled environment
  • Black-out conditions
  • Short-pulse ultrafast OPO laser system (Coherent) [Verdi V18 (18 W, 532 nm, CW); Mira HP (>3.5 W, 700-980 nm, <100 fs); Mira OPO (>200 mW, 515-725/1000-1500/1750-4000 nm, <100 fs)]
  • Extra-cavity pulse compression and dispersion compensation
  • Associated ultrafast optics, computer controlled optical delay line, and signal acquisition electronics

Immediately adjacent to our lab is the Olsen Lab, which contains a suite of complementary capabilities in organic polymer synthesis and cell culture.

Other facilities around campus that we regularly use:

  • Center for Materials Science and Engineering (AFM, SEM, TEM, XRD, ALD, ellipsometry)
  • ONE Lab growth facility (thermal evaporation, sputtering, optoelectronic device fabrication and testing)
  • eni-MIT Nanomaterials Metrology Lab (thermal evaporation, spectrophotometry, AFM)
  • eni-MIT Nanomaterials Spectroscopy Lab (1 kHz ultrafast laser system with OPA, transient absorption, optical Kerr-gated photoluminescence, streak camera, near IR spectrometer, near IR single photon counting, supercontinuum pulsed light source)
  • Microsystems Technology Laboratory (lithography, nanofabrication)
  • RLE Scanning Electron Beam Lithography facility