Next Page: Introduction
1
DOE/Opt: A System for Design of Experiments,
Response Surface Modeling, and Optimization
using Process and Device Simulation
Duane S. Boning
and P. K. Mozumder
Semiconductor Process and Design Center
Texas Instruments, Dallas TX 75235
December 7, 1993
1.5
Abstract:
Rapid modeling and optimization of manufacturing processes,
devices, and circuits are required to support modern integrated
circuit technology development and yield improvement. We have
prototyped and applied an integrated system, called DOE/Opt, for
performing Design of Experiments (DOE), Response Surface Modeling
(RSM), and Optimization (Opt). The system to be modeled and optimized
can be either physical or simulation based. Within the DOE/Opt
system, coupling to external simulation or experimental tools is
achieved via an embedded extension language based on Tcl. The
external problem then appears to DOE/Opt as a model with user defined
inputs and outputs. DOE/Opt is used to generate splits for
experiments, to dynamically build and evaluate regression models from
experimental runs, and to perform nonlinear constrained optimizations
using either regression models or embedded executions. The
intermediate regression modeling can appreciably accelerate the
optimization task when simulation or physical experiments are
expensive. The primary application of DOE/Opt has been to process
optimization using coupled process and device simulation. DOE/Opt has
also been applied to process and device simulator tuning, and to aid
in device characterization. Such a DOE/Opt system is expected to
augment the use of TCAD tools and to utilize data collected by CIM
systems in support of process synthesis. We have demonstrated the
application of the system to process parameter determination,
simulator tuning, process control modeling, and statistical process
optimization. We are extending the system to more fully support
emerging device design and process synthesis methodologies.