[labnetwork] Dry etching of ITO

[Helena Gleskova]

Does anyone have an experience with dry etching of ITO?
According to some publications, CH4/H2 gas mixture is used.
While we have these gases, I am concerned that the etcher
will be coated with indium afterwards.  Do you have any
suggestions, literature references, etc.?
Thank you for your help,
Helena


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Helena Gleskova, Ph.D.
Director, PRISM Micro/Nano Fabrication Facility
http://www.prism.princeton.edu/PRISM_cleanroom/fabrication.htm

Princeton University
Princeton Institute for the Science and Technology of Materials (PRISM)
Engineering Quadrangle, Room J301
Olden Street
Princeton, NJ 08544

Phone: (609) 258-4626
Fax: (609) 258-3585
Pager: (888) 200-3481
E-mail: gleskova at princeton.edu
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