From mark.crain at louisville.edu Wed Nov 5 14:49:25 2008 From: mark.crain at louisville.edu (Mark M Crain) Date: Wed, 5 Nov 2008 14:49:25 -0500 Subject: [labnetwork] Mask writing capabilities Message-ID: <4911B275.716B.0008.0@gwise.louisville.edu> Hello LABNETWORK I am interested in getting input from the various labs on their mask writing systems. I would like to get a response to the following questions from anyone interested in participating in a survey. I will post a summary to LABNETWORK early next week. Anyone willing to share information but wanting anonymity, please just let me know. 1) What type of system do you primarily use for making photomasks? (Send out files, Flash, laser writing, E beam, other) 2) What system do you wish you had? (type, make, model, options, etc) 3) For those with or looking for a laser writing system. What companies and models did you investigate? (Micronic (Swedish), Heideleberg, Microtech, other) 4) Does your system provide a sufficient resolution for most users? What is the best resolution, minimum feature size? 5) Does the system provide sufficient throughput for the lab? What is the typical throughput? 6) How do you develop your masks? (in a pyrex pan, with a spin developer, other) 7) How do you etch your metal layer? (wet etch manual, wet etch automation, plasma etch, other) 8) is your facility primarily defined as academic, national lab, or commercial? I appreciate the time and effort in replies. Best Regards Mark Mark Crain Cleanroom Manager University of Louisville BRB room 233 2210 South Brook Street Louisville KY 40208 Phone 502/852-1572 Fax 502/852-8128 From philippe.fluckiger at epfl.ch Thu Nov 6 01:46:15 2008 From: philippe.fluckiger at epfl.ch (Philippe Fluckiger) Date: Thu, 06 Nov 2008 07:46:15 +0100 Subject: [labnetwork] Mask writing capabilities In-Reply-To: <4911B275.716B.0008.0@gwise.louisville.edu> References: <4911B275.716B.0008.0@gwise.louisville.edu> Message-ID: <7.0.1.0.2.20081106074329.052fb960@epfl.ch > Dear Mark, We have at EPFL a Heidelberg DWL 200 and we are extremely satisfied! DWL200: http://cmi.epfl.ch/photo/Laser_DWL200/DWL200_introduction.php Homepage: http://cmi.epfl.ch/ Please visit our website and for further questions do not hesitate to give me a call. With my very best regards, Philippe Dr Philippe Fl?ckiger Director of Operations http://cmi.epfl.ch/ Phone +41 21 693 6695 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jeffg at purdue.edu Fri Nov 7 09:04:30 2008 From: jeffg at purdue.edu (Grau, Jeffrey E) Date: Fri, 7 Nov 2008 09:04:30 -0500 Subject: [labnetwork] Mask writing capabilities Message-ID: <3D03BBA53E694B41B6C1CF2A33B191A802818EBA@EXCH06.purdue.lcl> Hello Mark, My name is Jeff Grau and I am the equipment owner here at Purdue University. I am responding to your email regarding our equipment. 1) We presently have two Electromask CC-251 Criss Cross machines. One machine is set up for pattern generation and image repeating with a 10x lens. The other Electromask is set up for pattern generation and image repeating with a 5x lens. The 5x lens enables us to image a chip size of 2 centimeters by 2 centimeters which is very beneficial in the Mems application. 2) It would be nice to have a Micronic MP-80 system sometime in the future. 3) I operated, trained new employees, and maintained a Micronic MP-80 and a Micronic LRS-600 laser writer system. 4)Both Electomask systems provide sufficient results for most students at Purdue University. If sub-micron features are required, the VB-6 E-Beam or the Raith system will then generate the mask for the students Both Electromask systems are capable of generating features as small as 1.25 microns. 5) Both Electromasks are currently handling all of the mask submissions. The typical lead time is less than 2 days from the time the data is approved from the student. Throughput is based on the size of the flash count. A typical day for generating masks is 8 masks per day. 6)We develop all our masks using an APT automatic mask processor. 7) We etch our masks using the APT processor. When etching Iron Oxide masks we use a Pyrex dish. 8)Our facility is an academic environment -------------- next part -------------- An HTML attachment was scrubbed... URL: From bradshaw at utdallas.edu Fri Nov 7 19:00:25 2008 From: bradshaw at utdallas.edu (Keith Bradshaw) Date: Fri, 7 Nov 2008 18:00:25 -0600 Subject: [labnetwork] Thermco minibrute 431 controller help Message-ID: <003e01c94135$00b517b0$9f29ae0a@campus.ad.utdallas.edu> Does anyone have any spare Thermco 431 controllers? We have two in our minibrutes and one has stopped controlling! Cordially, Keith Bradshaw 972-883-2099 University of Texas at Dallas Clean Room -------------- next part -------------- An HTML attachment was scrubbed... URL: