From lichen at case.edu  Wed Aug  5 10:54:25 2009
From: lichen at case.edu (Li Chen)
Date: Wed, 5 Aug 2009 10:54:25 -0400
Subject: [labnetwork] problem with LPCVD SiN deposition
Message-ID: <00fb01ca15dc$a03f6ca0$e0be45e0$@edu>

 

Hi:

 

Recently, our silicon nitride LPCVD tube generates very low deposition rate.

Normally, the depo rate for LSN is 18A/min, and 30A/min for stoic. Nitride.

Now, only about 7A/min for both. The temperature gauge, pressure gauge and
MFCs are newly calibrated.

Anything suggestion for the sudden depo rate drop? 

Thank you very much. 

 

 

Li Chen

MicroFabrication Lab

Dept. of Electrical Engineering and Computer Science

Case Western Reserve University

Bingham 342, 10900 Euclid Avenue

Cleveland, OH 44106-7200

Tel: (216) 368-0393

Fax:(216) 368-6888

Email:  <mailto:lichen at case.edu> lichen at case.edu

Web:  <http://mems.case.edu/> mems.case.edu

 

 

 

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