[labnetwork] problem with LPCVD SiN deposition
Li Chen
lichen at case.edu
Wed Aug 5 10:54:25 EDT 2009
Hi:
Recently, our silicon nitride LPCVD tube generates very low deposition rate.
Normally, the depo rate for LSN is 18A/min, and 30A/min for stoic. Nitride.
Now, only about 7A/min for both. The temperature gauge, pressure gauge and
MFCs are newly calibrated.
Anything suggestion for the sudden depo rate drop?
Thank you very much.
Li Chen
MicroFabrication Lab
Dept. of Electrical Engineering and Computer Science
Case Western Reserve University
Bingham 342, 10900 Euclid Avenue
Cleveland, OH 44106-7200
Tel: (216) 368-0393
Fax:(216) 368-6888
Email: <mailto:lichen at case.edu> lichen at case.edu
Web: <http://mems.case.edu/> mems.case.edu
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