From everly at usf.edu Mon Aug 16 13:37:05 2010 From: everly at usf.edu (Everly, Richard) Date: Mon, 16 Aug 2010 13:37:05 -0400 Subject: [labnetwork] Help with Silicon on Sapphire Message-ID: I have researcher that wants to grow a thermal oxide on 6000Ang epi layer on sapphire substrate. I have no experience with this material and the documentation seems to be scarce. I don't want to burn up the substrate by doing something foolish as they very expensive. any help would be greatly appreciated! 1. is this material process compatible with standard silicon processes, can I use the same tube as I do my regular dry oxidation and not worry about contamination. 2. What heat-up and cool-down rates should I use, and are there any temp limits I need to be aware of? I've read that thermal expansion can be a problem. 3. Can I use the RCA clean process? I'm worried about the SC1 solution attacking the Sapphire. Richard Everly Cleanroom Engineer Nanotechnology Research and Education Center (NREC) University of South Florida NREC, ENB118 4202 E. Fowler Ave. Tampa, FL 33620 Office: 813-974-5365 Fax:??? 813-974-3610 ? From bob at eecs.berkeley.edu Mon Aug 16 13:53:14 2010 From: bob at eecs.berkeley.edu (Bob Hamilton) Date: Mon, 16 Aug 2010 10:53:14 -0700 Subject: [labnetwork] Help with Silicon on Sapphire In-Reply-To: References: Message-ID: <4C697B0A.7060209@eecs.berkeley.edu> Richard Everly, A couple of decades ago I did a fair amount of work with sapphire substrates, bonding these to glass for optical windows in the DUV. For glass work I had to make sure the sapphire face was cut on the correct axis to assure both x and y directions had the same COE. You should have no issues with chemical attack. There are no known liquid etchants for sapphire at standard process bath temps. Si processing temps do not exceed the melting point of sapphire susbstrates. These substrates can be run to 1250 C without issue. Assuming a reasonably thin wafer (~ 1mm) standard handling will not represent a thermal shock issue. Bob Hamilton Robert Hamilton University of California at Berkeley Nanolab Equipment Engineering Manager Rm406 Cory Hall Berkeley, CA 94720-1770 510-642-2716 510-642-2916 (Fax) 510-325-7557 (Cell) bob at silicon2.eecs.berkeley.edu On 8/16/2010 10:37 AM, Everly, Richard wrote: > I have researcher that wants to grow a thermal oxide on 6000Ang epi layer on sapphire substrate. I have no experience with this material and the documentation seems to be scarce. I don't want to burn up the substrate by doing something foolish as they very expensive. any help would be greatly appreciated! > > 1. is this material process compatible with standard silicon processes, can I use the same tube as I do my regular dry oxidation and not worry about contamination. > > 2. What heat-up and cool-down rates should I use, and are there any temp limits I need to be aware of? I've read that thermal expansion can be a problem. > > 3. Can I use the RCA clean process? I'm worried about the SC1 solution attacking the Sapphire. > > > Richard Everly > Cleanroom Engineer > Nanotechnology Research and Education Center (NREC) > University of South Florida > NREC, ENB118 > 4202 E. Fowler Ave. > Tampa, FL 33620 > > Office: 813-974-5365 > Fax: 813-974-3610 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From D.Lloyd at lboro.ac.uk Mon Aug 16 16:52:42 2010 From: D.Lloyd at lboro.ac.uk (Daniel Lloyd) Date: Mon, 16 Aug 2010 21:52:42 +0100 Subject: [labnetwork] Thermal conductivity in plasma chamber In-Reply-To: <4C697B0A.7060209@eecs.berkeley.edu> References: <4C697B0A.7060209@eecs.berkeley.edu> Message-ID: <64991842D0A7F147A88769E6A143A9F2038C9FACBC@STAFFMBX-1.lunet.lboro.ac.uk> Hi all, I currently use a vacuum grease to promote thermal conductivity in a RIE chamber but unfortunately it seems to react badly with fused silica (SiO2). This results in a dirty film being left on the surface of the substrate which is very hard (verging on impossible) to remove). Can anyone suggest a replacement which won't cause this problem? Thanks, Daniel From bob at eecs.berkeley.edu Tue Aug 17 12:02:00 2010 From: bob at eecs.berkeley.edu (Bob Hamilton) Date: Tue, 17 Aug 2010 09:02:00 -0700 Subject: [labnetwork] Thermal conductivity in plasma chamber In-Reply-To: <64991842D0A7F147A88769E6A143A9F2038C9FACBC@STAFFMBX-1.lunet.lboro.ac.uk> References: <4C697B0A.7060209@eecs.berkeley.edu> <64991842D0A7F147A88769E6A143A9F2038C9FACBC@STAFFMBX-1.lunet.lboro.ac.uk> Message-ID: <4C6AB278.6050601@eecs.berkeley.edu> The Microlab has been using thermal grease, CGR7016, Cool-Grease 7016, 50gram jar available from: http://www.aitechnology.com/store/ This grease is used in an STS/Bosch Si etch process. I have no information to offer about its interactions with SiO2. We also make our own thermal paste from Santovac V (polyphenol ether) and aluminum powder for use in our ionmill. Santovac V has an exceptionally low vapor pressure and is soluble in acetone, post-milling (perhaps boron ntirde would be a better additive than aluminum)? Also, a thin film of Santovac may be enough without a filler. http://www.2spi.com/catalog/vac/santovac-5-vacuum-grease.shtml Bob Hamilton Robert Hamilton University of California at Berkeley Nanolab Equipment Engineering Manager Rm406 Cory Hall Berkeley, CA 94720-1770 510-642-2716 510-642-2916 (Fax) 510-325-7557 (Cell) bob at silicon2.eecs.berkeley.edu On 8/16/2010 1:52 PM, Daniel Lloyd wrote: > Hi all, > > I currently use a vacuum grease to promote thermal conductivity in a RIE chamber but unfortunately it seems to react badly with fused silica (SiO2). This results in a dirty film being left on the surface of the substrate which is very hard (verging on impossible) to remove). Can anyone suggest a replacement which won't cause this problem? > > Thanks, > > Daniel > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From matthieu.nannini at mcgill.ca Mon Aug 23 10:07:30 2010 From: matthieu.nannini at mcgill.ca (Matthieu Nannini, Dr.) Date: Mon, 23 Aug 2010 10:07:30 -0400 Subject: [labnetwork] how-to retain knowledge Message-ID: <55462AE0-6387-4B16-AC36-B71E13F47041@mcgill.ca> Dear lab network members, i'm the manager of the McGill Microfab in Montr?al QC and I have a few questions to al of you: I've been asking myself this question for a long time and wondering how do others do. - how do you retain knowledge from fab members ? process, know-how etc, so members don't have to reinvent the wheel every time. - where do you draw the line between a researcher doing research and a researcher doing r&d for his/her newly spun off company using students - how do you deal with patented processes owned by PIs ? Thanks a lot Matthieu ----------------------------------- Matthieu Nannini McGill Nanotools Microfab Manager t: 514 398 3310 c: 514 758 3311 f: 514 398 8434 http://miam.physics.mcgill.ca/microfab ------------------------------------ From jlschroe at purdue.edu Mon Aug 23 12:07:26 2010 From: jlschroe at purdue.edu (Schroeder, Jeremy L) Date: Mon, 23 Aug 2010 12:07:26 -0400 Subject: [labnetwork] how-to retain knowledge In-Reply-To: <55462AE0-6387-4B16-AC36-B71E13F47041@mcgill.ca> References: <55462AE0-6387-4B16-AC36-B71E13F47041@mcgill.ca> Message-ID: <7FEA6BAE5320124A8E37F58C726BAB68A46CECB32E@VPEXCH06.purdue.lcl> Matthieu, I don't have the answer, but I can briefly comment on the first question (i.e. retaining knowledge from fab members). We have discussed this issue at Purdue's Birck Nanotechnology Center and we thought about developing an online knowledge database. However, the key is getting members to actually write down their know-how since people are often not interested in doing additional work that does not clearly benefit them. Not only that, even if members write down their information, it has to be written in a clearly understood format and someone else should check the information to ensure that it is accurate. In order to get this to work, I think you need a staff member partly devoted to the project. The staff member can ask students for specific information and then create standard-format documents from this information. Jeremy -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Matthieu Nannini, Dr. Sent: Monday, August 23, 2010 10:08 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] how-to retain knowledge Dear lab network members, i'm the manager of the McGill Microfab in Montr?al QC and I have a few questions to al of you: I've been asking myself this question for a long time and wondering how do others do. - how do you retain knowledge from fab members ? process, know-how etc, so members don't have to reinvent the wheel every time. - where do you draw the line between a researcher doing research and a researcher doing r&d for his/her newly spun off company using students - how do you deal with patented processes owned by PIs ? Thanks a lot Matthieu ----------------------------------- Matthieu Nannini McGill Nanotools Microfab Manager t: 514 398 3310 c: 514 758 3311 f: 514 398 8434 http://miam.physics.mcgill.ca/microfab ------------------------------------ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dcchrist at wisc.edu Mon Aug 23 13:09:40 2010 From: dcchrist at wisc.edu (Daniel C. Christensen) Date: Mon, 23 Aug 2010 12:09:40 -0500 Subject: [labnetwork] how-to retain knowledge In-Reply-To: <55462AE0-6387-4B16-AC36-B71E13F47041@mcgill.ca> References: <55462AE0-6387-4B16-AC36-B71E13F47041@mcgill.ca> Message-ID: <73708ec22c799.4c726504@wiscmail.wisc.edu> Our University has webspace where we encourage users to upload recipe, results and any other useful info to share with each other. Right now we have no way to organize the info. Also we do not see very mush activity by the users to utilize this resource. Dan Christensen Univ of WI-Madison On 08/23/10, "Matthieu Nannini, Dr." wrote: > Dear lab network members, > > i'm the manager of the McGill Microfab in Montr?al QC and I have a few questions to al of you: > > I've been asking myself this question for a long time and wondering how do others do. > - how do you retain knowledge from fab members ? process, know-how etc, so members don't have to reinvent the wheel every time. > - where do you draw the line between a researcher doing research and a researcher doing r&d for his/her newly spun off company using students > - how do you deal with patented processes owned by PIs ? > > Thanks a lot > > Matthieu > > ----------------------------------- > Matthieu Nannini > McGill Nanotools Microfab > Manager > t: 514 398 3310 > c: 514 758 3311 > f: 514 398 8434 > http://miam.physics.mcgill.ca/microfab > ------------------------------------ > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Daniel C Christensen dan at engr.wisc.edu? 608-262-6877 From vijay.m at ece.iisc.ernet.in Mon Aug 23 23:21:26 2010 From: vijay.m at ece.iisc.ernet.in (Vijay) Date: Tue, 24 Aug 2010 08:51:26 +0530 Subject: [labnetwork] how-to retain knowledge In-Reply-To: <7FEA6BAE5320124A8E37F58C726BAB68A46CECB32E@VPEXCH06.purdue.lcl> Message-ID: <4758C49779F144758A40C4EC1A476021@computer692435> Matthieu, I can share my experience of getting process recipes documented from students who use our laboratory for their research work (Centre of excellence in Nanoelectronics, IISc, Bangalore) in following manner-- 1. A brief format of the reports that each researchers needs to submit after completion of research work (or part of it) is given to them at the time of their initiating the work. 2. Report is colleted from them after research is completed and their next usage of lab may not be approved if they have not submitted the report in appropriate format. 3. New processes or recipes shared by the user student is documented as an internal report authored by the researcher and co-authored by the lab staff if essential role played by them. This gives the researchers sense of ownership of the work and also co-author gets his due credit. This document is not shared publicly until the researcher so desires. However, it is available for sharing amongst the Lab members on request basis. (This process is followed with researchers approaching our lab under Indian Nanoelectronics Users Program--INUP) Regards, VIjay -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Schroeder, Jeremy L Sent: Monday, August 23, 2010 9:37 PM To: 'Matthieu Nannini, Dr.'; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] how-to retain knowledge Matthieu, I don't have the answer, but I can briefly comment on the first question (i.e. retaining knowledge from fab members). We have discussed this issue at Purdue's Birck Nanotechnology Center and we thought about developing an online knowledge database. However, the key is getting members to actually write down their know-how since people are often not interested in doing additional work that does not clearly benefit them. Not only that, even if members write down their information, it has to be written in a clearly understood format and someone else should check the information to ensure that it is accurate. In order to get this to work, I think you need a staff member partly devoted to the project. The staff member can ask students for specific information and then create standard-format documents from this information. Jeremy -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Matthieu Nannini, Dr. Sent: Monday, August 23, 2010 10:08 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] how-to retain knowledge Dear lab network members, i'm the manager of the McGill Microfab in Montr?al QC and I have a few questions to al of you: I've been asking myself this question for a long time and wondering how do others do. - how do you retain knowledge from fab members ? process, know-how etc, so members don't have to reinvent the wheel every time. - where do you draw the line between a researcher doing research and a researcher doing r&d for his/her newly spun off company using students - how do you deal with patented processes owned by PIs ? Thanks a lot Matthieu ----------------------------------- Matthieu Nannini McGill Nanotools Microfab Manager t: 514 398 3310 c: 514 758 3311 f: 514 398 8434 http://miam.physics.mcgill.ca/microfab ------------------------------------ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. From diadiuk at MIT.EDU Tue Aug 24 10:49:53 2010 From: diadiuk at MIT.EDU (Vicky Diadiuk) Date: Tue, 24 Aug 2010 10:49:53 -0400 Subject: [labnetwork] how-to retain knowledge In-Reply-To: <4758C49779F144758A40C4EC1A476021@computer692435> References: <4758C49779F144758A40C4EC1A476021@computer692435> Message-ID: Hi, This is a perennial question that we've tried unsuccessfully to approach really formally (we started a process library database, searchable by material, process, etc) & the problem is that the person inputting the data doesn't benefit from it, so it doesn't work well. We haven't completely given up, & we have a Wiki site into which users can upload their processes - some do.... some actually look at it once in a while. What we are doing, that sort of works, is maintain electronic versions of each process that gets submitted for approval & we are insisting on fairly descriptive titles. The cumulative memory of the Process Technology Committe & the fabstaff is the most useful tool, though. Vicky On Aug 23, 2010, at 11:21 PM, Vijay wrote: > Matthieu, > I can share my experience of getting process recipes > documented > from students who use our laboratory for their research work (Centre > of > excellence in Nanoelectronics, IISc, Bangalore) in following manner-- > > 1. A brief format of the reports that each researchers needs to submit > after completion of research work (or part of it) is given to them at > the time of their initiating the work. > > 2. Report is colleted from them after research is completed and their > next usage of lab may not be approved if they have not submitted the > report in appropriate format. > > 3. New processes or recipes shared by the user student is documented > as > an internal report authored by the researcher and co-authored by the > lab > staff if essential role played by them. This gives the researchers > sense > of ownership of the work and also co-author gets his due credit. This > document is not shared publicly until the researcher so desires. > However, it is available for sharing amongst the Lab members on > request > basis. > > (This process is followed with researchers approaching our lab under > Indian Nanoelectronics Users Program--INUP) > > Regards, > > VIjay > > -----Original Message----- > From: labnetwork-bounces at mtl.mit.edu > [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Schroeder, > Jeremy L > Sent: Monday, August 23, 2010 9:37 PM > To: 'Matthieu Nannini, Dr.'; labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] how-to retain knowledge > > Matthieu, > > I don't have the answer, but I can briefly comment on the first > question > (i.e. retaining knowledge from fab members). > > We have discussed this issue at Purdue's Birck Nanotechnology Center > and > we thought about developing an online knowledge database. However, the > key is getting members to actually write down their know-how since > people are often not interested in doing additional work that does not > clearly benefit them. Not only that, even if members write down their > information, it has to be written in a clearly understood format and > someone else should check the information to ensure that it is > accurate. > > In order to get this to work, I think you need a staff member partly > devoted to the project. The staff member can ask students for specific > information and then create standard-format documents from this > information. > > Jeremy > > -----Original Message----- > From: labnetwork-bounces at mtl.mit.edu > [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Matthieu Nannini, > Dr. > Sent: Monday, August 23, 2010 10:08 AM > To: labnetwork at mtl.mit.edu > Subject: [labnetwork] how-to retain knowledge > > Dear lab network members, > > i'm the manager of the McGill Microfab in Montr?al QC and I have a few > questions to al of you: > > I've been asking myself this question for a long time and wondering > how > do others do. > - how do you retain knowledge from fab members ? process, know-how > etc, > so members don't have to reinvent the wheel every time. > - where do you draw the line between a researcher doing research and a > researcher doing r&d for his/her newly spun off company using students > - how do you deal with patented processes owned by PIs ? > > Thanks a lot > > Matthieu > > ----------------------------------- > Matthieu Nannini > McGill Nanotools Microfab > Manager > t: 514 398 3310 > c: 514 758 3311 > f: 514 398 8434 > http://miam.physics.mcgill.ca/microfab > ------------------------------------ > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- > This message has been scanned for viruses and > dangerous content by MailScanner, and is > believed to be clean. > > > -- > This message has been scanned for viruses and > dangerous content by MailScanner, and is > believed to be clean. > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From conrad at princeton.edu Fri Aug 27 15:20:30 2010 From: conrad at princeton.edu (Conrad Silvestre) Date: Fri, 27 Aug 2010 15:20:30 -0400 Subject: [labnetwork] Model 410 CV Meter Message-ID: <015001cb461c$ea32fdb0$be98f910$@edu> I have two old Model 410 CV Meters that I need to have repaired. Can anyone recommend an appropriate vendor? Conrad Silvestre Department of Electrical Engineering C430 EQuad, CN-5263 Princeton University Princeton, New Jersey 08544-5263 Office: 609-258-6236 FAX: 609-258-1840 Business Cell: 609-356-8825 -------------- next part -------------- An HTML attachment was scrubbed... URL: From voros at silicon.EECS.Berkeley.EDU Fri Aug 27 18:45:04 2010 From: voros at silicon.EECS.Berkeley.EDU (Katalin Voros) Date: Fri, 27 Aug 2010 15:45:04 -0700 (PDT) Subject: [labnetwork] how to retain knowledge Message-ID: <201008272245.o7RMj4pq014107@silicon2.EECS.Berkeley.EDU> Dear Colleagues, This is indeed a subject we are all struggling with and it will be a great subject to discuss at our next UGIM symposium. With input from many of you who were at this year's meeting at Purdue, we decided that our next meeting, in 2012, will be held here at UC Berkeley. We selected the date such that you will also have a chance to attend Semicon West in San Francisco, while you are here. UGIM 2012: 9-10 July Semicon West: 10-11-12 July 2012 Because of the shorter time frame and also because of the requests for longer sessions on lab management, we will not invite technical papers in 2012. We are planning to call for papers on all facets of lab management, benchmarking, and on special issues medium and small labs face. In the mean time let us continue to communicate through this list, labnetwork at mtl.mit.edu It was great to see many of you at the Purdue meeting. Sincerely Katalin Voros UC Berkeley UGIM Steering Committee: Greg Cibuzar - Chair (cibuzar at umn.edu) Dan Christensen - At large (dan at engr.wisc.edu) Bill Flounders - Next meeting organizer (bill at eecs.berkeley.edu) Lynn Fuller - Honorary for life (lffeee at rit.edu) Rob Pearson - At large (repemc at rit.edu) Katalin Voros - At large (voros at eecs.berkeley.edu) Kevin Walsh - At large (walsh at louisville.edu) John Weaver - Past meeting organizer (jrweaver at purdue.edu)