[labnetwork] Thermal Evap Opinions

[BenZ]

I suggest don't buy it at all, use others' system and pay by hour if you want to save money.

Ben
-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Kevin McPeak
Sent: Thursday, November 18, 2010 5:26 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Thermal Evap Opinions

Dear labnetwork subscribers,

I am new to the list and am looking for some advice on thermal evaporators. I am a new postdoc at ETH-Zurich and one of my first jobs is to select a thermal evaporator. The thermal evap will be used to deposit Ag, Au, Cu and Al films on Si wafers. Furthermore we want stage rotation and stage heating (150 C). So far the leading contenders (based on provided quotes) are Lesker's Nano 36 and the Minilab system from Moorfield (www.moorfield.co.uk). One of the biggest concerns I have with the Lesker system is that the current system comes with a 700 L/s diffusion pump. We can upgrade to a turbo but that would make the product less price competitive with the Minilab. Both products are in the high 50K range. The minilab comes with a 70 L/s Turbo pump.

Does anyone on the list have any experience (good or bad) with either of these products? Also and advice on the diffusion vs turbo pump issue is greatly appreciated. I myself come from a solution deposition background so I am just coming up to speed on vacuum processing equipment. What I have been told is that diffusion pumps suck a lot of power and can have catastrophic oil issues if proper safety precautions aren't taken.

Any advice is most appreciated.

Regards,
Kevin McPeak

--
Kevin McPeak Ph.D.
Postdoctoral Fellow
ETH Zürich
Optical Materials Engineering Laboratory Universitaetsstrasse 6, CNB F121
CH-8092 Zurich, Switzerland
Voice: +41 44 632 6594
Email: kmcpeak at ethz.ch

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