[labnetwork] ICP RIE etch of NbTiN: chamber contamination issues?

[Vito Logiudice]

Hello all,

We are contemplating the possibility of etching NbTiN in our ICP RIE chlorine etch system (Oxford Plasmalab 100 with ICP380 source). Initial feedback regarding potential chamber contamination issues are encouraging but we would appreciate any input from people whom may have had experience etching this material in the past. Many thanks in advance.

Regards,
Vito Logiudice

Vito Logiudice  P.Eng.
Director of Operations
QNC & RAC Fabrication Facilities

University of Waterloo
200 University Avenue West
Waterloo, ON
Canada   N2L 3G1
Tel:  1-519-888-4567  ext. 38703
Fax: 1-519-888-7610
Cel:  1-519-500-2538
Email: vlogiudi at uwaterloo.ca

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