From rmorrison at draper.com Tue Aug 2 11:48:35 2011 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Tue, 02 Aug 2011 11:48:35 -0400 Subject: [labnetwork] RH question Message-ID: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> Hi Everyone, Draper Laboratory is in the design phase for a new 6,000 sqft cleanroom. We are lucky enough to have a chance to have a Class 10 photolithography area. My question is what are others using for a humidity spec for the photolithography area, we are thinking 45% +-3%. This is based on research done by Dave Carter here at Draper. Any thoughts? Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bordonaro at cnf.cornell.edu Wed Aug 3 09:37:29 2011 From: bordonaro at cnf.cornell.edu (Garry J. Bordonaro) Date: Wed, 3 Aug 2011 09:37:29 -0400 Subject: [labnetwork] RH question In-Reply-To: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> References: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> Message-ID: Rick, I have seen the range of 40-45% typically specified. Our room is targeted for 42% +/- 2%. The most important thing is to keep the humidity stable, so the smaller the % swing the better. Garry Bordonaro Photolithographic Engineer Cornell NanoScale Facility Cornell University 250 Duffield Hall Ithaca, NY 14853-2700 On Tue, Aug 2, 2011 at 11:48 AM, Morrison, Richard H., Jr. < rmorrison at draper.com> wrote: > Hi Everyone,**** > > ** ** > > Draper Laboratory is in the design phase for a new 6,000 sqft cleanroom. We > are lucky enough to have a chance to have a Class 10 photolithography area. > My question is what are others using for a humidity spec for the > photolithography area, we are thinking 45% +-3%. This is based on research > done by Dave Carter here at Draper.**** > > ** ** > > Any thoughts?**** > > ** ** > > Rick**** > > ** ** > > ** ** > > ** ** > > ** ** > > Rick Morrison**** > > Senior Member Technical Staff **** > > Acting Group Leader Mems Fabrication**** > > Draper Laboratory**** > > 555 Technology Square**** > > Cambridge, MA 02139**** > > ** ** > > 617-258-3420**** > > ** ** > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Wed Aug 3 10:47:39 2011 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Wed, 3 Aug 2011 10:47:39 -0400 Subject: [labnetwork] RH question In-Reply-To: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> References: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> Message-ID: <8F95EA77ACBF904A861E580B44288EFD99BC1FF1EB@FASXCH02.fasmail.priv> Rick, 45% is on the low side but not unusual. Operating an area with lower RH can invite static problems. Operating in the mid to high 50% range will affect resists, it actually absorbs water and changes the photo speed. Here at Harvard CNS, we maintain 45% with a tolerance of +/_ 3%. If you plan on installing steppers, Check with the manufacturer to see where the machine will be "happy" . In any event, emphasis must be put into control tolerance. In order to get consistent processes, you need a consistent environment. Feel free to come over and look at our clean room, your just down the street and I could give you a tour. Regards, Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge MA 02138 Tel. 617 496 9816 spaolini at cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr. Sent: Tuesday, August 02, 2011 11:49 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] RH question Hi Everyone, Draper Laboratory is in the design phase for a new 6,000 sqft cleanroom. We are lucky enough to have a chance to have a Class 10 photolithography area. My question is what are others using for a humidity spec for the photolithography area, we are thinking 45% +-3%. This is based on research done by Dave Carter here at Draper. Any thoughts? Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 -------------- next part -------------- An HTML attachment was scrubbed... URL: From vincent.luciani at nist.gov Wed Aug 3 18:25:38 2011 From: vincent.luciani at nist.gov (Luciani, Vincent) Date: Wed, 3 Aug 2011 18:25:38 -0400 Subject: [labnetwork] RH question In-Reply-To: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> References: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0470C13E@exchbk1.draper.com> Message-ID: <01F47D4EDEEC64488C10B767D15E485808F4459F4E@MBCLUSTER.xchange.nist.gov> Hello Rick, Your 45% is the right target. +-3% is the absolute widest you should go. If you can keep within 2%, your tools/processes will be the limiting factor of your sub-micron repeatability. Any wider range than that and your RH variation could start taking away from your repeatability. For example: Deep sub-micrometer geometries on an automatic developer will be sensitive to even +-2%. With large geometries and developing in a beaker +-3% is fine. Here at CNST we shoot for +-2% and achieve better than +-1%. A class 10 clean room will have enough air changes/minute to do very well if the HVAC designer specs the right humidity control hardware. Good Luck! Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 [cid:image001.jpg at 01CC520A.D19475E0] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr. Sent: Tuesday, August 02, 2011 11:49 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] RH question Hi Everyone, Draper Laboratory is in the design phase for a new 6,000 sqft cleanroom. We are lucky enough to have a chance to have a Class 10 photolithography area. My question is what are others using for a humidity spec for the photolithography area, we are thinking 45% +-3%. This is based on research done by Dave Carter here at Draper. Any thoughts? Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2575 bytes Desc: image001.jpg URL: From rmorrison at draper.com Wed Aug 10 15:57:23 2011 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Wed, 10 Aug 2011 15:57:23 -0400 Subject: [labnetwork] Results of the STS RIE oxide etch mystery Message-ID: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA04819CCF@exchbk1.draper.com> Hi Everyone, I would like to thanks the many people that responded to my initial email about the STS RIE tool etching SiO2 during an O2 plasma. To sum up: We replaced the vacuum pump to ensure no oil back streaming (Ebara dry pump), no change in etch rate or in the plasma emission. We replaced the cover o-ring (old one had Fomblin grease), no change in etch rate or in the plasma emission. Scrubbed the walls and ran long multi hour O2 clean, no change in etch rate or in the plasma emission. Removed the Teflon Shield Ring (installed around the chuck), etch rate went to zero and F was gone from the plasma emissions. So it appears that the O2 plasma is liberating F from the Teflon ring which in turns etches the SiO2. We are consulting STS to see if there is a fix. If there is I will let you all know. Thanks Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Aug 11 13:55:48 2011 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 11 Aug 2011 13:55:48 -0400 Subject: [labnetwork] wet bench issue Message-ID: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0481A336@exchbk1.draper.com> Hi Everyone, When you mix bases and acids in wet benches with lip exhaust we sometimes grow crystals, mostly with NH4OH and HCL baths, for instance a bath with says 10% NH4OH next to a bath with 5% HCL. Besides dumping the tanks every day, how can you keep the crystal growth down? We solved that issues with BOE by covering the bath, but NH4OH and HCL evolve lots of gas so lids are problematic. Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bernard at mtl.mit.edu Thu Aug 11 14:04:26 2011 From: bernard at mtl.mit.edu (Bernard Alamariu) Date: Thu, 11 Aug 2011 14:04:26 -0400 Subject: [labnetwork] Results of the STS RIE oxide etch mystery In-Reply-To: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA04819CCF@exchbk1.draper.com> References: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA04819CCF@exchbk1.draper.com> Message-ID: <4E4419AA.1010709@mtl.mit.edu> Hi, Great! I understood that you can sustain a 1,000A/ min SiO2 etch with CFn+ ions from a Solid Teflon Source, triggered by O2 plasma. Correct? Very Interesting! Do you plan to make Patent application? I think that would be a very good example of the just as they said: "Don't let a Crisis go to Waste!" Thanks, Bernard On 8/10/11 3:57 PM, Morrison, Richard H., Jr. wrote: > > Hi Everyone, > > I would like to thanks the many people that responded to my initial > email about the STS RIE tool etching SiO2 during an O2 plasma. > > To sum up: > > We replaced the vacuum pump to ensure no oil back streaming (Ebara dry > pump), no change in etch rate or in the plasma emission. > > We replaced the cover o-ring (old one had Fomblin grease), no change > in etch rate or in the plasma emission. > > Scrubbed the walls and ran long multi hour O2 clean, no change in etch > rate or in the plasma emission. > > Removed the Teflon Shield Ring (installed around the chuck), etch rate > went to zero and F was gone from the plasma emissions. > > So it appears that the O2 plasma is liberating F from the Teflon ring > which in turns etches the SiO2. We are consulting STS to see if there > is a fix. If there is I will let you all know. > > > Thanks > > Rick > > Rick Morrison > > Senior Member Technical Staff > > Acting Group Leader Mems Fabrication > > Draper Laboratory > > 555 Technology Square > > Cambridge, MA 02139 > > 617-258-3420 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Aug 11 14:30:37 2011 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 11 Aug 2011 14:30:37 -0400 Subject: [labnetwork] Results of the STS RIE oxide etch mystery In-Reply-To: <4E4419AA.1010709@mtl.mit.edu> References: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA04819CCF@exchbk1.draper.com> <4E4419AA.1010709@mtl.mit.edu> Message-ID: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0481A3A3@exchbk1.draper.com> By our data that is what is happening, I do not understand at this time if anything else plays a role. We also saw a reduction in N2 peaks (using a plasma scope to look at the plasma cloud) and some other things dropped. Good point about the patent, need to research that. This Teflon ring makes the plasma harder to understand, if I get anything I else I will share it with the group. Rick From: Bernard Alamariu [mailto:bernard at mtl.mit.edu] Sent: Thursday, August 11, 2011 2:04 PM To: Morrison, Richard H., Jr. Cc: labnetwork at mtl.mit.edu; Eric S. Lim; Bernard Subject: Re: [labnetwork] Results of the STS RIE oxide etch mystery Hi, Great! I understood that you can sustain a 1,000A/ min SiO2 etch with CFn+ ions from a Solid Teflon Source, triggered by O2 plasma. Correct? Very Interesting! Do you plan to make Patent application? I think that would be a very good example of the just as they said: "Don't let a Crisis go to Waste!" Thanks, Bernard On 8/10/11 3:57 PM, Morrison, Richard H., Jr. wrote: Hi Everyone, I would like to thanks the many people that responded to my initial email about the STS RIE tool etching SiO2 during an O2 plasma. To sum up: We replaced the vacuum pump to ensure no oil back streaming (Ebara dry pump), no change in etch rate or in the plasma emission. We replaced the cover o-ring (old one had Fomblin grease), no change in etch rate or in the plasma emission. Scrubbed the walls and ran long multi hour O2 clean, no change in etch rate or in the plasma emission. Removed the Teflon Shield Ring (installed around the chuck), etch rate went to zero and F was gone from the plasma emissions. So it appears that the O2 plasma is liberating F from the Teflon ring which in turns etches the SiO2. We are consulting STS to see if there is a fix. If there is I will let you all know. Thanks Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From kmcpeak at ethz.ch Thu Aug 11 16:31:31 2011 From: kmcpeak at ethz.ch (Kevin McPeak) Date: Thu, 11 Aug 2011 22:31:31 +0200 Subject: [labnetwork] Preferred sputtering target supplier (for TCOs) Message-ID: Dear labnetwork subscribers, Do any of you have recommendations for suppliers for sputtering targets? I have been using Lesker targets for my PVD75 sputterer. I am perfectly happy with their metal targets but haven't had the best of luck RF sputtering Al:ZnO films with their 2% Al2O3 / 98% ZnO target (copper backed and Indium bonded). My issues may not be related to their target at all but I am interested to hear if others on the list feel strongly about certain target suppliers, especially for TCO materials like Al:ZnO and ITO. Thanks in advance for your input. Regards, Kevin McPeak -- Kevin McPeak Ph.D. Postdoctoral Researcher ETH Z?rich Optical Materials Engineering Laboratory Universit?tstrasse 6, CNB F121 CH-8092 Zurich, Switzerland Voice: +41 44 632 6594 Email: kmcpeak at ethz.ch From bill at eecs.berkeley.edu Thu Aug 11 20:45:42 2011 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Thu, 11 Aug 2011 17:45:42 -0700 Subject: [labnetwork] Preferred sputtering target supplier (for TCOs) In-Reply-To: References: Message-ID: <4E4477B6.6070306@eecs.berkeley.edu> Lesker provides high quality targets. The material you are 'targeting' is finicky. If you have no evidence of contamination and no issues with debonding, I would question process parameters before Lesker's target quality. Bill Flounders UC Berkeley Kevin McPeak wrote: > Dear labnetwork subscribers, > > Do any of you have recommendations for suppliers for sputtering > targets? I have been using Lesker targets for my PVD75 sputterer. I am > perfectly happy with their metal targets but haven't had the best of > luck RF sputtering Al:ZnO films with their 2% Al2O3 / 98% ZnO target > (copper backed and Indium bonded). My issues may not be related to > their target at all but I am interested to hear if others on the list > feel strongly about certain target suppliers, especially for TCO > materials like Al:ZnO and ITO. Thanks in advance for your input. > > Regards, > Kevin McPeak > From rmorrison at draper.com Fri Aug 12 07:01:57 2011 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Fri, 12 Aug 2011 07:01:57 -0400 Subject: [labnetwork] Preferred sputtering target supplier (for TCOs) In-Reply-To: <4E4477B6.6070306@eecs.berkeley.edu> References: <4E4477B6.6070306@eecs.berkeley.edu> Message-ID: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0485DF17@exchbk1.draper.com> Here at Draper Labs we use Materion (was Williams) 845-279-0900. Sometimes we use Angstrom Sciences www.angstromsciences.com Rick -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bill Flounders Sent: Thursday, August 11, 2011 8:46 PM To: Kevin McPeak Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Preferred sputtering target supplier (for TCOs) Lesker provides high quality targets. The material you are 'targeting' is finicky. If you have no evidence of contamination and no issues with debonding, I would question process parameters before Lesker's target quality. Bill Flounders UC Berkeley Kevin McPeak wrote: > Dear labnetwork subscribers, > > Do any of you have recommendations for suppliers for sputtering > targets? I have been using Lesker targets for my PVD75 sputterer. I am > perfectly happy with their metal targets but haven't had the best of > luck RF sputtering Al:ZnO films with their 2% Al2O3 / 98% ZnO target > (copper backed and Indium bonded). My issues may not be related to > their target at all but I am interested to hear if others on the list > feel strongly about certain target suppliers, especially for TCO > materials like Al:ZnO and ITO. Thanks in advance for your input. > > Regards, > Kevin McPeak > _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dabunzow at lbl.gov Fri Aug 12 10:55:47 2011 From: dabunzow at lbl.gov (David A. Bunzow) Date: Fri, 12 Aug 2011 07:55:47 -0700 Subject: [labnetwork] Preferred sputtering target supplier (for TCOs) In-Reply-To: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0485DF17@exchbk1.draper.com> References: <4E4477B6.6070306@eecs.berkeley.edu> <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0485DF17@exchbk1.draper.com> Message-ID: <4E453EF3.704@lbl.gov> I have historically used both Angstrom Sciences and Lesker for various target materials. I had good luck with several exotic/custom targets from Angstrom, but in head-to-head for same material I have not seen any measurable distinction in film quality, longevity or contamination. David A. Bunzow User Facilities Program Manager The Molecular Foundry Materials Science Division Lawrence Berkeley National Laboratory 1 Cyclotron Road MS 67-3207 Berkeley, CA 94720 Office: 510-486-4574 FAX: 510-486-7424 Cell: 701-541-2354 On 8/12/2011 4:01 AM, Morrison, Richard H., Jr. wrote: > Here at Draper Labs we use Materion (was Williams) 845-279-0900. > > Sometimes we use Angstrom Sciences www.angstromsciences.com > > Rick > > > -----Original Message----- > From: labnetwork-bounces at mtl.mit.edu > [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bill Flounders > Sent: Thursday, August 11, 2011 8:46 PM > To: Kevin McPeak > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Preferred sputtering target supplier (for > TCOs) > > Lesker provides high quality targets. > The material you are 'targeting' is finicky. > If you have no evidence of contamination > and no issues with debonding, I would question > process parameters before Lesker's target quality. > > Bill Flounders > UC Berkeley > > Kevin McPeak wrote: >> Dear labnetwork subscribers, >> >> Do any of you have recommendations for suppliers for sputtering >> targets? I have been using Lesker targets for my PVD75 sputterer. I am >> perfectly happy with their metal targets but haven't had the best of >> luck RF sputtering Al:ZnO films with their 2% Al2O3 / 98% ZnO target >> (copper backed and Indium bonded). My issues may not be related to >> their target at all but I am interested to hear if others on the list >> feel strongly about certain target suppliers, especially for TCO >> materials like Al:ZnO and ITO. Thanks in advance for your input. >> >> Regards, >> Kevin McPeak >> > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From jrweaver at purdue.edu Tue Aug 16 15:24:55 2011 From: jrweaver at purdue.edu (Weaver, John R) Date: Tue, 16 Aug 2011 15:24:55 -0400 Subject: [labnetwork] IEST and UGIM Synergies White Paper Aug 2011.docx Message-ID: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> Please see the attached white paper. It is based on my previous discussions regarding options for an "off year" UGIM meeting, based on inputs at UGIM 2010. Thanks, John -------------- next part -------------- A non-text attachment was scrubbed... Name: IEST and UGIM Synergies White Paper Aug 2011.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 17364 bytes Desc: IEST and UGIM Synergies White Paper Aug 2011.docx URL: From weidong001 at hotmail.com Tue Aug 16 23:24:58 2011 From: weidong001 at hotmail.com (weidong zhou) Date: Tue, 16 Aug 2011 22:24:58 -0500 Subject: [labnetwork] Can we use the same chamber for both Si and III-V (GaAs, InP, GaN) etching In-Reply-To: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> References: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> Message-ID: Dear Colleagues I have one question: Can we use the same chamber for both Si and III-V (GaAs, InP, GaN, etc)? Any potential contamination issues? Why in most places, there are two separate chambers/tools for Si and III-V etching? Thanks. Weidong -------------- next part -------------- An HTML attachment was scrubbed... URL: From IRHarvey at eng.utah.edu Wed Aug 17 11:05:19 2011 From: IRHarvey at eng.utah.edu (Ian Harvey) Date: Wed, 17 Aug 2011 09:05:19 -0600 Subject: [labnetwork] Fwd: IEST and UGIM Synergies White Paper Aug 2011.docx References: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> Message-ID: Hi John, As one of last year's UGIM attendees vocalizing the need for more interaction with my peers, I think that 2012's UGIM operational focus at Berkeley coupled with your plan for ESTECH 2013 perfectly addresses my own interest in advancing best practices and cooperation among peer cleanroom fabrication facilities. Thank you for your efforts putting this together! --Ian ******************************************** Ian R. Harvey, Ph.D. Associate Director, Utah Nanofab College of Engineering / University of Utah www.nanofab.utah.edu Begin forwarded message: From: "Weaver, John R" Date: August 16, 2011 1:24:55 PM MDT To: "'Gregory Cibuzar'" , "labnetwork at mtl.mit.edu" Subject: [labnetwork] IEST and UGIM Synergies White Paper Aug 2011.docx Please see the attached white paper. It is based on my previous discussions regarding options for an "off year" UGIM meeting, based on inputs at UGIM 2010. Thanks, John -------------- next part -------------- A non-text attachment was scrubbed... Name: IEST and UGIM Synergies White Paper Aug 2011.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 17364 bytes Desc: not available URL: -------------- next part -------------- _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From diadiuk at MIT.EDU Wed Aug 17 11:31:48 2011 From: diadiuk at MIT.EDU (Vicky Diadiuk) Date: Wed, 17 Aug 2011 11:31:48 -0400 Subject: [labnetwork] IEST and UGIM Synergies White Paper Aug 2011.docx In-Reply-To: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> References: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> Message-ID: <9EACFF09-720B-4837-A55D-5912D186F959@mit.edu> HI, I find the biennial UGIMs to be sufficient & I wld probably not participate in such a conf every year. As interesting as our topics are, they don't change that rapidly :) & the e-mails fill any gap pretty well. Just my 2-cets. Thx, Vicky On Aug 16, 2011, at 3:24 PM, Weaver, John R wrote: > Please see the attached white paper. It is based on my previous > discussions regarding options for an "off year" UGIM meeting, based > on inputs at UGIM 2010. > > Thanks, > John > 2011.docx>_______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From voros at silicon.EECS.Berkeley.EDU Wed Aug 17 15:38:48 2011 From: voros at silicon.EECS.Berkeley.EDU (Katalin Voros) Date: Wed, 17 Aug 2011 12:38:48 -0700 (PDT) Subject: [labnetwork] IEST and UGIM Synergies White Paper Message-ID: <201108171938.p7HJcm0F016383@silicon2.EECS.Berkeley.EDU> John, pls submit your paper to UGIM 2010, where it will fit nicely in the University and Public Relations panel/Past and Future of UGIM. I think IEST 2013 will fill the gap between UGIM 2012 and 2014. BTW - those of you who are interested in organizing UGIM 2014 pls send a line stating this, to Greg Cibuzar, Chair, UGIM Steering Committee, cibuzar at umn.edu. Thank you Katalin Katalin Voros, Co-Chair UGIM 2012 Conference Committee http://microlab2.eecs.berkeley.edu/UGIM2012/ -------------------------------------------- KATALIN VOROS R&D Engineering Manager Engineering Research Support Organization Electrical Engineering and Computer Sciences University of California at Berkeley 406 Cory Hall #1770 Berkeley, CA 94720-1770 phone: (510) 642-2911 voros at eecs.berkeley.edu http://microlab.berkeley.edu -------------------------------------------- From bill at eecs.berkeley.edu Wed Aug 17 18:40:49 2011 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Wed, 17 Aug 2011 15:40:49 -0700 Subject: [labnetwork] IEST and UGIM Synergies White Paper Aug 2011.docx In-Reply-To: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> References: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl> Message-ID: <4E4C4371.9080502@eecs.berkeley.edu> John, Excellent paper. I recommend a conversation with Greg, Katalin, Lynn Fuller and other UGIM originators to clarify some of the UGIM background section. Then, I look forward to your presentation of this proposal at the 2012 UGIM conference. The session covering this topic will be just before the lunch meeting during which we define our next meeting plans. Bill Weaver, John R wrote: > Please see the attached white paper. It is based on my previous discussions regarding options for an "off year" UGIM meeting, based on inputs at UGIM 2010. > > Thanks, > John > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From hbtusainc at yahoo.com Wed Aug 17 19:20:47 2011 From: hbtusainc at yahoo.com (Mario Portillo) Date: Wed, 17 Aug 2011 16:20:47 -0700 (PDT) Subject: [labnetwork] NH3 YES Reversal Oven Message-ID: <1313623247.55023.YahooMailNeo@web130202.mail.mud.yahoo.com> Dear Members.....on behalf of a customer there is a NH3 image reversal oven available for sale, YES-8, well maintain and in an excellent working condition with its pump.....It is priced $5K lower than any similar oven available in the open market. ? Let me know if interested.. ? Regards Mario A. Portillo Sr. High'born Technology USA Inc. Semiconductor Equipment Services 8130 Glades Road, #229 Boca Raton, FL 33434 561 479-1975 office 561 504-0244 cell hbtusainc at yahoo.com www.hbtusainc.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From matthieu.nannini at mcgill.ca Thu Aug 18 14:44:39 2011 From: matthieu.nannini at mcgill.ca (Matthieu Nannini, Dr.) Date: Thu, 18 Aug 2011 18:44:39 +0000 Subject: [labnetwork] EBeam Evap Message-ID: Dear all, I'm about to buy an ebeam evaporator and we received three bids from Nanomaster, Angstrom Science and Plasmionique. Any comment about those three companies ? Any recommendation ? Thanks in advance Matthieu Nannini McGill Nanotools Lab. From hathaway at cns.fas.harvard.edu Fri Aug 19 09:43:59 2011 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm) Date: Fri, 19 Aug 2011 09:43:59 -0400 Subject: [labnetwork] Can we use the same chamber for both Si and III-V (GaAs, InP, GaN) etching In-Reply-To: References: <18AD986E445FE847B2A80B53E65704EDAD3ECD88EC@VPEXCH02.purdue.lcl>, Message-ID: <8F95EA77ACBF904A861E580B44288EFD99BA141AB5@FASXCH02.fasmail.priv> Generally not, as any residual As, P, or Ga will act as a dopant in your Si devices. Similarly, Si is a dopant for many of these other materials. As you noticed, most places keep them separate. Some places will not even allow both materials in the same lab. Mac Harvard CNS ________________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] On Behalf Of weidong zhou [weidong001 at hotmail.com] Sent: Tuesday, August 16, 2011 11:24 PM To: Lab Network Subject: [labnetwork] Can we use the same chamber for both Si and III-V (GaAs, InP, GaN) etching Dear Colleagues I have one question: Can we use the same chamber for both Si and III-V (GaAs, InP, GaN, etc)? Any potential contamination issues? Why in most places, there are two separate chambers/tools for Si and III-V etching? Thanks. Weidong From shott at stanford.edu Fri Aug 19 16:51:59 2011 From: shott at stanford.edu (John Shott) Date: Fri, 19 Aug 2011 13:51:59 -0700 Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? Message-ID: <4E4ECCEF.8000007@stanford.edu> Labnetwork: Like many facilities, I suspect, we have a single LN2 tank that is used for delivery of gaseous nitrogen to the entire building. While our shared laboratory is undoubtedly the largest user of that nitrogen, there are also a number of private labs in the building that consume nitrogen. Because they do not pay for it, however, they have little incentive to conserve nitrogen. Additionally, because we don't have great metering of our own nitrogen usage, we probably use more than we should in our facility. Do any of you have experience with either totalizing flow meters and/or flow computers that can be used for tracking nitrogen flow and usage at 15 or 20 distributed points that end up communicating to a central data collection point? Any experience with systems of this type would be greatly appreciated. Thanks, John From kingdc at rpi.edu Sat Aug 20 06:18:37 2011 From: kingdc at rpi.edu (Dave King) Date: Sat, 20 Aug 2011 06:18:37 -0400 Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? In-Reply-To: <4E4ECCEF.8000007@stanford.edu> References: <4E4ECCEF.8000007@stanford.edu> Message-ID: <000001cc5f22$89baf6c0$9d30e440$@edu> John, We have exactly the same situation at RPI, but we have been unable to find a good solution. The meters that we tried were not accurate. (I don't recall the brand name offhand, but I can get that info if you need it.) We even had one that would "count" when it was sitting on a desk, not connected to anything! In addition, people felt that requiring each lab to pay for the installation of a meter was just one more barrier to getting them to use the centralized distribution system instead of having cylinders delivered to their lab. And then there's the overhead involved in generating bills for each lab each month. Conservation is certainly a good thing, but we feel that the primary factor affecting our LN2 consumption is our liquid use, not our gas use. Even with other labs in the building connected to the system, at an expansion factor of 700:1, it takes an awful lot of gas usage to make a dent in our 6,000 gallon bulk tank. >From a financial standpoint, you might be better off trying to get someone at the proper level (Dean, Provost, VP) to recognize the nitrogen system as part of the building infrastructure and agree to subsidize part of the annual LN2 cost out of overhead funds. This doesn't help with conservation, but it would take the financial burden off your facility (and prevent auditors from asking why funding coming to your lab is being used to support activities elsewhere). Dave King -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of John Shott Sent: Friday, August 19, 2011 4:52 PM To: Labnetwork Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? Labnetwork: Like many facilities, I suspect, we have a single LN2 tank that is used for delivery of gaseous nitrogen to the entire building. While our shared laboratory is undoubtedly the largest user of that nitrogen, there are also a number of private labs in the building that consume nitrogen. Because they do not pay for it, however, they have little incentive to conserve nitrogen. Additionally, because we don't have great metering of our own nitrogen usage, we probably use more than we should in our facility. Do any of you have experience with either totalizing flow meters and/or flow computers that can be used for tracking nitrogen flow and usage at 15 or 20 distributed points that end up communicating to a central data collection point? Any experience with systems of this type would be greatly appreciated. Thanks, John _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dgrimard at umich.edu Sun Aug 21 12:06:21 2011 From: dgrimard at umich.edu (Grimard, Dennis) Date: Sun, 21 Aug 2011 16:06:21 +0000 Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? In-Reply-To: <4E4ECCEF.8000007@stanford.edu> References: <4E4ECCEF.8000007@stanford.edu> Message-ID: <4568ACC1-915E-4FC2-A1FB-BF66DE39F810@umich.edu> John: We have exterior labs using our house N2 also. We use about 7 to 8 MCF per month (yes that is millions of CF). We measured that the exterior labs were using about a Million CF. We are now charging them. We did a simple estimate of their use and came up with about 600, 000 cF without measurements. Of course, faculty complained. So we are putting in a totalizer system now that will neater exactly what they are using. Dennis Schweiger can send you the details. What we did to estimate the use was tie a standard a-size bottle to each lab and drain it and record the time. Volume of bottle divided by rime equals use. We also estimated use by walking through each lab and giving standard values to specific types of equipment (dry pumps, MBE, dry boxes, etc). Good luck ... Dennis S Grimard On Aug 19, 2011, at 6:56 PM, "John Shott" wrote: > Labnetwork: > > Like many facilities, I suspect, we have a single LN2 tank that is used for delivery of gaseous nitrogen to the entire building. While our shared laboratory is undoubtedly the largest user of that nitrogen, there are also a number of private labs in the building that consume nitrogen. Because they do not pay for it, however, they have little incentive to conserve nitrogen. Additionally, because we don't have great metering of our own nitrogen usage, we probably use more than we should in our facility. > > Do any of you have experience with either totalizing flow meters and/or flow computers that can be used for tracking nitrogen flow and usage at 15 or 20 distributed points that end up communicating to a central data collection point? > > Any experience with systems of this type would be greatly appreciated. > > Thanks, > > John > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From rathbun at cnf.cornell.edu Mon Aug 22 09:16:04 2011 From: rathbun at cnf.cornell.edu (Lynn Rathbun) Date: Mon, 22 Aug 2011 09:16:04 -0400 Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? In-Reply-To: <4568ACC1-915E-4FC2-A1FB-BF66DE39F810@umich.edu> References: <4E4ECCEF.8000007@stanford.edu> <4568ACC1-915E-4FC2-A1FB-BF66DE39F810@umich.edu> Message-ID: <6.2.5.6.2.20110822090557.095b4e58@cnf.cornell.edu> John At Cornell , we have just within the last year installed meters in about 5 zones. The cleanroom is basically two zones, and one zone for each other floor and to one other major user. And we have a total flow meter. We will soon begin charging by the meters, with the use on each floor prorated out by floor to the users. So a room on the third floor may pay more than a room on the 2nd floor, depending on use of neighbors. Metering individual rooms is not practical. there are some difficulties however. Average flows are a ctually pretty steady, even instantaneous flows dont vary much. But the level of use in the zones is dramatically different so the meters have to be drastically different sizes. Each meter only works well over a limited range of flows, and the errors and offsets are not small.....to the point where the errors and offsets of the big flowmeters are larger than the flows of the little meters. So the zone flows never add up to the total flow....Typically off by 10%. Not to bad except that that 10% respresents most of the flow to the rest of the building. So , we get a ballpark reading of the percentages to each zone, I would not call it an accurate measurement. And 10% of 200K/yr is real money. Good luck ************************************************************** Dr. Lynn Rathbun Rathbun at cnf.cornell.edu NNIN Program Manager (607)-254-4872 CNF Laboratory Manager Duffield Hall (607)-255-8601 Fax Cornell University (607)-592-1549 Work Cell Ithaca, New York 14853 (607)-342-1880 Personal Cell -------------- next part -------------- An HTML attachment was scrubbed... URL: From bob at eecs.berkeley.edu Mon Aug 22 12:32:49 2011 From: bob at eecs.berkeley.edu (Robert M. Hamilton) Date: Mon, 22 Aug 2011 09:32:49 -0700 Subject: [labnetwork] Berkeley's reply - N2 Flow Meters and/or Flow Computers for tracking distributed nitrogen usage In-Reply-To: <4E4ECCEF.8000007@stanford.edu> References: <4E4ECCEF.8000007@stanford.edu> Message-ID: <4E5284B1.1030708@eecs.berkeley.edu> The UC Berkeley NanoLab supports two LN vessels. We meter nitrogen fed to the NanoLab and the labs in two associated buildings. In addition, we've built and manage a LN fill station used by an assortment of researchers to fill portable Dewars. We use nitrogen metrology and the billing methods we inherited from the Microlab, which we supersede. We bill N2 and LN at fixed-charge, i.e. we do not further break down our costs for those who wish to hook up to the nitrogen facilities we support. N2 metering consists of a Hoffer-brand turbine meter within our LN vessel cage. The Hoffer monitors and totalizes all N2 use. N2 mass flow meters are used in two of the three buildings supplied with N2. One of these is a Brooks thermal-mass-flow meter and the other a Kurtz. Calculation for N2 use by the third building is done by decrementing the use of the other two from the Hoffer total. We installed a flow-fuse to the third building to keep their operation from downing ours should there be a breach in their distribution lines. This building operates with less professional staff and is therefore subject to issues with their N2 plumbing setups. Our computer resource utility monitoring system, "RUMS" monitors and allows us to remotely access data such as N2 use and vessel fill needs. I often use my smartphone to monitor utilities and our LN vendor uses a link to RUMS to determine vessel levels and coordinate fills. We operate two LN vessels, a 9000 and a 3000 gallon vessel. The 3000 gallon vessel is held at ~60 psi while the 9000 is operated at 150 psi. There is a crossover manifold that allows us to feed N2 from either vessel in the case of an equipment failure. When we have to switch feeds we reset each vessels pressure-building circuit. The smaller vessel is run at lower pressure to minimize flash-loss for LN needs as two molecular beam epitaxial systems demand ambient pressure LN. Also, Dewar fills take much longer when the LN source for such fills is at high pressure. It seems the broader question is the civics of operating a shared-research facility. The NanoLab, like the Microlab before is a self-supporting recharge operation. As such, we pay for all our nitrogen costs including the purchase of bulk LN and the cost of purchasing, facilitating and maintaining LN vessels and their associated plumbing . We've chosen to share our nitrogen based on the spirit of a "common good". The disadvantage is PI's who are not familiar with the complexity of an operation do not gain the sense for the real costs associated with a utility. Regrettably, there are even a few who knowledgeably take advantage of a situation. It would be nice if nitrogen came from the air, for free. This would solve the issues of cost and I'd be grateful for not get those 4 AM phone calls, from the LN delivery drivers, about fill issues. Best regards, Bob Hamilton Robert M. Hamilton Marvel NanoLab University of CA at Berkeley Rm 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu (e-mail preferred) 510-809-8600 510-325-7557 (Emergencies) On 8/19/2011 1:51 PM, John Shott wrote: > Labnetwork: > > Like many facilities, I suspect, we have a single LN2 tank > that is used for delivery of gaseous nitrogen to the > entire building. While our shared laboratory is > undoubtedly the largest user of that nitrogen, there are > also a number of private labs in the building that consume > nitrogen. Because they do not pay for it, however, they > have little incentive to conserve nitrogen. Additionally, > because we don't have great metering of our own nitrogen > usage, we probably use more than we should in our facility. > > Do any of you have experience with either totalizing flow > meters and/or flow computers that can be used for tracking > nitrogen flow and usage at 15 or 20 distributed points > that end up communicating to a central data collection point? > > Any experience with systems of this type would be greatly > appreciated. > > Thanks, > > John > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From voros at silicon.EECS.Berkeley.EDU Mon Aug 22 13:57:50 2011 From: voros at silicon.EECS.Berkeley.EDU (Katalin Voros) Date: Mon, 22 Aug 2011 10:57:50 -0700 (PDT) Subject: [labnetwork] looking for manufacturer's manual Message-ID: <201108221757.p7MHvosa018422@silicon2.EECS.Berkeley.EDU> Dear colleagues, Can anyone help Mr. Dean Jorgensen? i(see below) We decommissioned our Vickers Image Shearing System Microscope in 2006 and do not have the manufacturer's manual any longer. If you can help pls contact dean at integra.net dirctly. Thank you Katalin -------------------------------------------- KATALIN VOROS R&D Engineering Manager Engineering Research Support Organization Electrical Engineering and Computer Sciences University of California at Berkeley 406 Cory Hall #1770 Berkeley, CA 94720-1770 phone: (510) 642-2911 voros at eecs.berkeley.edu http://microlab.berkeley.edu -------------------------------------------- Subject: Vickers Image Shearing System Miicroscpe Lab Manual From: "dean jorgensen" Date: Sat, August 20, 2011 10:57 am To: voros at eecs.berkeley.edu I read your Vickers M17 operation notes with enthusiam and would like very much to obtain a copy of the Lab Manual that is referred to through out the Vickers Image Shearing Microscope Notes by Z. Karami, M. Kushner and K. Chan dated 11-97 that was posted on the internet. I would be willing to pay for the copied LAB MANUAL as I need these most importantly.THANK YOU. Dean Jorgensen 801 661 2133 From rmorrison at draper.com Mon Aug 22 14:28:16 2011 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Mon, 22 Aug 2011 14:28:16 -0400 Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? In-Reply-To: <4E4ECCEF.8000007@stanford.edu> References: <4E4ECCEF.8000007@stanford.edu> Message-ID: <94CDEF5D18F0BB4A85B1D78EFBDD6FDA0493334F@exchbk1.draper.com> Hi, At Draper we have totalizer flow meters at all the main lines going into the lab spaces, it cost us about $15K per installation point. We then charge the labs for the amount of gas they use. We do have issues with the totalizer units not working, it requires local reset. Overall the system has been in place for 2 years and is working ok. We worked through our N2 supplier to find the companies that sell the products, it is very vanilla flavor instruments. The install must be done by a good process piping company, you do not want to contaminate the N2 lines. The entire system cost us around $50K so it is expensive. When you see the amount of N2 you use it makes you conserve whenever possible. We spent around $10K on a firm to come in and find leaks, it was not really worth the effort. Big culprits are dry boxes, fittings inside wet benches, glove boxes and purge lines. Rick Rick Morrison Senior Member Technical Staff Acting Group Leader Mems Fabrication Draper Laboratory 555 Technology Square Cambridge, MA 02139 617-258-3420 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of John Shott Sent: Friday, August 19, 2011 4:52 PM To: Labnetwork Subject: [labnetwork] Flow Meters and/or Flow Computers for tracking distributed nitrogen usage? Labnetwork: Like many facilities, I suspect, we have a single LN2 tank that is used for delivery of gaseous nitrogen to the entire building. While our shared laboratory is undoubtedly the largest user of that nitrogen, there are also a number of private labs in the building that consume nitrogen. Because they do not pay for it, however, they have little incentive to conserve nitrogen. Additionally, because we don't have great metering of our own nitrogen usage, we probably use more than we should in our facility. Do any of you have experience with either totalizing flow meters and/or flow computers that can be used for tracking nitrogen flow and usage at 15 or 20 distributed points that end up communicating to a central data collection point? Any experience with systems of this type would be greatly appreciated. Thanks, John _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From jjmccarthy at wisc.edu Tue Aug 23 11:01:57 2011 From: jjmccarthy at wisc.edu (Jon McCarthy) Date: Tue, 23 Aug 2011 10:01:57 -0500 Subject: [labnetwork] ATTN: Two used JEOL JBX-5DII . Message-ID: <005001cc61a5$9a838370$cf8a8a50$@wisc.edu> The University of Wisconsin-Madison, College of engineering has a JEOL JBX-5DII tools that have been de-commissioned. We would accept any reasonable offer for purchase of the systems. We can wrap and palletize if you pay shipping and pickup. Any purchase will go through UW SWAP Neither system has a working computer: the Primary system(originally from Intel/JEOL) was working when shut down in 2009. In 2010 the VAX failed during a restart. As far as we know the rest of the system can be operated. A similar system is available (originally Univ. of Michigan) for parts. See specifications below; . JEOL JBX-5D2-U E-Beam Lithography System Specifications . 19 year old Electron Beam Lithographer . 50 KeV Electron Beam . LaB 6 Current Source . 2 MHz Pattern Generator . Variable field size . Low and high resolution modes . 10mm working distance for high res mode . No height map . Current Range - 10 pA to 10 mA . Beam Size ~ 10 nm for small current. . 125 mm (5") Stage Travel with l/120 Interferometer . Best Resolution - 50 nm nested lines in 200 nm resist (Hank Smith et al.), 70 nm nested lines in 150 nm resist (JPL). 75 nm nested lines in 350 nm UV3 . Down to 30 nmin 150nmresist, problemswith repeatability. . Pattern code fully accessible - custom modification * Substrates * 3-5" Si wafers * SiN membranes * 4-5" Quartz Masks Field Sizes: * Low Resolution Mode 100 mm working distance: - 800 microns * High Resolution Mode 10 mm working distance: - 80 microns and smaller (small area only) Resist dose requirements: * UVseries ~30mC/cm 2 * Apex E ~ 12 mC/cm 2 * Sal-605 ~ 12 mC/cm 2 * PMMA ~ 600 mC/cm 2 * Description: Description: http://www.nanotech.wisc.edu/images/clear.gif Description: Description: http://www.nanotech.wisc.edu/images/clear.giflast updated: May 15, 2010 SEND INQUIRIES ON HOW TO PURCHASE OR MAKE AN OFFER TO: Jon J McCarthy, Ph.D. Director, Shared Instrument Facilities Co-Director Advance Materials Industrial Consortium UW College of Engineering Phone: 608-263-1073 Cell:608-345-6134 jjmccarthy at wisc.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image005.jpg Type: image/jpeg Size: 11777 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image006.png Type: image/png Size: 173 bytes Desc: not available URL: From psharris at magma.ca Tue Aug 23 15:55:54 2011 From: psharris at magma.ca (P. Scott Harris) Date: Tue, 23 Aug 2011 15:55:54 -0400 Subject: [labnetwork] ATTN: Two used JEOL JBX-5DII . In-Reply-To: <005001cc61a5$9a838370$cf8a8a50$@wisc.edu> References: <005001cc61a5$9a838370$cf8a8a50$@wisc.edu> Message-ID: <4E5405CA.5080601@magma.ca> Hi, Just FYI, we normally make upgrade kits for Mann/GCA Pattern Generator/Stepper equipment but a university in China asked us to look at upgrading their JEOL JBX-6AII tool in the same manner (desktop PC replaces PDP-11/44, bus controller and related peripherals etc.) so we are currently trying that out. The hardware and software are there now and testing is scheduled but I haven't begun actual testing yet. I wouldn't have started this project if I didn't think that it was doable but I won't know for certain until testing is complete. I guess that all of this is just to say that you might have other options for the equipment if the computer controller issue is your primary reason for getting rid of it. On 23/08/2011 11:01 AM, Jon McCarthy wrote: > > The University of Wisconsin-Madison, College of engineering has a JEOL > JBX-5DII tools that have been de-commissioned. We would accept any reasonable > offer for purchase of the systems. We can wrap and palletize if you pay > shipping and pickup. Any purchase will go through UW SWAP > > Neither system has a working computer: the Primary system(originally from > Intel/JEOL) was working when shut down in 2009. In 2010 the VAX failed during > a restart. As far as we know the rest of the system can be operated. A similar > system is available (originally Univ. of Michigan) for parts. > > See specifications below; > -- Best regards, P. Scott Harris, P.Eng. H&L Associates 21 Parkmount Crescent Nepean, Ontario K2H 5T3 Canada Tel: (613) 828-1462 -------------- next part -------------- An HTML attachment was scrubbed... URL: From eheves at sabanciuniv.edu Fri Aug 26 07:56:53 2011 From: eheves at sabanciuniv.edu (Emre Heves) Date: Fri, 26 Aug 2011 14:56:53 +0300 Subject: [labnetwork] coral software Message-ID: <4E578A05.1040203@sabanciuniv.edu> Dear all, we are in need of lab management software in our new nanotechnology center. I am trying to reach technical/pricing information about Coral software. Can you advice me any contacts related with it? Or do you have any other suggestions for lab management software? Thanks in advance -- Emre Heves Sabanc? University Nanotechnology Research and Application Center Orhanl?, Tuzla, ?stanbul 34956 Office: 0 216 483 9884 Fax: 0 216 483 9550 Email: eheves at sabanciuniv.edu http://sunum.sabanciuniv.edu/ From Hathaway at cns.fas.harvard.edu Fri Aug 26 09:49:51 2011 From: Hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Fri, 26 Aug 2011 09:49:51 -0400 Subject: [labnetwork] coral software In-Reply-To: <4E578A05.1040203@sabanciuniv.edu> References: <4E578A05.1040203@sabanciuniv.edu> Message-ID: <4E57A47F.5080308@cns.fas.harvard.edu> Hi Emre, This is Mac at Harvard CNS. We don't use Coral for our cleanroom and labs. Instead, we have an application called CLEAN (CNS Logbook and Equipment Access Network), which we use in conjunction with our reservation system to control access to equipment, manage on-line logbooks for all connected equipment, clock usage time, and generate billing information. It /can/ be exported to other locations, but I'm not sure how simple it is. You can contact Eric Martin, our director, about how/whether it might be made available for your use. Mac Hathaway Harvard Center for Nanoscale Systems Emre Heves wrote: > Dear all, > we are in need of lab management software in our new nanotechnology > center. I am trying to reach technical/pricing information about Coral > software. Can you advice me any contacts related with it? > Or do you have any other suggestions for lab management software? > > Thanks in advance > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From ocola at anl.gov Tue Aug 30 12:15:03 2011 From: ocola at anl.gov (Leonidas E Ocola) Date: Tue, 30 Aug 2011 11:15:03 -0500 Subject: [labnetwork] coral software In-Reply-To: <4E57A47F.5080308@cns.fas.harvard.edu> References: <4E578A05.1040203@sabanciuniv.edu> <4E57A47F.5080308@cns.fas.harvard.edu> Message-ID: <4E5D0C87.7000000@anl.gov> Mac, I would also be interested in learning if your system is portable. We tried to use Coral and had problems with adapting the software to our database system. I am not the person in charge of that, but would be happy to relay the info along to our group leader. I assume there are other software available for the same purposes as CLEAN and Coral? Thanks Leo On 8/26/2011 8:49 AM, Mac Hathaway wrote: > Hi Emre, > > This is Mac at Harvard CNS. We don't use Coral for our cleanroom and > labs. Instead, we have an application called CLEAN (CNS Logbook and > Equipment Access Network), which we use in conjunction with our > reservation system to control access to equipment, manage on-line > logbooks for all connected equipment, clock usage time, and generate > billing information. It /can/ be exported to other locations, but I'm > not sure how simple it is. You can contact Eric Martin, our director, > about how/whether it might be made available for your use. > > Mac Hathaway > Harvard Center for Nanoscale Systems > > Emre Heves wrote: >> Dear all, >> we are in need of lab management software in our new nanotechnology >> center. I am trying to reach technical/pricing information about Coral >> software. Can you advice me any contacts related with it? >> Or do you have any other suggestions for lab management software? >> >> Thanks in advance >> >> > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rgc5 at psu.edu Tue Aug 30 14:32:07 2011 From: rgc5 at psu.edu (Cornwall, Robert G.) Date: Tue, 30 Aug 2011 18:32:07 +0000 Subject: [labnetwork] coral software In-Reply-To: <4E578A05.1040203@sabanciuniv.edu> References: <4E578A05.1040203@sabanciuniv.edu> Message-ID: <112F5A9BC6B8DA44BB0BD3ACE2EAAA8447F29043@Cirrus> The Penn State Nanofabrication and other user facilities have a tool that we call Research Instrumentation Management System which was developed by a company called Versatile and has been modified over a number of years. Princeton University recently implemented the system for their fab. I don?t know their current pricing structure, but we have found it to be a very flexible tool that spans multiple user facilities. It is a reservation, equipment management, and billing system rolled into one. Email me if you are interested in more information. Robert Cornwall 814-863-8735 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Emre Heves Sent: Friday, August 26, 2011 7:57 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] coral software Dear all, we are in need of lab management software in our new nanotechnology center. I am trying to reach technical/pricing information about Coral software. Can you advice me any contacts related with it? Or do you have any other suggestions for lab management software? Thanks in advance -- Emre Heves Sabanc? University Nanotechnology Research and Application Center Orhanl?, Tuzla, ?stanbul 34956 Office: 0 216 483 9884 Fax: 0 216 483 9550 Email: eheves at sabanciuniv.edu http://sunum.sabanciuniv.edu/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From coolunix at pacbell.net Wed Aug 31 11:35:04 2011 From: coolunix at pacbell.net (Larry Southern) Date: Wed, 31 Aug 2011 08:35:04 -0700 (PDT) Subject: [labnetwork] inquiry about CNS Logbook and Equipment Access Network Message-ID: <1314804904.19969.YahooMailClassic@web83714.mail.sp1.yahoo.com> To Mac Hathaway- I am writing internal scheduling and auditing software for the Molecular Foundry, at Lawrence Berkeley Labs, for David Bunzow. I seen in emails you guys have something called "CLEAN (CNS Logbook and Equipment Access Network)" For my own reference- could I take a look at it, and review it's features? thanks much, -Larry Southern From philippe.fluckiger at epfl.ch Wed Aug 31 03:22:50 2011 From: philippe.fluckiger at epfl.ch (=?utf-8?B?RmzDvGNraWdlciBQaGlsaXBwZQ==?=) Date: Wed, 31 Aug 2011 07:22:50 +0000 Subject: [labnetwork] coral software In-Reply-To: <4E5D0C87.7000000@anl.gov> References: <4E578A05.1040203@sabanciuniv.edu> <4E57A47F.5080308@cns.fas.harvard.edu> <4E5D0C87.7000000@anl.gov> Message-ID: <4AA894F792D3D64085E82E89F36041311EA2107B@rexi1.intranet.epfl.ch> Dear All, This is Philippe at the Swiss Federal Institute of Technology in Lausanne, Switzerland. The Center of MicroNanoTechnology (CMi) has developed a whole software package for equipment reservation & equipment access & invoicing. It also includes an e-buying module for the consumables distributed to the users (wafers, precious metals, masks, ?). The system has been implemented in other places as well. Please do not hesitate to contact me if you are interested. With my very best regards, Philippe Dr Philippe Fl?ckiger Director of Operations http://cmi.epfl.ch/ Phone +41 21 693 6695 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leonidas E Ocola Sent: mardi 30 ao?t 2011 18:15 To: labnetwork at mtl.mit.edu; Leonidas E Ocola Subject: Re: [labnetwork] coral software Mac, I would also be interested in learning if your system is portable. We tried to use Coral and had problems with adapting the software to our database system. I am not the person in charge of that, but would be happy to relay the info along to our group leader. I assume there are other software available for the same purposes as CLEAN and Coral? Thanks Leo On 8/26/2011 8:49 AM, Mac Hathaway wrote: Hi Emre, This is Mac at Harvard CNS. We don't use Coral for our cleanroom and labs. Instead, we have an application called CLEAN (CNS Logbook and Equipment Access Network), which we use in conjunction with our reservation system to control access to equipment, manage on-line logbooks for all connected equipment, clock usage time, and generate billing information. It can be exported to other locations, but I'm not sure how simple it is. You can contact Eric Martin, our director, about how/whether it might be made available for your use. Mac Hathaway Harvard Center for Nanoscale Systems Emre Heves wrote: Dear all, we are in need of lab management software in our new nanotechnology center. I am trying to reach technical/pricing information about Coral software. Can you advice me any contacts related with it? Or do you have any other suggestions for lab management software? Thanks in advance _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: