[labnetwork] RH question

[Luciani, Vincent]

Hello Rick,

Your 45% is the right target.  +-3% is the absolute widest you should go.

If you can keep within 2%, your tools/processes will be the limiting factor of your sub-micron repeatability.  Any wider range than that and your RH variation could start taking away from your repeatability.
For example: Deep sub-micrometer geometries on an automatic developer will be sensitive to even +-2%.  With large geometries and developing in a beaker +-3% is fine.
Here at CNST we shoot for +-2% and achieve better than +-1%.  A class 10 clean room will have enough air changes/minute to do very well if the HVAC designer specs the right humidity control hardware.

Good Luck!

Vince

Vincent K. Luciani
NanoFab Manager
Center for Nanoscale Science and Technology<http://www.cnst.nist.gov/>
National Institute of Standards and Technology
100 Bureau Drive, MS 6201
Gaithersburg, MD 20899-6200 USA
+1-301-975-2886
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From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr.
Sent: Tuesday, August 02, 2011 11:49 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] RH question

Hi Everyone,

Draper Laboratory is in the design phase for a new 6,000 sqft cleanroom. We are lucky enough to have a chance to have a Class 10 photolithography area. My question is what are others using for a humidity spec for the photolithography area, we are thinking 45% +-3%. This is based on research done by Dave Carter here at Draper.

Any thoughts?

Rick




Rick Morrison
Senior Member Technical  Staff
Acting Group Leader Mems Fabrication
Draper Laboratory
555 Technology Square
Cambridge, MA  02139

617-258-3420

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