From fponce004 at gmail.com Thu Mar 3 17:02:46 2011 From: fponce004 at gmail.com (Francisco Ponce) Date: Thu, 3 Mar 2011 14:02:46 -0800 Subject: [labnetwork] KLA Tencor 2320 Message-ID: Hi, I am trying to a 3-D Deflection map from a KLA Tencor 2320 the company has been anything but helpful so I will take any insight I can get. I know I need to enter a new orientation angle to do the deflection mapping but the system does not let me enter a new angle. In fact the slot where the angle would be entered is completely missing. Does anyone know if there is a way of "turning on and off" this function and that perhaps that is what has happened? If the software is corrupted? Or simply not working. Thank you, Francisco Ponce -------------- next part -------------- An HTML attachment was scrubbed... URL: From geoff at purdue.edu Fri Mar 4 12:40:28 2011 From: geoff at purdue.edu (Gardner, Geoffrey C) Date: Fri, 4 Mar 2011 12:40:28 -0500 Subject: [labnetwork] Etch Tool Chamber Cleaning Procedures Message-ID: <4236EE4ACF400B428955E0E7D5012AAD8704178FAB@VPEXCH06.purdue.lcl> Lab Network Community, Thank you in advance for your time and thoughts. We are undertaking a critical review of our Etch Process Chamber Wet or Manual Cleaning Procedures. For the purpose of this review we will ignore plasma cleaning and conditioning. Could you please describe for me the techniques you use to clean your etch chambers. I am specifically interested in; 1. Processes/Gasses being run in chamber? 2. Type of contamination/ build up attempting to remove. 3. Frequency of cleaning? Or What signals you it is time to clean. 4. Inner chamber material being cleaned? (quartz, anodized aluminum, SS, etc.) 5. What wetting agent is used? (water, solvent type or acid type) 6. That is the wiping agent (brillow pad/ CR wipes) 7. Is there a specific order/processes for your cleaning? (Acetone first, water second etc) 8. Are there other suggestions or thoughts you would like to include in this review. I will compile a summary of the responses and share them with those who are interested. Thank you, Geoffrey C. Gardner Microfab Research Engineer Purdue University, Birck Nanotechnology Center, 1205 West State Street West Lafayette, IN 47907 office: (765) 494-3458 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rlbemc at rit.edu Wed Mar 9 10:24:24 2011 From: rlbemc at rit.edu (Richard Battaglia) Date: Wed, 09 Mar 2011 10:24:24 -0500 Subject: [labnetwork] Branson Asher Message-ID: <77FE2617B4EE654881E4E7BBB74B0DEB56E61CCE4D@ex02mail01.ad.rit.edu> Lab Network community, We have in the SMFL, here at RIT, a Branson Asher IPC3200/6. At this time we are having issues with the ADE 350 ARM not responding to the machine. Is there anyone out there with any knowledge on this tool or the robot? I have tried to talk to the robot controller with Hyper Terminal but have had no success. I am not sure if we are having robot issues or if the computer hard drive in the Branson is the problem. Any help is greatly appreciated. Thank You Richard Battaglia Richard L Battaglia RIT/SMFL BLDG 17 ROOM 2627 82 Lomb Memorial Drive Rochester NY 14623 585-478-3834 - phone 585-475-5041 - fax -------------- next part -------------- An HTML attachment was scrubbed... URL: From info at fabsurplus.com Wed Mar 9 21:12:59 2011 From: info at fabsurplus.com (Stephen CS Howe) Date: Thu, 10 Mar 2011 11:12:59 +0900 Subject: [labnetwork] Branson Asher In-Reply-To: <77FE2617B4EE654881E4E7BBB74B0DEB56E61CCE4D@ex02mail01.ad.rit.edu> References: <77FE2617B4EE654881E4E7BBB74B0DEB56E61CCE4D@ex02mail01.ad.rit.edu> Message-ID: <1299723179.2285.15.camel@samsung.tower> Dear Richard, If you can't fix it let me know. We can probably supply a replacement robot and/or controller and cable if needed. Branson was taken over by Gasonics and then by Novellus. You could possibly ask Novellus for support but they did discontinue that product. Yours sincerely, Stephen Howe Company Owner SDI Fabsurplus Group +1 830 388 1071 (USA Mobile) +39 335 710 7756 (Italy Mobile) Skype: Stephencshowe e-mail:showe at fabsurplus.com WWW.FABSURPLUS.COM On Wed, 2011-03-09 at 10:24 -0500, Richard Battaglia wrote: > Lab Network community, > > > > We have in the SMFL, here at RIT, a Branson Asher IPC3200/6. At this > time we are having issues with the ADE 350 ARM not responding to the > machine. Is there anyone out there with any knowledge on this tool or > the robot? I have tried to talk to the robot controller with Hyper > Terminal but have had no success. I am not sure if we are having > robot issues or if the computer hard drive in the Branson is the > problem. Any help is greatly appreciated. > > > > Thank You > > > > Richard Battaglia > > > > Richard L Battaglia > > RIT/SMFL > > BLDG 17 ROOM 2627 > > 82 Lomb Memorial Drive > > Rochester NY 14623 > > 585-478-3834 - phone > > 585-475-5041 - fax > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From diadiuk at MIT.EDU Mon Mar 14 11:01:09 2011 From: diadiuk at MIT.EDU (Vicky Diadiuk) Date: Mon, 14 Mar 2011 11:01:09 -0400 Subject: [labnetwork] transformer available Message-ID: Hi, We are decommissioning our AMAT Centura 5300 & have lots of components that will become available. To start with there's a Square D "Watchdog" 3-phase isolated transformer 150 kVA, 60 Hz Cat # 150T3HFCU Style # 35549-17212-076 Pls let me know if this is of interest Vicky From diadiuk at MIT.EDU Wed Mar 16 15:42:49 2011 From: diadiuk at MIT.EDU (Vicky Diadiuk) Date: Wed, 16 Mar 2011 15:42:49 -0400 Subject: [labnetwork] Centura 5300 RF generators available References: <4D810E47.7000508@mtl.mit.edu> Message-ID: > Hi, > We have 2 AMAT Centura 5300 RF generators avialable. Their specs are > as follows : > > AMAT ETO generator model 80-S03, fully automatic, water cooled, Dual > RF Generator from an AMAT 5300 HDP oxide etch system. > Bias generator (2KW @ 1.8MHz continuous output) > source generator (4KW @ 2.0MHz continuous output) > > 1 unit fully functional, > 1 unit only bias generator is working > > Pls let me know if you have any interest in them > Thx, Vicky From wrd1 at psu.edu Thu Mar 17 11:18:17 2011 From: wrd1 at psu.edu (William R. Drawl) Date: Thu, 17 Mar 2011 11:18:17 -0400 Subject: [labnetwork] Centura rf pwr spplys Message-ID: <473D6C7BEEF3A74B989103208824D76501A38181@echo.mri.psu.edu> Hi Vicky, What is needed to obtain these power supply that you sent notice of? Thanks, Bill -------------- next part -------------- An HTML attachment was scrubbed... URL: From ocola at anl.gov Thu Mar 24 16:10:37 2011 From: ocola at anl.gov (Leonidas E Ocola) Date: Thu, 24 Mar 2011 15:10:37 -0500 Subject: [labnetwork] Any one interested in being an exhibitor at EIPBN ???? In-Reply-To: <77FE2617B4EE654881E4E7BBB74B0DEB56E61CCE4D@ex02mail01.ad.rit.edu> References: <77FE2617B4EE654881E4E7BBB74B0DEB56E61CCE4D@ex02mail01.ad.rit.edu> Message-ID: <4D8BA53D.70609@cnm.anl.gov> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 25528 bytes Desc: not available URL: From mmcrai01 at louisville.edu Sat Mar 26 12:27:30 2011 From: mmcrai01 at louisville.edu (Mark M Crain) Date: Sat, 26 Mar 2011 12:27:30 -0400 Subject: [labnetwork] on the deposition of copper indium diselenide Message-ID: <4D8DDBBA.716B.0008.1@gwise.louisville.edu> Hello Everyone, We have just started some sputter deposition of copper indium diselenide. This deposition has started some questioning both its safety and contamination. I did the obvious before even purchasing the target; reviewing the MSDS, speaking with target suppliers, and "googling" the topic of CIS and CIGS deposition. 1) Earlier this week there were concerns regarding the smell coming from the chamber after sputter deposition. I did have the opportunity to smell this. Is this harmful? Would it be advisable to add some pump and purge process to the venting sequence? 2) There are claims of particulate in the chamber. I have not seen this yet but would be interested in comments regarding the use of a target like this and its possible contamination to other deposition processes. The sources have lids so this material should be landing on the lids and not the targets. I can imagine that heated areas of the chamber could off gas contamination. Best Regards Mark Mark Crain Cleanroom Manager University of Louisville SRB room 233 2210 South Brook Street Louisville KY 40208 Phone 502/852-1572 Fax 502/852-8128 mark.crain at louisville.edu From pkarulkar9 at gmail.com Sat Mar 26 20:26:40 2011 From: pkarulkar9 at gmail.com (Pramod C Karulkar) Date: Sat, 26 Mar 2011 16:26:40 -0800 Subject: [labnetwork] on the deposition of copper indium diselenide In-Reply-To: <4D8DDBBA.716B.0008.1@gwise.louisville.edu> References: <4D8DDBBA.716B.0008.1@gwise.louisville.edu> Message-ID: <4D8E8440.30307@gmail.com> The odors in plasma systems that use sulfur compounds are well known and have been analyzed. Back-streaming from pumps combined with chamber processes can also result in odors. It is not surprising that you smell something in a sputtering system that uses selenium. The trace chemicals may be harmful and one should avoid breathing them. If you smell it, then you have it.Your local safety officer should be able help you seek solutions. There are mature protocols in the industry for opening, operating, and cleaning reactive systems such as evaporator chambers, plasma chambers, implant sources, and even ovens. You may find that the boxes used to store the deposited substrates and vacuum system parts might develop the same odor after a few days of storage. Some possibilities are: (1) Improve protocol: Delay opening of the chamber after a deposition and go through repeated vent/pump cycles before opening the chamber. Require operators to wear appropriate personal protection equipment e.g., gloves, sleeve covers, masks etc. Avoid opening the chamber when the area is crowded with people. (2) Enhance installation for safety: Place the entire equipment in a exhausted enclosure, environmental chamber, a hood, or a glove box such that there is enough exhaust to carry the odor away and airflow is always away (and not towards) the operator. What to do with the exhaust will depend on the size of your operation and local policies/regulations. Prevent back-streaming from the pumping station. Pump oils, even in trace amounts, lead to serious problems when added to the chamber chemistry. (3) Selenium and many of its compounds are considered toxic. At some point, the odor causing compound will have to identified. In sulfur, fluorine, oxygen based plasma systems, oxyfluorides are believed to cause the odors. (4) You will have many particles. They will get worse as the system is used. Your results will be dominated by particle contamination if you keep making depositions without any cleaning. You may choose to cover surfaces that are in the direct line of deposition with a disposable liner such as a custom made shield or a clean Al foil. Protocols to change the shield often and to vacuum out the chamber after every deposition run will have to be developed. You have to use a vacuum cleaner with a HEPA filter designed for such a laboratory use and dispose bags appropriately. A scraping tool made by pinching flat and sharpening a stainless steel tube to custom fit the vacuum cleaner hose will help. You can make smaller vacuum tools from smaller tubes by using a Teflon plug (cork) to fit them into the vacuum hose. Good luck and please do send info about the closure of thisissue to the microelectronics community. Pramod Karulkar Pramod C Karulkar 1470 Goshawk Lane Fairbanks AK 99709 907 457 4123 On 3/26/2011 8:27 AM, Mark M Crain wrote: > Hello Everyone, > > We have just started some sputter deposition of copper indium > diselenide. This deposition has started some questioning both its > safety and contamination. I did the obvious before even purchasing the > target; reviewing the MSDS, speaking with target suppliers, and > "googling" the topic of CIS and CIGS deposition. > > 1) Earlier this week there were concerns regarding the smell coming > from the chamber after sputter deposition. I did have the opportunity to > smell this. Is this harmful? Would it be advisable to add some pump > and purge process to the venting sequence? > > 2) There are claims of particulate in the chamber. I have not seen > this yet but would be interested in comments regarding the use of a > target like this and its possible contamination to other deposition > processes. The sources have lids so this material should be landing on > the lids and not the targets. I can imagine that heated areas of the > chamber could off gas contamination. > > > Best Regards > > Mark > > Mark Crain > Cleanroom Manager > University of Louisville > SRB room 233 > 2210 South Brook Street > Louisville KY 40208 > Phone 502/852-1572 > Fax 502/852-8128 > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- -------------- next part -------------- An HTML attachment was scrubbed... URL: From david at sussexsemiconductor.com Mon Mar 28 12:00:10 2011 From: david at sussexsemiconductor.com (David) Date: Mon, 28 Mar 2011 12:00:10 -0400 Subject: [labnetwork] diode fab closing Message-ID: Hi, We are closing our diode fab in Florida and have the following equipment for sale. Please let me know if you might have an interest in any of it. We have: 1.Laminar flow hoods 6' and 8' 2.Thermco diffusion furnaces (4-stack 4303 with 4" and 6" quartz and silicon tubes, 4-stack 4300 with silicon tubes for 4" wafers, 3-stack LPCVD furnace with pumpsand controllers, 3-stack furnace with robot-load system for sintering.) also have a huge lot of quartz Tubes in boxes to go with furnaces 3. Many microscopes 4. Many disco 2H/6T dicing saws 5. Cobilt mask Aligner CA800 and CA400a 6. Solitec single head spinner 7. Headway research 4-head spinners, one newly rebuilt with new motors and controllers, and one with acp201 controllers. 8. Plus much more. Best Regards, David Tibol Sussex Semiconductor, Inc. 12251 Towne Lake Dr Ft Myers, FL 33913 (P) 239-768-6800 (F) 239-768-6868 david at sussexsemiconductor.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From info at fabsurplus.com Tue Mar 29 20:21:50 2011 From: info at fabsurplus.com (Stephen CS Howe) Date: Tue, 29 Mar 2011 19:21:50 -0500 Subject: [labnetwork] diode fab closing In-Reply-To: References: Message-ID: <1301444510.2082.5.camel@samsung.tower> Sir, Thanks for your message. My company specializes in re-selling this kind of surplus equipment. Obviously, it is much easier for us to resell the whole facility, rather than just selected items from the facility. If you can send me a list of the tools in excel, and the overall characteristics of the equipment line in terms of average age of tools, condition, capacity and performance, we would be happy to re-market this equipment for you on a no sale no fee basis. Yours sincerely, Stephen Howe Company Owner SDI Fabsurplus Group +1 830 388 1071 (USA Mobile) +39 335 710 7756 (Italy Mobile) Skype: Stephencshowe e-mail:showe at fabsurplus.com WWW.FABSURPLUS.COM On Mon, 2011-03-28 at 12:00 -0400, David wrote: > Hi, > > > > We are closing our diode fab in Florida and have the following > equipment for sale. Please let me know if you might have an interest > in any of it. > > We have: > > 1.Laminar flow hoods 6? and 8? > > 2.Thermco diffusion furnaces (4-stack 4303 with 4? and 6? quartz and > silicon tubes, 4-stack 4300 with silicon tubes for 4? wafers, 3-stack > LPCVD furnace with pumpsand controllers, 3-stack furnace with > robot-load system for sintering.) also have a huge lot of quartz Tubes > in boxes to go with furnaces > > 3. Many microscopes > > 4. Many disco 2H/6T dicing saws > > 5. Cobilt mask Aligner CA800 and CA400a > > 6. Solitec single head spinner > > 7. Headway research 4-head spinners, one newly rebuilt with new motors > and controllers, and one with acp201 controllers. > > 8. Plus much more. > > Best Regards, > > > > David Tibol > > Sussex Semiconductor, Inc. > > 12251 Towne Lake Dr > > Ft Myers, FL 33913 > > (P) 239-768-6800 (F) 239-768-6868 > > david at sussexsemiconductor.com > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork