From jerry.bowser at nist.gov Wed Aug 8 13:13:44 2012 From: jerry.bowser at nist.gov (Bowser, Jerry) Date: Wed, 8 Aug 2012 13:13:44 -0400 Subject: [labnetwork] Toxic Gas Monitoring Systems Message-ID: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Hello All, I wanted to survey the group for information regarding the type and brands of toxic gas monitoring control systems in use. Here at the CNST, we use various gas sensors (about 55) connected to a custom PLC based system that is just about at capacity. If a gas is detected, the system shuts down gas cabinets, sounds alarms, and alerts our fire department. The major shortfall of the system is that the detection level can be read at the sensor in the detection zone but is not displayed at the control interface. Before we decide on upgrading or replacing our control system, I thought I would see what others are currently using. Thanks for your input. Jerry ******************************************* Jerry Bowser NanoFab Operations Group Center for Nanoscale Science and Technology National Institute of Standards and Technology Phone: (301) 975-8187 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dabunzow at lbl.gov Wed Aug 8 16:51:53 2012 From: dabunzow at lbl.gov (David A. Bunzow) Date: Wed, 08 Aug 2012 13:51:53 -0700 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: <5022D169.506@lbl.gov> Hi Jerry, We have two systems at The Molecular Foundry, an older Honeywell Analytics (about 6-7 years old and a newer system (1-2 years old). They operate similarly to what you describe, except ours can be read remotely in locations immediately outside the lab enclosure where sensor are located, as well as at kiosk-type video panels that allow the FD to see what is in alarm, where its located, and the detection level (the FD likes this since they can make a determination of how to proceed without visiting the detection location). Hope this helps... David A. Bunzow User Facilities Program Manager The Molecular Foundry Materials Science Division Lawrence Berkeley National Laboratory 1 Cyclotron Road MS 67-3207 Berkeley, CA 94720 Office: 510-486-4574 FAX: 510-486-7424 Cell: 510-542-1747 On 8/8/2012 10:13 AM, Bowser, Jerry wrote: > > Hello All, > > I wanted to survey the group for information regarding the type and brands of > toxic gas monitoring control systems in use. > > Here at the CNST, we use various gas sensors (about 55) connected to a custom > PLC based system that is just about at capacity. If a gas is detected, the > system shuts down gas cabinets, sounds alarms, and alerts our fire department. > The major shortfall of the system is that the detection level can be read at > the sensor in the detection zone but is not displayed at the control interface. > > Before we decide on upgrading or replacing our control system, I thought I > would see what others are currently using. Thanks for your input. > > Jerry > > ******************************************* > > Jerry Bowser > > NanoFab Operations Group > > Center for Nanoscale Science and Technology > > National Institute of Standards and Technology > > Phone: (301) 975-8187 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From ds120 at gatech.edu Wed Aug 8 17:07:09 2012 From: ds120 at gatech.edu (Dean Sutter) Date: Wed, 08 Aug 2012 17:07:09 -0400 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: <5022D4FD.1050006@gatech.edu> Hello Jerry, Expect a response from Bob Rose, he handles these types of systems for GT-IEN. Can Bob be added to labnetwork mailing list? "Rose,Robert W" Thanks and Regards, Dean On 8/8/2012 1:13 PM, Bowser, Jerry wrote: > > Hello All, > > I wanted to survey the group for information regarding the type and > brands of toxic gas monitoring control systems in use. > > Here at the CNST, we use various gas sensors (about 55) connected to a > custom PLC based system that is just about at capacity. If a gas is > detected, the system shuts down gas cabinets, sounds alarms, and > alerts our fire department. The major shortfall of the system is that > the detection level can be read at the sensor in the detection zone > but is not displayed at the control interface. > > Before we decide on upgrading or replacing our control system, I > thought I would see what others are currently using. Thanks for your > input. > > Jerry > > ******************************************* > > Jerry Bowser > > NanoFab Operations Group > > Center for Nanoscale Science and Technology > > National Institute of Standards and Technology > > Phone: (301) 975-8187 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Dean A. Sutter Associate Director, Research Operations and Business Development Inst. of Electronics and Nanotechnologies Georgia Institute of Technology dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From tbritton at criticalsystemsinc.com Wed Aug 8 16:45:43 2012 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Wed, 8 Aug 2012 20:45:43 +0000 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EE0D7BA@P3PWEX2MB006.ex2.secureserver.net> Hello Jerry, You should talk with Rizik Michael of IES Engineering (rmichael at iesengineering.net). He offers a very nice gas monitoring package with the sensors and the ability to send the outputs to a central monitoring system that can be viewed remotely. Rizik is part of the labnetwork email group. Best Regards, Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 [cid:image003.png at 01CD7574.75B4ED20] www.criticalsystemsinc.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bowser, Jerry Sent: Wednesday, August 08, 2012 11:14 AM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] Toxic Gas Monitoring Systems Hello All, I wanted to survey the group for information regarding the type and brands of toxic gas monitoring control systems in use. Here at the CNST, we use various gas sensors (about 55) connected to a custom PLC based system that is just about at capacity. If a gas is detected, the system shuts down gas cabinets, sounds alarms, and alerts our fire department. The major shortfall of the system is that the detection level can be read at the sensor in the detection zone but is not displayed at the control interface. Before we decide on upgrading or replacing our control system, I thought I would see what others are currently using. Thanks for your input. Jerry ******************************************* Jerry Bowser NanoFab Operations Group Center for Nanoscale Science and Technology National Institute of Standards and Technology Phone: (301) 975-8187 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 21902 bytes Desc: image003.png URL: From fouad.karouta at anu.edu.au Wed Aug 8 19:45:42 2012 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Thu, 9 Aug 2012 09:45:42 +1000 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: <002e01cd75bf$ec472020$c4d56060$@anu.edu.au> Hi Jerry, At our facility we have gas monitoring using sensors from Bionics (Cl2, BCl3, SiH4, NH3, flammables). All sensors are monitored by a home built monitoring cabinet based on a quite flexible software that we kept adapting to meet our needs. All sensors have two levels of alarm: 1- Alarm 1: just give a warning at the local level (monitoring cabinet) 2- Alarm 2: here we differentiate between sensors in open area towards sensors in exhaust ducting. The open lab sensors will trigger a general alarm: sirens, shutting down all gases, evacuation and alert fire Dept; while the exhaust detectors will initiate shutting down the corresponding gas and the system using it, shutting the exhaust fan plus a local alarm at the monitoring cabinet level/lab. Before taking my actual position in Australia I worked at Technical University Eindhoven where an 800m2 clean room was built in 2000-2002 with also Bionics sensors used to monitor gases like AsH3, PH3, SiH4, NH3, Cl2, flammables. Bionics did deliver a complete system with the interfacing computer that controls all sensors. We get the sensors calibrated twice by representatives of Bionics in Australia. Kind regards, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bowser, Jerry Sent: Thursday, 9 August 2012 3:14 AM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] Toxic Gas Monitoring Systems Hello All, I wanted to survey the group for information regarding the type and brands of toxic gas monitoring control systems in use. Here at the CNST, we use various gas sensors (about 55) connected to a custom PLC based system that is just about at capacity. If a gas is detected, the system shuts down gas cabinets, sounds alarms, and alerts our fire department. The major shortfall of the system is that the detection level can be read at the sensor in the detection zone but is not displayed at the control interface. Before we decide on upgrading or replacing our control system, I thought I would see what others are currently using. Thanks for your input. Jerry ******************************************* Jerry Bowser NanoFab Operations Group Center for Nanoscale Science and Technology National Institute of Standards and Technology Phone: (301) 975-8187 -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Thu Aug 9 03:32:40 2012 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Thu, 9 Aug 2012 17:32:40 +1000 Subject: [labnetwork] Dilution of Triton X-100 Message-ID: <00ec01cd7601$28656170$79302450$@anu.edu.au> Hello all, Recently when discussing with Bill Flounders about adding a surfactant to BHF solution he suggested to use Triton X-100. We like to use it in a diluted form. From internet I could find water, toluene, xylene and ethanol can be used as diluent. However water may turn the solution gelatinous. Does anyone have experience with diluting triton x-100 (supplier Sigma Aldrich)? Thanks, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From kingdc at rpi.edu Thu Aug 9 04:51:56 2012 From: kingdc at rpi.edu (King, Dave) Date: Thu, 9 Aug 2012 08:51:56 +0000 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: RPI switched to Honeywell Analytics sensors a year or so ago, and we are pleased with them. The signals from our sensors go to a control panel of our own design, which can shut down the gases (by cutting off the air to the pneumatic valves) and generate alarms (by sending a signal to the building fire alarm panel) in the event that a sensor reading exceeds its high alarm set point. In the event of an alarm, one of our security cameras also zooms in on the alarm panel display, so that we have the choice of physically going to the panel or viewing it remotely through the camera system. Dave King Rensselaer Polytechnic Institute -------------- next part -------------- An HTML attachment was scrubbed... URL: From sivapenmetsapr at gmail.com Thu Aug 9 07:44:00 2012 From: sivapenmetsapr at gmail.com (Siva Penmetsa) Date: Thu, 9 Aug 2012 07:44:00 -0400 Subject: [labnetwork] CVD Diborane Diffusion Message-ID: Hi All, We are trying to optimise Diborane furnace in a new CVD equipment. We have performed few trials(all the souces are gases) at Temperature 1000 C Diborane Flow rate in the range 40 sccm to 100 sccm Oxygen flow rate 2 SLPM Nitrogen flow rate is 3 SLPM Time 30 minutes Instead of decrese in resistance we observed that the resistance incresed to around 500 ohm/sq from around 50 ohm/sq We apprecite your experience and inputs on how we can resduce the resisitivity with better Diborane diffussion. -- Thanks & Regards, *Siva Prasad Raju Penmetsa* *Senior Facility Technologist* National Nano Fabrication Center *Indian Institute of Science(IISc)* Bangalore, India 560 054 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Aug 9 09:00:06 2012 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 09 Aug 2012 13:00:06 +0000 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: Our existing fab at Draper uses a Honeywell/Vertex system, paper tape. Light tree that trips an evacuation at the Lower limit and a warning at the higher limit. The paper tape systems works just fine, costly because the paper tapes get pricy and need to be changed out. The system was 100% uptime and we never had any false alarms. Monitoring, Silane, Mineral Acids, NH3, Hydrogen. In our new Microfab we are using MSA Trigard, 3 sensors per alarm pack, this pack goes back to a main panel. The panel sets the alarm lights and alerts the safety group. The sensors are easy to change they are cylindrical sensor and 3 sensors run off of 1 pump. TGMS is a very sensitive topic at most places, I suggest that you purchase a turnkey system from a vendor in your area. The systems are very sophisticated and the sensor choice is the most important part. Finally the system integration gets complicated with all the different controllers, sensors, pumps and alarm systems. Since this is a life safety issue it is best left to the experts. Our turnkey system installed was $250K pricey yes but a solid solution. That gives me 27 points split between, Ammonia, hydrides, mineral acids, Silane and Fluorine. Rick Rick Morrison Senior Member Technical Staff Group Leader Microfabrication Operations Draper Laboratory 555 Technology Square Cambridge, MA 02139 W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bowser, Jerry Sent: Wednesday, August 08, 2012 1:14 PM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] Toxic Gas Monitoring Systems Hello All, I wanted to survey the group for information regarding the type and brands of toxic gas monitoring control systems in use. Here at the CNST, we use various gas sensors (about 55) connected to a custom PLC based system that is just about at capacity. If a gas is detected, the system shuts down gas cabinets, sounds alarms, and alerts our fire department. The major shortfall of the system is that the detection level can be read at the sensor in the detection zone but is not displayed at the control interface. Before we decide on upgrading or replacing our control system, I thought I would see what others are currently using. Thanks for your input. Jerry ******************************************* Jerry Bowser NanoFab Operations Group Center for Nanoscale Science and Technology National Institute of Standards and Technology Phone: (301) 975-8187 -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Aug 9 10:56:43 2012 From: shott at stanford.edu (John Shott) Date: Thu, 09 Aug 2012 07:56:43 -0700 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: <5023CFAB.6050604@stanford.edu> Jerry et al: As we have a newly commissioned toxic gas monitoring system here at the Stanford Nanofabrication Facility, let me tell you what we ended up with to complement all of the other good input you are receiving. In February of this year, we replaced an aging system that had about 80 monitored points. Our new system monitors nearly 150 points with gas detectors. Ny guess is that about 125 of those points are monitoring our main shared facility and the remaining 25 are monitoring points in private labs that share our building. In our case, we went with "draw type" sensors. We have 16 channels of paper tape monitoring of hydrides using a DOD Technologies CL-96 unit. The remainder of our sensors are DOD Technologies PS-7 electrochemical sensors that are also draw type sensors. Note: we would have likely only used the PS-7 electrochemical sensors were it not for the fact that we have an epitaxial reactor that uses arsine. To my knowledge, none of the electochemical sensors can reliably detect the 50 ppb PEL level required for arsine gas. We have also added digital input fire eyes in all of our silane cylinders and in our silane VMBs. Note: all of our sensors put out old-fashioned 4-20 mA signals that are monitored by analog input modules in the PLC. I know that there are a number of detectors that have web interfaces, etc., but we chose not to go that route. We do like draw-type sensors: They don't tend to dry out if they are sensing a point in either a high-velocity or high-temperature area. You can look at a non-zero reading without being nearly so close to an actual leak. Being able to cluster a bunch of sensor bodies in one area makes annual live-gas testing easier and allows you to get a better idea if more than one sensor is "smelling" something. Our system is PLC based with inputs going to a GE 3Xi PLC. HMI in our case is provided through a WonderWare interface. Our TGO computer is in the FACP control room which is, we believe, out of harms way in the event of a gas leak. Our fire department always goes there first and is sufficiently well trained that they can get a pretty good idea of what is going on even if none of us is there yet. We also have VPN remote access to the HMI as well as synthesized voice phone dialer and email messaging. The voice and email options provide a listing of the sensor involved and whether it is reporting a fault, warning level, or alarm. All of our sensors are set up to provide a warning signal at about 50% of the alarm level. The warning level does not evacuate the building or call the fire department. In general, even though legal requirements only require alarms in exhausted spaces at 1/2 IDLH, we have all of our alarms set at PEL for several reasons: 1. Dilution in most gas cabinets and exhausted enclosures is high. In many cases it would be quite a large leak to reach 1/2 IDLH in those spaces. 2. If our detectors are set at PEL in exhausted enclosures, we can also use that sensor to monitor the nearby breathing air as any gas outside the enclosure will soon get drawn in to the enclosed space. 3. We'd rather find and deal with a problem as soon as possible. Little leaks seem to have an annoying habit of becoming larger leaks if left unattended. Note: in the same vein, we have also installed 0-1000 ppm hydrogen sensors rather than 0-100% LEL sensors. I recommend early discussions with your Authority Having Jurisdiction. Their interpretation and preferences can have a large bearing on what you may end up with. For example, in our case, Santa Clara county would categorically be opposed to any approach that was not fully designed and stamped by a Registered PE including comparatively minor changes/upgrades to an existing system. While I know that there are a number of examples of very nice in-house designed and built systems ... and, at some level, I envy those that have full control ... that is something that simply wouldn't fly with our AHJ. Good luck, there are a lot of choices and options. You are welcome to contact me should you care for any additional detail. Thanks, John From bob at eecs.berkeley.edu Thu Aug 9 11:07:52 2012 From: bob at eecs.berkeley.edu (Robert M. Hamilton) Date: Thu, 09 Aug 2012 08:07:52 -0700 Subject: [labnetwork] CVD Diborane Diffusion In-Reply-To: References: Message-ID: <5023D248.2000903@eecs.berkeley.edu> Siva Penmetsa, Can you better describe your process, i.e. is it atmospheric or subatmospheric? Have you considered BCl3 in a diluent such as Ar in lieu of diborane? I am not qualified to write about your resistivity issues; however, I have fair experience using diborane in gas jungles and in furnace applications. Diborane is usually diluted in hydrogen (10%, bal. H2 is common) when used as a gas source in semiconductor applications. Diborane is unstable and forms higher order boranes which deposit on the surfaces of gas jungles. This can be problematic with valves and mass flow controller. I have witnessed the issues with regulators and valves, and read discussions about drift in mfc's because of polymerization of diborane within the capillary of the heated gas bypass sensor. Because of this we routinely programmed our recipes to pump diborane from the gas jungle upon completing a process. There's no cost or downside with this precaution. . Because diboranes decompose at high temperatures it can be difficult to maintain uniform dopant distribution within the wafer load. This is even more problematic when diborane is used via an injector tube because of the higher pressure within an injector, the greater surface to volume ratio and that injectors invariably pass through the guard zones of a furnace, which operate at higher temperature than the flat zone. We have obviated diborane for furnace processing and we currently use a 1% BCl3 in Ar for both atmospheric doping and for lpcvd Si/Ge films with good success. Bob Hamilton Robert M. Hamilton Marvel NanoLab University of CA at Berkeley Rm 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu (e-mail preferred) 510-809-8600 510-325-7557 (mobile - emergencies) On 8/9/2012 4:44 AM, Siva Penmetsa wrote: > Hi All, > We are trying to optimise Diborane furnace in a new CVD > equipment. > We have performed few trials(all the souces are gases) at > Temperature 1000 C > Diborane Flow rate in the range 40 sccm to 100 sccm > Oxygen flow rate 2 SLPM > Nitrogen flow rate is 3 SLPM > Time 30 minutes > Instead of decrese in resistance we observed that the > resistance incresed to around 500 ohm/sq from around 50 ohm/sq > We apprecite your experience and inputs on how we can > resduce the resisitivity with better Diborane diffussion. > > -- > Thanks & Regards, > *Siva Prasad Raju Penmetsa* > /Senior Facility Technologist/ > National Nano Fabrication Center > /Indian Institute of Science(IISc)/ > Bangalore, India 560 054 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Aug 9 11:10:07 2012 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 09 Aug 2012 15:10:07 +0000 Subject: [labnetwork] Dilution of Triton X-100 In-Reply-To: <00ec01cd7601$28656170$79302450$@anu.edu.au> References: <00ec01cd7601$28656170$79302450$@anu.edu.au> Message-ID: Here at Draper we dilute it with water, or if you are adding it to the BHF then you want 1% of the total volume to be TritonX-100, just premix it in water and then add that. It takes some time to get the Triton X-100 to mix into the water. Why not just buy the BHF with a surfactant already mixed in. Transene Company can do this for you. Rick Rick Morrison Senior Member Technical Staff Group Leader Microfabrication Operations Draper Laboratory 555 Technology Square Cambridge, MA 02139 W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Fouad Karouta Sent: Thursday, August 09, 2012 3:33 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Dilution of Triton X-100 Hello all, Recently when discussing with Bill Flounders about adding a surfactant to BHF solution he suggested to use Triton X-100. We like to use it in a diluted form. From internet I could find water, toluene, xylene and ethanol can be used as diluent. However water may turn the solution gelatinous. Does anyone have experience with diluting triton x-100 (supplier Sigma Aldrich)? Thanks, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From bernard at mtl.mit.edu Thu Aug 9 15:57:16 2012 From: bernard at mtl.mit.edu (Bernard Alamariu) Date: Thu, 09 Aug 2012 15:57:16 -0400 Subject: [labnetwork] CVD Diborane Diffusion In-Reply-To: References: Message-ID: <5024161C.4050901@mtl.mit.edu> Hi, I think that you use this process to dope Si wafers, correct? Or is it an in-situ doping of some Polysilicon film deposited by CVD, using Silane? In any case you have a concurrent oxidation process with O2 flow at 1000C; during which the Boron "segregates" into the SiO2 grown layer depleting the Si substrate; so when you remove the oxide for 4 point probe the resistivity increases. If it is PolySilicon: the thermal oxidation goes first around the poly grains and high resistance again. I think of trying to deposit the Boron doped source layer at lower temperature and for a short time ( O2 flow still is required for Diborane ) and continue with drive-in at 1000C in Nitrogen only. Then remove the Diborane doped source. Thanks, Bernard On 8/9/12 7:44 AM, Siva Penmetsa wrote: > Hi All, > We are trying to optimise Diborane furnace in a new CVD equipment. > We have performed few trials(all the souces are gases) at > Temperature 1000 C > Diborane Flow rate in the range 40 sccm to 100 sccm > Oxygen flow rate 2 SLPM > Nitrogen flow rate is 3 SLPM > Time 30 minutes > Instead of decrese in resistance we observed that the resistance > incresed to around 500 ohm/sq from around 50 ohm/sq > We apprecite your experience and inputs on how we can resduce the > resisitivity with better Diborane diffussion. > > -- > Thanks & Regards, > *Siva Prasad Raju Penmetsa* > /Senior Facility Technologist/ > National Nano Fabrication Center > /Indian Institute of Science(IISc)/ > Bangalore, India 560 054 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From daniel.woodie at cornell.edu Thu Aug 9 16:04:45 2012 From: daniel.woodie at cornell.edu (Dan Woodie) Date: Thu, 9 Aug 2012 20:04:45 +0000 Subject: [labnetwork] Dilution of Triton X-100 In-Reply-To: <00ec01cd7601$28656170$79302450$@anu.edu.au> References: <00ec01cd7601$28656170$79302450$@anu.edu.au> Message-ID: <1A2C639447BEA24EA19C3A3B7DF59AF9095808A5@MBXD-01.exchange.cornell.edu> Fouad, For work at the Cornell NanoScale Facility, I developed a small drop bottle of diluted Triton X-100 for users to add to any etching solution they wanted to add a surfactant to. The key to success is to remember that with surfactants, a little goes a long way. Trying to determine the proper concentration I came across a publications (sorry I don't have the reference) that showed that the micelle density for the Triton X-100 seemed to plateau at a concentration of about 100 ppm. So, I purchased a small eye dropper style bottle, diluted it with water to the proper amount, and labeled the bottle with directions to add 1 - 2 drops per 100 mL of etching solution to get to the 100 ppm concentration. That way, researchers could chose to have an etchant with surfactant or without, depending on their application, without overfilling our chemical cabinets. We also point to that instead of using IPA for KOH etching due to flammability issues. I didn't do too many tests on it but the comments from the users who tried it were generally favorable. Prior to this, a few users would pour the 100% Triton into the container, usually leaving a layer floating on top of the etchant. Once they dipped their wafers into that mess, the Triton would never come off the substrate or the container. Highly dilute is the key. I hope this helps. Dan Daniel Woodie Safety Manager, College of Engineering From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Fouad Karouta Sent: Thursday, August 09, 2012 3:33 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Dilution of Triton X-100 Hello all, Recently when discussing with Bill Flounders about adding a surfactant to BHF solution he suggested to use Triton X-100. We like to use it in a diluted form. From internet I could find water, toluene, xylene and ethanol can be used as diluent. However water may turn the solution gelatinous. Does anyone have experience with diluting triton x-100 (supplier Sigma Aldrich)? Thanks, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Thu Aug 9 17:04:33 2012 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm) Date: Thu, 9 Aug 2012 17:04:33 -0400 Subject: [labnetwork] Toxic Gas Monitoring Systems In-Reply-To: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> References: <01F47D4EDEEC64488C10B767D15E4858100F89E1A6@MBCLUSTER.xchange.nist.gov> Message-ID: <8F95EA77ACBF904A861E580B44288EFD9C1CB80FBB@FASXCH02.fasmail.priv> Hi Jerry, At Harvard CNS, we have a monitoring system created by Hallam-ICS, using around 90 sensors, a mixture of Midas sensors (allows modestly remote sampling - 10-100 ft depending on gas) and MST sensors (can be made explosion-proof, for use in gas bunker). Both are currently from Honeywell. We have also heard good things about DOD Technologies "Cosmos" sensors. We use 4-20mA current loop output from sensors to the Hallam system. Four levels of alert go to our Siemans building control system, relayed to our University Operations Center, where a "Dialogic" system sends out email and phone alerts. The four levels are for high and low level ambient gas sense events, "enclosure" gas sense events (in exhausted enclosures like gas cabinets, etc), and sensor faults. All gas sense events trigger local or general evacuations, and all ambient gas sense events tie into the building fire alarm system. All sense events also shut off gas cabinets and VMBs (valve manifold boxes) appropriate to the detected gas. Gas sense events of various types, and sensor faults, are communicated through the Hallam system, triggering alarms and alert calls and emails. A bit of system monitoring is also included, which sends out email alerts to the system administrators when other conditions exist which might effect the over-all system functionality, such as network issues between the Hallam TGMS and the Siemans system, horns or strobes turned off for testing or maintenance, network issues within the Hallam system, connection status between the TGMS and the fire alarm system, etc. The Hallam system (the "TGMS") is able to store a lot of log data, and show graphical traces of all monitored signals. It also allows us to go back and check times and details on any "events", viewed on touch-screen monitoring terminals called SCADAs. Hallam's most recent revision of their software includes the ability to choose different vendors' sensors, with each sensor point being individually configurable. We have a separate "Remote Monitoring" PC which mirrors the TGMS monitoring "SCADA" nodes, which PC we can access from off-site via Remote Desktop Connection in Windows. We have a company called EERC come up every 4 months to do response "bump" testing. So far, it all seems to work pretty well. Mac Hathaway Senior Process Engineer TGMS Administrator Harvard CNS 617-495-9012 _______________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] On Behalf Of Bowser, Jerry [jerry.bowser at nist.gov] Sent: Wednesday, August 08, 2012 1:13 PM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] Toxic Gas Monitoring Systems Hello All, I wanted to survey the group for information regarding the type and brands of toxic gas monitoring control systems in use. Here at the CNST, we use various gas sensors (about 55) connected to a custom PLC based system that is just about at capacity. If a gas is detected, the system shuts down gas cabinets, sounds alarms, and alerts our fire department. The major shortfall of the system is that the detection level can be read at the sensor in the detection zone but is not displayed at the control interface. Before we decide on upgrading or replacing our control system, I thought I would see what others are currently using. Thanks for your input. Jerry ******************************************* Jerry Bowser NanoFab Operations Group Center for Nanoscale Science and Technology National Institute of Standards and Technology Phone: (301) 975-8187 From michael.whitley at engeniusmicro.com Thu Aug 9 17:44:12 2012 From: michael.whitley at engeniusmicro.com (Michael Whitley) Date: Thu, 9 Aug 2012 16:44:12 -0500 Subject: [labnetwork] Critical Point Dryer Problem Message-ID: We've been having an on-going problem with our Tousimis Autosamdri 815B, Series B critical point dryer. We are able to successfully run 1cm die though the system, but 100mm wafers come with parts stuck, contaminated and sometimes there are still liquid drops left on top of the water. We have shipped the system back to Tousimis and it checked out OK at their facility. We have replaced the following filters and parts: - Internal Pre- Fill 0.5um Particulate Filter - Internal Post-Fill 0.5um Particulate Filter - 0.5um Purge Line Filter Element - LCO2 Oil/Water Filter Element on LCO2 Filter Assembly, Gasket & O-Ring - 0.5um Particulate Filter in T-Filter Element on LCO2 Filter Assembly - High Pressure 10ft hose changed out with 5ft hose for Chamber LCO2 Supply Only (New Cylinder) - Chamber O-Ring - Wafer basket and rings And we have used the following solvents in the chamber: - 2-Propanol Optima LC/MS, 99.9% - Fisher Scientific (Note: packaged under Nitrogen, 0.2 micron filtered) - Ethanol - ?99.5%, anhydrous (200 proof) - Sigma Aldrich *Note: Both of the alcohols above have been further filtered manually with a 0.2um filter prior to processing. After all of this we are still getting wet wafers and stuck parts. I was hoping someone might have a suggestion on something else to try. Best Regards, Michael -- Michael R. Whitley, PE Vice President of Engineering | EngeniusMicro, LLC 107 Jefferson Street N, Huntsville, AL 35801 256-261-1260x124 | michael.whitley at engeniusmicro.com From shott at stanford.edu Thu Aug 9 20:09:19 2012 From: shott at stanford.edu (John Shott) Date: Thu, 09 Aug 2012 17:09:19 -0700 Subject: [labnetwork] CVD Diborane Diffusion In-Reply-To: References: Message-ID: <5024512F.40309@stanford.edu> On 8/9/2012 4:44 AM, Siva Penmetsa wrote: You are talking about an atmospheric pressure pre-deposition correct? While it's been many, many years, we used to use diborane as a predeposition source and my failing memory recalls that we would expect a sheet resistance of about 45-50 ohms/square following a 30 minute predep at 1000 degrees C prior to drive in. I trust that you are actually using fairly dilute diborane in a carrier gas, correct? What is the diborane concentration of your source gas and what is the carrier gas? While my recommendations might vary somewhat depending on those answers, one thing jumps off the page at me when I read your process details: 2 SLPM of oxygen is a very large flow oxygen when your total flow is about 5 SLPM. While you need enough oxygen to fully oxidize the amount of diborane injected to convert it into B2O3 ... which is ultimately what does the doping, too much oxygen is a bad thing because it creates an ever increasing oxide layer at the silicon surface that tends to isolate the B2O3 layer (that is deposited on top of that oxidizing surface) from the silicon surface. I believe that it is likely that you would see lower sheet resistance and better reproducibility if you lowered your oxygen flow significantly .... while I can't quite recall details from my youth, I'm guessing that an oxygen flow of 100-200 SCCM is probably a lot closer to where you want to be to fully oxidize the diborane but not have such a high concentration of oxygen that the thermally grown oxide prevents the glassy B2O3 layer from doping your silicon surface. You need to look carefully at how much diborane you are actually flowing at various flow conditions .... assuming that you are using a comparatively low concentration of diborane. As I recall, for example, we used to use something on the order of 1000 ppm diborane in nitrogen as our source .... certainly well less than 1%. If you are using a comparable concentration, it only takes a few SCCM of oxygen to fully oxidize your diborane. Rather than adjusting diborane flow, I'd fix your diborane flow at 40 SCCM and then back down your oxygen flow significantly. I suspect that you'll see lower sheet resistance and better reproducibility because the oxidation of the silicon surface will no longer be "winning". This is all from many years ago from someone whose memory is not that great, but that is where I would start. Good luck, John > Hi All, > We are trying to optimise Diborane furnace in a new CVD equipment. > We have performed few trials(all the souces are gases) at > Temperature 1000 C > Diborane Flow rate in the range 40 sccm to 100 sccm > Oxygen flow rate 2 SLPM > Nitrogen flow rate is 3 SLPM > Time 30 minutes > Instead of decrese in resistance we observed that the resistance > incresed to around 500 ohm/sq from around 50 ohm/sq > We apprecite your experience and inputs on how we can resduce the > resisitivity with better Diborane diffussion. > > -- > Thanks & Regards, > *Siva Prasad Raju Penmetsa* > /Senior Facility Technologist/ > National Nano Fabrication Center > /Indian Institute of Science(IISc)/ > Bangalore, India 560 054 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ytousimis at tousimis.com Fri Aug 10 01:03:41 2012 From: ytousimis at tousimis.com (Yianni Tousimis) Date: Thu, 9 Aug 2012 22:03:41 -0700 Subject: [labnetwork] Critical Point Dryer Problem In-Reply-To: References: Message-ID: <145e01cd76b5$84776df0$8d6649d0$@com> Hello Michael- Here's some advice regarding your key points: 1. Residual Water If there is any residual water remaining in the process chamber your design on the wafer may require additional dehydration baths and/or increasing the time in the bath so that you can be sure that all of the H20 molecules bond sufficiently with the alcohol. Please note that if there any residual H20 molecules in your substrate prior to going into the process chamber that regardless of how long you PURGE (exchange) the alcohol for LCO2 the H20 will never be removed as LCO2 is not miscible with H20. Therefore; any residual H20 will not go thru the CO2 critical point whose minimum pressure/temp. requirements is 1072psi/31C. The critical point for H20 is significantly higher which means that anywhere on the substrate that has H20 remaining during the process will not go thru critical point and will result in stiction. 2. Residual Alcohol Should you have any residual alcohol remaining in the process chamber that is either a result of 1 of 3 main things: a) Insufficient PURGE time b) Insufficient flow (typically due to incorrect metering valve flow adjustments) c) Flow blockage (typically due to break away debris clogging the immediate 0.5um PURGE filter) and should be changed out for a fresh one. 3. Contamination This is a complex question that typically requires complete examination starting from the system environment, handling techniques and careful review of the entire pre-CPD wet process steps to see if there is a possibility of chemical reactions occurring, etc. It's good to see that you use high purity alcohol and take the time to filter it down to 0.2um. I hope that you find some of the above information insightful. Please feel free to contact me direct for a more detailed conversation to better assist you. Best Regards- Yianni Tousimis Tel.# 301.881.2450 Fax.# 301.881.5374 Cell # 443.254.5423 ...innovation and quality... www.tousimis.com CONFIDENTIALITY NOTICE: This e-mail transmission, and any documents, files or previous e-mail messages attached to it, may contain confidential information that is legally privileged. If you are not the intended recipient, or a person responsible for delivering it to the intended recipient, you are hereby notified that any disclosure, copying, distribution or use of any of the information contained in or attached to this message is STRICTLY PROHIBITED. If you have received this transmission in error, please immediately notify us by reply e-mail at ytousimis at tousimis.com or by telephone at (301) 881-2450, and destroy the original transmission and its attachments without reading them or saving them to any memory device. Thank you. -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Whitley Sent: Thursday, August 09, 2012 2:44 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Critical Point Dryer Problem We've been having an on-going problem with our Tousimis Autosamdri 815B, Series B critical point dryer. We are able to successfully run 1cm die though the system, but 100mm wafers come with parts stuck, contaminated and sometimes there are still liquid drops left on top of the water. We have shipped the system back to Tousimis and it checked out OK at their facility. We have replaced the following filters and parts: - Internal Pre- Fill 0.5um Particulate Filter - Internal Post-Fill 0.5um Particulate Filter - 0.5um Purge Line Filter Element - LCO2 Oil/Water Filter Element on LCO2 Filter Assembly, Gasket & O-Ring - 0.5um Particulate Filter in T-Filter Element on LCO2 Filter Assembly - High Pressure 10ft hose changed out with 5ft hose for Chamber LCO2 Supply Only (New Cylinder) - Chamber O-Ring - Wafer basket and rings And we have used the following solvents in the chamber: - 2-Propanol Optima LC/MS, 99.9% - Fisher Scientific (Note: packaged under Nitrogen, 0.2 micron filtered) - Ethanol - ?99.5%, anhydrous (200 proof) - Sigma Aldrich *Note: Both of the alcohols above have been further filtered manually with a 0.2um filter prior to processing. After all of this we are still getting wet wafers and stuck parts. I was hoping someone might have a suggestion on something else to try. Best Regards, Michael -- Michael R. Whitley, PE Vice President of Engineering | EngeniusMicro, LLC 107 Jefferson Street N, Huntsville, AL 35801 256-261-1260x124 | michael.whitley at engeniusmicro.com _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From sivapenmetsapr at gmail.com Fri Aug 10 01:33:46 2012 From: sivapenmetsapr at gmail.com (Siva Penmetsa) Date: Fri, 10 Aug 2012 01:33:46 -0400 Subject: [labnetwork] CVD Diborane Diffusion In-Reply-To: References: Message-ID: Hi All, We do the process in Horizontal Hot Wall Atmospheric CVD using Single Crystal N Type Silicon wafer The gas used for Boron diffusion is 1% Diborane in Argon We use Nitrogen as the carrier gas. I sincerely thank you for the inputs from Labnewtwork. Thanks & Regards, *Siva Prasad Raju Penmetsa* *Senior Facility Technologist* National Nano Fabrication Center *Indian Institute of Science(IISc)* Bangalore, India 560 054 On Thu, Aug 9, 2012 at 7:44 AM, Siva Penmetsa wrote: > Hi All, > > We are trying to optimise Diborane furnace in a new CVD equipment. > > We have performed few trials(all the souces are gases) at > > Temperature 1000 C > Diborane Flow rate in the range 40 sccm to 100 sccm > Oxygen flow rate 2 SLPM > Nitrogen flow rate is 3 SLPM > Time 30 minutes > > Instead of decrese in resistance we observed that the resistance incresed > to around 500 ohm/sq from around 50 ohm/sq > > We apprecite your experience and inputs on how we can resduce the > resisitivity with better Diborane diffussion. > > -- > Thanks & Regards, > *Siva Prasad Raju Penmetsa* > *Senior Facility Technologist* > National Nano Fabrication Center > *Indian Institute of Science(IISc)* > Bangalore, India 560 054 > > > -- -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Fri Aug 10 17:06:38 2012 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Fri, 10 Aug 2012 21:06:38 +0000 Subject: [labnetwork] Dilution of Triton X-100 In-Reply-To: References: <00ec01cd7601$28656170$79302450$@anu.edu.au> Message-ID: We purchase both, BHF with and without surfactant pre-mixed in it. Cheers! Julia Aebersold, Ph.D. MNTC Cleanroom Manager Shumaker Research Building, Room 233 2210 South Brook Street University of Louisville Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr. Sent: Thursday, August 09, 2012 11:10 AM To: Fouad Karouta; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dilution of Triton X-100 Here at Draper we dilute it with water, or if you are adding it to the BHF then you want 1% of the total volume to be TritonX-100, just premix it in water and then add that. It takes some time to get the Triton X-100 to mix into the water. Why not just buy the BHF with a surfactant already mixed in. Transene Company can do this for you. Rick Rick Morrison Senior Member Technical Staff Group Leader Microfabrication Operations Draper Laboratory 555 Technology Square Cambridge, MA 02139 W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Fouad Karouta Sent: Thursday, August 09, 2012 3:33 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Dilution of Triton X-100 Hello all, Recently when discussing with Bill Flounders about adding a surfactant to BHF solution he suggested to use Triton X-100. We like to use it in a diluted form. From internet I could find water, toluene, xylene and ethanol can be used as diluent. However water may turn the solution gelatinous. Does anyone have experience with diluting triton x-100 (supplier Sigma Aldrich)? Thanks, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Tue Aug 21 08:33:05 2012 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas) Date: Tue, 21 Aug 2012 12:33:05 +0000 Subject: [labnetwork] staffing Message-ID: We (UMass Lowell) have been fortunate enough to purchase some equipment for our 4200 (1450 is chase) square foot clean room opening October 11th. (It will take most of the fall for delivery and fit up) Now that I have equipment on the way (Including a Raith 150two), I need to justify hiring a dedicated photo lithography engineer. It would be helpful to get a read on square footage to staffing number. If you could fill out the table (overwriting my input and forward it back) it would provide a great data point for us! (one which I will share once compiled) I'm not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. Staffing Survey Input Comment University U Mass Lowell Clean Room Square Footage 4200 clean room envelope Management 1 Engineers 1 IT Staff 0 Technicians 0 As always opinions and comments are welcome Best Regards Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: From len.olona at ou.edu Tue Aug 21 12:42:53 2012 From: len.olona at ou.edu (Olona, Leonard E.) Date: Tue, 21 Aug 2012 16:42:53 +0000 Subject: [labnetwork] staffing In-Reply-To: Message-ID: Hi Tomas, Here at OU we have the following. Staffing Survey Input Comment University Oklahoma Class 10000 / Class 1000 Litho Clean Room Square Footage 3500 clean room envelope Management 1 Engineers 1 IT Staff 0 Technicians 0 I hope this helps, Len Leonard E. Olona University of Oklahoma ECE Cleanroom Manager School of Electrical and Computer Engineering 110 West Boyd St. Norman, Oklahoma Zip 73019 O/ (405) 325-4374 C/ (405) 630-9068 Email len.olona at ou.edu From: , Thomas > Date: Tuesday, August 21, 2012 7:33 AM To: "labnetwork at mtl.mit.edu" >, "Ferraguto, Thomas" > Subject: [labnetwork] staffing We (UMass Lowell) have been fortunate enough to purchase some equipment for our 4200 (1450 is chase) square foot clean room opening October 11th. (It will take most of the fall for delivery and fit up) Now that I have equipment on the way (Including a Raith 150two), I need to justify hiring a dedicated photo lithography engineer. It would be helpful to get a read on square footage to staffing number. If you could fill out the table (overwriting my input and forward it back) it would provide a great data point for us! (one which I will share once compiled) I?m not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. Staffing Survey Input Comment University U Mass Lowell Clean Room Square Footage 4200 clean room envelope Management 1 Engineers 1 IT Staff 0 Technicians 0 As always opinions and comments are welcome Best Regards Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at seas.upenn.edu Tue Aug 21 12:49:47 2012 From: codreanu at seas.upenn.edu (Iulian Codreanu) Date: Tue, 21 Aug 2012 12:49:47 -0400 Subject: [labnetwork] staffing In-Reply-To: References: Message-ID: <5033BC2B.9060907@seas.upenn.edu> Thomas, Dennis Grimard at Michigan has done a marvelous job at collecting all sorts of data from well established University fabs. I used the one he presented at the 2010 UGIM it to come up with all sorts of metrics (staff/sqft, staff/tools, staff/users, etc) to make my points here at Penn. Iulian --- iulian Codreanu, Ph.D. Director, Penn NanoFab 200 South 33rd Street Room 376 GRW Bldg Philadelphia, PA 19104-6314 P: 215-898-9308 F: 215-573-2068 www.seas.upenn.edu/~nanofab On 8/21/2012 8:33 AM, Ferraguto, Thomas wrote: > We (UMass Lowell) have been fortunate enough to purchase some equipment > for our 4200 (1450 is chase) square foot clean room opening October > 11^th . (It will take most of the fall for delivery and fit up) > > Now that I have equipment on the way (Including a Raith 150two), I need > to justify hiring a dedicated photo lithography engineer. > > It would be helpful to get a read on square footage to staffing number. > If you could fill out the table (overwriting my input and forward it > back) it would provide a great data point for us! (one which I will > share once compiled) > > I?m not including facilities support staff, i.e. HVAC, electrical etc. > This is dedicated clean room staff to train users and maintain equipment. > > *Staffing Survey* > > > > Input > > > > Comment > > University > > > > U Mass Lowell > > > > Clean Room Square Footage > > > > 4200 > > > > clean room envelope > > Management > > > > 1 > > > > Engineers > > > > 1 > > > > IT Staff > > > > 0 > > > > Technicians > > > > 0 > > > > As always opinions and comments are welcome > > Best Regards > > Thomas S. Ferraguto > > ETIC Clean Room Director > > University of Massachusetts Lowell > > 600 Suffolk Street 456C > > Lowell MA 01854-5120 > > 978-934-1809 land > > 617-755-0910 mobile > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > From mheiden at engr.ucr.edu Tue Aug 21 16:39:07 2012 From: mheiden at engr.ucr.edu (Mark Heiden) Date: Tue, 21 Aug 2012 13:39:07 -0700 Subject: [labnetwork] FW: staffing In-Reply-To: References: Message-ID: <004501cd7fdd$02ff05e0$08fd11a0$@engr.ucr.edu> From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ferraguto, Thomas Sent: Tuesday, August 21, 2012 5:33 AM To: labnetwork at mtl.mit.edu; Ferraguto, Thomas Subject: [labnetwork] staffing We (UMass Lowell) have been fortunate enough to purchase some equipment for our 4200 (1450 is chase) square foot clean room opening October 11th. (It will take most of the fall for delivery and fit up) Now that I have equipment on the way (Including a Raith 150two), I need to justify hiring a dedicated photo lithography engineer. It would be helpful to get a read on square footage to staffing number. If you could fill out the table (overwriting my input and forward it back) it would provide a great data point for us! (one which I will share once compiled) I'm not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. Staffing Survey Input Comment University UC Riverside Clean Room Square Footage 2,000 clean room envelope Management 1 Engineers 3 IT Staff 0 Technicians 0 As always opinions and comments are welcome Best Regards Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- An embedded and charset-unspecified text was scrubbed... Name: Untitled attachment 00063.txt URL: From kevin.walsh at louisville.edu Tue Aug 21 17:51:33 2012 From: kevin.walsh at louisville.edu (Walsh,Kevin M.) Date: Tue, 21 Aug 2012 21:51:33 +0000 Subject: [labnetwork] writing board in cleanroom? Message-ID: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> Does anyone have a suggestion for a chalkless whiteboard or some other type of large writing board for teaching classes and labs in the cleanroom? What do other university cleanrooms do? Thanks in advance, Kevin Dr. Kevin M. Walsh Samuel T. Fife Professor of Electrical and Computer Engineering Founding Director of the UofL Micro/Nanotechnology Center University of Louisville BRB Building, Room 234 2210 S. Brook St Louisville, KY 40292 (502) 852-0826 office (502) 852-8128 fax walsh at louisville.edu or walsh at ieee.org www.louisville.edu /micronano -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Tue Aug 21 19:22:48 2012 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Wed, 22 Aug 2012 09:22:48 +1000 Subject: [labnetwork] staffing In-Reply-To: References: Message-ID: <002901cd7ff3$e0c06ca0$a24145e0$@anu.edu.au> Hi Thomas, The question depends how the lab is organised and kind and number of equipment. I don't understand the relation of the HVAC staff (how many?) to the lab management. To my opinion only two staff for 4200sqf lab is by far not sufficient. At ANU we have about 1200sqf labs with 7 major equipment and a few small equipment and the staffing is: I'm not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. I have the impression your facility is oppositely organized than the Marvel Nanolab with equipment owner/responsible at your lab who report to their own professor. Staffing Survey Input Comment University ANFF ACT Node (ANU) Labs Square Footage 1200 600 sqf is CR 1000 Management 1 fte Engineers 3.5 fte IT Staff 0 Gets school support when needed Technicians 1 fte Admin 0.5 fte Kind regards, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From len.olona at gmail.com Tue Aug 21 20:02:21 2012 From: len.olona at gmail.com (Len Olona) Date: Tue, 21 Aug 2012 19:02:21 -0500 Subject: [labnetwork] writing board in cleanroom? In-Reply-To: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> References: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> Message-ID: <3028CBD8-F304-4156-B8E7-8ECBB247568B@ou.edu> Kevin, We have an area where our grad and post docs reside. It leads into the entrance hallway of the gowning area. That is where we positioned our large white board. I use it to post the most recent status of the cleanroom toolsets, facilities, IT and etc.. It works for us. We also mounted an IPad for equipment scheduling. Within this iPad is an area for free exchange information. Hope this helps. Len OU Cleanroom Manager 405 325-4374 On Aug 21, 2012, at 4:51 PM, "Walsh,Kevin M." wrote: > Does anyone have a suggestion for a chalkless whiteboard or some other type of large writing board for teaching classes and labs in the cleanroom? What do other university cleanrooms do? > > Thanks in advance, > Kevin > > Dr. Kevin M. Walsh > Samuel T. Fife Professor of Electrical and Computer Engineering > Founding Director of the UofL Micro/Nanotechnology Center > University of Louisville > BRB Building, Room 234 > 2210 S. Brook St > Louisville, KY 40292 > (502) 852-0826 office > (502) 852-8128 fax > walsh at louisville.edu or walsh at ieee.org > www.louisville.edu /micronano > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From ytousimis at tousimis.com Tue Aug 21 20:04:03 2012 From: ytousimis at tousimis.com (Yianni Tousimis) Date: Tue, 21 Aug 2012 17:04:03 -0700 Subject: [labnetwork] writing board in cleanroom? In-Reply-To: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> References: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> Message-ID: <073901cd7ff9$a61e24b0$f25a6e10$@com> Hi Kevin- I have never seen these used in a cleanroom. I've seen them in some elementary schools; however, I think they would do the trick.. they're called Smart Boards: http://smarttech.com/smartboard You can project images, write with what I believe is a MEMS based stylus, etc.very clever boards. Best Regards- Yianni Tel.# 301.881.2450 Fax.# 301.881.5374 Cell # 443.254.5423 2012 Microscopyy Today Innovation Award Winner for 931 Autosamdri CPD System ...innovation and quality... www.tousimis.com CONFIDENTIALITY NOTICE: This e-mail transmission, and any documents, files or previous e-mail messages attached to it, may contain confidential information that is legally privileged. If you are not the intended recipient, or a person responsible for delivering it to the intended recipient, you are hereby notified that any disclosure, copying, distribution or use of any of the information contained in or attached to this message is STRICTLY PROHIBITED. If you have received this transmission in error, please immediately notify us by reply e-mail at ytousimis at tousimis.com or by telephone at (301) 881-2450, and destroy the original transmission and its attachments without reading them or saving them to any memory device. Thank you. From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Walsh,Kevin M. Sent: Tuesday, August 21, 2012 2:52 PM To: labnetwork at mtl.mit.edu Cc: Walsh,Kevin M. Subject: [labnetwork] writing board in cleanroom? Does anyone have a suggestion for a chalkless whiteboard or some other type of large writing board for teaching classes and labs in the cleanroom? What do other university cleanrooms do? Thanks in advance, Kevin Dr. Kevin M. Walsh Samuel T. Fife Professor of Electrical and Computer Engineering Founding Director of the UofL Micro/Nanotechnology Center University of Louisville BRB Building, Room 234 2210 S. Brook St Louisville, KY 40292 (502) 852-0826 office (502) 852-8128 fax walsh at louisville.edu or walsh at ieee.org www.louisville.edu /micronano -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Tue Aug 21 20:23:50 2012 From: mtang at stanford.edu (Mary Tang) Date: Tue, 21 Aug 2012 17:23:50 -0700 Subject: [labnetwork] writing board in cleanroom? In-Reply-To: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> References: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> Message-ID: <50342696.5030403@stanford.edu> Hi Kevin -- Magnadoodles, the kids' toy. I've often thought about bringing some in to try out, but haven't gotten around to it and my need faded away. I'd since learned there's a professional version made for cleanrooms called a "chalkless board", but haven't seen these available in the US. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu On 8/21/2012 2:51 PM, Walsh,Kevin M. wrote: > > Does anyone have a suggestion for a chalkless whiteboard or some other > type of large writing board for teaching classes and labs in the > cleanroom? What do other university cleanrooms do? > > Thanks in advance, > > Kevin > > Dr. Kevin M. Walsh > Samuel T. Fife Professor of Electrical and Computer Engineering > Founding Director of the UofL Micro/Nanotechnology Center > University of Louisville > BRB Building, Room 234 > 2210 S. Brook St > Louisville, KY 40292 > (502) 852-0826 office > (502) 852-8128 fax > walsh at louisville.edu or walsh at ieee.org > > www.louisville.edu /micronano > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From jhub at danchip.dtu.dk Wed Aug 22 01:59:28 2012 From: jhub at danchip.dtu.dk (=?iso-8859-1?Q?J=F6rg_H=FCbner?=) Date: Wed, 22 Aug 2012 07:59:28 +0200 Subject: [labnetwork] FW: staffing In-Reply-To: <004501cd7fdd$02ff05e0$08fd11a0$@engr.ucr.edu> References: <004501cd7fdd$02ff05e0$08fd11a0$@engr.ucr.edu> Message-ID: <39838FA4BF2F9A43AE3918CAD0F6AF171866EDC96A@WINEXCHANGE3.win.dtu.dk> Hi Here is our staffing, it will seem quite high but being the only cleanroom in Denmark that allows small scale production we have to be a bit of both, academic learning environment, research and development and small scale production facility (that's also why we have chosen to be ISO 9001 certified). All training and service is carried out be Danchip personnel, no user peer training is allowed. Staffing Survey Input Comment University DTU Danchip, Technical University of Denmark Clean Room Square Footage 14000 Management 4 Including facility management Engineers 10 offer small scale production /process development to our customers IT Staff 1 Also QA/QC manager (ISO certified) Technicians 10 offer small scale production to our customers Best Regards Jorg J?rg H?bner Director DTU Danchip National Center for Micro- and Nanofabrication Technical University of Denmark [cid:image001.gif at 01CD803C.0E14CE10] Danchip ?rstedsPlads Building 347 2800 Kgs Lyngby Direct +45 4525 5762 jhub at danchip.dtu.dk www.danchip.dtu.dk From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mark Heiden Sent: 21. august 2012 22:39 To: labnetwork at mtl.mit.edu; 'Ferraguto, Thomas' Subject: [labnetwork] FW: staffing From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ferraguto, Thomas Sent: Tuesday, August 21, 2012 5:33 AM To: labnetwork at mtl.mit.edu; Ferraguto, Thomas Subject: [labnetwork] staffing We (UMass Lowell) have been fortunate enough to purchase some equipment for our 4200 (1450 is chase) square foot clean room opening October 11th. (It will take most of the fall for delivery and fit up) Now that I have equipment on the way (Including a Raith 150two), I need to justify hiring a dedicated photo lithography engineer. It would be helpful to get a read on square footage to staffing number. If you could fill out the table (overwriting my input and forward it back) it would provide a great data point for us! (one which I will share once compiled) I'm not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. As always opinions and comments are welcome Best Regards Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From jrweaver at purdue.edu Wed Aug 22 08:52:03 2012 From: jrweaver at purdue.edu (Weaver, John R) Date: Wed, 22 Aug 2012 08:52:03 -0400 Subject: [labnetwork] writing board in cleanroom? In-Reply-To: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> References: <0D1ABD6DF2541B42A05BD6E6D369541132F467B2@EXMBX03.ad.louisville.edu> Message-ID: <18AD986E445FE847B2A80B53E65704EDCB7ED17CA5@VPEXCH02.purdue.lcl> Kevin - I have had success using a whiteboard in the cleanroom with a grease pencil rather than dry-mark markers. You simply clean the white board with an isopropyl alcohol solution on a cleanroom wiper. You don't end up with the incredible number of particles present if you use a conventional marker. That said, I have located the white board some distance from critical processes. John John R. Weaver Facility Manager Birck Nanotechnology Center Purdue University (765) 494-5494 jrweaver at purdue.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Walsh,Kevin M. Sent: Tuesday, August 21, 2012 5:52 PM To: labnetwork at mtl.mit.edu Cc: Walsh,Kevin M. Subject: [labnetwork] writing board in cleanroom? Does anyone have a suggestion for a chalkless whiteboard or some other type of large writing board for teaching classes and labs in the cleanroom? What do other university cleanrooms do? Thanks in advance, Kevin Dr. Kevin M. Walsh Samuel T. Fife Professor of Electrical and Computer Engineering Founding Director of the UofL Micro/Nanotechnology Center University of Louisville BRB Building, Room 234 2210 S. Brook St Louisville, KY 40292 (502) 852-0826 office (502) 852-8128 fax walsh at louisville.edu or walsh at ieee.org www.louisville.edu /micronano -------------- next part -------------- An HTML attachment was scrubbed... URL: From ds120 at gatech.edu Wed Aug 22 10:09:51 2012 From: ds120 at gatech.edu (Dean Sutter) Date: Wed, 22 Aug 2012 10:09:51 -0400 Subject: [labnetwork] FW: staffing In-Reply-To: <39838FA4BF2F9A43AE3918CAD0F6AF171866EDC96A@WINEXCHANGE3.win.dtu.dk> References: <004501cd7fdd$02ff05e0$08fd11a0$@engr.ucr.edu> <39838FA4BF2F9A43AE3918CAD0F6AF171866EDC96A@WINEXCHANGE3.win.dtu.dk> Message-ID: <5034E82F.10205@gatech.edu> On 8/22/2012 1:59 AM, J?rg H?bner wrote: > > Hi > > Here is a snapshot at our staffing and size based on most recent > organizational changes. We provide both, academic learning > environment, research and development. Providing EHS, tools training, > and process training. Additionally, we provide advanced consulting > services and work for hire services. We cover typical and advanced > semiconductor type fab processes, advanced > packaging/assembly/reliability testing, high freq. characterization, > and E/M Imaging and Characterization. > > *Staffing Survey* > > > > Input > > > > Comment > > University > > > > Georgia Tech > > > > Clean Room Square Footage > > > > 35000 +/- in 3 separate buildings > > > > Management > > > > 3 > > > > > Including facility and 2 building management > > Engineers > > > > 6.5 (Ph'd/MS) > > > > > offer small scale production /process development to our customers > > IT Staff > > > > 3 Full Time/3 Students > > > > > 1 prgmr, 1 IT mgr, 1 controls sys eng. Provides 2 building network + > occupant, 3 cleanroom + 173 major tools supported by in-house > automated sched/billing system > > Technicians/Cleanroom Ops Eng. > > > > 17+ 20FTE Student Assist. > > > > provides orientation, tool training, tool and support sys maint(DI, > Haz. Alarm Sys, etc) maintenance, user process support, limited > fabrication > > > Best Regards > > Dean > > *From:*labnetwork-bounces at mtl.mit.edu > > [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Ferraguto, Thomas > *Sent:* Tuesday, August 21, 2012 5:33 AM > *To:* labnetwork at mtl.mit.edu ; > Ferraguto, Thomas > *Subject:* [labnetwork] staffing > > We (UMass Lowell) have been fortunate enough to purchase some > equipment for our 4200 (1450 is chase) square foot clean room opening > October 11^th . (It will take most of the fall for delivery and fit up) > > Now that I have equipment on the way (Including a Raith 150two), I > need to justify hiring a dedicated photo lithography engineer. > > It would be helpful to get a read on square footage to staffing > number. If you could fill out the table (overwriting my input and > forward it back) it would provide a great data point for us! (one > which I will share once compiled) > > I'm not including facilities support staff, i.e. HVAC, electrical etc. > This is dedicated clean room staff to train users and maintain equipment. > > As always opinions and comments are welcome > > Best Regards > > Thomas S. Ferraguto > > ETIC Clean Room Director > > University of Massachusetts Lowell > > 600 Suffolk Street 456C > > Lowell MA 01854-5120 > > 978-934-1809 land > > 617-755-0910 mobile > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Dean A. Sutter Associate Director, Research Operations and Business Development Inst. of Electronics and Nanotechnologies Georgia Institute of Technology dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From kevin.walsh at louisville.edu Wed Aug 22 11:26:04 2012 From: kevin.walsh at louisville.edu (Walsh,Kevin M.) Date: Wed, 22 Aug 2012 15:26:04 +0000 Subject: [labnetwork] FW: staffing In-Reply-To: <39838FA4BF2F9A43AE3918CAD0F6AF171866EDC96A@WINEXCHANGE3.win.dtu.dk> References: <004501cd7fdd$02ff05e0$08fd11a0$@engr.ucr.edu> <39838FA4BF2F9A43AE3918CAD0F6AF171866EDC96A@WINEXCHANGE3.win.dtu.dk> Message-ID: <0D1ABD6DF2541B42A05BD6E6D369541132F470D6@EXMBX03.ad.louisville.edu> Here is UofL's. Forgot to copy the group. This is all good stuff. kw From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ferraguto, Thomas Sent: Tuesday, August 21, 2012 8:33 AM To: labnetwork at mtl.mit.edu; Ferraguto, Thomas Subject: [labnetwork] staffing We (UMass Lowell) have been fortunate enough to purchase some equipment for our 4200 (1450 is chase) square foot clean room opening October 11th. (It will take most of the fall for delivery and fit up) Now that I have equipment on the way (Including a Raith 150two), I need to justify hiring a dedicated photo lithography engineer. It would be helpful to get a read on square footage to staffing number. If you could fill out the table (overwriting my input and forward it back) it would provide a great data point for us! (one which I will share once compiled) I'm not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. Staffing Survey Input Comment University U Louisville Clean Room Square Footage 5600 10,000 sq ft total but about 6,000 is usable (in the 7 bays). Remainder is in chases and support areas. Management 1 cleanroom mgr (Julia Aebersold, PhD) and 1 unit business manager (accounting background) Dr. Walsh serves as the faculty director Engineers 0 There are some research enginners who use the cleanroom but they are supported on soft grant money. They come and go with the funding. Don't count those people!!! IT Staff 0 One of the Technicians below has IT training and helps out. Technicians 3 (1 has an eng degree, 1 has physics degree and 1 has chem degree) As always opinions and comments are welcome Best Regards Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of J?rg H?bner Sent: Wednesday, August 22, 2012 1:59 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] FW: staffing Hi Here is our staffing, it will seem quite high but being the only cleanroom in Denmark that allows small scale production we have to be a bit of both, academic learning environment, research and development and small scale production facility (that's also why we have chosen to be ISO 9001 certified). All training and service is carried out be Danchip personnel, no user peer training is allowed. Staffing Survey Input Comment University DTU Danchip, Technical University of Denmark Clean Room Square Footage 14000 Management 4 Including facility management Engineers 10 offer small scale production /process development to our customers IT Staff 1 Also QA/QC manager (ISO certified) Technicians 10 offer small scale production to our customers Best Regards Jorg J?rg H?bner Director DTU Danchip National Center for Micro- and Nanofabrication Technical University of Denmark [http://www.dtu.dk/images/DTU_email_logo_01.gif] Danchip ?rstedsPlads Building 347 2800 Kgs Lyngby Direct +45 4525 5762 jhub at danchip.dtu.dk The MTL Mail Server has detected a possible fraud attempt from "micmail.mic.dtu.dk" claiming to be www.danchip.dtu.dk From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mark Heiden Sent: 21. august 2012 22:39 To: labnetwork at mtl.mit.edu; 'Ferraguto, Thomas' Subject: [labnetwork] FW: staffing From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ferraguto, Thomas Sent: Tuesday, August 21, 2012 5:33 AM To: labnetwork at mtl.mit.edu; Ferraguto, Thomas Subject: [labnetwork] staffing We (UMass Lowell) have been fortunate enough to purchase some equipment for our 4200 (1450 is chase) square foot clean room opening October 11th. (It will take most of the fall for delivery and fit up) Now that I have equipment on the way (Including a Raith 150two), I need to justify hiring a dedicated photo lithography engineer. It would be helpful to get a read on square footage to staffing number. If you could fill out the table (overwriting my input and forward it back) it would provide a great data point for us! (one which I will share once compiled) I'm not including facilities support staff, i.e. HVAC, electrical etc. This is dedicated clean room staff to train users and maintain equipment. As always opinions and comments are welcome Best Regards Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From hughes at illinois.edu Wed Aug 22 12:17:27 2012 From: hughes at illinois.edu (Hughes, John S) Date: Wed, 22 Aug 2012 16:17:27 +0000 Subject: [labnetwork] staffing In-Reply-To: <0D1ABD6DF2541B42A05BD6E6D369541132F470D6@EXMBX03.ad.louisville.edu> References: <004501cd7fdd$02ff05e0$08fd11a0$@engr.ucr.edu> <39838FA4BF2F9A43AE3918CAD0F6AF171866EDC96A@WINEXCHANGE3.win.dtu.dk> <0D1ABD6DF2541B42A05BD6E6D369541132F470D6@EXMBX03.ad.louisville.edu> Message-ID: I also forgot to copy the group. Here is the table for MNTL at the University of Illinois. (There are three other, much smaller, cleanrooms on campus that are not included.) -- John Begin forwarded message: From: John Hughes > Subject: Re: [labnetwork] staffing Date: August 21, 2012 1:14:38 PM CDT To: "Ferraguto, Thomas" > Hi Thomas, We consider ourselves understaffed (or lean and mean, depending on who you talk to). We have over 200 cleanroom users at any given time (and increasing). I manage the cleanrooms, but also do some equipment maintenance, hence the "1/2" in the management and engineer categories. Best regards, John ------------------------------------------------------------- John S. Hughes Office: (217) 333-4674 Associate Director FAX: (217) 244-6375 Laboratory Operations hughes at illinois.edu Micro and Nanotechnology Laboratory University of Illinois at Urbana-Champaign 3114 Micro and Nanotechnology Laboratory 208 North Wright Street Urbana, Illinois 61801 http://mntl.illinois.edu ------------------------------------------------------------- Staffing Survey Input Comment University University of Illinois Micro & Nanotechnology Lab Clean Room Square Footage 8000 Chase areas NOT included Management 1/2 (Manages all labs in building) Engineers 4 1/2 IT Staff 1/10 Or less. We only rarely get IT assistance in the cleanrooms Technicians 0 -------------- next part -------------- An HTML attachment was scrubbed... URL: From lej at danchip.dtu.dk Thu Aug 23 08:03:04 2012 From: lej at danchip.dtu.dk (Leif Johansen) Date: Thu, 23 Aug 2012 14:03:04 +0200 Subject: [labnetwork] SVG track coaters Message-ID: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30881@WINEXCHANGE3.win.dtu.dk> Dear all, In our lab we have a 20 years old Semiconductor Systems Inc. (SSI) track coater which is on its last leg. I have noticed that quite a number of you are using Silicon Valley Group (SVG) coaters. We are presently considering if we should buy a refurbished SVG coater as a replacement tool. I therefore have a few questions: ? What is our experience with their up-time? ? How easy are they to service? ? Is the cost of ownership large, medium or small? ? Is it still possible to find companies which can provide spare parts and/or offer engineering services? Best regards, Leif Leif S. Johansen Head of Operations DTU Danchip Technical University of Denmark [cid:image001.gif at 01CD8137.D8E6EF50] Danchip ?rsteds Plads, Byg. 347 2800 Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.danchip.dtu.dk/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From codreanu at seas.upenn.edu Thu Aug 23 08:49:02 2012 From: codreanu at seas.upenn.edu (Iulian Codreanu) Date: Thu, 23 Aug 2012 08:49:02 -0400 Subject: [labnetwork] chemical resistant gloves used with HF Message-ID: <503626BE.3080806@seas.upenn.edu> Good Morning. I am in the process of re-evaluating the additional PPEs we require at the HF bench and your feedback would be much appreciated. Can you please tell me what kind of chemical resistant gloves you use at your HF bench? Make/model would be very helpful. Also, how do you go about checking their integrity? How frequently do you check? Thank you very much. Iulian -- iulian Codreanu, Ph.D. Director, Penn NanoFab 200 South 33rd Street Room 376 GRW Bldg Philadelphia, PA 19104-6314 P: 215-898-9308 F: 215-573-2068 www.seas.upenn.edu/~nanofab From Thomas_Ferraguto at uml.edu Thu Aug 23 09:24:01 2012 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas) Date: Thu, 23 Aug 2012 13:24:01 +0000 Subject: [labnetwork] staffing table Message-ID: * I've compiled the results and will forward an excel spread sheet with everyone's data * Each Institution has its own tab, with descriptive comments provided. * If for any reason you would like make your data anonymous please let me know. * I know it's a relatively simplistic take on staffing but I feel it was a good exercise. * Once I forward the spread sheet feel free to provide feedback and corrections. The outliers all have specific circumstances and situations, but the average staffing per 1000 square feet of envelop clean room space was ~.8 Thank You to everyone for sharing their information with me... Best Regards Tom Ferraguto [cid:image003.png at 01CD8111.07CC9E90] Thomas S. Ferraguto ETIC Clean Room Director University of Massachusetts Lowell 600 Suffolk Street 456C Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 12838 bytes Desc: image003.png URL: From shott at stanford.edu Thu Aug 23 11:15:41 2012 From: shott at stanford.edu (John Shott) Date: Thu, 23 Aug 2012 08:15:41 -0700 Subject: [labnetwork] chemical resistant gloves used with HF In-Reply-To: <503626BE.3080806@seas.upenn.edu> References: <503626BE.3080806@seas.upenn.edu> Message-ID: <5036491D.7050409@stanford.edu> Iulian: We are using MAPA Advantech Trionic E-194 gloves (available from VWR and a number of the PPE providers) for all of our acid needs. They are a mix of natural rubber, neoprene and nitrile blend. In terms of acid resistance they are rated (on the MAPA site www.mapaglove.com) as a "5" for concentrated HF, buffered oxide etch, sulfuric acid, phosphoric acid, 30% H2O2, nitric acid, hydrochloric acid. On their rating scale, a 5 means that they recommend changing the gloves after 301-480 minutes of exposure to the chemical. Hopefully, our lab members don't have their gloved hands sitting in vats of acid ... Of course, just sitting around, these gloves will eventually dry out and begin to crack. Our lab members are trained (and we hope that they follow through) to capture some air in the glove by squeezing the cuff to make sure that there are no pin holes or leaks ... and to discard the gloves when they find a problem rather than putting them back on the carts. They should be doing that before every use ... We also provide shared use gloves at every acid station in a variety of sizes but also invite folks to get and maintain their own gloves if they prefer to have better knowledge of the history of the gloves that they use. Whether they select to use the shared gloves or have their own pair is up to them ... but there is no charge for gloves if they want to get and use their private pair out of our stockroom. Because these gloves contain natural rubber, folks with latex allergies may have problems. However, in general, folks would be wearing these gloves over the top of a lightweight inner glove. We provide inner gloves in either latex or vinyl. I have never heard of a person having a latex-related problem with these gloves because anyone with a latex allergy will choose to use vinyl liner gloves. I hope this helps. As usual, I'll be interested in reading all of the other reports that you get in response to this question as there are always a good number of thoughtful responses on this list. Good luck, John On 8/23/2012 5:49 AM, Iulian Codreanu wrote: > Good Morning. > > I am in the process of re-evaluating the additional PPEs we require at > the HF bench and your feedback would be much appreciated. > > Can you please tell me what kind of chemical resistant gloves you use > at your HF bench? Make/model would be very helpful. > > Also, how do you go about checking their integrity? How frequently do > you check? > > Thank you very much. > > Iulian From rmorrison at draper.com Thu Aug 23 11:44:19 2012 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 23 Aug 2012 15:44:19 +0000 Subject: [labnetwork] SVG track coaters In-Reply-To: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30881@WINEXCHANGE3.win.dtu.dk> References: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30881@WINEXCHANGE3.win.dtu.dk> Message-ID: HI Leif, Here at Draper we used refurbished SVG systems. Uptime is >90% and COO is very low. We purchased 3 coat tracks and 3 develop tracks for the following vendors: AZN Track Inc. (2 coat tracks and 2 dev tracks) 1081 Memorex Dr Santa Clara, CA 95050 Tel: (408) 982-6102 AIO International Corporation (1 coat track and 1 dev track) 1938 Junction Avenue San Jose, CA 95131 Ph: 408.586.7667 Both companies are good and responsive. Both have the same pricing. We started with AIO with a person named Jim Grambow, he left AIO and went to AZN so we followed him to AZN. Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen Sent: Thursday, August 23, 2012 8:03 AM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] SVG track coaters Dear all, In our lab we have a 20 years old Semiconductor Systems Inc. (SSI) track coater which is on its last leg. I have noticed that quite a number of you are using Silicon Valley Group (SVG) coaters. We are presently considering if we should buy a refurbished SVG coater as a replacement tool. I therefore have a few questions: ? What is our experience with their up-time? ? How easy are they to service? ? Is the cost of ownership large, medium or small? ? Is it still possible to find companies which can provide spare parts and/or offer engineering services? Best regards, Leif Leif S. Johansen Head of Operations DTU Danchip Technical University of Denmark [http://www.dtu.dk/images/DTU_email_logo_01.gif] Danchip ?rsteds Plads, Byg. 347 2800 Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.danchip.dtu.dk/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From michael.rooks at yale.edu Thu Aug 23 12:01:15 2012 From: michael.rooks at yale.edu (Michael Rooks) Date: Thu, 23 Aug 2012 12:01:15 -0400 Subject: [labnetwork] SVG track coaters In-Reply-To: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30881@WINEXCHANGE3.win.dtu.dk> References: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30881@WINEXCHANGE3.win.dtu.dk> Message-ID: <503653CB.5030503@yale.edu> We are very happy with our (4)Laurell spinners. They are simple, well built, and relatively inexpensive. I bought a new one for $4100 USD. In my opinion, simple spinners and hot plates are more appropriate for university labs. Track coaters are very complex and hard to maintain. ----------------- Michael Rooks Yale Institute for Nanoscience & Quantum Engineering nano.yale.edu On 08/23/2012 08:03 AM, Leif Johansen wrote: > > Dear all, > > In our lab we have a 20 years old Semiconductor Systems Inc. (SSI) > track coater which is on its last leg. I have noticed that quite a > number of you are using Silicon Valley Group (SVG) coaters. We are > presently considering if we should buy a refurbished SVG coater as a > replacement tool. I therefore have a few questions: > > ?What is our experience with their up-time? > > ?How easy are they to service? > > ?Is the cost of ownership large, medium or small? > > ?Is it still possible to find companies which can provide spare parts > and/or offer engineering services? > > Best regards, > > Leif > > *Leif S. Johansen *** > > Head of Operations > > DTU Danchip > > *Technical University of Denmark*** > > > > http://www.dtu.dk/images/DTU_email_logo_01.gif > > Danchip > > ?rsteds Plads, Byg. 347 > > 2800 Lyngby > > Direct +45 45255713 > > Mobile +45 25348992 > > lesjo at danchip.dtu.dk > > www.danchip.dtu.dk/ > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 1055 bytes Desc: not available URL: From shott at stanford.edu Thu Aug 23 13:23:42 2012 From: shott at stanford.edu (John Shott) Date: Thu, 23 Aug 2012 10:23:42 -0700 Subject: [labnetwork] SVG track coaters In-Reply-To: References: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30881@WINEXCHANGE3.win.dtu.dk> Message-ID: <5036671E.7010501@stanford.edu> Leif: Like, Rick, we at Stanford University also have a collection of SVG coat and develop tracks and have also used AZN and AIO for support. A third company that we us for support of these tracks is Pico Track (www.picotrack.com) that is also located in Silicon Valley. It is probably worth discussing which series of SVG system you are considering. We have the older 8600 series in use in our lab (two dual-track coat systems and one dual-track develop system) ... which are still supported by the previously mentioned third-party companies. My guess is that some universities and research labs also have the somewhat newer (but still pretty old ....) 8800 series. As all of our experience is with the 8600 series, I'm not qualified to comment on differences in reliability, performance, or availability of support between the 8600 and 8800 series. I believe that we have been generally pretty happy with the performance of the 8600 series ... although all track systems seem to have a fair amount of cleaning and support involved that increases if you plan to use high-viscosity resists for thick layers. Getting long life out of pumps used for high-viscosity resists seem to be an ongoing challenge (and expense ...). If there are more specific questions, I'm confident that I can get our folks that support these tracks on a daily basis to provide more detailed comments. Good luck, John On 8/23/2012 8:44 AM, Morrison, Richard H., Jr. wrote: > > HI Leif, > > Here at Draper we used refurbished SVG systems. Uptime is >90% and COO > is very low. We purchased 3 coat tracks and 3 develop tracks for the > following vendors: > > AZN Track Inc. (2 coat tracks and 2 dev tracks) > > 1081 Memorex Dr > > Santa Clara, CA 95050 > > Tel: (408) 982-6102 > > AIO International Corporation (1 coat track and 1 dev track) > > 1938 Junction Avenue > > San Jose, CA 95131 > > Ph: 408.586.7667 > > Both companies are good and responsive. Both have the same pricing. We > started with AIO with a person named Jim Grambow, he left AIO and went > to AZN so we followed him to AZN. > > Rick > > Draper Laboratory > > Group Leader Microfabrication Operations > > 555 Technology Square > > Cambridge Ma, 02139-3563 > > www.draper.com > > rmorrison at draper.com > > W 617-258-3420 > > C 508-930-3461 > -------------- next part -------------- An HTML attachment was scrubbed... URL: From lej at danchip.dtu.dk Thu Aug 23 15:56:05 2012 From: lej at danchip.dtu.dk (Leif Johansen) Date: Thu, 23 Aug 2012 21:56:05 +0200 Subject: [labnetwork] chemical resistant gloves used with HF In-Reply-To: <503626BE.3080806@seas.upenn.edu> References: <503626BE.3080806@seas.upenn.edu> Message-ID: <39838FA4BF2F9A43AE3918CAD0F6AF171866F30882@WINEXCHANGE3.win.dtu.dk> Hello Iulian, We are using North SilverShield 4H gloves. Please refer to the links below. http://www.northsafety.com/TriggerWorkflow.aspx?WorkflowModuleGUID=a3c3bf34-f500-45aa-a73f-13a246669a21&Alias=NSUS&SB_ContentItemGuid=16486627-ea23-4442-bde6-d9008e3579ba http://www.northsafety.com/TriggerWorkflow.aspx?WorkflowModuleGUID=a3c3bf34-f500-45aa-a73f-13a246669a21&Alias=NSUS&SB_ContentItemGuid=babf5024-993c-4792-9ed5-442e9335ee49&ReuseToken=True&CDTID=a2de4ac6-0971-431d-ac14-d9496fd9b052 Look at page 18 in the pdf product catalogue. Their advantage is that they provide 4 hours protection against most hazardous chemicals, hence the product name. The disadvantage is that after repeated use they are prone to crack in the weldings, so it is quite important to inspect used gloves carefully before handling HF. We always provide a stack of new 4H gloves near all chemical wet benches. 4H gloves are also quite slippery, so handling beakers can be cumbersome. For this reason, many lab users put an extra pair of nitrile gloves over the 4H gloves. Best regards, Leif -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Thursday, August 23, 2012 2:49 PM To: Fab Network Subject: [labnetwork] chemical resistant gloves used with HF Good Morning. I am in the process of re-evaluating the additional PPEs we require at the HF bench and your feedback would be much appreciated. Can you please tell me what kind of chemical resistant gloves you use at your HF bench? Make/model would be very helpful. Also, how do you go about checking their integrity? How frequently do you check? Thank you very much. Iulian -- iulian Codreanu, Ph.D. Director, Penn NanoFab 200 South 33rd Street Room 376 GRW Bldg Philadelphia, PA 19104-6314 P: 215-898-9308 F: 215-573-2068 www.seas.upenn.edu/~nanofab _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From vincent.luciani at nist.gov Thu Aug 23 18:16:13 2012 From: vincent.luciani at nist.gov (Luciani, Vincent) Date: Thu, 23 Aug 2012 18:16:13 -0400 Subject: [labnetwork] chemical resistant gloves used with HF In-Reply-To: <5036491D.7050409@stanford.edu> References: <503626BE.3080806@seas.upenn.edu> <5036491D.7050409@stanford.edu> Message-ID: <01F47D4EDEEC64488C10B767D15E48581010EF0978@MBCLUSTER.xchange.nist.gov> Hello Iulian, Great seeing you at the UGIM. Our policy is very close to John's. We like the Trionic (or tri-blend more generically) gloves as well. They are by far the best combination of protection and dexterity. We still supply the re-usable thicker nitrile gloves and recommend their usage when using any acids but we permit the use of double-gloved tri-blend gloves when good dexterity is essential. At the solvent benches, we have switched to the tri-blend gloves. When using a TMAH solution we require nitrile or tri-blend gloves and disposable sleeve protectors due to the toxicity of the TMAH via skin absorption. I look forward to the day that extra-long tri-blend gloves are available. Take care, Vince -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of John Shott Sent: Thursday, August 23, 2012 11:16 AM To: labnetwork at mtl.mit.edu; Iulian Codreanu Subject: Re: [labnetwork] chemical resistant gloves used with HF Iulian: We are using MAPA Advantech Trionic E-194 gloves (available from VWR and a number of the PPE providers) for all of our acid needs. They are a mix of natural rubber, neoprene and nitrile blend. In terms of acid resistance they are rated (on the MAPA site www.mapaglove.com) as a "5" for concentrated HF, buffered oxide etch, sulfuric acid, phosphoric acid, 30% H2O2, nitric acid, hydrochloric acid. On their rating scale, a 5 means that they recommend changing the gloves after 301-480 minutes of exposure to the chemical. Hopefully, our lab members don't have their gloved hands sitting in vats of acid ... Of course, just sitting around, these gloves will eventually dry out and begin to crack. Our lab members are trained (and we hope that they follow through) to capture some air in the glove by squeezing the cuff to make sure that there are no pin holes or leaks ... and to discard the gloves when they find a problem rather than putting them back on the carts. They should be doing that before every use ... We also provide shared use gloves at every acid station in a variety of sizes but also invite folks to get and maintain their own gloves if they prefer to have better knowledge of the history of the gloves that they use. Whether they select to use the shared gloves or have their own pair is up to them ... but there is no charge for gloves if they want to get and use their private pair out of our stockroom. Because these gloves contain natural rubber, folks with latex allergies may have problems. However, in general, folks would be wearing these gloves over the top of a lightweight inner glove. We provide inner gloves in either latex or vinyl. I have never heard of a person having a latex-related problem with these gloves because anyone with a latex allergy will choose to use vinyl liner gloves. I hope this helps. As usual, I'll be interested in reading all of the other reports that you get in response to this question as there are always a good number of thoughtful responses on this list. Good luck, John On 8/23/2012 5:49 AM, Iulian Codreanu wrote: > Good Morning. > > I am in the process of re-evaluating the additional PPEs we require at > the HF bench and your feedback would be much appreciated. > > Can you please tell me what kind of chemical resistant gloves you use > at your HF bench? Make/model would be very helpful. > > Also, how do you go about checking their integrity? How frequently do > you check? > > Thank you very much. > > Iulian _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From Nandini.Iyer at ucsf.edu Thu Aug 23 20:17:18 2012 From: Nandini.Iyer at ucsf.edu (Nan Iyer) Date: Thu, 23 Aug 2012 17:17:18 -0700 Subject: [labnetwork] Karl Suss Spinner Technician Message-ID: Hi, We have a Karl Suss RC 8 spinner in our cleanroom that needs some service. We are located in the Bay Area and are looking for someone local (or as close to us as possible) to help us with it. Does anyone have any recommendations? Thank you. Nan ____________________ Nandini Iyer Biomedical Micro and Nanofabrication Core Facility, Dept. of Bioengineering and Therapeutic Sciences, UCSF, Mission Bay, San Francisco From hwooden at iest.org Fri Aug 24 09:56:07 2012 From: hwooden at iest.org (Heather Wooden) Date: Fri, 24 Aug 2012 08:56:07 -0500 Subject: [labnetwork] Abstracts Needed on Operations and Management of Micro/Nanotechnology Facilities Message-ID: *Abstracts are still being solicited for the new conference session track at the IEST Annual Technical Meeting, ESTECH 2013. *The session track is part of a cooperation with the University, Government, Industry Micro/Nano (UGIM) consortium, to be held in conjunction with ESTECH 2013. The conference will take place April 29-May 2, 2013 in San Diego, California. The deadline for abstracts is September 17, 2012. Topics being solicited for the Operation and Management of Micro/Nanotechnology Research and Manufacturing Facilities include: - Facility Management - Management Systems - Scheduling and Billing - Space utilization and prioritization - Rules and enforcement - Priorities: Research vs. Education - Staff management structures - Fostering collaboration - International partnerships and collaboration - Dealing with Anomalies - Emergency planning and response - PM shutdown management - Recovery from events - Financial Management - Charging models - Income streams - Reporting - Chemical procurement and distribution - Decommissioning equipment and facilities - ITAR and Homeland Security issues - Priorities for equipment purchases - Processing equipment selection - Collaboration and cross-contamination - Sustainability opportunities in nanotechnology cleanrooms - Training and education Abstracts and biographies can be submitted by e-mail to hwooden at iest.org. More information can be found at http://www.iest.org/Meetings/ESTECH/CallforPresentations/tabid/13170/Default.aspx *. *Regards, Heather Wooden Heather Wooden IEST Marketing and Meeting Coordinator Arlington Place One 2340 S. Arlington Heights Road Suite 100 Arlington Heights, IL 60005 Phone: 847-981-0100 ext. 20 E-mail: hwooden at iest.org Mark your calendars for the 2012 IEST Fall Conference - November 12-15 in northshore suburban Chicago. *IEST - Membership Is a Best Practice - www.iest.org* -------------- next part -------------- An HTML attachment was scrubbed... URL: From kevin.walsh at louisville.edu Tue Aug 28 18:21:09 2012 From: kevin.walsh at louisville.edu (Walsh,Kevin M.) Date: Tue, 28 Aug 2012 22:21:09 +0000 Subject: [labnetwork] hotplate parameters for Shipley 1813 Message-ID: <0D1ABD6DF2541B42A05BD6E6D369541132F4AE38@EXMBX03.ad.louisville.edu> Processing Experts! What hotplate processing parameters do you recommend for Shipley 1813. We have Brewer Science hotplates capable of hard contact (vacuum), proximity contact (nitrogen cushion), or soft contact (gravity). Dehydration Bake - temp, time, soft/hard/proximity contact? Soft Bake - temp, time, soft/hard/proximity contact? Hard Bake - temp, time, soft/hard/proximity contact? If soft contact, do you use alum foil to keep your hotplate surfaces clean? Thanks in advance, Kevin Dr. Kevin M. Walsh Samuel T. Fife Professor of Electrical and Computer Engineering Founding Director of the UofL Micro/Nanotechnology Center University of Louisville BRB Building, Room 234 2210 S. Brook St Louisville, KY 40292 (502) 852-0826 office (502) 852-8128 fax walsh at louisville.edu or walsh at ieee.org www.louisville.edu /micronano -------------- next part -------------- An HTML attachment was scrubbed... URL: From gary.spinner at gmail.com Wed Aug 29 00:10:58 2012 From: gary.spinner at gmail.com (gary.spinner@mirc.gatech.edu) Date: Wed, 29 Aug 2012 00:10:58 -0400 Subject: [labnetwork] hotplate parameters for Shipley 1813 In-Reply-To: <0D1ABD6DF2541B42A05BD6E6D369541132F4AE38@EXMBX03.ad.louisville.edu> References: <0D1ABD6DF2541B42A05BD6E6D369541132F4AE38@EXMBX03.ad.louisville.edu> Message-ID: Hello Dr. Walsh, The attached file contains processing parameters for Shipley S1800 series resist. Thanks, On Tue, Aug 28, 2012 at 7:46 PM, Walsh,Kevin M. wrote: > Processing Experts! > > > > What hotplate processing parameters do you recommend for Shipley 1813. We > have Brewer Science hotplates capable of hard contact (vacuum), proximity > contact (nitrogen cushion), or soft contact (gravity). > > > > Dehydration Bake - temp, time, soft/hard/proximity contact? > > Soft Bake - temp, time, soft/hard/proximity contact? > > Hard Bake - temp, time, soft/hard/proximity contact? > > > > If soft contact, do you use alum foil to keep your hotplate surfaces clean? > > > > Thanks in advance, > Kevin > > > > Dr. Kevin M. Walsh > Samuel T. Fife Professor of Electrical and Computer Engineering > Founding Director of the UofL Micro/Nanotechnology Center > University of Louisville > BRB Building, Room 234 > 2210 S. Brook St > Louisville, KY 40292 > (502) 852-0826 office > (502) 852-8128 fax > walsh at louisville.edu or walsh at ieee.org > www.louisville.edu /micronano > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Gary Spinner Senior Assistant Director of Research Operations Institute for Electronics and Nanotechnology Georgia Institute of Technology Office Number (404) 894-4010 Cell Phone Number (404) 391-9182 http://grover.mirc.gatech.edu/ "Successful people are always looking for opportunities to help others. Unsuccessful people are always asking, "What's in it for me?"" ? Brian Tracy -------------- next part -------------- A non-text attachment was scrubbed... Name: S1800.pdf Type: application/pdf Size: 2393209 bytes Desc: not available URL: From john.nibarger at nist.gov Thu Aug 30 09:52:10 2012 From: john.nibarger at nist.gov (Nibarger, John) Date: Thu, 30 Aug 2012 09:52:10 -0400 Subject: [labnetwork] hotplate parameters for Shipley 1813 In-Reply-To: Message-ID: Here's what one of my colleagues recommends here at NIST: Dehydration bake ? 110-120 C vacuum contact on hot plate for 2 to 5 min. 3-5 min O2 ash at 50W is also a very good option. Soft Bake ? 95-115 C vacuum contact on hot plate for 45-75 seconds. This is really dependent on the aligner and source wavelength used. Minimum temp/time process is 95C vacuum contact , 1 min. Hard bake ? 110-130 C vacuum contact on hot plate for 1-5 min. Temp and time are driven by the etch resistance need. Above 130C or with extended bake times (10+ min) resist stripping becomes a concern. Found this product link that may also be of use. http://www.nanophys.kth.se/nanophys/facilities/nfl/resists/S1813/s1800serie sDataSheet.pdf Cheers, John John P. Nibarger, Ph.D. Manager, Boulder Micro-Fabrication Facility National Institute of Standards and Technology 325 Broadway, MS 817.03 Boulder, CO 80305 303-497-4575 (phone) 303-497-3042 (fax) john.nibarger at nist.gov On 8/28/12 10:10 PM, "gary.spinner at mirc.gatech.edu" wrote: >Hello Dr. Walsh, > >The attached file contains processing parameters for Shipley S1800 >series resist. > >Thanks, > > > >On Tue, Aug 28, 2012 at 7:46 PM, Walsh,Kevin M. > wrote: >> Processing Experts! >> >> >> >> What hotplate processing parameters do you recommend for Shipley 1813. >>We >> have Brewer Science hotplates capable of hard contact (vacuum), >>proximity >> contact (nitrogen cushion), or soft contact (gravity). >> >> >> >> Dehydration Bake - temp, time, soft/hard/proximity contact? >> >> Soft Bake - temp, time, soft/hard/proximity contact? >> >> Hard Bake - temp, time, soft/hard/proximity contact? >> >> >> >> If soft contact, do you use alum foil to keep your hotplate surfaces >>clean? >> >> >> >> Thanks in advance, >> Kevin >> >> >> >> Dr. Kevin M. Walsh >> Samuel T. Fife Professor of Electrical and Computer Engineering >> Founding Director of the UofL Micro/Nanotechnology Center >> University of Louisville >> BRB Building, Room 234 >> 2210 S. Brook St >> Louisville, KY 40292 >> (502) 852-0826 office >> (502) 852-8128 fax >> walsh at louisville.edu or walsh at ieee.org >> www.louisville.edu /micronano >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > > > >-- >Gary Spinner >Senior Assistant Director of Research Operations >Institute for Electronics and Nanotechnology >Georgia Institute of Technology >Office Number (404) 894-4010 >Cell Phone Number (404) 391-9182 > >http://grover.mirc.gatech.edu/ > >"Successful people are always looking for opportunities to help others. >Unsuccessful people are always asking, "What's in it for me?"" >? Brian Tracy From murphy at me.lsu.edu Fri Aug 31 11:31:16 2012 From: murphy at me.lsu.edu (Michael Murphy) Date: Fri, 31 Aug 2012 10:31:16 -0500 Subject: [labnetwork] Fwd: hotplate parameters for Shipley 1813 References: <963381BC78C4FB4B944E273C12FC6DCD1C391B37@BL2PRD0611MB433.namprd06.prod.outlook.com> Message-ID: Everyone Here are our research associate's, Daniel Park's, conditions for processing Shipley 1813. Mike Murphy Begin forwarded message: > From: Daniel S Park > Subject: RE: [labnetwork] hotplate parameters for Shipley 1813 > Date: August 31, 2012 10:13:44 AM CDT > To: Michael Murphy > > Dr. Murphy. > > Here is the data w/ 4 inch Si wafer. > > Dehydration: 150oC for 10min (or 200oC for 5 min) > Spin-coat S1813 at 3,000 rpm for 60 sec > Softbake at 115oC for 60 sec > Exposure at 30~50 mJ/cm^2 (UV wavelength at 365 nm) > Develop in 1:4 dilution of AZ400K for 20~30 sec > Hard bake: 115oC for 60 sec > > All soft contact for HP use > Use 6 inch Si wafer (not Al foil) to keep hotplate clean and place 4 inch Si wafer on 6 inch Si wafer during baking > > Best, > Daniel > > ---------------------------------------------------------------------------------------------------------------- > > Daniel Park, Ph. D., Research Associate > > Mechanical Engineering > > Louisiana State Univeristy > > Phone: 225-578-4412 > > From: Michael Murphy [murphy at me.lsu.edu] > Sent: Thursday, August 30, 2012 12:59 PM > To: Daniel S Park > Subject: Fwd: [labnetwork] hotplate parameters for Shipley 1813 > > Daniel > > Do we have some? > > Mike > > > Begin forwarded message: > >> From: "Walsh,Kevin M." >> Subject: [labnetwork] hotplate parameters for Shipley 1813 >> Date: August 28, 2012 5:21:09 PM CDT >> To: "labnetwork at mtl.mit.edu" >> >> Processing Experts! >> >> What hotplate processing parameters do you recommend for Shipley 1813. We have Brewer Science hotplates capable of hard contact (vacuum), proximity contact (nitrogen cushion), or soft contact (gravity). >> >> Dehydration Bake - temp, time, soft/hard/proximity contact? >> Soft Bake - temp, time, soft/hard/proximity contact? >> Hard Bake - temp, time, soft/hard/proximity contact? >> >> If soft contact, do you use alum foil to keep your hotplate surfaces clean? >> >> Thanks in advance, >> Kevin >> >> Dr. Kevin M. Walsh >> Samuel T. Fife Professor of Electrical and Computer Engineering >> Founding Director of the UofL Micro/Nanotechnology Center >> University of Louisville >> BRB Building, Room 234 >> 2210 S. Brook St >> Louisville, KY 40292 >> (502) 852-0826 office >> (502) 852-8128 fax >> walsh at louisville.edu or walsh at ieee.org >> www.louisville.edu /micronano >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > ************************************************************************************************************* > Michael C. Murphy > Phone: (225) 578-5921 > Roy O. Martin Lumber Company > Fax: (225) 578-5924 > Professor of Mechanical Engineering > E-mail: murphy at me.lsu.edu > Dept. of Mechanical Engineering > Louisiana State University > 2508 Patrick F. Taylor Hall > Baton Rouge, LA 70803 > ************************************************************************************************************** > > ************************************************************************************************************* Michael C. Murphy Phone: (225) 578-5921 Roy O. Martin Lumber Company Fax: (225) 578-5924 Professor of Mechanical Engineering E-mail: murphy at me.lsu.edu Dept. of Mechanical Engineering Louisiana State University 2508 Patrick F. Taylor Hall Baton Rouge, LA 70803 ************************************************************************************************************** -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Fri Aug 31 16:12:47 2012 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Fri, 31 Aug 2012 20:12:47 +0000 Subject: [labnetwork] Senior Micro/Nano Process Engineering Position Open at the University of Louisville Message-ID: Open Position Senior Micro/Nano Technology Process Engineer Micro/Nano Technology Center University of Louisville The University of Louisville's Micro/Nano Technology Center (MNTC) is home to one of the premier multidisciplinary research facilities in the region. The center encompasses a 10,000 ft2, 7-bay, class 100/1000 cleanroom facility for micro / nano technology design, modeling, fabrication, packaging, metrology and testing. The center supports a broad range of research performed by students, staff, faculty, post-docs, and industrial clients with interests in micro/nano fabrication and device development, including MEMS, CMOS, optics, and a variety of experimental devices. The MNTC is seeking qualified applicants with experience in the areas of micro/nanotechnology and semiconductor processing for the open position of Senior Micro/Nano Technology Process Engineer. A Ph.D is preferred with CMOS processing experience. The position's responsibilities will include, but are not limited to: Interact With, Train and Assist Users of the MNTC: The position will be responsible for assisting internal and external users with tool use, process design, and proper handling of chemicals. This includes teaching safety and cleanroom etiquette, writing and updating standard operating procedures (SOPs), training users to use microfabrication tools, and developing new processes. This position requires strong interpersonal and communication skills, and the ability to work on multiple technical tasks concurrently. Equipment Support & Repair: The position also involves installing, characterizing and maintaining equipment in the cleanroom as well as ancillary equipment. This will include working closely with field service engineers and infrastructure support with our toxic gas monitoring (TGM) and acid waste neutralization (AWN) systems. MNTC Operational Support: This position requires supporting the safe operation of the cleanroom, including preventing incidents to people and equipment, and responding to incidents that may occur. PI & Lab Manager Interaction: The position requires working closely with the lab manager, faculty and industrial/academic researchers to support writing research and equipment proposals. Educational Requirements: The minimum requirement for this senior-level position is a Masters of Engineering or the Physical Sciences with substantial background in microfabrication and at least five years of directly-related professional experience. An advanced degree of Ph.D. is preferred. A BS in Engineering or the Physical Sciences with exceptional work experience in lieu of the Masters will be considered. Experience Requirements The candidate should have experience with semiconductor processing, microfabrication techniques, cleanroom/safety protocols, and contamination issues. Experience with toxic gases, wet chemical protocols and hazardous materials training are preferred. A minimum of 3-5 years in semiconductor/MEMS device fabrication is required. Additionally, the candidate should have experience in training cleanroom users in all aspects of microfabrication in regards to process design, safety protocol, troubleshooting and testing. Experience and expertise in electrical/electronic, mechanical, pneumatic, and vacuum components as related to semiconductor/microfabrication equipment is desired. Experience with specific instruments such as, mask aligners, evaporators, metal deposition, plasma etch, horizontal tube furnaces and CVD systems is required. Do not send resumes' to this e-mail address. Resumes' will only be considered from online submissions at the following link: http://www.higheredjobs.com/institution/details.cfm?JobCode=175663481&Title=Sr%20Micro%2FNano%20Tech%20Process%20Eng%20%28Job%20ID%3A%2028591%29&aID=7137 Cheers! Julia Aebersold, Ph.D. MNTC Cleanroom Manager Shumaker Research Building, Room 233 2210 South Brook Street University of Louisville Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: