[labnetwork] Anneal temp for aluminum on silicon with forming gas
Aebersold,Julia W.
julia.aebersold at louisville.edu
Tue Nov 13 15:11:58 EST 2012
I wanted to gather some information of aluminum anneal on a silicon wafer performed by other cleanrooms. We are using 5% forming gas with an anneal temp of 400C for ½ hour with a 20C/min ramp up and ramp down However, I have also seen higher temps up to 475C, but was concerned about the flammability of 100% hydrogen per its MSDS.
Cheers!
Julia Aebersold, Ph.D.
MNTC Cleanroom Manager
Shumaker Research Building, Room 233
2210 South Brook Street
University of Louisville
Louisville, KY 40292
502-852-1572
http://louisville.edu/micronano/
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