From miller at purdue.edu Mon Oct 1 09:34:35 2012 From: miller at purdue.edu (Miller, Timothy J) Date: Mon, 1 Oct 2012 09:34:35 -0400 Subject: [labnetwork] FW: DIW maintenance In-Reply-To: References: Message-ID: <4236EE4ACF400B428955E0E7D5012AAD01586D81AF9C@VPEXCH06.purdue.lcl> Matthieu, The annual cost depends not only on system size, but more so as to what level of purity is needed. Most research facilities appear to be happy with a simple RO-Mixed bed-UV configuration, which will deliver 18.2 MegOhm-cm water. If you want to approach to level of purity used in any of the current wafer fabs, then you have to add nitrogen blanketing on the tanks, degas membranes, boron (and perhaps silica) monitoring, temperature control, ultrafiltration, and virgin resin in the mixed beds. All of which take you to higher levels of purity, and all of which come with a price. You just have to select the level of technology you deem necessary for your facility, and that your budget can support. Personal observation: It never ceases to amaze me how little effort the research community puts into understanding the characteristics of the ultra-pure water they pour directly over their samples. The semiconductor industry expends a lot of effort to determine acceptable levels of specific organics and ions, while those in research centers are quite happy to base everything on 18.2 MegOhm-cm resistivity, which is a figure of merit the semiconductor industry left behind 20 years ago. If you don't mind sharing, you could send me a quick description of how your system is configured and the normal levels of use, and I'll see if anything looks out of line. Will have to wait until the UPW conference November 13-14 is over. Tim Miller Purdue University - Birck Nanotechnology Center 1205 West State Street West Lafayette, IN -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Matthieu Nannini, Dr. Sent: Friday, September 28, 2012 1:46 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] DIW maintenance Dear colleagues, Reviewing my annual costs and trying to find places where I could save money I realized that one of my main maintenance expense was on DIW. I pay about 10,000$/y to a contractor that is doing monthly and annually maintenance on the mixed bed and anionic cylinders. I have full confidence in this contractor and I don't have to worry about the DIW plant. However, everytime I issue a PO I can't help but thinking it's quite expensive. I'd like to know if I'm in the normal range or not. Thanks Matthieu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From julia.aebersold at louisville.edu Mon Oct 1 10:08:34 2012 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Mon, 1 Oct 2012 14:08:34 +0000 Subject: [labnetwork] Porous Silicon In-Reply-To: References: <8F95EA77ACBF904A861E580B44288EFD9C20EC55F5@FASXCH02.fasmail.priv> Message-ID: Hi Susan! We have extensive experience in making porous silicon on small samples and up to large 4" wafers for a number of applications with good uniformity. We have also made porous silicon for external customers and have given input on their setups, so that they may make porous silicon at their facilities. I'd be happy to discuss setups with your colleague. You can contact me either through e-mail or call me at 502-852-1572. Cheers! Julia Aebersold, Ph.D. MNTC Cleanroom Manager Shumaker Research Building, Room 233 2210 South Brook Street University of Louisville Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Burkett, Susan Sent: Friday, September 28, 2012 12:38 PM To: labnetwork at mtl.mit.edu Cc: testacy at ad.unc.edu Subject: [labnetwork] Porous Silicon Good morning, Is there someone out there with a porous silicon set-up that would be willing to discuss this with one of my colleagues at UNC, Tina Stacy? She is copied on this note. Thank you, Susan Burkett Alabama Power Foundation Endowed Professor University of Alabama 101 Houser Hall Tuscaloosa, AL 35487-0286 205 348 4378 Sburkett at eng.ua.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From kuhn1 at purdue.edu Wed Oct 3 13:16:11 2012 From: kuhn1 at purdue.edu (Kuhn, Jeffrey G) Date: Wed, 3 Oct 2012 13:16:11 -0400 Subject: [labnetwork] Reclaimed Water Issue Message-ID: Good Day All, The campus water supply at Purdue is quite hard. As a result, we have seen a significant buildup of scale in our exhaust scrubber, liquid ring vacuum pumps, and burn boxes. This required periodic shutdowns to remove the scale, which was expensive and time consuming. We have since installed a water reclaim system to capture RO, ultrafilter, and EDI reject streams for use as makeup water for the systems mentioned above. The water from those waste streams has been softened, thus we eliminated the scaling issue. Unfortunately, in solving the scaling issue we have created a new problem. A brown, slimy, stringy, substance builds up in the storage tank. It clings to the tank walls, peels off in sheets, and gets pumped to the points of use where it causes fouling. It settles to the bottom of the storage tank and coats the tank walls and process piping. We have to semi-annually drain and clean the tank to prevent severe fouling at the points of use. We have verified that the material is not viable (I was surprised by this). Analysis shows that it is primarily comprised of iron. Purdue uses ground water that is high in iron for its potable water supply. In order to protect the water distribution infrastructure, a monophosphate-based agent is added to the water in order to sequester dissolved iron. This helps prevent the iron from oxidizing and precipitating inside the piping system. It would seem that their sequestering agent is strong enough to prevent the dissolved iron from being completely removed by IX in the UPW system softeners. My belief is that dissolved iron becomes concentrated at the RO in the reject brine stream and then oxidizes in the storage tank, combining with phosphate to form the slime we are seeing. I do not believe the ultrafilter or EDI loop reject streams are major contributors to the problem due to the high purity of these waters. We do not have enough information yet to prove or disprove my theory. I realize that this is a rather unusual problem, but I was hoping that some of you may also have installed reclaim water systems and can provide some insight as to how to deal with this issue. We are considering installing a filtration system, but it is expensive and I am not yet convinced that it will solve the problem. Thank you in advance for your feedback. Jeff Kuhn Facility Engineer Birck Nanotechnology Center Purdue University 1205 W. State St. West Lafayette, IN 47907 Ph: (765) 496-8329 Fax: (765) 496-2018 -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Wed Oct 3 18:30:24 2012 From: shott at stanford.edu (John Shott) Date: Wed, 03 Oct 2012 15:30:24 -0700 Subject: [labnetwork] Reclaimed Water Issue In-Reply-To: References: Message-ID: <506CBC80.7080200@stanford.edu> Jeff: Although we don't have an identical system, we do use a reclaim water system. While I'm not sure that I can offer a great solution, I can tell you that your description of the problem as a "brown, slimy, stringy, substance" really sounds very similar to what we have seen. Let me describe for you and others what our reclaim water system is like: Our two, big 25,000 CFM building scrubbers consume something like 4 GPM ... which, as you know, is a lot of water over the course of a month. To reduce "one-time-use" of industrial water in that system, we have a system that pumps the output of our acid waste neutralization tank (as long as the pH is between 5.5 and 10) to the scrubber and uses that water as the makeup water for our two scrubbers. The feed into our AWN system includes waste chemicals from our wet bench cleaning stations (note: things containing HF are collected in a separate tank/drain system), DI water once it have been used, and industrial water from a handful of small, local tool-specific burn boxes and scrubbers. Although we tried it at one point, we no longer try to reclaim RO reject water. In the early months of this year, in particular, we were seeing a significant buildup of a "brown, slimy, stringy substance" in the sump of our main scrubbers that was clinging to the walls, clogging the inlet to the spray pumps, etc. While I think that you may have done more scientific analysis than we to identify this stuff, we were wondering whether some of our wet vacuum pumps (we still us a significant number of wet pumps) were "belching" pump oil vapors that were collecting in our scrubber system and causing this problem. While we never convinced ourselves that there was any validity to our pump oil vapor hypothesis, we certainly did see a build up of a material that sounds a lot like what you were seeing. It was sufficiently severe that we had to schedule a mid-year shutdown of the scrubbers to have them cleaned. Although I'd need to check some records to be sure, that is the time of the year when we often get a higher fraction of ground water mixed into our supply. Most of the year, the water that we get from the Hetch Hetchy water system is pretty good, produces minimal scale, is easy on DI systems, etc ... but during the winter months we often get a higher mix of ground water that necessitated more frequent resin bed changes, etc. So, while I can't offer you a solution, I think that we have seem something that sounds very similar to what you are experiencing and would be eager to coordinate our efforts to help further study this and come up with a good solution. I've cced our building facility engineer as well as some of our lab senior technical staff in hopes of making them aware of this discussion. You are welcome to send me email directly if there is any need for further off-line discussion, comparison, and brainstorming. Thanks, John On 10/3/2012 10:16 AM, Kuhn, Jeffrey G wrote: > > Good Day All, > > The campus water supply at Purdue is quite hard. As a result, we have > seen a significant buildup of scale in our exhaust scrubber, liquid > ring vacuum pumps, and burn boxes. This required periodic shutdowns to > remove the scale, which was expensive and time consuming. We have > since installed a water reclaim system to capture RO, ultrafilter, and > EDI reject streams for use as makeup water for the systems mentioned > above. The water from those waste streams has been softened, thus we > eliminated the scaling issue. > > Unfortunately, in solving the scaling issue we have created a new > problem. A brown, slimy, stringy, substance builds up in the storage > tank. It clings to the tank walls, peels off in sheets, and gets > pumped to the points of use where it causes fouling. It settles to the > bottom of the storage tank and coats the tank walls and process > piping. We have to semi-annually drain and clean the tank to prevent > severe fouling at the points of use. > > We have verified that the material is not viable (I was surprised by > this). Analysis shows that it is primarily comprised of iron. Purdue > uses ground water that is high in iron for its potable water supply. > In order to protect the water distribution infrastructure, a > monophosphate-based agent is added to the water in order to sequester > dissolved iron. This helps prevent the iron from oxidizing and > precipitating inside the piping system. It would seem that their > sequestering agent is strong enough to prevent the dissolved iron from > being completely removed by IX in the UPW system softeners. > > My belief is that dissolved iron becomes concentrated at the RO in the > reject brine stream and then oxidizes in the storage tank, combining > with phosphate to form the slime we are seeing. I do not believe the > ultrafilter or EDI loop reject streams are major contributors to the > problem due to the high purity of these waters. We do not have enough > information yet to prove or disprove my theory. > > I realize that this is a rather unusual problem, but I was hoping that > some of you may also have installed reclaim water systems and can > provide some insight as to how to deal with this issue. We are > considering installing a filtration system, but it is expensive and I > am not yet convinced that it will solve the problem. > > Thank you in advance for your feedback. > > Jeff Kuhn > > Facility Engineer > > Birck Nanotechnology Center > > Purdue University > > 1205 W. State St. > > West Lafayette, IN 47907 > > Ph: (765) 496-8329 > > Fax: (765) 496-2018 > -------------- next part -------------- An HTML attachment was scrubbed... URL: From yafsar at princeton.edu Thu Oct 4 12:20:43 2012 From: yafsar at princeton.edu (Yasmin Afsar) Date: Thu, 4 Oct 2012 12:20:43 -0400 Subject: [labnetwork] DEZ compatibility Message-ID: Dear colleagues, I am a graduate student at Princeton currently working on a new system for plasma-enhanced atomic layer deposition (PEALD) of ZnO and Al2O3. We are outsourcing the production of the gas manifold, and we need to supply this company with information about compatibility of our metal-organic precursors with various components in the manifold. Does anyone know the valve seat material compatibility for DEZ (diethyl zinc) vapor, or what type of seat material is typically used with DEZ? Since our group is new to ALD and to these materials, we really do not know. Any advice would be much appreciated! Thank you, Yasmin Yasmin Afsar Graduate Student Electrical Engineering Princeton University yafsar at princeton.edu From hathaway at cns.fas.harvard.edu Fri Oct 5 09:17:21 2012 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm) Date: Fri, 5 Oct 2012 09:17:21 -0400 Subject: [labnetwork] DEZ compatibility In-Reply-To: References: Message-ID: <8F95EA77ACBF904A861E580B44288EFD9C1FD17A81@FASXCH02.fasmail.priv> Hi Yasmin, ALD systems generally have stainless steel plumbing from the reactor back to the precursor cylinders. On all the systems I?ve seen (including CVD and various plasma systems), VCR fittings are standard, with (on ALD systems) SS gaskets. This is both for purity and chemical compatibility. The precursor cylinders can be either SS or pyrex-like glass. After the reactor, SS is still used for the plumbing, but viton orings and Quik-flange fittings are sufficient down to the pump. In our system, the chamber is SS, but the lid is aluminum. This can be an issue over time, as the chamber oring (often Kalrez but sometimes viton) can outgas fluorine, which changes to HF, which attacks the lid near the oring, causing pitting. Not the end of the world (and curiously doesn?t seem to cause leaking, as the oring itself appears to protect the actual sealing surface), but it does lead to a bit more maintenance, (sanding or machining the general oring area to remove the pitting). As for compatibility in the valve, below is a link to the Swagelok collection of ALD valves. I?m not sure what the valve seating material is, but I?ve never heard of any compatibility issue with any ALD precursor with this line of valve. http://www.swagelok.com/search/find_products_home.aspx?SEARCH=/search/Atomic+Layer+Deposition+Valves/id-10002261/type-1&item=2aaa50c9-2b77-44aa-a4f9-63650971d876 Hope this helps! Mac Hathaway Harvard CNS ________________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] On Behalf Of Yasmin Afsar [yafsar at princeton.edu] Sent: Thursday, October 04, 2012 12:20 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] DEZ compatibility Dear colleagues, I am a graduate student at Princeton currently working on a new system for plasma-enhanced atomic layer deposition (PEALD) of ZnO and Al2O3. We are outsourcing the production of the gas manifold, and we need to supply this company with information about compatibility of our metal-organic precursors with various components in the manifold. Does anyone know the valve seat material compatibility for DEZ (diethyl zinc) vapor, or what type of seat material is typically used with DEZ? Since our group is new to ALD and to these materials, we really do not know. Any advice would be much appreciated! Thank you, Yasmin Yasmin Afsar Graduate Student Electrical Engineering Princeton University yafsar at princeton.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From matthieu.nannini at mcgill.ca Fri Oct 5 13:15:17 2012 From: matthieu.nannini at mcgill.ca (Matthieu Nannini, Dr.) Date: Fri, 5 Oct 2012 17:15:17 +0000 Subject: [labnetwork] DI costs - DIW maintenance In-Reply-To: <506717A0.9020303@eecs.berkeley.edu> References: <506717A0.9020303@eecs.berkeley.edu> Message-ID: Hi Bob, So here are the answers to the questions about my system, see below: Le 2012-09-29 ? 11:45, Robert M. Hamilton a ?crit : > Matthieu Nannini, > > To open the dialogue parameters for your system are needed: > 1) What' the analysis of the water you are starting with? 289 uS/cm pH: 7.79 > 2) How much RO makeup are you using 7.5usgpm > and what is the makeup's final resistivity (conductivity)? 20uS/cm for operation 10h/day 5 days a week. > 3) What is your DI spec? The desired total-silica value partly determines the polishing bed performance. It is the first breakthrough product. R > 18 megohm/cm TOC (max): < 100 ppb Silica (disolved): < 5ppb Sodium: < 0.1ppb Bacteria (1000 mL): < 10 Particle/L (SEM): < 10 (1um size) > 4) What's the DI loops recirc. gpm? 40 usgpm @ 50psi > 5) How many polish beds are in use and are they in a lead/lag configuration? 4 Mixed bed in parallel + 4 other in parallel > 6) Do you blanket your DI reservoir with N2? not N2 available at DIW plant site. we have a 0.1um filter for vent > 7) How much DI is being removed from the loop? 5 to 12 usgpm > > Berkeley can share our numbers but we need to compare the systems specs. Regrettably, the costs don't scale with system size. > > Bob Hamilton > > Bob Hamilton > Marvel NanoLab > University of CA at Berkeley > Rm 520 Sutardja Dai Hall > Berkeley, CA 94720-1754 > bob at eecs.berkeley.edu > (e-mail preferred) > 510-809-8600 > 510-325-7557 (mobile - emergencies) > > On 9/28/2012 10:46 AM, Matthieu Nannini, Dr. wrote: >> Dear colleagues, >> >> Reviewing my annual costs and trying to find places where I could save money I realized that one of my main maintenance expense was on DIW. I pay about 10,000$/y to a contractor that is doing monthly and annually maintenance on the mixed bed and anionic cylinders. I have full confidence in this contractor and I don't have to worry about the DIW plant. However, everytime I issue a PO I can't help but thinking it's quite expensive. >> >> I'd like to know if I'm in the normal range or not. >> >> Thanks >> >> Matthieu >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From tbritton at criticalsystemsinc.com Mon Oct 8 09:43:44 2012 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Mon, 8 Oct 2012 13:43:44 +0000 Subject: [labnetwork] DEZ compatibility In-Reply-To: References: Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EE43919@P3PWEX2MB006.ex2.secureserver.net> Hello Yasmin, Temperature can have an effect on the material compatibility with a given elastomer. Can you tell me what temperature the gas delivery will be at? It's looking like either PTFE or PCTFE will be the best choices, but we can narrow it down a bit by knowing the temperature. Best Regards, Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 [cid:image002.png at 01CDA528.99BF7A30] www.criticalsystemsinc.com -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Yasmin Afsar Sent: Thursday, October 04, 2012 10:21 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] DEZ compatibility Dear colleagues, I am a graduate student at Princeton currently working on a new system for plasma-enhanced atomic layer deposition (PEALD) of ZnO and Al2O3. We are outsourcing the production of the gas manifold, and we need to supply this company with information about compatibility of our metal-organic precursors with various components in the manifold. Does anyone know the valve seat material compatibility for DEZ (diethyl zinc) vapor, or what type of seat material is typically used with DEZ? Since our group is new to ALD and to these materials, we really do not know. Any advice would be much appreciated! Thank you, Yasmin Yasmin Afsar Graduate Student Electrical Engineering Princeton University yafsar at princeton.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 21902 bytes Desc: image002.png URL: From jrweaver at purdue.edu Mon Oct 8 15:09:57 2012 From: jrweaver at purdue.edu (Weaver, John R) Date: Mon, 8 Oct 2012 19:09:57 +0000 Subject: [labnetwork] FW: EM posting for lab network Message-ID: <6A848421F695C54A9210C1A873C96AC2CCB3@WPVEXCMBX04.purdue.lcl> We have an opening for a Staff Scientist in electron microscopy here at the Birck Nanotechnology Center, Purdue University. Please publicize this to people who might be interested in the position. Please apply online if you are interested. You can use the search feature for the job posting number, shown below or search by the posting date of 5October12. Thanks, John John R. Weaver Facility Manager Birck Nanotechnology Center Purdue University (765) 494-5494 jrweaver at purdue.edu Electron Microscopy Associate Scientist - West Lafayette - Birck Nanotechnology Center Job Number: 1201589 Description Birck Nanotechnology Center (BNC) seeks an Electron Microscopy Scientist for its electron microscopy (EM) facilities within BNC. The entire set of resources provided by BNC, 186,000 square foot facility, are designed to support collaborative interdisciplinary research in nanotechnology. Primary Responsibilities: --Participates in all of the Electron Microscopy Center's daily operations. Trains new EM users and supporting their skill development, provides technical support and collaborative assistance to users on their projects. Collaborates with faculty and conducts technical and complex laboratory research activities. --Selects appropriate microscopy procedures, operates and maintains transmission and scanning electron microscopes and auxiliary equipment. Operates the microscopes, produces and interprets images in support of visiting researchers from academia, national/government laboratories and industry and keeps up with the latest methodologies. Prepares samples for TEM and SEM. --Performs instrument calibration and maintenance and trouble-shoots problems with the highly sophisticated FIB/SEM/TEM equipment and instruments. Determines and implements best methods to resolve instrument issues. Supervises the maintenance of the facility's equipment, arranging for repair as necessary. --Oversees inventory control to ensure that the facility has sufficient accessibility to supplies and maintains an appropriate storage level. Be responsible for ordering and receiving parts/supplies, managing chemical waste compliance, handling administrative support for office duties and center billing. Be fiscally responsible for the Electron Microscopy Recharge Center. --Provides educational opportunities in assisting and facilitating lab assignments and other educational activities. Organizes and performs demonstrations/tutorials for users seeking to apply advanced EM techniques. Develops protocols for performing advanced EM techniques, including usage policies, training procedures and user tests. Give oral/poster presentations and tours of the Electron Microscopy Center to internal and external potential users to increase the number of researchers utilizing the facility. --Performs miscellaneous job-related duties as necessary. BNC reserves the right to add or change duties at any time. Qualifications Required: * Ph.D. in science, engineering, or closely related field. * Two years research experience in TEM and FIB/SEM. * Hands-on EM experience spanning from sample preparation to advanced techniques including, but not limited to, scanning electron microscopy, energy dispersive spectroscopy, electron backscatter diffraction, transmission electron microscopy (HRTEM, diffraction contrast & defect analysis), electron energy loss spectroscopy, spectroscopic imaging, tomographic imaging, and STEM microanalyses. * Hands-on experience in sample preparation by FIB (lift-out technique with Klocke Nanomanipulator) and conventional techniques (polishing wheel, diamond saw, ultrasonic disc cutter, dimple grinder, PIPS). * Ability to assist the internal/external researchers on a wide variety of materials characterization projects that cover the full spectrum of materials (i.e., metals, ceramics, semi-conductors/devices, composites, polymers and biological materials) ranging in size from the macro- to nano-scale. * Excellent communication and interpersonal skills and strong commitment to collaborative research involving internal/external users of BNC. * Strong organizational and time management skills with the ability to carry out several projects simultaneously. Preferred: * Experience in environmental TEM. Additional Information: * A background check is required for employment in this position. * FLSA: Exempt (Not Eligible For Overtime). * Retirement Eligibility: Defined Contributions Immediately. * Purdue University is an equal opportunity, equal access, affirmative action employer. -------------- next part -------------- An HTML attachment was scrubbed... URL: From info at fabsurplus.com Thu Oct 11 15:37:43 2012 From: info at fabsurplus.com (Stephen CS Howe) Date: Thu, 11 Oct 2012 21:37:43 +0200 Subject: [labnetwork] Reclaimed Water Issue In-Reply-To: References: Message-ID: <1349984263.2269.5.camel@samsung> Dear Jeff, I have some experience regarding residue buildup in cooling water tubes. My input is that it is essential to use black ot dark colored tubing. The reason for this is organic algal growth will occur if any light can penetrate the water tubes. We first used a fungicide when we discovered the algae in our cooling system, but later discovered that it was not necessary to use a fungicide if the tubes were dark colored. The algal growth is typically a brown color like what you describe. We never did an organic analysis of what grew. Yours sincerely, Stephen Howe Company Owner SDI Fabsurplus Group +1 830 388 1071 (Mobile) +39 335 710 7756 (Italy Mobile) Skype: Stephencshowe WWW.FABSURPLUS.COM Japan-Italy-Ireland-USA On Wed, 2012-10-03 at 13:16 -0400, Kuhn, Jeffrey G wrote: > Good Day All, > > The campus water supply at Purdue is quite hard. As a result, we have > seen a significant buildup of scale in our exhaust scrubber, liquid > ring vacuum pumps, and burn boxes. This required periodic shutdowns to > remove the scale, which was expensive and time consuming. We have > since installed a water reclaim system to capture RO, ultrafilter, and > EDI reject streams for use as makeup water for the systems mentioned > above. The water from those waste streams has been softened, thus we > eliminated the scaling issue. > > Unfortunately, in solving the scaling issue we have created a new > problem. A brown, slimy, stringy, substance builds up in the storage > tank. It clings to the tank walls, peels off in sheets, and gets > pumped to the points of use where it causes fouling. It settles to the > bottom of the storage tank and coats the tank walls and process > piping. We have to semi-annually drain and clean the tank to prevent > severe fouling at the points of use. > > We have verified that the material is not viable (I was surprised by > this). Analysis shows that it is primarily comprised of iron. Purdue > uses ground water that is high in iron for its potable water supply. > In order to protect the water distribution infrastructure, a > monophosphate-based agent is added to the water in order to sequester > dissolved iron. This helps prevent the iron from oxidizing and > precipitating inside the piping system. It would seem that their > sequestering agent is strong enough to prevent the dissolved iron from > being completely removed by IX in the UPW system softeners. > > My belief is that dissolved iron becomes concentrated at the RO in the > reject brine stream and then oxidizes in the storage tank, combining > with phosphate to form the slime we are seeing. I do not believe the > ultrafilter or EDI loop reject streams are major contributors to the > problem due to the high purity of these waters. We do not have enough > information yet to prove or disprove my theory. > > I realize that this is a rather unusual problem, but I was hoping that > some of you may also have installed reclaim water systems and can > provide some insight as to how to deal with this issue. We are > considering installing a filtration system, but it is expensive and I > am not yet convinced that it will solve the problem. > > Thank you in advance for your feedback. > > Jeff Kuhn > > Facility Engineer > > Birck Nanotechnology Center > > Purdue University > > 1205 W. State St. > > West Lafayette, IN 47907 > > Ph: (765) 496-8329 > > Fax: (765) 496-2018 > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From michael.rooks at yale.edu Fri Oct 12 09:45:22 2012 From: michael.rooks at yale.edu (Michael Rooks) Date: Fri, 12 Oct 2012 09:45:22 -0400 Subject: [labnetwork] Reclaimed Water Issue In-Reply-To: <1349984263.2269.5.camel@samsung> References: <1349984263.2269.5.camel@samsung> Message-ID: <50781EF2.1000102@yale.edu> Stephen is correct that the use of black tubing impedes the growth of algae (or fungus, whatever it is). Unfortunately, many brands of black hose start cracking badly after only one year; certainly the type sold at Home Depot is really quite poor. We had to replace all of our black hose on the cooling systems. Clear, nylon-reinforced hose is a lot more durable for water. To stop the growth of "black goo" we simply include 5% isopropyl alcohol in the cooling water, which is also a great way to recycle the IPA we use for developer (IPA+water is used to develop PMMA resist.) If you want to use something even less toxic, you could recycle waste ethanol. --------------------- Michael Rooks Yale Institute for Nanoscience & Quantum Engineering nano.yale.edu On 10/11/2012 03:37 PM, Stephen CS Howe wrote: > Dear Jeff, > > I have some experience regarding residue buildup in cooling water tubes. > My input is that it is essential to use black ot dark colored tubing. > The reason for this is organic algal growth will occur if any light can > penetrate the water tubes. > We first used a fungicide when we discovered the algae in our cooling > system, but later discovered that it was not necessary to use a > fungicide if the tubes were dark colored. > > The algal growth is typically a brown color like what you describe. We > never did an organic analysis of what grew. > > Yours sincerely, > > Stephen Howe > Company Owner > SDI Fabsurplus Group > > +1 830 388 1071 (Mobile) > +39 335 710 7756 (Italy Mobile) > Skype: Stephencshowe > > WWW.FABSURPLUS.COM > > Japan-Italy-Ireland-USA > > On Wed, 2012-10-03 at 13:16 -0400, Kuhn, Jeffrey G wrote: >> Good Day All, >> >> The campus water supply at Purdue is quite hard. As a result, we have >> seen a significant buildup of scale in our exhaust scrubber, liquid >> ring vacuum pumps, and burn boxes. This required periodic shutdowns to >> remove the scale, which was expensive and time consuming. We have >> since installed a water reclaim system to capture RO, ultrafilter, and >> EDI reject streams for use as makeup water for the systems mentioned >> above. The water from those waste streams has been softened, thus we >> eliminated the scaling issue. >> >> Unfortunately, in solving the scaling issue we have created a new >> problem. A brown, slimy, stringy, substance builds up in the storage >> tank. It clings to the tank walls, peels off in sheets, and gets >> pumped to the points of use where it causes fouling. It settles to the >> bottom of the storage tank and coats the tank walls and process >> piping. We have to semi-annually drain and clean the tank to prevent >> severe fouling at the points of use. >> >> We have verified that the material is not viable (I was surprised by >> this). Analysis shows that it is primarily comprised of iron. Purdue >> uses ground water that is high in iron for its potable water supply. >> In order to protect the water distribution infrastructure, a >> monophosphate-based agent is added to the water in order to sequester >> dissolved iron. This helps prevent the iron from oxidizing and >> precipitating inside the piping system. It would seem that their >> sequestering agent is strong enough to prevent the dissolved iron from >> being completely removed by IX in the UPW system softeners. >> >> My belief is that dissolved iron becomes concentrated at the RO in the >> reject brine stream and then oxidizes in the storage tank, combining >> with phosphate to form the slime we are seeing. I do not believe the >> ultrafilter or EDI loop reject streams are major contributors to the >> problem due to the high purity of these waters. We do not have enough >> information yet to prove or disprove my theory. >> >> I realize that this is a rather unusual problem, but I was hoping that >> some of you may also have installed reclaim water systems and can >> provide some insight as to how to deal with this issue. We are >> considering installing a filtration system, but it is expensive and I >> am not yet convinced that it will solve the problem. >> >> Thank you in advance for your feedback. >> >> Jeff Kuhn >> >> Facility Engineer >> >> Birck Nanotechnology Center >> >> Purdue University >> >> 1205 W. State St. >> >> West Lafayette, IN 47907 >> >> Ph: (765) 496-8329 >> >> Fax: (765) 496-2018 >> >> >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From kbarnes at semitorrinc.com Mon Oct 15 00:09:29 2012 From: kbarnes at semitorrinc.com (Keith Barnes) Date: Mon, 15 Oct 2012 00:09:29 -0400 Subject: [labnetwork] DEZ compatibility In-Reply-To: References: Message-ID: Yasmin, please take a look at the attached Presentation. This is a great tool for labs doing WetOx, ALD, and any other processes needing water vapor or other polar chemicals in a safe, vapor, form. Thank you, Keith F. Barnes Sales Representative SEMITORR sales distribution service 6336 Patterson Pass Road Suite H Livermore, CA 94550 tel:?? 925.667.3607 cell: 925.337.2221 email:? kbarnes at semitorrinc.com web:? www.semitorrinc.com -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Yasmin Afsar Sent: Thursday, October 04, 2012 9:21 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] DEZ compatibility Dear colleagues, I am a graduate student at Princeton currently working on a new system for plasma-enhanced atomic layer deposition (PEALD) of ZnO and Al2O3. We are outsourcing the production of the gas manifold, and we need to supply this company with information about compatibility of our metal-organic precursors with various components in the manifold. Does anyone know the valve seat material compatibility for DEZ (diethyl zinc) vapor, or what type of seat material is typically used with DEZ? Since our group is new to ALD and to these materials, we really do not know. Any advice would be much appreciated! Thank you, Yasmin Yasmin Afsar Graduate Student Electrical Engineering Princeton University yafsar at princeton.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- A non-text attachment was scrubbed... Name: RASIRC H2O2 Delivery 2012 10 1 lite[1].pptx.pptx Type: application/vnd.openxmlformats-officedocument.presentationml.presentation Size: 2121248 bytes Desc: RASIRC H2O2 Delivery 2012 10 1 lite[1].pptx.pptx URL: From betemc at rit.edu Tue Oct 23 08:06:02 2012 From: betemc at rit.edu (Bruce Tolleson) Date: Tue, 23 Oct 2012 08:06:02 -0400 Subject: [labnetwork] Low Level Format for MAC Dos 2.0 or 2.2 Message-ID: Dear Labnetwork, I am trying to find a place that can do a low level format for MAC Dos circa 1984. I have new ST225 MFM hard drives but can't find a place that can format them for old MAC Dos . Does anyone know of a place that can help? Bruce E. Tolleson Rochester Institute of Technology 82 Lomb Memorial Drive, Bldg 17-2627 Rochester, NY 14623-5604 (585) 478-3836 [cid:image001.jpg at 01CDB0F5.3E5BC490] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: From matthieu.nannini at mcgill.ca Fri Oct 26 07:55:43 2012 From: matthieu.nannini at mcgill.ca (Matthieu Nannini, Dr.) Date: Fri, 26 Oct 2012 11:55:43 +0000 Subject: [labnetwork] special wafers Message-ID: Dear colleagues, I'm looking for specific kinds of wafers: 150mm DSP Si 1.2mm thick. I already tried a few suppliers (Addison, WRS and University Wafers) but all have lead time of 8 weeks or so. Would any of you know suppliers that could have this kind of wafers ? Thanks ----------------------------------- Matthieu Nannini McGill Nanotools Microfab Manager t: 514 398 3310 c: 514 758 3311 f: 514 398 8434 http://mnm.physics.mcgill.ca/ ------------------------------------ From dabunzow at lbl.gov Fri Oct 26 10:48:54 2012 From: dabunzow at lbl.gov (David A. Bunzow) Date: Fri, 26 Oct 2012 07:48:54 -0700 Subject: [labnetwork] special wafers In-Reply-To: References: Message-ID: <508AA2D6.3070007@lbl.gov> Matthieu, Not sure of your other technical specs for these ~double-thick wafers, so this may sound off the wall. Have you considered wafer bonding to create such a structure? David A. Bunzow User Facilities Program Manager The Molecular Foundry Materials Science Division Lawrence Berkeley National Laboratory 1 Cyclotron Road MS 67-3207 Berkeley, CA 94720 Office: 510-486-4574 FAX: 510-486-7424 Cell: 510-542-1747 On 10/26/2012 4:55 AM, Matthieu Nannini, Dr. wrote: > Dear colleagues, > > I'm looking for specific kinds of wafers: 150mm DSP Si 1.2mm thick. I already tried a few suppliers (Addison, WRS and University Wafers) but all have lead time of 8 weeks or so. > Would any of you know suppliers that could have this kind of wafers ? > > Thanks > > > ----------------------------------- > Matthieu Nannini > McGill Nanotools Microfab > Manager > t: 514 398 3310 > c: 514 758 3311 > f: 514 398 8434 > http://mnm.physics.mcgill.ca/ > ------------------------------------ > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Ben at mtpv.com Fri Oct 26 17:08:14 2012 From: Ben at mtpv.com (Ben Zhang) Date: Fri, 26 Oct 2012 21:08:14 +0000 Subject: [labnetwork] 100X darkfield microscope Message-ID: <4CB611B3163C434FBC128AF4E4ACAAAA1EA01AE9@CH1PRD0711MB430.namprd07.prod.outlook.com> Hi All, Is there anyone happen to have a cheap microscope have a darkfield view goes to 100X or more? Thanks We would like to buy one. BR Ben -------------- next part -------------- An HTML attachment was scrubbed... URL: From kevin.walsh at louisville.edu Mon Oct 29 11:24:06 2012 From: kevin.walsh at louisville.edu (Walsh,Kevin M.) Date: Mon, 29 Oct 2012 15:24:06 +0000 Subject: [labnetwork] 100X darkfield microscope In-Reply-To: <4CB611B3163C434FBC128AF4E4ACAAAA1EA01AE9@CH1PRD0711MB430.namprd07.prod.outlook.com> References: <4CB611B3163C434FBC128AF4E4ACAAAA1EA01AE9@CH1PRD0711MB430.namprd07.prod.outlook.com> Message-ID: <0D1ABD6DF2541B42A05BD6E6D3695411813D5009@EXMBX03.ad.louisville.edu> http://www.amscope.com/DarkfieldCon.html Accessories are avilable to convert a stereo microscope to quasi-darkfield and you can get up to 90X mag. Depending upon the application, they work OK. kw From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ben Zhang Sent: Friday, October 26, 2012 5:08 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] 100X darkfield microscope Hi All, Is there anyone happen to have a cheap microscope have a darkfield view goes to 100X or more? Thanks We would like to buy one. BR Ben -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Tue Oct 30 06:12:13 2012 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Tue, 30 Oct 2012 10:12:13 +0000 Subject: [labnetwork] 100X darkfield microscope In-Reply-To: <4CB611B3163C434FBC128AF4E4ACAAAA1EA01AE9@CH1PRD0711MB430.namprd07.prod.outlook.com> References: <4CB611B3163C434FBC128AF4E4ACAAAA1EA01AE9@CH1PRD0711MB430.namprd07.prod.outlook.com> Message-ID: Hi, I always use the following company for microscopes. Micro Optical Solutions LLC Dick Schneider ph 978-255-2220 Cell 978-697-2216 Regards Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ben Zhang Sent: Friday, October 26, 2012 5:08 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] 100X darkfield microscope Hi All, Is there anyone happen to have a cheap microscope have a darkfield view goes to 100X or more? Thanks We would like to buy one. BR Ben -------------- next part -------------- An HTML attachment was scrubbed... URL: