From diadiuk at MIT.EDU Thu Aug 1 08:00:40 2013 From: diadiuk at MIT.EDU (Vicky Diadiuk) Date: Thu, 1 Aug 2013 08:00:40 -0400 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: <51F95ED7.7020303@eecs.berkeley.edu> References: <51F95ED7.7020303@eecs.berkeley.edu> Message-ID: HI, I think it's ok to discuss process issues. The idea is to exchange information that affects the fabs. But I don't feel particularly strongly either way. Vicky On Jul 31, 2013, at 3:00 PM, Bill Flounders wrote: > Chandrashekar S Kambar, > Lab Network is primarily for operations discussions > or facility wide issues rather than detailed nanofabrication questions. > Please consider the mems talk venue for > questions at this level of process detail. > I also encourage you to contact Process Support > at CHA Industries > http://www.chaindustries.com/ > > I welcome dissenting opinion from the network > if I have misrepresented our forum. > > Thank you > Bill Flounders > UC Berkeley > > > > Chandrashekar S Kambar wrote: >> Hi, >> >> We are trying to optimize Ni with E-Beam Evaporator (TECPORT). >> >> The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK 2. >> ELECTRON BEAM PATTERN: Focused to one point (to the middle of the crucible). >> CRUCIBLE: Graphite. >> >> ISSUE: During the RAISE 1, everything seems to be normal and only the material in the middle of the crucible gets melted. During the RAISE 2 the material starts to spit out of the crucible. During the deposition the spitting increases drastically, thus we will be forced to stop the deposition. After the deposition when we take out the crucible, crucible was broken across the wall. However there was no damage done to the pocket holder (Hearth). >> >> Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) >> Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) >> During the deposition Power % goes up to 16% and the current goes up to 180 mA ( V = 6.99 KV constant). >> >> We need to know, if there is any way to reduce the crucible cracking and to avoid the spitting of the material. >> >> QUESTION 2: >> >> During the deposition the crucibles are cracked and its pieces are stuck with the Ni material. Is there any way to recover the material by removing the graphite pieces? >> >> Thanks and Regards, >> Chandrashekar S Kambar. >> >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From hbtusainc at yahoo.com Thu Aug 1 09:26:04 2013 From: hbtusainc at yahoo.com (Mario Portillo) Date: Thu, 1 Aug 2013 06:26:04 -0700 (PDT) Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: References: <51F95ED7.7020303@eecs.berkeley.edu> Message-ID: <1375363564.28818.YahooMailNeo@web140702.mail.bf1.yahoo.com> We have 4 cents now...I agree with Charles........ Mario A. Portillo Sr. High'born Technology USA Inc. Semiconductor Equipment Services 8130 Glades Road, #229 Boca Raton, FL 33434 561 479-1975 office 561 504-0244 cell hbtusainc at yahoo.com www.hbtusainc.com ________________________________ From: Charles Ellis To: "labnetwork at mtl.mit.edu" Sent: Wednesday, July 31, 2013 5:01 PM Subject: Re: [labnetwork] E-Beam Evaporation, Ni optimization. I could be wrong as the original intent ?of this forum, but I welcome the process questions.. ?I think it is a great place for the old guys like me and some of you to share our experiences and maybe help some of these young guys. ?As a lab manager I also welcome the operations discussions ? it does not seem that this forum is overly busy and so I vote we encourage process questions as well as operational questions. ?It seems to have been working quite well so far. I very much enjoy the traffic I have seen over the years.. Just my 2 cents! Charles Ellis? Auburn.. From: Bill Flounders Date: Wednesday, July 31, 2013 2:00 PM To: Chandrashekar S Kambar , "labnetwork at mtl.mit.edu" Subject: Re: [labnetwork] E-Beam Evaporation, Ni optimization. Chandrashekar S Kambar, Lab Network is primarily for operations discussions or facility wide issues rather than detailed nanofabrication questions. Please consider the mems talk venue for questions at this level of process detail. I also encourage you to contact Process Support at CHA Industries http://www.chaindustries.com/ I welcome dissenting opinion from the network if I have misrepresented our forum. Thank you Bill Flounders UC Berkeley Chandrashekar S Kambar wrote: Hi, >? >We are trying to optimize Ni with E-Beam Evaporator (TECPORT). >? >The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK 2. >ELECTRON BEAM PATTERN: Focused to one point (to the middle of the crucible). >CRUCIBLE: Graphite. >? >ISSUE: During the RAISE 1, everything seems to be normal and only the material in the middle of the crucible gets melted. During the RAISE 2 the material starts to spit out of the crucible. During the deposition the spitting increases drastically, thus we will be forced to stop the deposition. After the deposition when we take out the crucible, crucible was broken across the wall. However there was no damage done to the pocket holder (Hearth). >? >Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) >??????????????? Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) >??????????????? During the deposition Power % goes up to 16% and the current goes up to 180 mA ( V = 6.99 KV constant). >? >We need to know, if there is any way to reduce the crucible cracking and to avoid the spitting of the material. >? >QUESTION 2: >? >During the deposition the crucibles are cracked and its pieces are stuck with the Ni material. Is there any way to recover the material by removing the graphite pieces? >Thanks and Regards, >Chandrashekar S Kambar. > >? > > >_______________________________________________ labnetwork mailing list labnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From dgrimard at umich.edu Thu Aug 1 13:53:13 2013 From: dgrimard at umich.edu (Dennis Grimard) Date: Thu, 1 Aug 2013 13:53:13 -0400 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: References: <51F95ED7.7020303@eecs.berkeley.edu> Message-ID: I agree in principle with Bill ... the "original" intent of the this forum was to address facility operations and fab-level issues not process details or process equipment details ... I feel that the forum could become so diluted that many of us will "tune out" due to the volume of the questions ... On Wed, Jul 31, 2013 at 5:01 PM, Charles Ellis wrote: > I could be wrong as the original intent of this forum, but I welcome > the process questions.. I think it is a great place for the old guys like > me and some of you to share our experiences and maybe help some of these > young guys. As a lab manager I also welcome the operations discussions ? > it does not seem that this forum is overly busy and so I vote we encourage > process questions as well as operational questions. It seems to have been > working quite well so far. I very much enjoy the traffic I have seen over > the years.. > > Just my 2 cents! > > Charles Ellis? > Auburn.. > > From: Bill Flounders > Date: Wednesday, July 31, 2013 2:00 PM > To: Chandrashekar S Kambar , "labnetwork at mtl.mit.edu" > > Subject: Re: [labnetwork] E-Beam Evaporation, Ni optimization. > > Chandrashekar S Kambar, > Lab Network is primarily for operations discussions > or facility wide issues rather than detailed nanofabrication questions. > Please consider the mems talk venue for > questions at this level of process detail. > I also encourage you to contact Process Support > at CHA Industries > http://www.chaindustries.com/ > > I welcome dissenting opinion from the network > if I have misrepresented our forum. > > Thank you > Bill Flounders > UC Berkeley > > > > Chandrashekar S Kambar wrote: > > Hi, > > We are trying to optimize Ni with E-Beam Evaporator (TECPORT). > > The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK > 2. > ELECTRON BEAM PATTERN: Focused to one point (to the middle of the > crucible). > CRUCIBLE: Graphite. > > ISSUE: During the RAISE 1, everything seems to be normal and only the > material in the middle of the crucible gets melted. During the RAISE 2 the > material starts to spit out of the crucible. During the deposition the > spitting increases drastically, thus we will be forced to stop the > deposition. After the deposition when we take out the crucible, crucible > was broken across the wall. However there was no damage done to the pocket > holder (Hearth). > > Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) > Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) > During the deposition Power % goes up to 16% and the > current goes up to 180 mA ( V = 6.99 KV constant). > > We need to know, if there is any way to reduce the crucible cracking and > to avoid the spitting of the material. > > QUESTION 2: > > During the deposition the crucibles are cracked and its pieces are stuck > with the Ni material. Is there any way to recover the material by removing > the graphite pieces? > > Thanks and Regards, > Chandrashekar S Kambar. > > > > > _______________________________________________ > labnetwork mailing listlabnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- Dennis S Grimard, Ph.D Managing Director, Lurie Nanofabrication Facility University of Michigan 1246D EECS Building 1301 Beal Avenue Ann Arbor, MI 48109-2122 (734) 368-7172 (Cell) (734) 647-1781 (Fax) http://www.lnf.umich.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Thu Aug 1 09:16:36 2013 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 01 Aug 2013 09:16:36 -0400 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: References: Message-ID: <51FA5FB4.50506@udel.edu> I second Bill's motion. It would be best if we limited the discussions to topics that provide the environment (infrastructure, equipment, safety, management, billing, etc) that allows our customers to do their work. One could ignore items that are not of interest but I am concerned that the forum may be "flooded" with process-related questions. Iulian iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 On 7/31/2013 5:01 PM, Charles Ellis wrote: > I could be wrong as the original intent of this forum, but I welcome > the process questions.. I think it is a great place for the old guys > like me and some of you to share our experiences and maybe help some > of these young guys. As a lab manager I also welcome the operations > discussions -- it does not seem that this forum is overly busy and so > I vote we encourage process questions as well as operational > questions. It seems to have been working quite well so far. I very > much enjoy the traffic I have seen over the years.. > > Just my 2 cents! > > Charles Ellis... > Auburn.. > > From: Bill Flounders > > Date: Wednesday, July 31, 2013 2:00 PM > To: Chandrashekar S Kambar >, "labnetwork at mtl.mit.edu > " > > Subject: Re: [labnetwork] E-Beam Evaporation, Ni optimization. > > Chandrashekar S Kambar, > Lab Network is primarily for operations discussions > or facility wide issues rather than detailed nanofabrication questions. > Please consider the mems talk venue for > questions at this level of process detail. > I also encourage you to contact Process Support > at CHA Industries > http://www.chaindustries.com/ > > I welcome dissenting opinion from the network > if I have misrepresented our forum. > > Thank you > Bill Flounders > UC Berkeley > > > > Chandrashekar S Kambar wrote: >> >> Hi, >> >> We are trying to optimize Ni with E-Beam Evaporator (TECPORT). >> >> The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, >> SOAK 2. >> ELECTRON BEAM PATTERN: Focused to one point (to the middle of the >> crucible). >> CRUCIBLE: Graphite. >> >> ISSUE: During the RAISE 1, everything seems to be normal and only the >> material in the middle of the crucible gets melted. During the RAISE >> 2 the material starts to spit out of the crucible. During the >> deposition the spitting increases drastically, thus we will be forced >> to stop the deposition. After the deposition when we take out the >> crucible, crucible was broken across the wall. However there was no >> damage done to the pocket holder (Hearth). >> >> Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) >> Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) >> During the deposition Power % goes up to 16% and the >> current goes up to 180 mA ( V = 6.99 KV constant). >> >> We need to know, if there is any way to reduce the crucible cracking >> and to avoid the spitting of the material. >> >> QUESTION 2: >> >> During the deposition the crucibles are cracked and its pieces are >> stuck with the Ni material. Is there any way to recover the material >> by removing the graphite pieces? >> >> Thanks and Regards, >> Chandrashekar S Kambar. >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From evporte at uark.edu Mon Aug 5 17:06:30 2013 From: evporte at uark.edu (Errol V. Porter) Date: Mon, 5 Aug 2013 21:06:30 +0000 Subject: [labnetwork] UARK STS multiplex ASE high coil reflectance resolved Message-ID: <49510757561B8E4EB8076830B69BF2775761363C@ex-mbx3.uark.edu> Greetings, I just wanted to inform the forum that we were able to identify the high coil reflectance problem in our ASE. Our ENI VL400 phase shift oscillator was determined to be the culprit. With help from the OEM {who fortunately monitors this forum}, we determined it was not working correctly. A refurbished replacement was installed today and the problem has gone away. I would like to thank everyone who provided suggestions on how to troubleshoot this issue. It is greatly appreciated. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From tbritton at criticalsystemsinc.com Mon Aug 12 23:19:50 2013 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Tue, 13 Aug 2013 03:19:50 +0000 Subject: [labnetwork] 1989 Oxford VG80 MBE System Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EFFDEEF@P3PWEX2MB006.ex2.secureserver.net> Hello all, A friend of mine at the US Army has a 1989 Oxford Instruments VG80 molecular beam epitaxy tool and he is trying to find parts for it. Currently he is looking for bearings for the trolley. Does anyone have an idea if there is a good source for spares for this tool? He is telling me that since Oxford sold this business unit to Riber that he's having a difficult time getting support. Any help would be greatly appreciated. Thanks all! Sincerely, Tom Britton Director of Sales Critical Systems, Inc. Direct: 208-890-1417 Office: 877-572-5515 www.CriticalSystemsInc.com [logo for email signature png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 9501 bytes Desc: image001.png URL: From khbeis at uw.edu Tue Aug 13 17:00:06 2013 From: khbeis at uw.edu (Michael Khbeis) Date: Tue, 13 Aug 2013 14:00:06 -0700 Subject: [labnetwork] Phosphine sources Message-ID: <822BFC73-C4CE-40BE-AA37-CF5522E862AA@uw.edu> Dear Colleagues, I remember hearing (I think it was UGIM) about NIST using sub-atmospheric sources for doping gases (e.g. phosphine, diborane). I was wondering if you have similar experience or do I need to plan for the traditional gas feeds via a cabinet from our HPM bunker? Best, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (F) 206.221.1681 (C) 443.254.5192 khbeis at uw.edu http://www.engr.washington.edu/mff/ From bill at eecs.berkeley.edu Tue Aug 13 20:44:49 2013 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Tue, 13 Aug 2013 17:44:49 -0700 Subject: [labnetwork] Phosphine sources In-Reply-To: <822BFC73-C4CE-40BE-AA37-CF5522E862AA@uw.edu> References: <822BFC73-C4CE-40BE-AA37-CF5522E862AA@uw.edu> Message-ID: <520AD301.2000007@eecs.berkeley.edu> UC Berkeley reviewed sub atmospheric (SA) delivery several years ago. While the technology had some specific advantages it had the following reservations: 1. there was only single supplier of SA cylinders and hence only a single supplier of that gas. No competition for cost savings - you become a captive customer for that gas. 2. The vendor required we purchase and install a specific gas cabinet / gas panel to insure protection of their custom cylinder with absorbent media. No competition for gas cabinet savings - you become captive customer for that gas cabinet - and it was relatively expensive. 3. Only select pure gases can be provided. Gas mixtures not possible due to variable gas desorption rates with gas mixtures. Not all pure gases compatible with absorbent media. 4. Unclear if authority having jurisdiction (AHJ) will relax any containment and detection requirements. You will likely still pursue all containment and detection best practices. Bill Flounders UC Berkeley Michael Khbeis wrote: > Dear Colleagues, > > I remember hearing (I think it was UGIM) about NIST using sub-atmospheric sources for doping gases (e.g. phosphine, diborane). I was wondering if you have similar experience or do I need to plan for the traditional gas feeds via a cabinet from our HPM bunker? > > Best, > > Dr. Michael Khbeis > Associate Director > Microfabrication Facility (MFF) > University of Washington > Fluke Hall, Box 352143 > (O) 206.543.5101 > (F) 206.221.1681 > (C) 443.254.5192 > khbeis at uw.edu > http://www.engr.washington.edu/mff/ > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dgrimard at umich.edu Wed Aug 14 07:52:52 2013 From: dgrimard at umich.edu (Dennis Grimard) Date: Wed, 14 Aug 2013 07:52:52 -0400 Subject: [labnetwork] Phosphine sources In-Reply-To: <520AD301.2000007@eecs.berkeley.edu> References: <822BFC73-C4CE-40BE-AA37-CF5522E862AA@uw.edu> <520AD301.2000007@eecs.berkeley.edu> Message-ID: <0C9485E5-F9CF-4FAA-9701-95F63B840C8D@umich.edu> I could not have said it better. I would add that the cost per cylinder is significant ... Dennis S Grimard, Ph.D. Managing Director Lurie Nanofabrication Facility 1246D EECS Bldg University of Michigan Ann Arbor, MI 48103 (734) 368-7172 Cell On Aug 13, 2013, at 8:44 PM, Bill Flounders wrote: > UC Berkeley reviewed sub atmospheric (SA) delivery several years ago. > While the technology had some specific advantages it had the > following reservations: > 1. there was only single supplier of SA cylinders and hence only > a single supplier of that gas. No competition for cost > savings - you become a captive customer for that gas. > 2. The vendor required we purchase and install a specific > gas cabinet / gas panel to insure protection of their custom > cylinder with absorbent media. No competition for gas cabinet > savings - you become captive customer for that gas cabinet > - and it was relatively expensive. > 3. Only select pure gases can be provided. Gas mixtures not > possible due to variable gas desorption rates with gas mixtures. > Not all pure gases compatible with absorbent media. > 4. Unclear if authority having jurisdiction (AHJ) will relax > any containment and detection requirements. You will likely > still pursue all containment and detection best practices. > > Bill Flounders > UC Berkeley > > > > > Michael Khbeis wrote: >> Dear Colleagues, >> >> I remember hearing (I think it was UGIM) about NIST using sub-atmospheric sources for doping gases (e.g. phosphine, diborane). I was wondering if you have similar experience or do I need to plan for the traditional gas feeds via a cabinet from our HPM bunker? >> >> Best, >> >> Dr. Michael Khbeis >> Associate Director >> Microfabrication Facility (MFF) >> University of Washington >> Fluke Hall, Box 352143 >> (O) 206.543.5101 >> (F) 206.221.1681 >> (C) 443.254.5192 >> khbeis at uw.edu >> http://www.engr.washington.edu/mff/ >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From Vincent.Luciani at nist.gov Wed Aug 14 08:00:59 2013 From: Vincent.Luciani at nist.gov (Luciani, Vincent) Date: Wed, 14 Aug 2013 12:00:59 +0000 Subject: [labnetwork] Phosphine sources In-Reply-To: <822BFC73-C4CE-40BE-AA37-CF5522E862AA@uw.edu> References: <822BFC73-C4CE-40BE-AA37-CF5522E862AA@uw.edu> Message-ID: <1d365e92e49a4fd6b5a5ec3e8bd3cd84@BLUPR09MB008.namprd09.prod.outlook.com> Hello, My colleague Jerry Bowser talked about this project at UGIM 2012. The abstract and presentation are attached. Feel free to contact Jerry or I if you have any questions. Thanks, Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Khbeis Sent: Tuesday, August 13, 2013 5:00 PM To: labnetwork at mtl.mit.edu Network Subject: [labnetwork] Phosphine sources Dear Colleagues, I remember hearing (I think it was UGIM) about NIST using sub-atmospheric sources for doping gases (e.g. phosphine, diborane). I was wondering if you have similar experience or do I need to plan for the traditional gas feeds via a cabinet from our HPM bunker? Best, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (F) 206.221.1681 (C) 443.254.5192 khbeis at uw.edu http://www.engr.washington.edu/mff/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- A non-text attachment was scrubbed... Name: A Phosphine Sub Atmospheric Delivery System.pdf Type: application/pdf Size: 62581 bytes Desc: A Phosphine Sub Atmospheric Delivery System.pdf URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PhosphineDeliverySystemJuly2012.pptx Type: application/vnd.openxmlformats-officedocument.presentationml.presentation Size: 4475898 bytes Desc: PhosphineDeliverySystemJuly2012.pptx URL: From codreanu at udel.edu Thu Aug 15 11:22:39 2013 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 15 Aug 2013 11:22:39 -0400 Subject: [labnetwork] Lithography Engineer at UDNF Message-ID: <520CF23F.8050404@udel.edu> Dear Colleagues, I am looking to hire a lithography engineer for UD's upcoming nanofabrication facility. Among other things the successful candidate will be responsible for specifying, acquiring, installing, qualifying, and managing a 100 kV e-beam lithography system. I would like to kindly ask for your help in distributing the attached position description to your user lists and to other parties who may be interested. With many thanks, Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD NanoFab University of Delaware 149 Evans Hall Newark, DE 19716 302-831-2784 -------------- next part -------------- A non-text attachment was scrubbed... Name: udjobs_LithoEngineer_2013.pdf Type: application/pdf Size: 681920 bytes Desc: not available URL: From tbritton at criticalsystemsinc.com Fri Aug 16 08:20:32 2013 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Fri, 16 Aug 2013 12:20:32 +0000 Subject: [labnetwork] CSI Awards Scholarship to University Student for Nanomaterial's Research Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EFFFE4D@P3PWEX2MB006.ex2.secureserver.net> http://www.criticalsystemsinc.com/scholarships Hello all, A while back several of you helped us determine the requirements for CSI's newly created scholarship program. Deemed "Breakthrough Technologies Scholarship", CSI will award this scholarship to a student twice a year who shows work in the advanced technology studies such as nanotechnology, semiconductors, physics, etc. We feel that the advancements your students are making, and the work they are doing in your facilities, will improve the future for all of us and our children, and we want to do our part to support your students research efforts. It is our goal over time to bring other companies in under this scholarship to grow the award amount to the point where it becomes a sizable sum of money where we can help fund specific research programs. The winner of the CSI Fall 2103 Breakthrough Technologies Scholarship is Stanford's Ryan Swoboda.! Ryan's work with synthesis and characterization of novel nanomaterials, namely the assembly of chalcogenide materials, will have applications in quantum computing, biolabelling, and potentially hydrogen storage. We selected Ryan from over 50 scholarship entries, and we wish him much success with his research. We will be accepting entries for the Winter 2013 Scholarship between September 15th and October 31st, and will award our next scholarship November 15th. If you have students who you feel would benefit by receiving this extra money, please send them this link: http://www.criticalsystemsinc.com/scholarships They can also check their University's Financial Aid & Scholarships page. Our scholarship currently resides in this section within many Universities websites. If you want it to be listed in yours, please let me know who to contact, and we'll get with them to make this scholarship available to your student body as well. Thank you again for all who helped to make this happen. Sincerely, Tom Britton Director of Sales Critical Systems, Inc. Direct: 208-890-1417 Office: 877-572-5515 www.CriticalSystemsInc.com [logo for email signature png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 9501 bytes Desc: image001.png URL: From ds120 at gatech.edu Mon Aug 26 15:09:56 2013 From: ds120 at gatech.edu (Dean Sutter) Date: Mon, 26 Aug 2013 15:09:56 -0400 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols Message-ID: <521BA804.4070009@gatech.edu> Hello, AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. So, we are seeking a benchmark from existing facilities that use BCL3. Anyone care to volunteer to explain their installation and operating/safety protocols? Thanks -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu From roberthamilton at berkeley.edu Mon Aug 26 18:34:36 2013 From: roberthamilton at berkeley.edu (Bob Hamilton) Date: Mon, 26 Aug 2013 15:34:36 -0700 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521BA804.4070009@gatech.edu> References: <521BA804.4070009@gatech.edu> Message-ID: <521BD7FC.5080306@berkeley.edu> Colleagues, I can share a UC Berkeley anecdote about delivering SICL4 via a long gas delivery line. SiCL4 has similar issues to Dean's query about BCl3 delivery experience. SiCl4 has similar issues of a liquid/gas phase transition at low pressures, at 20 C. Without problem, we delivered SICl4 to an etcher using one of our standard cylinder gas automated gas panels by adjusting the delivery pressure to about half the cylinder pressure. We felt confident the SiCl4 would remain in a gas phase. Thus, we delivered at ~ 2 psi absolute. As it turned out, one of a series of fan-coil units that delivered tempered air to the HEPA banks had been out of order since we commissioned the lab. This did not cause a significant problem as we had excess cooling capacity; however, we eventually got around to fixing it. Shortly thereafter we began seeing BCL3 delivery problems to an etcher. It took a while to associate this fan-coil repair with BCl3 delivery problems. The BCL3 line had been routed directly under one of the cold-air discharge points. The fix for this problem was obvious; however, it took a while to make the association between a air-handler fix and the BCl3 delivery issue. The lesson I learned is gas panels for subambient pressure need better low-pressure gauging than standard gas panels and better regulators. It is worth purchasing a dedicated subambient-delivery regulator. Regards, Bob Hamilton On 8/26/2013 12:09 PM, Dean Sutter wrote: > Hello, > > AT GT Nano we have a hard plumbed BCL3 line coming from a central gas > room, running several hundred feet into the sub fab eventually > connecting to the tools. > > We have been internally debating the necessary protocols and physical > installations necessary to ensure a safe and properly functioning > delivery mechanism. > > These discussions have included the elimination of the central > approach, replaced with a local gas cabinet and shorter runs since > maintaining and being able to monitor line heaters on a several > hundred foot of line, buried in plumbing up in the ceiling is our > primary concern. > > So, we are seeking a benchmark from existing facilities that use BCL3. > > Anyone care to volunteer to explain their installation and > operating/safety protocols? > > Thanks > -- Robert Hamilton University of California at Berkeley Marvell NanoLab Equipment Eng. Mgr. Room 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu Phone: 510-809-8600 Mobile: 510-325-7557 e-mail preferred From fouad.karouta at anu.edu.au Mon Aug 26 20:42:38 2013 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Tue, 27 Aug 2013 00:42:38 +0000 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521BA804.4070009@gatech.edu> References: <521BA804.4070009@gatech.edu> Message-ID: <3AFA8059AACADA449EA87434415992BA61CFE5@SINPRD0610MB356.apcprd06.prod.outlook.com> Dear Dean, At ANFF ACT Node we use BCl3 in our ICP system. Here follows the way we installed it: 1- The cylinder is located in an individual exhausted gas cabinet located outside the lab in a dedicated gas shed. The SS tubing going to the ICP tool is argon welded (single line) and is about 10m long. No other appendages are used between the gas panel in the gas cabinet and the gaspod of the tool. 2- We have a low pressure (secondary side) pressure regulator with a reading of -4PSI (maybe the gauge is faulty). From the panel the SS tubing is heated at 30?C. 3- We monitor the gas through three BCl3 sensors (from Bionics): one sampling the exhaust of the gas cabinet, one sampling the tool gaspod (exhaust) and one monitoring the open air around the system. Also we do have a shared gas sensor (with Cl2) to monitor the exhaust of the dry scrubber (Clean Systems). Hope this is helpful. Regards, Fouad ********************************* Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter Sent: Tuesday, 27 August 2013 5:10 AM To: Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols Hello, AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. So, we are seeking a benchmark from existing facilities that use BCL3. Anyone care to volunteer to explain their installation and operating/safety protocols? Thanks -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Tue Aug 27 06:07:13 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Tue, 27 Aug 2013 10:07:13 +0000 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521BA804.4070009@gatech.edu> References: <521BA804.4070009@gatech.edu> Message-ID: Hi, At Draper Laboratory we placed the BCL3 cabinet next to the tool. We did not want to bother with heated lines and all the plumbing involved. The closer the better. Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter Sent: Monday, August 26, 2013 3:10 PM To: Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols Hello, AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. So, we are seeking a benchmark from existing facilities that use BCL3. Anyone care to volunteer to explain their installation and operating/safety protocols? Thanks -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dgrimard at umich.edu Tue Aug 27 07:08:52 2013 From: dgrimard at umich.edu (Dennis Grimard) Date: Tue, 27 Aug 2013 07:08:52 -0400 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521BA804.4070009@gatech.edu> References: <521BA804.4070009@gatech.edu> Message-ID: <58171F38-A04E-4EF0-B2DA-E7532F44734D@umich.edu> Dean: I would add the following comments: (1) limit the number if 90 degree weldments ... Use large radius bends whenever possible, (2) use close source supplies (place low vapor pressure gas bottles in close proximity to the tool), (3) refrain from using a single source to supply more than one tool, and (4) minimize secondary enclosures with exhaust air flow (VMB's). I developed these rules of thumb while at IBM ... For production tools they are essential for a reliable supply to your tools. In a research environment they are good suggestions. Heating is always an option. I would start with simple insulation first. Watlow may make heat jackets specifically designed for lines (they make a large line of heat jackets for pump vacuum lines). They may not make them anymore but they did years ago ... There are other companies that may still make them. Lastly, the demand of the line is important too. That is, low flow conditions minimize the impact of not following these rules because the line acts as a supply as the gas condenses. As long as the flow is low the condensed gas will just revaporize to meet the need. Dennis S Grimard, Ph.D. Managing Director Lurie Nanofabrication Facility 1246D EECS Bldg University of Michigan Ann Arbor, MI 48103 (734) 368-7172 Cell On Aug 26, 2013, at 3:09 PM, Dean Sutter wrote: > Hello, > > AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. > > We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. > > These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. > > So, we are seeking a benchmark from existing facilities that use BCL3. > > Anyone care to volunteer to explain their installation and operating/safety protocols? > > Thanks > > -- > Dean A. Sutter > Associate Director, > Research Operations and Industry Engagements > > dean.sutter at ien.gatech.edu > 404 894 3847 - Office > 404 558 1844 - Cell > www.ien.gatech.edu > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From ds120 at gatech.edu Tue Aug 27 08:03:35 2013 From: ds120 at gatech.edu (Dean Sutter) Date: Tue, 27 Aug 2013 08:03:35 -0400 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: References: <521BA804.4070009@gatech.edu> Message-ID: <521C9597.6050508@gatech.edu> Thanks to all for your responses. The information will be helpful. Best regards On 8/27/2013 6:07 AM, Morrison, Richard H., Jr. wrote: > Hi, > > At Draper Laboratory we placed the BCL3 cabinet next to the tool. We did not want to bother with heated lines and all the plumbing involved. The closer the better. > > Rick > > > Draper Laboratory > Group Leader Microfabrication Operations > 555 Technology Square > Cambridge Ma, 02139-3563 > > www.draper.com > rmorrison at draper.com > W 617-258-3420 > C 508-930-3461 > > > > -----Original Message----- > From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter > Sent: Monday, August 26, 2013 3:10 PM > To: > Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen > Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols > > Hello, > > AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. > > We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. > > These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. > > So, we are seeking a benchmark from existing facilities that use BCL3. > > Anyone care to volunteer to explain their installation and operating/safety protocols? > > Thanks > > -- > Dean A. Sutter > Associate Director, > Research Operations and Industry Engagements > > dean.sutter at ien.gatech.edu > 404 894 3847 - Office > 404 558 1844 - Cell > www.ien.gatech.edu > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu From spaolini at cns.fas.harvard.edu Tue Aug 27 10:56:46 2013 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Tue, 27 Aug 2013 14:56:46 +0000 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521BA804.4070009@gatech.edu> References: <521BA804.4070009@gatech.edu> Message-ID: I agree with Bob Hamilton. I have gone through all the problems associated with low vapor pressure liquid source gases and the only method that has worked flawlessly for me is to lower the delivery pressure to keep the material in vapor form. This is a common problem with gases such as Boron Trichloride and Dichlorosilane. In the past, we have heated lines, cylinders, and any other object in the gas circuitry in an effort to keep the gas from condensing into liquid but the material always finds something cooler (like an MFC) and it results in condensation problems. Good ole' high school physics tells us if you lower the pressure surrounding a liquid, you lower the boiling point proportionally. I now purchase sub-atmospheric regulators and run these gases at the lowest possible pressure that will still deliver full flow and then add about 10% more. Typical pressures for Dichlorosilane are around 1 in Hg to 1 PSI and for Boron Trichloride about 3 PSI due to the higher flows used. Luckily, these gases are almost always used in a vacuum system. Steve Paolini Equipment Dood Harvard University Center For Nanoscale Systems -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter Sent: Monday, August 26, 2013 3:10 PM To: Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols Hello, AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. So, we are seeking a benchmark from existing facilities that use BCL3. Anyone care to volunteer to explain their installation and operating/safety protocols? Thanks -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From ccheney at infinityhps.com Tue Aug 27 11:08:35 2013 From: ccheney at infinityhps.com (Craig Cheney) Date: Tue, 27 Aug 2013 10:08:35 -0500 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521BA804.4070009@gatech.edu> References: <521BA804.4070009@gatech.edu> Message-ID: <00b501cea337$59ebafb0$0dc30f10$@infinityhps.com> Dean, We have done numerous BCL3 systems for different customers, mostly semiconductor, but a few others. Here are the major points we hit with customers that cover code compliance, safety, and the proper design for a BCl3 system. Some of these have been mentioned before but will run through them quick for you. 1. Keeping the gas source as close to the point of use is very beneficial, reduces line length etc. and all the problems that come with that, given the nature of BCL3. 2. The gas cabinet needs to be ventilated properly, this does two things, first, in the event of a leak its exhausted. Second, if your building is 72F or cooler, this will help chill the cylinder. 3. A typical BCL3 system has the cylinder chilled with a cooling blanket (you can get them from accurate gas, http://accurategas.com/). And the delivery panel as well as the gas line should be heat traced also. 68 - 70F on the cylinder, and 75 F or higher on the gas line. 4. The process delivery line is supposed to be coaxial, closed/open design so the gas is forced to your gas detection point, the gas delivery system should be Orbitally welded throughout. 5. Use high quality electro-polished seamless stainless steel for the wetted portion of the gas line. The gas panel needs to be capable of performing cycle purges on the panel, gas line, and pigtail. 6. All regulators, valves, etc. should be rated for use with extreme corrosives. 7. If you are delivering this gas to more than one tool and you the required coaxial gas lines, you will need to use a Valve Manifold Box to deliver gas to more than one point. 8. The vapor pressure of BCL3 is 4 psi, if you try to deliver a higher pressure than 4 psi, you will not get it, and if you try heating the cylinder to raise the pressure, you will add numerous problems to your system, the gas will turn back into a liquid on the first surface it hits that is in the 70F range, trashing MFC's, reducing gas flow, and pulling liquid into your process chamber. 9. Your gas delivery panel should incorporate a nitrogen bleed on the pigtail during cylinder changes to prevent moisture from entering any of the wetted components, failure to do this will result in failed components such as regulators, MFC's, etc. 10. Minimizing bends and changes in direction is always best, but if the gas line is properly heat traced and the cylinder is chilled, you should not have any problems. We have installed systems for BCL3 where the line length is over 100' with no problems. 11. One key point, if the gas delivery line has gas in it, it should be heated 24X7, if the usage of this gas is low (once a week or less) than you should consider doing a cycle purge on the gas line and leaving it under vacuum when not in use. Hope that helps, and feel free to give me a call if you have any other questions. Craig Cheney Infinity High Purity Systems ? Desk:? (608)834-4200 Fax:???? (608)834-4299 Cell:??? (608)438-8714 This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer. -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter Sent: Monday, August 26, 2013 2:10 PM To: Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols Hello, AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. So, we are seeking a benchmark from existing facilities that use BCL3. Anyone care to volunteer to explain their installation and operating/safety protocols? Thanks -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From reynolds at ece.ucsb.edu Tue Aug 27 12:05:06 2013 From: reynolds at ece.ucsb.edu (Tom Reynolds) Date: Tue, 27 Aug 2013 09:05:06 -0700 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: References: <521BA804.4070009@gatech.edu> Message-ID: <062001cea33f$32316c50$969444f0$@ucsb.edu> I agree with Bob and Steve. This is our approach at UCSB with our BCl3. We feed multiple tools from one source with over 100' of 1/4" SS coax line. Keep the cylinder pressure as low as possible with a sub atmospheric regulator while maintaining the appropriate total flow. This took us a little time to figure out originally as we set up the lab, but has worked fine since the adjustments. -------------------------------------------------------------- Tom Reynolds, Lab Manager UCSB Nanofabrication Facility Electrical and Computer Engineering Dept. Engineering Science Bldg #225, Room 1109E Santa Barbara, CA 93106 805-893-3918 x215 office 805-451-3979 cell 805-893-3918 fax reynolds at ece.ucsb.edu -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paolini, Steven Sent: Tuesday, August 27, 2013 7:57 AM To: Dean Sutter; Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen Subject: Re: [labnetwork] BCL3 - Gas Line Heaters and Protocols I agree with Bob Hamilton. I have gone through all the problems associated with low vapor pressure liquid source gases and the only method that has worked flawlessly for me is to lower the delivery pressure to keep the material in vapor form. This is a common problem with gases such as Boron Trichloride and Dichlorosilane. In the past, we have heated lines, cylinders, and any other object in the gas circuitry in an effort to keep the gas from condensing into liquid but the material always finds something cooler (like an MFC) and it results in condensation problems. Good ole' high school physics tells us if you lower the pressure surrounding a liquid, you lower the boiling point proportionally. I now purchase sub-atmospheric regulators and run these gases at the lowest possible pressure that will still deliver full flow and then add about 10% more. Typical pressures for Dichlorosilane are around 1 in Hg to 1 PSI and for Boron Trichloride about 3 PSI due to the higher flows u sed. Luckily, these gases are almost always used in a vacuum system. Steve Paolini Equipment Dood Harvard University Center For Nanoscale Systems -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter Sent: Monday, August 26, 2013 3:10 PM To: Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols Hello, AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. So, we are seeking a benchmark from existing facilities that use BCL3. Anyone care to volunteer to explain their installation and operating/safety protocols? Thanks -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From tbritton at criticalsystemsinc.com Tue Aug 27 19:25:47 2013 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Tue, 27 Aug 2013 23:25:47 +0000 Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols In-Reply-To: <521C9597.6050508@gatech.edu> References: <521BA804.4070009@gatech.edu> <521C9597.6050508@gatech.edu> Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2E0100BF2A@P3PWEX2MB006.ex2.secureserver.net> Hello Dean, I asked my Ops Manager how he dealt with BCl3 in a production Fab. He was the gas manager for ON Semi for 15 years, and has used BCl3, without issue, for most of his tenure there. Here's what I got from him: Chill the cylinders to 65F, remove regulators from the gas cabinet, temp control line from gas cabinet to VMB( 77 F +- 3F.) Regulators should be installed in VMB to reduce line pressure from VMB to Tool, temp from VMB to tool to around 83F+- 4F. Basically an increase in line temp from source to point of use and a decrease in pressure this system will flow flawlessly at distances upwards of 5 to 600'. I would recommend using 3/8" tubing from the gas cabinet to the VMB. After that it doesn't matter on size unless large amounts of BCL3 is used in process. The key factor is not using a regulator in the gas cabinet it is not necessary and will cause a heat sink. The VMB does not require temp control unless the environment its located in is below ambient. Hope it helps. Sincerely, Tom Britton Director of Sales Critical Systems, Inc. Direct: 208-890-1417 Office: 877-572-5515 www.CriticalSystemsInc.com [logo for email signature png] -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter Sent: Tuesday, August 27, 2013 6:04 AM To: Subject: Re: [labnetwork] BCL3 - Gas Line Heaters and Protocols Thanks to all for your responses. The information will be helpful. Best regards On 8/27/2013 6:07 AM, Morrison, Richard H., Jr. wrote: > Hi, > > At Draper Laboratory we placed the BCL3 cabinet next to the tool. We did not want to bother with heated lines and all the plumbing involved. The closer the better. > > Rick > > > Draper Laboratory > Group Leader Microfabrication Operations > 555 Technology Square > Cambridge Ma, 02139-3563 > > www.draper.com > rmorrison at draper.com > W 617-258-3420 > C 508-930-3461 > > > > -----Original Message----- > From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dean Sutter > Sent: Monday, August 26, 2013 3:10 PM > To: > > Cc: Rose, Robert W; Michael Sullivan; Vinh Nguyen > Subject: [labnetwork] BCL3 - Gas Line Heaters and Protocols > > Hello, > > AT GT Nano we have a hard plumbed BCL3 line coming from a central gas room, running several hundred feet into the sub fab eventually connecting to the tools. > > We have been internally debating the necessary protocols and physical installations necessary to ensure a safe and properly functioning delivery mechanism. > > These discussions have included the elimination of the central approach, replaced with a local gas cabinet and shorter runs since maintaining and being able to monitor line heaters on a several hundred foot of line, buried in plumbing up in the ceiling is our primary concern. > > So, we are seeking a benchmark from existing facilities that use BCL3. > > Anyone care to volunteer to explain their installation and operating/safety protocols? > > Thanks > > -- > Dean A. Sutter > Associate Director, > Research Operations and Industry Engagements > > dean.sutter at ien.gatech.edu > 404 894 3847 - Office > 404 558 1844 - Cell > www.ien.gatech.edu > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Dean A. Sutter Associate Director, Research Operations and Industry Engagements dean.sutter at ien.gatech.edu 404 894 3847 - Office 404 558 1844 - Cell www.ien.gatech.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 9501 bytes Desc: image001.png URL: