From codreanu at UDel.Edu Wed Jan 2 12:40:38 2013 From: codreanu at UDel.Edu (Iulian Codreanu) Date: Wed, 02 Jan 2013 12:40:38 -0500 Subject: [labnetwork] cleanroom occupancy ratings Message-ID: <50E47116.7090003@udel.edu> Dear Colleagues, Happy New Year and thank you for all the useful feedback you have provided! Could you please tell me/us what the occupancy rating of your cleanroom is? I am trying to convince some folks that H-5 is better suited for future research flexibility than B. Thank you very much. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 From Steven.Schultz at hdrinc.com Wed Jan 2 17:04:43 2013 From: Steven.Schultz at hdrinc.com (Schultz, Steven) Date: Wed, 2 Jan 2013 22:04:43 +0000 Subject: [labnetwork] cleanroom occupancy ratings In-Reply-To: <50E47116.7090003@udel.edu> References: <50E47116.7090003@udel.edu> Message-ID: <93B2C4A54D36FF438897A6A387803D215F06B5B3@OMAC-INEXDAG1N4.intranet.hdr> We typically recommend H5 for design due to the chemical loading benefits allowed by the code. Unless the lab is presumed essentially dry or minimal 'wet' (lesser chem types / classes) you really should stay with H5 and the applicable NFPA's. STEVEN SCHULTZ R.A. LEED AP BD+C HDR Architecture Sr. Project Manager 3200 E. Camelback Road, Suite 250 | Phoenix, AZ 85018 602.522.4391 steven.schultz at hdrinc.com | hdrarchitecture.com Follow Us - Architizer | Facebook | Twitter | YouTube | Flickr -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Wednesday, January 02, 2013 10:41 AM To: Fab Network Subject: [labnetwork] cleanroom occupancy ratings Dear Colleagues, Happy New Year and thank you for all the useful feedback you have provided! Could you please tell me/us what the occupancy rating of your cleanroom is? I am trying to convince some folks that H-5 is better suited for future research flexibility than B. Thank you very much. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From agregg at abbiegregg.com Wed Jan 2 23:11:48 2013 From: agregg at abbiegregg.com (Abbie Gregg) Date: Wed, 2 Jan 2013 23:11:48 -0500 Subject: [labnetwork] cleanroom occupancy ratings In-Reply-To: <93B2C4A54D36FF438897A6A387803D215F06B5B3@OMAC-INEXDAG1N4.intranet.hdr> References: <50E47116.7090003@udel.edu> <93B2C4A54D36FF438897A6A387803D215F06B5B3@OMAC-INEXDAG1N4.intranet.hdr> Message-ID: <5863FB4055D90542A7A7DAE0CEF2ACB00866374884@E2K7CCR1.netvigour.com> We absolutely agree with Steve from HDR that H-5 is the code that was designed to give fabrication cleanrooms the maximum flexibility for chemical and gas usage. It should be used whenever practical. Abbie Gregg President Abbie Gregg, Inc. 1130 East University Drive, Suite 105 Tempe, Arizona 85281 Phone 480 446-8000 x 107 Cell 480-577-5083 FAX 480-446-8001 email agregg at abbiegregg.com website www.abbiegregg.com CONFIDENTIALITY NOTICE: ??All information contained in or attached to this email constitutes confidential information belonging to Abbie Gregg, Inc., its affiliates and subsidiaries and/or its clients.? This email and any attachments are proprietary and/or confidential and are intended for business use of the addressee(s) only. ??All other uses or disclosures are strictly prohibited.? If the reader is not the intended recipient you are hereby notified that the perusal, copying or dissemination of this email is strictly prohibited. If you have received this communication in error, please notify the sender, and delete all copies of this message and its attachments immediately. -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Schultz, Steven Sent: Wednesday, January 02, 2013 3:05 PM To: Iulian Codreanu; Fab Network Subject: Re: [labnetwork] cleanroom occupancy ratings We typically recommend H5 for design due to the chemical loading benefits allowed by the code. Unless the lab is presumed essentially dry or minimal 'wet' (lesser chem types / classes) you really should stay with H5 and the applicable NFPA's. STEVEN SCHULTZ R.A. LEED AP BD+C HDR Architecture Sr. Project Manager 3200 E. Camelback Road, Suite 250 | Phoenix, AZ 85018 602.522.4391 steven.schultz at hdrinc.com | hdrarchitecture.com Follow Us - Architizer | Facebook | Twitter | YouTube | Flickr -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Wednesday, January 02, 2013 10:41 AM To: Fab Network Subject: [labnetwork] cleanroom occupancy ratings Dear Colleagues, Happy New Year and thank you for all the useful feedback you have provided! Could you please tell me/us what the occupancy rating of your cleanroom is? I am trying to convince some folks that H-5 is better suited for future research flexibility than B. Thank you very much. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From jrweaver at purdue.edu Thu Jan 3 08:53:59 2013 From: jrweaver at purdue.edu (Weaver, John R) Date: Thu, 3 Jan 2013 13:53:59 +0000 Subject: [labnetwork] cleanroom occupancy ratings In-Reply-To: <93B2C4A54D36FF438897A6A387803D215F06B5B3@OMAC-INEXDAG1N4.intranet.hdr> References: <50E47116.7090003@udel.edu> <93B2C4A54D36FF438897A6A387803D215F06B5B3@OMAC-INEXDAG1N4.intranet.hdr> Message-ID: <6A848421F695C54A9210C1A873C96AC20727773E@WPVEXCMBX04.purdue.lcl> Iulian - I am in complete agreement with Steve. We rated our cleanroom H5 and our Labs B. We have found the B rating of the labs to be quite limiting, actually driving away a couple of chemistry types who would most likely have moved into the building otherwise. I also would strongly urge you to comply with NFPA 318 if you use fabrication equipment and/or materials. While it is not required - it covers semiconductor fabrication facilities - it gives excellent guidance for any fabrication cleanroom. John John R. Weaver Facility Manager Birck Nanotechnology Center Purdue University (765) 494-5494 jrweaver at purdue.edu -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Schultz, Steven Sent: Wednesday, January 02, 2013 5:05 PM To: Iulian Codreanu; Fab Network Subject: Re: [labnetwork] cleanroom occupancy ratings We typically recommend H5 for design due to the chemical loading benefits allowed by the code. Unless the lab is presumed essentially dry or minimal 'wet' (lesser chem types / classes) you really should stay with H5 and the applicable NFPA's. STEVEN SCHULTZ R.A. LEED AP BD+C HDR Architecture Sr. Project Manager 3200 E. Camelback Road, Suite 250 | Phoenix, AZ 85018 602.522.4391 steven.schultz at hdrinc.com | hdrarchitecture.com Follow Us - Architizer | Facebook | Twitter | YouTube | Flickr -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Wednesday, January 02, 2013 10:41 AM To: Fab Network Subject: [labnetwork] cleanroom occupancy ratings Dear Colleagues, Happy New Year and thank you for all the useful feedback you have provided! Could you please tell me/us what the occupancy rating of your cleanroom is? I am trying to convince some folks that H-5 is better suited for future research flexibility than B. Thank you very much. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From shott at stanford.edu Thu Jan 3 11:12:12 2013 From: shott at stanford.edu (John Shott) Date: Thu, 03 Jan 2013 08:12:12 -0800 Subject: [labnetwork] cleanroom occupancy ratings In-Reply-To: <50E47116.7090003@udel.edu> References: <50E47116.7090003@udel.edu> Message-ID: <50E5ADDC.7030801@stanford.edu> Iulian: Just to add slightly to this discussion. I also agree that going H-5 is the way to go. As Mary pointed out, our facility (built in 1985) is a B-occupancy cleanroom with outboard H occupancy gas bunkers and chemical storage rooms. While that is a lot better than a full B-occupancy, I believe that the code is not clear on how you "count" chemical volumes that pass from one occupancy to another. I believe that it becomes a matter of what your AHJ will agree to. In our case, I believe that we ended up with a reasonable outcome: we count the volume of gas that is downstream of the TGO-controlled shutoff valve in the bunker as the volume of gas that is counted as a part of the chemical inventory in the B occupancy. That is fair and reasonable ... but not all AHJs would come to that same ruling I fear. Even with outboard H-occupancy gas bunkers, we do have a couple of gas cylinders within the B-occupancy. In particular, we've got a 5 lb bottle of boron trichloride for our etchers because of it's low vapor pressure. We are soon to have an 8 lb bottle of anhydrous hydrofluoric for a vapor HF oxide process. Those things get us closer to our B-occupancy limits. When we add the water reactives in the form of sulfuric acid and a number of the ALD organometalics and the pryophoric nature of some of the ALD organometalics we are getting close to B-occupancy limits in several areas. To me, the greatest risk in having a B-occupancy today is trying to guess what might be in use or desired at some far distant point in time. My guess is that most university facilities of this type will have an expected lifetime of at least 25 years. When our facility opened in 1985, for example, while many of the gases and chemicals are still in use, we certainly didn't anticipate things like anhydrous HF, all of the ALD organometalics, etc. Moreover, over time, it seems as if PELs tend to go down and hazard ratings go up. If a handful of the ALD organometalics get re-classified as pyrophoric, for example, over the next few years, or something like anhydrous HF gets reclassified "highly toxic" instead of merely "toxic", we are suddenly in an operational bind ... While I know that building an H-occupancy is more expensive than an equivalent B-rated facility, I believe that this will help avoid unpleasant surprises over the life of your facility. Good luck, John On 1/2/2013 9:40 AM, Iulian Codreanu wrote: > Dear Colleagues, > > Happy New Year and thank you for all the useful feedback you have > provided! > > Could you please tell me/us what the occupancy rating of your > cleanroom is? I am trying to convince some folks that H-5 is better > suited for future research flexibility than B. > > Thank you very much. > > Iulian From rbradley at chtm.unm.edu Thu Jan 3 12:37:59 2013 From: rbradley at chtm.unm.edu (Rick Bradley) Date: Thu, 03 Jan 2013 10:37:59 -0700 Subject: [labnetwork] cleanroom occupancy ratings In-Reply-To: <50E47116.7090003@udel.edu> References: <50E47116.7090003@udel.edu> Message-ID: <50E5C1F7.2080005@chtm.unm.edu> Good morning Iulian, I agree with comments from Steven Schultz, Abbie Gregg and John Shott that one should push for H-5 occupancy rating for future flexibility even though H-5 rating will cost more in the short term. At the University of New Mexico's Center for High Technology Materials, we have the following occupancy ratings for our clean room and laser labs. Our facility design documents are from the 1995 time frame so the codes on our building drawings are slightly different compared to today's standard. Our life safety architect informed us that the H-7 occupancy code on our building drawings are now the equivalent of H-5 under the current standard. Our ~3,000 square foot cleanroom is H-5 All sixteen of our laser labs are H-5 Our chemical storage areas on the dock are H-5 All other areas in the facility are either 'B' for offices/support building or 'A' for lecture hall / classrooms. I hope this information helps in your facility building campaign. Regards, Rick Rick Bradley Nanoscience Lab Manager Center for High Technology Materials University of New Mexico 1313 Goddard, S.E. Albuquerque, NM 87106 Phone: 505.272.7648 FAX: 505.272.7801 Iulian Codreanu wrote: > Dear Colleagues, > > Happy New Year and thank you for all the useful feedback you have > provided! > > Could you please tell me/us what the occupancy rating of your > cleanroom is? I am trying to convince some folks that H-5 is better > suited for future research flexibility than B. > > Thank you very much. > > Iulian > From khbeis at uw.edu Thu Jan 3 13:21:04 2013 From: khbeis at uw.edu (Michael Khbeis) Date: Thu, 3 Jan 2013 10:21:04 -0800 Subject: [labnetwork] Precious Metal Reclaim Message-ID: Dearest Colleagues, I was wondering if you can recommend your best sources for precious metal reclaim. We have solid gold sputtering targets that need to be recast. With margins so tight, we need the best possible reclaim rates. Gratefully, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (C) 443.254.5192 khbeis at uw.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/pkcs7-signature Size: 1345 bytes Desc: not available URL: From sgupta at eng.ua.edu Thu Jan 3 17:35:32 2013 From: sgupta at eng.ua.edu (Gupta, Su) Date: Thu, 3 Jan 2013 16:35:32 -0600 Subject: [labnetwork] Precious Metal Reclaim In-Reply-To: References: Message-ID: <1B53C0DED5D00E40A81DF47DBF6A3DCB03A6C82D714E@MAIL1.ua-net.ua.edu> I have had pretty good reclaim rates from Materion Corporation. Heraeus may be another good vendor. Best, Su Gupta ________________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Khbeis [khbeis at uw.edu] Sent: Thursday, January 03, 2013 12:21 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Precious Metal Reclaim Dearest Colleagues, I was wondering if you can recommend your best sources for precious metal reclaim. We have solid gold sputtering targets that need to be recast. With margins so tight, we need the best possible reclaim rates. Gratefully, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (C) 443.254.5192 khbeis at uw.edu From rbradley at chtm.unm.edu Thu Jan 3 18:48:52 2013 From: rbradley at chtm.unm.edu (Rick Bradley) Date: Thu, 03 Jan 2013 16:48:52 -0700 Subject: [labnetwork] Precious Metal Reclaim In-Reply-To: References: Message-ID: <50E618E4.2020007@chtm.unm.edu> Hello Dr. Khbeis, At CHTM we use a precious metals supplier originally called Academy Corporation. They are now part of the Materion group with multiple locations across the US. Ping me if you would like the name of my local contact. Thks, Rick Rick Bradley Nanoscience Lab Manager Center for High Technology Materials University of New Mexico 1313 Goddard, S.E. Albuquerque, NM 87106 Phone: 505.272.7648 FAX: 505.272.7801 Michael Khbeis wrote: > Dearest Colleagues, > > I was wondering if you can recommend your best sources for precious metal reclaim. We have solid gold sputtering targets that need to be recast. With margins so tight, we need the best possible reclaim rates. > > Gratefully, > > Dr. Michael Khbeis > Associate Director > Microfabrication Facility (MFF) > University of Washington > Fluke Hall, Box 352143 > (O) 206.543.5101 > (C) 443.254.5192 > khbeis at uw.edu > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From rmorrison at draper.com Fri Jan 4 06:03:30 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Fri, 04 Jan 2013 11:03:30 +0000 Subject: [labnetwork] Precious Metal Reclaim In-Reply-To: References: Message-ID: Hi, Here at Draper we use Materion, very good accurate quick service organization. Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Khbeis Sent: Thursday, January 03, 2013 1:21 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Precious Metal Reclaim Dearest Colleagues, I was wondering if you can recommend your best sources for precious metal reclaim. We have solid gold sputtering targets that need to be recast. With margins so tight, we need the best possible reclaim rates. Gratefully, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (C) 443.254.5192 khbeis at uw.edu From Thomas_Ferraguto at uml.edu Fri Jan 4 08:11:51 2013 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas) Date: Fri, 4 Jan 2013 13:11:51 +0000 Subject: [labnetwork] Precious Metal Reclaim In-Reply-To: References: Message-ID: I've used Winfield Alloy http://www.winfieldalloy.com/ And So-Accurate (Jason Braun) http://www.soaccurate.com/ (they have their prices posted on the website) Best Thomas S. Ferraguto ETIC Nanofabrication Laboratory Director University of Massachusetts Lowell 1 University Avenue Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Khbeis Sent: Thursday, January 03, 2013 1:21 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Precious Metal Reclaim Dearest Colleagues, I was wondering if you can recommend your best sources for precious metal reclaim. We have solid gold sputtering targets that need to be recast. With margins so tight, we need the best possible reclaim rates. Gratefully, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (C) 443.254.5192 khbeis at uw.edu From shott at stanford.edu Fri Jan 4 11:51:25 2013 From: shott at stanford.edu (John Shott) Date: Fri, 04 Jan 2013 08:51:25 -0800 Subject: [labnetwork] Precious Metal Reclaim In-Reply-To: References: Message-ID: <50E7088D.5080508@stanford.edu> Michael: While I can't tell you exactly what their pricing/reimbursement algorithm is, we've been using M & K Recovery Group in Andover, MA for reclaim of deposited metal on a number of our evaporator planetaries, shields, etc. In general, what we send them has a mix of metals with gold and platinum being the subjects of reclaim. Because of that, it's hard for us to know the gold/platinum content of what we send them, so we are at their mercy to tell us what they recovered. We really didn't do any comparison shopping before choosing them ... although some reclaim is clearly better than no reclaim. For others doing reclaim, I'd be curious to know what financial method you have for dealing with this. Our accounting/financial folks seem to have no means of accommodating something that was going to result in net money returned to us. As a result, we run a credit at M & K which we periodically "cash in" in gold pellets or equivalent. Although we haven't used them, it appears as if Lesker also does reclaim and they even quote reclaim efficiency for various type of materials/objects including sputtering targets, evaporation shields, etc. Has anyone used them? http://www.lesker.com/newweb/deposition_materials/depositionmaterials_reclaim_2.cfm?pgid=0# Good luck, John > Dearest Colleagues, > > I was wondering if you can recommend your best sources for precious metal reclaim. We have solid gold sputtering targets that need to be recast. With margins so tight, we need the best possible reclaim rates. > > Gratefully, > > Dr. Michael Khbeis From schweig at umich.edu Mon Jan 7 14:50:00 2013 From: schweig at umich.edu (Dennis Schweiger) Date: Mon, 7 Jan 2013 14:50:00 -0500 Subject: [labnetwork] cleanroom occupancy ratings In-Reply-To: <50E47116.7090003@udel.edu> References: <50E47116.7090003@udel.edu> Message-ID: Iulian, good afternoon. Here at UofMichigan, our fab is H-5, and the gas bunkers are H-3 (I think). You're not going to want to be a B occupancy. It's too limiting. We have a couple of B locations in other parts of the building, and they're constantly adjusting HPM gas cylinder sizes to remain code compliant. In my opinion, if you're building a research facility, H is the way to go. It provides a lot of "chemical" flexibility. With a B, you've got a fancy classroom building, not a research facility. Dennis 734.647.2055 Ofc On Wed, Jan 2, 2013 at 12:40 PM, Iulian Codreanu wrote: > Dear Colleagues, > > Happy New Year and thank you for all the useful feedback you have provided! > > Could you please tell me/us what the occupancy rating of your cleanroom > is? I am trying to convince some folks that H-5 is better suited for > future research flexibility than B. > > Thank you very much. > > Iulian > > -- > iulian Codreanu, Ph.D. > Director of Operations, UD Nanofab > 149 Evans Hall > Newark, DE 19716 > 302-831-2784 > > > ______________________________**_________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/**mailman/listinfo.cgi/**labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jcoy at purdue.edu Wed Jan 9 10:04:21 2013 From: jcoy at purdue.edu (Coy, John A) Date: Wed, 9 Jan 2013 15:04:21 +0000 Subject: [labnetwork] Electromask/TRE mask making unit, model CC251-5X Message-ID: <6DD220006F5449418808B78CA354D0431346A28B@WPVEXCMBX04.purdue.lcl> Lab Network members, The Birck Nanotechnology Center at Purdue is accepting offers on an Electromask/TRE mask making system, model CC251-5X. The system is fully operational and currently installed in our cleanroom. It is capable of writing patterns down to 1.5 microns with a die size less than 2x2cm and 3 microns for die above 2x2cm. It can produce photomasks ranging in size from 3x3 inch to 8x8 inch. The image repeater camera is a 5x reduction lens. Full system specifications can be sent upon request. Please contact me with any questions. Best Regards, John -- John Coy Microfab Research Engineer Birck Nanotechnology Center Purdue University jcoy at purdue.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Wed Jan 9 15:35:23 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Wed, 09 Jan 2013 20:35:23 +0000 Subject: [labnetwork] sputter targets Message-ID: Hi everyone, We recently decommissioned a Mill Lane sputter machine, I have to following targets as surplus items all on backing plates 6: diameter if anyone is interested let me know. COPPER 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 70.17 TOZ TITANIUM 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 57.885 TOZ PLATINUM TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 9.245 TOZ CHROMIUM TARGET (CR) 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 34.985 TOZ TITANIUM 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 55.215 TOZ TANTALUM 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 104.6885 TOZ ALUMINUM TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 53.86 TOZ PLATINUM TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 72.21 TOZ TITANIUM 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 57.225 TOZ MOLYBDENUM 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 63.66 TOZ TUNGSTEN SPUTTERING TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 113.94 TOZ ALUMINUM TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 51.451 TOZ CHROME TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 63.835 TOZ NICKEL/VANADIUM ( NI-VD ) 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 71.65 TOZ ALUMINUM TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 54.025 TOZ CHROME TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 68.38 TOZ TUNGSTEN TITANIUM SPUTTERING TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 89.27 TOZ PALLADIUM 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 65.05 TOZ CHROME TARGET 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 68.325 TOZ NICKEL 01_3343 Morrison Jr,Richard H. GBD3 TARGET WITH BACKING PLATE 49.04 TOZ Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at UDel.Edu Fri Jan 11 11:40:59 2013 From: codreanu at UDel.Edu (Iulian Codreanu) Date: Fri, 11 Jan 2013 11:40:59 -0500 Subject: [labnetwork] N2 grade for blow guns Message-ID: <50F0409B.4090909@udel.edu> Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 From lej at danchip.dtu.dk Fri Jan 11 15:48:27 2013 From: lej at danchip.dtu.dk (Leif Johansen) Date: Fri, 11 Jan 2013 20:48:27 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <879AEF5002D70747B136D02BC86A9C9804DE8B@ait-pex02mbx04.win.dtu.dk> Hello Iulian, Here at DTU Danchip, we are using purified N2 for the guns in fume hoods and wet benches. We have had the same discussion whether it is overkill to do so, since the most of the impurities in our bulk N2 probably stems from water trace. One could argue that the nice clean process N2 becomes dirty the second it leaves the nozzle. However, we have never changed to bulk N2 and most probably will not do so. Best regards, Leif Leif S. Johansen Head of Operations DTU Danchip ? Technical University of Denmark Danchip ?rsteds Plads, Byg. 347 2800? Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.danchip.dtu.dk/ -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: 11. januar 2013 17:41 To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From kbarnes at semitorrinc.com Fri Jan 11 15:56:07 2013 From: kbarnes at semitorrinc.com (Keith Barnes) Date: Fri, 11 Jan 2013 20:56:07 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: It should be high purity. Thank you, Keith F. Barnes Sales Representative SEMITORR sales distribution service 6336 Patterson Pass Road Suite H Livermore, CA 94550 tel:?? 925.667.3607 cell: 925.337.2221 email:? kbarnes at semitorrinc.com web:? www.semitorrinc.com -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 8:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From tbritton at criticalsystemsinc.com Fri Jan 11 15:56:20 2013 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Fri, 11 Jan 2013 20:56:20 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EEF6FD8@P3PWEX2MB006.ex2.secureserver.net> Hi Iulian, Back in my component distribution days I was the Entegris (Fluoroware at the time) rep and we hardly ever had Fabs use utility N2 in blow guns inside the cleanroom due to the possibility of particulate being blown into the fab air. Whether or not it would have mattered in a laminar flow environment is debatable, but this is what the Fabs did. This being said, you're not in a production environment, so the question becomes two-fold. First, is potentially particulate laden air, or the moisture/molecular contamination in utility N2 going to cause any issue with other devices/wafers in your clean room, and second, is what you are going to blow off with the guns sensitive to particles, moisture or molecular contamination. If the answer to these questions is no, I would recommend utility N2 for cost purposes. Good luck! Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 www.criticalsystemsinc.com "World Leader in UHP Reconditioned Gas Delivery & Abatement Technologies" -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 9:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Fri Jan 11 16:09:53 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Fri, 11 Jan 2013 21:09:53 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: At Draper labs we use high purity N2 for all functions, tools gases and blow off guns. It eliminates the need for filters and the cost of ownership associated with the filters. Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 11:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From spaolini at cns.fas.harvard.edu Fri Jan 11 16:18:06 2013 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Fri, 11 Jan 2013 16:18:06 -0500 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <8F95EA77ACBF904A861E580B44288EFD9C22867883@FASXCH02.fasmail.priv> I would specify high purity because of the possibility of CU contamination. The consumption is small enough. Steve Paolini Harvard University Center for Nanoscale systems -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 11:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From len.olona at ou.edu Fri Jan 11 19:56:34 2013 From: len.olona at ou.edu (Olona, Leonard E.) Date: Sat, 12 Jan 2013 00:56:34 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <68888241-A425-4061-8926-88B6BCDDEF9B@ou.edu> Iulian, At Intel we did away with N2 guns in the late 80's. However, here at OU and in a research environment using a HEPA clean air bench we have adopted UHP nitrogen as the gas of choice. Len Olona University of Oklahoma University Cleanroom 110 West Boyd Street Norman, Oklahoma 74019 405 325-4374 405 630-9068 On Jan 11, 2013, at 2:44 PM, "Iulian Codreanu" wrote: > Dear Colleagues, > > Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? > > Thank you for your help. > > Iulian > > -- > iulian Codreanu, Ph.D. > Director of Operations, UD Nanofab > 149 Evans Hall > Newark, DE 19716 > 302-831-2784 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From kbarnes at semitorrinc.com Fri Jan 11 20:00:42 2013 From: kbarnes at semitorrinc.com (Keith Barnes) Date: Sat, 12 Jan 2013 01:00:42 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <9820889A26AAC34EBEB01D62DFCEEB2EEF6FD8@P3PWEX2MB006.ex2.secureserver.net> References: <50F0409B.4090909@udel.edu> <9820889A26AAC34EBEB01D62DFCEEB2EEF6FD8@P3PWEX2MB006.ex2.secureserver.net> Message-ID: I would think that you wouldn't want utility N2 in your clean room at all! The cost of using a purifier to clean up low flows of N2 would not be prohibitive. Thank you, Keith F. Barnes Sales Representative SEMITORR sales distribution service 6336 Patterson Pass Road Suite H Livermore, CA 94550 tel: 925.667.3607 cell: 925.337.2221 email: kbarnes at semitorrinc.com web: www.semitorrinc.com [bottom signature graphic] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tom Britton Sent: Friday, January 11, 2013 12:56 PM To: Iulian Codreanu; Fab Network Subject: Re: [labnetwork] N2 grade for blow guns Hi Iulian, Back in my component distribution days I was the Entegris (Fluoroware at the time) rep and we hardly ever had Fabs use utility N2 in blow guns inside the cleanroom due to the possibility of particulate being blown into the fab air. Whether or not it would have mattered in a laminar flow environment is debatable, but this is what the Fabs did. This being said, you're not in a production environment, so the question becomes two-fold. First, is potentially particulate laden air, or the moisture/molecular contamination in utility N2 going to cause any issue with other devices/wafers in your clean room, and second, is what you are going to blow off with the guns sensitive to particles, moisture or molecular contamination. If the answer to these questions is no, I would recommend utility N2 for cost purposes. Good luck! Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 www.criticalsystemsinc.com "World Leader in UHP Reconditioned Gas Delivery & Abatement Technologies" -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 9:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2709 bytes Desc: image001.jpg URL: From tbritton at criticalsystemsinc.com Fri Jan 11 20:06:53 2013 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Sat, 12 Jan 2013 01:06:53 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: References: <50F0409B.4090909@udel.edu> <9820889A26AAC34EBEB01D62DFCEEB2EEF6FD8@P3PWEX2MB006.ex2.secureserver.net> Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EEF72F5@P3PWEX2MB006.ex2.secureserver.net> It depends on the cleanroom and whether the effects of utility grade N2 will produce an issue. In a production Fab absolutely, but not having seen Iulian's layout and what he is trying to do, it's hard to make that call. How many guns will there be? Is there UHP N2 close or will they need to run additional lines? Does the process care? Does the area care? Just questions he needs to ask before he defaults to spending extra money that he might not need to. Enjoy the weekend! Tom From: Keith Barnes [mailto:kbarnes at semitorrinc.com] Sent: Friday, January 11, 2013 6:01 PM To: Tom Britton; Iulian Codreanu; Fab Network Subject: RE: [labnetwork] N2 grade for blow guns I would think that you wouldn't want utility N2 in your clean room at all! The cost of using a purifier to clean up low flows of N2 would not be prohibitive. Thank you, Keith F. Barnes Sales Representative SEMITORR sales distribution service 6336 Patterson Pass Road Suite H Livermore, CA 94550 tel: 925.667.3607 cell: 925.337.2221 email: kbarnes at semitorrinc.com web: www.semitorrinc.com [bottom signature graphic] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tom Britton Sent: Friday, January 11, 2013 12:56 PM To: Iulian Codreanu; Fab Network Subject: Re: [labnetwork] N2 grade for blow guns Hi Iulian, Back in my component distribution days I was the Entegris (Fluoroware at the time) rep and we hardly ever had Fabs use utility N2 in blow guns inside the cleanroom due to the possibility of particulate being blown into the fab air. Whether or not it would have mattered in a laminar flow environment is debatable, but this is what the Fabs did. This being said, you're not in a production environment, so the question becomes two-fold. First, is potentially particulate laden air, or the moisture/molecular contamination in utility N2 going to cause any issue with other devices/wafers in your clean room, and second, is what you are going to blow off with the guns sensitive to particles, moisture or molecular contamination. If the answer to these questions is no, I would recommend utility N2 for cost purposes. Good luck! Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 www.criticalsystemsinc.com "World Leader in UHP Reconditioned Gas Delivery & Abatement Technologies" -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 9:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2709 bytes Desc: image001.jpg URL: From agregg at abbiegregg.com Sat Jan 12 00:31:39 2013 From: agregg at abbiegregg.com (Abbie Gregg) Date: Sat, 12 Jan 2013 00:31:39 -0500 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> Yes Abbie Gregg President Abbie Gregg, Inc. 1130 East University Drive, Suite 105 Tempe, Arizona 85281 Phone 480 446-8000 x 107 Cell 480-577-5083 FAX 480-446-8001 email agregg at abbiegregg.com website www.abbiegregg.com CONFIDENTIALITY NOTICE: ??All information contained in or attached to this email constitutes confidential information belonging to Abbie Gregg, Inc., its affiliates and subsidiaries and/or its clients.? This email and any attachments are proprietary and/or confidential and are intended for business use of the addressee(s) only. ??All other uses or disclosures are strictly prohibited.? If the reader is not the intended recipient you are hereby notified that the perusal, copying or dissemination of this email is strictly prohibited. If you have received this communication in error, please notify the sender, and delete all copies of this message and its attachments immediately. -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 9:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From schweig at umich.edu Sat Jan 12 07:26:44 2013 From: schweig at umich.edu (Dennis Schweiger) Date: Sat, 12 Jan 2013 07:26:44 -0500 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: Iulian, good morning. We've always used UHP product for anything that touches the device surface (blow off guns, chamber venting, process gas, etc.). Utility N2 is used primarily for secondary purging, like pump purges. Dennis Schweiger Facilities Manager Lurie Nanofabrication Facility UofMichigan 734.647.2055 Ofc On Fri, Jan 11, 2013 at 11:40 AM, Iulian Codreanu wrote: > Dear Colleagues, > > Would it be overkill or a good idea to supply high purity nitrogen > (instead of utility nitrogen) to the blow guns located in cleanroom fume > hoods? > > Thank you for your help. > > Iulian > > -- > iulian Codreanu, Ph.D. > Director of Operations, UD Nanofab > 149 Evans Hall > Newark, DE 19716 > 302-831-2784 > > > ______________________________**_________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/**mailman/listinfo.cgi/**labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rathbun at cnf.cornell.edu Sat Jan 12 13:29:22 2013 From: rathbun at cnf.cornell.edu (Lynn Rathbun) Date: Sat, 12 Jan 2013 13:29:22 -0500 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvig our.com> References: <50F0409B.4090909@udel.edu> <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> Message-ID: <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> Well, first you would have to define what grades you mean by utility nitrogen and high purity nitrogen. ************************************************************** Dr. Lynn Rathbun Rathbun at cnf.cornell.edu NNIN Deputy Director (607)-254-4872 CNF Laboratory Manager Duffield Hall (607)-255-8601 Fax Cornell University (607)-592-1549 Work Cell Ithaca, New York 14853 (607)-342-1880 Personal Cell -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Sat Jan 12 13:51:04 2013 From: shott at stanford.edu (John Shott) Date: Sat, 12 Jan 2013 10:51:04 -0800 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <50F1B098.5050906@stanford.edu> Iulian: First class is better than coach. A Mercedes is better than what I drive. But, I don't fly first class and I don't drive a Mercedes, so I guess that I'm going to voice an opinion that is somewhat contrary to that expressed by most of my esteemed colleagues who have weighed in. You've heard from a number of the best university lab/facility managers representing a number of the best university research facilities and the best fab design people and the great majority say use UHP nitrogen. Also, many of those folks are in newer facilities whereas ours has been use for 25+ years. However, in addition to some of the cost/quality/convenience issues that Tom Britton raised, I think it is important to ask what is the quality difference between your utility nitrogen and your UHP nitrogen. If utility nitrogen has a standard meaning, I'm not sure that I know what it is. In our case, both our utility (AKA 'house') nitrogen and our UHP nitrogen come out of the same (non-stainless) 9000 gallon cryogenic tank. So, I believe that our utility nitrogen is "pretty good" quality. Although we don't monitor it, I suspect that it is likely less than 1 ppm moisture content most of the time ... it certainly has been every time that we have had it tested, but we don't have either online or routine monitoring of our moisture levels. The utility system also has high-quality inline particle filters just downstream of the vaporizers, but is routed in copper piping. Our UHP nitrogen, however, goes through an additional set of Entegris Gatekeeper cartridge filters and then is routed in stainless. In short, our utility nitrogen is, in my view, very good, but our UHP nitrogen is better.s Like everyone, I suspect, we use UHP nitrogen for all of our process gases to furnaces, etchers, deposition tools, etc. Utility nitrogen is used for pump purges and all of the other things that others have outlined. However, all of our wet benches are only supplied with utility nitrogen. Not only does that mean that our blow guns use utility nitrogen, but so do our SRDs ... the last thing that wafers will see before a furnace step. While that likely sends shivers down the spines of many, that's the way that our facility is set up and it would now be expensive to change. Over the years, we've built a wide range of high-efficiency solar cells and high-energy physics particle detectors with finished carrier lifetime in the msec, if not 10s of msec, range. So, while our utility nitrogen is still of pretty high quality, except for the fact that it is distributed in copper piping, that is what we use for blow guns and for our SRDs. There are a lot of things to lay awake at night and worry about in operating facilities of this type, but in my case, using our utility nitrogen for these purposes is not one of them. Of course, if utility nitrogen means something of greatly lower quality ... such as a nitrogen generator of the type used to fill tires with nitrogen at Costco ... then that is an entirely different matter. Have a good weekend all, John From Thomas_Ferraguto at uml.edu Mon Jan 14 08:15:30 2013 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas) Date: Mon, 14 Jan 2013 13:15:30 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: References: <50F0409B.4090909@udel.edu> <9820889A26AAC34EBEB01D62DFCEEB2EEF6FD8@P3PWEX2MB006.ex2.secureserver.net> Message-ID: We're installing a conventional 9000 gallon tank and a purifier. We will have both house N2 and UHP N2 available. The purifier is expensive though $200K+ for Grade 5.5 , 99.9995% Purity. This is a less expensive route that going with the UHP tank and vaporizer though. I'm sure there are less expensive (i.e. lower volume UHP purifiers). Thomas S. Ferraguto ETIC Nanofabrication Laboratory Director University of Massachusetts Lowell 1 University Avenue Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Keith Barnes Sent: Friday, January 11, 2013 8:01 PM To: Tom Britton; Iulian Codreanu; Fab Network Subject: Re: [labnetwork] N2 grade for blow guns I would think that you wouldn't want utility N2 in your clean room at all! The cost of using a purifier to clean up low flows of N2 would not be prohibitive. Thank you, Keith F. Barnes Sales Representative SEMITORR sales distribution service 6336 Patterson Pass Road Suite H Livermore, CA 94550 tel: 925.667.3607 cell: 925.337.2221 email: kbarnes at semitorrinc.com web: www.semitorrinc.com [bottom signature graphic] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tom Britton Sent: Friday, January 11, 2013 12:56 PM To: Iulian Codreanu; Fab Network Subject: Re: [labnetwork] N2 grade for blow guns Hi Iulian, Back in my component distribution days I was the Entegris (Fluoroware at the time) rep and we hardly ever had Fabs use utility N2 in blow guns inside the cleanroom due to the possibility of particulate being blown into the fab air. Whether or not it would have mattered in a laminar flow environment is debatable, but this is what the Fabs did. This being said, you're not in a production environment, so the question becomes two-fold. First, is potentially particulate laden air, or the moisture/molecular contamination in utility N2 going to cause any issue with other devices/wafers in your clean room, and second, is what you are going to blow off with the guns sensitive to particles, moisture or molecular contamination. If the answer to these questions is no, I would recommend utility N2 for cost purposes. Good luck! Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 www.criticalsystemsinc.com "World Leader in UHP Reconditioned Gas Delivery & Abatement Technologies" -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 9:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2709 bytes Desc: image001.jpg URL: From jrweaver at purdue.edu Mon Jan 14 08:18:34 2013 From: jrweaver at purdue.edu (Weaver, John R) Date: Mon, 14 Jan 2013 13:18:34 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F0409B.4090909@udel.edu> References: <50F0409B.4090909@udel.edu> Message-ID: <6A848421F695C54A9210C1A873C96AC20728431D@WPVEXCMBX04.purdue.lcl> Iulian - As with the answer to most of these questions, it depends. :) In the BNC, we have a high-purity N2 tank that supplies our gaseous nitrogen to the building through stainless-steel tubing. Inside the facility, we split the line between utility and process nitrogen. The process nitrogen remains in UHP stainless tubing with certified welds, etc. The utility nitrogen goes through backflow-prevention devices then converts to oxygen-grade copper tubing. The primary difference in the nitrogen quality is moisture - ionics are very low in both streams. For blow-off guns, moisture level is a non-issue. I use utility nitrogen and am very happy with the quality. If your utility nitrogen is of a significantly lower quality, then the answer might be different, but for a situation where moisture is the primary contaminant utility nitrogen is perfectly adequate. As an aside, if you run your nitrogen to your blow-off guns through Teflon tubing (and who doesn't?), then you will be picking up moisture in your nitrogen stream anyway. If you are using UHP nitrogen, you will most likely be backstreaming moisture into your UHP system when the nitrogen is not flowing, thus contaminating your UHP line. That is a strong argument for using utility nitrogen wherever you are using Teflon tubing. John John R. Weaver Facility Manager Birck Nanotechnology Center Purdue University (765) 494-5494 jrweaver at purdue.edu -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu Sent: Friday, January 11, 2013 11:41 AM To: Fab Network Subject: [labnetwork] N2 grade for blow guns Dear Colleagues, Would it be overkill or a good idea to supply high purity nitrogen (instead of utility nitrogen) to the blow guns located in cleanroom fume hoods? Thank you for your help. Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From hughes at illinois.edu Mon Jan 14 08:55:13 2013 From: hughes at illinois.edu (Hughes, John S) Date: Mon, 14 Jan 2013 13:55:13 +0000 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F1B098.5050906@stanford.edu> References: <50F0409B.4090909@udel.edu> <50F1B098.5050906@stanford.edu> Message-ID: We're in a similar place as John. We have a 24 year-old cleanroom design with high-quality (99.995% purity; Mil. Spec. 27401-C) distributed "house" nitrogen. In our case, there are two separate LN2 tanks being used. The one distributes at low pressure (~40 psi) through copper pipe, the other at high pressure (~120 psi) through stainless lines. We use 0.2 um filters on all the blow guns and some of the process chamber vent lines. Any nitrogen process gas comes from UHP cylinders, but we haven't had any problems using our house nitrogen for everything else. -- John ------------------------------------------------------------- John S. Hughes Office: (217) 333-4674 Associate Director FAX: (217) 244-6375 Laboratory Operations hughes at illinois.edu Micro and Nanotechnology Laboratory University of Illinois at Urbana-Champaign 2000E Micro and Nanotechnology Laboratory 208 North Wright Street Urbana, Illinois 61801 http://mntl.illinois.edu ------------------------------------------------------------- On Jan 12, 2013, at 12:51 PM, John Shott > wrote: Iulian: First class is better than coach. A Mercedes is better than what I drive. But, I don't fly first class and I don't drive a Mercedes, so I guess that I'm going to voice an opinion that is somewhat contrary to that expressed by most of my esteemed colleagues who have weighed in. You've heard from a number of the best university lab/facility managers representing a number of the best university research facilities and the best fab design people and the great majority say use UHP nitrogen. Also, many of those folks are in newer facilities whereas ours has been use for 25+ years. However, in addition to some of the cost/quality/convenience issues that Tom Britton raised, I think it is important to ask what is the quality difference between your utility nitrogen and your UHP nitrogen. If utility nitrogen has a standard meaning, I'm not sure that I know what it is. In our case, both our utility (AKA 'house') nitrogen and our UHP nitrogen come out of the same (non-stainless) 9000 gallon cryogenic tank. So, I believe that our utility nitrogen is "pretty good" quality. Although we don't monitor it, I suspect that it is likely less than 1 ppm moisture content most of the time ... it certainly has been every time that we have had it tested, but we don't have either online or routine monitoring of our moisture levels. The utility system also has high-quality inline particle filters just downstream of the vaporizers, but is routed in copper piping. Our UHP nitrogen, however, goes through an additional set of Entegris Gatekeeper cartridge filters and then is routed in stainless. In short, our utility nitrogen is, in my view, very good, but our UHP nitrogen is better.s Like everyone, I suspect, we use UHP nitrogen for all of our process gases to furnaces, etchers, deposition tools, etc. Utility nitrogen is used for pump purges and all of the other things that others have outlined. However, all of our wet benches are only supplied with utility nitrogen. Not only does that mean that our blow guns use utility nitrogen, but so do our SRDs ... the last thing that wafers will see before a furnace step. While that likely sends shivers down the spines of many, that's the way that our facility is set up and it would now be expensive to change. Over the years, we've built a wide range of high-efficiency solar cells and high-energy physics particle detectors with finished carrier lifetime in the msec, if not 10s of msec, range. So, while our utility nitrogen is still of pretty high quality, except for the fact that it is distributed in copper piping, that is what we use for blow guns and for our SRDs. There are a lot of things to lay awake at night and worry about in operating facilities of this type, but in my case, using our utility nitrogen for these purposes is not one of them. Of course, if utility nitrogen means something of greatly lower quality ... such as a nitrogen generator of the type used to fill tires with nitrogen at Costco ... then that is an entirely different matter. Have a good weekend all, John _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From dabunzow at lbl.gov Mon Jan 14 09:59:51 2013 From: dabunzow at lbl.gov (David A. Bunzow) Date: Mon, 14 Jan 2013 06:59:51 -0800 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: References: <50F0409B.4090909@udel.edu> Message-ID: <50F41D67.1050508@lbl.gov> Overkill? NO Warranted: YES David A. Bunzow User Facilities Program Manager The Molecular Foundry Materials Science Division Lawrence Berkeley National Laboratory 1 Cyclotron Road MS 67-3207 Berkeley, CA 94720 Office: 510-486-4574 FAX: 510-486-7424 Cell: 510-542-1747 On 1/12/2013 4:26 AM, Dennis Schweiger wrote: > Iulian, > good morning. We've always used UHP product for anything that touches the > device surface (blow off guns, chamber venting, process gas, etc.). Utility > N2 is used primarily for secondary purging, like pump purges. > Dennis Schweiger > Facilities Manager > Lurie Nanofabrication Facility > UofMichigan > 734.647.2055 Ofc > > On Fri, Jan 11, 2013 at 11:40 AM, Iulian Codreanu > wrote: > > Dear Colleagues, > > Would it be overkill or a good idea to supply high purity nitrogen > (instead of utility nitrogen) to the blow guns located in cleanroom fume > hoods? > > Thank you for your help. > > Iulian > > -- > iulian Codreanu, Ph.D. > Director of Operations, UD Nanofab > 149 Evans Hall > Newark, DE 19716 > 302-831-2784 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at UDel.Edu Mon Jan 14 10:25:29 2013 From: codreanu at UDel.Edu (Iulian Codreanu) Date: Mon, 14 Jan 2013 10:25:29 -0500 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> References: <50F0409B.4090909@udel.edu> <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> Message-ID: <50F42369.40804@udel.edu> Dear Colleagues, Thank you very much for your feedback. As some of you have pointed out, it would be helpful to be more specific about the N2 grades I mentioned. I have what I call utility N2 already installed and I am designing the high purity system: - Utility N2 runs in CFOS Cu piping and is shared with the rest of the building; at best I can expect 99.999% entering that piping system from the bulk N2 system. - High purity N2 (99.9999%) will be generated using purifiers (I am debating central purification vs. distributed [per chase purifiers]) and will run in electropolished, orbitally welded 316L stainless steel downstream of the purifiers. The purifies will be fed from the same bulk N2 system but the pipe run (CFOS Cu) will be dedicated to the cleanroom. The bulk N2 system I have is not stainless steel and it does NOT have filters after the vaporizers. My thinking is similar to Dennis Schweiger's, i.e. anything that touches the product should be high purity. Iulian iulian Codreanu, Ph.D. Director of Operations, UD Nanofab 149 Evans Hall Newark, DE 19716 302-831-2784 On 1/12/2013 1:29 PM, Lynn Rathbun wrote: > Well, first you would have to define what grades you mean by utility > nitrogen and high purity nitrogen. > > ************************************************************** > Dr. Lynn Rathbun Rathbun at cnf.cornell.edu > NNIN Deputy Director(607)-254-4872 > CNF Laboratory Manager > Duffield Hall (607)-255-8601 Fax > Cornell University (607)-592-1549 Work Cell > Ithaca, New York 14853(607)-342-1880 Personal Cell > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From khbeis at uw.edu Mon Jan 14 14:06:22 2013 From: khbeis at uw.edu (Michael Khbeis) Date: Mon, 14 Jan 2013 11:06:22 -0800 Subject: [labnetwork] N2 grade for blow guns In-Reply-To: <50F42369.40804@udel.edu> References: <50F0409B.4090909@udel.edu> <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> <50F42369.40804@udel.edu> Message-ID: <9B544654-94A9-4BC6-BED1-BD6F7580A9B7@uw.edu> Iulian, At my last facility both UHP and utility N2 was run in stainless from a vaporized liquid source. The UHP ran through a purifier system. When the system hit end of life, we did extensive studies on the difference of the UHP through the purifier and utility N2 and found none. Essentially, the vaporization process was sufficient enough to produce UHP N2 so we did not need the purifier. We elected to remove the unit and saw no marked difference in yield or particle counts. In fact, most particle and contamination issues came from the dirty surface of the benches, not from the nozzle. Best regards, Dr. Michael Khbeis Associate Director Microfabrication Facility (MFF) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (C) 443.254.5192 khbeis at uw.edu On Jan 14, 2013, at 7:25 AM, Iulian Codreanu wrote: > Dear Colleagues, > > Thank you very much for your feedback. > > As some of you have pointed out, it would be helpful to be more specific about the N2 grades I mentioned. > > I have what I call utility N2 already installed and I am designing the high purity system: > - Utility N2 runs in CFOS Cu piping and is shared with the rest of the building; at best I can expect 99.999% entering that piping system from the bulk N2 system. > - High purity N2 (99.9999%) will be generated using purifiers (I am debating central purification vs. distributed [per chase purifiers]) and will run in electropolished, orbitally welded 316L stainless steel downstream of the purifiers. The purifies will be fed from the same bulk N2 system but the pipe run (CFOS Cu) will be dedicated to the cleanroom. > > The bulk N2 system I have is not stainless steel and it does NOT have filters after the vaporizers. > > My thinking is similar to Dennis Schweiger's, i.e. anything that touches the product should be high purity. > > Iulian > iulian Codreanu, Ph.D. > Director of Operations, UD Nanofab > 149 Evans Hall > Newark, DE 19716 > 302-831-2784 > > On 1/12/2013 1:29 PM, Lynn Rathbun wrote: >> Well, first you would have to define what grades you mean by utility nitrogen and high purity nitrogen. >> >> ************************************************************** >> Dr. Lynn Rathbun Rathbun at cnf.cornell.edu >> NNIN Deputy Director (607)-254-4872 >> CNF Laboratory Manager >> Duffield Hall (607)-255-8601 Fax >> Cornell University (607)-592-1549 Work Cell >> Ithaca, New York 14853 (607)-342-1880 Personal Cell >> >> >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/pkcs7-signature Size: 1345 bytes Desc: not available URL: From warren.mckenzie.anff at gmail.com Wed Jan 16 01:13:16 2013 From: warren.mckenzie.anff at gmail.com (Warren McKenzie) Date: Wed, 16 Jan 2013 17:13:16 +1100 Subject: [labnetwork] Fe in an ALD In-Reply-To: <50F42369.40804@udel.edu> References: <50F0409B.4090909@udel.edu> <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> <50F42369.40804@udel.edu> Message-ID: <50f64503.2948420a.4ebd.65d1@mx.google.com> Dear Colleagues, Does anyone have any experience depositing pure iron in an atomic layer deposition system? Our supplier has been acquired and we are having trouble identifying precursors or recipes. Our system is a CambridgeNanotech Fiji200. Regards, Warren Dr Warren McKenzie BE PhD MCom Business Development Manager - Australian National Fabrication Facility (ANFF). Level 3 Newton Building The University of New South Wales Sydney NSW 2052 AUSTRALIA Ph: +61 400 059 509 Web: www.anff.org.au Email: Warren.McKenzie at anff.org.au ANFF_logo_col_150_rgb -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 7224 bytes Desc: not available URL: From jprovine at stanford.edu Wed Jan 16 16:44:49 2013 From: jprovine at stanford.edu (J Provine) Date: Wed, 16 Jan 2013 13:44:49 -0800 Subject: [labnetwork] Fe in an ALD In-Reply-To: <50f64503.2948420a.4ebd.65d1@mx.google.com> References: <50F0409B.4090909@udel.edu> <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> <50F42369.40804@udel.edu> <50f64503.2948420a.4ebd.65d1@mx.google.com> Message-ID: we have previously used ferrorcene and O2 then reduced by H2 plasma for iron ALD. http://cambridgenanotech.com/papers/atomic%20layer%20deposition%20of%20transition%20metals.pdf On Tue, Jan 15, 2013 at 10:13 PM, Warren McKenzie < warren.mckenzie.anff at gmail.com> wrote: > Dear Colleagues, **** > > ** ** > > Does anyone have any experience depositing pure iron in an atomic layer > deposition system? Our supplier has been acquired and we are having trouble > identifying precursors or recipes.**** > > ** ** > > Our system is a CambridgeNanotech Fiji200.**** > > ** ** > > Regards, **** > > Warren**** > > ** ** > > ** ** > > *Dr Warren McKenzie * > > BE PhD MCom**** > > ** ** > > Business Development Manager - Australian National Fabrication Facility > (ANFF).**** > > ** ** > > Level 3 Newton Building **** > > The University of New South Wales**** > > Sydney NSW 2052**** > > AUSTRALIA**** > > ** ** > > Ph: +61 400 059 509**** > > Web: www.anff.org.au**** > > Email: Warren.McKenzie at anff.org.au **** > > ** ** > > [image: ANFF_logo_col_150_rgb]**** > > ** ** > > ** ** > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Wed Jan 16 21:11:43 2013 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm) Date: Wed, 16 Jan 2013 21:11:43 -0500 Subject: [labnetwork] Fe in an ALD In-Reply-To: <50f64503.2948420a.4ebd.65d1@mx.google.com> References: <50F0409B.4090909@udel.edu> <5863FB4055D90542A7A7DAE0CEF2ACB00866435691@E2K7CCR1.netvigour.com> <6.2.5.6.2.20130112132805.0b178d90@cnf.cornell.edu> <50F42369.40804@udel.edu>,<50f64503.2948420a.4ebd.65d1@mx.google.com> Message-ID: <8F95EA77ACBF904A861E580B44288EFD9C2480B057@FASXCH02.fasmail.priv> Hi Warren, Just an fyi, for you and any other Cambridge Nanotech customers... Cambridge Nanotech has been acquired by Ultratech, and the plan is to have the "Cambridge Nanotech" division of Ultratech open for business shortly. We are just down the road from them, and in fact, we have an order pending for some spare parts. Mac Hathaway Harvard Center for Nanoscale Systems Cambridge, MA (USA) ________________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] On Behalf Of Warren McKenzie [warren.mckenzie.anff at gmail.com] Sent: Wednesday, January 16, 2013 1:13 AM To: 'Fab Network' Subject: [labnetwork] Fe in an ALD Dear Colleagues, Does anyone have any experience depositing pure iron in an atomic layer deposition system? Our supplier has been acquired and we are having trouble identifying precursors or recipes. Our system is a CambridgeNanotech Fiji200. Regards, Warren Dr Warren McKenzie BE PhD MCom Business Development Manager - Australian National Fabrication Facility (ANFF). Level 3 Newton Building The University of New South Wales Sydney NSW 2052 AUSTRALIA Ph: +61 400 059 509 Web: www.anff.org.au Email: Warren.McKenzie at anff.org.au [cid:image001.jpg at 01CDF40C.C625BFC0] From mtang at stanford.edu Thu Jan 17 14:09:32 2013 From: mtang at stanford.edu (Mary Tang) Date: Thu, 17 Jan 2013 11:09:32 -0800 Subject: [labnetwork] Recirculating DI water spray guns? Message-ID: <50F84C6C.70803@stanford.edu> Dear labnetwork members -- Our wet benches have "recirculating" DI guns to avoid stagnant water lines. WIth 10 wet benches, this adds up to 50K gallons of DI water each year. We are in the process of replacing our wet benches. All of the wet bench providers we've spoken with have said that most of their customers are choosing to use non-recirculating DI spray guns to save water. But I wonder if this may be feasible in certain lab environments. Does anyone have advice and insight to offer? Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From rmorrison at draper.com Thu Jan 17 15:16:18 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 17 Jan 2013 20:16:18 +0000 Subject: [labnetwork] Recirculation DI water spray guns? In-Reply-To: <50F84C6C.70803@stanford.edu> References: <50F84C6C.70803@stanford.edu> Message-ID: HI Mary, We just purchased 10 new benches for the Draper Microfabrication lab, the DI from the loop enters into the bench on the supply side and exits to the return loop. The DI guns are a dead leg, we just dump the first 30 seconds down the drain and then check for bacteria every 6 months. So far so good. Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mary Tang Sent: Thursday, January 17, 2013 2:10 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Recirculating DI water spray guns? Dear labnetwork members -- Our wet benches have "recirculating" DI guns to avoid stagnant water lines. WIth 10 wet benches, this adds up to 50K gallons of DI water each year. We are in the process of replacing our wet benches. All of the wet bench providers we've spoken with have said that most of their customers are choosing to use non-recirculating DI spray guns to save water. But I wonder if this may be feasible in certain lab environments. Does anyone have advice and insight to offer? Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From kuhn1 at purdue.edu Thu Jan 17 15:53:05 2013 From: kuhn1 at purdue.edu (Kuhn, Jeffrey G) Date: Thu, 17 Jan 2013 20:53:05 +0000 Subject: [labnetwork] Recirculating DI water spray guns? In-Reply-To: <50F84C6C.70803@stanford.edu> References: <50F84C6C.70803@stanford.edu> Message-ID: <06C167B22748364D85BCA1AA812FDA1A210CCA66@WPVEXCMBX02.purdue.lcl> Mary, Our circulating DI water guns return the water back to the storage tank via the return loop piping. Since the water is returned to the tank, it is not actually consumed. This configuration uses no more DI water than if our piping were to dead-end at the guns. The only time water is actually consumed is when the guns are in operation. The issues I see with using a circulating configuration are primarily cost driven. The UPW distribution pump needs to be sized large enough to accommodate the additional flow requirement. The distribution loop equipment (resin & membrane systems, UV, etc.) also need to be sized such that it can handle the additional flow. These things are usually initial design considerations that an existing facility should already be beyond. Other cost factors are that the circulating guns themselves are more costly, and there is additional PVDF piping required to construct the loops. Personally, I would never use a non-circulating DI water gun unless I was certain that bacteria would not be an issue. You will almost certainly develop bacterial growth in any stagnant DI water piping and hardware. I can personally attest to the ability of bacteria to grow amazingly well in low nutrient environments. Continuous flow is one method of combating bacterial growth in UPW systems; the flow helps prevent them from gaining a "foothold" on the pipe walls. I am a bit surprised to hear folks are using non-circulating DI water spray guns. I'd be interested in hearing the logic behind why that is being considered, especially since it doesn't really save any water. However, as I mentioned before if bacteria is not an issue then non-circulating guns may be fine. I hope this helps somewhat. Regards, Jeff Kuhn Facility Engineer Birck Nanotechnology Center Purdue University 1205 W. State St. West Lafayette, IN 47907 Ph: (765) 496-8329 Fax: (765) 496-2018 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mary Tang Sent: Thursday, January 17, 2013 2:10 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Recirculating DI water spray guns? Dear labnetwork members -- Our wet benches have "recirculating" DI guns to avoid stagnant water lines. WIth 10 wet benches, this adds up to 50K gallons of DI water each year. We are in the process of replacing our wet benches. All of the wet bench providers we've spoken with have said that most of their customers are choosing to use non-recirculating DI spray guns to save water. But I wonder if this may be feasible in certain lab environments. Does anyone have advice and insight to offer? Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From schweig at umich.edu Thu Jan 17 16:25:31 2013 From: schweig at umich.edu (Dennis Schweiger) Date: Thu, 17 Jan 2013 16:25:31 -0500 Subject: [labnetwork] Recirculating DI water spray guns? In-Reply-To: <50F84C6C.70803@stanford.edu> References: <50F84C6C.70803@stanford.edu> Message-ID: Mary, I don't understand your question. If you're recirculating the water in the guns, you're not really losing it, it's just being returned to the storage tank to be polished and sent back out on your DI loop. Or, are your guns "bleeding" water off to drain to keep the water at the nozzle "fresh"? Here at UofM, all of the newer wet benches have recirculating guns. The older benches are just single pass (and these are gradually being replaced). There doesn't appear to be any problems with the older style operation. The thing to remember is that you're building a fab for the future, at some point you may need the cleanliness that recirculation offers. If your benches aren't set up that way now, modifying them, or replacing them, to get that functionality at a later date is expensive. Thanks, Dennis Schweiger Facilities Manager Lurie Nanofabrication Facility Unifersity of Michigan 734.647.2055 Ofc On Thu, Jan 17, 2013 at 2:09 PM, Mary Tang wrote: > Dear labnetwork members -- > > Our wet benches have "recirculating" DI guns to avoid stagnant water > lines. WIth 10 wet benches, this adds up to 50K gallons of DI water each > year. We are in the process of replacing our wet benches. All of the wet > bench providers we've spoken with have said that most of their customers > are choosing to use non-recirculating DI spray guns to save water. But I > wonder if this may be feasible in certain lab environments. Does anyone > have advice and insight to offer? > > Mary > > -- > Mary X. Tang, Ph.D. > Stanford Nanofabrication Facility > Paul G. Allen Room 136, Mail Code 4070 > Stanford, CA 94305 > (650)723-9980 > mtang at stanford.edu > http://snf.stanford.edu > > > > ______________________________**_________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/**mailman/listinfo.cgi/**labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From len.olona at ou.edu Fri Jan 18 09:46:43 2013 From: len.olona at ou.edu (Olona, Leonard E.) Date: Fri, 18 Jan 2013 14:46:43 +0000 Subject: [labnetwork] Recirculating DI water spray guns? In-Reply-To: <06C167B22748364D85BCA1AA812FDA1A210CCA66@WPVEXCMBX02.purdue.lcl> Message-ID: <31F2F95FCDFB2A4EBCF5340D57E798E209CB3C93@it-athena.sooner.net.ou.edu> Hi Mary, I agree with Jeff. Here at OU our DI system has a return loop. However, the DI guns inside our acid bench have a short run that does not return. Simply put.... WE only use our DI water guns for general wash down or final decontamination of the bench. It's much better than using city water. And we do not encourage the students and or researchers to use the spray guns where pure DI (18Mohm) is required. I like to think of the DI "vegetable" sprayer as a cleanup tool. You could do an experiment where you run the sprayer into a beaker and check resistivity. Letting it run for a while may clear things up. We also have an inline ultraviolet system bacteria unit that helps keep the biological fishes at bay! It really all depends on what you're trying to achieve. The level of resistivity that is required. Biological stuff as well. (we are not too concerned with the latter) Etc... I hope this helps. Thank you, -Len Leonard E. Olona University Cleanroom Director and Facility Manager University of Oklahoma 110 West Boyd Street Norman, Oklahoma 73019 Email len.olona at ou.edu Desk 405 325-4374 Cell 405 630-9068 Fax 405 325-7066 On 1/17/13 2:53 PM, "Kuhn, Jeffrey G" wrote: >Mary, > >Our circulating DI water guns return the water back to the storage tank >via the return loop piping. Since the water is returned to the tank, it >is not actually consumed. This configuration uses no more DI water than >if our piping were to dead-end at the guns. The only time water is >actually consumed is when the guns are in operation. > >The issues I see with using a circulating configuration are primarily >cost driven. The UPW distribution pump needs to be sized large enough to >accommodate the additional flow requirement. The distribution loop >equipment (resin & membrane systems, UV, etc.) also need to be sized such >that it can handle the additional flow. These things are usually initial >design considerations that an existing facility should already be beyond. >Other cost factors are that the circulating guns themselves are more >costly, and there is additional PVDF piping required to construct the >loops. > >Personally, I would never use a non-circulating DI water gun unless I was >certain that bacteria would not be an issue. You will almost certainly >develop bacterial growth in any stagnant DI water piping and hardware. I >can personally attest to the ability of bacteria to grow amazingly well >in low nutrient environments. Continuous flow is one method of combating >bacterial growth in UPW systems; the flow helps prevent them from gaining >a "foothold" on the pipe walls. > >I am a bit surprised to hear folks are using non-circulating DI water >spray guns. I'd be interested in hearing the logic behind why that is >being considered, especially since it doesn't really save any water. >However, as I mentioned before if bacteria is not an issue then >non-circulating guns may be fine. > >I hope this helps somewhat. > >Regards, > >Jeff Kuhn >Facility Engineer >Birck Nanotechnology Center >Purdue University >1205 W. State St. >West Lafayette, IN 47907 >Ph: (765) 496-8329 >Fax: (765) 496-2018 > > > >-----Original Message----- >From: labnetwork-bounces at mtl.mit.edu >[mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mary Tang >Sent: Thursday, January 17, 2013 2:10 PM >To: labnetwork at mtl.mit.edu >Subject: [labnetwork] Recirculating DI water spray guns? > >Dear labnetwork members -- > >Our wet benches have "recirculating" DI guns to avoid stagnant water >lines. WIth 10 wet benches, this adds up to 50K gallons of DI water each >year. We are in the process of replacing our wet benches. All of the >wet bench providers we've spoken with have said that most of their >customers are choosing to use non-recirculating DI spray guns to save >water. But I wonder if this may be feasible in certain lab >environments. Does anyone have advice and insight to offer? > >Mary > >-- >Mary X. Tang, Ph.D. >Stanford Nanofabrication Facility >Paul G. Allen Room 136, Mail Code 4070 >Stanford, CA 94305 >(650)723-9980 >mtang at stanford.edu >http://snf.stanford.edu > > > >_______________________________________________ >labnetwork mailing list >labnetwork at mtl.mit.edu >https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > >_______________________________________________ >labnetwork mailing list >labnetwork at mtl.mit.edu >https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From agadre at ucmerced.edu Fri Jan 18 17:50:41 2013 From: agadre at ucmerced.edu (Anand Gadre) Date: Fri, 18 Jan 2013 22:50:41 +0000 Subject: [labnetwork] Sputter Coating Equipment Message-ID: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com> Dear Colleagues, We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated. Here is a list of specific requirements from our users: 1.In need of a more advanced sputter setup for niobium and niobium nitride deposition. DC/RF magnetron sputtering system. ) Specific Reuirements: ? sputtering machine that can sputter niobium or niobium nitride that becomes superconducting at cryogenic temperatures. ? -DC/RF magnetron sputtering system ? -This requires a cleaned argon discharge that has been passed through a liquid nitrogen trap, either outside or inside the sputtering chamber. ? -The RF sputtering power level should be above 100 Watts. ? -There should be shutters inside the sputtering chamber that can be rotated into, or out of, the front of the sample, at will. ? -There also should be a crystal oscillator thickness monitor so that we can measure the sputtered thickness of the niobium or niobium nitride films. ? -Temperature ranges up to 700C ? -We shouldn't need more than 2 targets for our purpose, but it might be nice to support multiple targets in a user facility ? -sample areas on the order of 10X10 cm 2. In need for a high quality Nb deposition (superconductor). System requirements. 3. Need magnetron sputter for high quality insulating film deposition. 4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?). 5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required. 6. dc/ac magnetron (deposition of both metal and ceramic possible) - heating up to > 400C (preferably up to 600C) - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr) - Power > 200 W (both dc and ac) - Chiller pump flow: > 5 lpm @20 psi - Feeding oxidant possible (for example, 10% O2 / 90% N2) Optional - 4'' wafer size preferred, but smaller ones are still okay - Substrate rotation control (for uniform deposition) Thanks, Anand Gadre, Ph.D, MBA Director Stem Cell Instrumentation Foundry (SCIF) University of California, Merced 5200 N. Lake Road Merced, CA 95343 Phone: (O): 209-228-2345 Phone (C): (209) 658-3879 Fax: (209) 228 4424 Email: agadre at ucmerced.edu SCIF website: Scif.ucmerced.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Sat Jan 19 10:45:31 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Sat, 19 Jan 2013 15:45:31 +0000 Subject: [labnetwork] Sputter Coating Equipment In-Reply-To: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com> References: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com> Message-ID: I would try Lesker they make excellent research tools. Rick ________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Anand Gadre [agadre at ucmerced.edu] Sent: Friday, January 18, 2013 5:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sputter Coating Equipment Dear Colleagues, We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated. Here is a list of specific requirements from our users: 1.In need of a more advanced sputter setup for niobium and niobium nitride deposition. DC/RF magnetron sputtering system. ) Specific Reuirements: ? sputtering machine that can sputter niobium or niobium nitride that becomes superconducting at cryogenic temperatures. ? -DC/RF magnetron sputtering system ? -This requires a cleaned argon discharge that has been passed through a liquid nitrogen trap, either outside or inside the sputtering chamber. ? -The RF sputtering power level should be above 100 Watts. ? -There should be shutters inside the sputtering chamber that can be rotated into, or out of, the front of the sample, at will. ? -There also should be a crystal oscillator thickness monitor so that we can measure the sputtered thickness of the niobium or niobium nitride films. ? -Temperature ranges up to 700C ? -We shouldn't need more than 2 targets for our purpose, but it might be nice to support multiple targets in a user facility ? -sample areas on the order of 10X10 cm 2. In need for a high quality Nb deposition (superconductor). System requirements. 3. Need magnetron sputter for high quality insulating film deposition. 4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?). 5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required. 6. dc/ac magnetron (deposition of both metal and ceramic possible) - heating up to > 400C (preferably up to 600C) - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr) - Power > 200 W (both dc and ac) - Chiller pump flow: > 5 lpm @20 psi - Feeding oxidant possible (for example, 10% O2 / 90% N2) Optional - 4'' wafer size preferred, but smaller ones are still okay - Substrate rotation control (for uniform deposition) Thanks, Anand Gadre, Ph.D, MBA Director Stem Cell Instrumentation Foundry (SCIF) University of California, Merced 5200 N. Lake Road Merced, CA 95343 Phone: (O): 209-228-2345 Phone (C): (209) 658-3879 Fax: (209) 228 4424 Email: agadre at ucmerced.edu SCIF website: Scif.ucmerced.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From reynolds at ece.ucsb.edu Sat Jan 19 11:02:08 2013 From: reynolds at ece.ucsb.edu (reynolds) Date: Sat, 19 Jan 2013 08:02:08 -0800 Subject: [labnetwork] Sputter Coating Equipment In-Reply-To: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com> References: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com> Message-ID: Hi Anand, We have five different sputter tools at UCSB. Two older SFI systems, two AJA systems and a custom built Kurt J Lesker tool. The two multi target systems from AJA, http://www.ajaint.com/systems.htm are our most current purchases. We have had great performance from the systems and they will build to your requirements. The Lesker tool may be less expensive than the AJA, but it has no bells and whistles and is a very manual tool with a simple loadlock. It requires that you select and help design the tool, but can save on cost. SFI was purchased by Tegal and at this point I don't even know if they design new sputter tools. Hope this helps, Tom -- Tom Reynolds Lab Manager UCSB Nanofab Engineering Science Building #225, Room 1109E Santa Barbara, CA 93106 805-893-3918 office 805-451-3979 cell 805-893-7210 fax On 2013-01-18 14:50, Anand Gadre wrote: > Dear Colleagues, > > We are planning to purchase a sputter coating machine (new or > refurbished) that may be placed in our class 1000 cleanroom at the > Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already > got in touch with one vendor in California (ANATECH USA) and received > a quote from him but I would like to contact more manufacturers who > would offer best suitable equipment that would fit well with our > research needs with better price. Any advice about the > manufacturers/vendors of such a machine would be much appreciated. > > Here is a list of specific requirements from our users: > > 1.In need of a more advanced sputter setup for > > niobium and niobium nitride deposition. DC/RF magnetron sputtering > system. ) > > Specific Reuirements: > > ? sputtering machine that can sputter niobium or niobium nitride > that becomes superconducting at cryogenic temperatures. > > ? -DC/RF magnetron sputtering system > > ? -This requires a cleaned argon discharge that has been passed > through a liquid nitrogen trap, either outside or inside the > sputtering chamber. > > ? -The RF sputtering power level should be above 100 Watts. > > ? -There should be shutters inside the sputtering chamber that can > be rotated into, or out of, the front of the sample, at will. > > ? -There also should be a crystal oscillator thickness monitor so > that we can measure the sputtered thickness of the niobium or niobium > nitride films. > > ? -Temperature ranges up to 700C > > ? -We shouldn't need more than 2 targets for our purpose, but it > might be nice to support multiple targets in a user facility > > ? -sample areas on the order of 10X10 cm > > 2. In need for a high quality Nb deposition (superconductor). System > requirements. > > 3. Need magnetron sputter for high quality insulating film > deposition. > > 4. Potentially interested in sputtering metal and metal oxide (maybe > reactive sputtering?). > > 5. Indium Tin Oxide (transparent, conductive substrate) deposition > needed. High vacuum required. > > 6. dc/ac magnetron (deposition of both metal and ceramic possible) > > - heating up to > 400C (preferably up to 600C) > > - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 > mTorr) > > - Power > 200 W (both dc and ac) > > - Chiller pump flow: > 5 lpm @20 psi > > - Feeding oxidant possible (for example, 10% O2 / 90% N2) > > Optional > > - 4'' wafer size preferred, but smaller ones are still okay > > - Substrate rotation control (for uniform deposition) > > Thanks, > > Anand Gadre, Ph.D, MBA > Director > Stem Cell Instrumentation Foundry (SCIF) > University of California, Merced > 5200 N. Lake Road > Merced, CA 95343 > Phone: (O): 209-228-2345 > Phone (C): (209) 658-3879 > Fax: (209) 228 4424 > Email: agadre at ucmerced.edu > SCIF website: Scif.ucmerced.edu > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From sgupta at eng.ua.edu Sat Jan 19 16:17:22 2013 From: sgupta at eng.ua.edu (Gupta, Su) Date: Sat, 19 Jan 2013 15:17:22 -0600 Subject: [labnetwork] Sputter Coating Equipment In-Reply-To: References: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com>, Message-ID: <1B53C0DED5D00E40A81DF47DBF6A3DCB03A6C82D71A3@MAIL1.ua-net.ua.edu> Hi Anand: I haved been in the sputter coating industry for over twenty years prior to moving to academia in 2004. I agree with Tom the AJA is your best best -- they are dominating the R&D market right now. I have an SFI Shamrock seven-gun tool -- it is exceptional for my GNR/TMR needs, but for more general purposes I would recommend AJA. Also SFI has been out of business for many years now, and it is difficult finding support for the tools. All the best, Su ________________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] On Behalf Of reynolds [reynolds at ece.ucsb.edu] Sent: Saturday, January 19, 2013 10:02 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sputter Coating Equipment Hi Anand, We have five different sputter tools at UCSB. Two older SFI systems, two AJA systems and a custom built Kurt J Lesker tool. The two multi target systems from AJA, http://www.ajaint.com/systems.htm are our most current purchases. We have had great performance from the systems and they will build to your requirements. The Lesker tool may be less expensive than the AJA, but it has no bells and whistles and is a very manual tool with a simple loadlock. It requires that you select and help design the tool, but can save on cost. SFI was purchased by Tegal and at this point I don't even know if they design new sputter tools. Hope this helps, Tom -- Tom Reynolds Lab Manager UCSB Nanofab Engineering Science Building #225, Room 1109E Santa Barbara, CA 93106 805-893-3918 office 805-451-3979 cell 805-893-7210 fax On 2013-01-18 14:50, Anand Gadre wrote: > Dear Colleagues, > > We are planning to purchase a sputter coating machine (new or > refurbished) that may be placed in our class 1000 cleanroom at the > Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already > got in touch with one vendor in California (ANATECH USA) and received > a quote from him but I would like to contact more manufacturers who > would offer best suitable equipment that would fit well with our > research needs with better price. Any advice about the > manufacturers/vendors of such a machine would be much appreciated. > > Here is a list of specific requirements from our users: > > 1.In need of a more advanced sputter setup for > > niobium and niobium nitride deposition. DC/RF magnetron sputtering > system. ) > > Specific Reuirements: > > ? sputtering machine that can sputter niobium or niobium nitride > that becomes superconducting at cryogenic temperatures. > > ? -DC/RF magnetron sputtering system > > ? -This requires a cleaned argon discharge that has been passed > through a liquid nitrogen trap, either outside or inside the > sputtering chamber. > > ? -The RF sputtering power level should be above 100 Watts. > > ? -There should be shutters inside the sputtering chamber that can > be rotated into, or out of, the front of the sample, at will. > > ? -There also should be a crystal oscillator thickness monitor so > that we can measure the sputtered thickness of the niobium or niobium > nitride films. > > ? -Temperature ranges up to 700C > > ? -We shouldn't need more than 2 targets for our purpose, but it > might be nice to support multiple targets in a user facility > > ? -sample areas on the order of 10X10 cm > > 2. In need for a high quality Nb deposition (superconductor). System > requirements. > > 3. Need magnetron sputter for high quality insulating film > deposition. > > 4. Potentially interested in sputtering metal and metal oxide (maybe > reactive sputtering?). > > 5. Indium Tin Oxide (transparent, conductive substrate) deposition > needed. High vacuum required. > > 6. dc/ac magnetron (deposition of both metal and ceramic possible) > > - heating up to > 400C (preferably up to 600C) > > - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 > mTorr) > > - Power > 200 W (both dc and ac) > > - Chiller pump flow: > 5 lpm @20 psi > > - Feeding oxidant possible (for example, 10% O2 / 90% N2) > > Optional > > - 4'' wafer size preferred, but smaller ones are still okay > > - Substrate rotation control (for uniform deposition) > > Thanks, > > Anand Gadre, Ph.D, MBA > Director > Stem Cell Instrumentation Foundry (SCIF) > University of California, Merced > 5200 N. Lake Road > Merced, CA 95343 > Phone: (O): 209-228-2345 > Phone (C): (209) 658-3879 > Fax: (209) 228 4424 > Email: agadre at ucmerced.edu > SCIF website: Scif.ucmerced.edu > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From fouad.karouta at anu.edu.au Sun Jan 20 20:38:42 2013 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Mon, 21 Jan 2013 12:38:42 +1100 Subject: [labnetwork] Glassware Message-ID: <00e401cdf778$0b716750$225435f0$@anu.edu.au> Dear all, I am looking to source glassware I want to use to ultrasonically clean photolithography masks (4 and 5" size) in acetone and iso-propanol. I haven't bought yet the ultrasonic system as I wanted first to find a supplier for the glassware. Ideally I am looking for a rectangular base glassware of minimum dimensions 200x150 mm2 with a height of 150 to 200mm. The glassware can be quartz, pyrex or other glass. Can anyone suggest a supplier for such a glassware? Kind regards, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From len.olona at ou.edu Mon Jan 21 10:07:01 2013 From: len.olona at ou.edu (Olona, Leonard E.) Date: Mon, 21 Jan 2013 15:07:01 +0000 Subject: [labnetwork] Glassware In-Reply-To: <00e401cdf778$0b716750$225435f0$@anu.edu.au> Message-ID: <31F2F95FCDFB2A4EBCF5340D57E798E209CB5B22@it-athena.sooner.net.ou.edu> Fouad, Try Schott Glassware, or VWR, Fisher Scientific. http://www.us.schott.com/english/index.html Most ultrasonic tanks are square or rectangular in design. Using a cylindrical pyrex beaker can work. But you will need to size up your tank a bit. I hope this helps you. -Len Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Norman, Oklahoma 73019 Email len.olona at ou.edu Desk 405 325-4374 Cell 405 630-9068 Fax 405 325-7066 From: Fouad Karouta > Date: Sunday, January 20, 2013 7:38 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Glassware Dear all, I am looking to source glassware I want to use to ultrasonically clean photolithography masks (4 and 5? size) in acetone and iso-propanol. I haven?t bought yet the ultrasonic system as I wanted first to find a supplier for the glassware. Ideally I am looking for a rectangular base glassware of minimum dimensions 200x150 mm2 with a height of 150 to 200mm. The glassware can be quartz, pyrex or other glass. Can anyone suggest a supplier for such a glassware? Kind regards, Fouad Karouta ********************************* Facility Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au -------------- next part -------------- An HTML attachment was scrubbed... URL: From agadre at ucmerced.edu Mon Jan 21 18:37:56 2013 From: agadre at ucmerced.edu (Anand Gadre) Date: Mon, 21 Jan 2013 23:37:56 +0000 Subject: [labnetwork] Sputter Coating Equipment In-Reply-To: References: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com>, Message-ID: <1B4DD9C1D91227429C8A27AFD1A12850C00BEA@CH1PRD0611MB432.namprd06.prod.outlook.com> Dear Colleagues, Thank you very much for the information and for sharing your thoughts about the sputter coating machine. I am in process of contacting all the manufactures that you recommended. Best, Anand ________________________________ From: Morrison, Richard H., Jr. [rmorrison at draper.com] Sent: Saturday, January 19, 2013 7:45 AM To: Anand Gadre; labnetwork at mtl.mit.edu Subject: RE: Sputter Coating Equipment I would try Lesker they make excellent research tools. Rick ________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Anand Gadre [agadre at ucmerced.edu] Sent: Friday, January 18, 2013 5:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sputter Coating Equipment Dear Colleagues, We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated. Here is a list of specific requirements from our users: 1.In need of a more advanced sputter setup for niobium and niobium nitride deposition. DC/RF magnetron sputtering system. ) Specific Reuirements: ? sputtering machine that can sputter niobium or niobium nitride that becomes superconducting at cryogenic temperatures. ? -DC/RF magnetron sputtering system ? -This requires a cleaned argon discharge that has been passed through a liquid nitrogen trap, either outside or inside the sputtering chamber. ? -The RF sputtering power level should be above 100 Watts. ? -There should be shutters inside the sputtering chamber that can be rotated into, or out of, the front of the sample, at will. ? -There also should be a crystal oscillator thickness monitor so that we can measure the sputtered thickness of the niobium or niobium nitride films. ? -Temperature ranges up to 700C ? -We shouldn't need more than 2 targets for our purpose, but it might be nice to support multiple targets in a user facility ? -sample areas on the order of 10X10 cm 2. In need for a high quality Nb deposition (superconductor). System requirements. 3. Need magnetron sputter for high quality insulating film deposition. 4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?). 5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required. 6. dc/ac magnetron (deposition of both metal and ceramic possible) - heating up to > 400C (preferably up to 600C) - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr) - Power > 200 W (both dc and ac) - Chiller pump flow: > 5 lpm @20 psi - Feeding oxidant possible (for example, 10% O2 / 90% N2) Optional - 4'' wafer size preferred, but smaller ones are still okay - Substrate rotation control (for uniform deposition) Thanks, Anand Gadre, Ph.D, MBA Director Stem Cell Instrumentation Foundry (SCIF) University of California, Merced 5200 N. Lake Road Merced, CA 95343 Phone: (O): 209-228-2345 Phone (C): (209) 658-3879 Fax: (209) 228 4424 Email: agadre at ucmerced.edu SCIF website: Scif.ucmerced.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From amsanc02 at louisville.edu Wed Jan 23 11:50:25 2013 From: amsanc02 at louisville.edu (Sanchez Galiano,Ana Maria) Date: Wed, 23 Jan 2013 16:50:25 +0000 Subject: [labnetwork] Equipment Online Scheduling Recomendation Message-ID: Could anyone please advise me on a good free or low cost online scheduler for lab equipment? Any comments about FOM (Facility Online Manager)? Thank you, ______________________________ Ana M Sanchez Galiano -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Wed Jan 23 15:29:50 2013 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Wed, 23 Jan 2013 15:29:50 -0500 Subject: [labnetwork] vacuum pump rebuilding Message-ID: <5100483E.4060409@seas.upenn.edu> Hello, I manage the nanofab at Penn and was looking for some help. Can anyone recommend a company close to Philadelphia that rebuilds vacuum pumps? I'm looking specifically for a company that is willing to deal with fomblin-prepared pumps used on systems with corrosive gasses, that is also willing to pick up/drop off the pumps. If you do not know of any near Philadelphia, I would also be interested in companies that have reasonably simple shipping requirements and policies that perform the above-mentioned work. Thank you for your help. -- Kyle Keenan Cleanroom Engineer Wolf Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-2068 From James_Goodman at uml.edu Wed Jan 23 15:46:23 2013 From: James_Goodman at uml.edu (Goodman, James R) Date: Wed, 23 Jan 2013 20:46:23 +0000 Subject: [labnetwork] vacuum pump rebuilding In-Reply-To: <5100483E.4060409@seas.upenn.edu> References: <5100483E.4060409@seas.upenn.edu> Message-ID: Kyle, You may want to check with Kurt Lesker, I believe they are fairly close to you. If you have no luck I have had good results with Mass Vac in Billerica Massachusetts. Curt Paden is my contact and you can reach him at: Mass Vac 247 Rangeway Rd North Billerica, MA 01862 (978) 667-2393 Regards, Jay. James Goodman Equipment Manager, Saab/ETIC Nanofabrication Laboratory 40 University Ave. Room 121 Lowell, MA -01854 Office (978) 934-3469 Cell (603) 235-1496 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Kyle Keenan Sent: Wednesday, January 23, 2013 3:30 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] vacuum pump rebuilding Hello, I manage the nanofab at Penn and was looking for some help. Can anyone recommend a company close to Philadelphia that rebuilds vacuum pumps? I'm looking specifically for a company that is willing to deal with fomblin-prepared pumps used on systems with corrosive gasses, that is also willing to pick up/drop off the pumps. If you do not know of any near Philadelphia, I would also be interested in companies that have reasonably simple shipping requirements and policies that perform the above-mentioned work. Thank you for your help. -- Kyle Keenan Cleanroom Engineer Wolf Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-2068 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From michael.rooks at yale.edu Wed Jan 23 15:55:42 2013 From: michael.rooks at yale.edu (Michael Rooks) Date: Wed, 23 Jan 2013 15:55:42 -0500 Subject: [labnetwork] Equipment Online Scheduling Recomendation In-Reply-To: References: Message-ID: <51004E4E.608@yale.edu> We use Badger, which is the new version of Coral (developed at Stanford). Badger can be used for both scheduling and charging for laboratory equipment use. When using Badger for billing, it can control ethernet-connected relay boxes (e.g. to switch off monitors). It's not free, but you get what you pay for. Contact Mike Bell for more information. We used to use a Google calendar for scheduling, but it got too chaotic. Google can't enforce any time limit rules, unlike Badger. --------------------- Michael Rooks Yale Institute for Nanoscience & Quantum Engineering nano.yale.edu On 01/23/2013 11:50 AM, Sanchez Galiano,Ana Maria wrote: > > Could anyone please advise me on a good free or low cost online > scheduler for lab equipment? > > Any comments about FOM (Facility Online Manager)? > > Thank you, > > *______________________________* > > *Ana M Sanchez Galiano* > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From tbritton at criticalsystemsinc.com Wed Jan 23 15:55:13 2013 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Wed, 23 Jan 2013 20:55:13 +0000 Subject: [labnetwork] vacuum pump rebuilding In-Reply-To: <5100483E.4060409@seas.upenn.edu> References: <5100483E.4060409@seas.upenn.edu> Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2EEFE085@P3PWEX2MB006.ex2.secureserver.net> Hi Kyle, I'd recommend ADVACO. The contact is Kaye Kolb, and they take care of vacuum pumps and other exhaust specific equipment. Here is their contact info. Their website is www.advaco.com. Advanced Vacuum Company, Inc. 1215 Business Parkway North, Westminster, MD 21157 1-800-272-2525 [http://www.advaco.com/images/bullet.gif] (410) 876-8200 [http://www.advaco.com/images/bullet.gif] FAX (410) 876-5820 Have a great day! Tom Britton Sales Manager Critical Systems, Inc. 7000 W. Victory Road Boise, ID 83709 Direct: 208-890-1417 Shop: 877-572-5515 www.criticalsystemsinc.com "World Leader in UHP Reconditioned Gas Delivery & Abatement Technologies" -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Kyle Keenan Sent: Wednesday, January 23, 2013 1:30 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] vacuum pump rebuilding Hello, I manage the nanofab at Penn and was looking for some help. Can anyone recommend a company close to Philadelphia that rebuilds vacuum pumps? I'm looking specifically for a company that is willing to deal with fomblin-prepared pumps used on systems with corrosive gasses, that is also willing to pick up/drop off the pumps. If you do not know of any near Philadelphia, I would also be interested in companies that have reasonably simple shipping requirements and policies that perform the above-mentioned work. Thank you for your help. -- Kyle Keenan Cleanroom Engineer Wolf Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-2068 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 168 bytes Desc: image001.png URL: From len.olona at ou.edu Wed Jan 23 16:38:44 2013 From: len.olona at ou.edu (Olona, Leonard E.) Date: Wed, 23 Jan 2013 21:38:44 +0000 Subject: [labnetwork] vacuum pump rebuilding In-Reply-To: <5100483E.4060409@seas.upenn.edu> Message-ID: <31F2F95FCDFB2A4EBCF5340D57E798E209CB7B15@it-athena.sooner.net.ou.edu> Kyle, I realize that these guys are away from your home. However, they are top notch. We used them at Intel and when I worked at Sandia National Labs. OU uses them exclusively. And hey, that?s what fed-ex is for. Here is the link. http://www.pchemlabs.com/ I'm certain that there are plenty of pump rebuild shops near your neck of the woods. Research Triangle is close by. Cheers! -Len Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Norman, Oklahoma 73019 Email len.olona at ou.edu Desk 405 325-4374 Cell 405 630-9068 Fax 405 325-7066 On 1/23/13 2:29 PM, "Kyle Keenan" wrote: >Hello, > >I manage the nanofab at Penn and was looking for some help. > >Can anyone recommend a company close to Philadelphia that rebuilds >vacuum pumps? I'm looking specifically for a company that is willing to >deal with fomblin-prepared pumps used on systems with corrosive gasses, >that is also willing to pick up/drop off the pumps. > >If you do not know of any near Philadelphia, I would also be interested >in companies that have reasonably simple shipping requirements and >policies that perform the above-mentioned work. > >Thank you for your help. >-- >Kyle Keenan > >Cleanroom Engineer >Wolf Nanofabrication Facility >University of Pennsylvania >P: 215-898-7560 >F: 215-573-2068 > >_______________________________________________ >labnetwork mailing list >labnetwork at mtl.mit.edu >https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From len.olona at ou.edu Wed Jan 23 16:43:07 2013 From: len.olona at ou.edu (Olona, Leonard E.) Date: Wed, 23 Jan 2013 21:43:07 +0000 Subject: [labnetwork] Equipment Online Scheduling Recomendation In-Reply-To: Message-ID: <31F2F95FCDFB2A4EBCF5340D57E798E209CB7B2A@it-athena.sooner.net.ou.edu> We are currently developing our own here are OU. Stay tuned and I can ask my webmaster if he is willing to contact you to discuss. I believe he programs in Drupal 7 or Merci. -Len Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Norman, Oklahoma 73019 Email len.olona at ou.edu Desk 405 325-4374 Cell 405 630-9068 Fax 405 325-7066 From: "", Ana Maria > Date: Wednesday, January 23, 2013 10:50 AM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Equipment Online Scheduling Recomendation Could anyone please advise me on a good free or low cost online scheduler for lab equipment? Any comments about FOM (Facility Online Manager)? Thank you, ______________________________ Ana M Sanchez Galiano -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Wed Jan 23 17:35:36 2013 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Thu, 24 Jan 2013 09:35:36 +1100 Subject: [labnetwork] Equipment Online Scheduling Recomendation In-Reply-To: References: Message-ID: <003001cdf9b9$f6d591b0$e480b510$@anu.edu.au> Hello Sanchez, We are using a commercial service and set a booking system for our facility. You use a part of their website and you set your own booking page only accessible by people you authorize. The system generates an easy logging data (excel format( that allows you to track usage per any category you want either among the users or the equipment. We found it very easy to use and at the end of each month it takes us 2-3 days to generate the invoices and all figures with regards to our performance (KPIs). The cost is related to the amount of usage in advance and in the past but for our facility 8 major equipment + a suite of small equipment we are paying typically <20$/month. All the details are available here - http://www.supersaas.com/. There is a fully functional free service - only restricted in the number of bookings etc, and it has ads. If you want to look at our schedule to get an idea of how we use it go to - http://www.supersaas.co.uk/schedule/ANFF_ACT_Node/Flagship_Equipment. You'll only be able to look, not make any bookings or see the operational parts. Hope this is helpful, Fouad Karouta From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Sanchez Galiano,Ana Maria Sent: Thursday, 24 January 2013 3:50 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Equipment Online Scheduling Recomendation Could anyone please advise me on a good free or low cost online scheduler for lab equipment? Any comments about FOM (Facility Online Manager)? Thank you, ______________________________ Ana M Sanchez Galiano -------------- next part -------------- An HTML attachment was scrubbed... URL: From dm.zheng at unsw.edu.au Wed Jan 23 20:50:33 2013 From: dm.zheng at unsw.edu.au (Dong Zheng) Date: Thu, 24 Jan 2013 01:50:33 +0000 Subject: [labnetwork] Equipment Online Scheduling Recomendation In-Reply-To: <510090a9.8981440a.6c3e.003a@mx.google.com> References: <510090a9.8981440a.6c3e.003a@mx.google.com> Message-ID: <41B2AA4D4DEECF45A9155B0BF4C2E5A01EC4F2DD@INFPWXM004.ad.unsw.edu.au> We are currently operating AC Lab System (ACLS) at UNSW. ACLS was developed at UNSW and ready for exportation. ACLS has been adopted by 35 labs in Australia, proven a low cost and reliable online facility management system, plus many more features in the attached PDF. You can find more information at http://www.analytical.unsw.edu.au/capability/acls.htm. Dong Dong Zheng Systems Manager M66, Chemical Science Building Mark Wainwright Analytical Centre UNSW Tel: 02 9385 6680 Web: http://www.analytical.unsw.edu.au/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Olona, Leonard E. Sent: Thursday, 24 January 2013 8:43 AM To: Sanchez Galiano,Ana Maria; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Equipment Online Scheduling Recomendation We are currently developing our own here are OU. Stay tuned and I can ask my webmaster if he is willing to contact you to discuss. I believe he programs in Drupal 7 or Merci. -Len Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Norman, Oklahoma 73019 Email len.olona at ou.edu Desk 405 325-4374 Cell 405 630-9068 Fax 405 325-7066 From: "", Ana Maria > Date: Wednesday, January 23, 2013 10:50 AM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Equipment Online Scheduling Recomendation Could anyone please advise me on a good free or low cost online scheduler for lab equipment? Any comments about FOM (Facility Online Manager)? Thank you, ______________________________ Ana M Sanchez Galiano -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: ACLS-Summary-112012.pdf Type: application/pdf Size: 112505 bytes Desc: ACLS-Summary-112012.pdf URL: From diadiuk at MIT.EDU Thu Jan 24 08:07:08 2013 From: diadiuk at MIT.EDU (Vicky Diadiuk) Date: Thu, 24 Jan 2013 08:07:08 -0500 Subject: [labnetwork] Equipment Online Scheduling Recomendation In-Reply-To: <31F2F95FCDFB2A4EBCF5340D57E798E209CB7B2A@it-athena.sooner.net.ou.edu> References: <31F2F95FCDFB2A4EBCF5340D57E798E209CB7B2A@it-athena.sooner.net.ou.edu> Message-ID: Hi, We are still using CORAL, which is open source, excellent & free :) Pls look at: OpenCORAL.mit.edu Vicky PS Len - why are you developing your own???!! On Jan 23, 2013, at 4:43 PM, Olona, Leonard E. wrote: > We are currently developing our own here are OU. Stay tuned and I can ask my webmaster if he is willing to contact you to discuss. > > I believe he programs in Drupal 7 or Merci. > > > -Len > > Leonard E. Olona > University Cleanroom Manager > University of Oklahoma > 110 West Boyd Street > Norman, Oklahoma 73019 > > Email len.olona at ou.edu > Desk 405 325-4374 > Cell 405 630-9068 > Fax 405 325-7066 > > > > From: "", Ana Maria > Date: Wednesday, January 23, 2013 10:50 AM > To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Equipment Online Scheduling Recomendation > > Could anyone please advise me on a good free or low cost online scheduler for lab equipment? > Any comments about FOM (Facility Online Manager)? > Thank you, > ______________________________ > Ana M Sanchez Galiano > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Thu Jan 24 15:08:16 2013 From: hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Thu, 24 Jan 2013 15:08:16 -0500 Subject: [labnetwork] Quantox Film Characterization Message-ID: <510194B0.9070804@cns.fas.harvard.edu> Hello all, We (Harvard CNS) have just gotten a donation of a used Quantox film characterization system. We don't have much experience with this unit, so we are seeking anyone who has any experience with these, either from current installations or previous positions, to compare notes and learn more about its capabilities and weaknesses. We are in contact with Tencor, the seller of these units, but user experiences are often very valuable. Thanks, Mac Hathaway Harvard CNS -------------- next part -------------- An HTML attachment was scrubbed... URL: From raghavan at ece.iisc.ernet.in Sun Jan 27 22:26:43 2013 From: raghavan at ece.iisc.ernet.in (raghavan) Date: Mon, 28 Jan 2013 08:56:43 +0530 Subject: [labnetwork] Bio samples in CPD in semiconductor cleanroom Message-ID: <019f01cdfd07$4bb2cd60$e3186820$@iisc.ernet.in> Hi All We have some requests from users of our class 1000 semiconductor cleanroom to use our Critical Point Dryer (CPD) to dry biological samples ( human tissue , for example) before SEM inspection. Can anyone suggest if this is allowed? Are there any specific protocols to follow? Thank you Regards Raghavan ************************************************* Dr.Vijayaraghavan Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering Indian institute of Science ( IISc) Bangalore - 560 012 India Ph: 09663304316 *************************************************** -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. -------------- next part -------------- An HTML attachment was scrubbed... URL: From lej at danchip.dtu.dk Mon Jan 28 16:43:27 2013 From: lej at danchip.dtu.dk (Leif Johansen) Date: Mon, 28 Jan 2013 21:43:27 +0000 Subject: [labnetwork] Need Entegris photoresist pump filters Message-ID: <879AEF5002D70747B136D02BC86A9C98069DF0@ait-pex02mbx05.win.dtu.dk> Dear all, We are in urgent need of two filters for an Entegris Intelligen photoresist pump. Our local vendor has quoted us a lead time of 14 weeks(!). We can use the following filter types: ? Impact 2 V2 (preferred) ? Impact 8G (alternative) ? Impact Mini OF (alternative) Does anyone have such filters sitting on a shelf that they would be willing to sell to us? Best regards, Leif Leif S. Johansen Head of Operations DTU Danchip Technical University of Denmark [http://www.dtu.dk/images/DTU_email_logo_01.gif] Danchip ?rsteds Plads, Byg. 347 2800 Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.danchip.dtu.dk/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From yichen1 at illinois.edu Mon Jan 28 17:01:58 2013 From: yichen1 at illinois.edu (Yi Chen) Date: Mon, 28 Jan 2013 16:01:58 -0600 Subject: [labnetwork] UIUC research group seeking 8" ICP RIE with HBr Message-ID: Hi All, We are a UIUC research group currently seeking an ICP RIE able to handle and process *156 mm x 156 mm SQUARE* (8? round) silicon wafer with *180 - 200 ?m* thickness. The ICP RIE has to have an *HBr* gas line. If any of you has this kind of machine in your facility or knows where we can find one, please let us know. Any information will be greatly appreciated. Thanks, Yi -- Yi Chen Department of Electrical and Computer Engineering 3231 Micro and Nanotechnology Laboratory University of Illinois at Urbana-Champaign 208 North Wright Street, MC-249 Urbana, IL 61801-2355 USA Phone: (217) 979-0200 -------------- next part -------------- An HTML attachment was scrubbed... URL: From vito.logiudice at uwaterloo.ca Mon Jan 28 17:23:49 2013 From: vito.logiudice at uwaterloo.ca (Vito Logiudice) Date: Mon, 28 Jan 2013 22:23:49 +0000 Subject: [labnetwork] N2 pump purge source of chamber contamination? Message-ID: Dear Colleagues, We are depositing single crystal diamond via PECVD in a newly purchased tool dedicated to this process. Initial deposition runs have revealed the presence of film defects caused by stray nitrogen. The system and process gas lines have been helium leak-tested. The load-locked process chamber is pumped down by a turbo pump backed by a nitrogen-purged dry pump (the process makes use of methane and hydrogen). We're wondering if the N2 purge on the roughing pump might somehow be contributing to the problem. I'd appreciate hearing the community's thoughts on the possibility of nitrogen back flow from an N2-purged roughing pump back to the process chamber. Many thanks, Vito -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From raghavan at ece.iisc.ernet.in Mon Jan 28 22:19:53 2013 From: raghavan at ece.iisc.ernet.in (raghavan) Date: Tue, 29 Jan 2013 08:49:53 +0530 Subject: [labnetwork] As, P and Boron implantations on service request basis Message-ID: <01c101cdfdcf$81c6cf00$85546d00$@iisc.ernet.in> Hi All As you all may know, an implantation tool in semiconductor cleanroom is a very expensive item. Many cleanrooms with great MEMS facility would still have an implantation tool missing. We too , in our NNfC cleanroom (http://sindhu.ece.iisc.ernet.in/nanofab/twikii/bin/view/Main/WebHome) have no such tool. I would like know if there are any such centres in Asia /Europe that cater to universities and do implantation on request basis. Thank you Regards Raghavan ************************************************* Dr.Vijayaraghavan Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering Indian institute of Science ( IISc) Bangalore - 560 012 India Ph: 09663304316 *************************************************** -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. -------------- next part -------------- An HTML attachment was scrubbed... URL: From bob at eecs.berkeley.edu Tue Jan 29 11:53:27 2013 From: bob at eecs.berkeley.edu (Robert M. Hamilton) Date: Tue, 29 Jan 2013 08:53:27 -0800 Subject: [labnetwork] N2 pump purge source of chamber contamination? In-Reply-To: References: Message-ID: <5107FE87.8010206@eecs.berkeley.edu> Vito Logiudice, The UC Berkeley Marvell NanoLab supports a CVD diamond tool made by sp3. It is CVD and not PECVD; however, I'll take a stab at a way of ruling out your pump-stack as a source of back-diffused N2. It is unlikely N2 could back diffuse through a turbo-pumped system from its foreline roughing pump. By chance, does this turbopump use N2 as a bearing-purge, another source of N2? If so, is the flow for this purge under control? One way to rule out N2 from the pump stack would be to substitute Ar as the pump-purge gas and do a run. If your runs are long and a cylinder of Ar does not contain enough gas (~6500 standard liters/cylinder) to support a full run consider rental of a liquid Ar Dewar. Depending on the size of your dry pump it likely uses 35-50 slpm of N2 purge and the turbo bearing purge would be much less than the mech pumps N2 purge gas consumption. An RGA would be a terrific tool to review effects. Appended is a graph from Edwards on the RGA analysis of the ratio of residual gases from their turbos. Given the base pressure of turbos and the throughput of your process gas the N2 partial pressure should be nil: * Edwards STP magnetically levitated turbomolecular pumps Regards, Bob Hamilton Bob Hamilton Marvel NanoLab University of CA at Berkeley4 Rm 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu (e-mail preferred) 510-809-8600 510-325-7557 (mobile - emergencies) On 1/28/2013 2:23 PM, Vito Logiudice wrote: > Dear Colleagues, > > We are depositing single crystal diamond via PECVD in a > newly purchased tool dedicated to this process. Initial > deposition runs have revealed the presence of film defects > caused by stray nitrogen. The system and process gas lines > have been helium leak-tested. The load-locked process > chamber is pumped down by a turbo pump backed by a > nitrogen-purged dry pump (the process makes use of methane > and hydrogen). We're wondering if the N2 purge on the > roughing pump might somehow be contributing to the problem. > > I'd appreciate hearing the community's thoughts on the > possibility of nitrogen back flow from an N2-purged > roughing pump back to the process chamber. > > Many thanks, > Vito > -- > > Vito Logiudice M.A.Sc., P.Eng. > > Director of Operations, Quantum NanoFab > > University of Waterloo > > 200 University Avenue West > > Waterloo, ON Canada N2L 3G1 > > Tel: 1-519-888-4567 ext. 38703 > > Email: vlogiudi at uwaterloo.ca > > Website: https://qncfab.uwaterloo.ca/ > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: stp3.jpg Type: image/jpeg Size: 6242 bytes Desc: not available URL: From shott at stanford.edu Tue Jan 29 11:25:29 2013 From: shott at stanford.edu (John Shott) Date: Tue, 29 Jan 2013 08:25:29 -0800 Subject: [labnetwork] N2 pump purge source of chamber contamination? In-Reply-To: References: Message-ID: <5107F7F9.3050108@stanford.edu> Vito: While I'm sure that folks more knowledgeable than I will chime in, let me get the ball rolling with some of my thoughts. First, a modern turbomolecular drag pump should have a very high, but not infinite, compression ratio for nitrogen on the order of 10^12. To me that means that there should be very little, but probably not zero, nitrogen flowing back through the turbo pump. Knowing more about your system flows, pressure and nitrogen partial pressure in the foreline, etc. would probably be required to provide a more detailed analysis. Do you have an RGA on this system ... or at least the ability to add one temporarily? I would think that this would be a useful tool. Particularly, if I had an RGA, I'd be inclined to replace the nitrogen pump purge with argon ... at least as a quick experiment ... to see if that made a difference. Actually, I'd probably run experiments using argon as a pump purge even if I didn't have an RGA on the tool ... Do you have SIMS (or similar) data that shows constant nitrogen background levels or does the nitrogen level show a spike at the start of the deposition or at other times during the process? How confident are you that nitrogen and/or air aren't able to enter the chamber through the load lock or through leakage in the main chamber? What is your pumpdown/purge procedure in the load lock? Is that using argon to purge and backfill? What's the rate of rise in the chamber itself? Has the chamber been hard baked so that you are more confident that you aren't seeing evolution of adsorbed gas, contributions from virtual leaks, etc? Depending on what nitrogen background levels you are seeing, it doesn't take much of a leak in the chamber to result in a significant partial pressure of air in the system? Are there any rotary or linear seals in the system that could result in unwanted partial pressures of air/nitrogen? My first guess is that back flow of pump purge nitrogen is not your primary source of nitrogen in the chamber ... but that should be fairly easily tested using clean argon for your pump purge for a bit. Although I haven't used one, I know that EBARA (and maybe other dry pump manufacturers) offers the ESR20N that claims to require no nitrogen purge in clean applications. If backflow of nitrogen purge gas IS your problem, this may be a way of reducing that source ... and maybe at a lower total cost than using high-cost argon continuously as a pump purge. Finding the source of low-partial pressure contaminants in these type of systems is often tricky and typically requires a significant number of experiments to fully resolve. We have been working hard to find the source of low levels of oxygen contamination in some SiGe epitaxial processes ... and thus far have a hefty stack of receipts from SIMS analysis but less-than-complete resolution of the problem. Good luck, John On 1/28/2013 2:23 PM, Vito Logiudice wrote: > Dear Colleagues, > > We are depositing single crystal diamond via PECVD in a newly > purchased tool dedicated to this process. Initial deposition runs have > revealed the presence of film defects caused by stray nitrogen. The > system and process gas lines have been helium leak-tested. The > load-locked process chamber is pumped down by a turbo pump backed by a > nitrogen-purged dry pump (the process makes use of methane and > hydrogen). We're wondering if the N2 purge on the roughing pump might > somehow be contributing to the problem. > > I'd appreciate hearing the community's thoughts on the possibility of > nitrogen back flow from an N2-purged roughing pump back to the process > chamber. > > Many thanks, > Vito > -- > > Vito Logiudice M.A.Sc., P.Eng. > > Director of Operations, Quantum NanoFab > > University of Waterloo > > 200 University Avenue West > > Waterloo, ON Canada N2L 3G1 > > Tel: 1-519-888-4567 ext. 38703 > > Email: vlogiudi at uwaterloo.ca > > Website: https://qncfab.uwaterloo.ca/ > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From vincent.luciani at nist.gov Tue Jan 29 18:53:30 2013 From: vincent.luciani at nist.gov (Luciani, Vincent) Date: Tue, 29 Jan 2013 18:53:30 -0500 Subject: [labnetwork] Assistant NanoFab manager at NIST CNST Message-ID: <01F47D4EDEEC64488C10B767D15E4858110C143AC2@MBCLUSTER.xchange.nist.gov> Hello All, The NIST CNST NanoFab is seeking expressions of interest for an assistant NanoFab Manager. Please distribute as you see fit. Resumes can be sent to me directly. The ad is pasted below and attached as a WORD document. Best Regards, Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 Assistant NanoFab Manager US Citizenship Required The Center for Nanoscale Science and Technology is seeking expressions of interest for an exciting opportunity for a customer service-focused nanofabrication expert to join its management team. About Us The NIST Center for Nanoscale Science and Technology (CNST), located in Gaithersburg, MD, is a major nanotechnology user facility that supports the U.S. nanotechnology enterprise from discovery to production by providing industry, academia, NIST, and other government agencies with access to world-class nanoscale measurement and fabrication methods and technology. The CNST's shared-use NanoFab gives researchers economical access to and training on an extensive commercial state-of-the-art tool set for cutting-edge nanotechnology development. The simple application process is designed to get projects started in a few weeks. Visit us on the web at www.nist.gov/cnst. Unique Opportunity We expect to offer the right candidate the opportunity to join one of the country's leading nanotechnology user facilities. The individual would assist in the management of the CNST's NanoFab, including its full complement of state-of-the-art nanofabrication, metrology, and material characterization tools made available individually at hourly rates. There are over 250 projects at the NanoFab each year involving over a thousand participating researchers from both inside and outside NIST, including projects led by NIST and other government, academic, and industrial organizations. Job Description As the NanoFab Assistant Manager you will be part of the CNST's NanoFab Operations Group, assisting the NanoFab Manager with a wide range of both technical and administrative responsibilities. Responsibilities will include but are not limited to reviewing new project proposals, assisting researchers with project plans, serving as a liaison between researchers and NanoFab process engineers, planning and overseeing advanced process development, sustaining the NanoFab safety program, specifying and procuring parts and instrumentation, supervising the User Coordinators Office staff and operations, and generally supporting day-to-day operations and user management. Skills required The position will involve all aspects of NanoFab operations-from process development, analysis, and control, to budget, user, and personnel management. The position requires a broad knowledge and experience in nanofabrication processes and process integration. The successful candidate will have demonstrated, hands-on process development experience in multiple process technologies such as reactive ion etching (RIE), low pressure and plasma enhanced chemical vapor deposition (LPCVD, PECVD), physical vapor deposition (PVD), diffusion/oxidation, photolithography, and electron beam lithography (EBL). Experience integrating these processes for the fabrication of nanoelectronic and nanomechanical devices is strongly desired. Excellent oral and written communication and interpersonal skills are required to effectively lead technical discussions with research participants, prepare process library, procurement, and policy documentation, and represent the CNST to visitors and at technical meetings and conferences. The responsibilities also require project management skills to oversee advanced process development and NanoFab infrastructure improvements. The successful candidate will also be proficient in Microsoft Office applications and general computer use. The ability to work with scientists and engineers from a wide range of disciplines and cultures combined with an enthusiasm for working on multiple, complex projects simultaneously are important. Positions may be filled at an appropriate level (NIST pay band III-IV, salary $55,824 - $129,670), commensurate with education, training and/or experience About NIST Founded in 1901, NIST is a non-regulatory federal agency within the Department of Commerce. NIST's mission is to promote U.S. innovation and industrial competitiveness by advancing measurement science, standards, and technology in ways that enhance economic security and improve our quality of life. To Apply The Department of Commerce is an Equal Opportunity Employer. US citizenship is required (Under Executive Order 11935, only United States citizens and nationals may be appointed to competitive service Federal jobs). All opportunities for federal employment in the CNST are posted at www.usajobs.gov (keyword: CNST). Send expressions of interest, including resume to: Matthew Gonzales Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6201 USA matthew.gonzales at nist.gov -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: CNST_NanoFab_Position.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 67757 bytes Desc: CNST_NanoFab_Position.docx URL: From pkarulkar9 at gmail.com Tue Jan 29 18:54:53 2013 From: pkarulkar9 at gmail.com (Pramod C Karulkar) Date: Tue, 29 Jan 2013 15:54:53 -0800 Subject: [labnetwork] N2 pump purge source of chamber contamination? In-Reply-To: <5107FE87.8010206@eecs.berkeley.edu> References: <5107FE87.8010206@eecs.berkeley.edu> Message-ID: <5108614D.5060700@gmail.com> I am not sure if the suggestion given below will work with a good small volume, load locked turbo pump system. But it is worth considering after all the obvious causes of trace nitrogen in the films have been eliminated. One source of nitrogen could be the the backstreaming during the last stages of chamber pump-down. This is serious if the pre-process pumpdown goes on for a long time to attain a certain predetermined level of vacuum (or the operator leaves the system pumping for an extended period of time to get "good" vacuum and goes for a meeting or a break). Backstreaming is nearly absent when something is being pumped (i.e. flowing through the pumping line). Nitrogen purging suppresses backstreaming of species resident in the pump but can create the problem of that nitrogen itself backstreaming depending on the system and process design. Replacing nitrogen with another gas is one solution as described in Bob's e-mail. Backstreaming of the pump purge gas can be suppressed by purging the chamber itself with a desirable gas (carrier gas used in the process) and thus pumping the chamber in a "carrier gas rinse" mode. This is easy in sputtering or PECVD systems in which you can purge with a carrier gas, typically Ar or He, at very low flow rates. One may switch to the final process without cutting off the carrier gas purge and without ever switching to the "full low vacuum state." The purge also helps to reduce the effectiveness of virtual leaks by exhausting them and replacing them with carrier gas. A Meissner coil or a water pump that is installed directly on the chamber further improves the vacuum quality if turned on after the chamber is pumped down. Periodic system qualification, regular use of RGA, and qualification of the material on test substrates before committing valuable parts may be routinely required. You may want to check if the contamination varies as a function of the deposition number in a sequence of depositions. Does wafer (or run ) number 1 differ from wafer (or run) number 10? You have to see if there is a virtual leak that you wear out as deposition progresses (as chamber components heat up). One way to address this process quirk without going into a large R&D project is to run simulated depositions before committing to a product wafer. Ignoring the first few depositions to stabilize the system is a no-no if you are running a product line but is OK in a research project. This paper on effectiveness on N2 contamination might interest you: R. Locher, C. Wild, N. Herres, D. Behr, and P. Koidl, "Nitrogen stabilized ?100? texture in chemical vapor deposited diamond films," Appl. Phys. Lett. *65*, 34 (1994); http://dx.doi.org/10.1063/1.113064 (/3 pages/) Problem mentioned in the original e-mail is very common when one deposits anything sensitive to trace impurities, such as superconductors. In studies of superconducting films, deposition of ultra high purity films used to be very difficult in vacuum systems of the past. Films that seemed to be OK at room temperature would exhibit very different (disappointing) properties when cooled to low temperatures. Trace impurities were one of the culprits. Implementing several "tricks" to improve purity of the films gave researchers access to good superconducting films for device applications while using inexpensive systems. Good luck. Pramod Karulkar Pramod C Karulkar Ph. D. 6024 33rd Street Ct NW Gig Harbor WA 98335 On 1/29/2013 8:53 AM, Robert M. Hamilton wrote: > Vito Logiudice, > > The UC Berkeley Marvell NanoLab supports a CVD diamond tool made by > sp3. It is CVD and not PECVD; however, I'll take a stab at a way of > ruling out your pump-stack as a source of back-diffused N2. > It is unlikely N2 could back diffuse through a turbo-pumped system > from its foreline roughing pump. By chance, does this turbopump use N2 > as a bearing-purge, another source of N2? If so, is the flow for this > purge under control? > > One way to rule out N2 from the pump stack would be to substitute Ar > as the pump-purge gas and do a run. If your runs are long and a > cylinder of Ar does not contain enough gas (~6500 standard > liters/cylinder) to support a full run consider rental of a liquid Ar > Dewar. Depending on the size of your dry pump it likely uses 35-50 > slpm of N2 purge and the turbo bearing purge would be much less than > the mech pumps N2 purge gas consumption. > > An RGA would be a terrific tool to review effects. Appended is a graph > from Edwards on the RGA analysis of the ratio of residual gases from > their turbos. Given the base pressure of turbos and the throughput of > your process gas the N2 partial pressure should be nil: > > * Edwards STP magnetically levitated turbomolecular pumps > > > Regards, > Bob Hamilton > > Bob Hamilton > Marvel NanoLab > University of CA at Berkeley4 > Rm 520 Sutardja Dai Hall > Berkeley, CA 94720-1754 > bob at eecs.berkeley.edu (e-mail preferred) > 510-809-8600 510-325-7557 (mobile - emergencies) > > On 1/28/2013 2:23 PM, Vito Logiudice wrote: >> Dear Colleagues, >> >> We are depositing single crystal diamond via PECVD in a newly >> purchased tool dedicated to this process. Initial deposition runs >> have revealed the presence of film defects caused by stray nitrogen. >> The system and process gas lines have been helium leak-tested. The >> load-locked process chamber is pumped down by a turbo pump backed by >> a nitrogen-purged dry pump (the process makes use of methane and >> hydrogen). We're wondering if the N2 purge on the roughing pump might >> somehow be contributing to the problem. >> >> I'd appreciate hearing the community's thoughts on the possibility of >> nitrogen back flow from an N2-purged roughing pump back to the >> process chamber. >> >> Many thanks, >> Vito >> -- >> >> Vito Logiudice M.A.Sc., P.Eng. >> >> Director of Operations, Quantum NanoFab >> >> University of Waterloo >> >> 200 University Avenue West >> >> Waterloo, ON Canada N2L 3G1 >> >> Tel: 1-519-888-4567 ext. 38703 >> >> Email: vlogiudi at uwaterloo.ca >> >> Website: https://qncfab.uwaterloo.ca/ >> >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 6242 bytes Desc: not available URL: From ocola at anl.gov Tue Jan 29 22:25:20 2013 From: ocola at anl.gov (Leonidas E Ocola) Date: Tue, 29 Jan 2013 21:25:20 -0600 (CST) Subject: [labnetwork] N2 pump purge source of chamber contamination? In-Reply-To: <5108614D.5060700@gmail.com> Message-ID: <450934637.884357.1359516320646.JavaMail.root@cnm.anl.gov> Also check your hydrogen source. It has to be at least 6 nines. We tried using hydrogen from a hydrogen generator. It delivered 5 nines H2 and the diamond guys were not happy. They had to go with bottled H2. Leo ----- Original Message ----- From: "Pramod C Karulkar" To: labnetwork at mtl.mit.edu, "vito logiudice" , shott at stanford.edu, bob at eecs.berkeley.edu Sent: Tuesday, January 29, 2013 5:54:53 PM Subject: Re: [labnetwork] N2 pump purge source of chamber contamination? I am not sure if the suggestion given below will work with a good small volume, load locked turbo pump system. But it is worth considering after all the obvious causes of trace nitrogen in the films have been eliminated. One source of nitrogen could be the the backstreaming during the last stages of chamber pump-down. This is serious if the pre-process pumpdown goes on for a long time to attain a certain predetermined level of vacuum (or the operator leaves the system pumping for an extended period of time to get "good" vacuum and goes for a meeting or a break). Backstreaming is nearly absent when something is being pumped (i.e. flowing through the pumping line). Nitrogen purging suppresses backstreaming of species resident in the pump but can create the problem of that nitrogen itself backstreaming depending on the system and process design. Replacing nitrogen with another gas is one solution as described in Bob's e-mail. Backstreaming of the pump purge gas can be suppressed by purging the chamber itself with a desirable gas (carrier gas used in the process) and thus pumping the chamber in a "carrier gas rinse" mode. This is easy in sputtering or PECVD systems in which you can purge with a carrier gas, typically Ar or He, at very low flow rates. One may switch to the final process without cutting off the carrier gas purge and without ever switching to the "full low vacuum state." The purge also helps to reduce the effectiveness of virtual leaks by exhausting them and replacing them with carrier gas. A Meissner coil or a water pump that is installed directly on the chamber further improves the vacuum quality if turned on after the chamber is pumped down. Periodic system qualification, regular use of RGA, and qualification of the material on test substrates before committing valuable parts may be routinely required. You may want to check if the contamination varies as a function of the deposition number in a sequence of depositions. Does wafer (or run ) number 1 differ from wafer (or run) number 10? You have to see if there is a virtual leak that you wear out as deposition progresses (as chamber components heat up). One way to address this process quirk without going into a large R&D project is to run simulated depositions before committing to a product wafer. Ignoring the first few depositions to stabilize the system is a no-no if you are running a product line but is OK in a research project. This paper on effectiveness on N2 contamination might interest you: R. Locher , C. Wild , N. Herres , D. Behr , and P. Koidl , "Nitrogen stabilized ?100? texture in chemical vapor deposited diamond films," Appl. Phys. Lett. 65 , 34 (1994); The MTL Mail Server has detected a possible fraud attempt from "link.aip.org" claiming to be http://dx.doi.org/10.1063/1.113064 ( 3 pages ) Problem mentioned in the original e-mail is very common when one deposits anything sensitive to trace impurities, such as superconductors. In studies of superconducting films, deposition of ultra high purity films used to be very difficult in vacuum systems of the past. Films that seemed to be OK at room temperature would exhibit very different (disappointing) properties when cooled to low temperatures. Trace impurities were one of the culprits. Implementing several "tricks" to improve purity of the films gave researchers access to good superconducting films for device applications while using inexpensive systems. Good luck. Pramod Karulkar Pramod C Karulkar Ph. D. 6024 33rd Street Ct NW Gig Harbor WA 98335 On 1/29/2013 8:53 AM, Robert M. Hamilton wrote: Vito Logiudice, The UC Berkeley Marvell NanoLab supports a CVD diamond tool made by sp3. It is CVD and not PECVD; however, I'll take a stab at a way of ruling out your pump-stack as a source of back-diffused N2. It is unlikely N2 could back diffuse through a turbo-pumped system from its foreline roughing pump. By chance, does this turbopump use N2 as a bearing-purge, another source of N2? If so, is the flow for this purge under control? One way to rule out N2 from the pump stack would be to substitute Ar as the pump-purge gas and do a run. If your runs are long and a cylinder of Ar does not contain enough gas (~6500 standard liters/cylinder) to support a full run consider rental of a liquid Ar Dewar. Depending on the size of your dry pump it likely uses 35-50 slpm of N2 purge and the turbo bearing purge would be much less than the mech pumps N2 purge gas consumption. An RGA would be a terrific tool to review effects. Appended is a graph from Edwards on the RGA analysis of the ratio of residual gases from their turbos. Given the base pressure of turbos and the throughput of your process gas the N2 partial pressure should be nil: * Edwards STP magnetically levitated turbomolecular pumps Regards, Bob Hamilton Bob Hamilton Marvel NanoLab University of CA at Berkeley4 Rm 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu (e-mail preferred) 510-809-8600 510-325-7557 (mobile - emergencies) On 1/28/2013 2:23 PM, Vito Logiudice wrote:
Dear Colleagues, We are depositing single crystal diamond via PECVD in a newly purchased tool dedicated to this process. Initial deposition runs have revealed the presence of film defects caused by stray nitrogen. The system and process gas lines have been helium leak-tested. The load-locked process chamber is pumped down by a turbo pump backed by a nitrogen-purged dry pump (the process makes use of methane and hydrogen). We're wondering if the N2 purge on the roughing pump might somehow be contributing to the problem. I'd appreciate hearing the community's thoughts on the possibility of nitrogen back flow from an N2-purged roughing pump back to the process chamber. Many thanks, Vito -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca / _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
-- _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 6242 bytes Desc: not available URL: From lej at danchip.dtu.dk Wed Jan 30 03:21:24 2013 From: lej at danchip.dtu.dk (Leif Johansen) Date: Wed, 30 Jan 2013 08:21:24 +0000 Subject: [labnetwork] As, P and Boron implantations on service request basis In-Reply-To: <01c101cdfdcf$81c6cf00$85546d00$@iisc.ernet.in> References: <01c101cdfdcf$81c6cf00$85546d00$@iisc.ernet.in> Message-ID: <879AEF5002D70747B136D02BC86A9C9806ACA9@ait-pex02mbx05.win.dtu.dk> Hello Raghavan, We have some people who use Ion Beam Services in France. http://www.ion-beam-services.com/ The people I have talked to are rather satisfied with the service there. As far as I understand, they can handle a variety of substrate sizes, including odd wafer pieces. Best regards, Leif From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of raghavan Sent: 29. januar 2013 04:20 To: labnetwork at mtl.mit.edu Subject: [labnetwork] As, P and Boron implantations on service request basis Hi All As you all may know, an implantation tool in semiconductor cleanroom is a very expensive item. Many cleanrooms with great MEMS facility would still have an implantation tool missing. We too , in our NNfC cleanroom (http://sindhu.ece.iisc.ernet.in/nanofab/twikii/bin/view/Main/WebHome) have no such tool. I would like know if there are any such centres in Asia /Europe that cater to universities and do implantation on request basis. Thank you Regards Raghavan ************************************************* Dr.Vijayaraghavan Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering Indian institute of Science ( IISc) Bangalore - 560 012 India Ph: 09663304316 *************************************************** -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. -------------- next part -------------- An HTML attachment was scrubbed... URL: From vito.logiudice at uwaterloo.ca Thu Jan 31 09:07:17 2013 From: vito.logiudice at uwaterloo.ca (Vito Logiudice) Date: Thu, 31 Jan 2013 14:07:17 +0000 Subject: [labnetwork] N2 pump purge source of chamber contamination? In-Reply-To: Message-ID: Dear Colleagues, Sincere thanks to all of you whom have taken the time to provide so many insights and excellent suggestions ? it's greatly appreciated. For the benefit of the community, an update will be provided after we try some of these suggestions and obtain additional experimental results. Best regards, Vito -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ From: Vito Logiudice > Date: Monday, 28 January, 2013 5:23 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] N2 pump purge source of chamber contamination? Dear Colleagues, We are depositing single crystal diamond via PECVD in a newly purchased tool dedicated to this process. Initial deposition runs have revealed the presence of film defects caused by stray nitrogen. The system and process gas lines have been helium leak-tested. The load-locked process chamber is pumped down by a turbo pump backed by a nitrogen-purged dry pump (the process makes use of methane and hydrogen). We're wondering if the N2 purge on the roughing pump might somehow be contributing to the problem. I'd appreciate hearing the community's thoughts on the possibility of nitrogen back flow from an N2-purged roughing pump back to the process chamber. Many thanks, Vito -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From vito.logiudice at uwaterloo.ca Thu Jan 31 09:54:37 2013 From: vito.logiudice at uwaterloo.ca (Vito Logiudice) Date: Thu, 31 Jan 2013 14:54:37 +0000 Subject: [labnetwork] Sputter Coating Equipment In-Reply-To: <1B4DD9C1D91227429C8A27AFD1A12850C00101@CH1PRD0611MB432.namprd06.prod.outlook.com> Message-ID: Dear Anand, You may also want to consider Plassys: http://www.plassys.com/pageuk/renseignement/accueil/accueil.html We recently purchased a Plassys MP700S sputter system which is dedicated to the deposition of superconducting films of Niobium. The system is robust and well-built and we've obtained very encouraging results to date. Plassys was chosen as they were prepared to guarantee certain minimum film characteristics which were of great interest to our researchers. If interested, additional system details can be found on our website: https://qncfab.uwaterloo.ca/equipment/all/plassys-mp700s-sputter-system/general-info Regards, Vito -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ From: Anand Gadre > Date: Friday, 18 January, 2013 5:50 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Sputter Coating Equipment Dear Colleagues, We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated. Here is a list of specific requirements from our users: 1.In need of a more advanced sputter setup for niobium and niobium nitride deposition. DC/RF magnetron sputtering system. ) Specific Reuirements: ? sputtering machine that can sputter niobium or niobium nitride that becomes superconducting at cryogenic temperatures. ? -DC/RF magnetron sputtering system ? -This requires a cleaned argon discharge that has been passed through a liquid nitrogen trap, either outside or inside the sputtering chamber. ? -The RF sputtering power level should be above 100 Watts. ? -There should be shutters inside the sputtering chamber that can be rotated into, or out of, the front of the sample, at will. ? -There also should be a crystal oscillator thickness monitor so that we can measure the sputtered thickness of the niobium or niobium nitride films. ? -Temperature ranges up to 700C ? -We shouldn't need more than 2 targets for our purpose, but it might be nice to support multiple targets in a user facility ? -sample areas on the order of 10X10 cm 2. In need for a high quality Nb deposition (superconductor). System requirements. 3. Need magnetron sputter for high quality insulating film deposition. 4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?). 5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required. 6. dc/ac magnetron (deposition of both metal and ceramic possible) - heating up to > 400C (preferably up to 600C) - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr) - Power > 200 W (both dc and ac) - Chiller pump flow: > 5 lpm @20 psi - Feeding oxidant possible (for example, 10% O2 / 90% N2) Optional - 4'' wafer size preferred, but smaller ones are still okay - Substrate rotation control (for uniform deposition) Thanks, Anand Gadre, Ph.D, MBA Director Stem Cell Instrumentation Foundry (SCIF) University of California, Merced 5200 N. Lake Road Merced, CA 95343 Phone: (O): 209-228-2345 Phone (C): (209) 658-3879 Fax: (209) 228 4424 Email: agadre at ucmerced.edu SCIF website: Scif.ucmerced.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: