[labnetwork] Sputter Coating Equipment

[reynolds]

Hi Anand,

We have five different sputter tools at UCSB. Two older SFI systems, 
two AJA systems and a custom built Kurt J Lesker tool. The two multi 
target systems from AJA, http://www.ajaint.com/systems.htm are our most 
current purchases.  We have had great performance from the systems and 
they will build to your requirements. The Lesker tool may be less 
expensive than the AJA, but it has no bells and whistles and is a very 
manual tool with a simple loadlock. It requires that you select and help 
design the tool, but can save on cost. SFI was purchased by Tegal and at 
this point I don't even know if they design new sputter tools.

Hope this helps,  Tom
-- 
Tom Reynolds
Lab Manager
UCSB Nanofab
Engineering Science Building #225, Room 1109E
Santa Barbara, CA 93106
805-893-3918  office
805-451-3979  cell
805-893-7210  fax


On 2013-01-18 14:50, Anand Gadre wrote:
> Dear Colleagues,
>
>  We are planning to purchase a sputter coating machine (new or
> refurbished) that may be placed in our class 1000 cleanroom at the
> Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already
> got in touch with one vendor in California (ANATECH USA) and received
> a quote from him but I would like to contact more manufacturers who
> would offer best suitable equipment that would fit well with our
> research needs with better price. Any advice about the
> manufacturers/vendors of such a machine would be much appreciated.
>
>  Here is a list of specific requirements from our users:
>
>  1.In need of a more advanced sputter setup for
>
>  niobium and niobium nitride deposition. DC/RF magnetron sputtering 
> system. )
>
>  Specific Reuirements:
>
>  · sputtering machine that can sputter niobium or niobium nitride
> that becomes superconducting at cryogenic temperatures.
>
>  · -DC/RF magnetron sputtering system
>
>  · -This requires a cleaned argon discharge that has been passed
> through a liquid nitrogen trap, either outside or inside the
> sputtering chamber.
>
>  · -The RF sputtering power level should be above 100 Watts.
>
>  · -There should be shutters inside the sputtering chamber that can
> be rotated into, or out of, the front of the sample, at will.
>
>  · -There also should be a crystal oscillator thickness monitor so
> that we can measure the sputtered thickness of the niobium or niobium
> nitride films.
>
>  · -Temperature ranges up to 700C
>
>  · -We shouldn't need more than 2 targets for our purpose, but it
> might be nice to support multiple targets in a user facility
>
>  · -sample areas on the order of 10X10 cm
>
>  2. In need for a high quality Nb deposition (superconductor). System
> requirements.
>
>  3. Need magnetron sputter for high quality insulating film 
> deposition.
>
>  4. Potentially interested in sputtering metal and metal oxide (maybe
> reactive sputtering?).
>
>  5. Indium Tin Oxide (transparent, conductive substrate) deposition
> needed. High vacuum required.
>
>  6. dc/ac magnetron (deposition of both metal and ceramic possible)
>
>  - heating up to > 400C (preferably up to 600C)
>
>  - Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 
> mTorr)
>
>  - Power > 200 W (both dc and ac)
>
>  - Chiller pump flow: > 5 lpm @20 psi
>
>  - Feeding oxidant possible (for example, 10% O2 / 90% N2)
>
>  Optional
>
>  - 4'' wafer size preferred, but smaller ones are still okay
>
>  - Substrate rotation control (for uniform deposition)
>
>  Thanks,
>
> Anand Gadre, Ph.D, MBA
> Director
> Stem Cell Instrumentation Foundry (SCIF)
> University of California, Merced
> 5200 N. Lake Road
> Merced, CA 95343
> Phone: (O): 209-228-2345
> Phone (C): (209) 658-3879
> Fax: (209) 228 4424
> Email: agadre at ucmerced.edu
> SCIF website: Scif.ucmerced.edu
>
>
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