From ryant at nanofab.utah.edu Tue Jul 2 16:50:29 2013 From: ryant at nanofab.utah.edu (Ryan Taylor) Date: Tue, 02 Jul 2013 14:50:29 -0600 Subject: [labnetwork] Intercom / Paging System Message-ID: <51D33D15.8060002@nanofab.utah.edu> Hi Everyone, I'm looking for suggestions for an intercom or paging system for use in our cleanroom. Does anybody here have any experience with specific vendors/products that you would recommend or that you would suggest avoiding? I'm sure the use cases are pretty obvious and universal, but these are the scenarios that I'm trying to address: Possible Use Cases: 1. I am a PI working from my office. I want to contact a researcher (Jane Doe) in the cleanroom. I pick up my phone, dial 555-555-5555 and receive a prompt telling me that my voice is now being broadcast through out the cleanroom. I say "Jane Doe, please call me back at ...." and wait to receive a call. or 2. I go to http://www.nanofab.utah.edu/pager (for example). I am presented with a form that allows me to enter a short message. The message is then displayed on an LED scrolling sign in the lab for several minutes to an hour. Thanks for sharing your ideas and experiences! Ryan -- --------- Ryan Taylor Software Systems Development Engineer University of Utah Nanofab www.nanofab.utah.edu Phone: (801) 587-0671 Email: ryant at nanofab.utah.edu From rmorrison at draper.com Wed Jul 3 06:07:54 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Wed, 03 Jul 2013 10:07:54 +0000 Subject: [labnetwork] evaporation question Message-ID: HI, I have a user requesting to evaporate Selenium, has anybody done that? Looking for info on hazards and rough process information. Thanks Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Wed Jul 3 20:07:20 2013 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Thu, 4 Jul 2013 10:07:20 +1000 Subject: [labnetwork] evaporation question In-Reply-To: References: Message-ID: <006e01ce784a$739af050$5ad0d0f0$@anu.edu.au> Hi Rick, We do not have direct experience with Se. Se MSDS does not indicate extreme hazard. We had a few years ago a user who used our sputter for depositing Ga2Se3 and GeSe2. We realised that when opening the chamber a very unpleasant smell was present and concerns raised whether H2Se was formed but unfortunately we couldn't detect it (maybe detector didn't have sufficient sensitivity). We also tried to sputter Al after the Se-compound to seal it but this hasn't worked out as smell persisted. Besides the smell I don't know if this may cause any contamination issue to other deposition processes. You need to investigate possible reactions of Se with air/H2O. It is not much but hope it helps a bit, Fouad Karouta ********************************* Manager ANFF ACT Node Research School of Physics and Engineering Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr. Sent: Wednesday, 3 July 2013 8:08 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] evaporation question HI, I have a user requesting to evaporate Selenium, has anybody done that? Looking for info on hazards and rough process information. Thanks Rick Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -------------- next part -------------- An HTML attachment was scrubbed... URL: From lej at danchip.dtu.dk Thu Jul 4 09:53:45 2013 From: lej at danchip.dtu.dk (Leif Johansen) Date: Thu, 4 Jul 2013 13:53:45 +0000 Subject: [labnetwork] Veeco D125 MOVPE wafer rotation motor issue Message-ID: <879AEF5002D70747B136D02BC86A9C981265E3@ait-pex02mbx05.win.dtu.dk> Dear all, Here at DTU Danchip we have a Veeco D125 MOVPE reactor whose wafer rotator motor is giving us quite a headache - please see my colleague's description of the problem below. Any hints on how to proceed would be much appreciated. "We are using the DC motor Baldor (AP7402) for rotating wafer-carrier for the MOVPE reactor VEECO D125. Recently, one of the boards, namely DC motor speed control board, model KBMM-225D (9451), in the Motor Drive burned and we changed it for a new one (KBMM-225D (9450)). The system did not work with an old motor; it just was burning fuses on the mentioned board. We have ordered a new motor. Unfortunately the new motor did not solve the problem, after about 40 minutes of work on high rpm (500-1000) the current is slowly increasing and the motor getting very warm, than it burns the fuse. We have adjusted settings (potentiometers) on the speed control board according the manual to our machine. We have try to run the motor off-load and it works fine for two hours without any problems. From the other hand, the part on the reactor, which should be rotated, goes very smooth, as it was before. I would appreciate a lot if you can give me a hint what could be the reason for the problem I described." Best regards, Leif Leif S. Johansen Head of Operations DTU Danchip Technical University of Denmark [http://www.dtu.dk/images/DTU_email_logo_01.gif] Danchip ?rsteds Plads, Byg. 347 2800 Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.danchip.dtu.dk/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From merport at gmail.com Fri Jul 5 13:17:16 2013 From: merport at gmail.com (Todd Merport) Date: Fri, 5 Jul 2013 10:17:16 -0700 Subject: [labnetwork] Intercom / Paging System In-Reply-To: <51D33D15.8060002@nanofab.utah.edu> References: <51D33D15.8060002@nanofab.utah.edu> Message-ID: A voice synthesizer is a useful tool for a lab. Messages entered on a web page can be passed through a synthesizer into the PA system (leaving out intermediate steps). It also allows automated messages to be broadcast. Take a look at the open source synthesizer, espeak. http://espeak.sourceforge.net/ Todd Merport On Tue, Jul 2, 2013 at 1:50 PM, Ryan Taylor wrote: > Hi Everyone, > > I'm looking for suggestions for an intercom or paging system for use in > our cleanroom. Does anybody here have any experience with specific > vendors/products that you would recommend or that you would suggest > avoiding? I'm sure the use cases are pretty obvious and universal, but > these are the scenarios that I'm trying to address: > > Possible Use Cases: > 1. I am a PI working from my office. I want to contact a researcher (Jane > Doe) in the cleanroom. I pick up my phone, dial 555-555-5555 and receive a > prompt telling me that my voice is now being broadcast through out the > cleanroom. I say "Jane Doe, please call me back at ...." and wait to > receive a call. > > or 2. I go to http://www.nanofab.utah.edu/**pager(for example). I am presented with a form that allows me to enter a short > message. The message is then displayed on an LED scrolling sign in the lab > for several minutes to an hour. > > Thanks for sharing your ideas and experiences! > > Ryan > > -- > --------- > Ryan Taylor > Software Systems Development Engineer > University of Utah Nanofab > www.nanofab.utah.edu > Phone: (801) 587-0671 > Email: ryant at nanofab.utah.edu > > > > ______________________________**_________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/**mailman/listinfo.cgi/**labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From ryant at nanofab.utah.edu Fri Jul 5 13:28:42 2013 From: ryant at nanofab.utah.edu (Ryan Taylor) Date: Fri, 05 Jul 2013 11:28:42 -0600 Subject: [labnetwork] Intercom / Paging System In-Reply-To: References: <51D33D15.8060002@nanofab.utah.edu> Message-ID: <51D7024A.4070806@nanofab.utah.edu> > A voice synthesizer is a useful tool for a lab. Messages entered on a > web page can be passed through a synthesizer into the PA system > (leaving out intermediate steps). It also allows automated messages > to be broadcast. Thanks! That's a good tip. Do you have any suggestions for the hardware part of the system (speakers, amplifiers, etc.)? Thanks, Ryan From merport at gmail.com Fri Jul 5 13:53:02 2013 From: merport at gmail.com (Todd Merport) Date: Fri, 5 Jul 2013 10:53:02 -0700 Subject: [labnetwork] Intercom / Paging System In-Reply-To: <51D7024A.4070806@nanofab.utah.edu> References: <51D33D15.8060002@nanofab.utah.edu> <51D7024A.4070806@nanofab.utah.edu> Message-ID: Hi Ryan, I don't recall the specifics too well. The PA amplifier had multiple inputs, one was from the PBX. I recall that speaker placement in the fab required some fine tuning. My task was limited to getting a network connection to the synthesizer and routing the analog output to the paging amplifier. On Fri, Jul 5, 2013 at 10:28 AM, Ryan Taylor wrote: > A voice synthesizer is a useful tool for a lab. Messages entered on a web >> page can be passed through a synthesizer into the PA system (leaving out >> intermediate steps). It also allows automated messages to be broadcast. >> > Thanks! That's a good tip. Do you have any suggestions for the hardware > part of the system (speakers, amplifiers, etc.)? > > Thanks, > Ryan > -------------- next part -------------- An HTML attachment was scrubbed... URL: From psharris at magma.ca Sat Jul 6 20:05:52 2013 From: psharris at magma.ca (P. Scott Harris) Date: Sat, 06 Jul 2013 20:05:52 -0400 Subject: [labnetwork] Intercom / Paging System In-Reply-To: <51D33D15.8060002@nanofab.utah.edu> References: <51D33D15.8060002@nanofab.utah.edu> Message-ID: <51D8B0E0.8070505@magma.ca> Hi, Assuming that you have a wireless network in your lab, you might consider something simple like 'Line' or 'Viber' (free apps for Android/iOS/Windows). Basically they let you turn a tablet/iPod Touch/phone into a text/voice chat device. I can use it to talk to/chat with/message people in a lab (you can set each client to ring/buzz/whatever when a call/message comes in) so long as they have a network connection i.e. you don't need a phone connection at all. It's free so it would be simple enough to try - take two people with an iPod Touch (or whatever) and somebody on a Windows desktop and see if they can communicate in a useful way. If you mount a tablet of some sort to a wall (or link a display on the wall to a tablet) you could use it as a message board. Not useful without WiFi but possible worth trying. On 2013-07-02 4:50 PM, Ryan Taylor wrote: > Hi Everyone, > > I'm looking for suggestions for an intercom or paging system for use in our > cleanroom. Does anybody here have any experience with specific > vendors/products that you would recommend or that you would suggest avoiding? > I'm sure the use cases are pretty obvious and universal, but these are the > scenarios that I'm trying to address: > > Possible Use Cases: > 1. I am a PI working from my office. I want to contact a researcher (Jane > Doe) in the cleanroom. I pick up my phone, dial 555-555-5555 and receive a > prompt telling me that my voice is now being broadcast through out the > cleanroom. I say "Jane Doe, please call me back at ...." and wait to receive > a call. > > or 2. I go to http://www.nanofab.utah.edu/pager (for example). I am presented > with a form that allows me to enter a short message. The message is then > displayed on an LED scrolling sign in the lab for several minutes to an hour. > > Thanks for sharing your ideas and experiences! > > Ryan > -- Best regards, P. Scott Harris, P.Eng. H&L Associates 21 Parkmount Crescent Nepean, Ontario K2H 5T3 Canada Tel: (613) 828-1462 From shanti.gupta2008 at gmail.com Wed Jul 10 07:37:23 2013 From: shanti.gupta2008 at gmail.com (Suman Gupta) Date: Wed, 10 Jul 2013 17:07:23 +0530 Subject: [labnetwork] CPD Release of samples after dicing Message-ID: Dear All, We had a doubt regarding releasing few diced samples with our CPD Equipment The diced sample contain wax and few residues on the sample. We tired taking out with Trichloroethylene, acetone and Isopropanol. Still, the samples are not completely clean. We are doubtful, that these samples may contaminate the CPD Chamber and also clog the 0.5Micron filter present in the purge line. The CPD model we have is Tousimis Supercritical automegasamdri 815B Series C Do let us know your suggestions. Thanks Suman Indian Institute of Science. -------------- next part -------------- An HTML attachment was scrubbed... URL: From evporte at uark.edu Thu Jul 11 17:17:05 2013 From: evporte at uark.edu (Errol V. Porter) Date: Thu, 11 Jul 2013 21:17:05 +0000 Subject: [labnetwork] STS multiplex ASE high coil reflectance issues Message-ID: <49510757561B8E4EB8076830B69BF2774E88DA46@ex-mbx1b.uark.edu> Greetings, We are trying to troubleshoot a problem with our STS ASE system generating nearly a 30% reflectance on the coil power. We have tested the supply using a dummy load with no problems. We have cleaned the inner ceramic shield and he reflectance remains. Any assistance you may have would be greatly appreciated. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Fri Jul 12 10:40:26 2013 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Fri, 12 Jul 2013 10:40:26 -0400 Subject: [labnetwork] STS multiplex ASE high coil reflectance issues In-Reply-To: <49510757561B8E4EB8076830B69BF2774E88DA46@ex-mbx1b.uark.edu> References: <49510757561B8E4EB8076830B69BF2774E88DA46@ex-mbx1b.uark.edu> Message-ID: <8F95EA77ACBF904A861E580B44288EFD9CA20B3B9B@FASXCH02.fasmail.priv> Errol, can you tune it manually? If so, something is interfering with the movement of the air caps. If you think both air (or vacuum) caps are freely turning and you can't tune it manually, remove the UHF cable from the generator to the match and using an ohmmeter, measure resistance from ground to the electrode, it should be 2 megohm or higher. If the resistance is lower, start removing parts such as shields and keep measuring till you find the short. Another avenue is to make sure the chuck RF is tuning, a mismatch of 20% or greater will create havoc for the coil tuning. Best of luck, Steve Paolini Equipment Dood Harvard University Center for Nanoscale Systems spaolini at cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter Sent: Thursday, July 11, 2013 5:17 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS multiplex ASE high coil reflectance issues Greetings, We are trying to troubleshoot a problem with our STS ASE system generating nearly a 30% reflectance on the coil power. We have tested the supply using a dummy load with no problems. We have cleaned the inner ceramic shield and he reflectance remains. Any assistance you may have would be greatly appreciated. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Fri Jul 12 14:41:38 2013 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Fri, 12 Jul 2013 18:41:38 +0000 Subject: [labnetwork] STS multiplex ASE high coil reflectance issues In-Reply-To: <8F95EA77ACBF904A861E580B44288EFD9CA20B3B9B@FASXCH02.fasmail.priv> References: <49510757561B8E4EB8076830B69BF2774E88DA46@ex-mbx1b.uark.edu> <8F95EA77ACBF904A861E580B44288EFD9CA20B3B9B@FASXCH02.fasmail.priv> Message-ID: I agree with Steve. Its usually attributed to either a dirty chamber or leaky current and make sure that resistance is as high as possible. Cheers! Julia Aebersold, Ph.D. MNTC Cleanroom Manager Shumaker Research Building, Room 233 2210 South Brook Street University of Louisville Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paolini, Steven Sent: Friday, July 12, 2013 10:40 AM To: Errol V. Porter; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] STS multiplex ASE high coil reflectance issues Errol, can you tune it manually? If so, something is interfering with the movement of the air caps. If you think both air (or vacuum) caps are freely turning and you can't tune it manually, remove the UHF cable from the generator to the match and using an ohmmeter, measure resistance from ground to the electrode, it should be 2 megohm or higher. If the resistance is lower, start removing parts such as shields and keep measuring till you find the short. Another avenue is to make sure the chuck RF is tuning, a mismatch of 20% or greater will create havoc for the coil tuning. Best of luck, Steve Paolini Equipment Dood Harvard University Center for Nanoscale Systems spaolini at cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter Sent: Thursday, July 11, 2013 5:17 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS multiplex ASE high coil reflectance issues Greetings, We are trying to troubleshoot a problem with our STS ASE system generating nearly a 30% reflectance on the coil power. We have tested the supply using a dummy load with no problems. We have cleaned the inner ceramic shield and he reflectance remains. Any assistance you may have would be greatly appreciated. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Fri Jul 12 14:50:11 2013 From: michael.martin at louisville.edu (Martin,Michael David) Date: Fri, 12 Jul 2013 18:50:11 +0000 Subject: [labnetwork] STS multiplex ASE high coil reflectance issues In-Reply-To: <8F95EA77ACBF904A861E580B44288EFD9CA20B3B9B@FASXCH02.fasmail.priv> References: <49510757561B8E4EB8076830B69BF2774E88DA46@ex-mbx1b.uark.edu> <8F95EA77ACBF904A861E580B44288EFD9CA20B3B9B@FASXCH02.fasmail.priv> Message-ID: Hi, We ran into a similar issue with poor tuning on our platen bias and it turned out to be simply a loose RS-232 going to the tuner. Incidentally, we have an older STS (early 2000 model) here at U of Louisville and as the system has aged we continue to run into progressively worse communication issues between the various components and controller that does not seem to be related to loose cables. Good luck! From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paolini, Steven Sent: Friday, July 12, 2013 10:40 AM To: Errol V. Porter; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] STS multiplex ASE high coil reflectance issues Errol, can you tune it manually? If so, something is interfering with the movement of the air caps. If you think both air (or vacuum) caps are freely turning and you can't tune it manually, remove the UHF cable from the generator to the match and using an ohmmeter, measure resistance from ground to the electrode, it should be 2 megohm or higher. If the resistance is lower, start removing parts such as shields and keep measuring till you find the short. Another avenue is to make sure the chuck RF is tuning, a mismatch of 20% or greater will create havoc for the coil tuning. Best of luck, Steve Paolini Equipment Dood Harvard University Center for Nanoscale Systems spaolini at cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter Sent: Thursday, July 11, 2013 5:17 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS multiplex ASE high coil reflectance issues Greetings, We are trying to troubleshoot a problem with our STS ASE system generating nearly a 30% reflectance on the coil power. We have tested the supply using a dummy load with no problems. We have cleaned the inner ceramic shield and he reflectance remains. Any assistance you may have would be greatly appreciated. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtiner at masdar.ac.ae Mon Jul 15 00:57:07 2013 From: mtiner at masdar.ac.ae (Mike Tiner) Date: Mon, 15 Jul 2013 08:57:07 +0400 Subject: [labnetwork] acetone in Acetylene Message-ID: Dear All, I can't remember if this has been addressed before, but we are installing a CVD reactor for CNTs and graphene which uses Acetylene as one of the feed gasses. I am trying to decide whether to use a cylinder with or without acetone. Can anyone give insight into this? Do we require acetone?, is there a contamination issue to be aware of? Any advice will be appreciated. Best regards, Mike Mike Tiner Manager, Fabrication and Microscopy Facilities Masdar Institute Electron Microscopy Facility Website Masdar Institute Fabrication Facility Website [cid:image001.jpg at 01CE8139.48CF30A0] PO Box 54224, Khalifa City Abu Dhabi, United Arab Emirates Office +971 2 810 8122 Direct +971 2 810 9053 Fax +971 2 810 8121 Mobile +971 56 733 9604 Email mtiner at masdar.ac.ae http://www.masdar.ac.ae [cid:image002.jpg at 01CE8139.48CF30A0] P Please consider the environment before printing this email This transmission is confidential and intended solely for the person or organization to whom it is addressed. It may contain privileged and confidential information. If you are not the intended recipient, you should not copy, distribute or take any action in reliance on it. If you have received this transmission in error, please notify us immediately by e-mail at info at masdar.ac.ae -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 5411 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 13117 bytes Desc: image002.jpg URL: From roberthamilton at berkeley.edu Mon Jul 15 10:45:21 2013 From: roberthamilton at berkeley.edu (Bob Hamilton) Date: Mon, 15 Jul 2013 07:45:21 -0700 Subject: [labnetwork] acetone in Acetylene In-Reply-To: References: Message-ID: <51E40B01.80805@berkeley.edu> Mike Tiner, Before making a decision of what form of acetylene to use for carbon nanotube production it is worth reviewing issues with this gas. The well known issue of acetylene being explosive and unstable at pressure over ~30 psig is one issue. This is why it is disolved in acetone and an inert matrix in a welding cylinder. There are other issues worth considering. Acetylene derived from calcium carbide has some level of phosphine contamination. This will be high enough PH3 to affect the dopant properties of the nanotubes produced. As a result of this PH3 contaminant the Microlab used calcium carbide as a convenient surrogate when doing "bump" tests on our toxic gas monitoring system and our hand-held monitor. CaC2 also provided a way to let engineers know what phosphine smelled like. A small chunk of calcium carbide in a beaker plus a little water produces that characteristic odor. It was good instruction, in those less-litigious times, a time when one could get away with a common-sense demonstrations. Regards, Bob Hamilton On 7/14/2013 9:57 PM, Mike Tiner wrote: > > Dear All, > > I can't remember if this has been addressed before, but we are > installing a CVD reactor for CNTs and graphene which uses Acetylene as > one of the feed gasses. I am trying to decide whether to use a > cylinder with or without acetone. Can anyone give insight into this? > Do we require acetone?, is there a contamination issue to be aware of? > > Any advice will be appreciated. > > Best regards, > > Mike > > *Mike Tiner > *Manager, Fabrication and Microscopy Facilities > > Masdar Institute Electron Microscopy Facility Website > > > Masdar Institute Fabrication Facility Website > > > InstDual > > PO Box 54224, Khalifa City > > Abu Dhabi, United Arab Emirates > Office +971 2 810 8122 > > Direct +971 2 810 9053 > Fax +971 2 810 8121 > > Mobile +971 56 733 9604 > > Email mtiner at masdar.ac.ae > > http://www.masdar.ac.ae > > 41_Email-Signature > > > P /Please consider the environment before printing this email > / > This transmission is confidential and intended solely for the person > or organization to whom it is addressed. It may contain privileged and > confidential information. If you are not the intended recipient, you > should not copy, distribute or take any action in reliance on it. If > you have received this transmission in error, please notify us > immediately by e-mail at *info at masdar.ac.ae * > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Robert Hamilton University of California at Berkeley Marvell NanoLab Room 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu Phone: 510-809-8600 Mobile: 510-325-7557 (emergencies) e-mail preferred -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 5411 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 13117 bytes Desc: not available URL: From Nandini.Iyer at ucsf.edu Tue Jul 16 18:33:52 2013 From: Nandini.Iyer at ucsf.edu (Iyer, Nandini) Date: Tue, 16 Jul 2013 22:33:52 +0000 Subject: [labnetwork] Discolouration on evaporated Mg Message-ID: <91625D20BE5AA24FB206AAAC6EF156176B871B@ex06.net.ucsf.edu> Hi, Recently, we have noticed some unusual spots on our evaporated Mg film (~10um). It consists of a contaminating particle and a ring shaped discolouration around the particle. We suspect that the contaminant may be Mg particles deposited during evaporation but we are not certain about this. Does anyone have any theories about what could be happening? Thank you. Nandini -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ring_around_Contaminant_On_Mg_Film.jpg Type: image/jpeg Size: 32836 bytes Desc: Ring_around_Contaminant_On_Mg_Film.jpg URL: From pkarulkar9 at gmail.com Wed Jul 17 00:42:24 2013 From: pkarulkar9 at gmail.com (Pramod C Karulkar) Date: Tue, 16 Jul 2013 21:42:24 -0700 Subject: [labnetwork] Discolouration on evaporated Mg In-Reply-To: <91625D20BE5AA24FB206AAAC6EF156176B871B@ex06.net.ucsf.edu> References: <91625D20BE5AA24FB206AAAC6EF156176B871B@ex06.net.ucsf.edu> Message-ID: <51E620B0.7080706@gmail.com> I hope you have eliminated the evaporation source and process themselves as the sources of problem. Mg deposition is very tricky because it is very reactive. The particles are probably contaminants that are present on the substrate/wafer before evaporation. Two possibilities for the rings: The rings are present around the particle before deposition and are from the same source of contamination. They manifest vividly after deposition. Other origin for the rings is out-gassing or decomposition of the particle. Shadowing by the particle can also cause some rings. The substrate (elemental such as silicon or oxide such as SiO2 or Al2O3) can play a role in this too. Varying thermal treatment without breaking the vacuum may help to understand this. Look up literature on reactions with substrate and condensation phenomena in ultra-thin films in JVST and APL. Substate processes can modify film structure (Very interesting effect is described here: http://apl.aip.org/resource/1/applab/v93/i21/p213304_s1?view=fulltext&display=print&bypassSSO=1 ) But the "rings" strongly suggest contamination. There is one way to be perfect and infinite ways to be imperfect. Contamination is an imperfection in the process. It is not something that happens universally. Hence it is difficult to explain what is happening based on your brief comment. Someone has to audit your complete process (not just the evaporation) thoroughly. You will also have to do some experimentation and analytical work to resolve this. Good luck.... Pramod C Karulkar Ph. D. Home 2*5*3* 3*0*3 0*4*1*8 6024 33rd Street Ct NW Gig Harbor WA 98335 On 7/16/2013 3:33 PM, Iyer, Nandini wrote: > Hi, > > Recently, we have noticed some unusual spots on our evaporated Mg film > (~10um). It consists of a contaminating particle and a ring shaped > discolouration around the particle. We suspect that the contaminant > may be Mg particles deposited during evaporation but we are not > certain about this. Does anyone have any theories about what could be > happening? > > Thank you. > > Nandini > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Pramod C Karulkar Ph. D. Home 2*5*3* 3*0*3 0*4*1*8 6024 33rd Street Ct NW Gig Harbor WA 98335 -------------- next part -------------- An HTML attachment was scrubbed... URL: From tony.olsen at utah.edu Mon Jul 22 18:03:13 2013 From: tony.olsen at utah.edu (Tony L Olsen) Date: Mon, 22 Jul 2013 22:03:13 +0000 Subject: [labnetwork] KOH Tank Design Message-ID: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> Dear Labnetwork We are building a new wet bench and would like to include a dedicated KOH etch bath to replace the current methodology of glassware with stir bars on a hotplate. We generally use a bath of 80?C. Our wetbench vendor initially quoted a recirculated bath in a stainless steel tank. We are concerned about the stainless, nor do we believe the Teflon or PVDF wetted surfaces in the proposed diaphragm pump will hold up to the hot KOH. Another option we are aware of is a quartz tank heated externally by recirculated water. I'm certain there are other options, too. Can you share your experience with dedicated KOH baths? What is the configuration? What are the materials? How do you mix/stir the bath? What problems have you experienced? What would you do next time? Thank You, tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer 36 S Wasatch Dr, Suite 2500 SMBB Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Tue Jul 23 06:14:28 2013 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Tue, 23 Jul 2013 10:14:28 +0000 Subject: [labnetwork] KOH Tank Design In-Reply-To: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> References: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> Message-ID: Hi, I have used a reflux condenser (Lab Glass) with a heated jacket. I have never had the need for a stir bar with the heated jacket. For the condenser coil I use either cold water or a recir system to save on water going to the drain. The web site for Lab Glass is http://www.wilmad-labglass.com/ProductList.aspx?t=108 The beaker has a large flat on the top which is clamped to the cover. The cover has 3 holes, one for the condenser, one for a T/C and one extra, this works great for KOH and I also use it for EDP. The beaker fits into a heater jacket. This applies even heat to the solution so a stir bar is not needed. Good luck. Rick Morrison Draper Laboratory Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tony L Olsen Sent: Monday, July 22, 2013 6:03 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] KOH Tank Design Dear Labnetwork We are building a new wet bench and would like to include a dedicated KOH etch bath to replace the current methodology of glassware with stir bars on a hotplate. We generally use a bath of 80?C. Our wetbench vendor initially quoted a recirculated bath in a stainless steel tank. We are concerned about the stainless, nor do we believe the Teflon or PVDF wetted surfaces in the proposed diaphragm pump will hold up to the hot KOH. Another option we are aware of is a quartz tank heated externally by recirculated water. I'm certain there are other options, too. Can you share your experience with dedicated KOH baths? What is the configuration? What are the materials? How do you mix/stir the bath? What problems have you experienced? What would you do next time? Thank You, tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer 36 S Wasatch Dr, Suite 2500 SMBB Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From kuhn1 at purdue.edu Tue Jul 23 07:31:36 2013 From: kuhn1 at purdue.edu (Kuhn, Jeffrey G) Date: Tue, 23 Jul 2013 11:31:36 +0000 Subject: [labnetwork] KOH Tank Design In-Reply-To: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> References: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> Message-ID: <06C167B22748364D85BCA1AA812FDA1A3C410D24@WPVEXCMBX02.purdue.lcl> Tony, A couple of years ago we installed a dedicated KOH bath inside a fume hood for some of our research folks. The bath is made by Modutek and is electrically heated. The tank itself is quartz and has a Teflon liner. There is also a coil of tubing around the top that flows cold water in order to condense vapors and return them to the tank. The tank uses a magnetic stirrer (air or N2 powered) for stirring. We had some issues initially with the tank as supplied but those issues have been resolved. Please feel free to contact me privately if you'd like more details. Regards, Jeff Kuhn Facility Engineer Birck Nanotechnology Center Purdue University 1205 W. State St. West Lafayette, IN 47907 Ph: (765) 496-8329 Fax: (765) 496-2018 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tony L Olsen Sent: Monday, July 22, 2013 6:03 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] KOH Tank Design Dear Labnetwork We are building a new wet bench and would like to include a dedicated KOH etch bath to replace the current methodology of glassware with stir bars on a hotplate. We generally use a bath of 80?C. Our wetbench vendor initially quoted a recirculated bath in a stainless steel tank. We are concerned about the stainless, nor do we believe the Teflon or PVDF wetted surfaces in the proposed diaphragm pump will hold up to the hot KOH. Another option we are aware of is a quartz tank heated externally by recirculated water. I'm certain there are other options, too. Can you share your experience with dedicated KOH baths? What is the configuration? What are the materials? How do you mix/stir the bath? What problems have you experienced? What would you do next time? Thank You, tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer 36 S Wasatch Dr, Suite 2500 SMBB Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From Vincent.Luciani at nist.gov Tue Jul 23 09:01:52 2013 From: Vincent.Luciani at nist.gov (Luciani, Vincent) Date: Tue, 23 Jul 2013 13:01:52 +0000 Subject: [labnetwork] KOH Tank Design In-Reply-To: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> References: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> Message-ID: <92edaf3885414283a582903db738a57e@BLUPR09MB008.namprd09.prod.outlook.com> Hello Tony, This is an interesting question for me because I am considering changing strategies away from the built in tank. First: The approach that Jeff describes has successfully worked for me over the years in a few different implementations including the one we have now ( by Reynolds's Tech). I personally like the quartz or Teflon lined quartz. I would stay away from a SS tank. However, there is dissatisfaction in my KOH etch community that has me re-evaluating our approach. Based on the comments and usage behavior of our users over the last few years, our KOH setup is not what they want. Having done extensive KOH etching experiments over the years, I agree and sympathize with some of their specific complaints. Their issues (partial list): I want to mix a custom version of KOH etch mixture. Don't make me use your community tank. I don't need a large volume. So your dedicated tank is too big. The built -in tank is too slow, takes too long to heat and cool thus limited user throughput. Sometimes I wonder if tank contamination from a previous users botched experiment affected mine. I want to watch my sample etch. There are many reasons this can be a real need. And more! My Issue: They want to set up their own version for a day or two or at a time and we don't have the space to allow folks to set up camp in a wet bench . What I plan for next time: One day when I replace our KOH bench I will make a bench with 3 or 4 stations, each of which have a big quartz beaker with water cooled reflux lid, thermometer (or TC) well, on a stirring hotplate with excellent lighting and good visibility of the sample during the etch. This seems to be what most "advanced" KOH users want...at NIST anyway. Certainly, the built-in, heated tank is perfect for some labs. I want to poiuntb out that it is not always the case. We definitely have more researchers/users that would like the multiple station, raised tank version I described. Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 [Description: CNST Horztl Color logo] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tony L Olsen Sent: Monday, July 22, 2013 6:03 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] KOH Tank Design Dear Labnetwork We are building a new wet bench and would like to include a dedicated KOH etch bath to replace the current methodology of glassware with stir bars on a hotplate. We generally use a bath of 80?C. Our wetbench vendor initially quoted a recirculated bath in a stainless steel tank. We are concerned about the stainless, nor do we believe the Teflon or PVDF wetted surfaces in the proposed diaphragm pump will hold up to the hot KOH. Another option we are aware of is a quartz tank heated externally by recirculated water. I'm certain there are other options, too. Can you share your experience with dedicated KOH baths? What is the configuration? What are the materials? How do you mix/stir the bath? What problems have you experienced? What would you do next time? Thank You, tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer 36 S Wasatch Dr, Suite 2500 SMBB Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 6965 bytes Desc: image001.jpg URL: From reynolds at ece.ucsb.edu Tue Jul 23 12:17:07 2013 From: reynolds at ece.ucsb.edu (Tom Reynolds) Date: Tue, 23 Jul 2013 09:17:07 -0700 Subject: [labnetwork] KOH Tank Design In-Reply-To: <06C167B22748364D85BCA1AA812FDA1A3C410D24@WPVEXCMBX02.purdue.lcl> References: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> <06C167B22748364D85BCA1AA812FDA1A3C410D24@WPVEXCMBX02.purdue.lcl> Message-ID: <001b01ce87c0$13bae890$3b30b9b0$@ucsb.edu> We also have this Modutek bath at UCSB for our heated KOH and have been satisfied with the results. The drains valves need cleaning periodically, but that is not uncommon. Thanks, Tom -------------------------------------------------------------- Tom Reynolds, Lab Manager UCSB Nanofabrication Facility Electrical and Computer Engineering Dept. Engineering Science Bldg #225, Room 1109E Santa Barbara, CA 93106 805-893-3918 x215 office 805-451-3979 cell 805-893-3918 fax reynolds at ece.ucsb.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Kuhn, Jeffrey G Sent: Tuesday, July 23, 2013 4:32 AM To: 'Tony L Olsen'; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] KOH Tank Design Tony, A couple of years ago we installed a dedicated KOH bath inside a fume hood for some of our research folks. The bath is made by Modutek and is electrically heated. The tank itself is quartz and has a Teflon liner. There is also a coil of tubing around the top that flows cold water in order to condense vapors and return them to the tank. The tank uses a magnetic stirrer (air or N2 powered) for stirring. We had some issues initially with the tank as supplied but those issues have been resolved. Please feel free to contact me privately if you?d like more details. Regards, Jeff Kuhn Facility Engineer Birck Nanotechnology Center Purdue University 1205 W. State St. West Lafayette, IN 47907 Ph: (765) 496-8329 Fax: (765) 496-2018 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tony L Olsen Sent: Monday, July 22, 2013 6:03 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] KOH Tank Design Dear Labnetwork We are building a new wet bench and would like to include a dedicated KOH etch bath to replace the current methodology of glassware with stir bars on a hotplate. We generally use a bath of 80?C. Our wetbench vendor initially quoted a recirculated bath in a stainless steel tank. We are concerned about the stainless, nor do we believe the Teflon or PVDF wetted surfaces in the proposed diaphragm pump will hold up to the hot KOH. Another option we are aware of is a quartz tank heated externally by recirculated water. I?m certain there are other options, too. Can you share your experience with dedicated KOH baths? What is the configuration? What are the materials? How do you mix/stir the bath? What problems have you experienced? What would you do next time? Thank You, tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer 36 S Wasatch Dr, Suite 2500 SMBB Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Tue Jul 23 15:10:28 2013 From: michael.martin at louisville.edu (Martin,Michael David) Date: Tue, 23 Jul 2013 19:10:28 +0000 Subject: [labnetwork] KOH Tank Design In-Reply-To: <92edaf3885414283a582903db738a57e@BLUPR09MB008.namprd09.prod.outlook.com> References: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> <92edaf3885414283a582903db738a57e@BLUPR09MB008.namprd09.prod.outlook.com> Message-ID: Hi guys, We've been using both techniques at UofL, i.e. Teflon lined quartz tanks and 6" or 8" diameter beaker with reflux condenser. One advantage of the quartz tanks for many our users is having the space to use a PEEK fixture for doing single sided etches. These fixtures protect both the wafer edge and the back side during the etch resulting in a very clean looking final product. Etches done with the fixture tend to produce a more robust wafer as one frequently has oxide defects at the edge that results in nucleation sites for cracks upon further handling. This is also true for TMAH etches. Michael Martin Lab Grunt From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Luciani, Vincent Sent: Tuesday, July 23, 2013 9:02 AM To: 'Tony L Olsen'; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] KOH Tank Design Hello Tony, This is an interesting question for me because I am considering changing strategies away from the built in tank. First: The approach that Jeff describes has successfully worked for me over the years in a few different implementations including the one we have now ( by Reynolds's Tech). I personally like the quartz or Teflon lined quartz. I would stay away from a SS tank. However, there is dissatisfaction in my KOH etch community that has me re-evaluating our approach. Based on the comments and usage behavior of our users over the last few years, our KOH setup is not what they want. Having done extensive KOH etching experiments over the years, I agree and sympathize with some of their specific complaints. Their issues (partial list): I want to mix a custom version of KOH etch mixture. Don't make me use your community tank. I don't need a large volume. So your dedicated tank is too big. The built -in tank is too slow, takes too long to heat and cool thus limited user throughput. Sometimes I wonder if tank contamination from a previous users botched experiment affected mine. I want to watch my sample etch. There are many reasons this can be a real need. And more! My Issue: They want to set up their own version for a day or two or at a time and we don't have the space to allow folks to set up camp in a wet bench . What I plan for next time: One day when I replace our KOH bench I will make a bench with 3 or 4 stations, each of which have a big quartz beaker with water cooled reflux lid, thermometer (or TC) well, on a stirring hotplate with excellent lighting and good visibility of the sample during the etch. This seems to be what most "advanced" KOH users want...at NIST anyway. Certainly, the built-in, heated tank is perfect for some labs. I want to poiuntb out that it is not always the case. We definitely have more researchers/users that would like the multiple station, raised tank version I described. Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 [Description: CNST Horztl Color logo] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tony L Olsen Sent: Monday, July 22, 2013 6:03 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] KOH Tank Design Dear Labnetwork We are building a new wet bench and would like to include a dedicated KOH etch bath to replace the current methodology of glassware with stir bars on a hotplate. We generally use a bath of 80?C. Our wetbench vendor initially quoted a recirculated bath in a stainless steel tank. We are concerned about the stainless, nor do we believe the Teflon or PVDF wetted surfaces in the proposed diaphragm pump will hold up to the hot KOH. Another option we are aware of is a quartz tank heated externally by recirculated water. I'm certain there are other options, too. Can you share your experience with dedicated KOH baths? What is the configuration? What are the materials? How do you mix/stir the bath? What problems have you experienced? What would you do next time? Thank You, tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer 36 S Wasatch Dr, Suite 2500 SMBB Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 6965 bytes Desc: image001.jpg URL: From bill at eecs.berkeley.edu Tue Jul 23 20:43:27 2013 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Tue, 23 Jul 2013 17:43:27 -0700 Subject: [labnetwork] KOH Tank Design In-Reply-To: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> References: <9269F95770688D4FA77843D0D2DA2ABD43BF5612@X-MB1.xds.umail.utah.edu> Message-ID: <51EF232F.5060905@eecs.berkeley.edu> KOH bath is electro-polished stainless steel extruded (soft corners) vessel. Heated via an immersion heater, controlled by a PID controller. Thermocouple and backup OT thermocouples are internal to the bath, Type J with PFA cladding. Bath has lid, no reflux. We sparge KOH bath with O2 to react with generated H2 and minimize hillock formation J. Micromech. Microeng. 9 (1999) 139--145. Members mix their own KOH, use for period of hours, can reserve for up to 2 days, then dispose. KOH is mixed from solid source with DI so material cost is modest compared to CMOS grade acid bath Bill Flounders UC Berkeley NanoLab Tony L Olsen wrote: > > Dear Labnetwork > > We are building a new wet bench and would like to include a dedicated > KOH etch bath to replace the current methodology of glassware with > stir bars on a hotplate. We generally use a bath of 80?C. > > Our wetbench vendor initially quoted a recirculated bath in a > stainless steel tank. We are concerned about the stainless, nor do we > believe the Teflon or PVDF wetted surfaces in the proposed diaphragm > pump will hold up to the hot KOH. Another option we are aware of is a > quartz tank heated externally by recirculated water. I'm certain > there are other options, too. > > Can you share your experience with dedicated KOH baths? What is the > configuration? What are the materials? How do you mix/stir the > bath? What problems have you experienced? What would you do next time? > > Thank You, > > tonyO > > Tony Olsen > > Nanofab Cleanroom Supervisor/Process Engineer > > 36 S Wasatch Dr, Suite 2500 SMBB > > Salt Lake City, UT 84112 > > 801-587-0651 office > > 801-587-3077 fax > > www.nanofab.utah.edu > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From kambar009 at gmail.com Wed Jul 31 08:13:16 2013 From: kambar009 at gmail.com (Chandrashekar S Kambar) Date: Wed, 31 Jul 2013 17:43:16 +0530 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. Message-ID: Hi, We are trying to optimize Ni with E-Beam Evaporator (TECPORT). The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK 2. ELECTRON BEAM PATTERN: Focused to one point (to the middle of the crucible). CRUCIBLE: Graphite. ISSUE: During the RAISE 1, everything seems to be normal and only the material in the middle of the crucible gets melted. During the RAISE 2 the material starts to spit out of the crucible. During the deposition the spitting increases drastically, thus we will be forced to stop the deposition. After the deposition when we take out the crucible, crucible was broken across the wall. However there was no damage done to the pocket holder (Hearth). Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) During the deposition Power % goes up to 16% and the current goes up to 180 mA ( V = 6.99 KV constant). We need to know, if there is any way to reduce the crucible cracking and to avoid the spitting of the material. QUESTION 2: During the deposition the crucibles are cracked and its pieces are stuck with the Ni material. Is there any way to recover the material by removing the graphite pieces? Thanks and Regards, Chandrashekar S Kambar. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mheiden at engr.ucr.edu Wed Jul 31 12:35:32 2013 From: mheiden at engr.ucr.edu (Mark Heiden) Date: Wed, 31 Jul 2013 09:35:32 -0700 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: References: Message-ID: <002301ce8e0b$f991cef0$ecb56cd0$@engr.ucr.edu> Hi Chandrashekar, At first it seems that your raise #2 power is just too high but many other factors may be in play. Hopefully your system has a sweep controller which you should be using to set the Electron Beam Pattern to sweep the surface of the melt. This is the best way to distribute the heat across the entire melt. Focusing the beam in one stationary spot in the center will cause exactly the problems that you are describing and could lead to a damaged liner or hearth. If you have no sweep available, you may try extending your rise times to more slowly heat the material. Any time that you heat too fast or have to shut off the beam instantly (like when the melt is spitting all over) you run the risk of cracking the liner from thermal shock. Also, you should run the system manually first and watch carefully what happens and at what power levels. If your shutter does not have a chimney or hole that allows the rate sensor to see the melt at all times, you will need to do the testing with the shutter open and record what power levels it takes to achieve a given deposition rate. This way you can set the rise and soak programs to safe levels and when your shutter opens it will already be at the desired deposition rate. If the crucible liner disintegrates and leaves pieces in the melt, we replace the liner and the melt since it is likely contaminated and nickel is one of the cheaper materials to purchase. Hope this helps, Mark Heiden UC Riverside Center for Nanoscale Science and Engineering NanoFab Cleanroom Manager (951) 827-2551 mheiden at engr.ucr.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chandrashekar S Kambar Sent: Wednesday, July 31, 2013 5:13 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] E-Beam Evaporation, Ni optimization. Hi, We are trying to optimize Ni with E-Beam Evaporator (TECPORT). The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK 2. ELECTRON BEAM PATTERN: Focused to one point (to the middle of the crucible). CRUCIBLE: Graphite. ISSUE: During the RAISE 1, everything seems to be normal and only the material in the middle of the crucible gets melted. During the RAISE 2 the material starts to spit out of the crucible. During the deposition the spitting increases drastically, thus we will be forced to stop the deposition. After the deposition when we take out the crucible, crucible was broken across the wall. However there was no damage done to the pocket holder (Hearth). Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) During the deposition Power % goes up to 16% and the current goes up to 180 mA ( V = 6.99 KV constant). We need to know, if there is any way to reduce the crucible cracking and to avoid the spitting of the material. QUESTION 2: During the deposition the crucibles are cracked and its pieces are stuck with the Ni material. Is there any way to recover the material by removing the graphite pieces? Thanks and Regards, Chandrashekar S Kambar. -------------- next part -------------- An HTML attachment was scrubbed... URL: From nathan.nelson-fitzpatrick at uwaterloo.ca Wed Jul 31 13:37:33 2013 From: nathan.nelson-fitzpatrick at uwaterloo.ca (Nathan Nelson - Fitzpatrick) Date: Wed, 31 Jul 2013 17:37:33 +0000 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: Message-ID: Hi Chandrashekar, We had an issue like this about 18 months ago when evaporating Ni in "Fabmate" graphite crucible liners. Our crucible liners would only last about 4 or 5 depositions before being hopelessly cracked and the Nickel melt would degrade from its normal shiny lustre to a dull grey colour. We did not experience spitting, but otherwise our experience sounds similar. We ended up purchasing a Tungsten crucible liner for our Ni evaporation. The liner has been working for the past 18 months through many Ni depositions and only has one hairline crack. In migrating to the W liner our deposition power has gone down (for the same deposition rate) and we now see much less blistering of resist materials when performing a lift-off (this used to be a significant problem in our E-beam evaporator). Best regards, -Nathan -- Nathan Nelson-Fitzpatrick PhD Nanofabrication Process Engineer Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Ph: +1 519-888-4567 ext. 31796 From: Chandrashekar S Kambar > Date: Wednesday, 31 July, 2013 8:13 AM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] E-Beam Evaporation, Ni optimization. Hi, We are trying to optimize Ni with E-Beam Evaporator (TECPORT). The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK 2. ELECTRON BEAM PATTERN: Focused to one point (to the middle of the crucible). CRUCIBLE: Graphite. ISSUE: During the RAISE 1, everything seems to be normal and only the material in the middle of the crucible gets melted. During the RAISE 2 the material starts to spit out of the crucible. During the deposition the spitting increases drastically, thus we will be forced to stop the deposition. After the deposition when we take out the crucible, crucible was broken across the wall. However there was no damage done to the pocket holder (Hearth). Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) During the deposition Power % goes up to 16% and the current goes up to 180 mA ( V = 6.99 KV constant). We need to know, if there is any way to reduce the crucible cracking and to avoid the spitting of the material. QUESTION 2: During the deposition the crucibles are cracked and its pieces are stuck with the Ni material. Is there any way to recover the material by removing the graphite pieces? Thanks and Regards, Chandrashekar S Kambar. -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill at eecs.berkeley.edu Wed Jul 31 15:00:39 2013 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Wed, 31 Jul 2013 12:00:39 -0700 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: References: Message-ID: <51F95ED7.7020303@eecs.berkeley.edu> Chandrashekar S Kambar, Lab Network is primarily for operations discussions or facility wide issues rather than detailed nanofabrication questions. Please consider the mems talk venue for questions at this level of process detail. I also encourage you to contact Process Support at CHA Industries http://www.chaindustries.com/ I welcome dissenting opinion from the network if I have misrepresented our forum. Thank you Bill Flounders UC Berkeley Chandrashekar S Kambar wrote: > > Hi, > > We are trying to optimize Ni with E-Beam Evaporator (TECPORT). > > The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, > SOAK 2. > ELECTRON BEAM PATTERN: Focused to one point (to the middle of the > crucible). > CRUCIBLE: Graphite. > > ISSUE: During the RAISE 1, everything seems to be normal and only the > material in the middle of the crucible gets melted. During the RAISE 2 > the material starts to spit out of the crucible. During the deposition > the spitting increases drastically, thus we will be forced to stop the > deposition. After the deposition when we take out the crucible, > crucible was broken across the wall. However there was no damage done > to the pocket holder (Hearth). > > Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) > Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) > During the deposition Power % goes up to 16% and the > current goes up to 180 mA ( V = 6.99 KV constant). > > We need to know, if there is any way to reduce the crucible cracking > and to avoid the spitting of the material. > > QUESTION 2: > > During the deposition the crucibles are cracked and its pieces are > stuck with the Ni material. Is there any way to recover the material > by removing the graphite pieces? > > Thanks and Regards, > Chandrashekar S Kambar. > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From elliscd at auburn.edu Wed Jul 31 17:01:25 2013 From: elliscd at auburn.edu (Charles Ellis) Date: Wed, 31 Jul 2013 21:01:25 +0000 Subject: [labnetwork] E-Beam Evaporation, Ni optimization. In-Reply-To: <51F95ED7.7020303@eecs.berkeley.edu> Message-ID: I could be wrong as the original intent of this forum, but I welcome the process questions.. I think it is a great place for the old guys like me and some of you to share our experiences and maybe help some of these young guys. As a lab manager I also welcome the operations discussions ? it does not seem that this forum is overly busy and so I vote we encourage process questions as well as operational questions. It seems to have been working quite well so far. I very much enjoy the traffic I have seen over the years.. Just my 2 cents! Charles Ellis? Auburn.. From: Bill Flounders > Date: Wednesday, July 31, 2013 2:00 PM To: Chandrashekar S Kambar >, "labnetwork at mtl.mit.edu" > Subject: Re: [labnetwork] E-Beam Evaporation, Ni optimization. Chandrashekar S Kambar, Lab Network is primarily for operations discussions or facility wide issues rather than detailed nanofabrication questions. Please consider the mems talk venue for questions at this level of process detail. I also encourage you to contact Process Support at CHA Industries http://www.chaindustries.com/ I welcome dissenting opinion from the network if I have misrepresented our forum. Thank you Bill Flounders UC Berkeley Chandrashekar S Kambar wrote: Hi, We are trying to optimize Ni with E-Beam Evaporator (TECPORT). The E-Beam power is raised in two steps: RAISE 1, SOAK 1 AND RAISE 2, SOAK 2. ELECTRON BEAM PATTERN: Focused to one point (to the middle of the crucible). CRUCIBLE: Graphite. ISSUE: During the RAISE 1, everything seems to be normal and only the material in the middle of the crucible gets melted. During the RAISE 2 the material starts to spit out of the crucible. During the deposition the spitting increases drastically, thus we will be forced to stop the deposition. After the deposition when we take out the crucible, crucible was broken across the wall. However there was no damage done to the pocket holder (Hearth). Power % : Raise 1: 5% (V= 6.99 KV and I ~ 70 mA) Raise 2: 10% (V= 6.99 KV and I ~ 120 mA) During the deposition Power % goes up to 16% and the current goes up to 180 mA ( V = 6.99 KV constant). We need to know, if there is any way to reduce the crucible cracking and to avoid the spitting of the material. QUESTION 2: During the deposition the crucibles are cracked and its pieces are stuck with the Ni material. Is there any way to recover the material by removing the graphite pieces? Thanks and Regards, Chandrashekar S Kambar. _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: