[labnetwork] C4F8 polymer deposition in RIE - issues related to that

[N P VAMSI KRISHNA]

Dear Colleagues,
Recently we had a problem in our RIE (Oxford Plasma lab system 100) tool.
The RF Lower electrode was giving very high reflected powers for some
recipes and DC bias close to 0V and we realized the auto match capacitors
are misaligned. After a long effort we could got that back to almost
normal, by manually tuning the RF auto match and doing error corrections.
The last recipe which ran on the tool was depositing C4F8 for 10 min.
Before this run chamber was clean. (We normally don't encourage polymer
deposition in our RIE tool for longer durations)

Does any one face similar problem or any idea if C4F8 polymer deposition
could do this and why?


-- 
Thanks & Regards,

*Vamsi Krishna*
Sr.Facility Technologist - Process Integration
National Nano Fabrication Center
Center for Nano Science and Engineering (CeNSE)
Indian Institute of Science(IISc)
Bangalore 560012, INDIA
Mobile:  +91 9880988239

*A bird sitting on the branch of a tree is not afraid of the branch shaking
or breaking, because it trusts not the branches but its OWN WINGS. *
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