From conrad at Princeton.EDU  Sat Sep  7 15:29:49 2013
From: conrad at Princeton.EDU (Conrad L. Silvestre)
Date: Sat, 7 Sep 2013 19:29:49 +0000
Subject: [labnetwork] High Purity Valve Cleaning Service
Message-ID: <942F7C9560506B479A2B7D73DB9F98D2439C55B2@CSGMBX204W.pu.win.princeton.edu>

I am looking for a vendor to disassemble, clean, and reassemble Swagelock high purity valves such as the SS-DLS4.  Does anyone know of a vendor?

Conrad Silvestre
Department of Electrical Engineering
C430 EQuad, CN-5263
Princeton University
Princeton, New Jersey 08544-5263
Office: 609-258-6236
FAX: 609-258-1840
Business Cell: 609-356-8825

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From len.olona at ou.edu  Sun Sep  8 09:05:29 2013
From: len.olona at ou.edu (Olona, Leonard E.)
Date: Sun, 8 Sep 2013 13:05:29 +0000
Subject: [labnetwork] High Purity Valve Cleaning Service
In-Reply-To: <942F7C9560506B479A2B7D73DB9F98D2439C55B2@CSGMBX204W.pu.win.princeton.edu>
References: <942F7C9560506B479A2B7D73DB9F98D2439C55B2@CSGMBX204W.pu.win.princeton.edu>
Message-ID: <B8B4EBCD-B8AC-48E9-93F7-AFD225C1CACF@ou.edu>

Craig Cheney from Infinity may be a good resource.

Len
OU Cleanroom Manager




On Sep 8, 2013, at 4:44 AM, "Conrad L. Silvestre" <conrad at Princeton.EDU<mailto:conrad at Princeton.EDU>> wrote:

I am looking for a vendor to disassemble, clean, and reassemble Swagelock high purity valves such as the SS-DLS4.  Does anyone know of a vendor?

Conrad Silvestre
Department of Electrical Engineering
C430 EQuad, CN-5263
Princeton University
Princeton, New Jersey 08544-5263
Office: 609-258-6236
FAX: 609-258-1840
Business Cell: 609-356-8825

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From cooper at exper-tech.com  Sun Sep  8 12:06:58 2013
From: cooper at exper-tech.com (Mark Cooper)
Date: Sun, 8 Sep 2013 09:06:58 -0700
Subject: [labnetwork] High Purity Valve Cleaning Service
References: <942F7C9560506B479A2B7D73DB9F98D2439C55B2@CSGMBX204W.pu.win.princeton.edu>
Message-ID: <92F6BFEEC7D07948AC17DC59716B434B01A52EAB@exserver.expertech.local>

Expertech in Scotts Valley provides these services. We can also repair or rebuild gas panels from tools. Conrad, please tell me more. 
We also offer a very large inventory of high purity gas sticks recently removed from a late model tier 1 fab. I can forward the lists to anyone with interest.

Mark Cooper

Vice President General Manager

Main: 831-439-9300  ext. 422 
Fax: 831-439-8139 
Mobile: 831-332-9396
cooper at exper-tech.com

This email message is for the sole use of the addressee(s) and may contain Expertech confidential and legally privileged information.  Access, review, use, disclosure or distribution of this email by anyone other than the intended addressee is unauthorized and prohibited.  If you are not the intended recipient, please notify the sender immediately and destroy all paper and electronic copies of the original message and any attachments.


-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu on behalf of Conrad L. Silvestre
Sent: Sat 9/7/2013 12:29 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] High Purity Valve Cleaning Service
 
I am looking for a vendor to disassemble, clean, and reassemble Swagelock high purity valves such as the SS-DLS4.  Does anyone know of a vendor?

Conrad Silvestre
Department of Electrical Engineering
C430 EQuad, CN-5263
Princeton University
Princeton, New Jersey 08544-5263
Office: 609-258-6236
FAX: 609-258-1840
Business Cell: 609-356-8825

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From tbritton at criticalsystemsinc.com  Sun Sep  8 12:17:12 2013
From: tbritton at criticalsystemsinc.com (Tom Britton)
Date: Sun, 8 Sep 2013 16:17:12 +0000
Subject: [labnetwork] High Purity Valve Cleaning Service
In-Reply-To: <942F7C9560506B479A2B7D73DB9F98D2439C55B2@CSGMBX204W.pu.win.princeton.edu>
References: <942F7C9560506B479A2B7D73DB9F98D2439C55B2@CSGMBX204W.pu.win.princeton.edu>
Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2E0101E74E@P3PWEX2MB006.ex2.secureserver.net>

Hello Conrad,

We've looked into doing this over the years, but with the cost of the repair kit at around $40, the labor to do it, and the cost of the testing to make sure it's seal to atmosphere is correct and it's properly shutting off, you're better off buying a new one. They're just not that expensive. A new APTech 316SS EP valve with 1/4" VCR fittings runs about $120, and the Var body version (for corrosives) runs about $185.  FYI

Best to you sir!

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[logo for email signature png]



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Conrad L. Silvestre
Sent: Saturday, September 07, 2013 1:30 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] High Purity Valve Cleaning Service

I am looking for a vendor to disassemble, clean, and reassemble Swagelock high purity valves such as the SS-DLS4.  Does anyone know of a vendor?

Conrad Silvestre
Department of Electrical Engineering
C430 EQuad, CN-5263
Princeton University
Princeton, New Jersey 08544-5263
Office: 609-258-6236
FAX: 609-258-1840
Business Cell: 609-356-8825

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From diadiuk at MIT.EDU  Mon Sep  9 15:55:09 2013
From: diadiuk at MIT.EDU (Vicky Diadiuk)
Date: Mon, 9 Sep 2013 15:55:09 -0400
Subject: [labnetwork] UGIM2014 Call for Presentations
Message-ID: <D96474DD-5AEE-4547-BDEA-0A25ABF636E1@mit.edu>



UGIM2014 Call for Presentations
 
The goal of this symposium is to bring together educators and researchers involved in micro/nanotechnology management around the world and to provide a forum for exchanging information and presenting new lab operations and educational concepts. Representatives of micro/nano fabrication facilities, ranging from new labs to nationally recognized facilities, have found this symposium an excellent forum for exchanging information. Industry/university interactions, including technology transfer, collaborative research, and training efforts are included.

Abstract Submission Deadline: 14 February 2014

Submission and Registration information at:  http://www.cns.fas.harvard.edu/UGIM2014/

Symposium on
Operations and Management of Nanotechnology Research Facilities
 
Submissions on all topics involving management of nanotechnology research facilities and academic laboratories will be considered. Papers are requested with a focus on one of the session topics listed below. Since this two-day symposium is dedicated to shared laboratory management, research papers are not appropriate.
 
Presentations Solicited on the Following Topics
1.    Multi-User Facility Operations
2.    Laboratory Safety and discipline
3.    Anti-Contamination Policies
4.    Supporting Numerous Wafer Materials and Sizes
5.    Lab Control Systems, Instrument Interlocks, Electronic Records
6.    Emerging Processes
7.    Staffing Strategies including use (or not) of student ?Super Users?
8.    Financing for Core Facilities, Capital Planning, and lab accounting
 

Also at UGIM2014

Discussion Panel Topics:  In addition to the Oral Paper Sessions, there will be 4-6 Discussion Panels on topics of cleanroom operations.

Topical Lunch:  Networking and topic discussion will continue during lunch at topic-assigned tables.

Exhibits:  Meet leading cleanroom and equipment vendors in a relaxed environment.

New This Year:  Optional ?New Lab Bootie Camp?:  Sunday preceding the start of UGIM there will be a half-day tutorial session on new laboratory startup including presentations on safety, tool maintenance options, and electronic tool management (interlocking and reservations).

 
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From rmorrison at draper.com  Tue Sep 10 06:31:08 2013
From: rmorrison at draper.com (Morrison, Richard H., Jr.)
Date: Tue, 10 Sep 2013 10:31:08 +0000
Subject: [labnetwork] Equipment Cleaning
Message-ID: <D3862732F46DEB4B93B4A7A80614D28809A2AD54@mbx2.draper.com>

Hi everyone,

I am in need of a cleaning service for sputtering system and evaporation system parts. I have a bead blast machine, but I would like to try to farm this service out, have any of you used outside cleaning vendors for this?

Thanks in advance.

Rick


Draper Laboratory
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461

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From julia.aebersold at louisville.edu  Tue Sep 10 10:45:12 2013
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Tue, 10 Sep 2013 14:45:12 +0000
Subject: [labnetwork] MOCVD systems
Message-ID: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>

Hi there!  We are considering the installation of a Veeco E300 MOCVD system into our cleanroom.  We have not had experience with this type of tool and would like to ask the community if they have a system of this type in their cleanroom or in another room due to its size.  Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.

See everyone at UGIM 2014!

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/
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From shott at stanford.edu  Tue Sep 10 11:31:41 2013
From: shott at stanford.edu (John Shott)
Date: Tue, 10 Sep 2013 08:31:41 -0700
Subject: [labnetwork] Equipment Cleaning
In-Reply-To: <D3862732F46DEB4B93B4A7A80614D28809A2AD54@mbx2.draper.com>
References: <D3862732F46DEB4B93B4A7A80614D28809A2AD54@mbx2.draper.com>
Message-ID: <522F3B5D.9030201@stanford.edu>

Rick:

We are currently using two different companies ... one of them near you 
... for that service.  They are:

MK Recovery Group
100 Willow St.
North Andover, MA 01845
*Phone*: 1-978-688-0606 <tel:1-978-688-0606>
*Fax*: 1-978-975-8464

Pentagon Technologies
21031 Alexander Ct, Hayward, CA 94545
Phone:(510) 783-5050

MK Recovery Group in Andover, MA is our choice when we have metals that 
have significant reclaim value (that is, gold, platinum, and friends).  
While I forget the exact algorithm, basically after reclaiming a certain 
amount of the precious metal for their efforts, we are credited with the 
remaining value of the metal.

When the metals on the parts are less valuable, we use Pentagon 
Technologies here in California.

I hope this helps,

John



On 9/10/2013 3:31 AM, Morrison, Richard H., Jr. wrote:
>
> Hi everyone,
>
> I am in need of a cleaning service for sputtering system and 
> evaporation system parts. I have a bead blast machine, but I would 
> like to try to farm this service out, have any of you used outside 
> cleaning vendors for this?
>
> Thanks in advance.
>
> Rick
>

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From gilheart at rice.edu  Tue Sep 10 11:22:37 2013
From: gilheart at rice.edu (Tim Gilheart)
Date: Tue, 10 Sep 2013 10:22:37 -0500
Subject: [labnetwork] Equipment Cleaning
In-Reply-To: <D3862732F46DEB4B93B4A7A80614D28809A2AD54@mbx2.draper.com>
References: <D3862732F46DEB4B93B4A7A80614D28809A2AD54@mbx2.draper.com>
Message-ID: <3D3AD1F5-FA99-4075-B301-C17D4A11E35C@rice.edu>

Hi Rick,

I've had good experiences with Cleanpart: www.cleanpart.com

I use them regularly (2-3 times a year) for cleaning evaporator parts.

--
Tim Gilheart, Ph.D.
Research Scientist - Nanofabrication Clean Room Manager
Shared Equipment Authority
Rice University, 6100 Main St MS-100, Houston, Texas 77005
Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu
Natural Sciences Divisional Advisor, Duncan College

On Sep 10, 2013, at 5:31 AM, Morrison, Richard H., Jr. wrote:

> Hi everyone,
>
> I am in need of a cleaning service for sputtering system and  
> evaporation system parts. I have a bead blast machine, but I would  
> like to try to farm this service out, have any of you used outside  
> cleaning vendors for this?
>
> Thanks in advance.
>
> Rick
>
>
> Draper Laboratory
> Group Leader Microfabrication Operations
> 555 Technology Square
> Cambridge Ma, 02139-3563
>
> www.draper.com
> rmorrison at draper.com
> W 617-258-3420
> C 508-930-3461
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

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From ccheney at infinityhps.com  Tue Sep 10 17:03:28 2013
From: ccheney at infinityhps.com (Craig Cheney)
Date: Tue, 10 Sep 2013 16:03:28 -0500
Subject: [labnetwork] MOCVD systems
In-Reply-To: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
Message-ID: <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>

Julia,

 

   We have installed quite a few MOCVD reactors at different Universities
and production facilities in different settings.  There are many nuances to
installing and operating a MOCVD reactor.  With so many different details to
discuss I will list the major ones in order of importance.  Without knowing
what type of material you will be growing I will list  the options that
would apply to all and note possible options for you.

 

Facilities:

 

Location, we have installed MOCVD reactors in non-clean room areas where the
reactors had a load lock.  If the system you are looking at has a load lock
you might want to consider saving your expensive cleanroom square footage
for a tool that requires it.  One note here, most reactors that utilize a
load lock (whether in  a clean room or not) require 5% (H2) forming gas to
condition the load lock.  Another key consideration is structure, these
units take up a lot of floor space and are heavy, make sure your structure
is rated to handle the weight, and plan ahead on how you are going to get it
from your loading dock to its final destination.

Exhaust,  the reactor will require some significant exhaust, make sure your
clean room (or other if not in a cleanroom) make-up air handler is ready to
make up the air that will be exhausted.  Another major concern for exhaust
is, the type rating on the exhaust.  Not knowing the requirements from your
EH&S department, it would be a good idea to review with them the gases you
will be using on the tool as well as well as the contents of the process
pump effluent, and whether or not you will be scrubbing your process
exhaust.

H2 Supply, you will need a large source of Hydrogen to operate this tool,
and the higher the quality the better.  If your campus has house Hydrogen or
a bulk source for it, your one step in the right direction.  We had one
customer (University) who tried running their reactor on a switch over panel
with a four cylinder manifold on each side of the switch over, this type of
setup caused them more problems and equipment repairs than if they had just
invested in a bulk source of Hydrogen.  

Power, most reactors such as this will require quite a bit of power,
typically 250 to 400 amps of 208V 3 phase power.  One major consideration,
if your reactor is purifying the Hydrogen with an older style Palladium
cell, you also might want to consider a UPS system for running the heaters
for the Palladium cell, on the older style ones, if they cool off too fast
they can crack the Palladium inside them and render them completely useless
(and they aren't cheap to replace ~ 50k).  The newer Palladium cells are a
little more robust and can withstand more abuse.  One other note, typically
the process pumps on these type of reactors run 24X7 due to the fact that
they quickly seize up when shut down and allowed to cool, so be prepared for
that also (process pumps for reactors are not cheap either).

Process Cooling water, MOCVD reactors require quite a bit of process cooling
water, if your facility has a good house PCW system then you are probably
ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees C
depending on manufacturer and reactor size.

Process Gas Delivery, without knowing what type of material you will be
growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can't say what type of
gas you will be using, but regardless of the type of semiconductor, you will
be installing some toxic gas systems to support them.  These gases will be
required to be in gas cabinets with high quality purge panels,  the gas
cabinets will require building exhaust also, the gas delivery lines will
have to be high quality electro-polished stainless steel, some gas types
will also be required to be coaxial style gas lines, the assembly method for
gas lines are required to be welded throughout.  Again, I would review all
required gases with your EH&S department to ensure you have the proper
equipment to support them.

Life Safety, you will be required to incorporate life safety systems to
monitor all spaces (gas cabinets, reactor, and people space) for the
presence of flammable gas, toxic gas (dependent on material type) and Oxygen
deficient atm. 

Process Exhaust, if you are going to be using scrubbers (typically activated
charcoal bed type), you will need a good maintenance program to stay on top
of the scrubber maintenance, these units require regeneration and periodic
charcoal changes.  If you will not be using process exhaust scrubbers, then
you need to make sure your process exhaust effluent is compatible with the
building exhaust system you will be connecting it to.  Also, depending the
material type grown your process exhaust lines may be required to be heated
to prevent buildup of process byproducts.

 

Operation:

 

Maintenance, as far as operation goes with these systems they do require
periodic maintenance which correlates to run time as with most semiconductor
processing equipment.  Without a good understanding of the material type you
will be growing it would be futile to mention different maintenance routines
and what is required.  I will say this much, if the required maintenance is
not performed when it is supposed to be done, it can cause process
deviations, equipment failures, and possible life safety issues.  Some
reactor processes require acid based cleaning of components on the reactor
chamber, you may need a wet bench to support this or a bench available for
cleaning.

Analytical tools, depending on the film type grown, you will need to the
proper analytical tools to measure the specific characteristics of the film
type that you are quantifying. 

Waste Stream, again, depending on the type of material grown you will
develop a waste stream that will need to be managed.

 

Those are the major thoughts when considering a MOCVD reactor, we have
helped many different customers achieve a cost effective solution with
regards to installation and startup of these systems, so don't let all the
details scare you.  We would be happy discuss any questions or concerns that
you might have.  Please feel free to contact us with any other questions or
concerns.

 

Thank you,

 

Craig Cheney

Description: cid:image001.jpg at 01C7E19F.47FFBAE0

 

 

Desk:  (608)834-4200

Fax:     (608)834-4299

Cell:    (608)438-8714

 

This e-mail transmission and any attachments to it are intended solely for
the use of the individual or entity to whom it is addressed and may contain
confidential and privileged information. If you are not the intended
recipient, your use, forwarding, printing, storing, disseminating,
distribution, or copying of this communication is prohibited. If you
received this communication in error, please notify the sender immediately
by replying to this message and delete it from your computer.

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Aebersold,Julia W.
Sent: Tuesday, September 10, 2013 9:45 AM
To: <labnetwork at mtl.mit.edu>
Subject: [labnetwork] MOCVD systems

 

var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr',
function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) {
return _arrInputs[i]; } } }(); function waxGetElement(i) { return
WAX.getElement(i); } 

Hi there!  We are considering the installation of a Veeco E300 MOCVD system
into our cleanroom.  We have not had experience with this type of tool and
would like to ask the community if they have a system of this type in their
cleanroom or in another room due to its size.  Also, if you have any other
concerns about operations, nuances, difficulty of operation, maintenance
headaches, etc. I would be greatly appreciative. 

 

See everyone at UGIM 2014!

 

Cheers!

 

Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292

 

(502) 852-1572

http://louisville.edu/micronano/

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From raghavan at ece.iisc.ernet.in  Tue Sep 10 23:36:34 2013
From: raghavan at ece.iisc.ernet.in (raghavan)
Date: Wed, 11 Sep 2013 09:06:34 +0530
Subject: [labnetwork] Equipment Cleaning
In-Reply-To: <522F3B5D.9030201@stanford.edu>
References: <D3862732F46DEB4B93B4A7A80614D28809A2AD54@mbx2.draper.com>
 <522F3B5D.9030201@stanford.edu>
Message-ID: <014801ceaea0$1eb9da60$5c2d8f20$@iisc.ernet.in>

Hi

We have come across a Dry Ice cleaning service company (
http://www.coldjet.com/en/index.php ) recently. We have not tried it yet. I
am not sure if this method can be used for semiconductor tool parts.

Our Oxford PECVD tool vendor did recommend Dry Ice clean as one of the
chamber clean methods, though. 

I will post the results once we give it a try.

Best wishes

Raghavan

 

*************************************************

Dr.Vijayaraghavan

Technology Manager

National Nanofabrication Centre 

Centre for Nano Science and Engineering

Indian institute of Science ( IISc)

Bangalore - 560 012

India

Ph: 09663304316

***************************************************

 

 

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of John Shott
Sent: 10 September 2013 21:02
To: labnetwork at mtl.mit.edu; Morrison, Richard H., Jr.
Subject: Re: [labnetwork] Equipment Cleaning

 

Rick:

We are currently using two different companies ... one of them near you ...
for that service.  They are:

MK Recovery Group
100 Willow St.
North Andover, MA 01845
Phone: 1-978-688-0606
Fax: 1-978-975-8464

Pentagon Technologies 
21031 Alexander Ct, Hayward, CA 94545 

Phone:(510) 783-5050

MK Recovery Group in Andover, MA is our choice when we have metals that have
significant reclaim value (that is, gold, platinum, and friends).  While I
forget the exact algorithm, basically after reclaiming a certain amount of
the precious metal for their efforts, we are credited with the remaining
value of the metal.

When the metals on the parts are less valuable, we use Pentagon Technologies
here in California.

I hope this helps,

John



On 9/10/2013 3:31 AM, Morrison, Richard H., Jr. wrote: 

Hi everyone,

 

I am in need of a cleaning service for sputtering system and evaporation
system parts. I have a bead blast machine, but I would like to try to farm
this service out, have any of you used outside cleaning vendors for this?

 

Thanks in advance.

 

Rick

 


-- 
This message has been scanned for viruses and 
dangerous content by  <http://www.mailscanner.info/> MailScanner, and is 
believed to be clean. 


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This message has been scanned for viruses and
dangerous content by MailScanner, and is
believed to be clean.

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From julia.aebersold at louisville.edu  Wed Sep 11 10:26:52 2013
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Wed, 11 Sep 2013 14:26:52 +0000
Subject: [labnetwork] MOCVD systems
In-Reply-To: <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>,
 <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
Message-ID: <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>

Mnay thanx Craig for the in depth information and will add this to our considerations.  The intent of this tool is for GaN growth.

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/

________________________________
From: Craig Cheney [ccheney at infinityhps.com]
Sent: Tuesday, September 10, 2013 5:03 PM
To: Aebersold,Julia W.; labnetwork at mtl.mit.edu
Cc: ccheney at infinityhps.com; bfisher at infinityhps.com
Subject: RE: [labnetwork] MOCVD systems

Julia,

   We have installed quite a few MOCVD reactors at different Universities and production facilities in different settings.  There are many nuances to installing and operating a MOCVD reactor.  With so many different details to discuss I will list the major ones in order of importance.  Without knowing what type of material you will be growing I will list  the options that would apply to all and note possible options for you.

Facilities:

Location, we have installed MOCVD reactors in non-clean room areas where the reactors had a load lock.  If the system you are looking at has a load lock you might want to consider saving your expensive cleanroom square footage for a tool that requires it.  One note here, most reactors that utilize a load lock (whether in  a clean room or not) require 5% (H2) forming gas to condition the load lock.  Another key consideration is structure, these units take up a lot of floor space and are heavy, make sure your structure is rated to handle the weight, and plan ahead on how you are going to get it from your loading dock to its final destination.
Exhaust,  the reactor will require some significant exhaust, make sure your clean room (or other if not in a cleanroom) make-up air handler is ready to make up the air that will be exhausted.  Another major concern for exhaust is, the type rating on the exhaust.  Not knowing the requirements from your EH&S department, it would be a good idea to review with them the gases you will be using on the tool as well as well as the contents of the process pump effluent, and whether or not you will be scrubbing your process exhaust.
H2 Supply, you will need a large source of Hydrogen to operate this tool, and the higher the quality the better.  If your campus has house Hydrogen or a bulk source for it, your one step in the right direction.  We had one customer (University) who tried running their reactor on a switch over panel with a four cylinder manifold on each side of the switch over, this type of setup caused them more problems and equipment repairs than if they had just invested in a bulk source of Hydrogen.
Power, most reactors such as this will require quite a bit of power, typically 250 to 400 amps of 208V 3 phase power.  One major consideration, if your reactor is purifying the Hydrogen with an older style Palladium cell, you also might want to consider a UPS system for running the heaters for the Palladium cell, on the older style ones, if they cool off too fast they can crack the Palladium inside them and render them completely useless (and they aren?t cheap to replace ~ 50k).  The newer Palladium cells are a little more robust and can withstand more abuse.  One other note, typically the process pumps on these type of reactors run 24X7 due to the fact that they quickly seize up when shut down and allowed to cool, so be prepared for that also (process pumps for reactors are not cheap either).
Process Cooling water, MOCVD reactors require quite a bit of process cooling water, if your facility has a good house PCW system then you are probably ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees C depending on manufacturer and reactor size.
Process Gas Delivery, without knowing what type of material you will be growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can?t say what type of gas you will be using, but regardless of the type of semiconductor, you will be installing some toxic gas systems to support them.  These gases will be required to be in gas cabinets with high quality purge panels,  the gas cabinets will require building exhaust also, the gas delivery lines will have to be high quality electro-polished stainless steel, some gas types will also be required to be coaxial style gas lines, the assembly method for gas lines are required to be welded throughout.  Again, I would review all required gases with your EH&S department to ensure you have the proper equipment to support them.
Life Safety, you will be required to incorporate life safety systems to monitor all spaces (gas cabinets, reactor, and people space) for the presence of flammable gas, toxic gas (dependent on material type) and Oxygen deficient atm.
Process Exhaust, if you are going to be using scrubbers (typically activated charcoal bed type), you will need a good maintenance program to stay on top of the scrubber maintenance, these units require regeneration and periodic charcoal changes.  If you will not be using process exhaust scrubbers, then you need to make sure your process exhaust effluent is compatible with the building exhaust system you will be connecting it to.  Also, depending the material type grown your process exhaust lines may be required to be heated to prevent buildup of process byproducts.

Operation:

Maintenance, as far as operation goes with these systems they do require periodic maintenance which correlates to run time as with most semiconductor processing equipment.  Without a good understanding of the material type you will be growing it would be futile to mention different maintenance routines and what is required.  I will say this much, if the required maintenance is not performed when it is supposed to be done, it can cause process deviations, equipment failures, and possible life safety issues.  Some reactor processes require acid based cleaning of components on the reactor chamber, you may need a wet bench to support this or a bench available for cleaning.
Analytical tools, depending on the film type grown, you will need to the proper analytical tools to measure the specific characteristics of the film type that you are quantifying.
Waste Stream, again, depending on the type of material grown you will develop a waste stream that will need to be managed.

Those are the major thoughts when considering a MOCVD reactor, we have helped many different customers achieve a cost effective solution with regards to installation and startup of these systems, so don?t let all the details scare you.  We would be happy discuss any questions or concerns that you might have.  Please feel free to contact us with any other questions or concerns.

Thank you,

Craig Cheney
[Description: cid:image001.jpg at 01C7E19F.47FFBAE0]


Desk:  (608)834-4200
Fax:     (608)834-4299
Cell:    (608)438-8714

This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer.

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aebersold,Julia W.
Sent: Tuesday, September 10, 2013 9:45 AM
To: <labnetwork at mtl.mit.edu>
Subject: [labnetwork] MOCVD systems

var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr', function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) { return _arrInputs[i]; } } }(); function waxGetElement(i) { return WAX.getElement(i); }
Hi there!  We are considering the installation of a Veeco E300 MOCVD system into our cleanroom.  We have not had experience with this type of tool and would like to ask the community if they have a system of this type in their cleanroom or in another room due to its size.  Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.

See everyone at UGIM 2014!

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/
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From ccheney at infinityhps.com  Wed Sep 11 10:37:36 2013
From: ccheney at infinityhps.com (Craig Cheney)
Date: Wed, 11 Sep 2013 09:37:36 -0500
Subject: [labnetwork] MOCVD systems
In-Reply-To: <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
 <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
 <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>
Message-ID: <D1EA32F8-3C4B-45D7-B9F7-93E603D2B457@infinityhps.com>

Julia,

Another option that I neglected to mention for your H2 source is an H2 generator.  Hogan has different models that would work great for you.  You would need a reliable DI water source for this, but there are many advantages with a system like this.  Let me know if you have any other questions.

Craig

Sent from my iPad

On Sep 11, 2013, at 9:26 AM, "Aebersold,Julia W." <julia.aebersold at louisville.edu> wrote:

> 
> Mnay thanx Craig for the in depth information and will add this to our considerations.  The intent of this tool is for GaN growth.
> 
> Cheers!
> 
> Julia Aebersold, Ph.D.
> 
> MNTC Cleanroom Manager
> 
> University of Louisville
> 
> 2210 South Brook Street
> 
> Shumaker Research Building, Room 233
> 
> Louisville, KY  40292
> 
>  
> 
> (502) 852-1572
> 
> http://louisville.edu/micronano/
> From: Craig Cheney [ccheney at infinityhps.com]
> Sent: Tuesday, September 10, 2013 5:03 PM
> To: Aebersold,Julia W.; labnetwork at mtl.mit.edu
> Cc: ccheney at infinityhps.com; bfisher at infinityhps.com
> Subject: RE: [labnetwork] MOCVD systems
> 
> Julia,
>  
>    We have installed quite a few MOCVD reactors at different Universities and production facilities in different settings.  There are many nuances to installing and operating a MOCVD reactor.  With so many different details to discuss I will list the major ones in order of importance.  Without knowing what type of material you will be growing I will list  the options that would apply to all and note possible options for you.
>  
> Facilities:
>  
> Location, we have installed MOCVD reactors in non-clean room areas where the reactors had a load lock.  If the system you are looking at has a load lock you might want to consider saving your expensive cleanroom square footage for a tool that requires it.  One note here, most reactors that utilize a load lock (whether in  a clean room or not) require 5% (H2) forming gas to condition the load lock.  Another key consideration is structure, these units take up a lot of floor space and are heavy, make sure your structure is rated to handle the weight, and plan ahead on how you are going to get it from your loading dock to its final destination.
> Exhaust,  the reactor will require some significant exhaust, make sure your clean room (or other if not in a cleanroom) make-up air handler is ready to make up the air that will be exhausted.  Another major concern for exhaust is, the type rating on the exhaust.  Not knowing the requirements from your EH&S department, it would be a good idea to review with them the gases you will be using on the tool as well as well as the contents of the process pump effluent, and whether or not you will be scrubbing your process exhaust.
> H2 Supply, you will need a large source of Hydrogen to operate this tool, and the higher the quality the better.  If your campus has house Hydrogen or a bulk source for it, your one step in the right direction.  We had one customer (University) who tried running their reactor on a switch over panel with a four cylinder manifold on each side of the switch over, this type of setup caused them more problems and equipment repairs than if they had just invested in a bulk source of Hydrogen. 
> Power, most reactors such as this will require quite a bit of power, typically 250 to 400 amps of 208V 3 phase power.  One major consideration, if your reactor is purifying the Hydrogen with an older style Palladium cell, you also might want to consider a UPS system for running the heaters for the Palladium cell, on the older style ones, if they cool off too fast they can crack the Palladium inside them and render them completely useless (and they aren?t cheap to replace ~ 50k).  The newer Palladium cells are a little more robust and can withstand more abuse.  One other note, typically the process pumps on these type of reactors run 24X7 due to the fact that they quickly seize up when shut down and allowed to cool, so be prepared for that also (process pumps for reactors are not cheap either).
> Process Cooling water, MOCVD reactors require quite a bit of process cooling water, if your facility has a good house PCW system then you are probably ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees C depending on manufacturer and reactor size.
> Process Gas Delivery, without knowing what type of material you will be growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can?t say what type of gas you will be using, but regardless of the type of semiconductor, you will be installing some toxic gas systems to support them.  These gases will be required to be in gas cabinets with high quality purge panels,  the gas cabinets will require building exhaust also, the gas delivery lines will have to be high quality electro-polished stainless steel, some gas types will also be required to be coaxial style gas lines, the assembly method for gas lines are required to be welded throughout.  Again, I would review all required gases with your EH&S department to ensure you have the proper equipment to support them.
> Life Safety, you will be required to incorporate life safety systems to monitor all spaces (gas cabinets, reactor, and people space) for the presence of flammable gas, toxic gas (dependent on material type) and Oxygen deficient atm.
> Process Exhaust, if you are going to be using scrubbers (typically activated charcoal bed type), you will need a good maintenance program to stay on top of the scrubber maintenance, these units require regeneration and periodic charcoal changes.  If you will not be using process exhaust scrubbers, then you need to make sure your process exhaust effluent is compatible with the building exhaust system you will be connecting it to.  Also, depending the material type grown your process exhaust lines may be required to be heated to prevent buildup of process byproducts.
>  
> Operation:
>  
> Maintenance, as far as operation goes with these systems they do require periodic maintenance which correlates to run time as with most semiconductor processing equipment.  Without a good understanding of the material type you will be growing it would be futile to mention different maintenance routines and what is required.  I will say this much, if the required maintenance is not performed when it is supposed to be done, it  can cause process deviations, equipment failures, and possible life safety issues.  Some reactor processes require acid based cleaning of components on the reactor chamber, you may need a wet bench to support this or a bench available for cleaning.
> Analytical tools, depending on the film type grown, you will need to the proper analytical tools to measure the specific characteristics of the film type that you are quantifying.
> Waste Stream, again, depending on the type of material grown you will develop a waste stream that will need to be managed.
>  
> Those are the major thoughts when considering a MOCVD reactor, we have helped many different customers achieve a cost effective solution with regards to installation and startup of these systems, so don?t let all the details scare you.  We would be happy discuss any questions or concerns that you might have.  Please feel free to contact us with any other questions or concerns.
>  
> Thank you,
>  
> Craig Cheney
> <image001.jpg>
>  
>  
> Desk:  (608)834-4200
> Fax:     (608)834-4299
> Cell:    (608)438-8714
>  
> This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer.
>  
> From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aebersold,Julia W.
> Sent: Tuesday, September 10, 2013 9:45 AM
> To: <labnetwork at mtl.mit.edu>
> Subject: [labnetwork] MOCVD systems
>  
> var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr', function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) { return _arrInputs[i]; } } }(); function waxGetElement(i) { return WAX.getElement(i); }
> Hi there!  We are considering the installation of a Veeco E300 MOCVD system into our cleanroom.  We have not had experience with this type of tool and would like to ask the community if they have a system of this type in their cleanroom or in another room due to its size.  Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.
>  
> See everyone at UGIM 2014!
>  
> Cheers!
>  
> Julia Aebersold, Ph.D.
> 
> MNTC Cleanroom Manager
> 
> University of Louisville
> 
> 2210 South Brook Street
> 
> Shumaker Research Building, Room 233
> 
> Louisville, KY  40292
> 
>  
> 
> (502) 852-1572
> 
> http://louisville.edu/micronano/
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From ccheney at infinityhps.com  Wed Sep 11 10:47:48 2013
From: ccheney at infinityhps.com (Craig Cheney)
Date: Wed, 11 Sep 2013 09:47:48 -0500
Subject: [labnetwork] MOCVD systems
In-Reply-To: <D1EA32F8-3C4B-45D7-B9F7-93E603D2B457@infinityhps.com>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
 <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
 <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>
 <D1EA32F8-3C4B-45D7-B9F7-93E603D2B457@infinityhps.com>
Message-ID: <4FD68A77-AE7F-475D-86B2-34686CA1C39A@infinityhps.com>

In a hurry, I just realized I miss spelled the name of the H2 generator, it's Hogen and is made by 
http://www.protononsite.com/.

Thanks

Craig
Sent from my iPad

On Sep 11, 2013, at 9:37 AM, Craig Cheney <ccheney at infinityhps.com> wrote:

> Julia,
> 
> Another option that I neglected to mention for your H2 source is an H2 generator.  Hogan has different models that would work great for you.  You would need a reliable DI water source for this, but there are many advantages with a system like this.  Let me know if you have any other questions.
> 
> Craig
> 
> Sent from my iPad
> 
> On Sep 11, 2013, at 9:26 AM, "Aebersold,Julia W." <julia.aebersold at louisville.edu> wrote:
> 
>> 
>> Mnay thanx Craig for the in depth information and will add this to our considerations.  The intent of this tool is for GaN growth.
>> 
>> Cheers!
>> 
>> Julia Aebersold, Ph.D.
>> 
>> MNTC Cleanroom Manager
>> 
>> University of Louisville
>> 
>> 2210 South Brook Street
>> 
>> Shumaker Research Building, Room 233
>> 
>> Louisville, KY  40292
>> 
>>  
>> 
>> (502) 852-1572
>> 
>> http://louisville.edu/micronano/
>> From: Craig Cheney [ccheney at infinityhps.com]
>> Sent: Tuesday, September 10, 2013 5:03 PM
>> To: Aebersold,Julia W.; labnetwork at mtl.mit.edu
>> Cc: ccheney at infinityhps.com; bfisher at infinityhps.com
>> Subject: RE: [labnetwork] MOCVD systems
>> 
>> Julia,
>>  
>>    We have installed quite a few MOCVD reactors at different Universities and production facilities in different settings.  There are many nuances to installing and operating a MOCVD reactor.  With so many different details to discuss I will list the major ones in order of importance.  Without knowing what type of material you will be growing I will list  the options that would apply to all and note possible options for you.
>>  
>> Facilities:
>>  
>> Location, we have installed MOCVD reactors in non-clean room areas where the reactors had a load lock.  If the system you are looking at has a load lock you might want to consider saving your expensive cleanroom square footage for a tool that requires it.  One note here, most reactors that utilize a load lock (whether in  a clean room or not) require 5% (H2) forming gas to condition the load lock.  Another key consideration is structure, these units take up a lot of floor space and are heavy, make sure your structure is rated to handle the weight, and plan ahead on how you are going to get it from your loading dock to its final destination.
>> Exhaust,  the reactor will require some significant exhaust, make sure your clean room (or other if not in a cleanroom) make-up air handler is ready to make up the air that will be exhausted.  Another major concern for exhaust is, the type rating on the exhaust.  Not knowing the requirements from your EH&S department, it would be a good idea to review with them the gases you will be using on the tool as well as well as the contents of the process pump effluent, and whether or not you will be scrubbing your process exhaust.
>> H2 Supply, you will need a large source of Hydrogen to operate this tool, and the higher the quality the better.  If your campus has house Hydrogen or a bulk source for it, your one step in the right direction.  We had one customer (University) who tried running their reactor on a switch over panel with a four cylinder manifold on each side of the switch over, this type of setup caused them more problems and equipment repairs than if they had just invested in a bulk source of Hydrogen. 
>> Power, most reactors such as this will require quite a bit of power, typically 250 to 400 amps of 208V 3 phase power.  One major consideration, if your reactor is purifying the Hydrogen with an older style Palladium cell, you also might want to consider a UPS system for running the heaters for the Palladium cell, on the older style ones, if they cool off too fast they can crack the Palladium inside them and render them completely useless (and they aren?t cheap to replace ~ 50k).  The newer Palladium cells are a little more robust and can withstand more abuse.  One other note, typically the process pumps on these type of reactors run 24X7 due to the fact that they quickly seize up when shut down and allowed to cool, so be prepared for that also (process pumps for reactors are not cheap either).
>> Process Cooling water, MOCVD reactors require quite a bit of process cooling water, if your facility has a good house PCW system then you are probably ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees C depending on manufacturer and reactor size.
>> Process Gas Delivery, without knowing what type of material you will be growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can?t say what type of gas you will be using, but regardless of the type of semiconductor, you will be installing some toxic gas systems to support them.  These gases will be required to be in gas cabinets with high quality purge panels,  the gas cabinets will require building exhaust also, the gas delivery  lines will have to be high quality electro-polished stainless steel, some gas types will also be required to be coaxial style gas lines, the assembly method for gas lines are required to be welded throughout.  Again, I would review all required gases with your EH&S department to ensure you have the proper equipment to support them.
>> Life Safety, you will be required to incorporate life safety systems to monitor all spaces (gas cabinets, reactor, and people space) for the presence of flammable gas, toxic gas (dependent on material type) and Oxygen deficient atm.
>> Process Exhaust, if you are going to be using scrubbers (typically activated charcoal bed type), you will need a good maintenance program to stay on top of the scrubber maintenance, these units require regeneration and periodic charcoal changes.  If you will not be using process exhaust scrubbers, then you need to make sure your process exhaust effluent is compatible with the building exhaust system you will be connecting it to.  Also, depending the material type grown your process exhaust lines may be required to be heated to prevent buildup of process byproducts.
>>  
>> Operation:
>>  
>> Maintenance, as far as operation goes with these systems they do require periodic maintenance which correlates to run time as with most semiconductor processing equipment.  Without a good understanding of the material type you will be growing it would be futile to mention different maintenance routines and what is required.  I will say this much, if the required maintenance is not performed when it is supposed to be done, it can cause process deviations, equipment failures, and possible life safety issues.  Some reactor processes require acid based cleaning of components on the reactor chamber, you may need a wet bench to support this or a bench available for cleaning.
>> Analytical tools, depending on the film type grown, you will need to the proper analytical tools to measure the specific characteristics of the film type that you are quantifying.
>> Waste Stream, again, depending on the type of material grown you will develop a waste stream that will need to be managed.
>>  
>> Those are the major thoughts when considering a MOCVD reactor, we have helped many different customers achieve a cost effective solution with regards to installation and startup of these systems, so don?t let all the details scare you.  We would be happy discuss any questions or concerns that you might have.  Please feel free to contact us with any other questions or concerns.
>>  
>> Thank you,
>>  
>> Craig Cheney
>> <image001.jpg>
>>  
>>  
>> Desk:  (608)834-4200
>> Fax:     (608)834-4299
>> Cell:    (608)438-8714
>>  
>> This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer.
>>  
>> From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aebersold,Julia W.
>> Sent: Tuesday, September 10, 2013 9:45 AM
>> To: <labnetwork at mtl.mit.edu>
>> Subject: [labnetwork] MOCVD systems
>>  
>> var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr', function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) { return _arrInputs[i]; } } }(); function waxGetElement(i) { return WAX.getElement(i); }
>> Hi there!  We are considering the installation of a Veeco E300 MOCVD system into our cleanroom.  We have not had experience with this type of tool and would like to ask the community if they have a system of this type in their cleanroom or in another room due to its size.  Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.
>>  
>> See everyone at UGIM 2014!
>>  
>> Cheers!
>>  
>> Julia Aebersold, Ph.D.
>> 
>> MNTC Cleanroom Manager
>> 
>> University of Louisville
>> 
>> 2210 South Brook Street
>> 
>> Shumaker Research Building, Room 233
>> 
>> Louisville, KY  40292
>> 
>>  
>> 
>> (502) 852-1572
>> 
>> http://louisville.edu/micronano/
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From tbritton at criticalsystemsinc.com  Thu Sep 12 01:08:50 2013
From: tbritton at criticalsystemsinc.com (Tom Britton)
Date: Thu, 12 Sep 2013 05:08:50 +0000
Subject: [labnetwork] MOCVD systems
In-Reply-To: <4FD68A77-AE7F-475D-86B2-34686CA1C39A@infinityhps.com>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
 <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
 <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>
 <D1EA32F8-3C4B-45D7-B9F7-93E603D2B457@infinityhps.com>
 <4FD68A77-AE7F-475D-86B2-34686CA1C39A@infinityhps.com>
Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2E0102219E@P3PWEX2MB006.ex2.secureserver.net>

I'll echo Craig on the H2 generator from Proton. We've provided several and they are great. The only downside is they get very expensive if you have a lot of H2 that is needed.

We provided a 300 sccm unit that was around $12K. They shoot up over $50K pretty quick and over $100K can be common for flows greater than 10 SLPM. You'll need a purifier downstream of it as they use compression fittings inside the unit, and transition to a VCR via a MNPT connection. All that being said, the unit is fantastic and has little maintenance required. I have a manual on it if you want to see it.

Take care,

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[logo for email signature png]



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Craig Cheney
Sent: Wednesday, September 11, 2013 10:48 AM
To: Aebersold,Julia W.
Cc: labnetwork at mtl.mit.edu; bfisher at infinityhps.com
Subject: Re: [labnetwork] MOCVD systems

In a hurry, I just realized I miss spelled the name of the H2 generator, it's Hogen and is made by
http://www.protononsite.com/.

Thanks

Craig
Sent from my iPad

On Sep 11, 2013, at 9:37 AM, Craig Cheney <ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>> wrote:
Julia,

Another option that I neglected to mention for your H2 source is an H2 generator.  Hogan has different models that would work great for you.  You would need a reliable DI water source for this, but there are many advantages with a system like this.  Let me know if you have any other questions.

Craig

Sent from my iPad

On Sep 11, 2013, at 9:26 AM, "Aebersold,Julia W." <julia.aebersold at louisville.edu<mailto:julia.aebersold at louisville.edu>> wrote:
var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr', function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) { return _arrInputs[i]; } } }(); function waxGetElement(i) { return WAX.getElement(i); }
Mnay thanx Craig for the in depth information and will add this to our considerations.  The intent of this tool is for GaN growth.

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/

________________________________
From: Craig Cheney [ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>]
Sent: Tuesday, September 10, 2013 5:03 PM
To: Aebersold,Julia W.; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Cc: ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>; bfisher at infinityhps.com<mailto:bfisher at infinityhps.com>
Subject: RE: [labnetwork] MOCVD systems
Julia,

   We have installed quite a few MOCVD reactors at different Universities and production facilities in different settings.  There are many nuances to installing and operating a MOCVD reactor.  With so many different details to discuss I will list the major ones in order of importance.  Without knowing what type of material you will be growing I will list  the options that would apply to all and note possible options for you.

Facilities:

Location, we have installed MOCVD reactors in non-clean room areas where the reactors had a load lock.  If the system you are looking at has a load lock you might want to consider saving your expensive cleanroom square footage for a tool that requires it.  One note here, most reactors that utilize a load lock (whether in  a clean room or not) require 5% (H2) forming gas to condition the load lock.  Another key consideration is structure, these units take up a lot of floor space and are heavy, make sure your structure is rated to handle the weight, and plan ahead on how you are going to get it from your loading dock to its final destination.
Exhaust,  the reactor will require some significant exhaust, make sure your clean room (or other if not in a cleanroom) make-up air handler is ready to make up the air that will be exhausted.  Another major concern for exhaust is, the type rating on the exhaust.  Not knowing the requirements from your EH&S department, it would be a good idea to review with them the gases you will be using on the tool as well as well as the contents of the process pump effluent, and whether or not you will be scrubbing your process exhaust.
H2 Supply, you will need a large source of Hydrogen to operate this tool, and the higher the quality the better.  If your campus has house Hydrogen or a bulk source for it, your one step in the right direction.  We had one customer (University) who tried running their reactor on a switch over panel with a four cylinder manifold on each side of the switch over, this type of setup caused them more problems and equipment repairs than if they had just invested in a bulk source of Hydrogen.
Power, most reactors such as this will require quite a bit of power, typically 250 to 400 amps of 208V 3 phase power.  One major consideration, if your reactor is purifying the Hydrogen with an older style Palladium cell, you also might want to consider a UPS system for running the heaters for the Palladium cell, on the older style ones, if they cool off too fast they can crack the Palladium inside them and render them completely useless (and they aren?t cheap to replace ~ 50k).  The newer Palladium cells are a little more robust and can withstand more abuse.  One other note, typically the process pumps on these type of reactors run 24X7 due to the fact that they quickly seize up when shut down and allowed to cool, so be prepared for that also (process pumps for reactors are not cheap either).
Process Cooling water, MOCVD reactors require quite a bit of process cooling water, if your facility has a good house PCW system then you are probably ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees C depending on manufacturer and reactor size.
Process Gas Delivery, without knowing what type of material you will be growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can?t say what type of gas you will be using, but regardless of the type of semiconductor, you will be installing some toxic gas systems to support them.  These gases will be required to be in gas cabinets with high quality purge panels,  the gas cabinets will require building exhaust also, the gas delivery lines will have to be high quality electro-polished stainless steel, some gas types will also be required to be coaxial style gas lines, the assembly method for gas lines are required to be welded throughout.  Again, I would review all required gases with your EH&S department to ensure you have the proper equipment to support them.
Life Safety, you will be required to incorporate life safety systems to monitor all spaces (gas cabinets, reactor, and people space) for the presence of flammable gas, toxic gas (dependent on material type) and Oxygen deficient atm.
Process Exhaust, if you are going to be using scrubbers (typically activated charcoal bed type), you will need a good maintenance program to stay on top of the scrubber maintenance, these units require regeneration and periodic charcoal changes.  If you will not be using process exhaust scrubbers, then you need to make sure your process exhaust effluent is compatible with the building exhaust system you will be connecting it to.  Also, depending the material type grown your process exhaust lines may be required to be heated to prevent buildup of process byproducts.

Operation:

Maintenance, as far as operation goes with these systems they do require periodic maintenance which correlates to run time as with most semiconductor processing equipment.  Without a good understanding of the material type you will be growing it would be futile to mention different maintenance routines and what is required.  I will say this much, if the required maintenance is not performed when it is supposed to be done, it can cause process deviations, equipment failures, and possible life safety issues.  Some reactor processes require acid based cleaning of components on the reactor chamber, you may need a wet bench to support this or a bench available for cleaning.
Analytical tools, depending on the film type grown, you will need to the proper analytical tools to measure the specific characteristics of the film type that you are quantifying.
Waste Stream, again, depending on the type of material grown you will develop a waste stream that will need to be managed.

Those are the major thoughts when considering a MOCVD reactor, we have helped many different customers achieve a cost effective solution with regards to installation and startup of these systems, so don?t let all the details scare you.  We would be happy discuss any questions or concerns that you might have.  Please feel free to contact us with any other questions or concerns.

Thank you,

Craig Cheney
<image001.jpg>


Desk:  (608)834-4200
Fax:     (608)834-4299
Cell:    (608)438-8714

This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer.

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aebersold,Julia W.
Sent: Tuesday, September 10, 2013 9:45 AM
To: <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] MOCVD systems

var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr', function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) { return _arrInputs[i]; } } }(); function waxGetElement(i) { return WAX.getElement(i); }
Hi there!  We are considering the installation of a Veeco E300 MOCVD system into our cleanroom.  We have not had experience with this type of tool and would like to ask the community if they have a system of this type in their cleanroom or in another room due to its size.  Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.

See everyone at UGIM 2014!

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/
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From dgrimard at umich.edu  Thu Sep 12 08:23:37 2013
From: dgrimard at umich.edu (Dennis Grimard)
Date: Thu, 12 Sep 2013 08:23:37 -0400
Subject: [labnetwork] MOCVD systems
In-Reply-To: <4FD68A77-AE7F-475D-86B2-34686CA1C39A@infinityhps.com>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
 <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
 <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>
 <D1EA32F8-3C4B-45D7-B9F7-93E603D2B457@infinityhps.com>
 <4FD68A77-AE7F-475D-86B2-34686CA1C39A@infinityhps.com>
Message-ID: <CAF2dRnT2J2p5J8NifBGgw2qadMLeL+mixQzM49mYJ6JpWuTvmg@mail.gmail.com>

Julia:

I am by no means an expert in MOCVD technology, but we have one here at UM
and I can share with you our experiences ... maybe they are relevant maybe
not.

In addition to Craig's comments I would add that there are many safety
implication to installing, maintaining, and operating an MOCVD.  In
particular is the precursors you will be using.  They are pyrophoric
liquids and must be treated with extreme care.  They are extremely water
reactive so you must consider the fire suppression system you will be using
and the local type of fire extinguisher you will need.  Since there is
always a possibility for fire, proper PPE such as Nomex clothing must be
considered.

Chamber maintenance is also something that must be considered since the
chamber will, typically, be reactive upon opening to atmosphere (depends on
what the chamber is being used for but the possibility is there).

Also, when the precursors burn they make, mostly, oxides of metals which
can be very toxic to inhalation so very good exhaust is needed in the
blubber area should there be a release of the precursor into the (I assume)
exhausted enclosure.  Also, since the by products of the burn are particles
(mostly) detection should be in the form of IR sensors rather than, say, a
hydrogen detector.

Lastly, many of the dopants (AH3, PH3, SiH4) are extremely dangerous in and
of themselves and require special precautions in addition to the pyrophoric
liquids.

I suggest you also google MOCVD fires ... to see just how devastating an
MOCVD fire can be.  I can't find it in my records but there was one fire
that destroyed an entire building.

Of course all these precautions depend on what material you are depositing,
but what may happen is that what you start out with is not what the tool
transforms into.  That is, the tools are very versatile and so you may
start out with GaN and end up with other films which have very different
properties and safety needs and dopant requirements.

I hope this helps ... and good luck ...


On Wed, Sep 11, 2013 at 10:47 AM, Craig Cheney <ccheney at infinityhps.com>wrote:

> In a hurry, I just realized I miss spelled the name of the H2 generator,
> it's Hogen and is made by
> http://www.protononsite.com/.
>
> Thanks
>
> Craig
> Sent from my iPad
>
> On Sep 11, 2013, at 9:37 AM, Craig Cheney <ccheney at infinityhps.com> wrote:
>
> Julia,
>
> Another option that I neglected to mention for your H2 source is an H2
> generator.  Hogan has different models that would work great for you.  You
> would need a reliable DI water source for this, but there are many
> advantages with a system like this.  Let me know if you have any other
> questions.
>
> Craig
>
> Sent from my iPad
>
> On Sep 11, 2013, at 9:26 AM, "Aebersold,Julia W." <
> julia.aebersold at louisville.edu> wrote:
>
> **var WAX = function () { var _arrInputs;
> window.addEventListener('waxSetArr', function(evt)
> {_arrInputs=evt.detail;}); return { getElement: function (i) { return
> _arrInputs[i]; } } }(); function waxGetElement(i) { return
> WAX.getElement(i); }**
> Mnay thanx Craig for the in depth information and will add this to our
> considerations.  The intent of this tool is for GaN growth.
>
>  Cheers!
>
>  Julia Aebersold, Ph.D.
>
> MNTC Cleanroom Manager
>
> University of Louisville
>
> 2210 South Brook Street
>
> Shumaker Research Building, Room 233
>
> Louisville, KY  40292
>
>
>
> (502) 852-1572
>
> http://louisville.edu/micronano/
>   ------------------------------
> *From:* Craig Cheney [ccheney at infinityhps.com]
> *Sent:* Tuesday, September 10, 2013 5:03 PM
> *To:* Aebersold,Julia W.; labnetwork at mtl.mit.edu
> *Cc:* ccheney at infinityhps.com; bfisher at infinityhps.com
> *Subject:* RE: [labnetwork] MOCVD systems
>
>   Julia,
>
>
>
>    We have installed quite a few MOCVD reactors at different Universities
> and production facilities in different settings.  There are many nuances to
> installing and operating a MOCVD reactor.  With so many different details
> to discuss I will list the major ones in order of importance.  Without
> knowing what type of material you will be growing I will list  the options
> that would apply to all and note possible options for you.
>
>
>
> *Facilities:*
>
>
>
> *Location*, we have installed MOCVD reactors in non-clean room areas
> where the reactors had a load lock.  If the system you are looking at has a
> load lock you might want to consider saving your expensive cleanroom square
> footage for a tool that requires it.  One note here, most reactors that
> utilize a load lock (whether in  a clean room or not) require 5% (H2)
> forming gas to condition the load lock.  Another key consideration is
> structure, these units take up a lot of floor space and are heavy, make
> sure your structure is rated to handle the weight, and plan ahead on how
> you are going to get it from your loading dock to its final destination.
>
> *Exhaust*,  the reactor will require some significant exhaust, make sure
> your clean room (or other if not in a cleanroom) make-up air handler is
> ready to make up the air that will be exhausted.  Another major concern for
> exhaust is, the type rating on the exhaust.  Not knowing the requirements
> from your EH&S department, it would be a good idea to review with them the
> gases you will be using on the tool as well as well as the contents of the
> process pump effluent, and whether or not you will be scrubbing your
> process exhaust.
>
> *H2 Supply*, you will need a large source of Hydrogen to operate this
> tool, and the higher the quality the better.  If your campus has house
> Hydrogen or a bulk source for it, your one step in the right direction.  We
> had one customer (University) who tried running their reactor on a switch
> over panel with a four cylinder manifold on each side of the switch over,
> this type of setup caused them more problems and equipment repairs than if
> they had just invested in a bulk source of Hydrogen.
>
> *Power*, most reactors such as this will require quite a bit of power,
> typically 250 to 400 amps of 208V 3 phase power.  One major consideration,
> if your reactor is purifying the Hydrogen with an older style Palladium
> cell, you also might want to consider a UPS system for running the heaters
> for the Palladium cell, on the older style ones, if they cool off too fast
> they can crack the Palladium inside them and render them completely useless
> (and they aren?t cheap to replace ~ 50k).  The newer Palladium cells are a
> little more robust and can withstand more abuse.  One other note, typically
> the process pumps on these type of reactors run 24X7 due to the fact that
> they quickly seize up when shut down and allowed to cool, so be prepared
> for that also (process pumps for reactors are not cheap either).
>
> *Process Cooling water*, MOCVD reactors require quite a bit of process
> cooling water, if your facility has a good house PCW system then you are
> probably ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees
> C depending on manufacturer and reactor size.
>
> *Process Gas Delivery*, without knowing what type of material you will be
> growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can?t say what type
> of gas you will be using, but regardless of the type of semiconductor, you
> will be installing some toxic gas systems to support them.  These gases
> will be required to be in gas cabinets with high quality purge panels,  the
> gas cabinets will require building exhaust also, the gas delivery lines
> will have to be high quality electro-polished stainless steel, some gas
> types will also be required to be coaxial style gas lines, the assembly
> method for gas lines are required to be welded throughout.  Again, I would
> review all required gases with your EH&S department to ensure you have the
> proper equipment to support them.
>
> *Life Safety*, you will be required to incorporate life safety systems to
> monitor all spaces (gas cabinets, reactor, and people space) for the
> presence of flammable gas, toxic gas (dependent on material type) and
> Oxygen deficient atm.
>
> *Process Exhaust*, if you are going to be using scrubbers (typically
> activated charcoal bed type), you will need a good maintenance program to
> stay on top of the scrubber maintenance, these units require regeneration
> and periodic charcoal changes.  If you will not be using process exhaust
> scrubbers, then you need to make sure your process exhaust effluent is
> compatible with the building exhaust system you will be connecting it to.
> Also, depending the material type grown your process exhaust lines may be
> required to be heated to prevent buildup of process byproducts.
>
>
>
> *Operation:*
>
>
>
> *Maintenance*, as far as operation goes with these systems they do
> require periodic maintenance which correlates to run time as with most
> semiconductor processing equipment.  Without a good understanding of the
> material type you will be growing it would be futile to mention different
> maintenance routines and what is required.  I will say this much, if the
> required maintenance is not performed when it is supposed to be done, it
> can cause process deviations, equipment failures, and possible life safety
> issues.  Some reactor processes require acid based cleaning of components
> on the reactor chamber, you may need a wet bench to support this or a bench
> available for cleaning.
>
> *Analytical tools*, depending on the film type grown, you will need to
> the proper analytical tools to measure the specific characteristics of the
> film type that you are quantifying.
>
> *Waste Stream*, again, depending on the type of material grown you will
> develop a waste stream that will need to be managed.
>
>
>
> Those are the major thoughts when considering a MOCVD reactor, we have
> helped many different customers achieve a cost effective solution with
> regards to installation and startup of these systems, so don?t let all the
> details scare you.  We would be happy discuss any questions or concerns
> that you might have.  Please feel free to contact us with any other
> questions or concerns.
>
>
>
> Thank you,
>
>
>
> *Craig Cheney*
>
> <image001.jpg>
>
>
>
>
>
> *Desk:  (608)834-4200*
>
> *Fax:     (608)834-4299*
>
> *Cell:    (608)438-8714*
>
> * *
>
> *This e-mail transmission and any attachments to it are intended solely
> for the use of the individual or entity to whom it is addressed and may
> contain confidential and privileged information. If you are not the
> intended recipient, your use, forwarding, printing, storing, disseminating,
> distribution, or copying of this communication is prohibited. If you
> received this communication in error, please notify the sender immediately
> by replying to this message and delete it from your computer.*
>
>
>
> *From:* labnetwork-bounces at mtl.mit.edu [
> mailto:labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu>] *On
> Behalf Of *Aebersold,Julia W.
> *Sent:* Tuesday, September 10, 2013 9:45 AM
> *To:* <labnetwork at mtl.mit.edu>
> *Subject:* [labnetwork] MOCVD systems
>
>
>
> var WAX = function () { var _arrInputs;
> window.addEventListener('waxSetArr', function(evt)
> {_arrInputs=evt.detail;}); return { getElement: function (i) { return
> _arrInputs[i]; } } }(); function waxGetElement(i) { return
> WAX.getElement(i); }
>
> Hi there!  We are considering the installation of a Veeco E300 MOCVD
> system into our cleanroom.  We have not had experience with this type of
> tool and would like to ask the community if they have a system of this type
> in their cleanroom or in another room due to its size.  Also, if you have
> any other concerns about operations, nuances, difficulty of operation,
> maintenance headaches, etc. I would be greatly appreciative.
>
>
>
> See everyone at UGIM 2014!
>
>
>
> Cheers!
>
>
>
> Julia Aebersold, Ph.D.
>
> MNTC Cleanroom Manager
>
> University of Louisville
>
> 2210 South Brook Street
>
> Shumaker Research Building, Room 233
>
> Louisville, KY  40292
>
>
>
> (502) 852-1572
>
> http://louisville.edu/micronano/
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>


-- 
Dennis S Grimard, Ph.D
Managing Director, Lurie Nanofabrication Facility

University of Michigan
1246D EECS Building
1301 Beal Avenue
Ann Arbor, MI 48109-2122
(734) 368-7172 (Cell)
(734) 647-1781 (Fax)
http://www.lnf.umich.edu
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From julia.aebersold at louisville.edu  Thu Sep 12 10:10:31 2013
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Thu, 12 Sep 2013 14:10:31 +0000
Subject: [labnetwork] MOCVD systems
In-Reply-To: <CAF2dRnT2J2p5J8NifBGgw2qadMLeL+mixQzM49mYJ6JpWuTvmg@mail.gmail.com>
References: <D84411B2FA8CBA42BC4868D5382CA1BBF753573E@EXMBX09.ad.louisville.edu>
 <030701ceae69$3f16a1d0$bd43e570$@infinityhps.com>
 <D84411B2FA8CBA42BC4868D5382CA1BBF753595B@EXMBX09.ad.louisville.edu>
 <D1EA32F8-3C4B-45D7-B9F7-93E603D2B457@infinityhps.com>
 <4FD68A77-AE7F-475D-86B2-34686CA1C39A@infinityhps.com>,
 <CAF2dRnT2J2p5J8NifBGgw2qadMLeL+mixQzM49mYJ6JpWuTvmg@mail.gmail.com>
Message-ID: <D84411B2FA8CBA42BC4868D5382CA1BBF7536C27@EXMBX09.ad.louisville.edu>

Thank you very much Dennis.  The items you mentions are key safety items we will need to address when putting a system like this in our cleanroom.  We won't be tackling the installation alone and most likely will have a consultant/vendor direct us on safety concerns and installation.

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/

________________________________
From: Dennis Grimard [dgrimard at umich.edu]
Sent: Thursday, September 12, 2013 8:23 AM
To: Craig Cheney
Cc: Aebersold,Julia W.; labnetwork at mtl.mit.edu; bfisher at infinityhps.com
Subject: Re: [labnetwork] MOCVD systems

Julia:

I am by no means an expert in MOCVD technology, but we have one here at UM and I can share with you our experiences ... maybe they are relevant maybe not.

In addition to Craig's comments I would add that there are many safety implication to installing, maintaining, and operating an MOCVD.  In particular is the precursors you will be using.  They are pyrophoric liquids and must be treated with extreme care.  They are extremely water reactive so you must consider the fire suppression system you will be using and the local type of fire extinguisher you will need.  Since there is always a possibility for fire, proper PPE such as Nomex clothing must be considered.

Chamber maintenance is also something that must be considered since the chamber will, typically, be reactive upon opening to atmosphere (depends on what the chamber is being used for but the possibility is there).

Also, when the precursors burn they make, mostly, oxides of metals which can be very toxic to inhalation so very good exhaust is needed in the blubber area should there be a release of the precursor into the (I assume) exhausted enclosure.  Also, since the by products of the burn are particles (mostly) detection should be in the form of IR sensors rather than, say, a hydrogen detector.

Lastly, many of the dopants (AH3, PH3, SiH4) are extremely dangerous in and of themselves and require special precautions in addition to the pyrophoric liquids.

I suggest you also google MOCVD fires ... to see just how devastating an MOCVD fire can be.  I can't find it in my records but there was one fire that destroyed an entire building.

Of course all these precautions depend on what material you are depositing, but what may happen is that what you start out with is not what the tool transforms into.  That is, the tools are very versatile and so you may start out with GaN and end up with other films which have very different properties and safety needs and dopant requirements.

I hope this helps ... and good luck ...


On Wed, Sep 11, 2013 at 10:47 AM, Craig Cheney <ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>> wrote:
In a hurry, I just realized I miss spelled the name of the H2 generator, it's Hogen and is made by
http://www.protononsite.com/.

Thanks

Craig
Sent from my iPad

On Sep 11, 2013, at 9:37 AM, Craig Cheney <ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>> wrote:

Julia,

Another option that I neglected to mention for your H2 source is an H2 generator.  Hogan has different models that would work great for you.  You would need a reliable DI water source for this, but there are many advantages with a system like this.  Let me know if you have any other questions.

Craig

Sent from my iPad

On Sep 11, 2013, at 9:26 AM, "Aebersold,Julia W." <julia.aebersold at louisville.edu<mailto:julia.aebersold at louisville.edu>> wrote:

var WAX = function () { var _arrInputs; window.addEventListener('waxSetArr', function(evt) {_arrInputs=evt.detail;}); return { getElement: function (i) { return _arrInputs[i]; } } }(); function waxGetElement(i) { return WAX.getElement(i); }
Mnay thanx Craig for the in depth information and will add this to our considerations.  The intent of this tool is for GaN growth.

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572<tel:%28502%29%20852-1572>

http://louisville.edu/micronano/

________________________________
From: Craig Cheney [ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>]
Sent: Tuesday, September 10, 2013 5:03 PM
To: Aebersold,Julia W.; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Cc: ccheney at infinityhps.com<mailto:ccheney at infinityhps.com>; bfisher at infinityhps.com<mailto:bfisher at infinityhps.com>
Subject: RE: [labnetwork] MOCVD systems

Julia,

   We have installed quite a few MOCVD reactors at different Universities and production facilities in different settings.  There are many nuances to installing and operating a MOCVD reactor.  With so many different details to discuss I will list the major ones in order of importance.  Without knowing what type of material you will be growing I will list  the options that would apply to all and note possible options for you.

Facilities:

Location, we have installed MOCVD reactors in non-clean room areas where the reactors had a load lock.  If the system you are looking at has a load lock you might want to consider saving your expensive cleanroom square footage for a tool that requires it.  One note here, most reactors that utilize a load lock (whether in  a clean room or not) require 5% (H2) forming gas to condition the load lock.  Another key consideration is structure, these units take up a lot of floor space and are heavy, make sure your structure is rated to handle the weight, and plan ahead on how you are going to get it from your loading dock to its final destination.
Exhaust,  the reactor will require some significant exhaust, make sure your clean room (or other if not in a cleanroom) make-up air handler is ready to make up the air that will be exhausted.  Another major concern for exhaust is, the type rating on the exhaust.  Not knowing the requirements from your EH&S department, it would be a good idea to review with them the gases you will be using on the tool as well as well as the contents of the process pump effluent, and whether or not you will be scrubbing your process exhaust.
H2 Supply, you will need a large source of Hydrogen to operate this tool, and the higher the quality the better.  If your campus has house Hydrogen or a bulk source for it, your one step in the right direction.  We had one customer (University) who tried running their reactor on a switch over panel with a four cylinder manifold on each side of the switch over, this type of setup caused them more problems and equipment repairs than if they had just invested in a bulk source of Hydrogen.
Power, most reactors such as this will require quite a bit of power, typically 250 to 400 amps of 208V 3 phase power.  One major consideration, if your reactor is purifying the Hydrogen with an older style Palladium cell, you also might want to consider a UPS system for running the heaters for the Palladium cell, on the older style ones, if they cool off too fast they can crack the Palladium inside them and render them completely useless (and they aren?t cheap to replace ~ 50k).  The newer Palladium cells are a little more robust and can withstand more abuse.  One other note, typically the process pumps on these type of reactors run 24X7 due to the fact that they quickly seize up when shut down and allowed to cool, so be prepared for that also (process pumps for reactors are not cheap either).
Process Cooling water, MOCVD reactors require quite a bit of process cooling water, if your facility has a good house PCW system then you are probably ok, typical flow-rates are around 60 to 100 LPM at  17-25 degrees C depending on manufacturer and reactor size.
Process Gas Delivery, without knowing what type of material you will be growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can?t say what type of gas you will be using, but regardless of the type of semiconductor, you will be installing some toxic gas systems to support them.  These gases will be required to be in gas cabinets with high quality purge panels,  the gas cabinets will require building exhaust also, the gas delivery lines will have to be high quality electro-polished stainless steel, some gas types will also be required to be coaxial style gas lines, the assembly method for gas lines are required to be welded throughout.  Again, I would review all required gases with your EH&S department to ensure you have the proper equipment to support them.
Life Safety, you will be required to incorporate life safety systems to monitor all spaces (gas cabinets, reactor, and people space) for the presence of flammable gas, toxic gas (dependent on material type) and Oxygen deficient atm.
Process Exhaust, if you are going to be using scrubbers (typically activated charcoal bed type), you will need a good maintenance program to stay on top of the scrubber maintenance, these units require regeneration and periodic charcoal changes.  If you will not be using process exhaust scrubbers, then you need to make sure your process exhaust effluent is compatible with the building exhaust system you will be connecting it to.  Also, depending the material type grown your process exhaust lines may be required to be heated to prevent buildup of process byproducts.

Operation:

Maintenance, as far as operation goes with these systems they do require periodic maintenance which correlates to run time as with most semiconductor processing equipment.  Without a good understanding of the material type you will be growing it would be futile to mention different maintenance routines and what is required.  I will say this much, if the required maintenance is not performed when it is supposed to be done, it can cause process deviations, equipment failures, and possible life safety issues.  Some reactor processes require acid based cleaning of components on the reactor chamber, you may need a wet bench to support this or a bench available for cleaning.
Analytical tools, depending on the film type grown, you will need to the proper analytical tools to measure the specific characteristics of the film type that you are quantifying.
Waste Stream, again, depending on the type of material grown you will develop a waste stream that will need to be managed.

Those are the major thoughts when considering a MOCVD reactor, we have helped many different customers achieve a cost effective solution with regards to installation and startup of these systems, so don?t let all the details scare you.  We would be happy discuss any questions or concerns that you might have.  Please feel free to contact us with any other questions or concerns.

Thank you,

Craig Cheney
<image001.jpg>


Desk:  (608)834-4200<tel:%28608%29834-4200>
Fax:     (608)834-4299<tel:%28608%29834-4299>
Cell:    (608)438-8714<tel:%28608%29438-8714>

This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer.

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aebersold,Julia W.
Sent: Tuesday, September 10, 2013 9:45 AM
To: <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] MOCVD systems

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Hi there!  We are considering the installation of a Veeco E300 MOCVD system into our cleanroom.  We have not had experience with this type of tool and would like to ask the community if they have a system of this type in their cleanroom or in another room due to its size.  Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.

See everyone at UGIM 2014!

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572<tel:%28502%29%20852-1572>

http://louisville.edu/micronano/

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork




--
Dennis S Grimard, Ph.D
Managing Director, Lurie Nanofabrication Facility

University of Michigan
1246D EECS Building
1301 Beal Avenue
Ann Arbor, MI 48109-2122
(734) 368-7172 (Cell)
(734) 647-1781 (Fax)
http://www.lnf.umich.edu
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From rmorrison at draper.com  Thu Sep 12 13:30:18 2013
From: rmorrison at draper.com (Morrison, Richard H., Jr.)
Date: Thu, 12 Sep 2013 17:30:18 +0000
Subject: [labnetwork] LPCVD SiC
Message-ID: <D3862732F46DEB4B93B4A7A80614D28809A34AF6@mbx2.draper.com>

Hi All,

I am planning a retro fit of our LPCVD stack, I want to remove LTO and replace with SiC. We have methane in the fab for our PECVD SiC process can I use that on an LPCVD process or is another feed gas better suited to SiC process?

Thanks in Advance.

Rick


Draper Laboratory
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461

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From fred at tystar.com  Fri Sep 13 18:32:15 2013
From: fred at tystar.com (Fred Thomas)
Date: Fri, 13 Sep 2013 15:32:15 -0700 (PDT)
Subject: [labnetwork] LPCVD SiC
In-Reply-To: <D3862732F46DEB4B93B4A7A80614D28809A34AF6@mbx2.draper.com>
References: <D3862732F46DEB4B93B4A7A80614D28809A34AF6@mbx2.draper.com>
Message-ID: <1379111535.81214.YahooMailNeo@web5801.biz.mail.ne1.yahoo.com>

This (free!) chapter from MEMS Materials and Processes Handbook titled "Additive Processes for Semiconductors and Dielectric Materials" lists propane, ethylene, acetylene, disilabutane, tetramethylsilane, trimethylsilane, and trimethylaluminum as carbon sources. Methylsilane is an important one that they left out. If the link doesn't work, try searching for the chapter title and the pdf will be the first page listed.

http://www.google.com/url?sa=t&rct=j&q=&esrc=s&source=web&cd=1&ved=0CDAQFjAA&url=http%3A%2F%2Fwww.springer.com%2Fcda%2Fcontent%2Fdocument%2Fcda_downloaddocument%2F9780387473161-c1.pdf%3FSGWID%3D0-0-45-1102942-p173695513&ei=mIwzUpPtPM782gXb4ICwDw&usg=AFQjCNEUvzbTp8tR2HVNu2RVHSla8B6O5A

Best regards,

Fred Thomas, Ph.D.
Research Scientist
TystarCorporation

369 Van Ness Way #702, Torrance, CA 90501
Phone 310.781.9219 ext. 334?
Fax: 310.781.9438
*fred at tystar.comhttp://www.tystar.com

Celebrating 25
Years of Business! 9/12/88 ? 9/12/13




________________________________
 From: "Morrison, Richard H., Jr." <rmorrison at draper.com>
To: "<labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu> 
Sent: Thursday, September 12, 2013 10:30 AM
Subject: [labnetwork] LPCVD SiC
 


 
Hi All,
?
I am planning a retro fit of our LPCVD stack, I want to remove LTO and replace with SiC. We have methane in the fab for our PECVD SiC process can I use that on an LPCVD process or is another feed gas better suited to SiC process?
?
Thanks in Advance.

Rick
?
?
Draper Laboratory
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563
?
www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461
?
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From codreanu at udel.edu  Tue Sep 17 16:42:12 2013
From: codreanu at udel.edu (Iulian Codreanu)
Date: Tue, 17 Sep 2013 16:42:12 -0400
Subject: [labnetwork] catastrophic release scrubbers
Message-ID: <5238BEA4.8070202@udel.edu>

Dear Colleagues,

I am writing to ask for input on the use individual catastrophic release 
scrubbers for gas cabinets.  They are being proposed to reduce the risk 
of toxic gases from the under-design toxics/pyrophorics bunker into the 
building air handlers.

If anyone is using these or has considered using them I would very much 
like to hear your thoughts on the subject.

Thanks a lot!

Iulian

-- 
iulian Codreanu, Ph.D.
Director of Operations, UD NanoFab
University of Delaware
149 Evans Hall
Newark, DE 19716
302-831-2784




From roberthamilton at berkeley.edu  Thu Sep 19 18:17:55 2013
From: roberthamilton at berkeley.edu (Bob Hamilton)
Date: Thu, 19 Sep 2013 15:17:55 -0700
Subject: [labnetwork] Update on CDA in lieu of N2 purging of drypumps
Message-ID: <523B7813.1050508@berkeley.edu>

Lab Network Colleagues,

In response to a labnetwork posting a few months ago, proposing the use 
of compressed dry air (CDA) in lieu of N2 for some drypump purging, the 
UC Berkeley NanoLab undertook a review of our dry-pumps. A total of 73 
mechanical pumps are in use in the NanoLab. Thirty six or ~ 50% of these 
are drypumps which require N2 purge.


The NanoLab nitrogen supply is derived from liquid nitrogen. The N2 
resource is a major expense for our operation. A rough calculation shows 
our N2 cost to be ~$100/yr/slpm (bulk N2 costs plus cryogenic vessel 
support). Our average dry pumps consume ~35 slpm of N2 for purging 
(note: some vendor-designed purge circuits are process-driven meaning N2 
is used at high flow rates only during process).

Our first effort was to review CDA vs. N2 with our pump manufacturers 
and with our pump rebuilders. Both gave us positive reports about the 
use of CDA in some applications. For obvious reasons the 19 pumps used 
to pump flammables or pyrophoric gases were excluded from consideration. 
This left the pumps that support etchers, load-locks and high-vacuum 
systems.

Following a review of the dewpoint of the NanoLab CDA (-75F or ~ 6.5 ppm 
H2O weight/volume) a decision was made to further exclude pumps that 
pumped the "acid gases" (more specifically Cl2, BF3, HBr, HCl, HF, 
SiCl4, etc.). While the NanoLab CDA dryer can produce air at dewpoints 
around -95F the dryer's shuttle-valve and check-valves must work 
significantly harder to achieve this value thus requiring more frequent 
maintenance and rebuilds. We have set our CDA standard at -75F.

Eighteen 18 pumps were identified and converted to CDA-purge. Our 
initial results look good. A review of our N2 flow rates shows a saving 
of about 23%; average N2 flows decreased from 2200 slpm to 1700 slpm 
saving us ~$50k per annum. So far, we have seen no negatives from this 
change. Our decision remains open to future review.

As a footnote, we've also decided to add 25 psi check valves to the 90 
psi N2 supply for the pumps that remain on N2-purge. The reason for this 
is we've found dry pumps will pump their N2 supply to sub-ambient 
pressure if the N2 supply is inadvertently interrupted. In some cases 
this can have negative repercussions.


On behalf of the NanoLab equipment staff, regards,
Bob Hamilton

-- 
Robert Hamilton
University of California at Berkeley
Marvell NanoLab
Equipment Eng. Mgr.
Room 520 Sutardja Dai Hall
Berkeley, CA 94720-1754
bob at eecs.berkeley.edu
Phone: 510-809-8600
Mobile: 510-325-7557
e-mail preferred

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From hathaway at cns.fas.harvard.edu  Fri Sep 20 15:44:35 2013
From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm)
Date: Fri, 20 Sep 2013 19:44:35 +0000
Subject: [labnetwork] Update on CDA in lieu of N2 purging of drypumps
In-Reply-To: <523B7813.1050508@berkeley.edu>
References: <523B7813.1050508@berkeley.edu>
Message-ID: <A1DD3F105DE57E4CBD0ECD582DF03E99019B78@HARVANDMBX02.fasmail.priv>

Excellent data, sir.   Thanks for reporting it back to the list.  In the aggregate, I think this is going to save us a pile of money!


Mac Hathaway
Harvard CNS
________________________________
From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Bob Hamilton [roberthamilton at berkeley.edu]
Sent: Thursday, September 19, 2013 6:17 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Update on CDA in lieu of N2 purging of drypumps

Lab Network Colleagues,

In response to a labnetwork posting a few months ago, proposing the use of compressed dry air (CDA) in lieu of N2 for some drypump purging, the UC Berkeley NanoLab undertook a review of our dry-pumps. A total of 73 mechanical pumps are in use in the NanoLab. Thirty six or ~ 50% of these are drypumps which require N2 purge.

The NanoLab nitrogen supply is derived from liquid nitrogen. The N2 resource is a major expense for our operation. A rough calculation shows our N2 cost to be ~$100/yr/slpm (bulk N2 costs plus cryogenic vessel support). Our average dry pumps consume ~35 slpm of N2 for purging (note: some vendor-designed purge circuits are process-driven meaning N2 is used at high flow rates only during process).

Our first effort was to review CDA vs. N2 with our pump manufacturers and with our pump rebuilders. Both gave us positive reports about the use of CDA in some applications. For obvious reasons the 19 pumps used to pump flammables or pyrophoric gases were excluded from consideration. This left the pumps that support etchers, load-locks and high-vacuum systems.

Following a review of the dewpoint of the NanoLab CDA (-75F or ~ 6.5 ppm H2O weight/volume) a decision was made to further exclude pumps that pumped the ?acid gases? (more specifically Cl2, BF3, HBr, HCl, HF, SiCl4, etc.). While the NanoLab CDA dryer can produce air at dewpoints around -95F the dryer?s shuttle-valve and check-valves must work significantly harder to achieve this value thus requiring more frequent maintenance and rebuilds. We have set our CDA standard at -75F.

Eighteen 18 pumps were identified and converted to CDA-purge. Our initial results look good. A review of our N2 flow rates shows a saving of about 23%; average N2 flows decreased from 2200 slpm to 1700 slpm saving us ~$50k per annum. So far, we have seen no negatives from this change. Our decision remains open to future review.

As a footnote, we?ve also decided to add 25 psi check valves to the 90 psi N2 supply for the pumps that remain on N2-purge. The reason for this is we?ve found dry pumps will pump their N2 supply to sub-ambient pressure if the N2 supply is inadvertently interrupted. In some cases this can have negative repercussions.

On behalf of the NanoLab equipment staff, regards,
Bob Hamilton


--
Robert Hamilton
University of California at Berkeley
Marvell NanoLab
Equipment Eng. Mgr.
Room 520 Sutardja Dai Hall
Berkeley, CA 94720-1754
bob at eecs.berkeley.edu<mailto:bob at eecs.berkeley.edu>
Phone: 510-809-8600
Mobile: 510-325-7557
e-mail preferred


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From rmorrison at draper.com  Mon Sep 23 07:25:45 2013
From: rmorrison at draper.com (Morrison, Richard H., Jr.)
Date: Mon, 23 Sep 2013 11:25:45 +0000
Subject: [labnetwork] Equipment question
Message-ID: <D3862732F46DEB4B93B4A7A80614D28809A48ED3@mbx2.draper.com>

Hi Everyone,

I am quoting new Oxidation and LPCVD stacks. I have quotes from Sandvic/MRL, Tempress and Thermco. The system will have a boat loader, oxidation stack has Dry/Wet (torch) oxide and anneal with forming gas. The LPCVD stack is Poly, Nitride and SiC.

Do any of you have experience with any of these vendors, looking for ease of use , maintenance and reliability.

Thanks in advance.


Thanks
Rick


Draper Laboratory
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461

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From savitha.p at ece.iisc.ernet.in  Mon Sep 23 08:21:38 2013
From: savitha.p at ece.iisc.ernet.in (Savitha P)
Date: Mon, 23 Sep 2013 17:51:38 +0530
Subject: [labnetwork] Diborane stability
Message-ID: <f7d13f01762e6be0f7fc8d8b6e4e3429.squirrel@www.ece.iisc.ernet.in>

Hi!

We have diborane (2% in Ar carrier gas) connected to our APCVD furnace as
the source for boron doping. For the past one month we have not achieved 
resistivity changes with any of our standard recipes. Our cylinder was
installed in 2011 and is kept at ~22-24 deg C.

 I have been reading some of the previous posts about the formation of
B4H10 particles which deposit out. Has anyone noticed this kind of
phenomena leading to only flushing of the carrier Argon gas. We tried
rolling of our cylinder for ~1hr (on the advice of our cylinder supplier)
but had no better results.

Thanks and regards,

Savitha

-- 
Dr.Savitha P
Technology Manager
National Nanofabrication Centre
Centre for Nano Science and Engineering (CeNSE)
Indian Institute of Science
Bangalore - 560012
Ph: +91 80 2293 3254
www.cense.iisc.ernet.in




-- 
This message has been scanned for viruses and
dangerous content by MailScanner, and is
believed to be clean.




From roberthamilton at berkeley.edu  Mon Sep 23 14:13:22 2013
From: roberthamilton at berkeley.edu (Bob Hamilton)
Date: Mon, 23 Sep 2013 11:13:22 -0700
Subject: [labnetwork] Diborane stability
In-Reply-To: <f7d13f01762e6be0f7fc8d8b6e4e3429.squirrel@www.ece.iisc.ernet.in>
References: <f7d13f01762e6be0f7fc8d8b6e4e3429.squirrel@www.ece.iisc.ernet.in>
Message-ID: <524084C2.8090501@berkeley.edu>

Savitha,

The mix of diborane and Ar will not be as stable as B2H6 in H2 and 
higher order boranes will form faster. I regret I cannot share 
experience with such a mix. Voltaix, a manufacturer of hydride gases may 
be able to offer guidance:
http://www.voltaix.com/

Having said this you may want to look at other possible issues. Mass 
flow controller have a a heated bypass sensor and this capillary bypass 
is subject to blockage if diborane is left within the mfc at the 
termination of a process. For this reason, when we used diborane we used 
an in and out isolation valve. We'd close the supply and then pump out 
the mfc so there was virtually no B2H6 in the mfc at idle.

At the UC Berkeley NanoLab we are not currently using diborane as a 
dopant having obviated it for 1% BCl3/bal He in our LPCVD processes. We 
may be using it again in our epi process. The carrier gas in that case 
will be H2.

Regards,
Bob Hamilton

On 9/23/2013 5:21 AM, Savitha P wrote:
> Hi!
>
> We have diborane (2% in Ar carrier gas) connected to our APCVD furnace as
> the source for boron doping. For the past one month we have not achieved
> resistivity changes with any of our standard recipes. Our cylinder was
> installed in 2011 and is kept at ~22-24 deg C.
>
>   I have been reading some of the previous posts about the formation of
> B4H10 particles which deposit out. Has anyone noticed this kind of
> phenomena leading to only flushing of the carrier Argon gas. We tried
> rolling of our cylinder for ~1hr (on the advice of our cylinder supplier)
> but had no better results.
>
> Thanks and regards,
>
> Savitha
>

-- 
Robert Hamilton
University of California at Berkeley
Marvell NanoLab
Equipment Eng. Mgr.
Room 520 Sutardja Dai Hall
Berkeley, CA 94720-1754
bob at eecs.berkeley.edu
Phone: 510-809-8600
Mobile: 510-325-7557
e-mail preferred




From schweig at umich.edu  Mon Sep 23 14:56:35 2013
From: schweig at umich.edu (Dennis Schweiger)
Date: Mon, 23 Sep 2013 14:56:35 -0400
Subject: [labnetwork] catastrophic release scrubbers
Message-ID: <CAKzi2_P-fyGH5vsBDGaRbRQsa9v05RNEyKMAMKUkp+WcAFb+7g@mail.gmail.com>

Iulian,

I figured everyone would want to see this response to your question as well.

We looked at the catastrophic release scenario when we designed the
expansion for our fab here at UofM, and by installing a restrictive flow
orifice in the cylinder (0.010"), minimizing the fill quantity (short
filling the cylinder to considerably less than a maximum), and maximizing
the dilution at the tip of the exhaust fans (using Strobic fans), we were
able to find a workable/acceptable solution.  It would take a "huge"
abatement system to handle what could essentially never happen.  It made
more sense to put our capital dollars into something that worked for
everything (the additional exhaust dilution), and share that capacity
across the entire fab.

Take care,

Dennis Schweiger
University of Michigan/LNF

734.647.2055 Ofc

"People can be divided into 3 groups - those that make things happen, those
that watch things happen, and those that wonder what happened."  Within
which group do you belong?


On Tue, Sep 17, 2013 at 4:42 PM, Iulian Codreanu <codreanu at udel.edu> wrote:

> Dear Colleagues,
>
> I am writing to ask for input on the use individual catastrophic release
> scrubbers for gas cabinets.  They are being proposed to reduce the risk of
> toxic gases from the under-design toxics/pyrophorics bunker into the
> building air handlers.
>
> If anyone is using these or has considered using them I would very much
> like to hear your thoughts on the subject.
>
> Thanks a lot!
>
> Iulian
>
> --
> iulian Codreanu, Ph.D.
> Director of Operations, UD NanoFab
> University of Delaware
> 149 Evans Hall
> Newark, DE 19716
> 302-831-2784
>
>
> ______________________________**_________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/**mailman/listinfo.cgi/**labnetwork<https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork>
>
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From mheiden at engr.ucr.edu  Mon Sep 23 18:49:19 2013
From: mheiden at engr.ucr.edu (Mark Heiden)
Date: Mon, 23 Sep 2013 15:49:19 -0700
Subject: [labnetwork] catastrophic release scrubbers
In-Reply-To: <CAKzi2_P-fyGH5vsBDGaRbRQsa9v05RNEyKMAMKUkp+WcAFb+7g@mail.gmail.com>
References: <CAKzi2_P-fyGH5vsBDGaRbRQsa9v05RNEyKMAMKUkp+WcAFb+7g@mail.gmail.com>
Message-ID: <003401ceb8af$235195e0$69f4c1a0$@engr.ucr.edu>

Iulian, 

I agree with Dennis from UofM. The scenario that is called a "catastrophic
release" with RFO's in place would require the cylinder to be dropped and
the valve broken off or the stem damaged. This essentially can't take place
in the confines of a gas cabinet but is much more likely to happen just
outside the cabinet where a cylinder could fall. In this case a
"catastrophic release" scrubber connected to the cabinet would do very
little good since the release is not contained within the cabinet. We wasted
a great deal of money and precious floor space on two of these units in our
first cleanroom. A word of caution; you may also find it very hard to make
any argument against a "safety" item once it has been suggested.

 

Mark Heiden 
UC Riverside 
Center for Nanoscale Science and Engineering 
NanoFab Cleanroom Manager 
(951) 827-2551 
mheiden at engr.ucr.edu 

 

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Dennis Schweiger
Sent: Monday, September 23, 2013 11:57 AM
To: Iulian Codreanu
Cc: Fab Network
Subject: Re: [labnetwork] catastrophic release scrubbers

 

Iulian,

 

I figured everyone would want to see this response to your question as well.

 

We looked at the catastrophic release scenario when we designed the
expansion for our fab here at UofM, and by installing a restrictive flow
orifice in the cylinder (0.010"), minimizing the fill quantity (short
filling the cylinder to considerably less than a maximum), and maximizing
the dilution at the tip of the exhaust fans (using Strobic fans), we were
able to find a workable/acceptable solution.  It would take a "huge"
abatement system to handle what could essentially never happen.  It made
more sense to put our capital dollars into something that worked for
everything (the additional exhaust dilution), and share that capacity across
the entire fab.

 

Take care,




Dennis Schweiger

University of Michigan/LNF

 

734.647.2055 Ofc

 

"People can be divided into 3 groups - those that make things happen, those
that watch things happen, and those that wonder what happened."  Within
which group do you belong?

 

On Tue, Sep 17, 2013 at 4:42 PM, Iulian Codreanu <codreanu at udel.edu> wrote:

Dear Colleagues,

I am writing to ask for input on the use individual catastrophic release
scrubbers for gas cabinets.  They are being proposed to reduce the risk of
toxic gases from the under-design toxics/pyrophorics bunker into the
building air handlers.

If anyone is using these or has considered using them I would very much like
to hear your thoughts on the subject.

Thanks a lot!

Iulian

-- 
iulian Codreanu, Ph.D.
Director of Operations, UD NanoFab
University of Delaware
149 Evans Hall
Newark, DE 19716
302-831-2784


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

 

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From dgrimard at umich.edu  Tue Sep 24 08:28:31 2013
From: dgrimard at umich.edu (Dennis Grimard)
Date: Tue, 24 Sep 2013 08:28:31 -0400
Subject: [labnetwork] catastrophic release scrubbers
In-Reply-To: <003401ceb8af$235195e0$69f4c1a0$@engr.ucr.edu>
References: <CAKzi2_P-fyGH5vsBDGaRbRQsa9v05RNEyKMAMKUkp+WcAFb+7g@mail.gmail.com>
 <003401ceb8af$235195e0$69f4c1a0$@engr.ucr.edu>
Message-ID: <CAF2dRnTqZ4LQcYN9bMefSeSpfMMk2dYP836iBZiwsHPi_rV-tQ@mail.gmail.com>

Lulian:

An additional point, some locations require the catastrophic abatement by
code.  You may need to restrict the amount of material you have to not be
required to use the catastrophic abatement.


On Mon, Sep 23, 2013 at 6:49 PM, Mark Heiden <mheiden at engr.ucr.edu> wrote:

> Iulian, ****
>
> I agree with Dennis from UofM. The scenario that is called a ?catastrophic
> release? with RFO?s in place would require the cylinder to be dropped and
> the valve broken off or the stem damaged. This essentially can?t take place
> in the confines of a gas cabinet but is much more likely to happen just
> outside the cabinet where a cylinder could fall. In this case a
> ?catastrophic release? scrubber connected to the cabinet would do very
> little good since the release is not contained within the cabinet. We
> wasted a great deal of money and precious floor space on two of these units
> in our first cleanroom. A word of caution; you may also find it very hard
> to make any argument against a ?safety? item once it has been suggested.**
> **
>
> ** **
>
> ****
>
> Mark Heiden
> UC Riverside
> Center for Nanoscale Science and Engineering
> NanoFab Cleanroom Manager
> (951) 827-2551
> mheiden at engr.ucr.edu ****
>
> ** **
>
> ** **
>
> *From:* labnetwork-bounces at mtl.mit.edu [mailto:
> labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Dennis Schweiger
> *Sent:* Monday, September 23, 2013 11:57 AM
> *To:* Iulian Codreanu
> *Cc:* Fab Network
> *Subject:* Re: [labnetwork] catastrophic release scrubbers****
>
> ** **
>
> Iulian,****
>
> ** **
>
> I figured everyone would want to see this response to your question as
> well.****
>
> ** **
>
> We looked at the catastrophic release scenario when we designed the
> expansion for our fab here at UofM, and by installing a restrictive flow
> orifice in the cylinder (0.010"), minimizing the fill quantity (short
> filling the cylinder to considerably less than a maximum), and maximizing
> the dilution at the tip of the exhaust fans (using Strobic fans), we were
> able to find a workable/acceptable solution.  It would take a "huge"
> abatement system to handle what could essentially never happen.  It made
> more sense to put our capital dollars into something that worked for
> everything (the additional exhaust dilution), and share that capacity
> across the entire fab.****
>
> ** **
>
> Take care,****
>
>
> ****
>
> Dennis Schweiger****
>
> University of Michigan/LNF****
>
>  ****
>
> 734.647.2055 Ofc****
>
>  ****
>
> "People can be divided into 3 groups - those that make things happen,
> those that watch things happen, and those that wonder what happened."
> Within which group do you belong?****
>
> ** **
>
> On Tue, Sep 17, 2013 at 4:42 PM, Iulian Codreanu <codreanu at udel.edu>
> wrote:****
>
> Dear Colleagues,
>
> I am writing to ask for input on the use individual catastrophic release
> scrubbers for gas cabinets.  They are being proposed to reduce the risk of
> toxic gases from the under-design toxics/pyrophorics bunker into the
> building air handlers.
>
> If anyone is using these or has considered using them I would very much
> like to hear your thoughts on the subject.
>
> Thanks a lot!
>
> Iulian
>
> --
> iulian Codreanu, Ph.D.
> Director of Operations, UD NanoFab
> University of Delaware
> 149 Evans Hall
> Newark, DE 19716
> 302-831-2784
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork****
>
> ** **
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>


-- 
Dennis S Grimard, Ph.D
Managing Director, Lurie Nanofabrication Facility

University of Michigan
1246D EECS Building
1301 Beal Avenue
Ann Arbor, MI 48109-2122
(734) 368-7172 (Cell)
(734) 647-1781 (Fax)
http://www.lnf.umich.edu
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From tbritton at criticalsystemsinc.com  Tue Sep 24 13:04:07 2013
From: tbritton at criticalsystemsinc.com (Tom Britton)
Date: Tue, 24 Sep 2013 17:04:07 +0000
Subject: [labnetwork] Diborane stability
In-Reply-To: <524084C2.8090501@berkeley.edu>
References: <f7d13f01762e6be0f7fc8d8b6e4e3429.squirrel@www.ece.iisc.ernet.in>
 <524084C2.8090501@berkeley.edu>
Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2E01034EA9@P3PWEX2MB006.ex2.secureserver.net>

Excellent information as usual Bob. We might be able to add on to this to help Savitha.

Hi Savitha,

In looking at your email, two things jump out at us as to what may be causing your issues.

The first is the temperature you're operating at. If you'll reference the attached electronics bulletin from Air Products, you'll see a chart showing the effects of temperature on the decomposition rate of B2H6. In a production environment our staff kept their gas at 4?C. As you rise above this temperature, the number of usable days of the gas decreases. Now when diborane decomposes it forms hydrogen and boron hydrides. These boron hydrides are the contamination that clogs small orifices, shows up as particulate on your end product and causes regulator creep. Chill the bottle to 4?C and insulate the line and you should see an improvement.

The second is the regulator in the gas cabinet. If you are not using a dual stage regulator, you should install one of these in place of the existing regulator. As diborane is so volatile, it has been well documented that the pressure drop in a single stage regulator creates a significant temperature change due to the Joule Thompson effect. By using a dual stage regulator you spread that pressure drop, and subsequent cooling change, over a wider area which reduces the amount of particulate contamination caused condensation at the pressure drop. See the attached paper by APTech on dual stage regulators.

If you need the chiller jackets and controllers, we just got 20 of the Accurate Gas Heater/Chillers in from a large gas cabinet purchase we just made and he have most sizes of cylinder jackets available. The Heater/Chillers are $2,200 and the jackets run $2,000 to $3,000 depending on cylinder size.

Good luck with your process! I hope this helps.

Thank you!

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[cid:image001.png at 01CEB915.5F7073A0]







-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bob Hamilton
Sent: Monday, September 23, 2013 12:13 PM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Diborane stability



Savitha,



The mix of diborane and Ar will not be as stable as B2H6 in H2 and higher order boranes will form faster. I regret I cannot share experience with such a mix. Voltaix, a manufacturer of hydride gases may be able to offer guidance:

http://www.voltaix.com/



Having said this you may want to look at other possible issues. Mass flow controller have a a heated bypass sensor and this capillary bypass is subject to blockage if diborane is left within the mfc at the termination of a process. For this reason, when we used diborane we used an in and out isolation valve. We'd close the supply and then pump out the mfc so there was virtually no B2H6 in the mfc at idle.



At the UC Berkeley NanoLab we are not currently using diborane as a dopant having obviated it for 1% BCl3/bal He in our LPCVD processes. We may be using it again in our epi process. The carrier gas in that case will be H2.



Regards,

Bob Hamilton



On 9/23/2013 5:21 AM, Savitha P wrote:

> Hi!

>

> We have diborane (2% in Ar carrier gas) connected to our APCVD furnace

> as the source for boron doping. For the past one month we have not

> achieved resistivity changes with any of our standard recipes. Our

> cylinder was installed in 2011 and is kept at ~22-24 deg C.

>

>   I have been reading some of the previous posts about the formation

> of

> B4H10 particles which deposit out. Has anyone noticed this kind of

> phenomena leading to only flushing of the carrier Argon gas. We tried

> rolling of our cylinder for ~1hr (on the advice of our cylinder

> supplier) but had no better results.

>

> Thanks and regards,

>

> Savitha

>



--

Robert Hamilton

University of California at Berkeley

Marvell NanoLab

Equipment Eng. Mgr.

Room 520 Sutardja Dai Hall

Berkeley, CA 94720-1754

bob at eecs.berkeley.edu<mailto:bob at eecs.berkeley.edu>

Phone: 510-809-8600

Mobile: 510-325-7557

e-mail preferred





_______________________________________________

labnetwork mailing list

labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>

https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From tbritton at criticalsystemsinc.com  Tue Sep 24 17:14:23 2013
From: tbritton at criticalsystemsinc.com (Tom Britton)
Date: Tue, 24 Sep 2013 21:14:23 +0000
Subject: [labnetwork] Diborane stability
In-Reply-To: <9820889A26AAC34EBEB01D62DFCEEB2E01034EA9@P3PWEX2MB006.ex2.secureserver.net>
References: <f7d13f01762e6be0f7fc8d8b6e4e3429.squirrel@www.ece.iisc.ernet.in>
 <524084C2.8090501@berkeley.edu>
 <9820889A26AAC34EBEB01D62DFCEEB2E01034EA9@P3PWEX2MB006.ex2.secureserver.net>
Message-ID: <9820889A26AAC34EBEB01D62DFCEEB2E010353F1@P3PWEX2MB006.ex2.secureserver.net>

Hello Savitha,

Something additional to check. Diborane has a shelf life, usually a year. If you installed it in 2011, it might be past its expiration date. The expiration date should be on the cylinder vendor's documentation.

Take care,

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[logo for email signature png]



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Tom Britton
Sent: Tuesday, September 24, 2013 11:04 AM
To: Bob Hamilton; labnetwork at mtl.mit.edu
Cc: treese at criticalsystemsinc.com
Subject: Re: [labnetwork] Diborane stability

Excellent information as usual Bob. We might be able to add on to this to help Savitha.

Hi Savitha,

In looking at your email, two things jump out at us as to what may be causing your issues.

The first is the temperature you're operating at. If you'll reference the attached electronics bulletin from Air Products, you'll see a chart showing the effects of temperature on the decomposition rate of B2H6. In a production environment our staff kept their gas at 4?C. As you rise above this temperature, the number of usable days of the gas decreases. Now when diborane decomposes it forms hydrogen and boron hydrides. These boron hydrides are the contamination that clogs small orifices, shows up as particulate on your end product and causes regulator creep. Chill the bottle to 4?C and insulate the line and you should see an improvement.

The second is the regulator in the gas cabinet. If you are not using a dual stage regulator, you should install one of these in place of the existing regulator. As diborane is so volatile, it has been well documented that the pressure drop in a single stage regulator creates a significant temperature change due to the Joule Thompson effect. By using a dual stage regulator you spread that pressure drop, and subsequent cooling change, over a wider area which reduces the amount of particulate contamination caused condensation at the pressure drop. See the attached paper by APTech on dual stage regulators.

If you need the chiller jackets and controllers, we just got 20 of the Accurate Gas Heater/Chillers in from a large gas cabinet purchase we just made and he have most sizes of cylinder jackets available. The Heater/Chillers are $2,200 and the jackets run $2,000 to $3,000 depending on cylinder size.

Good luck with your process! I hope this helps.

Thank you!

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[cid:image001.png at 01CEB938.C0E7FFE0]







-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bob Hamilton
Sent: Monday, September 23, 2013 12:13 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Diborane stability



Savitha,



The mix of diborane and Ar will not be as stable as B2H6 in H2 and higher order boranes will form faster. I regret I cannot share experience with such a mix. Voltaix, a manufacturer of hydride gases may be able to offer guidance:

http://www.voltaix.com/



Having said this you may want to look at other possible issues. Mass flow controller have a a heated bypass sensor and this capillary bypass is subject to blockage if diborane is left within the mfc at the termination of a process. For this reason, when we used diborane we used an in and out isolation valve. We'd close the supply and then pump out the mfc so there was virtually no B2H6 in the mfc at idle.



At the UC Berkeley NanoLab we are not currently using diborane as a dopant having obviated it for 1% BCl3/bal He in our LPCVD processes. We may be using it again in our epi process. The carrier gas in that case will be H2.



Regards,

Bob Hamilton



On 9/23/2013 5:21 AM, Savitha P wrote:

> Hi!

>

> We have diborane (2% in Ar carrier gas) connected to our APCVD furnace

> as the source for boron doping. For the past one month we have not

> achieved resistivity changes with any of our standard recipes. Our

> cylinder was installed in 2011 and is kept at ~22-24 deg C.

>

>   I have been reading some of the previous posts about the formation

> of

> B4H10 particles which deposit out. Has anyone noticed this kind of

> phenomena leading to only flushing of the carrier Argon gas. We tried

> rolling of our cylinder for ~1hr (on the advice of our cylinder

> supplier) but had no better results.

>

> Thanks and regards,

>

> Savitha

>



--

Robert Hamilton

University of California at Berkeley

Marvell NanoLab

Equipment Eng. Mgr.

Room 520 Sutardja Dai Hall

Berkeley, CA 94720-1754

bob at eecs.berkeley.edu<mailto:bob at eecs.berkeley.edu>

Phone: 510-809-8600

Mobile: 510-325-7557

e-mail preferred





_______________________________________________

labnetwork mailing list

labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>

https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From bill at eecs.berkeley.edu  Wed Sep 25 11:31:34 2013
From: bill at eecs.berkeley.edu (Bill Flounders)
Date: Wed, 25 Sep 2013 08:31:34 -0700
Subject: [labnetwork] Equipment question
In-Reply-To: <D3862732F46DEB4B93B4A7A80614D28809A48ED3@mbx2.draper.com>
References: <D3862732F46DEB4B93B4A7A80614D28809A48ED3@mbx2.draper.com>
Message-ID: <524301D6.7070709@eecs.berkeley.edu>

Rich,
I try to avoid using Lab Network for explicit vendor promotion.
I will simply say I would also include Tystar in your quote requests.
Off line I am pleased to share our furnace experience.

Bill Flounders
UC Berkeley



Morrison, Richard H., Jr. wrote:
>
> Hi Everyone,
>
> I am quoting new Oxidation and LPCVD stacks. I have quotes from 
> Sandvic/MRL, Tempress and Thermco. The system will have a boat loader, 
> oxidation stack has Dry/Wet (torch) oxide and anneal with forming gas. 
> The LPCVD stack is Poly, Nitride and SiC.
>
> Do any of you have experience with any of these vendors, looking for 
> ease of use , maintenance and reliability.
>
> Thanks in advance.
>
> Thanks
>
> Rick
>
> Draper Laboratory
>
> Group Leader Microfabrication Operations
>
> 555 Technology Square
>
> Cambridge Ma, 02139-3563
>
> www.draper.com
>
> rmorrison at draper.com
>
> W 617-258-3420
>
> C 508-930-3461
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork




From mheiden at engr.ucr.edu  Wed Sep 25 22:52:28 2013
From: mheiden at engr.ucr.edu (Mark Heiden)
Date: Wed, 25 Sep 2013 19:52:28 -0700
Subject: [labnetwork] Under-Utilized Equipment
Message-ID: <000301ceba63$70312280$50936780$@engr.ucr.edu>

Has anyone or everyone had the experience of purchasing an expensive or high
maintenance tool that a professor or user group HAD to have, only to watch
it sit there with little or no usage? Maintenance bills piling up and no
revenue to offset it? We ended up with a few under-utilize excellent tools
that are available to users from other institutions in the event that they
don't exist at their home labs. 

 

Here is our list:

6 inch 4-Tube CVD Furnace 

Jeol JBX-5500 E-beam Writer

Zeiss 1540XB Focused Ion Beam

Oxford EDAX

Oxford EBSD

Zeiss STEM

 

All of these systems are used by our normal user base but not nearly enough.
If you have systems that are highly available please post so that we may
send users to your site. Hopefully this can increase usage for everyone's
Must-have little used tools!

 

 

Mark Heiden 
UC Riverside 
Center for Nanoscale Science and Engineering 
NanoFab Cleanroom Manager 
(951) 827-2551 
mheiden at engr.ucr.edu 

 

 

 

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From ccheney at infinityhps.com  Thu Sep 26 11:20:43 2013
From: ccheney at infinityhps.com (Craig Cheney)
Date: Thu, 26 Sep 2013 10:20:43 -0500
Subject: [labnetwork] Under-Utilized Equipment
In-Reply-To: <000301ceba63$70312280$50936780$@engr.ucr.edu>
References: <000301ceba63$70312280$50936780$@engr.ucr.edu>
Message-ID: <002401cebacc$03a78cd0$0af6a670$@infinityhps.com>

Mark,

 

   We have a customer that is looking for a RIE etch tool with a load lock,
do you or anyone else know of one?

 

Thanks,

 

Craig Cheney

Description: cid:image001.jpg at 01C7E19F.47FFBAE0

 

 

Desk:  (608)834-4200

Fax:     (608)834-4299

Cell:    (608)438-8714

 

This e-mail transmission and any attachments to it are intended solely for
the use of the individual or entity to whom it is addressed and may contain
confidential and privileged information. If you are not the intended
recipient, your use, forwarding, printing, storing, disseminating,
distribution, or copying of this communication is prohibited. If you
received this communication in error, please notify the sender immediately
by replying to this message and delete it from your computer.

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Mark Heiden
Sent: Wednesday, September 25, 2013 9:52 PM
To: 'Fab Network'
Subject: [labnetwork] Under-Utilized Equipment

 

Has anyone or everyone had the experience of purchasing an expensive or high
maintenance tool that a professor or user group HAD to have, only to watch
it sit there with little or no usage? Maintenance bills piling up and no
revenue to offset it? We ended up with a few under-utilize excellent tools
that are available to users from other institutions in the event that they
don't exist at their home labs. 

 

Here is our list:

6 inch 4-Tube CVD Furnace 

Jeol JBX-5500 E-beam Writer

Zeiss 1540XB Focused Ion Beam

Oxford EDAX

Oxford EBSD

Zeiss STEM

 

All of these systems are used by our normal user base but not nearly enough.
If you have systems that are highly available please post so that we may
send users to your site. Hopefully this can increase usage for everyone's
Must-have little used tools!

 

 

Mark Heiden 
UC Riverside 
Center for Nanoscale Science and Engineering 
NanoFab Cleanroom Manager 
(951) 827-2551 
mheiden at engr.ucr.edu 

 

 

 

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From evporte at uark.edu  Thu Sep 26 14:05:49 2013
From: evporte at uark.edu (Errol V. Porter)
Date: Thu, 26 Sep 2013 18:05:49 +0000
Subject: [labnetwork] UARK Under-utilized equipment list
Message-ID: <49510757561B8E4EB8076830B69BF2775764F8D8@ex-mbx1b.uark.edu>

Greetings,

As per Mark Heiden's request, I am posting the one tool that fits the criteria described;

JEOL JBX 5500FS E-beam writer

A.      Piece, 50mm, & 100mm cassette's available. (Last service 08/2013)

B.      PMMA primary resist used and characterized.

a.       Primary mode - 4: 50kV, Aperture 2 {1 nA current}

C.      Utilizing Microsoft PC driven software for calibration, design and exposure.

a.       Readily interchangeable to UNIX version for users experienced with that GUI

D.      LINKCAD 7.0 DXF to GDSII  software conversion available on adjacent computer

E.       Recommended third party Beam exposure software not purchased

F.       In-house exposure, Cr/Au metallization and PG Remover lift off service available for samples in wafer form.

a.       Detailed in-situ traveler used during service available upon request.

Regards,

Errol Porter
University of Arkansas / HiDEC
700 W. Research Center Blvd
Fayetteville, AR 72701
Tel. (479) 575-2519
Mobile: (479) 236-0693
Fax (479) 575-2719
email: evporte at uark.edu<mailto:evporte at uark.edu>
http://www.hidec.uark.edu<http://www.hidec.uark.edu/>

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From bill at eecs.berkeley.edu  Fri Sep 27 17:19:16 2013
From: bill at eecs.berkeley.edu (Bill Flounders)
Date: Fri, 27 Sep 2013 14:19:16 -0700
Subject: [labnetwork] Position Available at UC Berkeley NanoLab
Message-ID: <5245F654.6010607@eecs.berkeley.edu>

Colleagues,
The Berkeley Nanoab has an opening for an R&D3 engineer.
The position emphasizes equipment and facilities support not process.
For a detailed job description, go to:
http://jobs.berkeley.edu/job-listings.html
Select external applicant and search for Job #16689

Sincerely,
Bill Flounders
UC Berkeley NanoLab











From christophe.clement at polymtl.ca  Fri Sep 27 17:28:13 2013
From: christophe.clement at polymtl.ca (=?iso-8859-1?Q?Christophe_Cl=E9ment?=)
Date: Fri, 27 Sep 2013 17:28:13 -0400 (EDT)
Subject: [labnetwork] Refurbished RIE
Message-ID: <695ab3d9.000003ac.00000118@lmf-technos2>

Hello labnetwork group,



We are presently looking for a refurbished RIE to buy. This RIE should
have a load lock as we want to use toxic gases such as Cl2 or HBr. It
should also accommodate sample size up to 6 inch.

Does anyone know where could we find a company in US or CA who can supply
such refurbished equipment?



Thank you for your answers!



Regards,



Christophe Cl?ment

Technicien laboratoire

Laboratoire de microfabrication (LMF)

Groupe des Couches Minces (GCM) www.gcmlab.ca

Ecole Polytechnique de Montr?al  <http://www.polymtl.ca/> www.polymtl.ca

D?partement de g?nie physique



* 2900 Boulevard Edouard Monpetit

Pavillon JAB
Campus de l'Universit? de Montr?al
Montr?al (Qu?bec) H3T 1J4


8  <mailto:christophe.clement at polymtl.ca> christophe.clement at polymtl.ca

( 514 340 4711 # 2417







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