From savitha.p at ece.iisc.ernet.in Fri Aug 1 01:26:23 2014 From: savitha.p at ece.iisc.ernet.in (Savitha P) Date: Fri, 1 Aug 2014 10:56:23 +0530 Subject: [labnetwork] Testing toxic gas sensors Message-ID: <9713b3b74d2006279a0f5fd9fe9d7fcf.squirrel@www.ece.iisc.ernet.in> Dear Colleagues: We have sensors for toxic gases like diborane, germane and phosphine in our gas cabinets and deposition systems. We were wondering how to test whether these are still working. Is there any proxy gases available which can used. Thanks and regards, Savitha -- Dr.Savitha P Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering (CeNSE) Indian Institute of Science Bangalore - 560012 Ph: +91 80 2293 3254 www.cense.iisc.ernet.in -- Dr.Savitha P Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering (CeNSE) Indian Institute of Science Bangalore - 560012 Ph: +91 80 2293 3254 www.cense.iisc.ernet.in -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. From Jacob.Trevino at asrc.cuny.edu Fri Aug 1 07:43:10 2014 From: Jacob.Trevino at asrc.cuny.edu (Jacob Trevino) Date: Fri, 1 Aug 2014 11:43:10 +0000 Subject: [labnetwork] Room Pressurization During a Fire Alarm Message-ID: Hello All, We are so very close to having our contractor hand over our new building and cleanroom, however an issue has come up over cleanroom pressurization during fire alarms. Currently in a fire alarm event, the building management system ramps the cleanroom supply air down, while maintaining hood exhaust rates, thus bringing the room into negative pressure. We have been told that this was done to comply with NYC Department of Building code, which requires rooms to be negative relative to ?corridor pressurization (in the event of a fire). The cleanroom team argues the negative pressure has two very negative implications. The first and most important is that with hoods still pulling air at normal rates, doors leading out of the cleanroom may become suctioned shut and difficult to open in the event of fire. Secondly, negative pressures are obviously bad for the cleanliness of the cleanroom. We would like to throttle the system down to maintain a very light positive pressure in the event of a fire alarm, however we are still meeting a good deal of resistance from building designers who have never worked with a cleanroom before. I am very curious to learn what your pressurization scheme might be in the event of a fire alarm. Do you have any references you have found valuable (people, organizations, documents)? Any input would be greatly appreciated. Best, Jacob ----------------------------- Jacob Trevino, PhD NanoFabrication Facility Director The City University of New York (CUNY) Advanced Science Research Center (ASRC) Tel. (646) 664-8914 Fax. (646) 664-2965 Email: Jacob.Trevino at asrc.cuny.edu Web: http://asrc.cuny.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From hft at ncsu.edu Fri Aug 1 08:12:57 2014 From: hft at ncsu.edu (Henry Taylor) Date: Fri, 1 Aug 2014 08:12:57 -0400 Subject: [labnetwork] question about spin rinse dryer In-Reply-To: References: Message-ID: Xiaojin, I had to get parts for my SRD. There are two companies that have parts. Sitek Process Solutions 233 Technology Solutions Rocklin, CA 95765 916-797-9000 OEMgroup East Inc 416 S 4th Street Coopersburg, PA 18031 610-282-0105 x246 Gail Adams Hope this helps, Henry Taylor On Thu, Jul 31, 2014 at 3:20 PM, Wang,Xiaojin wrote: > Dear colleagues: > > > > We have a spin rinse dryer from semitool that has been down lately. After > I discussed with technical support several times, the problem boil down to > the motor controller whose part number is 60710-27. The picture is > attached. Does anyone know where to repair this part besides OEM? Or does > anyone have an old working one that we can purchase? Thank you. > > > > Xiaojin Wang > > Senior micro/nano process engineer > > Micro/nano technology center > > University of Louisville > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Fri Aug 1 08:36:36 2014 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Fri, 01 Aug 2014 12:36:36 +0000 Subject: [labnetwork] Testing toxic gas sensors In-Reply-To: <9713b3b74d2006279a0f5fd9fe9d7fcf.squirrel@www.ece.iisc.ernet.in> References: <9713b3b74d2006279a0f5fd9fe9d7fcf.squirrel@www.ece.iisc.ernet.in> Message-ID: HI, You need to get standard gas samples that you can introduce to the sensor input and verify that the sensor trips. At Draper we hire a company that comes in and calibrates the system every 3 months. I believe that every 3 months is a good calibration cycle to ensure that critical systems are working. Rick Draper Laboratory Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Savitha P Sent: Friday, August 01, 2014 1:26 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Testing toxic gas sensors Dear Colleagues: We have sensors for toxic gases like diborane, germane and phosphine in our gas cabinets and deposition systems. We were wondering how to test whether these are still working. Is there any proxy gases available which can used. Thanks and regards, Savitha -- Dr.Savitha P Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering (CeNSE) Indian Institute of Science Bangalore - 560012 Ph: +91 80 2293 3254 www.cense.iisc.ernet.in -- Dr.Savitha P Technology Manager National Nanofabrication Centre Centre for Nano Science and Engineering (CeNSE) Indian Institute of Science Bangalore - 560012 Ph: +91 80 2293 3254 www.cense.iisc.ernet.in -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From schweig at umich.edu Fri Aug 1 08:57:54 2014 From: schweig at umich.edu (Dennis Schweiger) Date: Fri, 1 Aug 2014 08:57:54 -0400 Subject: [labnetwork] Room Pressurization During a Fire Alarm Message-ID: Jacob, can your system differentiate in the location of the fire alarm, and the nature (smoke alarm versus sprinkler release versus pull station)? Not all FIRE inputs require the same response, and not all are true (disgruntled student pulling a fire alarm during exams, for example). If it's in the cleanroom, suffocating the fire is a good thing, if it's outside of the cleanroom, leaving the room pressurized makes the most sense. Now, that's not a silver bullet fix, because there are dozens of scenarios to work through, and ramifications for each selection. Here at UofM, we went round and round, and settled on the above criteria. Dennis Schweiger Faclities Manager University of Michigan/LNF 734.647.2055 Ofc On Fri, Aug 1, 2014 at 7:43 AM, Jacob Trevino wrote: > Hello All, > > We are so very close to having our contractor hand over our new building > and cleanroom, however an issue has come up over cleanroom pressurization > during fire alarms. Currently in a fire alarm event, the building > management system ramps the cleanroom supply air down, while maintaining > hood exhaust rates, thus bringing the room into negative pressure. We have > been told that this was done to comply with NYC Department of Building > code, which requires rooms to be negative relative to ?corridor > pressurization (in the event of a fire). > > The cleanroom team argues the negative pressure has two very negative > implications. The first and most important is that with hoods still pulling > air at normal rates, doors leading out of the cleanroom may become > suctioned shut and difficult to open in the event of fire. Secondly, > negative pressures are obviously bad for the cleanliness of the cleanroom. > > We would like to throttle the system down to maintain a very light > positive pressure in the event of a fire alarm, however we are still > meeting a good deal of resistance from building designers who have never > worked with a cleanroom before. > > I am very curious to learn what your pressurization scheme might be in > the event of a fire alarm. Do you have any references you have found > valuable (people, organizations, documents)? Any input would be greatly > appreciated. > > Best, > Jacob > > ----------------------------- > > *Jacob Trevino, PhD* > NanoFabrication Facility Director > The City University of New York (CUNY) > Advanced Science Research Center (ASRC) > Tel. (646) 664-8914 > > Fax. (646) 664-2965 > > Email: Jacob.Trevino at asrc.cuny.edu > > Web: http://asrc.cuny.edu/ > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jerry.bowser at nist.gov Fri Aug 1 08:59:22 2014 From: jerry.bowser at nist.gov (Bowser, Jerry) Date: Fri, 1 Aug 2014 12:59:22 +0000 Subject: [labnetwork] question about spin rinse dryer In-Reply-To: References: Message-ID: Hello Xiaojin, Here at NIST we have used Sitek Solutions and Modular Process for SemiTool parts. Here is the contact info: Sitek Karen Henry 916-797-9000 x 17 khenry at sitekprocess.com Micro Process Charles Brown cbrown at microprocesstech.com Hope this helps Best, Jerry Bowser NIST CNST NanoFab From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Wang,Xiaojin Sent: Thursday, July 31, 2014 3:20 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] question about spin rinse dryer Dear colleagues: We have a spin rinse dryer from semitool that has been down lately. After I discussed with technical support several times, the problem boil down to the motor controller whose part number is 60710-27. The picture is attached. Does anyone know where to repair this part besides OEM? Or does anyone have an old working one that we can purchase? Thank you. Xiaojin Wang Senior micro/nano process engineer Micro/nano technology center University of Louisville -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Fri Aug 1 10:55:54 2014 From: codreanu at udel.edu (Iulian Codreanu) Date: Fri, 01 Aug 2014 10:55:54 -0400 Subject: [labnetwork] Room Pressurization During a Fire Alarm In-Reply-To: References: Message-ID: <53DBAA7A.4020003@udel.edu> Hi Jacob. I assume the sequence mentioned applies to smoke detected in the cleanroom space and not to every "building-level" fire alarm. In that particular situation my cleanroom would go negative (-0.05" WC) but the initiation of what we call the "smoke purge sequence" is a manual process - folks have to think things through before pushing the "cleanroom purge" button. Hope this helps. Iulian iulian Codreanu, Ph.D. Director of Operations, UD NanoFab University of Delaware 163 ISE Lab 221 Academy Street Newark, DE 19716 302-831-2784 On 8/1/2014 7:43 AM, Jacob Trevino wrote: > Hello All, > > We are so very close to having our contractor hand over our new > building and cleanroom, however an issue has come up over > cleanroom pressurization during fire alarms. Currently in a fire alarm > event, the building management system ramps the cleanroom supply air > down, while maintaining hood exhaust rates, thus bringing the room > into negative pressure. We have been told that this was done to comply > with NYC Department of Building code, which requires rooms to be > negative relative to?corridor pressurization (in the event of a fire). > > The cleanroom team argues the negative pressure has two very negative > implications. The first and most important is that with hoods still > pulling air at normal rates, doors leading out of the cleanroom may > become suctioned shut and difficult to open in the event of fire. > Secondly, negative pressures are obviously bad for the cleanliness of > the cleanroom. > > We would like to throttle the system down to maintain a very light > positive pressure in the event of a fire alarm, however we are still > meeting a good deal of resistance from building designers who have > never worked with a cleanroom before. > > I am very curious to learn what your pressurization scheme might be in > the event of a fire alarm. Do you have any references you have found > valuable (people, organizations, documents)? Any input would be > greatly appreciated. > > Best, > Jacob > > ----------------------------- > > */Jacob Trevino, PhD/* > NanoFabrication Facility Director > The City University of New York (CUNY) > Advanced Science Research Center (ASRC) > Tel. (646) 664-8914 > > Fax. (646) 664-2965 > > Email: Jacob.Trevino at asrc.cuny.edu > > Web: http://asrc.cuny.edu/ > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From dev.c0debabe at gmail.com Wed Aug 6 15:24:03 2014 From: dev.c0debabe at gmail.com (Stefan Schoenleitner) Date: Wed, 06 Aug 2014 21:24:03 +0200 Subject: [labnetwork] Filtering Setup and Documentation Request for Technics Planar Etch II Plasma Etcher Message-ID: <53E280D3.2030902@gmail.com> Hello, we recently acquired an old Plasma Etcher with a 750W 13.56 MHz RF plasma generator (Technics Planar Etch II, similar to the unit here: http://www.cleanroom.byu.edu/pe2.phtml). We are planning to use the unit with CF4 and O2 gas as well as N2 as vent gas. Our main application would be IC (integrated circuit) processing such as delayering or pre-processing for SEM analysis. In order to get the system up and running, it would be helpful to receive operating and technical manuals for the system. While we already have the unit's setup and operating manual, we are wondering if anyone has the following and could send it to us: * Schematic, model 750 plasma generator, d-3100-041 * schematic, planaretch II system, c-3100-038 * drawing, reference assembly, d-3100-049 * drawing, p.c. board assembly, c-3100-048 In addition, we would like to know more about usable and practically safe vacuum and exhaust setups. We currently have an Alcatel 2012A rotary vane vacuum pump that is not chemically resistant. In order to filter out corrosive and/or poisonous gases such as CO, we would like to use an inlet trap as well as an oil mist and exhaust filter. After that, the exhaust should be vented to the outside of the building without further processing. For the traps/filters, activated aluminia as well as activated charcoal filter media are available. Examples: http://www.pchemlabs.com/subcatagoryb.asp?pid=Replaceable-Element-Traps,-Plastic Which filter media do you suggest for our application ? Activated aluminia seems to work well with fluorides and appears to be widely used for plasma etching systems. However, at the same time, both filter media do not seem to work well for filtering CO exhaust gas. Another questions concerns storage of the inline trap. If we don't use the devices that need vacuum pumps, we typically turn them off. However, for the inlet traps this would mean that water and possibly a bit of dust could get into the inlet trap and, as a result, the filter media (i.e. activated aluminia) would get slightly moist. Is that a problem ? Should we store the inlet trap in vacuum, for instance by adding vacuum valves before and after the trap so that we can store it under vacuum (at least as long as the valves can hold the vacuum) ? Thank you and best Regards, Stefan From spaolini at cns.fas.harvard.edu Wed Aug 6 18:56:13 2014 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Wed, 6 Aug 2014 22:56:13 +0000 Subject: [labnetwork] Filtering Setup and Documentation Request for Technics Planar Etch II Plasma Etcher In-Reply-To: <53E280D3.2030902@gmail.com> References: <53E280D3.2030902@gmail.com> Message-ID: Stefan, Where is CO being generated? CF4 and O2 are widely used and are not necessary to abate in most localities (check yours) In most applications, general exhaust will suffice for the pump effluent. If you are processing something that will form or release CO, no type of filter that I know of will trap it, it must be mitigated downstream of the pump in compliance to your lab safety folks and local codes. What concerns me is that you MAY have a pump that uses hydrocarbon oil and that is a potential time bomb(literally) for any system running O2, you just can't and shouldn't do it. You can send the pump to a reputable rebuilder and they can clean it and prep it for inert oil such as Krytox or Fomblin which can be used with O2 service. Most dry pumps will suffice as well. I don't know where you can get manuals for that system but I can tell you that they are very simple and I have repaired dozens of them. If there is a particular question on this unit, I would be happy to help you with it. Steve Paolini Equipment Dood Harvard University Center for Nanoscale Systems spaolini at cns.fas.harvard.edu -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Stefan Schoenleitner Sent: Wednesday, August 06, 2014 3:24 PM To: Labnetwork Mailing List Subject: [labnetwork] Filtering Setup and Documentation Request for Technics Planar Etch II Plasma Etcher Hello, we recently acquired an old Plasma Etcher with a 750W 13.56 MHz RF plasma generator (Technics Planar Etch II, similar to the unit here: http://www.cleanroom.byu.edu/pe2.phtml). We are planning to use the unit with CF4 and O2 gas as well as N2 as vent gas. Our main application would be IC (integrated circuit) processing such as delayering or pre-processing for SEM analysis. In order to get the system up and running, it would be helpful to receive operating and technical manuals for the system. While we already have the unit's setup and operating manual, we are wondering if anyone has the following and could send it to us: * Schematic, model 750 plasma generator, d-3100-041 * schematic, planaretch II system, c-3100-038 * drawing, reference assembly, d-3100-049 * drawing, p.c. board assembly, c-3100-048 In addition, we would like to know more about usable and practically safe vacuum and exhaust setups. We currently have an Alcatel 2012A rotary vane vacuum pump that is not chemically resistant. In order to filter out corrosive and/or poisonous gases such as CO, we would like to use an inlet trap as well as an oil mist and exhaust filter. After that, the exhaust should be vented to the outside of the building without further processing. For the traps/filters, activated aluminia as well as activated charcoal filter media are available. Examples: http://www.pchemlabs.com/subcatagoryb.asp?pid=Replaceable-Element-Traps,-Plastic Which filter media do you suggest for our application ? Activated aluminia seems to work well with fluorides and appears to be widely used for plasma etching systems. However, at the same time, both filter media do not seem to work well for filtering CO exhaust gas. Another questions concerns storage of the inline trap. If we don't use the devices that need vacuum pumps, we typically turn them off. However, for the inlet traps this would mean that water and possibly a bit of dust could get into the inlet trap and, as a result, the filter media (i.e. activated aluminia) would get slightly moist. Is that a problem ? Should we store the inlet trap in vacuum, for instance by adding vacuum valves before and after the trap so that we can store it under vacuum (at least as long as the valves can hold the vacuum) ? Thank you and best Regards, Stefan _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dev.c0debabe at gmail.com Thu Aug 7 05:54:41 2014 From: dev.c0debabe at gmail.com (=?windows-1252?Q?Stefan_Sch=F6nleitner?=) Date: Thu, 07 Aug 2014 11:54:41 +0200 Subject: [labnetwork] Filtering Setup and Documentation Request for Technics Planar Etch II Plasma Etcher In-Reply-To: References: <53E280D3.2030902@gmail.com> Message-ID: <53E34CE1.5030300@gmail.com> Hello Steve, On 08/07/2014 12:56 AM, Paolini, Steven wrote: > Stefan, Where is CO being generated? if CF4 and O2 is used to etch silicon dioxide or polyimide, CO is generated as by-product [1]. The reason is that the C and O radicals can bind with each other. On the other side, those molecules will split up again in the plasma. As with all of those products I would believe that it is also a question of the concentration. > CF4 and O2 are widely used and > are not necessary to abate in most localities (check yours). In most > applications, general exhaust will suffice for the pump effluent. If > you are processing something that will form or release CO, no type of > filter that I know of will trap it, it must be mitigated downstream > of the pump in compliance to your lab safety folks and local codes. Thank you for this information. We already talked to a few other people operating plasma etchers at a regular basis and most of them are saying that they either directly vent the pump exhaust or they use an inline trap (to protect the pump from corrosive species). Besides, the amount of exhaust generated also depends on the gas flow rates. For my understanding, we have a very small process chamber (tabletop plasma etcher) and instead of processing full wafers, we would like to process single dies with a surface of less than 1 sq. cm. I would expect the amount of exhaust gas generated from that to be rather low. > What concerns me is that you MAY have a pump that uses hydrocarbon > oil and that is a potential time bomb(literally) for any system > running O2, you just can't and shouldn't do it. You can send the pump > to a reputable rebuilder and they can clean it and prep it for inert > oil such as Krytox or Fomblin which can be used with O2 service. I did not mention that in my last mail, but in order to comply with O2 safety standards we will use an inert pump oil (e.g. PFPE based) and follow the pump manufacturers guidelines for the oil change from hydrocarbon to inert pump oil (which typically involves a pump service). > Most > dry pumps will suffice as well. I don't know where you can get > manuals for that system but I can tell you that they are very simple > and I have repaired dozens of them. If there is a particular question > on this unit, I would be happy to help you with it. Thank you ! We opened up the unit already and it appears to be pretty simple. However, before we can test it for the first time we would like to have the vacuum and exhaust setup working properly to have a practically safe working environment. This would comprise: (1) vacuum inlet trap with activated aluminia filter medium (2) inert PFPE based pump oil (3) oil mist filter at exhaust (4) activated carbon filter after oil mist filter at exhaust (5) exhaust gas analyzer after last filter (6) exhaust outlet Components (4) and (5) are maybe already a bit of an overkill considering the small size of the unit. > > Steve Paolini Equipment Dood Harvard University Center for Nanoscale > Systems spaolini at cns.fas.harvard.edu Thank you and best regards, Stefan Sources: [1] http://www.triontech.com/pdfs/Plasma%20Delayering%20of%20Integrated%20Circuits%20V4%20080%E2%80%A6.pdf From matthieu.nannini at mcgill.ca Tue Aug 12 15:21:14 2014 From: matthieu.nannini at mcgill.ca (Matthieu Nannini) Date: Tue, 12 Aug 2014 15:21:14 -0400 Subject: [labnetwork] Alcatel/Tegal DRIE support Message-ID: <53EA692A.9020106@mcgill.ca> Dear colleagues, For those of you who own an Alcatel/Tegal DRIE, where do you get support from ? Our service guy (former Alcatel Eng. in France) is hard to get a hand on. Thanks Matthieu From IRHarvey at eng.utah.edu Tue Aug 12 17:13:45 2014 From: IRHarvey at eng.utah.edu (Ian Harvey) Date: Tue, 12 Aug 2014 15:13:45 -0600 Subject: [labnetwork] =?windows-1252?q?And_STS_too=85___Re=3A__Alcatel/Teg?= =?windows-1252?q?al_DRIE_support?= In-Reply-To: <53EA692A.9020106@mcgill.ca> References: <53EA692A.9020106@mcgill.ca> Message-ID: <3B39DE40-D92A-4CED-A4C4-3850A07E2DA7@eng.utah.edu> Dear Mathieu and colleagues We have the same question about STS... Who do you call when you run out of troubleshooting ideas on a 2000-vintage STS DRIE? Thanks, ?Ian Utah Nanofab / University of Utah Micron Technology Foundation Inc., Microscopy Suite Sorenson Molecular Biotechnology Building ? A USTAR Innovation Center On Aug 12, 2014, at 1:21 PM, Matthieu Nannini wrote: Dear colleagues, For those of you who own an Alcatel/Tegal DRIE, where do you get support from ? Our service guy (former Alcatel Eng. in France) is hard to get a hand on. Thanks Matthieu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From lej at danchip.dtu.dk Wed Aug 13 03:30:57 2014 From: lej at danchip.dtu.dk (Leif Johansen) Date: Wed, 13 Aug 2014 07:30:57 +0000 Subject: [labnetwork] =?windows-1252?q?And_STS_too=85___Re=3A__Alcatel/Teg?= =?windows-1252?q?al_DRIE_support?= In-Reply-To: <3B39DE40-D92A-4CED-A4C4-3850A07E2DA7@eng.utah.edu> References: <53EA692A.9020106@mcgill.ca> <3B39DE40-D92A-4CED-A4C4-3850A07E2DA7@eng.utah.edu> Message-ID: <879AEF5002D70747B136D02BC86A9C982DC047@ait-pex02mbx05.win.dtu.dk> Hello Ian, Two of our service engineers are former STS employees (a good solution when you have 10 STS tools - the oldest dating back to 1993). They won't mind answering a question or two, so if you have any, drop me a line. Several of the "old school" service engineers are now freelance. For a year 2000 system, I'm told that Gareth Morgan could be a good call. He has setup his own company based in the UK and is willing to travel - Best regards, Leif -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ian Harvey Sent: 12. august 2014 23:14 To: Matthieu Nannini Cc: labnetwork at mtl.mit.edu Subject: [labnetwork] And STS too? Re: Alcatel/Tegal DRIE support Dear Mathieu and colleagues We have the same question about STS... Who do you call when you run out of troubleshooting ideas on a 2000-vintage STS DRIE? Thanks, ?Ian Utah Nanofab / University of Utah Micron Technology Foundation Inc., Microscopy Suite Sorenson Molecular Biotechnology Building ? A USTAR Innovation Center On Aug 12, 2014, at 1:21 PM, Matthieu Nannini wrote: Dear colleagues, For those of you who own an Alcatel/Tegal DRIE, where do you get support from ? Our service guy (former Alcatel Eng. in France) is hard to get a hand on. Thanks Matthieu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From gwatson at Princeton.EDU Wed Aug 13 09:07:24 2014 From: gwatson at Princeton.EDU (George P. Watson) Date: Wed, 13 Aug 2014 13:07:24 +0000 Subject: [labnetwork] =?windows-1252?q?And_STS_too=85___Re=3A__Alcatel/Teg?= =?windows-1252?q?al_DRIE_support?= In-Reply-To: <3B39DE40-D92A-4CED-A4C4-3850A07E2DA7@eng.utah.edu> References: <53EA692A.9020106@mcgill.ca> <3B39DE40-D92A-4CED-A4C4-3850A07E2DA7@eng.utah.edu> Message-ID: <0565B0F370443F4CB0D9C1CDDD8533E73B9E1BAD@CSGMBX201W.pu.win.princeton.edu> Hi Ian, We use Hawks Technical Services for our STS etcher. (215) 872-0944 Pat PRISM Micro/Nano Fabrication Laboratory Princeton University -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ian Harvey Sent: Tuesday, August 12, 2014 5:14 PM To: Matthieu Nannini Cc: labnetwork at mtl.mit.edu Subject: [labnetwork] And STS too? Re: Alcatel/Tegal DRIE support Dear Mathieu and colleagues We have the same question about STS... Who do you call when you run out of troubleshooting ideas on a 2000-vintage STS DRIE? Thanks, ?Ian Utah Nanofab / University of Utah Micron Technology Foundation Inc., Microscopy Suite Sorenson Molecular Biotechnology Building ? A USTAR Innovation Center On Aug 12, 2014, at 1:21 PM, Matthieu Nannini wrote: Dear colleagues, For those of you who own an Alcatel/Tegal DRIE, where do you get support from ? Our service guy (former Alcatel Eng. in France) is hard to get a hand on. Thanks Matthieu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From voros at eecs.berkeley.edu Wed Aug 13 15:24:30 2014 From: voros at eecs.berkeley.edu (Katalin VOROS) Date: Wed, 13 Aug 2014 12:24:30 -0700 Subject: [labnetwork] Mercury -- A Laboratory Information and Management Sytem -- report available Message-ID: We compiled a detailed report on Mercury, the Berkeley computer lab management system. It is available on line at http://www.eecs.berkeley.edu/Pubs/TechRpts/2014/EECS-2014-149.html Authors: Todd Merport, Alexander Proskurowski, and Katalin Voros. Abstract: Mercury is a computer management and information system designed specifically to operate the Berkeley Marvell NanoLab and to use laboratory resources efficiently. The components of Mercury are a relational database management system (Ingres), daemons (background processes), and clients, in a dual, three tier application. This report describes the system design, database details, implementation technologies, and it gives some detailed examples. The Mercury system has been in real-time operation since December 2009 in the UC Berkeley NanoLab, with 99.9% uptime. Sincerely Katalin Voros R&D Engineering Manager Emerita Electrical Engineering and Computer Sciences University of California at Berkeley Berkeley, CA 94720-1770 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bcord at umn.edu Wed Aug 13 13:43:33 2014 From: bcord at umn.edu (bryan cord) Date: Wed, 13 Aug 2014 12:43:33 -0500 Subject: [labnetwork] Optical microscope cameras Message-ID: <53EBA3C5.5070703@umn.edu> Hi All, We're in the process of evaluating digital cameras to add to a few of our optical microscopes (nothing fancy, just Nikons with max 100X objectives). After some shopping around, we like the 5-8MP Zeiss and Leica CCD offerings, but they're a bit pricey. What I'm wondering is whether anyone has a more affordable brand of aftermarket scope camera that they really like. My main concern is software quality (since most low to midrange scope cameras seem to ship with awful software), but obviously things like signal/noise, image quality, and general usability are important too. Any recommendations would be appreciated. -bryan -- Bryan Cord Minnesota Nano Center (MNC) University of Minnesota 115 Union St SE, Rm 153 Minneapolis, MN 55455 612.626.3287 (work) 857.891.6820 (cell) bcord at umn.edu http://wiki.umn.edu/EBPG From michael.rooks at yale.edu Wed Aug 13 18:01:00 2014 From: michael.rooks at yale.edu (Michael Rooks) Date: Wed, 13 Aug 2014 18:01:00 -0400 Subject: [labnetwork] Optical microscope cameras In-Reply-To: <53EBA3C5.5070703@umn.edu> References: <53EBA3C5.5070703@umn.edu> Message-ID: <53EBE01C.9000509@yale.edu> We purchased a USB camera for an optical microscope: A Thor Labs DCC3240 , which has 1280x1024 resolution. The Windows software is good, and the lag time is very small. The price was $1225, which is high compared to web cams, but it's not junky. The camera has a USB-3 interface, but it works perfectly well on USB-2. --------------------- Michael Rooks Yale Institute for Nanoscience & Quantum Engineering nano.yale.edu On 08/13/2014 01:43 PM, bryan cord wrote: > Hi All, > > We're in the process of evaluating digital cameras to add to a few of > our optical microscopes (nothing fancy, just Nikons with max 100X > objectives). After some shopping around, we like the 5-8MP Zeiss and > Leica CCD offerings, but they're a bit pricey. What I'm wondering is > whether anyone has a more affordable brand of aftermarket scope camera > that they really like. My main concern is software quality (since > most low to midrange scope cameras seem to ship with awful software), > but obviously things like signal/noise, image quality, and general > usability are important too. > > Any recommendations would be appreciated. > > -bryan > -------------- next part -------------- An HTML attachment was scrubbed... URL: From dev.c0debabe at gmail.com Thu Aug 14 03:23:33 2014 From: dev.c0debabe at gmail.com (Stefan Schoenleitner) Date: Thu, 14 Aug 2014 09:23:33 +0200 Subject: [labnetwork] Optical microscope cameras In-Reply-To: <53EBA3C5.5070703@umn.edu> References: <53EBA3C5.5070703@umn.edu> Message-ID: <53EC63F5.10206@gmail.com> Hi, On 08/13/2014 07:43 PM, bryan cord wrote: > Hi All, > > We're in the process of evaluating digital cameras to add to a few of > our optical microscopes (nothing fancy, just Nikons with max 100X > objectives). After some shopping around, we like the 5-8MP Zeiss and > Leica CCD offerings, but they're a bit pricey. What I'm wondering is > whether anyone has a more affordable brand of aftermarket scope camera > that they really like. My main concern is software quality (since most > low to midrange scope cameras seem to ship with awful software), but > obviously things like signal/noise, image quality, and general usability > are important too. > > Any recommendations would be appreciated. we are currently using industrial FireWire cameras. They have the features of high priced microscope cameras, but they are are available at lower cost. The advantage of those cameras is that they use a standardized interface (IIDC) which is supported by a wider range of software. Here's a list of IIDC cameras with their features. You'll see that there are also some typical microscope camera models included. http://damien.douxchamps.net/ieee1394/cameras/#LIST The camera we like most so far is a Guppy F type manufactured by AVT. Regards, Stefan From spb1699 at rit.edu Thu Aug 14 11:15:31 2014 From: spb1699 at rit.edu (Scott Blondell) Date: Thu, 14 Aug 2014 15:15:31 +0000 Subject: [labnetwork] =?windows-1252?q?And_STS_too=85___Re=3A__Alcatel/Teg?= =?windows-1252?q?al_DRIE_support?= In-Reply-To: <879AEF5002D70747B136D02BC86A9C982DC047@ait-pex02mbx05.win.dtu.dk> References: <53EA692A.9020106@mcgill.ca> <3B39DE40-D92A-4CED-A4C4-3850A07E2DA7@eng.utah.edu> <879AEF5002D70747B136D02BC86A9C982DC047@ait-pex02mbx05.win.dtu.dk> Message-ID: <3E3D0635E969724F966823D007E445BD2A5C00D8@ex03mail03.ad.rit.edu> We used Class One Eqpt. in GA to help bring our vintage STS ASE on-line. It was a donated tool with more than its share of "issues". Running well since January start-up visit. Scott Blondell Facilities Manager RIT SMFL ________________________________________ From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Leif Johansen [lej at danchip.dtu.dk] Sent: Wednesday, August 13, 2014 3:30 AM To: 'Ian Harvey'; Matthieu Nannini Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] And STS too? Re: Alcatel/Tegal DRIE support Hello Ian, Two of our service engineers are former STS employees (a good solution when you have 10 STS tools - the oldest dating back to 1993). They won't mind answering a question or two, so if you have any, drop me a line. Several of the "old school" service engineers are now freelance. For a year 2000 system, I'm told that Gareth Morgan could be a good call. He has setup his own company based in the UK and is willing to travel - Best regards, Leif -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ian Harvey Sent: 12. august 2014 23:14 To: Matthieu Nannini Cc: labnetwork at mtl.mit.edu Subject: [labnetwork] And STS too? Re: Alcatel/Tegal DRIE support Dear Mathieu and colleagues We have the same question about STS... Who do you call when you run out of troubleshooting ideas on a 2000-vintage STS DRIE? Thanks, ?Ian Utah Nanofab / University of Utah Micron Technology Foundation Inc., Microscopy Suite Sorenson Molecular Biotechnology Building ? A USTAR Innovation Center On Aug 12, 2014, at 1:21 PM, Matthieu Nannini wrote: Dear colleagues, For those of you who own an Alcatel/Tegal DRIE, where do you get support from ? Our service guy (former Alcatel Eng. in France) is hard to get a hand on. Thanks Matthieu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From Kolin.Brown at mail.wvu.edu Fri Aug 15 15:39:37 2014 From: Kolin.Brown at mail.wvu.edu (Kolin Brown) Date: Fri, 15 Aug 2014 19:39:37 +0000 Subject: [labnetwork] Request for Surplus Bid Announcement Message-ID: RE: Request for Surplus Bids - WVU RFSB 90003299V Tystar Mini Tytan 3800 LFCVD Furnace West Virginia University on behalf of its Board of Governors invites qualified buyer to submit bids for a Tystar Mini Tytan 3800 LFCVD Furnace. Should you be interested in responding to this RFSB, you may obtain a copy of the Request for Surplus Bids document by visiting WVU Procurement, Contracting & Payment Services bid notification web site at: http://wvubids.finance.wvu.edu . Sealed Bids will be received by WVU Purchasing, Contracts & Payment Services Department, until: 3:00 PM; August 28, 2014. Should you experience any problems accessing the RFB document or, if you have any questions you may contact me at telephone number 304-293-9778 or by email at michelle.royce at mail.wvu.edu. Michelle E Royce, CPPB West Virginia University Procurement, Contracting, & Payment Services One Waterfront Place, 3rd Floor PO Box 6024 Cubicle 3435 Morgantown, WV 26506 Phone 304-293-9778 Fax 304-293-8152 [cid:image004.jpg at 01CFB897.D9FC0B20] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 1971 bytes Desc: image001.jpg URL: From Milan.Begliarbekov at asrc.cuny.edu Fri Aug 22 09:26:17 2014 From: Milan.Begliarbekov at asrc.cuny.edu (Milan Begliarbekov) Date: Fri, 22 Aug 2014 13:26:17 +0000 Subject: [labnetwork] Supplier for Silane and Chlorine PPE / Rating Message-ID: <7EB621C923665D458D0ED5D9E722D7210C3AE97A@EXPM5704.enterpriseapps.cuny.adlan> Hi All, At the CUNY NanoFab we're finally preparing for tool install and the immanent grand opening. To this end, can anyone recommend a good supplier for Silane and Chlorine PPE (for changing the bottles). Also, are there any minimum specs for the PPE (Nomex suits, gloves, face shields, etc) that are recommended? I checked a bunch of places and Nomex suits have different ratings, but I can't seem to find a source that makes a recommendation for Silane. We will have 10 and 100% Silane on our site. Any and all wisdom on this matter will be highly appreciated! Thank you, Milan Begliarbekov, Ph.D. | Technical Cleanroom Manager CUNY Advanced Science Research Center 85 St. Nicholas Terrace, Manhattan, NY 10027 O 646-664-8913 M 917-624-7843 F 646-664-2965 asrc.cuny.edu/NanoFab -------------- next part -------------- An HTML attachment was scrubbed... URL: From gcc27 at georgetown.edu Fri Aug 22 13:06:00 2014 From: gcc27 at georgetown.edu (G. Casey Cahill) Date: Fri, 22 Aug 2014 13:06:00 -0400 Subject: [labnetwork] Supplier for Silane and Chlorine PPE / Rating In-Reply-To: <7EB621C923665D458D0ED5D9E722D7210C3AE97A@EXPM5704.enterpriseapps.cuny.adlan> References: <7EB621C923665D458D0ED5D9E722D7210C3AE97A@EXPM5704.enterpriseapps.cuny.adlan> Message-ID: Having visited Harvard's nanomaterials facility, and looking at circumstances we may deal with here, some of the considerations below may be helpful. There's also some data attached on the ratings for Nomex from Tencate Freestyle. Hope this helps: *Protective apparel* Nomex lab coat be worn while manipulating quantities of liquid pyrophorics over 10 mL or solid pyrophorics over 1 gram. *Gloves* Considering the use of Nomex/Leather pilot?s gloves - fire resistance without compromising manual dexterity. The pilots gloves may be worn over nitrile gloves. *Eye protection* ANSI Z.87. 1 1989 *G. Casey Cahill, MS, MEn, MBA, CSP* *Lab Safety Manager* Georgetown University Safety and Environmental Management 3700 O Street NW P2 Leavey Center Washington D.C. 20057 Phone: 202-687-7785 Fax: 202-687-9229 Email: gcc27 at georgetown.edu On Fri, Aug 22, 2014 at 9:26 AM, Milan Begliarbekov < Milan.Begliarbekov at asrc.cuny.edu> wrote: > Hi All, > > > > At the CUNY NanoFab we?re finally preparing for tool install and the > immanent grand opening. To this end, can anyone recommend a good supplier > for Silane and Chlorine PPE (for changing the bottles). Also, are there any > minimum specs for the PPE (Nomex suits, gloves, face shields, etc) that are > recommended? I checked a bunch of places and Nomex suits have different > ratings, but I can?t seem to find a source that makes a recommendation for > Silane. We will have 10 and 100% Silane on our site. > > > > Any and all wisdom on this matter will be highly appreciated! > > > > Thank you, > > > > Milan Begliarbekov, Ph.D. | Technical Cleanroom Manager > > CUNY Advanced Science Research Center > > > > 85 St. Nicholas Terrace, Manhattan, NY 10027 > > O 646-664-8913 M 917-624-7843 F 646-664-2965 > > > > asrc.cuny.edu/NanoFab > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- *CONFIDENTIAL: The information contained in this communication, including its attachments may contain confidential information and is intended only for the individual (s) or entity (ies) to whom it is addressed. The information contained in this communication may also be protected by legal privilege, federal law or other applicable law. If you are not the intended recipient of this communication, you are hereby notified that any distribution, dissemination or duplication of this communication is strictly prohibited. If you have received this communication in error please immediately delete and destroy all copies of this message and please immediately notify us of the error by separate communication. Thank you. * -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: NOMEX INFO 3 (1).pdf Type: application/pdf Size: 1684316 bytes Desc: not available URL: From Jianchao.Li at unt.edu Mon Aug 25 16:03:49 2014 From: Jianchao.Li at unt.edu (Li, Jianchao) Date: Mon, 25 Aug 2014 20:03:49 +0000 Subject: [labnetwork] Nabity NPGS V9 Message-ID: <545c8bcaa5db4df5af8470b5de422c46@BLUPR01MB534.prod.exchangelabs.com> Dear Colleagues, We have a Nabity NPGS V9 (detailed items listed in the attached pic) pattern writer for sale. It was purchased around 2010 and never been used and still in its shipping box. If anyone is interested, please contact me. Thanks!, J.C. Jianchao (J.C.) Li Ph.D. Nanofabrication Facilities Manager UNT Discovery Park 3940 North Elm, UNT CART, E178G Denton, TX 76207-7102 Office: (940) 369-5318 Cleanroom #: 940-369-5352 e-mail: jianchao.li at unt.edu http://research.unt.edu/nanofabrication/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: nabity .jpg Type: image/jpeg Size: 1498246 bytes Desc: nabity .jpg URL: From evgenia.moiseeva at louisville.edu Tue Aug 26 11:23:15 2014 From: evgenia.moiseeva at louisville.edu (evgenia.moiseeva at louisville.edu) Date: Tue, 26 Aug 2014 15:23:15 +0000 Subject: [labnetwork] Video board for Dektak 8 Message-ID: Dear Colleagues, Do you know and/or recommend a 3rd party supplier that may have the video board (Integral Technologies. Inc) for Dektak 8 profilometer. Thank you! Sincerely, Evgeniya Moiseeva, Ph.D. Process Engineer, MNTC Cleanroom University of Louisville Work: (502) 852-0613 Mobile: (502) 592-4801 Email: evgenia.moiseeva at louisville.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill at eecs.berkeley.edu Tue Aug 26 15:38:44 2014 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Tue, 26 Aug 2014 12:38:44 -0700 Subject: [labnetwork] Video board for Dektak 8 In-Reply-To: References: Message-ID: <53FCE244.9090300@eecs.berkeley.edu> An HTML attachment was scrubbed... URL: From Jacob.Trevino at asrc.cuny.edu Wed Aug 27 11:48:48 2014 From: Jacob.Trevino at asrc.cuny.edu (Jacob Trevino) Date: Wed, 27 Aug 2014 15:48:48 +0000 Subject: [labnetwork] Cleanroom Equipment Technician Opening - CUNY ASRC Message-ID: I am forwarding information on an Cleanroom Equipment Technician opening at the City University of New York (CUNY) Advanced Science Research Center. Attached you will find a pdf with the job description. In order to apply go to the CUNY Jobs site: https://home.cunyfirst.cuny.edu/psp/cnyepprd/GUEST/HRMS/c/HRS_HRAM.HRS_CE.GBL click the Managerial and Professional category, find the position (ID# 11313) and follow the instructions within. More information about the CUNY ASRC can be found here: http://asrc.cuny.edu/ Feel free to distribute the postion to anyone who might be interested. Best regards, Jacob --------------------------- Jacob Trevino, PhD NanoFabrication Facility Director The City University of New York (CUNY) Advanced Science Research Center (ASRC) Tel. (646) 629-1179 Fax. (646) 664-2965 Email: Jacob.Trevino at asrc.cuny.edu Web: http://asrc.cuny.edu/ Twitter: yacobito -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Cleanroom Tech Position - CUNY ASRC NanoFab.pdf Type: application/pdf Size: 266967 bytes Desc: Cleanroom Tech Position - CUNY ASRC NanoFab.pdf URL: From rkbradle at Central.UH.EDU Thu Aug 28 10:11:04 2014 From: rkbradle at Central.UH.EDU (Bradley, Kelley) Date: Thu, 28 Aug 2014 09:11:04 -0500 Subject: [labnetwork] Question about CFR 15 B III A 301 Message-ID: Greeting all, CFR 15 B III A 301 was just brought to my attention by colleague at another university. The regulations appear to state that if a US university has equipment shipped duty free from a foreign seller the equipment cannot be used by industrial users. This has not come up for us yet at the University of Houston but I'm wondering how others handle it. Does anyone else have experience with this regulation and if so, how does your university interpret it? Here is a link to the regulations: http://www.ecfr.gov/cgi-bin/text-idx?SID=38f3e0f5486864d73636db4f13866f4d&node=pt15.2.301&rgn=div5 Specifically we are looking at 301.1 c: Summary of statutory procedures and requirements. (1) U.S. Note 1, Subchapter X, Chapter 98, HTSUS, provides, among other things, that articles covered by subheadings 9810.00.60 (scientific instruments and apparatus), 9810.00.65 (repair components therefor) and 9810.00.67 (tools for maintaining and testing the above), HTSUS, must be exclusively for the use of the institutions involved and not for distribution, sale, or other commercial use within five years after entry. These articles may be transferred to another qualified nonprofit institution, but any commercial use within five years of entry shall result in the assessment of applicable duties pursuant to ?301.9(c). And 301.4 a 3: Review and determination. The Commissioner shall date each application when received by Customs and Border Protection. If the application appears to be complete, the Commissioner shall determine: Whether the instrument or apparatus is for the exclusive use of the applicant institution and is not intended to be used for commercial purposes. For the purposes of this section, commercial uses would include, but not necessarily be limited to: Distribution, lease or sale of the instrument by the applicant institution; any use by, or for the primary benefit of, a commercial entity; or use of the instrument for demonstration purposes in return for a fee, price discount or other valuable consideration. Evaluation, modification or testing of the foreign instrument, beyond normal, routine acceptance testing and calibration, to enhance or expand its capabilities primarily to benefit the manufacturer in return for a discount or other valuable consideration, may be considered a commercial benefit. In making the above determination, the Commissioner may consider, among other things, whether the results of any research to be performed with the instrument will be fully and timely made available to the public. For the purposes of this section, use of an instrument for the treatment of patients is considered noncommercial. If any of the Commissioner's determinations is in the negative, the application shall be found to be outside the scope of the Act and shall be returned to the applicant with a statement of the reason(s) for such findings. Thanks -Kelley --------------------------------------------- Robert Kelley Bradley, Ph.D. Nanofabrication Facility Manager University of Houston 3605 Cullen Blvd, Entrance 14 Room 1011, SERC Bldg 545 Houston, TX 77204-5062 Postal Address: 3605 Cullen Blvd, Rm 2027 Houston, TX 77204-5062 Phone: 832-842-8822 FAX: 713-743-0428 Email: rkbradley at uh.edu Web: www.uh.edu/nanofab www.facebook.com/UH.Nanofab -------------- next part -------------- An HTML attachment was scrubbed... URL: From IRHarvey at eng.utah.edu Thu Aug 28 15:26:27 2014 From: IRHarvey at eng.utah.edu (Ian Harvey) Date: Thu, 28 Aug 2014 13:26:27 -0600 Subject: [labnetwork] Question about CFR 15 B III A 301 In-Reply-To: References: Message-ID: <4043ABB5-BCE4-4B04-933A-E00EB57D08B0@eng.utah.edu> Hi Kelley, It's actually worse than that both in terms of risk and also aggravation. In the application you fill out when appealing for duty-free status on those imported tools and instruments, the form you fill out is called: ADDITIONAL ANSWERS: INSTRUMENTS AND APPARATUS FOR EDUCATIONAL AND SCIENTIFIC INSTITUTIONS, 15 CFR, Part 301 And this form includes a statement to be signed by the purchaser (you) and subject to audit with specified penalties of "fines and imprisonment" 7.c "I hearby certify that there will not be any use of the foreign instrument by or for the primary benefit of any Commercial (for-profit) entity within 5 years after entry of the foreign instrument into the United States customs territory.? Note that the language prohibits "any use" "for the primary benefit" of a for-profit entity, as opposed to describing "primary use" by academic or commercial entities. If the latter, we would have some leeway. But given the language, it leaves us with two legal options: 1) pay the customs fees. -or- 2) ask companies to set up a formal sponsored project through OSP, wherein one or more students are trained to operate the tool. Then you can describe how the primary benefit is educational, to the student. The more common approach is to plead ignorance altogether or pretend to not know about it and hope that customs officials are too busy or too distracted or just unwilling to enforce this ridiculous regulation. I've gone the rounds with general counsel, import attorneys, state economic development officials, chambers of commerce, even the customs officials themselves. I have found no rational way around this from a legal standpoint. Good luck to you, ?Ian Utah Nanofab 801/585-6162 On Aug 28, 2014, at 8:11 AM, Bradley, Kelley wrote: Greeting all, CFR 15 B III A 301 was just brought to my attention by colleague at another university. The regulations appear to state that if a US university has equipment shipped duty free from a foreign seller the equipment cannot be used by industrial users. This has not come up for us yet at the University of Houston but I?m wondering how others handle it. Does anyone else have experience with this regulation and if so, how does your university interpret it? Here is a link to the regulations: http://www.ecfr.gov/cgi-bin/text-idx?SID=38f3e0f5486864d73636db4f13866f4d&node=pt15.2.301&rgn=div5 Specifically we are looking at 301.1 c: Summary of statutory procedures and requirements. (1) U.S. Note 1, Subchapter X, Chapter 98, HTSUS, provides, among other things, that articles covered by subheadings 9810.00.60 (scientific instruments and apparatus), 9810.00.65 (repair components therefor) and 9810.00.67 (tools for maintaining and testing the above), HTSUS, must be exclusively for the use of the institutions involved and not for distribution, sale, or other commercial use within five years after entry. These articles may be transferred to another qualified nonprofit institution, but any commercial use within five years of entry shall result in the assessment of applicable duties pursuant to ?301.9(c). And 301.4 a 3: Review and determination. The Commissioner shall date each application when received by Customs and Border Protection. If the application appears to be complete, the Commissioner shall determine: Whether the instrument or apparatus is for the exclusive use of the applicant institution and is not intended to be used for commercial purposes. For the purposes of this section, commercial uses would include, but not necessarily be limited to: Distribution, lease or sale of the instrument by the applicant institution; any use by, or for the primary benefit of, a commercial entity; or use of the instrument for demonstration purposes in return for a fee, price discount or other valuable consideration. Evaluation, modification or testing of the foreign instrument, beyond normal, routine acceptance testing and calibration, to enhance or expand its capabilities primarily to benefit the manufacturer in return for a discount or other valuable consideration, may be considered a commercial benefit. In making the above determination, the Commissioner may consider, among other things, whether the results of any research to be performed with the instrument will be fully and timely made available to the public. For the purposes of this section, use of an instrument for the treatment of patients is considered noncommercial. If any of the Commissioner's determinations is in the negative, the application shall be found to be outside the scope of the Act and shall be returned to the applicant with a statement of the reason(s) for such findings. Thanks -Kelley --------------------------------------------- Robert Kelley Bradley, Ph.D. Nanofabrication Facility Manager University of Houston 3605 Cullen Blvd, Entrance 14 Room 1011, SERC Bldg 545 Houston, TX 77204-5062 Postal Address: 3605 Cullen Blvd, Rm 2027 Houston, TX 77204-5062 Phone: 832-842-8822 FAX: 713-743-0428 Email: rkbradley at uh.edu Web: www.uh.edu/nanofab www.facebook.com/UH.Nanofab _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Ben at mtpv.com Fri Aug 29 13:02:48 2014 From: Ben at mtpv.com (Ben Zhang) Date: Fri, 29 Aug 2014 17:02:48 +0000 Subject: [labnetwork] looking for FTIR measurment service Message-ID: Hi I am an engineer at MTPV, we are looking for service providers to do FTIR spectrum analysis test. It is highly appreciated if someone could suggest a service provider around Boston(MA). Thanks Ben Zhang Engineer MTPV Power Corporation 200 Boston Ave, suite 1550 Medford, MA 02155 Direct Line: 781-874-9596 ext:404 Fax:781-874-9597 -------------- next part -------------- An HTML attachment was scrubbed... URL: