[labnetwork] Piranha Bath Alternatives or Substitutes

[Bernard Alamariu]

Hello,

Nanostrip cannot replace Piranha for overall semiconductor substrate 
cleaning.
Nonostrip DOES NOT clean METALS!

Pirnha 3:1 H2SO4:H2O2 is a strong acid , cleaning solution for BOTH 
METAL & ORGANIC
contaminants, with an intense hot surfactant action too.
It was the cleaning "workhorse" of the semiconductor industry for decades.
It was replaced by RCA clean for some applications and still used on 
large scale; actually
the RCA Qurtzware and Teflonware are clened by Pirnaha too.

Nanostrip could be used for Photoresist or other organic materials 
removal indeed, but that is all.

There is a false impression that Nanostrip is somehow a weak Piranha; it 
is not as its reaction with
metals is inhibited. It does not even compare with the well known Caro 
etch, which is a weak
Pirnaha ( 1:3) used in the past to final clean the Al pads before sinter 
( before the Asher was inveneted), etc.

Thanks, Bernard



On 12/4/14 1:02 PM, Kolin Brown wrote:
>
> To all:
>
> Currently our Environmental Health and Safety office  is creating new 
> disposal procedures for Piranha Bath.  They are also encouraging us to 
> find alternative processes.  In the past at WVU, we used SummaClean by 
> Malinkrodt Baker as a substitute; however, this product was 
> discontinued about a year ago.  Does anyone know of any other Piranha 
> bath substitutes?
>
> Kolin Brown
>
>
>
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