From vito.logiudice at uwaterloo.ca Tue Feb 4 11:30:23 2014 From: vito.logiudice at uwaterloo.ca (Vito Logiudice) Date: Tue, 4 Feb 2014 16:30:23 +0000 Subject: [labnetwork] Monitoring quality of CDA Message-ID: Dear Colleagues, We are in the process of implementing a standalone system for monitoring cleanroom environmental parameters such as temperature, humidity, differential pressures, etc. An additional variable we would like to monitor is moisture content of our clean, dry air (compressed air) supply. I would be grateful for any insights on how to best monitor this variable in a reliable fashion. Thank you. Regards, Vito Logiudice -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill at eecs.berkeley.edu Tue Feb 4 20:19:54 2014 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Tue, 04 Feb 2014 17:19:54 -0800 Subject: [labnetwork] Monitoring quality of CDA In-Reply-To: References: Message-ID: <52F191BA.7060005@eecs.berkeley.edu> An HTML attachment was scrubbed... URL: From vito.logiudice at uwaterloo.ca Wed Feb 5 08:43:44 2014 From: vito.logiudice at uwaterloo.ca (Vito Logiudice) Date: Wed, 5 Feb 2014 13:43:44 +0000 Subject: [labnetwork] Monitoring quality of CDA In-Reply-To: <52F191BA.7060005@eecs.berkeley.edu> Message-ID: Bill, Thank you much for this. Might you be able to share some info as to the make and model of the dew point sensor in use at your facility? I'd like to stick with a tried and true unit if at all possible. Thank you. Best regards, Vito From: Bill Flounders > Date: Tuesday, 4 February, 2014 8:19 PM To: Vito Logiudice >, "labnetwork at mtl.mit.edu" > Subject: Re: [labnetwork] Monitoring quality of CDA Install dew point sensor on outlet side of air dryer with 4-20mA output signal Common set points are -100 F, -75 F and - 40 F corresponding to approx 1ppm, 10ppm and 100ppm H2O content. We deliver at 1-10ppm; system alarms at 100ppm (-40 F) Useful reference: http://www.asge-online.com/pdf/ASGEpg185.pdf Bill Flounders UC Berkeley Vito Logiudice wrote: Dear Colleagues, We are in the process of implementing a standalone system for monitoring cleanroom environmental parameters such as temperature, humidity, differential pressures, etc. An additional variable we would like to monitor is moisture content of our clean, dry air (compressed air) supply. I would be grateful for any insights on how to best monitor this variable in a reliable fashion. Thank you. Regards, Vito Logiudice -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill at eecs.berkeley.edu Wed Feb 5 11:48:28 2014 From: bill at eecs.berkeley.edu (Bill Flounders) Date: Wed, 05 Feb 2014 08:48:28 -0800 Subject: [labnetwork] Monitoring quality of CDA In-Reply-To: References: Message-ID: <52F26B5C.7000700@eecs.berkeley.edu> An HTML attachment was scrubbed... URL: From xiaojin.wang at louisville.edu Fri Feb 7 10:36:33 2014 From: xiaojin.wang at louisville.edu (Wang,Xiaojin) Date: Fri, 7 Feb 2014 15:36:33 +0000 Subject: [labnetwork] cryopump for e-beam Message-ID: Dear all: We are looking for a refurbished cryopump on e-beam evaporator. Could you recommend me a company that can provide good refurbished cryopump with a reasonable price ($2000~$3000). Thank you. Best wishes Xiaojin Wang Senior process engineer Micro/nano technology center University of Louisville From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice Sent: Wednesday, February 05, 2014 8:44 AM To: Bill Flounders Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Monitoring quality of CDA Bill, Thank you much for this. Might you be able to share some info as to the make and model of the dew point sensor in use at your facility? I'd like to stick with a tried and true unit if at all possible. Thank you. Best regards, Vito From: Bill Flounders > Date: Tuesday, 4 February, 2014 8:19 PM To: Vito Logiudice >, "labnetwork at mtl.mit.edu" > Subject: Re: [labnetwork] Monitoring quality of CDA Install dew point sensor on outlet side of air dryer with 4-20mA output signal Common set points are -100 F, -75 F and - 40 F corresponding to approx 1ppm, 10ppm and 100ppm H2O content. We deliver at 1-10ppm; system alarms at 100ppm (-40 F) Useful reference: http://www.asge-online.com/pdf/ASGEpg185.pdf Bill Flounders UC Berkeley Vito Logiudice wrote: Dear Colleagues, We are in the process of implementing a standalone system for monitoring cleanroom environmental parameters such as temperature, humidity, differential pressures, etc. An additional variable we would like to monitor is moisture content of our clean, dry air (compressed air) supply. I would be grateful for any insights on how to best monitor this variable in a reliable fashion. Thank you. Regards, Vito Logiudice -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From len.olona at ou.edu Fri Feb 7 12:09:53 2014 From: len.olona at ou.edu (Olona, Leonard E.) Date: Fri, 7 Feb 2014 17:09:53 +0000 Subject: [labnetwork] cryopump for e-beam In-Reply-To: References: Message-ID: <309A5424-5446-4EA2-9005-EDDBCC36E72B@ou.edu> Austin scientific. Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Rm 550 Norman, Oklahoma 73019 D: +1- 405 325-4374 C: +1- 405 630-9068 F: +1- 405 325-7066 On Feb 7, 2014, at 10:59 AM, "Wang,Xiaojin" > wrote: Dear all: We are looking for a refurbished cryopump on e-beam evaporator. Could you recommend me a company that can provide good refurbished cryopump with a reasonable price ($2000~$3000). Thank you. Best wishes Xiaojin Wang Senior process engineer Micro/nano technology center University of Louisville From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice Sent: Wednesday, February 05, 2014 8:44 AM To: Bill Flounders Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Monitoring quality of CDA Bill, Thank you much for this. Might you be able to share some info as to the make and model of the dew point sensor in use at your facility? I'd like to stick with a tried and true unit if at all possible. Thank you. Best regards, Vito From: Bill Flounders > Date: Tuesday, 4 February, 2014 8:19 PM To: Vito Logiudice >, "labnetwork at mtl.mit.edu" > Subject: Re: [labnetwork] Monitoring quality of CDA Install dew point sensor on outlet side of air dryer with 4-20mA output signal Common set points are -100 F, -75 F and - 40 F corresponding to approx 1ppm, 10ppm and 100ppm H2O content. We deliver at 1-10ppm; system alarms at 100ppm (-40 F) Useful reference: http://www.asge-online.com/pdf/ASGEpg185.pdf Bill Flounders UC Berkeley Vito Logiudice wrote: Dear Colleagues, We are in the process of implementing a standalone system for monitoring cleanroom environmental parameters such as temperature, humidity, differential pressures, etc. An additional variable we would like to monitor is moisture content of our clean, dry air (compressed air) supply. I would be grateful for any insights on how to best monitor this variable in a reliable fashion. Thank you. Regards, Vito Logiudice -- Vito Logiudice M.A.Sc., P.Eng. Director of Operations, Quantum NanoFab University of Waterloo 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel: 1-519-888-4567 ext. 38703 Email: vlogiudi at uwaterloo.ca Website: https://qncfab.uwaterloo.ca/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.eduhttps://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From roberthamilton at berkeley.edu Fri Feb 7 18:00:47 2014 From: roberthamilton at berkeley.edu (Bob Hamilton) Date: Fri, 07 Feb 2014 15:00:47 -0800 Subject: [labnetwork] cryopump for e-beam In-Reply-To: <309A5424-5446-4EA2-9005-EDDBCC36E72B@ou.edu> References: <309A5424-5446-4EA2-9005-EDDBCC36E72B@ou.edu> Message-ID: <52F5659F.6090904@berkeley.edu> Also, http://www.bay-technologies.net/cryo_pump_and_compressor_repair -- Robert Hamilton University of California at Berkeley Marvell NanoLab Equipment Eng. Mgr. Room 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu Phone: 510-809-8600 Mobile: 510-325-7557 e-mail preferred On 2/7/2014 9:09 AM, Olona, Leonard E. wrote: > Austin scientific. > > *Leonard E. Olona* > /University Cleanroom Manager/ > University of Oklahoma > 110 West Boyd Street Rm 550 > Norman, Oklahoma 73019 > D: +1- 405 325-4374 > C: +1- 405 630-9068 > F: +1- 405 325-7066 > > On Feb 7, 2014, at 10:59 AM, "Wang,Xiaojin" > > wrote: > >> Dear all: >> >> We are looking for a refurbished cryopump on e-beam evaporator. Could >> you recommend me a company that can provide good refurbished cryopump >> with a reasonable price ($2000~$3000). Thank you. >> >> Best wishes >> >> Xiaojin Wang >> >> Senior process engineer >> >> Micro/nano technology center >> >> University of Louisville >> >> *From:*labnetwork-bounces at mtl.mit.edu >> >> [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Vito Logiudice >> *Sent:* Wednesday, February 05, 2014 8:44 AM >> *To:* Bill Flounders >> *Cc:* labnetwork at mtl.mit.edu >> *Subject:* Re: [labnetwork] Monitoring quality of CDA >> >> Bill, >> >> Thank you much for this. Might you be able to share some info as to >> the make and model of the dew point sensor in use at your facility? >> I'd like to stick with a tried and true unit if at all possible. >> Thank you. >> >> Best regards, >> >> Vito >> >> *From: *Bill Flounders > > >> *Date: *Tuesday, 4 February, 2014 8:19 PM >> *To: *Vito Logiudice > >, "labnetwork at mtl.mit.edu >> " > > >> *Subject: *Re: [labnetwork] Monitoring quality of CDA >> >> >> Install dew point sensor on outlet side of air dryer with 4-20mA >> output signal >> Common set points are -100 F, -75 F and - 40 F >> corresponding to approx 1ppm, 10ppm and 100ppm H2O content. >> >> We deliver at 1-10ppm; system alarms at 100ppm (-40 F) >> >> Useful reference: http://www.asge-online.com/pdf/ASGEpg185.pdf >> >> Bill Flounders >> UC Berkeley >> >> >> Vito Logiudice wrote: >> >> Dear Colleagues, >> >> We are in the process of implementing a standalone system for >> monitoring cleanroom environmental parameters such as >> temperature, humidity, differential pressures, etc. An additional >> variable we would like to monitor is moisture content of our >> clean, dry air (compressed air) supply. >> >> I would be grateful for any insights on how to best monitor this >> variable in a reliable fashion. Thank you. >> >> Regards, >> >> Vito Logiudice >> >> -- >> >> Vito Logiudice M.A.Sc., P.Eng. >> >> Director of Operations, Quantum NanoFab >> >> University of Waterloo >> >> 200 University Avenue West >> >> Waterloo, ON Canada N2L 3G1 >> >> Tel: 1-519-888-4567 ext. 38703 >> >> Email: vlogiudi at uwaterloo.ca >> >> Website: https://qncfab.uwaterloo.ca / >> >> >> >> >> _______________________________________________ >> >> labnetwork mailing list >> >> labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Robert Hamilton University of California at Berkeley Marvell NanoLab Equipment Eng. Mgr. Room 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu Phone: 510-809-8600 Mobile: 510-325-7557 e-mail preferred -------------- next part -------------- An HTML attachment was scrubbed... URL: From dave101260 at gmail.com Wed Feb 12 12:34:03 2014 From: dave101260 at gmail.com (Dave Terry) Date: Wed, 12 Feb 2014 12:34:03 -0500 Subject: [labnetwork] Veeco/Sloan Dektak 3ST Message-ID: Hello everyone, I'm trying to resurrect a Dektak 3ST. Does anyone have a set of schematics for one of these? Or, at the very least, have some information about changing/upgrading the system's power supply. Any help would be greatly appreciated. *Best Regards,------------------------------------Dave TerryMIT Microsystems Technology Labratories Dave101260 at gmail.com Cell: 617 784 7942-------------------------------------* -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Wed Feb 12 17:12:39 2014 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Wed, 12 Feb 2014 22:12:39 +0000 Subject: [labnetwork] cryopump for e-beam In-Reply-To: <52F5659F.6090904@berkeley.edu> References: <309A5424-5446-4EA2-9005-EDDBCC36E72B@ou.edu> <52F5659F.6090904@berkeley.edu> Message-ID: Hi folks! I have a client that is wishing to deposit Aluminum Nitride and Silicon Nitride in our Beneq ALD. Listed below are the precursors we already have in our Beneq TFS-200. It also has PEALD capabilities and is plumbed with Ar, N2 and O2 gases. My questions are, how are you depositing these materials at your facility and would it be better to perform this deposition with a precursor + ALD, PEALD + gas, PEALD + precursor, PEALD + gas + precursor? Hot Source 1: Bis(diethylamide) silane - BDMS Hot Source 2: Aluminum Chloride - AlCl3 Ambient Source 1: Water Ambient Source 2: Diethylzinc - DEZ Ambient Source 3: Trimethyl Aluminum - TMA Ambient Source 4: Titanium Tetrachloride - TiCl4 Thanks again, cheers and see everyone at UGIM 2014! Julia Aebersold, Ph.D. MNTC Cleanroom Manager Shumaker Research Building, Room 233 2210 South Brook Street University of Louisville Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From oserbest at sabanciuniv.edu Thu Feb 13 02:34:04 2014 From: oserbest at sabanciuniv.edu (Onur Serbest) Date: Thu, 13 Feb 2014 09:34:04 +0200 Subject: [labnetwork] Co Deposition Message-ID: Dear all, We are thinking to make Co deposition with e-beam evaporator. But we have no experience about it. We are afraid of contaminating our chamber. If it contaminates; how can we clean it. Also is there anything special we should do before and after deposition. If anyone with Co deposition experience could help us we would be grateful. Thanks already. Best Regards. -- --- --- --- --- Onur SERBEST Cleanroom Specialist Process Engineer Sabanci University Nanotechnology Research and Application Center, Orhanli - Tuzla, 34956, Istanbul, Turkey. Phone: +90 (216) 483 9993 Fax: +90 (216) 483 9885 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dave101260 at gmail.com Wed Feb 12 21:18:51 2014 From: dave101260 at gmail.com (Dave Terry) Date: Wed, 12 Feb 2014 21:18:51 -0500 Subject: [labnetwork] Dektak 3ST Message-ID: I apologize if this is the second time you've recieved this Email. Hello everyone, I'm trying to resurrect a Dektak 3ST. Does anyone have a set of schematics for one of these? Or, at the very least, have some information about changing/upgrading the system's power supply. Any help would be greatly appreciated. *Best Regards,------------------------------------Dave Terry MIT/MTLDave101260 at gmail.com Cell: 617 784 7942-------------------------------------* -------------- next part -------------- An HTML attachment was scrubbed... URL: From roberthamilton at berkeley.edu Thu Feb 13 11:18:49 2014 From: roberthamilton at berkeley.edu (Bob Hamilton) Date: Thu, 13 Feb 2014 08:18:49 -0800 Subject: [labnetwork] Co Deposition In-Reply-To: References: Message-ID: <52FCF069.1010909@berkeley.edu> Onur Serbest, Re: E-beam and more general PVD tool cleanlieness management Onur, At Berkeley we manage PVD tool cleanliness with the use of replaceable shielding. Our shields are fabricated from thin stainless steel. We maintain at least two sets, one in the tool, the other as a spare. We also use aluminum foil to sometimes cover these shields and to cover areas where shields aren't practicable given deposited films are line-of-sight. For health and safety reasons we do not allow our researchers to use N2 blowguns to cleanup metal flakes common in a PVD process. It seemed simplest for us to consider all metal aerosoles as hazardous rather than to try and keep up on such issues. It seems half the periodic table is getting used these days. We employ a HEPA vacuum for such cleanup work. Fortunately, UC Berkeley is situated in an area that has several semiconductor parts cleaning services and we use such services. Previously we employed 200 mm borosilicate glass chimneys which were either disposable or cleanable in an acid such as aqua-regia. In the case of a metal chambers we'd use a grinder with a metal brush. Our PVD systems incorporate "venetian-blind" view ports, i.e. windows that use a series of overlapping glass slides to intercept evaporants from the viewport window. The slides are cheap; we throw them away as needed. If you would like some photos, e-mail me. Regards, Bob Hamilton -- Robert Hamilton University of California at Berkeley Marvell NanoLab Equipment Eng. Mgr. Room 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu Phone: 510-809-8600 Mobile: 510-325-7557 e-mail preferred On 2/12/2014 11:34 PM, Onur Serbest wrote: > Dear all, > > We are thinking to make Co deposition with e-beam evaporator. But we > have no experience about it. > > We are afraid of contaminating our chamber. If it contaminates; how > can we clean it. Also is there anything special we should do before > and after deposition. > > If anyone with Co deposition experience could help us we would be > grateful. > > Thanks already. > > Best Regards. > > -- > --- --- --- --- > > Onur SERBEST > Cleanroom Specialist > Process Engineer > Sabanci University Nanotechnology Research and Application Center, > Orhanli - Tuzla, 34956, Istanbul, Turkey. > Phone: +90 (216) 483 9993 > Fax: +90 (216) 483 9885 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Robert Hamilton University of California at Berkeley Marvell NanoLab Equipment Eng. Mgr. Room 520 Sutardja Dai Hall Berkeley, CA 94720-1754 bob at eecs.berkeley.edu Phone: 510-809-8600 Mobile: 510-325-7557 e-mail preferred -------------- next part -------------- An HTML attachment was scrubbed... URL: From emartin at cns.fas.harvard.edu Fri Feb 14 14:49:00 2014 From: emartin at cns.fas.harvard.edu (Martin, Eric) Date: Fri, 14 Feb 2014 19:49:00 +0000 Subject: [labnetwork] UGIM 2014 Symposium June 15-17 Harvard University Message-ID: <2DF767B0ED5BB84FAF02C966FDAC8E9559F8565D@HARVANDMBX01.fasmail.priv> Dear Colleagues The 2014 University/Government/Industry/Micro-Nano Symposium will be held on the campus Harvard University June 15-17, 2014. Event information, registration link, and lodging information can be found at: http://www.cns.fas.harvard.edu/UGIM2014/ The meeting focus will be the operations aspects of research cleanrooms. Event will include: * Keynote talks by SEMATECH and NSF/NNI leadership * Discussion Panels * Working Lunch * Expanded Exhibit area * Optional "New Lab Bootie Camp" half day tutorial on operations and safety. The call for papers is still open and we welcome your submissions. Information on the website. We look forward to seeing you here this June. Eric Martin and Vicky Diadiuk Co-Chairs, UGIM 2014 Eric Martin, Ph.D. | UGIM2014 co-Chair Technical Director Harvard Center for Nanoscale Systems | Harvard University 11 Oxford Street | Cambridge, MA 02138 | 617-495-3161 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Thu Feb 20 08:50:41 2014 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas) Date: Thu, 20 Feb 2014 13:50:41 +0000 Subject: [labnetwork] mask writers Message-ID: Colleagues, I'm looking at purchasing a low end mask writer (with direct write capability). Besides Heidelberg and Intelligent Micro Patterning , what other manufactures are out there? Thanks for your help... AND DON'T FORGET TO MAKE YOUR PLANS FOR UGIM 2014 http://www.cns.fas.harvard.edu/UGIM2014/ Thomas S. Ferraguto ETIC Nanofabrication Laboratory Director University of Massachusetts Lowell 1 University Avenue Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile 978-934-1014 fax [cid:image003.png at 01CF2E18.D5D606E0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 57996 bytes Desc: image003.png URL: From evporte at uark.edu Wed Feb 26 17:43:41 2014 From: evporte at uark.edu (Errol V. Porter) Date: Wed, 26 Feb 2014 22:43:41 +0000 Subject: [labnetwork] Piranha & HF no rinse protocols Message-ID: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> Greetings, I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Wed Feb 26 20:40:01 2014 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Thu, 27 Feb 2014 01:40:01 +0000 Subject: [labnetwork] Piranha & HF no rinse protocols In-Reply-To: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> References: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> Message-ID: <51c804cdf42548b68fc8be5b286dd82d@HKNPR06MB308.apcprd06.prod.outlook.com> Hi Errol, Personally I support a thorough rinse step after these etchants. Especially the HF one as if not rinsed properly you take HF fumes with the sample and that pose Safety issues. Moreover if you look at the sample immediately after etching in a microscope there is a big chance of attacking the objective lens due to HF fumes. Regards, Fouad From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter Sent: Thursday, 27 February 2014 9:44 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Piranha & HF no rinse protocols Greetings, I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Feb 27 06:18:02 2014 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 27 Feb 2014 11:18:02 +0000 Subject: [labnetwork] Piranha & HF no rinse protocols In-Reply-To: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> References: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> Message-ID: HI, Here at Draper we regulate the use of 1:1 Sulfuric/H2O2 to one bench and only one bath at a time. The mixture reacts very violently and heats very quickly. In fact one time the mixture caused a small fire as a quartz bath failed and melted down and fire retardant plastic was melted and almost ignited. After that step there is a rinse in DI followed by the HF. You cannot mix the 1:1 with the HF bath that would be a bad idea, so you need to rinse after that step. If it is a bare silicon wafer then the wafer sheets off of the wafer but not the wafer cassette or wafer holder so a rinse is needed. I guess you could try to take out the wafer and dry it somehow but that is very risky. HF is very dangerous I do not recommend skipping the rinse step. Rick Draper Laboratory Principle Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter Sent: Wednesday, February 26, 2014 5:44 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Piranha & HF no rinse protocols Greetings, I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From len.olona at ou.edu Thu Feb 27 08:58:16 2014 From: len.olona at ou.edu (Olona, Leonard E.) Date: Thu, 27 Feb 2014 13:58:16 +0000 Subject: [labnetwork] Piranha & HF no rinse protocols Message-ID: Greetings Errol, Here at OU one of our main wet bench uses in the CR is wafer preparation for IV/VI MBE growth. Shiraki Clean is the method of choice. Its really just a fancy RCA clean with solvent metal cleaning in the beginning of the process. As our other colleagues stated? DI rinse is highly recommended post HF or any other type of acid dip. And to take it a bit further, the way the rinse is performed is very important. One must stride to employ a steady stream of decent research grade DI. A small trickle of low resistivity DI into a beaker just wont cut it. If you can provide ~18Mohm with a high volume of flow- you will be set! You really need to have the samples placed vertical in the boat or holder. That way the DI rinse can do its thing in a uniform fashion. I've seen folks submerge the samples horizontally which proved to be a poor way of rinse. Bubbles propagate and get stuck in between the samples/wafers. I have seen a weak flow of say ~2000ml / 4min @10Mohm DI barely cut it when your looking for a nice sheeting action of the sample. After boosting our DI system to provide an actual 17.86Mohm at gallons of flow per minute we now have excellent results in wafer preparation. A QDR (quick dump rinse) is ideal, but that system requires some serious infrastructure. Simply stated. A good strong rinse with the highest grade (18 Mohm) DI water is the best for results and safety. I hope this helps! Don?t forget your PPE! -Len Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Rm 550 Norman, Oklahoma 73019 D: +1- 405 325-4374 C: +1- 405 630-9068 F: +1- 405 325-7066 From: "Errol V. Porter" > Date: Wednesday, February 26, 2014 4:43 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Piranha & HF no rinse protocols Greetings, I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From Vincent.Luciani at nist.gov Thu Feb 27 09:31:35 2014 From: Vincent.Luciani at nist.gov (Luciani, Vincent) Date: Thu, 27 Feb 2014 14:31:35 +0000 Subject: [labnetwork] Piranha & HF no rinse protocols In-Reply-To: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> References: <49510757561B8E4EB8076830B69BF277576B4FDA@ex-mbx3.uark.edu> Message-ID: Hello Errol, I could be wrong but I have never heard of, or would recommend skipping, the water rinse between the piranha and the 10:1 HF dip. Skipping the water rinse after the final HF dip is a technique I and may other have used for very special applications. It is a trick used by some epi growers to get their wafers into an inert environment without growing a native oxide. However, as others have alluded, the technique requires special handling and training to maintain safety throughout the process. Even though the wafer will de-wet and look dry, it can burn you, etch glass, emit HF vapor fumes etc. Bottom line: There are special cases where this technique may be applicable but you must be prepared. I would not let anyone in our lab do this unless they can demonstrate to me the need for it and the experience to do it safely. Good Luck, Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter Sent: Wednesday, February 26, 2014 5:44 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Piranha & HF no rinse protocols Greetings, I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From evporte at uark.edu Thu Feb 27 11:39:59 2014 From: evporte at uark.edu (Errol V. Porter) Date: Thu, 27 Feb 2014 16:39:59 +0000 Subject: [labnetwork] No rinse protocol response Message-ID: <49510757561B8E4EB8076830B69BF277576B5482@ex-mbx3.uark.edu> Greetings, I would to sincerely thank all who responded to my email regarding this issue. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Thu Feb 27 18:00:29 2014 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Thu, 27 Feb 2014 23:00:29 +0000 Subject: [labnetwork] Piranha & HF no rinse protocols In-Reply-To: References: Message-ID: We are fortunate to have benches with a quick-dump-rinse cycles where the wafers are vertical and a gentle jets of water are injected onto the wafer while DI water bath is drained and refilled 3 times. The wafers proceed then to a spin-rinse-dryer before further processing. This process is performed for all wet processes including our developer bench. Cheers! Julia Aebersold, Ph.D. MNTC Cleanroom Manager Shumaker Research Building, Room 233 2210 South Brook Street University of Louisville Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Olona, Leonard E. Sent: Thursday, February 27, 2014 8:58 AM To: Errol V. Porter; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Piranha & HF no rinse protocols Greetings Errol, Here at OU one of our main wet bench uses in the CR is wafer preparation for IV/VI MBE growth. Shiraki Clean is the method of choice. Its really just a fancy RCA clean with solvent metal cleaning in the beginning of the process. As our other colleagues stated... DI rinse is highly recommended post HF or any other type of acid dip. And to take it a bit further, the way the rinse is performed is very important. One must stride to employ a steady stream of decent research grade DI. A small trickle of low resistivity DI into a beaker just wont cut it. If you can provide ~18Mohm with a high volume of flow- you will be set! You really need to have the samples placed vertical in the boat or holder. That way the DI rinse can do its thing in a uniform fashion. I've seen folks submerge the samples horizontally which proved to be a poor way of rinse. Bubbles propagate and get stuck in between the samples/wafers. I have seen a weak flow of say ~2000ml / 4min @10Mohm DI barely cut it when your looking for a nice sheeting action of the sample. After boosting our DI system to provide an actual 17.86Mohm at gallons of flow per minute we now have excellent results in wafer preparation. A QDR (quick dump rinse) is ideal, but that system requires some serious infrastructure. Simply stated. A good strong rinse with the highest grade (18 Mohm) DI water is the best for results and safety. I hope this helps! Don't forget your PPE! -Len Leonard E. Olona University Cleanroom Manager University of Oklahoma 110 West Boyd Street Rm 550 Norman, Oklahoma 73019 D: +1- 405 325-4374 C: +1- 405 630-9068 F: +1- 405 325-7066 From: "Errol V. Porter" > Date: Wednesday, February 26, 2014 4:43 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] Piranha & HF no rinse protocols Greetings, I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users. Regards, Errol Porter University of Arkansas / HiDEC 700 W. Research Center Blvd Fayetteville, AR 72701 Tel. (479) 575-2519 Mobile: (479) 236-0693 Fax (479) 575-2719 email: evporte at uark.edu http://www.hidec.uark.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jhub at danchip.dtu.dk Fri Feb 28 02:37:37 2014 From: jhub at danchip.dtu.dk (=?iso-8859-1?Q?J=F6rg_H=FCbner?=) Date: Fri, 28 Feb 2014 07:37:37 +0000 Subject: [labnetwork] HC Oersted post doc stipends at DTU Danchip, Technical University of Denmark In-Reply-To: <002a01cf1597$3a0ae030$ae20a090$@iisc.ernet.in> References: <0D1ABD6DF2541B42A05BD6E6D3695411F63CA812@EXMBX03.ad.louisville.edu> <002a01cf1597$3a0ae030$ae20a090$@iisc.ernet.in> Message-ID: <627EF7C75C01AA4D850017E027356FB749A08C@ait-pex02mbx05.win.dtu.dk> Hi, the Technical University of Denmark (DTU) is offering HC Oersted post-doc stipends for post-docs from foreign countries. The projects within micro-and nano fabrication or electron nanoscopy are to be carried out at DTU Danchip - National Center for Micro- and Nanofabrication and National or DTU Cen - Center for Electron Nanoscopy, www.danchip.dtu.dk , www.cen.dtu.dk This link provides more information: http://www.dtu.dk/english/Research/Research-at-DTU/HC-Oersted-Postdoc---COFUND The projects we are looking for are within micro-and nanofabrication technology and can be defined together with Danchip/Cen so candidate's project proposals are highly encouraged. The stipends can also be used to initiate a research collaboration. If you know of a suitable candidate that might be interested please refer her or him to Prof. Flemming Jensen fj at danchip.dtu.dk , or Deputy Director Anders Jorgensen ajoe at danchip.dtu.dk. Best Regards Jorg J?rg H?bner, Ph.D. Director DTU Danchip National Center for Micro- and Nanofabrication DTU CEN National Center for Electron Nanoscopy Technical University of Denmark [http://www.dtu.dk/images/DTU_email_logo_01.gif] Danchip ?rstedsPlads Building 347 2800 Kgs Lyngby Direct +45 4525 5762 Mobile +45 22785157 jhub at danchip.dtu.dk www.danchip.dtu.dk From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Walsh,Kevin M. Sent: 19 January 2014 05:05 To: labnetwork at mtl.mit.edu Cc: Walsh,Kevin M. Subject: [labnetwork] advice please I have an outstanding US citizen student who will complete his MENG degree in EE this summer. He has just recently decided he wishes to pursue his PHD in the area of MEMS or micro/nanoelectronics. Since it's a bit late to apply to PhD programs, he is looking for something to do for a year. He has 2 years of cleanroom experience making a variety of MEMS devices. He has much experience with a wide collection of processing, packaging and characterization tools. He is simply an outstanding "fabber". Does anyone have any suggestions which I could pass onto him. Thanks in advance, Kevin Dr. Kevin M. Walsh Ky nanoNET Director Samuel T. Fife Professor of Electrical and Computer Engineering Founding Director of the UofL Micro/Nanotechnology Center 2210 South Brook St Shumaker Research Building, Room 234 Louisville, KY 40292 Office # (502) 852-0826 Fax # (502) 852-8128 http://kynanonet.org/ [Description: Capture for email signature] -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. -- This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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