[labnetwork] Piranha & HF no rinse protocols

[Fouad Karouta]

Hi Errol,

Personally I support a thorough rinse step after these etchants. Especially the HF one as if not rinsed properly you take HF fumes with the sample and that pose Safety issues. Moreover if you look at the sample immediately after etching in a microscope there is a big chance of attacking the objective lens due to HF fumes.

Regards, Fouad

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Errol V. Porter
Sent: Thursday, 27 February 2014 9:44 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Piranha & HF no rinse protocols

Greetings,

I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users.

Regards,

Errol Porter
University of Arkansas / HiDEC
700 W. Research Center Blvd
Fayetteville, AR 72701
Tel. (479) 575-2519
Mobile: (479) 236-0693
Fax (479) 575-2719
email: evporte at uark.edu<mailto:evporte at uark.edu>
http://www.hidec.uark.edu<http://www.hidec.uark.edu/>

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