[labnetwork] Cleanroom baseline processes and monitoring

[Mark Walters]

I imagine that like most of you, we offer some standard baseline cleanroom
processes for our users to implement.  For example, there is a standard
positive resist process and negative resist process, standard RIE etch
recipes, etc.  We've done some characterization of these processes in the
past, especially when they were first set up, but we now want to be more
intentional on monitoring these processes over time to be able to notice
trends or problems before they affect our users.

 

I was wondering if other university cleanrooms do periodic process
monitoring, and if so, what types of processes and monitoring have you found
to be most useful for you and your users.  Do you look at single isolated
processes (e.g., evaporation thickness uniformity) or build devices that
test the integration of multiple processes (e.g., MOS devices or TLM
resistance structures) or a combination of both?

 

Thanks,

Mark D. Walters, Ph.D.

Director, Shared Materials Instrumentation Facility (SMIF)

Duke University

Box 90271

Durham, NC 27708-0271

 <blocked::http://smif.lab.duke.edu/> http://smif.lab.duke.edu

Phone: (919) 660-5486

Fax: (919) 660-5491

 

 

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