[labnetwork] Nanoimprint lithography tool assessment
Kevin McPeak
kmcpeak at ethz.ch
Fri May 9 06:26:05 EDT 2014
Dear Colleagues,
The joint ETH/IBM cleanroom is looking into purchasing a dedicated
nanoimprint lithography tool. Our two main criteria is that system can
do step-and-flash imprinting over large areas and that the system has
excellent parallelism (e.g. step and flash a 5 mm x 5 mm stamp with
~400 nm features over a 4" wafer)
Two models we are looking at are:
- Molecular Imprints Imprio 55
- Nanonex NX-3000
I would greatly appreciate NIL manufacturer and model recommendations
based on the above requirements. Thanks in advance!
Regards,
Kevin McPeak
--
Kevin McPeak Ph.D.
Postdoctoral Researcher
ETH Zürich
Optical Materials Engineering Laboratory
Universitätstrasse 6, CNB F121
CH-8092 Zurich, Switzerland
Voice: +41 44 632 6594
Email: kmcpeak at ethz.ch
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