From rmorrison at draper.com  Wed Aug  5 11:37:32 2015
From: rmorrison at draper.com (Morrison, Richard H., Jr.)
Date: Wed, 05 Aug 2015 15:37:32 +0000
Subject: [labnetwork] cleanroom loading
Message-ID: <D3862732F46DEB4B93B4A7A80614D288976258F7@mbx2.draper.com>

HI,

Is there a rule of thumb that is used to set a maximum capacity (# of people) in a cleanroom. I have class 10 rooms that are only 360 sqft with 450 air changes per hour and if I have >3 people in the space I have issues with particle control.

Any ideas on maximum capacity in a room by class?

Thanks
Rick


Draper Laboratory
Principal  Member of the Technical Staff
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From hbtusainc at yahoo.com  Wed Aug  5 15:52:31 2015
From: hbtusainc at yahoo.com (hbtusainc)
Date: Wed, 5 Aug 2015 15:52:31 -0400
Subject: [labnetwork] cleanroom loading
In-Reply-To: <D3862732F46DEB4B93B4A7A80614D288976258F7@mbx2.draper.com>
References: <D3862732F46DEB4B93B4A7A80614D288976258F7@mbx2.draper.com>
Message-ID: <CE710451-8C49-4A08-A3A0-83CBCFAFB952@yahoo.com>

Richard , I have done extensive work in wafer foundries worldwide,  for that size of cleanroom space 3-4 people is the max to keep the cleanliness at all times .. Anybody that needs to come into those modules is required to do a head count before coming in.

I hope this helps , regards ...

Sent from my iPhone. Mario A. Portillo. High' born Technology USA

> On Aug 5, 2015, at 11:37 AM, Morrison, Richard H., Jr. <rmorrison at draper.com> wrote:
> 
> HI,
>  
> Is there a rule of thumb that is used to set a maximum capacity (# of people) in a cleanroom. I have class 10 rooms that are only 360 sqft with 450 air changes per hour and if I have >3 people in the space I have issues with particle control.
>  
> Any ideas on maximum capacity in a room by class?
>  
> Thanks
> Rick
>  
>  
> Draper Laboratory
> Principal  Member of the Technical Staff
> Group Leader Microfabrication Operations
> 555 Technology Square
> Cambridge Ma, 02139-3563
>  
> www.draper.com
> rmorrison at draper.com
> W 617-258-3420
> C 508-930-3461
>  
> Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From hbtusainc at yahoo.com  Wed Aug  5 16:05:44 2015
From: hbtusainc at yahoo.com (hbtusainc)
Date: Wed, 5 Aug 2015 16:05:44 -0400
Subject: [labnetwork] cleanroom loading
In-Reply-To: <CE710451-8C49-4A08-A3A0-83CBCFAFB952@yahoo.com>
References: <D3862732F46DEB4B93B4A7A80614D288976258F7@mbx2.draper.com>
 <CE710451-8C49-4A08-A3A0-83CBCFAFB952@yahoo.com>
Message-ID: <86B4F338-955C-4AEE-BC2B-C9B640C8698F@yahoo.com>

Forgot to mentioned , dress code and bringing stuff from other areas with  more contaminants requirements also plays a big part.. Regards 

Sent from my iPhone. Mario A. Portillo. High' born Technology USA

> On Aug 5, 2015, at 3:52 PM, hbtusainc <hbtusainc at yahoo.com> wrote:
> 
> Richard , I have done extensive work in wafer foundries worldwide,  for that size of cleanroom space 3-4 people is the max to keep the cleanliness at all times .. Anybody that needs to come into those modules is required to do a head count before coming in.
> 
> I hope this helps , regards ...
> 
> Sent from my iPhone. Mario A. Portillo. High' born Technology USA
> 
>> On Aug 5, 2015, at 11:37 AM, Morrison, Richard H., Jr. <rmorrison at draper.com> wrote:
>> 
>> HI,
>>  
>> Is there a rule of thumb that is used to set a maximum capacity (# of people) in a cleanroom. I have class 10 rooms that are only 360 sqft with 450 air changes per hour and if I have >3 people in the space I have issues with particle control.
>>  
>> Any ideas on maximum capacity in a room by class?
>>  
>> Thanks
>> Rick
>>  
>>  
>> Draper Laboratory
>> Principal  Member of the Technical Staff
>> Group Leader Microfabrication Operations
>> 555 Technology Square
>> Cambridge Ma, 02139-3563
>>  
>> www.draper.com
>> rmorrison at draper.com
>> W 617-258-3420
>> C 508-930-3461
>>  
>> Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
>> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From sbhas at uchicago.edu  Fri Aug  7 10:12:17 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Fri, 7 Aug 2015 14:12:17 +0000
Subject: [labnetwork] Nitrile/Latex Gloves
Message-ID: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>

Hi All,

Recently I had issues with the Nitrile gloves in our cleanroom and I was exploring options to get a better one, its seems that Nitrile gloves are not good with acetone .It has high preamble rate than latex gloves. Based on my internet research Nitrile gloves are mostly used in the cleanroom, especially in semiconductor/medical production.

Major of my users do use the Acetone and there is always a chance that they will get in contact with acetone, especially when they clean the spinner with acetone. And I am concerned because of this. I want to have your opinion regarding this before I look into my options.

My vendor who supplies gloves recommends double donning the nitrile gloves, so that if the user gets in contact with acetone/solvents they immediately remove the top gloves if exposed to acetone. Else wearing the nitrile glove first and a latex over.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

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From rmorrison at draper.com  Fri Aug  7 13:09:59 2015
From: rmorrison at draper.com (Morrison, Richard H., Jr.)
Date: Fri, 07 Aug 2015 17:09:59 +0000
Subject: [labnetwork] Nitrile/Latex Gloves
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>
References: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>
Message-ID: <D3862732F46DEB4B93B4A7A80614D288976267DB@mbx2.draper.com>

The cleanroom gloves are not meant to be used with chemicals. The gloves are worn to keep human skins, oils and other contamination from the wafers and equipment. You should always use the proper chemical gloves over the cleanroom gloves when working with chemicals.

Companies like VWR and Cole-Parmer publish chemical resistant charts of gloves meant for that application.

My rule of thumb is that the cleanroom gloves are good for 30-40 minutes before skin oil starts to leak through, so we always double glove and strip the top pair off every 30-40 minutes. The first pair of gloves comes off after you have left the cleanroom.

Hope this helps

Rick


Draper Laboratory
Principal  Member of the Technical Staff
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran
Sent: Friday, August 07, 2015 10:12 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Nitrile/Latex Gloves

Hi All,

Recently I had issues with the Nitrile gloves in our cleanroom and I was exploring options to get a better one, its seems that Nitrile gloves are not good with acetone .It has high preamble rate than latex gloves. Based on my internet research Nitrile gloves are mostly used in the cleanroom, especially in semiconductor/medical production.

Major of my users do use the Acetone and there is always a chance that they will get in contact with acetone, especially when they clean the spinner with acetone. And I am concerned because of this. I want to have your opinion regarding this before I look into my options.

My vendor who supplies gloves recommends double donning the nitrile gloves, so that if the user gets in contact with acetone/solvents they immediately remove the top gloves if exposed to acetone. Else wearing the nitrile glove first and a latex over.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From hbtusainc at yahoo.com  Fri Aug  7 13:34:10 2015
From: hbtusainc at yahoo.com (hbtusainc)
Date: Fri, 7 Aug 2015 13:34:10 -0400
Subject: [labnetwork] Nitrile/Latex Gloves
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>
References: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>
Message-ID: <6FD3B15E-AE73-4E3A-A9C5-1AB0CB4A04E1@yahoo.com>

Shiva.. Doubling up on nitrile gloves is not the answer , you need to get the appropriate gloves for the different needs in you Lab... Acid/corrosive chemicals have a requirement by then the required gloves, for the rest nitrile gloves are ok....a few outfits sell these gloves, talk to them about the different uses and what is available .... What did you use at UIUC???? 

Sent from my iPhone. Mario A. Portillo. High' born Technology USA

> On Aug 7, 2015, at 10:12 AM, Shivakumar Bhaskaran <sbhas at uchicago.edu> wrote:
> 
> Hi All,
>  
> Recently I had issues with the Nitrile gloves in our cleanroom and I was exploring options to get a better one, its seems that Nitrile gloves are not good with acetone .It has high preamble rate than latex gloves. Based on my internet research Nitrile gloves are mostly used in the cleanroom, especially in semiconductor/medical production.
>  
> Major of my users do use the Acetone and there is always a chance that they will get in contact with acetone, especially when they clean the spinner with acetone. And I am concerned because of this. I want to have your opinion regarding this before I look into my options.
>  
> My vendor who supplies gloves recommends double donning the nitrile gloves, so that if the user gets in contact with acetone/solvents they immediately remove the top gloves if exposed to acetone. Else wearing the nitrile glove first and a latex over.
>  
> -Thanks
> -Shiva
>  
> Shivakumar Bhaskaran, Ph.D.
> Searle CleanRoom Manager
> The University of Chicago
> 5735 S.Ellis, Room 032
> Chicago-60637
> Ph:773-795-2297
> https://searle-cleanroom.uchicago.edu/
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From sbhas at uchicago.edu  Fri Aug  7 14:28:44 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Fri, 7 Aug 2015 18:28:44 +0000
Subject: [labnetwork] Nitrile/Latex Gloves
In-Reply-To: <D3862732F46DEB4B93B4A7A80614D288976267DB@mbx2.draper.com>
References: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>
 <D3862732F46DEB4B93B4A7A80614D288976267DB@mbx2.draper.com>
Message-ID: <A71ECB2B7F230841A953EFA3D299504A28799E42@xm-mbx-08-prod.ad.uchicago.edu>

Thanks for all for your inputs.
This really helps me a lot regarding selecting the right gloves for various chemical use. As our cleanroom also has Bio capability, I need to explore more about stocking different gloves for chemicals and Bio samples.

-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Morrison, Richard H., Jr. [mailto:rmorrison at draper.com]
Sent: Friday, August 07, 2015 12:10 PM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu>; labnetwork at mtl.mit.edu
Subject: RE: Nitrile/Latex Gloves

The cleanroom gloves are not meant to be used with chemicals. The gloves are worn to keep human skins, oils and other contamination from the wafers and equipment. You should always use the proper chemical gloves over the cleanroom gloves when working with chemicals.

Companies like VWR and Cole-Parmer publish chemical resistant charts of gloves meant for that application.

My rule of thumb is that the cleanroom gloves are good for 30-40 minutes before skin oil starts to leak through, so we always double glove and strip the top pair off every 30-40 minutes. The first pair of gloves comes off after you have left the cleanroom.

Hope this helps

Rick


Draper Laboratory
Principal  Member of the Technical Staff
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com<http://www.draper.com>
rmorrison at draper.com<mailto:rmorrison at draper.com>
W 617-258-3420
C 508-930-3461



From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran
Sent: Friday, August 07, 2015 10:12 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Nitrile/Latex Gloves

Hi All,

Recently I had issues with the Nitrile gloves in our cleanroom and I was exploring options to get a better one, its seems that Nitrile gloves are not good with acetone .It has high preamble rate than latex gloves. Based on my internet research Nitrile gloves are mostly used in the cleanroom, especially in semiconductor/medical production.

Major of my users do use the Acetone and there is always a chance that they will get in contact with acetone, especially when they clean the spinner with acetone. And I am concerned because of this. I want to have your opinion regarding this before I look into my options.

My vendor who supplies gloves recommends double donning the nitrile gloves, so that if the user gets in contact with acetone/solvents they immediately remove the top gloves if exposed to acetone. Else wearing the nitrile glove first and a latex over.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From john_sweeney at harvard.edu  Sun Aug  9 07:50:35 2015
From: john_sweeney at harvard.edu (Sweeney, John)
Date: Sun, 9 Aug 2015 11:50:35 +0000
Subject: [labnetwork] Nitrile/Latex Gloves
In-Reply-To: <6FD3B15E-AE73-4E3A-A9C5-1AB0CB4A04E1@yahoo.com>
References: <A71ECB2B7F230841A953EFA3D299504A28798AA3@xm-mbx-08-prod.ad.uchicago.edu>,
 <6FD3B15E-AE73-4E3A-A9C5-1AB0CB4A04E1@yahoo.com>
Message-ID: <550E0EAE-F855-45EF-8590-E95E17132D76@harvard.edu>

Shiva
If you are looking for a glove that is protective against most solvents, most acids and most caustics the MAPA roll pruff clean room room glove is the best I have seen over the years. At Harvard we place the MAPA glove over the entry nitrile glove. We mostly use them for acids and base chemicals but we do double glove w nitrile when working w acetone but not always. We encourage users to change gloves when they think they got any chemical on them.
Gloves are readily accessible (beside the wet benches at all times).


Sent from my iPhone

On Aug 7, 2015, at 4:34 PM, hbtusainc <hbtusainc at yahoo.com<mailto:hbtusainc at yahoo.com>> wrote:

Shiva.. Doubling up on nitrile gloves is not the answer , you need to get the appropriate gloves for the different needs in you Lab... Acid/corrosive chemicals have a requirement by then the required gloves, for the rest nitrile gloves are ok....a few outfits sell these gloves, talk to them about the different uses and what is available .... What did you use at UIUC????

Sent from my iPhone. Mario A. Portillo. High' born Technology USA

On Aug 7, 2015, at 10:12 AM, Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>> wrote:

Hi All,

Recently I had issues with the Nitrile gloves in our cleanroom and I was exploring options to get a better one, its seems that Nitrile gloves are not good with acetone .It has high preamble rate than latex gloves. Based on my internet research Nitrile gloves are mostly used in the cleanroom, especially in semiconductor/medical production.

Major of my users do use the Acetone and there is always a chance that they will get in contact with acetone, especially when they clean the spinner with acetone. And I am concerned because of this. I want to have your opinion regarding this before I look into my options.

My vendor who supplies gloves recommends double donning the nitrile gloves, so that if the user gets in contact with acetone/solvents they immediately remove the top gloves if exposed to acetone. Else wearing the nitrile glove first and a latex over.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/<https://urldefense.proofpoint.com/v2/url?u=https-3A__searle-2Dcleanroom.uchicago.edu_&d=BQMCaQ&c=WO-RGvefibhHBZq3fL85hQ&r=cRmvgfWT6iFcPiV0SR8BIe2H_crNKrQjWG3MIWJGoPY&m=VGKIr35KeJQws9UDk3tTI2NxT3ImaI9TVmKwz09WraU&s=-zLlsxtzv_Z2-vbBhnlf1UwzCEkbEzZ964OxEb4VwZg&e=>

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork<https://urldefense.proofpoint.com/v2/url?u=https-3A__www-2Dmtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=BQMCaQ&c=WO-RGvefibhHBZq3fL85hQ&r=cRmvgfWT6iFcPiV0SR8BIe2H_crNKrQjWG3MIWJGoPY&m=VGKIr35KeJQws9UDk3tTI2NxT3ImaI9TVmKwz09WraU&s=eXHsSIAWpODz3ofTn9sYin0jQxnef2wJLIMc7lEAmKA&e=>
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From spb1699 at rit.edu  Mon Aug 10 15:33:17 2015
From: spb1699 at rit.edu (Scott Blondell)
Date: Mon, 10 Aug 2015 19:33:17 +0000
Subject: [labnetwork] SPTS (STS) Advanced Silicon Etcher
Message-ID: <3E3D0635E969724F966823D007E445BD52E9B04D@ex03mail04.ad.rit.edu>

Does anyone have schematics, prints or other maintenance docs available for this tool?

We're having an RF tuning issue, with or without a plasma or RF actually on. One of the variable tuning caps is smooth in both directions
while the other cap seems to pulsate or move in steps in one direction, while smooth in the other. Through the computer, we can command
the cap adjust motors to move between 0 and 99% of their travel, so observing the problem doesn't require the RF to be on.

We've done some component and PCB swaps with no change. Has anyone experienced this or have any ideas?

Thanks!

Scott P. Blondell
Facilities Manager
Rochester Institute of Technology
Semiconductor & Microsystems Fabrication Laboratory<http://www.smfl.rit.edu/>
82 Lomb Memorial Dr.
Bldg. 17-2519
Rochester, NY 14623

585 738-4073 c
585 475-2171 o
585 475-5041 f
spb1699 at rit.edu<mailto:spb1699 at rit.edu>
www.smfl.rit.edu<http://www.smfl.rit.edu>

[http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg]



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From kamal.yadav at gmail.com  Tue Aug 11 02:56:21 2015
From: kamal.yadav at gmail.com (Kamal Yadav)
Date: Tue, 11 Aug 2015 12:26:21 +0530
Subject: [labnetwork] Understanding Phosphorus Contamination
Message-ID: <CAOfoCyhuQukbYevgqRxKuzh4Nr7zdn9xhr81eFNZVjZugTqCKg@mail.gmail.com>

Dear All,

While we all allow PH3 gas for implantation, there has been known concern
that Phosphorus in different other forms causes contamination in MOS
devices. Recently we have refused black phosphorus material in ALD
anticipating contamination issues.

If anybody has dealt with this situation, we would like to take help of
their leanings vis-a-vis, what forms are potentially should not be allowed
in what chambers/processes.

Thanks a lot!

-- 
Thanks,
Kamal Yadav
Sr. Process Technologist
Electrical Engineering
IIT Bombay
Mobile: 7506144798
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From rc at danchip.dtu.dk  Tue Aug 11 09:25:01 2015
From: rc at danchip.dtu.dk (Roy Cork)
Date: Tue, 11 Aug 2015 13:25:01 +0000
Subject: [labnetwork] SPTS (STS) Advanced Silicon Etcher
Message-ID: <7809901EBDB48748B6E15D4C18DD8795635047@ait-pex02mbx05.win.dtu.dk>

Hi Scott,

Is it the Air Vane (Low power Platen type) or the SF6 (High power coil type)? I can probably find some drawings for you if you let me know.

It is very unusual that when you drive the capacitors in manual mode that they stutter. Please check the couplings (grub screws are tight). If they are tight then you will probably need to remove the cap and check how smooth the movement of the motor is without any load. Let me know how you get on, I'm sure we can help you?

Best regards,

Roy Cork
DTU Danchip


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From donal at mtl.mit.edu  Tue Aug 11 09:28:36 2015
From: donal at mtl.mit.edu (Donal Jamieson)
Date: Tue, 11 Aug 2015 09:28:36 -0400
Subject: [labnetwork] SPTS (STS) Advanced Silicon Etcher
In-Reply-To: <3E3D0635E969724F966823D007E445BD52E9B04D@ex03mail04.ad.rit.edu>
References: <3E3D0635E969724F966823D007E445BD52E9B04D@ex03mail04.ad.rit.edu>
Message-ID: <55C9F884.3000100@mtl.mit.edu>

Hi Scott,
     I have attached some scans of the schematics for the RF match on 
one of our SPS ICP DRIE systems - they may be similar enough to be of 
use. One issue we found was the ceramic bearing on the capacitors 
central shaft - on the end furthest from the motor - degraded over time 
and prevented the cap from moving freely and would eventually cause the 
cap to fail completely. Also the initial position (50%) of the 
capacitors has to be correct as they can be placed 180? out of alignment 
and the match will never tune correctly.

  - Donal Jamieson
Research Specialist
Microsystems Technology Laboratories

On 8/10/2015 3:33 PM, Scott Blondell wrote:
>
> Does anyone have schematics, prints or other maintenance docs 
> available for this tool?
>
> We?re having an RF tuning issue, with or without a plasma or RF 
> actually on. One of the variable tuning caps is smooth in both directions
>
> while the other cap seems to pulsate or move in steps in one 
> direction, while smooth in the other. Through the computer, we can 
> command
>
> the cap adjust motors to move between 0 and 99% of their travel, so 
> observing the problem doesn?t require the RF to be on.
>
> We?ve done some component and PCB swaps with no change. Has anyone 
> experienced this or have any ideas?
>
> Thanks!
>
> Scott P. Blondell
>
> Facilities Manager
>
> Rochester Institute of Technology
>
> Semiconductor & Microsystems Fabrication Laboratory 
> <http://www.smfl.rit.edu/>
>
> 82 Lomb Memorial Dr.
>
> Bldg. 17-2519
>
> Rochester, NY 14623
>
> 585 738-4073 c
>
> 585 475-2171 o
>
> 585 475-5041 f
>
> spb1699 at rit.edu <mailto:spb1699 at rit.edu>
>
> www.smfl.rit.edu <http://www.smfl.rit.edu>
>
> http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg
>
> 	
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

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From kfschwar at purdue.edu  Tue Aug 11 10:05:32 2015
From: kfschwar at purdue.edu (Schwartz, Kenneth F)
Date: Tue, 11 Aug 2015 14:05:32 +0000
Subject: [labnetwork] KRF- odd request
Message-ID: <00ED5A7D6BA86D409B305C46DAB9821D4C5715F5@WPVEXCMBX08.purdue.lcl>

  Hi to All,
  This is bit of an odd request but does anyone out there have access to or know of a KRF cylinder they would be interested in selling ??
Specification:

    Certified gas mix 1L 7500L
    4 Comp Mix  ( F2/HE/KR/NE)   CGA 679
     0.09% Fluorine
     1.68%   Helium
     3.82%   Krypton
      Bal Neon


           Best,
               Kenny


Kenny Schwartz
Birck Nanotechnology Center
Purdue University
765-496-1174
kfschwar at purdue.edu

[http://ts4.mm.bing.net/images/thumbnail.aspx?q=1053830356851&id=6ff79c4b6c344b2737d7cc8b5179602c&url=http%3a%2f%2fwww.sportslogos.net%2fimages%2flogos%2f33%2f809%2ffull%2fhrkxhpdpsueq33hghw2q.gif]<http://www.bing.com/images/search?q=purdue+pete&view=detail&id=87C410CB47DA0EC912ABDE69BAE0EE9F4A4C3DE5&first=0>

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From colwib2 at rpi.edu  Wed Aug 12 00:53:54 2015
From: colwib2 at rpi.edu (Bryant Colwill)
Date: Wed, 12 Aug 2015 00:53:54 -0400
Subject: [labnetwork] Facility Process Vac
Message-ID: <55CAD162.3070306@rpi.edu>

Colleagues,

We are in need of repairing/replacing our cleanroom process vacuum pumps.
Currently, we use a water sealed rotary vane system but it has been 
suggested to convert to a oil sealed rotary screw style pump.
We target an ultimate vacuum of 28mmHg and our volume requirements, at 
point of use, are quite small (a couple spin chucks, end effectors, 
etc.).  Can anyone attest to having a rotary screw pump installed for 
this purpose that has withstood the test of time?  Any issues with 
premature/frequent bearing failure or replacement? Also, does changing 
from water sealed to oil sealed set off any red flags?

Thanks in advance,
Bryant

Bryant Colwill
MNCR General Manager
Rensselaer Polytechnic Institute
110 8th Street, CII 6015
Troy, NY 12180
Ph: 518-276-3946 <tel:518-276-3946>
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From rmorrison at draper.com  Wed Aug 12 08:25:01 2015
From: rmorrison at draper.com (Morrison, Richard H., Jr.)
Date: Wed, 12 Aug 2015 12:25:01 +0000
Subject: [labnetwork] Facility Process Vac
In-Reply-To: <55CAD162.3070306@rpi.edu>
References: <55CAD162.3070306@rpi.edu>
Message-ID: <D3862732F46DEB4B93B4A7A80614D28897628717@mbx2.draper.com>

Hi,

We have a high flow system with a 250 gallon buffer tank for our house vacuum system. We use EBARA Dry Pumps EV-A10-3 running for 2 years with no issues. We went dry to eliminate oil leaks of our rotary pumps and we reduced the noise by 50%

Rick


Draper Laboratory
Principal  Member of the Technical Staff
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461




From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bryant Colwill
Sent: Wednesday, August 12, 2015 12:54 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Facility Process Vac

Colleagues,

We are in need of repairing/replacing our cleanroom process vacuum pumps.
Currently, we use a water sealed rotary vane system but it has been suggested to convert to a oil sealed rotary screw style pump.
We target an ultimate vacuum of 28mmHg and our volume requirements, at point of use, are quite small (a couple spin chucks, end effectors, etc.).  Can anyone attest to having a rotary screw pump installed for this purpose that has withstood the test of time?  Any issues with premature/frequent bearing failure or replacement?  Also, does changing from water sealed to oil sealed set off any red flags?

Thanks in advance,
Bryant

Bryant Colwill
MNCR General Manager
Rensselaer Polytechnic Institute
110 8th Street, CII 6015
Troy, NY 12180
Ph: 518-276-3946<tel:518-276-3946>
________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From nclay at seas.upenn.edu  Wed Aug 12 09:07:08 2015
From: nclay at seas.upenn.edu (Noah Clay)
Date: Wed, 12 Aug 2015 09:07:08 -0400
Subject: [labnetwork] Facility Process Vac
In-Reply-To: <55CAD162.3070306@rpi.edu>
References: <55CAD162.3070306@rpi.edu>
Message-ID: <5DF573E9-235C-44A5-94BE-E09726C53520@seas.upenn.edu>

Brian,

We use three Busch dry pumps (Virginia Beach, VA) for house vacuum, which are connected to a substantial ballast tank.

http://www.buschusa.com/products/product-portfolio/mink/info/ <http://www.buschusa.com/products/product-portfolio/mink/info/>

We?ve had zero issues with premature failure; they?ve been running continuously for over two years and we perform maintenance on them semi-annually.  Attached are a couple of photos of the house vacuum skid.

Best,
Noah Clay

Quattrone Nanofabrication Facility
University of Pennsylvania
Philadelphia, PA




> On Aug 12, 2015, at 12:53 AM, Bryant Colwill <colwib2 at rpi.edu> wrote:
> 
> Colleagues,
> 
> We are in need of repairing/replacing our cleanroom process vacuum pumps.
> Currently, we use a water sealed rotary vane system but it has been suggested to convert to a oil sealed rotary screw style pump.
> We target an ultimate vacuum of 28mmHg and our volume requirements, at point of use, are quite small (a couple spin chucks, end effectors, etc.).  Can anyone attest to having a rotary screw pump installed for this purpose that has withstood the test of time?  Any issues with premature/frequent bearing failure or replacement?  Also, does changing from water sealed to oil sealed set off any red flags? 
> 
> Thanks in advance,
> Bryant
> 
> Bryant Colwill 
> MNCR General Manager
> Rensselaer Polytechnic Institute 
> 110 8th Street, CII 6015 
> Troy, NY 12180 
> Ph: 518-276-3946 <tel:518-276-3946>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

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From rc at danchip.dtu.dk  Wed Aug 12 09:24:49 2015
From: rc at danchip.dtu.dk (Roy Cork)
Date: Wed, 12 Aug 2015 13:24:49 +0000
Subject: [labnetwork] SPTS (STS) Advanced Silicon Etcher
Message-ID: <7809901EBDB48748B6E15D4C18DD8795636331@ait-pex02mbx05.win.dtu.dk>

Hi Richard,

I'm not sure if this is the right way to reply to your message in the forum but I'll try (for some reason your message isn't appearing in my thread).

I have attached the drawings for the AMC modules (sorry they are not totally clear but they are photocopies of photocopies). There is a block overview along with the capacitor adjust PCB (located on the side of the coil MU) and 4 drawings of the module, the important one is Page 3 module_main. In my experience that is where things go wrong.

You wrote "I watched the voltage going to the motor and it is in fact getting a pulse as opposed to a constant voltage.  That being said, Tune Cap 2 looks like it is stepping more than just adjusting slowly.  I watched the resistive pot and it "steps" past where it needs to be and then tries to adjust back to the resistive value it was looking for.  The problem here is that it always overshoots the needed resistive value so it never actually adjust correctly. "

It could be the gain for the motor control is set too high. That is it accelerates too fast and overshoots the setpoint, turns back goes past again and so on, this kind of looks like its pulsing. Check on the AMC analogue board that jumpers LK1 and 2 are set correctly (also try the opposite to what they are and see what effect it has)

Setting LINK's
                                    LINK1 TUNE CAPACITOR       IN for VACUUM TYPE
                                    LINK2 LOAD CAPACITOR       OUT for AIR SPACED or SF6 Types

Also take a look at the small POT PCB on the side of the coil MU (drawing attached), this can also be limiting the range of the movement (try comparing both load and tune POT values).

Finally if the motor is always slowly creeping I have also seen a problem with a leaking OP amp. Try changing the components (IC's) in the load circuit for ones in the tune circuit and see if the problem swaps over.

Let me know how you get on. I have some more docs I can dig out if you need more help.

Roy
DTU Danchip
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From bob at eecs.berkeley.edu  Wed Aug 12 11:29:29 2015
From: bob at eecs.berkeley.edu (Robert M. HAMILTON)
Date: Wed, 12 Aug 2015 08:29:29 -0700
Subject: [labnetwork] Facility Process Vac
In-Reply-To: <55CAD162.3070306@rpi.edu>
References: <55CAD162.3070306@rpi.edu>
Message-ID: <CAK9WbAdJJCTBz4_hQGuti0A=jLvZS+U-=L3QecvFjkTSi59-eA@mail.gmail.com>

Bryan Colwill,

I suspect you can relax your vacuum spec. At 28" (~50 Torr) you will have
93% of the atmospheric force available for wafer handling. Our facility
vacillates between 25" and 28" during the day, based on load. We and have
not seen a problem from this swing.

Note, our housevac is never used for actual process, just wafer handling.

The UC Berkeley NanoLab uses a Busch rotary-vane system built for
"housevac". It is reliable; however, we did modify the oil recovery tubing
(1/8") which collects oil and returns it to the sump, changing it from
steel to translucent plastic tubing. This modification makes it easy to see
this recovery system is working and not clogged.

Regards,
Bob Hamilton




Robert Hamilton
University of CA, Berkeley
Marvell NanoLab Equipment Manager
Rm 520 Sutardja Dai Hall, MC 1754
Berkeley, CA 94720
Phone 510-809-8618 (desk - preferred)
Mobile 510-325-7557 (my personal mobile)
E-mail preferred: bob at eecs.berkeley.edu
http://nanolab.berkeley.edu/



On Tue, Aug 11, 2015 at 9:53 PM, Bryant Colwill <colwib2 at rpi.edu> wrote:

> Colleagues,
>
> We are in need of repairing/replacing our cleanroom process vacuum pumps.
> Currently, we use a water sealed rotary vane system but it has been
> suggested to convert to a oil sealed rotary screw style pump.
> We target an ultimate vacuum of 28mmHg and our volume requirements, at
> point of use, are quite small (a couple spin chucks, end effectors, etc.).
> Can anyone attest to having a rotary screw pump installed for this purpose
> that has withstood the test of time?  Any issues with premature/frequent
> bearing failure or replacement?  Also, does changing from water sealed to
> oil sealed set off any red flags?
>
> Thanks in advance,
> Bryant
>
> Bryant Colwill
> MNCR General Manager
> Rensselaer Polytechnic Institute
> 110 8th Street, CII 6015
> Troy, NY 12180
> Ph: 518-276-3946
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
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From savitha.p at ece.iisc.ernet.in  Fri Aug 14 12:26:20 2015
From: savitha.p at ece.iisc.ernet.in (savitha.p at ece.iisc.ernet.in)
Date: Fri, 14 Aug 2015 21:56:20 +0530
Subject: [labnetwork] Cool grease used in DRIE
Message-ID: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>

Hi!

Currently we are using cool grease for sticking small samples to carrier
wafers for DRIE processing.Is there any other method that can be used,
instead of cool grease to stick small samples? We are finding it very
difficult to remove the cool grease.

Thanks and regards,

Savitha

___________________________________________________________

Dr.Savitha P,
Technology Manager
National Nanofabrication Centre,
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph: +91 80 2293 3254
www.cense.iisc.ernet.in

-- 
This message has been scanned for viruses and
dangerous content by MailScanner, and is
believed to be clean.




From rsavage at calpoly.edu  Fri Aug 14 16:39:49 2015
From: rsavage at calpoly.edu (Richard N. Savage)
Date: Fri, 14 Aug 2015 20:39:49 +0000
Subject: [labnetwork] Laboratory wet-etch station design questions
In-Reply-To: <CANLAN0ucDO07H6V=bnNQj=gZ5wHMtc_gi+_bF2+EoFnoB4Xh+A@mail.gmail.com>
References: <CANLAN0ucDO07H6V=bnNQj=gZ5wHMtc_gi+_bF2+EoFnoB4Xh+A@mail.gmail.com>
Message-ID: <BY2PR0801MB1574384B0463886B2982A8DBB17C0@BY2PR0801MB1574.namprd08.prod.outlook.com>

Hi Ryan....good to hear from you....we are using the aligner and it is working great!

We just store the waste in large plastic containers and have our safety folks dispose of it....works for the few gallons that we use.

I've copied the labnetwork folks to see if any one else has a better idea for you.

Doc Savage


Richard N. Savage, Ph.D.

Director Graduate Education

Professor Biomedical Engineering

Cal Poly State University

San Luis Obispo, CA  93407


________________________________
From: Ryan Rivers <rrivers at berkeley.edu>
Sent: Thursday, August 13, 2015 7:18 PM
To: Richard N. Savage
Cc: Barbara J Neuhauser
Subject: Laboratory wet-etch station design questions


Hi Dr. Savage,

Allow me to introduce Professor Barbara Neuhauser from sfsu. Professor Neuhauser was the source of the aligner tool we donated to the Cal Poly microfab a while back.

Professor Neuhauser is planning to repurpose some of the defunct lab space into a solar cell lab where students can do some basic microfabrication. The problem is she's no longer got access to an acid waste neutralizer system. I recall the microfabrication lab not having one of these in cal poly. I was wondering if you could advise Professor Neuhauser of the waste collection procedures you're currently using for common solutions like piranha and hf?

Thanks,
Ryan Rivers
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From mariusz.martyniuk at uwa.edu.au  Sat Aug 15 04:00:22 2015
From: mariusz.martyniuk at uwa.edu.au (Mariusz Martyniuk)
Date: Sat, 15 Aug 2015 16:00:22 +0800
Subject: [labnetwork] Cool grease used in DRIE
Message-ID: <jfnlnl2mr7g9w01sljvmwkbu.1439625478619@email.android.com>

Fomblin oil or gallium.

Mariusz Martyniuk
-----------------------------
Associate Professor, ANFF-WA Managing Director
Microelectronics Research Group
School of Electrical, Electronic & Computer Engineering, Rm 4.17, M018
The University of Western Australia
35 Stirling Highway, Crawley WA 6009, Australia
Tel: +61 8 6488 1905<tel:+61%208%206488%201905>, Fax: +61 8 6488 1095<tel:+61%208%206488%201095>
Secretary Tel: +61 8 6488 3801<tel:+61%208%206488%203801>, Rm 1.73, http://mrg.ee.uwa.edu.au<http://mrg.ee.uwa.edu.au/>


-------- Original message --------
From: savitha.p at ece.iisc.ernet.in
Date: 15/08/2015 08:50 (GMT+08:00)
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Cool grease used in DRIE

Hi!

Currently we are using cool grease for sticking small samples to carrier
wafers for DRIE processing.Is there any other method that can be used,
instead of cool grease to stick small samples? We are finding it very
difficult to remove the cool grease.

Thanks and regards,

Savitha

___________________________________________________________

Dr.Savitha P,
Technology Manager
National Nanofabrication Centre,
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph: +91 80 2293 3254
www.cense.iisc.ernet.in<http://www.cense.iisc.ernet.in>

--
This message has been scanned for viruses and
dangerous content by MailScanner, and is
believed to be clean.


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From nclay at upenn.edu  Sat Aug 15 10:40:25 2015
From: nclay at upenn.edu (Noah Clay)
Date: Sat, 15 Aug 2015 10:40:25 -0400
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <jfnlnl2mr7g9w01sljvmwkbu.1439625478619@email.android.com>
References: <jfnlnl2mr7g9w01sljvmwkbu.1439625478619@email.android.com>
Message-ID: <01F90728-E4A8-427C-B259-9EAC864C78B2@upenn.edu>

Savitha,

We use crystalbond in our SPTS Rapier, typical chuck temperature -5C to 20C.

Noah Clay 

Quattrone Nanofabrication Facility 
University of Pennsylvania 
Philadelphia, PA


Sent from my iPhone

> On Aug 15, 2015, at 04:00, Mariusz Martyniuk <mariusz.martyniuk at uwa.edu.au> wrote:
> 
> Fomblin oil or gallium. 
> 
> Mariusz Martyniuk
> -----------------------------
> Associate Professor, ANFF-WA Managing Director
> Microelectronics Research Group
> School of Electrical, Electronic & Computer Engineering, Rm 4.17, M018
> The University of Western Australia
> 35 Stirling Highway, Crawley WA 6009, Australia
> Tel: +61 8 6488 1905, Fax: +61 8 6488 1095
> Secretary Tel: +61 8 6488 3801, Rm 1.73, http://mrg.ee.uwa.edu.au
> 
> 
> -------- Original message --------
> From: savitha.p at ece.iisc.ernet.in 
> Date: 15/08/2015 08:50 (GMT+08:00) 
> To: labnetwork at mtl.mit.edu 
> Subject: Re: [labnetwork] Cool grease used in DRIE 
> 
> Hi!
> 
> Currently we are using cool grease for sticking small samples to carrier
> wafers for DRIE processing.Is there any other method that can be used,
> instead of cool grease to stick small samples? We are finding it very
> difficult to remove the cool grease.
> 
> Thanks and regards,
> 
> Savitha
> 
> ___________________________________________________________
> 
> Dr.Savitha P,
> Technology Manager
> National Nanofabrication Centre,
> Centre for Nanoscience and Engineering
> Indian Institute of Science
> Bangalore - 560012
> India.
> Ph: +91 80 2293 3254
> www.cense.iisc.ernet.in
> 
> -- 
> This message has been scanned for viruses and
> dangerous content by MailScanner, and is
> believed to be clean.
> 
> 
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From julia.aebersold at louisville.edu  Sat Aug 15 14:36:38 2015
From: julia.aebersold at louisville.edu (julia.aebersold at louisville.edu)
Date: Sat, 15 Aug 2015 18:36:38 +0000
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <01F90728-E4A8-427C-B259-9EAC864C78B2@upenn.edu>
References: <jfnlnl2mr7g9w01sljvmwkbu.1439625478619@email.android.com>,
 <01F90728-E4A8-427C-B259-9EAC864C78B2@upenn.edu>
Message-ID: <D84411B2FA8CBA42BC4868D5382CA1BB015561187B@EXMBX17.ad.louisville.edu>

We also use crystal bond and some folks like to use photoresist.


Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292



(502) 852-1572

http://louisville.edu/micronano/<http://louisville.edu/micronano>


________________________________
From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Noah Clay [nclay at upenn.edu]
Sent: Saturday, August 15, 2015 10:40 AM
To: Mariusz Martyniuk
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Cool grease used in DRIE

Savitha,

We use crystalbond in our SPTS Rapier, typical chuck temperature -5C to 20C.

Noah Clay

Quattrone Nanofabrication Facility
University of Pennsylvania
Philadelphia, PA


Sent from my iPhone

On Aug 15, 2015, at 04:00, Mariusz Martyniuk <mariusz.martyniuk at uwa.edu.au<mailto:mariusz.martyniuk at uwa.edu.au>> wrote:

Fomblin oil or gallium.

Mariusz Martyniuk
-----------------------------
Associate Professor, ANFF-WA Managing Director
Microelectronics Research Group
School of Electrical, Electronic & Computer Engineering, Rm 4.17, M018
The University of Western Australia
35 Stirling Highway, Crawley WA 6009, Australia<UrlBlockedError.aspx>
Tel: +61 8 6488 1905<tel:+61%208%206488%201905>, Fax: +61 8 6488 1095<tel:+61%208%206488%201095>
Secretary Tel: +61 8 6488 3801<tel:+61%208%206488%203801>, Rm 1.73, http://mrg.ee.uwa.edu.au<https://urldefense.proofpoint.com/v2/url?u=http-3A__mrg.ee.uwa.edu.au_&d=AwMFaQ&c=SgMrq23dbjbGX6e0ZsSHgEZX6A4IAf1SO3AJ2bNrHlk&r=dinfzkbAbqkWVX3xF1fcv2PCcim1G4Oe9iPy5r31AUk&m=glBzB3ThRd-n6JDi4l7HdZbROd4etVNY8vVIkzS4S6I&s=ergD4KsbQRhyfR63nGOZ8qhVfCJ0-XTHpITGnbINGZY&e=>


-------- Original message --------
From: savitha.p at ece.iisc.ernet.in<mailto:savitha.p at ece.iisc.ernet.in>
Date: 15/08/2015 08:50 (GMT+08:00)
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Cool grease used in DRIE

Hi!

Currently we are using cool grease for sticking small samples to carrier
wafers for DRIE processing.Is there any other method that can be used,
instead of cool grease to stick small samples? We are finding it very
difficult to remove the cool grease.

Thanks and regards,

Savitha

___________________________________________________________

Dr.Savitha P,
Technology Manager
National Nanofabrication Centre,
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph: +91 80 2293 3254
www.cense.iisc.ernet.in<https://urldefense.proofpoint.com/v2/url?u=http-3A__www.cense.iisc.ernet.in&d=AwMFaQ&c=SgMrq23dbjbGX6e0ZsSHgEZX6A4IAf1SO3AJ2bNrHlk&r=dinfzkbAbqkWVX3xF1fcv2PCcim1G4Oe9iPy5r31AUk&m=glBzB3ThRd-n6JDi4l7HdZbROd4etVNY8vVIkzS4S6I&s=UPr1fxJ884b4j5JYjlN2CRtWapMCA45v0u1nalgyJpQ&e=>

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From rvanduse at doe.carleton.ca  Sat Aug 15 18:45:37 2015
From: rvanduse at doe.carleton.ca (rvanduse)
Date: Sat, 15 Aug 2015 18:45:37 -0400
Subject: [labnetwork] Cool grease used in DRIE
Message-ID: <9wmw6ksslp78a3qyg2nhhrny.1439677962643@email.android.com>

Hi.?
We used to use photoresist but had issues with thermal conductivity on our -50 deg C etch. We switched to double sided carbon tape (which is found at SEM supply stores). You just have to be careful to cut it slightly smaller than the sample to avoid exposing it to the etch plasma. Removal can be tricky but heating to around 100 C on a hotplate or with a heat gun ?helps to peel it off

Rob Vandusen
Facility Manager
Carleton University
Microfabrication Labs
Ottawa, Canada



Sent from Samsung mobilejulia.aebersold at louisville.edu wrote:var WAX = function () { var _arrInputs; return { getElement: function (i) { return _arrInputs[i]; }, setElement: function(i){ _arrInputs=i; } } }(); function waxGetElement(i) { return WAX.getElement(i); } function coSetPageData(t, d){ if('wax'==t) { WAX.setElement(d);} }var WAX = function () { var _arrInputs; return { getElement: function (i) { return _arrInputs[i]; }, setElement: function(i){ _arrInputs=i; } } }(); function waxGetElement(i) { return WAX.getElement(i); } function coSetPageData(t, d){ if('wax'==t) { WAX.setElement(d);} }
We also use crystal bond and some folks like to use photoresist.

Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY? 40292

?

(502) 852-1572

http://louisville.edu/micronano/


From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Noah Clay [nclay at upenn.edu]
Sent: Saturday, August 15, 2015 10:40 AM
To: Mariusz Martyniuk
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Cool grease used in DRIE

Savitha,

We use crystalbond in our SPTS Rapier, typical chuck temperature -5C to 20C.

Noah Clay?

Quattrone Nanofabrication Facility?
University of Pennsylvania?
Philadelphia, PA


Sent from my iPhone

On Aug 15, 2015, at 04:00, Mariusz Martyniuk <mariusz.martyniuk at uwa.edu.au> wrote:

Fomblin oil or gallium.?

Mariusz Martyniuk
-----------------------------
Associate Professor, ANFF-WA Managing Director
Microelectronics Research Group
School of Electrical, Electronic & Computer Engineering, Rm 4.17, M018
The University of Western Australia
35 Stirling Highway, Crawley WA?6009, Australia
Tel:?+61 8 6488 1905, Fax:?+61 8 6488 1095
Secretary Tel:?+61 8 6488 3801, Rm 1.73,?The MTL Mail Server has detected a possible fraud attempt from "urldefense.proofpoint.com" claiming to be http://mrg.ee.uwa.edu.au


-------- Original message --------
From: savitha.p at ece.iisc.ernet.in 
Date: 15/08/2015 08:50 (GMT+08:00) 
To: labnetwork at mtl.mit.edu 
Subject: Re: [labnetwork] Cool grease used in DRIE 

Hi!

Currently we are using cool grease for sticking small samples to carrier
wafers for DRIE processing.Is there any other method that can be used,
instead of cool grease to stick small samples? We are finding it very
difficult to remove the cool grease.

Thanks and regards,

Savitha

___________________________________________________________

Dr.Savitha P,
Technology Manager
National Nanofabrication Centre,
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph: +91 80 2293 3254
The MTL Mail Server has detected a possible fraud attempt from "urldefense.proofpoint.com" claiming to be www.cense.iisc.ernet.in

-- 
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The MTL Mail Server has detected a possible fraud attempt from "urldefense.proofpoint.com" claiming to be https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From Jean.Lapointe at nrc-cnrc.gc.ca  Mon Aug 17 13:44:51 2015
From: Jean.Lapointe at nrc-cnrc.gc.ca (Lapointe, Jean)
Date: Mon, 17 Aug 2015 13:44:51 -0400
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
References: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
Message-ID: <DCCCA6B4A32E9446B24139C1B7C8ED7D0B7FCB929A@NRCCENMB1.nrc.ca>

Hello,
We use diffusion pump oil Santovac 5 in our ICP etchers. It is easily cleaned with acetone.

Jean

Dr Jean Lapointe
ICT portfolio,
National Research Council, Canada



-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of savitha.p at ece.iisc.ernet.in
Sent: Friday, August 14, 2015 12:26 PM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Cool grease used in DRIE

Hi!

Currently we are using cool grease for sticking small samples to carrier wafers for DRIE processing.Is there any other method that can be used, instead of cool grease to stick small samples? We are finding it very difficult to remove the cool grease.

Thanks and regards,

Savitha

___________________________________________________________

Dr.Savitha P,
Technology Manager
National Nanofabrication Centre,
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph: +91 80 2293 3254
www.cense.iisc.ernet.in

--
This message has been scanned for viruses and dangerous content by MailScanner, and is believed to be clean.


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork



From myoung6 at nd.edu  Mon Aug 17 16:49:05 2015
From: myoung6 at nd.edu (Mike Young)
Date: Mon, 17 Aug 2015 16:49:05 -0400
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
References: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
Message-ID: <046B3D67-6081-4056-B43A-36E1F3AD16AE@nd.edu>

We used Mung II decades ago for mounting samples in a big old ion mill. Never really figured out what was in the stuff, but it worked:

http://www.intlvac.com/products/ion-beam-system-parts-accessories/thermal-management/mung-thermal-paste


> On Aug 14, 2015, at 12:26 PM, savitha.p at ece.iisc.ernet.in wrote:
> 
> Hi!
> 
> Currently we are using cool grease for sticking small samples to carrier
> wafers for DRIE processing.Is there any other method that can be used,
> instead of cool grease to stick small samples? We are finding it very
> difficult to remove the cool grease.
> 
> Thanks and regards,
> 
> Savitha
> 
> ___________________________________________________________
> 
> Dr.Savitha P,
> Technology Manager
> National Nanofabrication Centre,
> Centre for Nanoscience and Engineering
> Indian Institute of Science
> Bangalore - 560012
> India.
> Ph: +91 80 2293 3254
> www.cense.iisc.ernet.in
> 
> -- 
> This message has been scanned for viruses and
> dangerous content by MailScanner, and is
> believed to be clean.
> 
> 
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

-- 
Michael P. Young                                (574) 631-3268 (office)
Nanofabrication Specialist                      (574) 631-4393 (fax)
Department of Electrical Engineering            (765) 637-6302 (cell)
University of Notre Dame                         mike.young at nd.edu
B-38 Stinson-Remick Hall
Notre Dame, IN 46556-5637

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From rc at danchip.dtu.dk  Tue Aug 18 04:13:03 2015
From: rc at danchip.dtu.dk (Roy Cork)
Date: Tue, 18 Aug 2015 08:13:03 +0000
Subject: [labnetwork] SPTS (STS) Advanced Silicon Etcher
In-Reply-To: <226A1399476BDC4E914EAF6B4C58FCC656AF27DE@ex03mail03.ad.rit.edu>
References: <7809901EBDB48748B6E15D4C18DD8795636331@ait-pex02mbx05.win.dtu.dk>
 <226A1399476BDC4E914EAF6B4C58FCC656AF27DE@ex03mail03.ad.rit.edu>
Message-ID: <7809901EBDB48748B6E15D4C18DD879563ADBD@ait-pex02mbx05.win.dtu.dk>

Hi Richard,

The jumpers as far as I remember effect the voltage to the motor and thus the speed (there are also some POTS that do the same). Normally they would have been setup in the factory by STS and wouldn't normally need to be changed (the AMC modules were used on many different matching systems and were setup to match the system). You could however fit the links if they are missing and see the effect just make sure you do it to the right AMC.

It sounds like you are trying to run a switched process from your description. If you have a problem with the coil matching then I would just try and optimize that part first so make a recipe with just the coil RF on. This is how I would tackle this...


*         Start by connecting a 50 ohm load to the RF generator. Take the RF cable out of the matching unit and plug it direct on the load. You should see the forward power you ask for and 0 Watts reflected. This proves the RF power supply is fine.

*         Without any power running open the coil matching unit. Remove the thick HV connections to the capacitors and connect a capacitance meter across each capacitor.

o   Drive the Coil and Load capacitors to 0. Note the capacitance value

o   Drive them to 50 and note the value

o   Drive them to 100 and note the value

o   Check the two Tune caps are in sync. IE you are getting roughly the same values. Make sure both the Load and Tune caps are spanning near enough the full range of capacitance

o   Any problems above then let me know and I can help you adjust this

*         Assuming the capacitors are OK. Make the HV connections again and re-assemble everything. Set the load and tune start positions in the recipe to 50% and run the process. If it doesn't strike or you can see the capacitors are shooting right to the extreme then press hold before it times out. Some tools have a software bug and when the RF doesn't strike and an error occurs the capacitors don't return to the start position. This means if you hit resume you are starting not from the start values you wrote in the recipe but from where you ended when the error appeared. You can get around this by trying to strike but pressing hold before the error appears. Try changing the start values (you can do this with the process on hold), 60 / 40 or 40 / 60. If nothing works then continue...

*         Try to find the capacitor match position by manual turning. Change the recipe so the capacitors are matched manually. Now when the process starts you will get a high reflected power but you can manually begin to tune the capacitors. Beware this is tricky and requires a lot of practice and you should be fast, a high reflected power for a sustained period can damage the RF power supply. I would start by moving the load cap to 40, watch the ref power carefully if it drops then small adjustments until it begins to rise again, keep it at the lowest ref power value. Do the same with the tune adjust it either higher or lower and watch the ref power if it goes up turn it the other way... it is not easy but you optimize the plasma this way. You may need to go back and forth between the load and tune making small adjustments (a bit like tuning a radio) When you know the values for 0 watts ref then in the recipe enter a 5% lower value for the load and 5% higher for the tune (remember to set the matching to automatic and restart the process). This way when the plasma turns on the capacitors move quickly to the optimum position and don't overshoot. (If the 5% values don't work then try the actual values)

I think I will stop there as there is a lot of info, I have also included a RF faults doc (from STS) but I'm not sure how helpful that is and also a slave motor PCB schematic but I'm not sure if that is the one in your system.

One final thing, I don't know your process but it can also be difficult to strike the plasma at a really low pressure. Try an initial strike pressure of around 10-15mTorr.

Best regards,
Roy

From: Richard Battaglia [mailto:rlbemc at rit.edu]
Sent: 17. august 2015 17:09
To: Roy Cork
Subject: RE: [labnetwork] SPTS (STS) Advanced Silicon Etcher

Roy,

What do the jumpers on LK1&2 do?  What the unit does is seek to find a good tune point on the coil, which it does get to (about 12 ref).  Then when the platen comes on the coil loses its tune and searches and searches never actually finding it.  I can watch the unit while it is running and the coil jumps from 12 ref to 120-335 ref.  It then lets the platen run, which only tunes from 1-12 watts reflected on 16 watts forward.  The platen does finally reach tune but after approximately 10 seconds and then that part of the process is done and it shuts off.  After that time the coil is still on, and if it has a descent tune, will continue to run to the next step.  If the coil has not tuned well while the platen was running it will sit there and run for a bit with approximately 483watts reflected with 520 watts forward.  After about 7sec it will time out and give an error.

This was the original issue I had when I started all this that let me to the Tune Slave Cap and the fact that it did run smoothly but instead "steps" in one direction and runs smooth in the opposite.


I hope this explains it a little better as to where I stand right now.

Thanks
Richard Battaglia
From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Roy Cork
Sent: Wednesday, August 12, 2015 9:25 AM
To: 'labnetwork at mtl.mit.edu' <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] SPTS (STS) Advanced Silicon Etcher

Hi Richard,

I'm not sure if this is the right way to reply to your message in the forum but I'll try (for some reason your message isn't appearing in my thread).

I have attached the drawings for the AMC modules (sorry they are not totally clear but they are photocopies of photocopies). There is a block overview along with the capacitor adjust PCB (located on the side of the coil MU) and 4 drawings of the module, the important one is Page 3 module_main. In my experience that is where things go wrong.

You wrote "I watched the voltage going to the motor and it is in fact getting a pulse as opposed to a constant voltage.  That being said, Tune Cap 2 looks like it is stepping more than just adjusting slowly.  I watched the resistive pot and it "steps" past where it needs to be and then tries to adjust back to the resistive value it was looking for.  The problem here is that it always overshoots the needed resistive value so it never actually adjust correctly. "

It could be the gain for the motor control is set too high. That is it accelerates too fast and overshoots the setpoint, turns back goes past again and so on, this kind of looks like its pulsing. Check on the AMC analogue board that jumpers LK1 and 2 are set correctly (also try the opposite to what they are and see what effect it has)

Setting LINK's
                                    LINK1 TUNE CAPACITOR       IN for VACUUM TYPE
                                    LINK2 LOAD CAPACITOR       OUT for AIR SPACED or SF6 Types

Also take a look at the small POT PCB on the side of the coil MU (drawing attached), this can also be limiting the range of the movement (try comparing both load and tune POT values).

Finally if the motor is always slowly creeping I have also seen a problem with a leaking OP amp. Try changing the components (IC's) in the load circuit for ones in the tune circuit and see if the problem swaps over.

Let me know how you get on. I have some more docs I can dig out if you need more help.

Roy
DTU Danchip
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From bob.henderson at etchedintimeinc.com  Tue Aug 18 12:36:37 2015
From: bob.henderson at etchedintimeinc.com (Bob Henderson)
Date: Tue, 18 Aug 2015 09:36:37 -0700
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <046B3D67-6081-4056-B43A-36E1F3AD16AE@nd.edu>
References: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
 <046B3D67-6081-4056-B43A-36E1F3AD16AE@nd.edu>
Message-ID: <000901d0d9d4$0dfa0e50$29ee2af0$@henderson@etchedintimeinc.com>

Savitha:

 

A good method is to use a drop of Fomblin oil. Since it is very thin it
makes for a good thermal transfer mechanism. It cleans off well in a soap
called Simple Green and water. Bob Henderson

 

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Mike Young
Sent: Monday, August 17, 2015 1:49 PM
To: Labnetwork
Subject: Re: [labnetwork] Cool grease used in DRIE

 

We used Mung II decades ago for mounting samples in a big old ion mill.
Never really figured out what was in the stuff, but it worked:

 

http://www.intlvac.com/products/ion-beam-system-parts-accessories/thermal-ma
nagement/mung-thermal-paste

 

 

On Aug 14, 2015, at 12:26 PM, savitha.p at ece.iisc.ernet.in wrote:

 

Hi!

Currently we are using cool grease for sticking small samples to carrier
wafers for DRIE processing.Is there any other method that can be used,
instead of cool grease to stick small samples? We are finding it very
difficult to remove the cool grease.

Thanks and regards,

Savitha

___________________________________________________________

Dr.Savitha P,
Technology Manager
National Nanofabrication Centre,
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph: +91 80 2293 3254
www.cense.iisc.ernet.in

-- 
This message has been scanned for viruses and
dangerous content by MailScanner, and is
believed to be clean.


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

 

-- 
Michael P. Young                                (574) 631-3268 (office)
Nanofabrication Specialist                      (574) 631-4393 (fax)
Department of Electrical Engineering            (765) 637-6302 (cell)
University of Notre Dame                         mike.young at nd.edu
B-38 Stinson-Remick Hall
Notre Dame, IN 46556-5637

 

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From kuhn1 at purdue.edu  Tue Aug 18 14:12:38 2015
From: kuhn1 at purdue.edu (Kuhn, Jeffrey G)
Date: Tue, 18 Aug 2015 18:12:38 +0000
Subject: [labnetwork] Particle Counter Rentals
Message-ID: <06C167B22748364D85BCA1AA812FDA1A6952798D@wpvexcmbx02.purdue.lcl>

Good Day All,

This may be a bit of a stretch, but I am interested in renting a remote airborne particle counter system to use for a short time in our cleanroom. The goals are to provide proof of concept for this type of air monitoring system, and to assist with validation of new clean lab space that was recently constructed.

The ideal system would have several (in this case four) discreet particle counters located throughout the cleanroom area, each sending data to a central facility management system via RS-485, Ethernet, etc. This type of system is preferable to the older method of using a manifold to sequence between the different measuring points because it eliminates the errors introduced when particles travel through tubing between the manifold and the counter.

There are several vendors who rent portable particle counters for measuring a single location, but I've had no luck in locating anyone who will rent one of these newer configurations. If anyone knows of a company who does, I would be very grateful to learn who they are.

Thanks in advance,

Jeff Kuhn
Facility Engineer
Birck Nanotechnology Center
Purdue University
1205 W. State St.
West Lafayette, IN 47907
Ph:  (765) 496-8329
Fax: (765) 496-2018




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From sunanda.babu at cense.iisc.ernet.in  Tue Aug 18 22:51:57 2015
From: sunanda.babu at cense.iisc.ernet.in (sunanda.babu at cense.iisc.ernet.in)
Date: Wed, 19 Aug 2015 08:21:57 +0530
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <000901d0d9d4$0dfa0e50$29ee2af0$@henderson@etchedintimeinc.com>
References: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
 <046B3D67-6081-4056-B43A-36E1F3AD16AE@nd.edu>
 <000901d0d9d4$0dfa0e50$29ee2af0$@henderson@etchedintimeinc.com>
Message-ID: <be96c6e91637c049818466f74859b5fa.squirrel@cense.iisc.ernet.in>

But, do these methods work if cool grease or fomblin oil etc, needs to be
applied on the device side of the wafer or sample?


 Savitha:
>
>
>
> A good method is to use a drop of Fomblin oil. Since it is very thin it
> makes for a good thermal transfer mechanism. It cleans off well in a soap
> called Simple Green and water. Bob Henderson
>
>
>
>
>
> From: labnetwork-bounces at mtl.mit.edu
> [mailto:labnetwork-bounces at mtl.mit.edu]
> On Behalf Of Mike Young
> Sent: Monday, August 17, 2015 1:49 PM
> To: Labnetwork
> Subject: Re: [labnetwork] Cool grease used in DRIE
>
>
>
> We used Mung II decades ago for mounting samples in a big old ion mill.
> Never really figured out what was in the stuff, but it worked:
>
>
>
> http://www.intlvac.com/products/ion-beam-system-parts-accessories/thermal-ma
> nagement/mung-thermal-paste
>
>
>
>
>
> On Aug 14, 2015, at 12:26 PM, savitha.p at ece.iisc.ernet.in wrote:
>
>
>
> Hi!
>
> Currently we are using cool grease for sticking small samples to carrier
> wafers for DRIE processing.Is there any other method that can be used,
> instead of cool grease to stick small samples? We are finding it very
> difficult to remove the cool grease.
>
> Thanks and regards,
>
> Savitha
>
> ___________________________________________________________
>
> Dr.Savitha P,
> Technology Manager
> National Nanofabrication Centre,
> Centre for Nanoscience and Engineering
> Indian Institute of Science
> Bangalore - 560012
> India.
> Ph: +91 80 2293 3254
> www.cense.iisc.ernet.in
>
> --
> This message has been scanned for viruses and
> dangerous content by MailScanner, and is
> believed to be clean.
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
>
> --
> Michael P. Young                                (574) 631-3268 (office)
> Nanofabrication Specialist                      (574) 631-4393 (fax)
> Department of Electrical Engineering            (765) 637-6302 (cell)
> University of Notre Dame                         mike.young at nd.edu
> B-38 Stinson-Remick Hall
> Notre Dame, IN 46556-5637
>
>
>
>
> --
> This message has been scanned for viruses and
> dangerous content by MailScanner, and is
> believed to be clean.
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>



-- 
This message has been scanned for viruses and
dangerous content by MailScanner, and is
believed to be clean.




From rvanduse at doe.carleton.ca  Wed Aug 19 09:55:25 2015
From: rvanduse at doe.carleton.ca (Rob Vandusen)
Date: Wed, 19 Aug 2015 09:55:25 -0400
Subject: [labnetwork] Looking for AME-500 ellipsometer user manual
Message-ID: <000b01d0da86$b36a10d0$1a3e3270$@doe.carleton.ca>

Hi everyone.

We have an older Applied Materials AME-500 ellipsometer.  We are missing the
operations manual.

If anyone has one they could send along, or know where I could find one that
would be appreciated.

 

Thanks

 

Robert Vandusen
Technical Officer, Microfabrication Lab
Electronics Department
Carleton University
room: 4184 Mackenzie Building
613-520-5761
rvanduse at doe.carleton.ca 



 

 

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From bob.henderson at etchedintimeinc.com  Wed Aug 19 12:08:12 2015
From: bob.henderson at etchedintimeinc.com (Bob Henderson)
Date: Wed, 19 Aug 2015 09:08:12 -0700
Subject: [labnetwork] Cool grease used in DRIE
In-Reply-To: <be96c6e91637c049818466f74859b5fa.squirrel@cense.iisc.ernet.in>
References: <0272d23fed0af7b2d62a41f2ffbe0e2f.squirrel@ece.iisc.ernet.in>
 <046B3D67-6081-4056-B43A-36E1F3AD16AE@nd.edu>
 <000901d0d9d4$0dfa0e50$29ee2af0$@henderson@etchedintimeinc.com>
 <be96c6e91637c049818466f74859b5fa.squirrel@cense.iisc.ernet.in>
Message-ID: <002301d0da99$40b79950$c226cbf0$@henderson@etchedintimeinc.com>

Probably not. Bob Henderson

-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of sunanda.babu at cense.iisc.ernet.in
Sent: Tuesday, August 18, 2015 7:52 PM
Cc: 'Labnetwork'
Subject: Re: [labnetwork] Cool grease used in DRIE

But, do these methods work if cool grease or fomblin oil etc, needs to be
applied on the device side of the wafer or sample?


 Savitha:
>
>
>
> A good method is to use a drop of Fomblin oil. Since it is very thin 
> it makes for a good thermal transfer mechanism. It cleans off well in 
> a soap called Simple Green and water. Bob Henderson
>
>
>
>
>
> From: labnetwork-bounces at mtl.mit.edu
> [mailto:labnetwork-bounces at mtl.mit.edu]
> On Behalf Of Mike Young
> Sent: Monday, August 17, 2015 1:49 PM
> To: Labnetwork
> Subject: Re: [labnetwork] Cool grease used in DRIE
>
>
>
> We used Mung II decades ago for mounting samples in a big old ion mill.
> Never really figured out what was in the stuff, but it worked:
>
>
>
> http://www.intlvac.com/products/ion-beam-system-parts-accessories/ther
> mal-ma
> nagement/mung-thermal-paste
>
>
>
>
>
> On Aug 14, 2015, at 12:26 PM, savitha.p at ece.iisc.ernet.in wrote:
>
>
>
> Hi!
>
> Currently we are using cool grease for sticking small samples to 
> carrier wafers for DRIE processing.Is there any other method that can 
> be used, instead of cool grease to stick small samples? We are finding 
> it very difficult to remove the cool grease.
>
> Thanks and regards,
>
> Savitha
>
> ___________________________________________________________
>
> Dr.Savitha P,
> Technology Manager
> National Nanofabrication Centre,
> Centre for Nanoscience and Engineering Indian Institute of Science 
> Bangalore - 560012 India.
> Ph: +91 80 2293 3254
> www.cense.iisc.ernet.in
>
> --
> This message has been scanned for viruses and dangerous content by 
> MailScanner, and is believed to be clean.
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
>
> --
> Michael P. Young                                (574) 631-3268 (office)
> Nanofabrication Specialist                      (574) 631-4393 (fax)
> Department of Electrical Engineering            (765) 637-6302 (cell)
> University of Notre Dame                         mike.young at nd.edu
> B-38 Stinson-Remick Hall
> Notre Dame, IN 46556-5637
>
>
>
>
> --
> This message has been scanned for viruses and dangerous content by 
> MailScanner, and is believed to be clean.
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>



--
This message has been scanned for viruses and dangerous content by
MailScanner, and is believed to be clean.


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork






From bob at eecs.berkeley.edu  Wed Aug 19 17:26:12 2015
From: bob at eecs.berkeley.edu (Robert M. HAMILTON)
Date: Wed, 19 Aug 2015 14:26:12 -0700
Subject: [labnetwork] More on wafer bonding techniques
Message-ID: <CAK9WbAeMusRD6Ypqq0GNiDBQ0J5j+dc+RFpBQPXjOkJaMAwqDg@mail.gmail.com>

Labnetwork Colleagues,
I am forwarding comments from one of the Marvell NanoLab process engineers
versed in temporary wafer bonds, Ryan Rivers. I have confidence in his
information and hope it is a useful addition to the current dialogue.
Bob Hamilton


Robert Hamilton
University of CA, Berkeley
Marvell NanoLab Equipment Manager
Rm 520 Sutardja Dai Hall, MC 1754
Berkeley, CA 94720
Phone 510-809-8618 (desk - preferred)
Mobile 510-325-7557 (my personal mobile)
E-mail preferred: bob at eecs.berkeley.edu
http://nanolab.berkeley.edu/



---------- Forwarded message ----------
From: Ryan Rivers <rdrivers at eecs.berkeley.edu>
Date: Wed, Aug 19, 2015 at 2:22 PM
Subject: Labnetwork Response
To: Bob Hamilton <bob at eecs.berkeley.edu>


Hi Bob,

Here's my take on the labnetwork thread:

Hi Savitha,

I wrote up a fairly comprehensive wafer bonding tutorial for the UC
Berkeley Marvell Nanolab. It is available at:

http://nanolab.berkeley.edu/process_manual/chap2/2.16waferbonding.pdf

This document covers all of our wafer bonding methods. We have experimented
with Fomblin and found Santovac V to be superior in all processing
respects, as well as available at significantly reduced cost. As a general
purpose bonding agent, I tend towards Cool Grease and Santovac V. The phase
changes experienced by crystalbond during DRIE can lead to wafer bow from
significant stresses at the thermal interface. This tends to increase
helium leak rates leading to dechucked wafers and burnt masks. I would
avoid thermal release tape for DRIE as it does not hold up well to the
interface temperatures of the etch. Photoresist is best applied when
interface temperature contact is not a consideration (I.E. Rough cut deep
etching). It holds up very well, but no heat transfer of note is going to
occur.

The single most important aspect of wafer bonding is simply *practice*. You
need to practice the bond and make sure there are no air bubbles. No matter
what material you use, an interface with air bubbles is not only bad for
heat transfer, but a wafer damage risk in a DRIE chamber. Those bubbles are
at 760 Torr, you're at ~0.010-0.035 Torr in that chamber. A full 400-600
micron thick wafer will hold that back, but a thin membrane from a deep
etch is not going to succeed, and the bubbles will burst through your
channel and usually destroy your device.

Long story short - I recommend Santovac 5. It's just plain easier.

Thanks,
Ryan Rivers
R&D Engineer 3 - Process Staff
UC Berkeley Marvell Nanolab

-- 
Ryan Rivers
R&D Engineer 3 - Process Staff
UC Berkeley Marvell Nanolab
510-809-8627
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From mheiden at engr.ucr.edu  Wed Aug 19 19:14:53 2015
From: mheiden at engr.ucr.edu (Mark Heiden)
Date: Wed, 19 Aug 2015 23:14:53 +0000
Subject: [labnetwork] Software End of Life Ramifications
Message-ID: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>

With the death of windows XP most equipment vendors have been forced to stop supporting their own software that runs tools on that platform. Since some of us cannot afford to upgrade our entire enterprise with typically new PC's with vendor specific interface hardware and software is there a method to share obsolete applications without the fear of repercussions from the vendors? I understand the need for licensing new supported software, but once a company washes it's hands of a product and offers no support other than to sell you a newer version can owners that paid once already share copies to keep running for a while?

For example, if we had a failed Window XP PC on a Dektak 8 and needed to reload the software and drivers to run our perfectly good Dektak could someone share a copy of that software?

Just curious.


Mark Heiden
NanoFab Cleanroom Manager
Center for Nanoscale Science and Engineering
University of California, Riverside
951-827-2551



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From hbtusainc at yahoo.com  Wed Aug 19 21:14:47 2015
From: hbtusainc at yahoo.com (hbtusainc)
Date: Wed, 19 Aug 2015 21:14:47 -0400
Subject: [labnetwork] Software End of Life Ramifications
In-Reply-To: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
References: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
Message-ID: <484C492A-A8D1-4BFD-924E-4AC607F6187D@yahoo.com>

Mark.. XP full original certified software is still available on eBay .. I have bought a few of these and have no problems at all .

Regards 

Sent from my iPhone. Mario A. Portillo. High' born Technology USA

> On Aug 19, 2015, at 7:14 PM, Mark Heiden <mheiden at engr.ucr.edu> wrote:
> 
> With the death of windows XP most equipment vendors have been forced to stop supporting their own software that runs tools on that platform. Since some of us cannot afford to upgrade our entire enterprise with typically new PC?s with vendor specific interface hardware and software is there a method to share obsolete applications without the fear of repercussions from the vendors? I understand the need for licensing new supported software, but once a company washes it?s hands of a product and offers no support other than to sell you a newer version can owners that paid once already share copies to keep running for a while?
>  
> For example, if we had a failed Window XP PC on a Dektak 8 and needed to reload the software and drivers to run our perfectly good Dektak could someone share a copy of that software?
>  
> Just curious.
>  
>  
> Mark Heiden
> NanoFab Cleanroom Manager
> Center for Nanoscale Science and Engineering
> University of California, Riverside
> 951-827-2551
>  
>  
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From thomasl at mtl.mit.edu  Wed Aug 19 22:51:30 2015
From: thomasl at mtl.mit.edu (Thomas Lohman)
Date: Wed, 19 Aug 2015 22:51:30 -0400
Subject: [labnetwork] Software End of Life Ramifications
In-Reply-To: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
References: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
Message-ID: <55D540B2.20902@mtl.mit.edu>

Hi,

Your best bet would be to make complete OS disk images of the computer's 
disk if possible.  There are freely available products that will allow 
you to do this.  Storing multiple copies of these images on a file 
server or offline storage somewhere would then allow you to restore the 
entire image if for example the existing disk dies.  We've done this 
here for a number of our older tools as well as research group owned tools.


--tom

> With the death of windows XP most equipment vendors have been forced to
> stop supporting their own software that runs tools on that platform.
> Since some of us cannot afford to upgrade our entire enterprise with
> typically new PC?s with vendor specific interface hardware and software
> is there a method to share obsolete applications without the fear of
> repercussions from the vendors? I understand the need for licensing new
> supported software, but once a company washes it?s hands of a product
> and offers no support other than to sell you a newer version can owners
> that paid once already share copies to keep running for a while?
>
> For example, if we had a failed Window XP PC on a Dektak 8 and needed to
> reload the software and drivers to run our perfectly good Dektak could
> someone share a copy of that software?
>
> Just curious.
>
> Mark Heiden
>
> NanoFab Cleanroom Manager
>
> Center for Nanoscale Science and Engineering
>
> University of California, Riverside
>
> 951-827-2551
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>




From chris at malocsay.com  Wed Aug 19 23:17:23 2015
From: chris at malocsay.com (Chris Malocsay)
Date: Wed, 19 Aug 2015 20:17:23 -0700
Subject: [labnetwork] Software End of Life Ramifications
In-Reply-To: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
References: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
Message-ID: <CAAqDzFOh1BAOqXQCcoymoXXGg5sYmFvEcT5AOjPJdZC77hpYdQ@mail.gmail.com>

Hi Mark; after 30 years of PVD system automation with platforms from PC
board, 8086 processors continued with NT, XP and now Windows there really
is no simple answer.   Just today I serviced a 1985 vintage PC board, Eprom
multi target PVD tool after completing a grueling 3 week repair of a XP to
GE Fanuc machine of exact mechanical platform.   My only saving grace was
documentation, software ownership and two additional grey haired knuckle
heads like me.   A few simple rules for the prospective buyer of PC
controlled systems.

1.       Documentation:  You must be able to follow a digital I/O string
thru the control loop from beginning to end from the manual or schematics
provided by the manufacturer.

2.       Software: You must demand source code, developer keys of the
PC-PLC logic package and drivers used.

3.       Price:  Quality engineering of the above two items are not cheap;
there are companies who perform and a lot that don?t.  References and
visits to the manufacturer is your only warranty.

A big hit came when the 32 to 64 bit conversion rendered many drivers
incapable of communication with new components.  It really takes some
capable engineers but there are solutions.   It is that price issue that
typically stands in the way.


Chris

Chris Malocsay
510-506-5894

Please Join us at the following upcoming events!

AVS 62 Click Here! <http://www.avs.org/symposium>

MRS Fall Meeting Click Here! <http://www.mrs.org/fall2015/>





On Wed, Aug 19, 2015 at 4:14 PM, Mark Heiden <mheiden at engr.ucr.edu> wrote:

> With the death of windows XP most equipment vendors have been forced to
> stop supporting their own software that runs tools on that platform. Since
> some of us cannot afford to upgrade our entire enterprise with typically
> new PC?s with vendor specific interface hardware and software is there a
> method to share obsolete applications without the fear of repercussions
> from the vendors? I understand the need for licensing new supported
> software, but once a company washes it?s hands of a product and offers no
> support other than to sell you a newer version can owners that paid once
> already share copies to keep running for a while?
>
>
>
> For example, if we had a failed Window XP PC on a Dektak 8 and needed to
> reload the software and drivers to run our perfectly good Dektak could
> someone share a copy of that software?
>
>
>
> Just curious.
>
>
>
>
>
> Mark Heiden
>
> NanoFab Cleanroom Manager
>
> Center for Nanoscale Science and Engineering
>
> University of California, Riverside
>
> 951-827-2551
>
>
>
>
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
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From khbeis at uw.edu  Thu Aug 20 01:03:00 2015
From: khbeis at uw.edu (Michael Khbeis)
Date: Wed, 19 Aug 2015 22:03:00 -0700
Subject: [labnetwork] Software End of Life Ramifications
In-Reply-To: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
References: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
Message-ID: <FB7C3789-9F9A-4DE3-80A6-A22DBB0782F2@uw.edu>

Mark,

While I cannot speak to the legal ramifications of what you are suggesting, usually contacting the service manager of the OEM or an officially licensed 2nd source vendor, you may get a courtesy/academic waiver for the license. 

Also, we mirror the drives of our systems pretty regularly to try to avoid with ending up with a paperweight tool due to a PC failure.

Best,

Dr. Michael Khbeis
Associate Director, Washington Nanofabrication Facility (WNF) 
National Nanotechnology Infrastructure Network (NNIN)
University of Washington
Fluke Hall, Box 352143
(O) 206.543.5101
(F) 206.221.1681
(C) 443.254.5192
khbeis at uw.edu
www.wnf.washington.edu/

> On Aug 19, 2015, at 4:14 PM, Mark Heiden <mheiden at engr.ucr.edu> wrote:
> 
> With the death of windows XP most equipment vendors have been forced to stop supporting their own software that runs tools on that platform. Since some of us cannot afford to upgrade our entire enterprise with typically new PC?s with vendor specific interface hardware and software is there a method to share obsolete applications without the fear of repercussions from the vendors? I understand the need for licensing new supported software, but once a company washes it?s hands of a product and offers no support other than to sell you a newer version can owners that paid once already share copies to keep running for a while?
>  
> For example, if we had a failed Window XP PC on a Dektak 8 and needed to reload the software and drivers to run our perfectly good Dektak could someone share a copy of that software?
>  
> Just curious.
>  
>  
> Mark Heiden
> NanoFab Cleanroom Manager
> Center for Nanoscale Science and Engineering
> University of California, Riverside
> 951-827-2551
>  
>  
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork




From anava at tauex.tau.ac.il  Thu Aug 20 01:31:01 2015
From: anava at tauex.tau.ac.il (Nava Ariel- Sternberg)
Date: Thu, 20 Aug 2015 05:31:01 +0000
Subject: [labnetwork] BN sputtering
Message-ID: <DB4PR02MB062988B1CF43ADA6334089BB7660@DB4PR02MB062.eurprd02.prod.outlook.com>

Hi all,

Do you have BN in your sputtering tools? Any specific recommendations? Safety-wise and with respect to contamination?

Thanks,

Nava



Nava Ariel-Sternberg, Ph.D.
Tel-Aviv University Center for Nanoscience and Nanotechnology, Managing Director
MNCF Manager
Phone: 03-640-5619
Mobile: 054-9984959
Email: anava at tauex.tau.ac.il<mailto:anava at tauex.tau.ac.il>

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From michael.rooks at yale.edu  Thu Aug 20 10:02:02 2015
From: michael.rooks at yale.edu (Michael Rooks)
Date: Thu, 20 Aug 2015 10:02:02 -0400
Subject: [labnetwork] Software End of Life Ramifications
In-Reply-To: <55D540B2.20902@mtl.mit.edu>
References: <b08dcddfff11473b9aed920e4169ff14@pobox.engr.local>
 <55D540B2.20902@mtl.mit.edu>
Message-ID: <55D5DDDA.7050507@yale.edu>

Tom's advice is very good. Around here we clone each Windows drive onto 
a spare disk, using Achronis, and once a year we make new clones and 
swap them to make sure they work. Also, we have to keep all the older XP 
controllers on a protected internal network. Some instrument vendors 
will do this as part of their routine service, but you really can't 
trust anyone but yourself.

--------------------------------
Michael Rooks
Yale Institute of Nanoscience and Quantum Engineering
nano.yale.edu <http://nano.yale.edu>



On 08/19/2015 10:51 PM, Thomas Lohman wrote:
> Hi,
>
> Your best bet would be to make complete OS disk images of the 
> computer's disk if possible.  There are freely available products that 
> will allow you to do this.  Storing multiple copies of these images on 
> a file server or offline storage somewhere would then allow you to 
> restore the entire image if for example the existing disk dies.  We've 
> done this here for a number of our older tools as well as research 
> group owned tools.
>
>
> --tom
>
>> With the death of windows XP most equipment vendors have been forced to
>> stop supporting their own software that runs tools on that platform.
>> Since some of us cannot afford to upgrade our entire enterprise with
>> typically new PC?s with vendor specific interface hardware and software
>> is there a method to share obsolete applications without the fear of
>> repercussions from the vendors? I understand the need for licensing new
>> supported software, but once a company washes it?s hands of a product
>> and offers no support other than to sell you a newer version can owners
>> that paid once already share copies to keep running for a while?
>>
>> For example, if we had a failed Window XP PC on a Dektak 8 and needed to
>> reload the software and drivers to run our perfectly good Dektak could
>> someone share a copy of that software?
>>
>> Just curious.
>>
>> Mark Heiden
>>
>> NanoFab Cleanroom Manager
>>
>> Center for Nanoscale Science and Engineering
>>
>> University of California, Riverside
>>
>> 951-827-2551
>>
>>
>>
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
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From gilheart at rice.edu  Fri Aug 21 14:57:47 2015
From: gilheart at rice.edu (gilheart at rice.edu)
Date: Fri, 21 Aug 2015 13:57:47 -0500
Subject: [labnetwork] Employment Opportunity at Rice University
Message-ID: <20150821135747.Horde.f1kfvtyWnY1hgy1iCKjFXw2@webmail.rice.edu>

Greetings colleagues,

The Shared Equipment Authority (SEA) at Rice University, in Houston,  
TX, is looking to add a capable technician to our cleanroom staff.  
Additional details may be found in the official job posting:

https://jobs.rice.edu/postings/4707

The cleanroom at Rice is part of the SEA, a larger umbrella  
organization under the Vice Provost for Research, that administers a  
number of shared core labs (electron microscopy, nanofab cleanroom,  
NMR, mass spec, optical microscopy, XRD, etc) scattered throughout the  
university. This new technician will join the SEA's collegial team of  
scientists in supporting research efforts from the schools of  
engineering and natural sciences.  More information about the SEA can  
be found on our website:

http://sea.rice.edu/

Rice is still accepting applications for this position, so if you know  
a good candidate, please pass this information along to them. Thanks  
for your time and consideration.

-Tim
-- 
Tim Gilheart, Ph.D.
Research Scientist - Nanofabrication Clean Room Manager,
Shared Equipment Authority, Rice University
Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu