From bfruhberger at ucsd.edu Tue Dec 1 17:23:07 2015 From: bfruhberger at ucsd.edu (Fruhberger, Bernd) Date: Tue, 1 Dec 2015 22:23:07 +0000 Subject: [labnetwork] job opportunity at UCSD's Nano3 cleanroom facility Message-ID: <076D71F311D3B04C89525DD354E42540584A3703@XMAIL-MBX-BC1.AD.UCSD.EDU> Hello everyone, The Nano3 micro/nano-fabrication and characterization facility has an immediate opening for a Senior Equipment Engineer. As part of our equipment/infrastructure support team, the Engineer will have primary responsibilities for acquisition and maintenance of all equipment and infrastructure in the facility. For additional details, or to apply, please visit the UCSD joblink at http://jobs.ucsd.edu/bulletin/job.aspx?cat=search&sortby=rank&jobnum_in=79046&search=79046 Best regards, Bernd Fruhberger, PhD Technical Director, Nano3 Cleanroom Facility UCSD Calit2 M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Ph (858) 534-4518 Fax (858) 534-9092 bfruhberger at ucsd.edu http://nano3.calit2.net/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Thu Dec 3 09:49:59 2015 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 3 Dec 2015 09:49:59 -0500 Subject: [labnetwork] Sputtering GeSbTe Message-ID: <56605697.9000604@udel.edu> Hello Everyone, I have received a request for using GeSbTe in the sputtering system. I am not familiar with the material and any input is much appreciated: -What potential contamination and/or toxicity issues should I consider and what mitigation strategies do you recommend? -Assuming this material can be used in the system, would you recommend a starting recipe? Thank you very much, Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD NanoFab 163 ISE Lab 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu From rmorrison at draper.com Thu Dec 3 13:21:05 2015 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 03 Dec 2015 18:21:05 +0000 Subject: [labnetwork] HF vapor etch Message-ID: Hi Folks, I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers? thanks in advance Rick Draper Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From mmoneck at andrew.cmu.edu Fri Dec 4 00:34:16 2015 From: mmoneck at andrew.cmu.edu (Matt Moneck) Date: Fri, 4 Dec 2015 00:34:16 -0500 Subject: [labnetwork] Process Engineer Position at Carnegie Mellon University Nanofabrication Facility Message-ID: <0ad701d12e55$6b5363a0$41fa2ae0$@andrew.cmu.edu> Hello All, The Nanofabrication Facility at Carnegie Mellon University has an immediate opening for a Process Engineer (https://cmu.taleo.net/careersection/2/jobdetail.ftl?job=2001281). This position will be responsible for process related work on a variety of micro/nano fabrication process equipment including tools for electron beam lithography, photolithography, RIE, PECVD, ALD, sputtering, evaporation, annealing, wet chemical processing, metrology, and more. Responsibilities include training users on lab procedures and lab safety, training users on existing processes and equipment, assisting users in process related troubleshooting, developing new processes, calibrating processes and process equipment, qualifying processes on new equipment, documenting processes and tool performance, documenting lab procedures, and adding to a process recipe database. Basic administrative work is also required and includes, but is not limited to the creation, distribution, and processing of lab forms, log sheets, etc. In some circumstances, the process engineer may be required to work with the Equipment Manager and technicians on repair and maintenance of various tools in the fab, as well as the modification, upgrade, and development of tools. Ideal candidates will have 5+ years of experience working in micro/nanofabrication at an academic or industrial research laboratory; experience in process development and troubleshooting; data analysis, CAD software, and device design experience. Additional experience preferred in working with cleanroom process equipment, including operation, optimization, and calibration of tools for sputtering, evaporation, chemical vapor deposition, atomic layer deposition, plasma etching, ion beam etching, photolithography, electron beam lithography, scanning electron microscopy, annealing, metrology, and device/film characterization. This position does require the use of hazardous chemicals and gases, so candidates should have experience in handling such materials. For more information please visit: www.nanofab.ece.cmu.edu Qualifications: * Bachelor's degree required. Master's degree in Electrical Engineering preferred * 1-3 years of relevant experience required. 5 or more years preferred * Excellent organization, planning and oral/written communication skills required The successful candidate must obtain all background clearances as may be required by Pennsylvania Act 153. Please feel free to pass this message along to interested colleagues. Thank you for your time. Best Regards, Matt Moneck -- Matthew T. Moneck, Ph.D. Executive Manager, Carnegie Mellon Nanofabrication Facility Electrical and Computer Engineering | Carnegie Mellon University 5000 Forbes Ave., Pittsburgh, PA 15213-3890 T: 412.268.5430 F: 412.268.3497 www.ece.cmu.edu nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From christophe.clement at polymtl.ca Fri Dec 4 07:35:31 2015 From: christophe.clement at polymtl.ca (=?iso-8859-1?Q?Christophe_Cl=E9ment?=) Date: Fri, 4 Dec 2015 07:35:31 -0500 (EST) Subject: [labnetwork] HF vapor etch In-Reply-To: References: Message-ID: <3ee81e01.000003c4.00000021@lmf-technos2> Hi Richard Here at Polytechnique Montreal, we have an Idonus HF vapor phase etcher. Consult the tool at http://www.idonus.com/ Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 Fax : 514 340 4711 # 2417 De : Morrison, Richard H., Jr. [mailto:rmorrison at draper.com] Envoy? : 3 d?cembre 2015 13:21 ? : labnetwork at mtl.mit.edu Objet : [labnetwork] HF vapor etch Hi Folks, I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers? thanks in advance Rick Draper Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 _____ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. _____ -------------- next part -------------- An HTML attachment was scrubbed... URL: From PMaciel at oainet.com Fri Dec 4 09:13:24 2015 From: PMaciel at oainet.com (Paul Maciel) Date: Fri, 4 Dec 2015 14:13:24 +0000 Subject: [labnetwork] HF vapor etch In-Reply-To: <3ee81e01.000003c4.00000021@lmf-technos2> References: <3ee81e01.000003c4.00000021@lmf-technos2> Message-ID: <5A1E7180AF85C94DA6FA1EF5A063D31C53578C2E@SBSSERVER.OAI.local> Hi Everyone, OAI (Optical Associates, Incorporated) is the distributor for Idonus products in North America. Please let me know if you need anything. Regards, ---Paul Paul Maciel Optical Associates, Incorporated Sales and Technical Support (408) 514-6121 pmaciel at oainet.com http://www.oainet.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Christophe Cl?ment Sent: Friday, December 04, 2015 7:36 AM To: Morrison, Richard H., Jr. ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] HF vapor etch Hi Richard Here at Polytechnique Montreal, we have an Idonus HF vapor phase etcher. Consult the tool at http://www.idonus.com/ Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 Fax : 514 340 4711 # 2417 De : Morrison, Richard H., Jr. [mailto:rmorrison at draper.com] Envoy? : 3 d?cembre 2015 13:21 ? : labnetwork at mtl.mit.edu Objet : [labnetwork] HF vapor etch Hi Folks, I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers? thanks in advance Rick Draper Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From kjvowen at lnf.umich.edu Fri Dec 4 09:36:40 2015 From: kjvowen at lnf.umich.edu (Kevin Owen) Date: Fri, 4 Dec 2015 09:36:40 -0500 Subject: [labnetwork] Sputtering GeSbTe In-Reply-To: <56605697.9000604@udel.edu> References: <56605697.9000604@udel.edu> Message-ID: Iulian, We just went through some testing with GeTe in our sputter tool at the LNF. Tellurium is known to be toxic, so we wanted to see how much was released when the chamber was vented to perform a target change. We took samples of the breathing air near the chamber and near the operator's head and swabs of the chamber walls before and after wiping them down with IPA. On the chamber walls initially, we found low levels of Te, but after wiping them down, it was below the detection limit. All breathing air samples came back negative for Te. These tests were taken with the assistance of UM OSEH, so we're confident in the results. I can't help you with recipe parameters, but I've copied our sputtering guy who might be able to help (and could comment more on the tests, since he's the one who performed them). In a related question, now that we can successfully deposit GeTe, users at the LNF now want to etch it, too. If we had an ion mill, I would be OK with it based on the same logic as above. However, all of our plasma etching systems run either F or Cl based chemistries and Te forms compounds with both of these that are much more toxic than in its elemental form (20 ppb REL for TeF6). We're concerned that even running an Ar only etch, the Te would be embedded in the walls and then could react during a subsequent F etch by another user. Does anyone have any thoughts or experience with etching Te, or even Se, based compounds? Maybe we're thinking way too hard about this and exposure levels are actually so minimal that it doesn't matter? Cheers, Kevin On Thu, Dec 3, 2015 at 9:49 AM, Iulian Codreanu wrote: > Hello Everyone, > > I have received a request for using GeSbTe in the sputtering system. I am > not familiar with the material and any input is much appreciated: > -What potential contamination and/or toxicity issues should I consider and > what mitigation strategies do you recommend? > -Assuming this material can be used in the system, would you recommend a > starting recipe? > > Thank you very much, > > Iulian > > -- > iulian Codreanu, Ph.D. > Director of Operations, UD NanoFab > 163 ISE Lab > 221 Academy Street > Newark, DE 19716 > 302-831-2784 > http://udnf.udel.edu > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Kevin Owen Senior Engineer in Research Operations Group, Lurie Nanofabrication Facility University of Michigan (734) 545-4014 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahryciw at ualberta.ca Fri Dec 4 10:17:11 2015 From: ahryciw at ualberta.ca (Aaron Hryciw) Date: Fri, 4 Dec 2015 08:17:11 -0700 Subject: [labnetwork] HF vapor etch In-Reply-To: <3ee81e01.000003c4.00000021@lmf-technos2> References: <3ee81e01.000003c4.00000021@lmf-technos2> Message-ID: Hi Rick, Another good option to consider would be memsstar . Cheers, ? Aaron Aaron Hryciw, PhD, PEng Fabrication Group Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 Ph: 780-940-7938 www.nanofab.ualberta.ca On Fri, Dec 4, 2015 at 5:35 AM, Christophe Cl?ment < christophe.clement at polymtl.ca> wrote: > Hi Richard > > Here at Polytechnique Montreal, we have an Idonus HF vapor phase etcher. > > Consult the tool at http://www.idonus.com/ > > Best > > Christophe > > > > *Christophe Cl?ment* > > *Technicien laboratoire* > > Laboratoire de microfabrication (LMF) > > Groupe des Couches Minces (GCM) *www.gcmlab.ca * > > Ecole Polytechnique de Montr?al www.polymtl.ca > > D?partement de g?nie physique > > * 2900 Boulevard Edouard Monpetit > > Pavillon JAB > Campus de l'Universit? de Montr?al > Montr?al (Qu?bec) H3T 1J4 > > > 8 christophe.clement at polymtl.ca > > ( 514 340 4711 > > Fax : 514 340 4711 # 2417 > > > > > > *De :* Morrison, Richard H., Jr. [mailto:rmorrison at draper.com] > *Envoy? :* 3 d?cembre 2015 13:21 > *? :* labnetwork at mtl.mit.edu > *Objet :* [labnetwork] HF vapor etch > > > > Hi Folks, > > > > I am looking for a HF vapor release tool, I see that OAI and SPTS are the > 2 manufactures out there, any recommendations or other suppliers? > > > thanks in advance > > > > Rick > > > > > > Draper > > Principal Member of the Technical Staff > > Group Leader Microfabrication Operations > > 555 Technology Square > > Cambridge Ma, 02139-3563 > > > > www.draper.com > > rmorrison at draper.com > > W 617-258-3420 > > C 508-930-3461 > > > ------------------------------ > > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are not > the intended recipient of this email, please immediately notify the sender > by replying to this email and immediately destroy all copies of this email. > ------------------------------ > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From duda at uchicago.edu Fri Dec 4 11:11:07 2015 From: duda at uchicago.edu (Peter J Duda III) Date: Fri, 4 Dec 2015 16:11:07 +0000 Subject: [labnetwork] HF vapor etch In-Reply-To: References: Message-ID: <369CF1861066C244B747413441CCF52908C6753F@xm-mbx-08-prod> Rick Just as an FYI - the two manufacturers you listed sell similar yet distinctly different tools. SPTS sells an Anhydrous HF etch tool that utilizes Anhydrous HF gas as the etchant source under vacuum. OAI sells an HF acid vapor etcher that utilizes HF acid as the etchant source at atmosphere. The etch mechanism is similar (if not technically the same) but the anhydrous system presumably does allow for better control of moisture on the etch surface which enables materials and process that are sensitive to HF acid but not sensitive to anhydrous HF (aluminum is a good example of a material that will be attacked by HF acid but not by anhydrous HF). I know of two manufacturers of HF acid Vapor systems: 1. I am pretty sure OAI and Idonus are the same tool. 2. Advanced Micromachining Tools http://www.ammt.com/products/hydrofluoric-acid-vapor-etcher/ I also know of two manufacturers of Vacuum Anhydrous HF etch systems: 1. SPTS 2. Memstar http://memsstar.com/products-services/mems/vapor-HF-hydrogen-fluoride-vapor-phase-etching/ The Anhydrous vacuum systems are orders of magnitude more in terms of cost than the acid systems (although the acid systems require some sort of exhaust hood) but presumable give more selectivity, rate control etc. I have only used the vacuum systems. The SPTS tool utilizes alcohol as catalyst and operates at higher pressures (Torr range) whereas the Memstar tool utilizes water vapor as a catalyst when required and operates at lower pressure (mTorr range). Thanks Peter J Duda Technical Manager, Pritzker Nanofabrication Facility Institute for Molecular Engineering University of Chicago 5640 South Ellis Avenue WERC LL181 Chicago, IL 60637 Office: 773-702-8903 Cell: 805-636-2323 duda at uchicago.edu ime.uchicago.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr. Sent: Thursday, December 03, 2015 12:21 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] HF vapor etch Hi Folks, I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers? thanks in advance Rick Draper Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Fri Dec 4 11:28:03 2015 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Fri, 4 Dec 2015 16:28:03 +0000 Subject: [labnetwork] HF vapor etch In-Reply-To: <3ee81e01.000003c4.00000021@lmf-technos2> References: <3ee81e01.000003c4.00000021@lmf-technos2> Message-ID: Hi Rick and Christophe, Sorry that I can't give an advice about a manufacturer but I have a question around the installation of such a system. At ANU we do have a system (not sure of the brand but it looks like the Idonus system) and our local H&S office does not allow the use of it in a fume hood unless the exhaust line is adequately wet scrubbed. Hence I wonder if you can share the installation information and whether the fume hood is wet-scrubbed before releasing the vapours to outside atmosphere. Also is it recommended to put a sensor on the scrubber outlet to monitor the fumes content? Thanks, Fouad Karouta ********************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Christophe Cl?ment Sent: Friday, December 4, 2015 11:36 PM To: Morrison, Richard H., Jr.; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] HF vapor etch Hi Richard Here at Polytechnique Montreal, we have an Idonus HF vapor phase etcher. Consult the tool at http://www.idonus.com/ Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 Fax : 514 340 4711 # 2417 De : Morrison, Richard H., Jr. [mailto:rmorrison at draper.com] Envoy? : 3 d?cembre 2015 13:21 ? : labnetwork at mtl.mit.edu Objet : [labnetwork] HF vapor etch Hi Folks, I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers? thanks in advance Rick Draper Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Fri Dec 4 13:23:46 2015 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas) Date: Fri, 4 Dec 2015 18:23:46 +0000 Subject: [labnetwork] UGIM Directors and Managers Please Participate in attached Survey Message-ID: Colleagues, In preparation for UGIM 2016 in Salt Lake City, Ian Harvey requested that we get a team to together to gather information on the UGIM Community. We ask UGIM Lab Directors/Managers to participate in the survey attached (to be completed by January 29th 2016). Problem Statement: To better understand how a University Nano/Micro Fabrication Facility can survive and thrive in today's economy the UGIM Team have authored Part 1 of a survey to gather information from as many Universities that wish to participate to be presented at UGIM 2016 Utah. The goal is to provide a comprehensive snap shot of multiple UGIM members (financially and operationally) for all the labs to benefit from. In addition to the presentation to be made at the UGIM Symposium 2016 Utah, the goal is to continue to grow the survey process and feed that information back to the UGIM participants periodically. Framework: 1. Any data and analysis of the survey results made publicly available will not have institutions identified. However, we will need your contact information for communication in regard to Part 2 of the survey. 2. The survey needs to be as simple as possible to encourage participation * Part 1 will be focused on Categorization and may help us parse down the data set for Part 2. The first level survey will set help guide us to Part 2. * Part 2 will be more detailed analysis and have more granularity on budget, funding sources and other topics to be determined. * We will utilize Survey Monkey as a tool to gather data 3. UGIM 2016 is NOT the end game, but a beginning of a longer effort to continue gathering and sharing information. The hope is that UGIM 2016 will spur increased participation in such activity. The Survey Link: https://www.surveymonkey.com/r/96BFZZP Questions and comments and be forwarded directly to Thomas_ferraguto at uml.edu 978-934-1809 Best Regards Tom Ferraguto Team: Thomas Ferraguto- UMass Lowell, Sandrine Martin - U Michigan, Noah Clay- U Penn, Robert Cornwall -Penn State, Dennis Grimard- MIT, Robert Hower- U Michigan & Vito Logiudice-U Waterloo. Note: Special thanks to Sandrine Martin for her extra efforts in putting the teams ideas into a usable survey. Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director University of Massachusetts Lowell 1 University Avenue Lowell MA 01854-5120 978-934-1809 land 617-755-0910 mobile 978-934-1014 fax [cid:image001.png at 01D12E97.00F71FF0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 57965 bytes Desc: image001.png URL: From jun.li at mcgill.ca Mon Dec 7 16:58:47 2015 From: jun.li at mcgill.ca (Jun Li, Mr) Date: Mon, 7 Dec 2015 21:58:47 +0000 Subject: [labnetwork] HF vapor etch In-Reply-To: References: <3ee81e01.000003c4.00000021@lmf-technos2> Message-ID: <0066325AFE8720429E24AC0D4BE10684D04A0C69@EXMBX2010-7.campus.MCGILL.CA> Hi Rick, FYI, only on my own experience, about 10yrs ago, I used Primaxx (now SPTS) 1st cluster VHF system, and as well as their single wafer tool. The process results meet our need. And Fouad, I think it is good to have sensor or detector to monitor contents, just to give you peace of mind. As I recalled, at that time, it is a pretty new technology, while We worked together with the manufacturer for process development and hardware improvement. We did detect HF residual content around atmosphere on the single wafer etch system once open the chamber door. Best -JL From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Fouad Karouta Sent: December-04-15 11:28 AM To: Christophe Cl?ment; Morrison, Richard H., Jr.; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] HF vapor etch Hi Rick and Christophe, Sorry that I can't give an advice about a manufacturer but I have a question around the installation of such a system. At ANU we do have a system (not sure of the brand but it looks like the Idonus system) and our local H&S office does not allow the use of it in a fume hood unless the exhaust line is adequately wet scrubbed. Hence I wonder if you can share the installation information and whether the fume hood is wet-scrubbed before releasing the vapours to outside atmosphere. Also is it recommended to put a sensor on the scrubber outlet to monitor the fumes content? Thanks, Fouad Karouta ********************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Christophe Cl?ment Sent: Friday, December 4, 2015 11:36 PM To: Morrison, Richard H., Jr.; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] HF vapor etch Hi Richard Here at Polytechnique Montreal, we have an Idonus HF vapor phase etcher. Consult the tool at http://www.idonus.com/ Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 Fax : 514 340 4711 # 2417 De : Morrison, Richard H., Jr. [mailto:rmorrison at draper.com] Envoy? : 3 d?cembre 2015 13:21 ? : labnetwork at mtl.mit.edu Objet : [labnetwork] HF vapor etch Hi Folks, I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers? thanks in advance Rick Draper Principal Member of the Technical Staff Group Leader Microfabrication Operations 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From tobi at stanford.edu Thu Dec 10 16:24:18 2015 From: tobi at stanford.edu (Tobi Beetz) Date: Thu, 10 Dec 2015 21:24:18 +0000 Subject: [labnetwork] 2 Open Position at Stanford's shared nanofacilities Message-ID: Dear All - I would like to make you aware of two open positions in support of Stanford's shared nanofacilities. Please share with anyone who might be interested. Research and Development Scientist and Engineer, National Nanotechnology Coordinated Infrastructure https://stanfordcareers.stanford.edu/job-search?jobId=69380 Program Manager, Education and Outreach, National Nanotechnology Coordinated Infrastructure https://stanfordcareers.stanford.edu/job-search?jobId=69375 Thanks, Tobi Tobi Beetz, Ph.D., Associate Director, Stanford Nano Shared Facilities, Stanford University 348 Via Pueblo, Spilker Building, Room 105, Stanford, CA 94305-4088, http://snsf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From philipp.altpeter at physik.uni-muenchen.de Sat Dec 12 06:05:22 2015 From: philipp.altpeter at physik.uni-muenchen.de (Philipp Altpeter) Date: Sat, 12 Dec 2015 12:05:22 +0100 Subject: [labnetwork] Ageing of SU-8 Message-ID: <566BFF72.5080901@physik.uni-muenchen.de> Dear all, I'm wondering what happens first when the expiry date of SU-8 is (heavily) exceeded. Recent exposure results indicate that the sensitivity seems to be roughly the same but the adhesion is rather poor (worse than usual). Do you think this comes from ageing of SU-8 or rather wrong treatment / substrate conditions? (I'm aware that the treatment - especially the baking procedure - is critical in terms of adhesion) Thank you in advance! Philipp -- Philipp Altpeter University of Munich (LMU) and Center for NanoScience (CeNS) Chair of Solid State Physics / N.N. Geschwister-Scholl-Platz 1 D-80539 Munich From robert.celotta at nist.gov Wed Dec 16 14:01:35 2015 From: robert.celotta at nist.gov (Celotta, Robert) Date: Wed, 16 Dec 2015 19:01:35 +0000 Subject: [labnetwork] NIST's CNST Nanocenter Deputy Director position available Message-ID: Dear all, This is a heads up to the fact that we will be posting the position of Deputy Director for the NIST Center for Nanoscale Science and Technology CNST after the holidays, more specifically in mid-January. The preannouncement is now on our website and I've attached a copy to this email. As described in the preannouncement, the Deputy Director plays the key role in the operations of the Center. If you know of someone who might be interested in this position, I would appreciate it if you would call this opportunity to their attention. Thanks in advance for your help! Bob Celotta Robert Celotta, Director Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, Stop #6200 Gaithersburg, MD 20899-6200 v: (301) 975-8001 f: (301) 975-8026 Executive Assistant: Amy Grafmuller CNST Brochure -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Dep Director Pre-announcement 1.2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 26308 bytes Desc: Dep Director Pre-announcement 1.2.docx URL: From fouad.karouta at anu.edu.au Thu Dec 17 01:00:44 2015 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Thu, 17 Dec 2015 06:00:44 +0000 Subject: [labnetwork] Thermal Conductivity of PECVD SiON Message-ID: Dear all, We have a user who's looking for a method to measure the lateral thermal conductivity of SiON layers of a few 100 nm thickness. I appreciate your feedback/comments. Thanks, Fouad Karouta ********************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From nannini.matthieu at gmail.com Fri Dec 18 12:01:20 2015 From: nannini.matthieu at gmail.com (Matthieu Nannini) Date: Fri, 18 Dec 2015 12:01:20 -0500 Subject: [labnetwork] =?utf-8?q?IPA_100=C2=B0C_clean?= Message-ID: Hi, An old process I'm trying to reproduce calls for a 5min clean step in IPA at 100?C. I'm a bit nervous about it. I'm doing it at 50-60C in bain-marie but I'm wondering it will make a difference. It's a cleaning step prior to photoresist and other things. What do you folks think? Matthieu -------------- next part -------------- An HTML attachment was scrubbed... URL: From IRHarvey at eng.utah.edu Fri Dec 18 17:32:37 2015 From: IRHarvey at eng.utah.edu (Ian Harvey) Date: Fri, 18 Dec 2015 15:32:37 -0700 Subject: [labnetwork] UGIM in six months... Message-ID: Dear Colleagues, Just a reminder that UGIM is coming up June 12-15, 2016, hosted by the Utah Nanofab in Salt Lake City. We have posted calls for sponsorship and registration, and these are located at: http://ugim.nanofab.utah.edu/announcements-3/ As you register, please note that we have held a large block of rooms at the Guest House, located in walking distance of the venues. But you need to call to access this block of rooms. The reserved room block is not available through the guest house web portal. 1-888-416-4075 mention Group Name Utah Nanofab In Early January we will be issuing the Call for Abstracts, and the Call for Posters. The Poster session will enable each research lab to introduce itself to others. More info coming with the new year. Meanwhile, Happy Holidays! Ian Harvey Chair, UGIM '16 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: dajcggfg.jpeg Type: image/jpeg Size: 175087 bytes Desc: not available URL: