[labnetwork] Atomic-layer etching Si in a standard ICP reactor

[bryan cord]

Hi Everyone,

I was wondering if anybody had experience with running a basic Cl-based 
atomic-layer etching process of silicon in a standard plasma etcher.  
I'm thinking of trying to add it to our Oxford ICP tool as a standard 
process; if anyone's done or is doing something similar, could you post 
some process specifics?  I've got a basic outline worked out from 
literature references but it will probably need a lot of tweaking to 
actually work in our tool.

Thanks!

-bryan

-- 
Bryan Cord
Minnesota Nano Center (MNC)
University of Minnesota
115 Union St SE, Rm 153
Minneapolis, MN 55455
612.626.3287 (work)
857.891.6820 (cell)
bcord at umn.edu
http://wiki.umn.edu/EBPG