From jun.li at mcgill.ca  Fri Oct  2 16:39:03 2015
From: jun.li at mcgill.ca (Jun Li, Mr)
Date: Fri, 2 Oct 2015 20:39:03 +0000
Subject: [labnetwork] Information on Aligner:  Mikasa MA-8
In-Reply-To: <1048536691.2345162.1443570593867.JavaMail.yahoo@mail.yahoo.com>
References: <0066325AFE8720429E24AC0D4BE10684C0BDCDC6@EXMBX2010-7.campus.MCGILL.CA>
 <1048536691.2345162.1443570593867.JavaMail.yahoo@mail.yahoo.com>
Message-ID: <0066325AFE8720429E24AC0D4BE10684C485F51C@exmbx2010-8.campus.MCGILL.CA>

Thanks Mario, Paul and Richard's information and other off-line help. I have passed along the messages to the PI. Hopefully it can be fixed.


-----Original Message-----
From: Mario Portillo [mailto:hbtusainc at yahoo.com] 
Sent: September-29-15 7:50 PM
To: Jun Li, Mr; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Information on Aligner: Mikasa MA-8

Mr. Li....The model number of power supply for this Mikasa aligner is irrevelant. Back then maybe a 100-200 watts lamp. There are power supplies available today.( Google power supplies companies)

Important to know today is; 1) the wattage of lamp,(IE: 100,200, 350 watts etc..)
                            2) Does the light source has an internal power igniter..???
                            3) If light source has not an internal igniter, then power supply has to have one.

I hope this helps, it is very straight forward.

Regards

Mario A. Portillo Sr.
HIGH'born Technology USA Inc..
Semiconductor Equipment Services
8130 Glades Road, #229
Boca Raton, FL 33434
561 470-1975 office
561 504-0244 cell
hbtusainc at yahoo.com
www.hbtusainc.com


________________________________
From: "Jun Li, Mr" <jun.li at mcgill.ca>
To: "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu> 
Sent: Tuesday, September 29, 2015 2:13 PM
Subject: [labnetwork] Information on Aligner:  Mikasa MA-8




Dear Labnetwork colleagues,
 
One of our  PI?s Fab has an old, but good aligner: (the tool is: Mikasa MA-8) ,  Unfortunately, at the last passage of tool travel, from UK to Canada, the power source for the UV lamp was lost.   
The aligner is from a company called Mikasa,  The type they have is MA-8, which is not available for more than 30 years so that they cannot find detail information on their official website. attached is the aligner picture.
 
I am wondering  if any one happens to own/use the tool before,  and know the model/type of power supply information,   or some alternative 2nd hand replacement solution suppliers for the power source.
 
Many Thanks
 
 
Jun Li
Nanotool Fab
McGill University
Rutherford Physics Building 
3600 University Street
Montreal, Quebec H3A 2T8 Canada
 
 
 
 
 
 
 
 
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

From kckeenan at seas.upenn.edu  Tue Oct  6 13:36:31 2015
From: kckeenan at seas.upenn.edu (Kyle Keenan)
Date: Tue, 6 Oct 2015 13:36:31 -0400
Subject: [labnetwork] job available at Penn Nanofab
Message-ID: <5614069F.6060409@seas.upenn.edu>

Hello,

I manage the Quattrone Nanofabrication Facility here at Penn, and would 
like to inform the Labnetwork community that we have a job opening for a 
Nanofab Equipment Specialist. The job posting can be found at this link:

https://jobs.hr.upenn.edu/postings/13518

Your help in spreading the word about this opportunity to potentially 
interested parties would be greatly appreciated.

For more information about our Nanofab, please visit our site:

http://www.nano.upenn.edu/resources/quattrone-nanofabrication/

Thank you for your help, and your time.
-- 
Kyle Keenan

Laboratory Manager
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-7560
F: 215-573-4925



From Jacob.Trevino at asrc.cuny.edu  Wed Oct  7 08:24:57 2015
From: Jacob.Trevino at asrc.cuny.edu (Jacob Trevino)
Date: Wed, 7 Oct 2015 12:24:57 +0000
Subject: [labnetwork] Process Engineer Position at CUNY ASRC NanoFab
Message-ID: <D23A8758.B3E0%jacob.trevino@asrc.cuny.edu>

Hello,

The Advanced Science Research Center (ASRC) NanoFabrication Facility at the The City University of New York (CUNY) would like to inform the community that we have a job opening for a Nanofabrication Process Engineer. The job posting can be found here:

http://tinyurl.com/pxhbfar

For more information about our facility, please visit: http://nanofab.asrc.cuny.edu/

Feel free to email me directly with any questions.

Best regards,
Jacob


--------------------------------
Jacob Trevino, PhD
NanoFabrication Facility Director
The City University of New York (CUNY)
Advanced Science Research Center (ASRC)
Tel.  (212) 413-3310
Cel.  (646) 629-1179
Email: Jacob.Trevino at asrc.cuny.edu<mailto:Jacob.Trevino at asrc.cuny.edu>
Web: http://asrc.cuny.edu/

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From Jacob.Trevino at asrc.cuny.edu  Wed Oct  7 12:24:36 2015
From: Jacob.Trevino at asrc.cuny.edu (Jacob Trevino)
Date: Wed, 7 Oct 2015 16:24:36 +0000
Subject: [labnetwork] Process Engineer Position at CUNY ASRC NanoFab
Message-ID: <D23ABF29.B41C%jacob.trevino@asrc.cuny.edu>

Looks like the MTL mail server didn?t like my tnyurl link. Sorry about that! Here is the full link if the previous one didn?t work.

https://home.cunyfirst.cuny.edu/psp/cnyepprd/GUEST/HRMS/c/HRS_HRAM.HRS_CE.GBL?Page=HRS_CE_JOB_DTL&Action=A&JobOpeningId=13696&SiteId=1&PostingSeq=1

Best,
Jacob


--------------------------------
Jacob Trevino, PhD
NanoFabrication Facility Director
The City University of New York (CUNY)
Advanced Science Research Center (ASRC)
Tel.  (212) 413-3310
Cel.  (646) 629-1179
Email: Jacob.Trevino at asrc.cuny.edu<mailto:Jacob.Trevino at asrc.cuny.edu>
Web: http://asrc.cuny.edu/


From: <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Jacob Trevino <jacob.trevino at asrc.cuny.edu<mailto:jacob.trevino at asrc.cuny.edu>>
Date: Wednesday, October 7, 2015 at 8:24 AM
To: "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] Process Engineer Position at CUNY ASRC NanoFab

Hello,

The Advanced Science Research Center (ASRC) NanoFabrication Facility at the The City University of New York (CUNY) would like to inform the community that we have a job opening for a Nanofabrication Process Engineer. The job posting can be found here:

The MTL Mail Server has detected a possible fraud attempt from "urldefense.proofpoint.com" claiming to be http://tinyurl.com/pxhbfar<https://urldefense.proofpoint.com/v2/url?u=http-3A__tinyurl.com_pxhbfar&d=AwMFAg&c=mRWFL96tuqj9V0Jjj4h40ddo0XsmttALwKjAEOCyUjY&r=VAhHZIOD6nYR_h_RRUyEIPRVnzdmDwzAzse6g5fzQcg&m=jRII685BAU9v3rHT2o-P8OMjzgUeJUGb7lYYzR00tu4&s=cpnGKoYV5nikU3Vbf5ZlABrwnYN9q5ITdbX_BXneFuM&e=>

For more information about our facility, please visit: http://nanofab.asrc.cuny.edu/

Feel free to email me directly with any questions.

Best regards,
Jacob


--------------------------------
Jacob Trevino, PhD
NanoFabrication Facility Director
The City University of New York (CUNY)
Advanced Science Research Center (ASRC)
Tel.  (212) 413-3310
Cel.  (646) 629-1179
Email: Jacob.Trevino at asrc.cuny.edu<mailto:Jacob.Trevino at asrc.cuny.edu>
Web: http://asrc.cuny.edu/

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From emarq at umich.edu  Thu Oct  8 17:43:35 2015
From: emarq at umich.edu (Emmanuelle Marquis)
Date: Thu, 8 Oct 2015 17:43:35 -0400
Subject: [labnetwork] job postings
Message-ID: <CAJRndQvV-wsV_Fh81WwRK1prstgji+ppAKGWQX87QTdQd3DrTQ@mail.gmail.com>

I would like to post the following two positions.
Thank you,
Emmanuelle

_______________________________________________

*Job openings: Center Manager and Instrument Scientist, **University of
Michigan*

*Michigan Center of Materials Characterization*



The Michigan Center for Materials Characterization, or (MC)2, is the new
University of Michigan College of Engineering?s (CoE?s) shared microscopy
and characterization facility housing state-of-the-art equipment (including
SEM, FIB, EBSD, nanoindenter, TEM, EDS, EELS,  XPS, APT, AFM,).

(MC)2 supports a diverse multi-disciplinary user-base of more than 550
users from various colleges and department across the UM campus, more than
100 internal research groups, and 20 non-academic companies. The mission of
(MC)2 is to provide cost effective, efficient, safe, and socially
responsible access to advanced characterization equipment and expertise
thereby promoting, enabling, and encouraging cutting-edge education,
research, and business development.

The CoE is seeking two talented professionals with a high level of
knowledge in microscopy techniques to complement the current staff, manage
a facility with complex instrumentation running 24/7, train users, and grow
the educational and scientific impact of the Center.



*Required Qualifications*

*Center Manager: *The preferred candidate should have a MS or PhD degree in
Physics, Materials Science & Engineering or a related Physical Science or
Engineering discipline or equivalent experience, several years of hands-on
experience in basic and state-of-the-art materials characterization, be
well knowledgeable about all microscopy and spectroscopy and diffraction
techniques including (but not limited to) sample preparation, light
microscopy, SEM, TEM, XPS, EDS, and EBSD, have demonstrated the ability to
train and interact with users, to create, support, and justify complex
financial and disciplined budgetary models in support of a user facility
depending on a recharge model.



*Instrument Scientist: *The preferred candidate will have obtained a PhD in
Materials Science, Physics or related physical science/engineering field,
at least a 3 year post-doctoral experience in FIB / SEM, EDS, and EBSD,
with emphasis on 3D imaging at the nano and micron scales, have
demonstrated the ability to train and guide the diverse user community, to
work and communicate effectively with a diverse population, to collaborate,
to perform independent research, strong analytical skills, and a record of
publications commensurate to the years of experience.



*Applying*: A cover letter is required for consideration for this position
and should be attached as the first page of your resume. The cover letter
should address your specific interest in the position and outline skills
and experience that directly relate to this position.

Application submission: http://umjobs.org/job_detail/115044/
<http://umjobs.org/job_detail/115044/center_manager_michigan_center_of_materials_characterization>
 and http://umjobs.org/job_detail/115037/

Application Deadline:  11/30/15

*Contact information*: E-mail: emarq at umich.edu

_______________________________________




____________________________________________________________
Emmanuelle A. Marquis
     Associate Professor of Materials Science and Engineering:
https://sites.google.com/a/umich.edu/marquisgroup/
     Director, Michigan Center for Materials Characterization (MC)2:
http://mc2.engin.umich.edu
Department of Materials Science and Engineering, University of Michigan
2300 Hayward St, Ann Arbor, MI, 48109-2136 USA
     Office: H.H. Dow Building, Rm 2006
     +1 734 764 8717 (Office)
_____________________________________________________________
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From diadiuk at mit.edu  Fri Oct  9 15:56:30 2015
From: diadiuk at mit.edu (Vicky Diadiuk)
Date: Fri, 9 Oct 2015 15:56:30 -0400
Subject: [labnetwork] ALD of SiO2 and SiN with precursors 3DMAS and BTBAS
Message-ID: <179AF2BB-E6F6-4C9B-8FE4-B9E2BE16188B@mit.edu>

Hi,
 We are interested in adding SiO2 and SiN deposition capabilities to at least one of our ALD systems (specifically the Oxford FlexAL).
The system has two sets of independent precursor manifolds.  
Currently, one manifold is completely filled up with TMA, the Hf source and the W source, while the second manifold only has TiCl4 for depositing TiN and TiO2.  
The problem is that the TiCl4 source (and other such metal halide sources) is not compatible with metal amide sources and thus we can't put any metal amide precursors on the two open slots on the second precursor manifold. 

Our users are interested in depositing SiO2 and SiN by using metal amide precursors like 3DMAS and BTBAS but that requires that the TiCl4 source be replaced with a compatible Ti precursor, such as TDMAT to deposit TiN.
The precursors we are considering based on what people seem to be using at other universities and a quick literature search are:

SiO2
3DMAS/TDMAS 
BTBAS

SiN
3DMAS 

Does anyone have any experience w/them & with TDMAT?
Any recommendations or suggestions for precursors for SiO2 and SiN?

We'd like to assess all of these precursors and films with respect to:
1) Cost and availability of precursor
2) Robustness of precursor  (A precursor that degrades rapidly over time wld not be preferred)
3) Quality of film:  Electrical data would be nice but even indices of refraction would do
4) Any chemical compatibility issues.
5) Existence of recipes on the Oxford ALD tool at other places.  This will reduce the amount of optimization that we will need to do.

We really appreciate any comments you might have.
Thx,
 Vicky

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From myoung6 at nd.edu  Tue Oct 13 09:03:52 2015
From: myoung6 at nd.edu (Mike Young)
Date: Tue, 13 Oct 2015 09:03:52 -0400
Subject: [labnetwork] Fwd: ALD of SiO2 and SiN with precursors 3DMAS and
	BTBAS
References: <CA+_DRfB0N4MGUcbJNxVSdpJhs5LTEuqTtX0ziGQ8B-1TzwWmdQ@mail.gmail.com>
Message-ID: <940964D2-5A05-41AE-8A0E-F7B837A14B43@nd.edu>

Hi Vicky. See below for relevant comments from two of my esteemed colleagues, regarding our FlexAL and its sources.

--Mike

> Begin forwarded message:
> 
> From: Mark Richmond <Mark.M.Richmond.7 at nd.edu>
> 
> 
> Mike,
>    I was never informed of any manifold compatibility issues of precursors by Oxford, and Dr. Xing didn't have any objections to that either. I found that odd but the system is under vacuum and is purged well before and after recipes are executed. As you can see from Dave's screen capture we have had this setup for the last few years, although we do not perform many Titanium growths. 
> 
>    As for the SiO2 and SiN we use BDEAS in our recipes, Nitride growth is very slow though. We never purchased a BTBAS source but we did have a 3DMAS source. The 3DMAS source was used up in attempting to characterize the material and we never had a good material growth so we have not replaced that material. It used to be in the empty spot that is now on the machine.
> 
>    Vicky should be able to contact Oxford for their information sheets on different film recipes per precursor or I have in the past anyway. 
> 
> Thanks
> Mark
> 
> On Mon, Oct 12, 2015 at 2:09 PM, David Heemstra <David.Heemstra.1 at nd.edu <mailto:David.Heemstra.1 at nd.edu>> wrote:
> Mike:
> We also have two separate manifolds.  Below is a screen capture for our system.
> Maybe im missing something but - it sounds like they don't want to put TiCl4 and TMA on the same manifold?  I believe that is how ours is currently setup.
> I thought we had 3DMAS or BTBAS a long time ago - but currently Si source is BDEAS.
> Possible (if we are doing something that isn't ideal) it is OK as long as you use sufficient purges afterwards?
> Not really sure that this helps.  Mark may have a better understanding.
> Dave
> 
> 
> 
> 
> 


> On Sun, Oct 11, 2015 at 10:26 AM, mike young <mike.young at nd.edu <mailto:mike.young at nd.edu>> wrote:
> dave/mark, can you advise Vicky regarding this ALD question?
> 
> 
> 
> -------- Forwarded Message --------
> Subject:	[labnetwork] ALD of SiO2 and SiN with precursors 3DMAS and BTBAS
> Date:	Fri, 9 Oct 2015 15:56:30 -0400
> From:	Vicky Diadiuk <diadiuk at mit.edu> <mailto:diadiuk at mit.edu>
> To:	labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> 
> Hi,
>  We are interested in adding SiO2 and SiN deposition capabilities to at least one of our ALD systems (specifically the Oxford FlexAL).
> The system has two sets of independent precursor manifolds.  
> Currently, one manifold is completely filled up with TMA, the Hf source and the W source, while the second manifold only has TiCl4 for depositing TiN and TiO2.  
> The problem is that the TiCl4 source (and other such metal halide sources) is not compatible with metal amide sources and thus we can't put any metal amide precursors on the two open slots on the second precursor manifold. 
> 
> Our users are interested in depositing SiO2 and SiN by using metal amide precursors like 3DMAS and BTBAS but that requires that the TiCl4 source be replaced with a compatible Ti precursor, such as TDMAT to deposit TiN.
> The precursors we are considering based on what people seem to be using at other universities and a quick literature search are:
> 
> SiO2
> 3DMAS/TDMAS 
> BTBAS
> 
> SiN
> 3DMAS 
> 
> Does anyone have any experience w/them & with TDMAT?
> Any recommendations or suggestions for precursors for SiO2 and SiN?
> 
> We'd like to assess all of these precursors and films with respect to:
> 1) Cost and availability of precursor
> 2) Robustness of precursor  (A precursor that degrades rapidly over time wld not be preferred)
> 3) Quality of film:  Electrical data would be nice but even indices of refraction would do
> 4) Any chemical compatibility issues.
> 5) Existence of recipes on the Oxford ALD tool at other places.  This will reduce the amount of optimization that we will need to do.
> 
> We really appreciate any comments you might have.
> Thx,
>  Vicky
> 
> 
> 
> 
> 

-- 
Michael P. Young                                (574) 631-3268 (office)
Nanofabrication Specialist                      (574) 631-4393 (fax)
Department of Electrical Engineering            (765) 637-6302 (cell)
University of Notre Dame                         mike.young at nd.edu
B-38 Stinson-Remick Hall
Notre Dame, IN 46556-5637

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From jprovine at stanford.edu  Tue Oct 13 14:48:23 2015
From: jprovine at stanford.edu (J Provine)
Date: Tue, 13 Oct 2015 11:48:23 -0700
Subject: [labnetwork] Fwd: ALD of SiO2 and SiN with precursors 3DMAS and
	BTBAS
In-Reply-To: <940964D2-5A05-41AE-8A0E-F7B837A14B43@nd.edu>
References: <CA+_DRfB0N4MGUcbJNxVSdpJhs5LTEuqTtX0ziGQ8B-1TzwWmdQ@mail.gmail.com>
 <940964D2-5A05-41AE-8A0E-F7B837A14B43@nd.edu>
Message-ID: <CAOKRUakGLWEnaGXPqvVKAWJ_2+k_fwnyX-iHwhY5p9GC_A41dA@mail.gmail.com>

Hello Dr. Diadiuk,
at stanford we have worked extensively on PEALD of SiN in the last year,
characterizing deposition both on the Fiji systems in the SNF and on a
FlexAl in a single PI laboratory. we were particularly interested in low
wet etch rate in fluorine chemistries (like HF) and electrical properties
such as leakage current and dielectric constant.

successful deposition was shown to be possible with 3DMAS, BTBAS, DCS
(dicholorsilane, which i highly recommend against, reasons below), and TSA
(trisilylamine). by far the majority of the work we have done is on 3DMAS,
which we have stocked for a long time and are familiar with since we use it
for SiO2 deposition as well. there are a couple of papers coming out soon
on this work.

some details about each that may be helpful for you
*3DMAS* - good recipes established for SiO2 and SiN. most fully
characterized precursor from this list. easily obtainable from sigma
aldrich and strem and gelleste. price is comparable to other metal amide
precursors (TDMA-Hf and TDMA-Ti). etch rate and electrical properties of
SiO2 and SiN films are both demonstrably improved over PECVD at the same
temperature. GPC ~0.1A/cycle

*BTBAS* - new precursor to us for this SiN study. not extensively studied,
but deposition definitely possible for SiO2 and SiN. GPC ~0.2A/cycle.
readily available and reasonably priced from all the typical precursor
suppliers

*TSA* - promising for SiN. we have not looked into SiO2 deposition yet. not
extensively explored. GPC ~0.25A/cycle for us, but others have reported
even higher (close to 1A/cycle) which we could not reproduce on the FlexAl.
low wet etch rate and low leakage currents, similar to what was achieved
with 3DMAS. this precursor is pretty hard to stock as we could only source
it from air liquid and it look a lot of effort/time/cost to get supply to
Stanford. not sure why that is.

*DCS* - stay away from this. hard to get in a compatible storage cylinder
for ALD (much more common to come in large volumes for distribution
throughout a facility). dangerous for sure. also, not at all clear that
this precursor provides a self limiting surface reaction, so it does not
perform ALD so much as CVD. could not achieve etch rate or electrical
properties as good as seen with 3dmas and tsa, most likely because of the
lack of self-limiting half reactions. since you are already using TiCl4,
this may not be as much of a concern, but we've stayed away from chloride
chemistries in SNF because of issues with co-deposition in the same chamber
with Pt and Ru metals by ALD.

let me comment further on your specific questions:
Does anyone have any experience w/them & with TDMAT?

we also have used TDMA-Ti for our Ti precursor since we started ALD work in
SNF. we have had great success with TiO2 and TiN deposition with this
precursor. as i mentioned above we steered clear of TiCl4 because of HCl by
products and compatibility issues since we wanted to deposition Pt and Ru
in the same chamber. is it possible this is where the concern you mentioned
about TiCl4 with metal amide precursors comes from? similar to the notes
from the folks at notre dame, i don't see a safety issue with using these
precursors on the same manifold. as an additional datapoint on this,
berkeley's nanolab had TiCl4, TMA, and TDMA-Hf all in use on their picosun
system.

Any recommendations or suggestions for precursors for SiO2 and SiN?

see above.

We'd like to assess all of these precursors and films with respect to:
1) Cost and availability of precursor

addressed above

2) Robustness of precursor  (A precursor that degrades rapidly over time
wld not be preferred)

i didn't mention this above, but we never saw any of these decay over time.
the only precursor we have stocked for a long time (meaning months to a
year) to know for sure that it has good shelf life is 3DMAS. however, TSA
at least is chemically stable and requires no heating for introduction into
the chamber, so i would surmise it is also stable.

bonus info: TDMA-Ti is quite stable on the shelf or even heated (we keep it
at 75C on the tools), and will last for months.

3) Quality of film:  Electrical data would be nice but even indices of
refraction would do

because we have papers coming out soon, i've stopped short of supplying raw
data, but gave a general level of results above. indices of refraction for
the optimized recipes are on the order of 2.0 at 655nm for 3DMAS and TSA.
closer to 1.9 at 655nm for BTBAS, and 1.8 at 655nm for DCS.

4) Any chemical compatibility issues.

nothing established in this regard. everything looks fine.

5) Existence of recipes on the Oxford ALD tool at other places.  This will
reduce the amount of optimization that we will need to do.

on our FlexAl
recipes in existence for SiN and SiO2 for 3DMAS. SiN for TSA and BTBAS, and
starting points for SiO2.

additionally a starting point recipe for SiO2 for BTBAS on a different
reactor (Cambridge Nanotech FijI)

please feel free to contact me if you would like recipe details, and i can
be in touch regarding our forthcoming papers related to this topic if you
wish.

i hope this was helpful.
dr j

On Tue, Oct 13, 2015 at 6:03 AM, Mike Young <myoung6 at nd.edu> wrote:

> Hi Vicky. See below for relevant comments from two of my esteemed
> colleagues, regarding our FlexAL and its sources.
>
> --Mike
>
> Begin forwarded message:
>
> *From: *Mark Richmond <Mark.M.Richmond.7 at nd.edu>
>
>
> Mike,
>    I was never informed of any manifold compatibility issues of precursors
> by Oxford, and Dr. Xing didn't have any objections to that either. I found
> that odd but the system is under vacuum and is purged well before and after
> recipes are executed. As you can see from Dave's screen capture we have had
> this setup for the last few years, although we do not perform many Titanium
> growths.
>
>    As for the SiO2 and SiN we use BDEAS in our recipes, Nitride growth is
> very slow though. We never purchased a BTBAS source but we did have a 3DMAS
> source. The 3DMAS source was used up in attempting to characterize the
> material and we never had a good material growth so we have not replaced
> that material. It used to be in the empty spot that is now on the machine.
>
>    Vicky should be able to contact Oxford for their information sheets on
> different film recipes per precursor or I have in the past anyway.
>
> Thanks
> Mark
>
> On Mon, Oct 12, 2015 at 2:09 PM, David Heemstra <David.Heemstra.1 at nd.edu>
> wrote:
>
>> Mike:
>> We also have two separate manifolds.  Below is a screen capture for our
>> system.
>> Maybe im missing something but - it sounds like they don't want to put
>> TiCl4 and TMA on the same manifold?  I believe that is how ours is
>> currently setup.
>> I thought we had 3DMAS or BTBAS a long time ago - but currently Si source
>> is BDEAS.
>> Possible (if we are doing something that isn't ideal) it is OK as long as
>> you use sufficient purges afterwards?
>> Not really sure that this helps.  Mark may have a better understanding.
>> Dave
>>
>>
>>
>>
>> [image: Inline image 1]
>>
>
>
> On Sun, Oct 11, 2015 at 10:26 AM, mike young <mike.young at nd.edu> wrote:
>>
>>> dave/mark, can you advise Vicky regarding this ALD question?
>>>
>>>
>>>
>>>
>>> -------- Forwarded Message -------- Subject: [labnetwork] ALD of SiO2
>>> and SiN with precursors 3DMAS and BTBAS Date: Fri, 9 Oct 2015 15:56:30
>>> -0400 From: Vicky Diadiuk <diadiuk at mit.edu> <diadiuk at mit.edu> To:
>>> labnetwork at mtl.mit.edu
>>>
>>> Hi,
>>>  We are interested in adding SiO2 and SiN deposition capabilities to at
>>> least one of our ALD systems (specifically the Oxford FlexAL).
>>> The system has two sets of independent precursor manifolds.
>>> Currently, one manifold is completely filled up with TMA, the Hf source
>>> and the W source, while the second manifold only has TiCl4 for depositing
>>> TiN and TiO2.
>>> The problem is that the TiCl4 source (and other such metal halide
>>> sources) is not compatible with metal amide sources and thus we can't put
>>> any metal amide precursors on the two open slots on the second
>>> precursor manifold.
>>>
>>> Our users are interested in depositing SiO2 and SiN by using metal amide
>>> precursors like 3DMAS and BTBAS but that requires that the TiCl4 source be
>>> replaced with a compatible Ti precursor, such as TDMAT to deposit TiN.
>>> The precursors we are considering based on what people seem to be using
>>> at other universities and a quick literature search are:
>>>
>>> *SiO2*
>>> 3DMAS/TDMAS
>>> BTBAS
>>>
>>> *SiN*
>>> 3DMAS
>>>
>>> Does anyone have any experience w/them & with TDMAT?
>>> Any recommendations or suggestions for precursors for SiO2 and SiN?
>>>
>>> We'd like to assess all of these precursors and films with respect to:
>>> 1) Cost and availability of precursor
>>> 2) Robustness of precursor  (A precursor that degrades rapidly over time
>>> wld not be preferred)
>>> 3) Quality of film:  Electrical data would be nice but even indices of
>>> refraction would do
>>> 4) Any chemical compatibility issues.
>>> 5) Existence of recipes on the Oxford ALD tool at other places.  This
>>> will reduce the amount of optimization that we will need to do.
>>>
>>> We really appreciate any comments you might have.
>>> Thx,
>>>  Vicky
>>>
>>>
>>>
>>>
>>
>
> --
> Michael P. Young                                (574) 631-3268 (office)
> Nanofabrication Specialist                      (574) 631-4393 (fax)
> Department of Electrical Engineering            (765) 637-6302 (cell)
> University of Notre Dame                         mike.young at nd.edu
> B-38 Stinson-Remick Hall
> Notre Dame, IN 46556-5637
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
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From tierney at mtl.mit.edu  Tue Oct 20 15:00:53 2015
From: tierney at mtl.mit.edu (Paul Tierney)
Date: Tue, 20 Oct 2015 15:00:53 -0400
Subject: [labnetwork] MTI Flexifab units
Message-ID: <CF06C594-8553-48FD-8C0B-6FB31DD0513E@mtl.mit.edu>

To whomever is interested,

We have ten MTI Flexifab modules that we acquired used & never installed ourselves.
We would like to give them to someone for parts or to install. 
Recipient would be responsible for shipping (crating is probably unnecessary). 

We received them AS IS, but they were removed directly from a cleanroom, so, they are assumed to be working.
There are 3 bake units, 3 spin coat (6?, no developer), 2 arms (6?)  and indexers, 2 master stations.

Photos are available on request.

Paul Tierney
MIT - Microsystems Tech. Lab.
(617)253-5245




From khbeis at uw.edu  Tue Oct 20 19:43:50 2015
From: khbeis at uw.edu (Michael Khbeis)
Date: Tue, 20 Oct 2015 16:43:50 -0700
Subject: [labnetwork] Fab Positions in Seattle
Message-ID: <B66FC211-6B1D-48BB-A8EB-A8CF3C0FB2AE@uw.edu>

Dear Lab Network, 

We have several postings for openings both in the WNF fab and with our clients for Sr. and Jr. Engineers with the biggest immediate need being an etch engineer. Also looking for more technicians and even an administrative assistant. Please let me know if you have interest in these positions as the job postings take a few days to show up on our hiring website. 

Gratefully, 

Dr. Michael Khbeis
Associate Director, Washington Nanofabrication Facility (WNF) 
National Nanotechnology Infrastructure Network (NNIN)
University of Washington
Fluke Hall, Box 352143
(O) 206.543.5101
(F) 206.221.1681
(C) 443.254.5192
khbeis at uw.edu
www.wnf.washington.edu/




From swolcott at uchicago.edu  Wed Oct 21 17:37:08 2015
From: swolcott at uchicago.edu (Sally J. Wolcott)
Date: Wed, 21 Oct 2015 21:37:08 +0000
Subject: [labnetwork] Process Engineer position in Chicago at the Pritzker
 Nanofabrication Facility
Message-ID: <EF048C713536B3418E704C7B60275B0508B1A954@xm-mbx-08-prod.ad.uchicago.edu>

We would like to share our posting for a process engineer.  This is an opportunity to work in our brand new, state of the art cleanroom supporting nanolithographic processing.

Here is a link to the posting on UChicago jobs, ihttps://jobopportunities.uchicago.edu/applicants/jsp/shared/position/JobDetails_css.jsp?postingId=644960.  If that link doesn't work for you, go to https://jobopportunities.uchicago.edu/applicants/jsp/shared/Welcome_css.jsp and search for posting 099396.

Sally Wolcott
Business Manager, Pritzker Nanofabrication Facility
Institute for Molecular Engineering
University of Chicago
5640 South Ellis Avenue, 105C
Chicago, IL  60637
Office: 773-834-3548
Mobile:  773-332-1196
swolcott at uchicago.edu<mailto:swolcott at uchicago.edu>
ime.uchicago.edu<http://ime.uchicago.edu/>

This qualified individual will interface with PNF users including students, faculty and staff while providing training and support on process related matters. The Process Engineer will aid in developing appropriate training and standard operating procedures for processes and equipment in the PNF as required.

Job Responsibilities:
Work with researchers, PNF engineers and technical manager to optimize processes to ensure quality, reliability, and documentation of said processes.
Develop new processes as required in order to improve quality, safety, reliability. Take ownership of and be responsible for changes and improvements to processes used in the PNF.
Take ownership of the documentation and recordkeeping of requisite PNF processes including maintaining information regarding said processes on the PNF website or web based repository.
Take initiative of technical investigations where directed including designing experiments, testing, reporting results, and making recommendations to prevent recurrences.
As needed, work with equipment engineers to modify equipment to improve uptime or overall process performance.
Work with vendors for technical assistance and support.
Work with equipment engineers on new equipment installations and assist with startup and acceptance testing.
Assists and mentors users with process support.
Willingness to be on call.

Bachelor's degree required. BS or MS in engineering preferred. Other degrees in combination with relevant experience will be considered.
Cleanroom-based nano/microfabrication experience is required including experience in lithography, deposition, and etch.
Expertise with e-beam lithography, optical lithography, and mask/lithography process design preferred.
Expertise in inorganic thin film deposition (evaporation, sputtering, chemical vapor deposition, atomic layer deposition, and high temperature oxidation) preferred.
Experience with electronic device characterization is preferred.
Proven experience investigating process deviations and developing corrective and preventative actions preferred.
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From Harm.KNOOPS at oxinst.com  Thu Oct 22 17:08:11 2015
From: Harm.KNOOPS at oxinst.com (KNOOPS Harm)
Date: Thu, 22 Oct 2015 21:08:11 +0000
Subject: [labnetwork] Fwd: ALD of SiO2 and SiN with precursors 3DMAS
	and	BTBAS
In-Reply-To: <04B653F756F79C4282AFECF2C6EED18B46174D83@UKCENMBX01.oxinst.com>
References: <CA+_DRfB0N4MGUcbJNxVSdpJhs5LTEuqTtX0ziGQ8B-1TzwWmdQ@mail.gmail.com>
 <940964D2-5A05-41AE-8A0E-F7B837A14B43@nd.edu>
 <CAOKRUakGLWEnaGXPqvVKAWJ_2+k_fwnyX-iHwhY5p9GC_A41dA@mail.gmail.com>
 <04B653F756F79C4282AFECF2C6EED18B46174D83@UKCENMBX01.oxinst.com>
Message-ID: <ae883c16-1b6f-47da-bbc1-beab6ce28b62@UKCENHUB01.oxinst.com>

Dear Vicky,

I have just a few comments in addition to the nice overview that J from Stanford sent.

First regarding silicon precursors. We have recipes on file for 3DMAS and BTBAS for both SiNx and SiO2, and for BDEAS we also have recipes for SiO2 (and I expect this one would also work for SiNx, in many cases precursors are interchangeable to an extent in these recipes). We started in the past with 3DMAS for SiNx, but most of the recent work (in collaboration with Eindhoven University) is on BTBAS (see also attached papers from me).

Second regarding TDMAT and TiCl4. The attached paper from Brennan is also from MIT doing TiN using TDMAT on an OpAL. The mentioned silicon precursors are compatible with TDMAT. For TDMAT we did quite some work at Yatton and now the results at low temperature are comparable to those for TiCl4 (we can give that recipe as well). If they want to switch from TiCl4 to TDMAT, we would normally suggest to get a new manifold to replace the chlorine contaminated manifold. From previous experience, there is a risk that chlorine contamination could decompose other precursors which are installed on that manifold. This is the recommendation, but based on the other responses in this email chain we might be too careful. I can also imagine that something with high vapour pressure and good stability such as TMA can be on the same manifold when purging is sufficient.

Best regards,
Harm

=============================
Dr.ir. Harm Knoops (H.C.M. Knoops)
Technical Sales Specialist (ALD)
Oxford Instruments Plasma Technology
Email: harm.knoops at oxinst.com<mailto:harm.knoops at oxinst.com>
Phone: +31 6 23153483
Skype: harm.knoops_oxinst
www.oxford-instruments.com<http://www.oxford-instruments.com/>
=============================

From: WARD Craig
Sent: dinsdag 13 oktober 2015 13:49
To: KNOOPS Harm; MACKENZIE Brodie
Cc: MCQUARRIE Andrew
Subject: FW: [labnetwork] Fwd: ALD of SiO2 and SiN with precursors 3DMAS and BTBAS

Chaps,

Some general information from the same chain, J is one of the main users at Stanford.

Best Regards,

Craig Ward
US Applications Manager
Oxford Instruments America, Inc.
300 Baker Avenue, Suite 150,
Concord, MA 01742, USA
Mobile: +1 (978) 764 7023
Email: craig.ward at oxinst.com<mailto:craig.ward at oxinst.com>
http://www.oxford-instruments.com/


[Oxford Instruments Logo : The Business of Science]<http://www.oxford-instruments.com/>
[Email-footer-Processnews2015]<http://www.oxford-instruments.com/process-news>

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of J Provine
Sent: Tuesday, October 13, 2015 11:48 AM
Cc: Labnetwork
Subject: Re: [labnetwork] Fwd: ALD of SiO2 and SiN with precursors 3DMAS and BTBAS

Hello Dr. Diadiuk,
at stanford we have worked extensively on PEALD of SiN in the last year, characterizing deposition both on the Fiji systems in the SNF and on a FlexAl in a single PI laboratory. we were particularly interested in low wet etch rate in fluorine chemistries (like HF) and electrical properties such as leakage current and dielectric constant.

successful deposition was shown to be possible with 3DMAS, BTBAS, DCS (dicholorsilane, which i highly recommend against, reasons below), and TSA (trisilylamine). by far the majority of the work we have done is on 3DMAS, which we have stocked for a long time and are familiar with since we use it for SiO2 deposition as well. there are a couple of papers coming out soon on this work.

some details about each that may be helpful for you
3DMAS - good recipes established for SiO2 and SiN. most fully characterized precursor from this list. easily obtainable from sigma aldrich and strem and gelleste. price is comparable to other metal amide precursors (TDMA-Hf and TDMA-Ti). etch rate and electrical properties of SiO2 and SiN films are both demonstrably improved over PECVD at the same temperature. GPC ~0.1A/cycle

BTBAS - new precursor to us for this SiN study. not extensively studied, but deposition definitely possible for SiO2 and SiN. GPC ~0.2A/cycle. readily available and reasonably priced from all the typical precursor suppliers

TSA - promising for SiN. we have not looked into SiO2 deposition yet. not extensively explored. GPC ~0.25A/cycle for us, but others have reported even higher (close to 1A/cycle) which we could not reproduce on the FlexAl. low wet etch rate and low leakage currents, similar to what was achieved with 3DMAS. this precursor is pretty hard to stock as we could only source it from air liquid and it look a lot of effort/time/cost to get supply to Stanford. not sure why that is.

DCS - stay away from this. hard to get in a compatible storage cylinder for ALD (much more common to come in large volumes for distribution throughout a facility). dangerous for sure. also, not at all clear that this precursor provides a self limiting surface reaction, so it does not perform ALD so much as CVD. could not achieve etch rate or electrical properties as good as seen with 3dmas and tsa, most likely because of the lack of self-limiting half reactions. since you are already using TiCl4, this may not be as much of a concern, but we've stayed away from chloride chemistries in SNF because of issues with co-deposition in the same chamber with Pt and Ru metals by ALD.

let me comment further on your specific questions:
Does anyone have any experience w/them & with TDMAT?

we also have used TDMA-Ti for our Ti precursor since we started ALD work in SNF. we have had great success with TiO2 and TiN deposition with this precursor. as i mentioned above we steered clear of TiCl4 because of HCl by products and compatibility issues since we wanted to deposition Pt and Ru in the same chamber. is it possible this is where the concern you mentioned about TiCl4 with metal amide precursors comes from? similar to the notes from the folks at notre dame, i don't see a safety issue with using these precursors on the same manifold. as an additional datapoint on this, berkeley's nanolab had TiCl4, TMA, and TDMA-Hf all in use on their picosun system.

Any recommendations or suggestions for precursors for SiO2 and SiN?

see above.

We'd like to assess all of these precursors and films with respect to:
1) Cost and availability of precursor

addressed above

2) Robustness of precursor  (A precursor that degrades rapidly over time wld not be preferred)

i didn't mention this above, but we never saw any of these decay over time. the only precursor we have stocked for a long time (meaning months to a year) to know for sure that it has good shelf life is 3DMAS. however, TSA at least is chemically stable and requires no heating for introduction into the chamber, so i would surmise it is also stable.

bonus info: TDMA-Ti is quite stable on the shelf or even heated (we keep it at 75C on the tools), and will last for months.

3) Quality of film:  Electrical data would be nice but even indices of refraction would do

because we have papers coming out soon, i've stopped short of supplying raw data, but gave a general level of results above. indices of refraction for the optimized recipes are on the order of 2.0 at 655nm for 3DMAS and TSA. closer to 1.9 at 655nm for BTBAS, and 1.8 at 655nm for DCS.

4) Any chemical compatibility issues.

nothing established in this regard. everything looks fine.

5) Existence of recipes on the Oxford ALD tool at other places.  This will reduce the amount of optimization that we will need to do.

on our FlexAl
recipes in existence for SiN and SiO2 for 3DMAS. SiN for TSA and BTBAS, and starting points for SiO2.

additionally a starting point recipe for SiO2 for BTBAS on a different reactor (Cambridge Nanotech FijI)

please feel free to contact me if you would like recipe details, and i can be in touch regarding our forthcoming papers related to this topic if you wish.

i hope this was helpful.
dr j

On Tue, Oct 13, 2015 at 6:03 AM, Mike Young <myoung6 at nd.edu<mailto:myoung6 at nd.edu>> wrote:
Hi Vicky. See below for relevant comments from two of my esteemed colleagues, regarding our FlexAL and its sources.

--Mike

Begin forwarded message:

From: Mark Richmond <Mark.M.Richmond.7 at nd.edu<mailto:Mark.M.Richmond.7 at nd.edu>>


Mike,
   I was never informed of any manifold compatibility issues of precursors by Oxford, and Dr. Xing didn't have any objections to that either. I found that odd but the system is under vacuum and is purged well before and after recipes are executed. As you can see from Dave's screen capture we have had this setup for the last few years, although we do not perform many Titanium growths.

   As for the SiO2 and SiN we use BDEAS in our recipes, Nitride growth is very slow though. We never purchased a BTBAS source but we did have a 3DMAS source. The 3DMAS source was used up in attempting to characterize the material and we never had a good material growth so we have not replaced that material. It used to be in the empty spot that is now on the machine.

   Vicky should be able to contact Oxford for their information sheets on different film recipes per precursor or I have in the past anyway.

Thanks
Mark

On Mon, Oct 12, 2015 at 2:09 PM, David Heemstra <David.Heemstra.1 at nd.edu<mailto:David.Heemstra.1 at nd.edu>> wrote:
Mike:
We also have two separate manifolds.  Below is a screen capture for our system.
Maybe im missing something but - it sounds like they don't want to put TiCl4 and TMA on the same manifold?  I believe that is how ours is currently setup.
I thought we had 3DMAS or BTBAS a long time ago - but currently Si source is BDEAS.
Possible (if we are doing something that isn't ideal) it is OK as long as you use sufficient purges afterwards?
Not really sure that this helps.  Mark may have a better understanding.
Dave




[Inline image 1]


On Sun, Oct 11, 2015 at 10:26 AM, mike young <mike.young at nd.edu<mailto:mike.young at nd.edu>> wrote:
dave/mark, can you advise Vicky regarding this ALD question?



-------- Forwarded Message --------
Subject:

[labnetwork] ALD of SiO2 and SiN with precursors 3DMAS and BTBAS

Date:

Fri, 9 Oct 2015 15:56:30 -0400

From:

Vicky Diadiuk <diadiuk at mit.edu><mailto:diadiuk at mit.edu>

To:

labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>


Hi,
 We are interested in adding SiO2 and SiN deposition capabilities to at least one of our ALD systems (specifically the Oxford FlexAL).
The system has two sets of independent precursor manifolds.
Currently, one manifold is completely filled up with TMA, the Hf source and the W source, while the second manifold only has TiCl4 for depositing TiN and TiO2.
The problem is that the TiCl4 source (and other such metal halide sources) is not compatible with metal amide sources and thus we can't put any metal amide precursors on the two open slots on the second precursor manifold.

Our users are interested in depositing SiO2 and SiN by using metal amide precursors like 3DMAS and BTBAS but that requires that the TiCl4 source be replaced with a compatible Ti precursor, such as TDMAT to deposit TiN.
The precursors we are considering based on what people seem to be using at other universities and a quick literature search are:

SiO2
3DMAS/TDMAS
BTBAS
SiN
3DMAS
Does anyone have any experience w/them & with TDMAT?
Any recommendations or suggestions for precursors for SiO2 and SiN?

We'd like to assess all of these precursors and films with respect to:
1) Cost and availability of precursor
2) Robustness of precursor  (A precursor that degrades rapidly over time wld not be preferred)
3) Quality of film:  Electrical data would be nice but even indices of refraction would do
4) Any chemical compatibility issues.
5) Existence of recipes on the Oxford ALD tool at other places.  This will reduce the amount of optimization that we will need to do.

We really appreciate any comments you might have.
Thx,
 Vicky






--
Michael P. Young                                (574) 631-3268<tel:%28574%29%20631-3268> (office)
Nanofabrication Specialist                      (574) 631-4393<tel:%28574%29%20631-4393> (fax)
Department of Electrical Engineering            (765) 637-6302<tel:%28765%29%20637-6302> (cell)
University of Notre Dame                         mike.young at nd.edu<mailto:mike.young at nd.edu>
B-38 Stinson-Remick Hall
Notre Dame, IN 46556-5637


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork



+++ Virus-scanned by MailControl for Oxford Instruments +++


___________________________________________________________________________This e-mail is confidential and is for the addressee only.  Please refer to www.oxinst.com/email-statement for regulatory information.
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From khbeis at uw.edu  Thu Oct 22 19:55:02 2015
From: khbeis at uw.edu (Michael Khbeis)
Date: Thu, 22 Oct 2015 16:55:02 -0700
Subject: [labnetwork] Fire Alarm and HAZMAT panels
Message-ID: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>

Dear Colleagues, 

We are finalizing designs for our cleanroom renovation and a question regarding how Fire Alarm and HAZMAT panels are integrated came up.  Currently our HAZMAT panel with toxic gas monitors, gas cabinets, and burn-box monitor also has yellow pull stations and HAZMAT alarms on it. HAZMAT alarms trigger a relocation alarm but not a fire alarm for the whole building. High level gas leak will trigger the fire alarm panel and dump the building. We have several issues with this architecture - for example currently it is all or nothing so if one of the gas cabinets has a problem they all get tripped. Also, if we are working on a system the pull stations and strobes have to be bypassed.  Clearly less than ideal. Another issue is the fire code isn?t really geared toward semiconductor fab facilities, so our code description is lacking. 

For those of you with experience or relatively new facilities, can you please share a little about your system architecture and HAZMAT/TGM systems?  Also, we are planning on migrating from our Zellweger/MDA System 16 to remote gas monitoring.  Can I please have some feedback on experience with remote monitors and replacement/maintenance vs the central systems?

Gratefully, 

Dr. Michael Khbeis
Associate Director, Washington Nanofabrication Facility (WNF) 
National Nanotechnology Infrastructure Network (NNIN)
University of Washington
Fluke Hall, Box 352143
(O) 206.543.5101
(F) 206.221.1681
(C) 443.254.5192
khbeis at uw.edu
www.wnf.washington.edu/




From mtang at stanford.edu  Fri Oct 23 08:50:00 2015
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 23 Oct 2015 05:50:00 -0700
Subject: [labnetwork] Fire Alarm and HAZMAT panels
In-Reply-To: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>
References: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>
Message-ID: <562A2CF8.4050104@stanford.edu>

Dear Michael --

The overall TGO response matrix for SNF is posted on the Stanford EH&S 
website:
http://web.stanford.edu/dept/EHS/prod/researchlab/lab/tgo/TGOMatrix4color.PDF

And yes, it does depend on sets and subsets of alarms being wired 
independently, so some careful thought should be given to how the space 
is used and what spaces should be affected.

We recently took on management of a satellite lab physically located on 
our site, but code-wise considered a separate building.  We had what 
should have been a minor incident (hydrogen detector in the tool exhaust 
went off while the H2 MFC was being tested). But because all the 
building alarms in the Annex building are daisy chained in series, there 
is no way to have a local lab relocation alarm without triggering a 
building-wide HazMat evacuation.  And unfortunately, this alarm occurred 
just before a student was to deliver his thesis defense in the 
auditorium.  If the building is mixed use, it makes sense to contain the 
control areas in well-defined locations.  This requires thought given to 
how to the HazMat and fire panels should be linked together.

We also underwent a renovation of our TGO system, prompted by phase-out 
of two Honeywell detector products -- and would be glad to discuss with 
you the specifics of our system design.

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Bldg 141, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



On 10/22/2015 4:55 PM, Michael Khbeis wrote:
> Dear Colleagues,
>
> We are finalizing designs for our cleanroom renovation and a question regarding how Fire Alarm and HAZMAT panels are integrated came up.  Currently our HAZMAT panel with toxic gas monitors, gas cabinets, and burn-box monitor also has yellow pull stations and HAZMAT alarms on it. HAZMAT alarms trigger a relocation alarm but not a fire alarm for the whole building. High level gas leak will trigger the fire alarm panel and dump the building. We have several issues with this architecture - for example currently it is all or nothing so if one of the gas cabinets has a problem they all get tripped. Also, if we are working on a system the pull stations and strobes have to be bypassed.  Clearly less than ideal. Another issue is the fire code isn?t really geared toward semiconductor fab facilities, so our code description is lacking.
>
> For those of you with experience or relatively new facilities, can you please share a little about your system architecture and HAZMAT/TGM systems?  Also, we are planning on migrating from our Zellweger/MDA System 16 to remote gas monitoring.  Can I please have some feedback on experience with remote monitors and replacement/maintenance vs the central systems?
>
> Gratefully,
>
> Dr. Michael Khbeis
> Associate Director, Washington Nanofabrication Facility (WNF)
> National Nanotechnology Infrastructure Network (NNIN)
> University of Washington
> Fluke Hall, Box 352143
> (O) 206.543.5101
> (F) 206.221.1681
> (C) 443.254.5192
> khbeis at uw.edu
> www.wnf.washington.edu/
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork





From cbayram at illinois.edu  Fri Oct 23 11:06:51 2015
From: cbayram at illinois.edu (Bayram, Can)
Date: Fri, 23 Oct 2015 15:06:51 +0000
Subject: [labnetwork] FYI : IMMEDIATE Research Engineer Opening at the Micro
 and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign,
 IL, USA
Message-ID: <6FCBF0FD5C36AB4B81ED9CDC061A045F06C21E65@CITESMBX6.ad.uillinois.edu>

Research Engineer

Micro and Nanotechnology Laboratory

College of Engineering

University of Illinois at Urbana-Champaign



REVISED and EXTENDED



The Micro and Nanotechnology Laboratory at the University of Illinois at Urbana-Champaign has an immediate opening for a Research Engineer.  This position will promote research related activities by managing equipment involving semiconductor device fabrication, processes, and some applications in nano-biotechnology.  Specific duties and responsibilities include:

  *   Manage and maintain semiconductor processing equipment including maintenance, repair, and operation of plasma etching equipment including reactive ion etching (RIE), chemically assisted ion beam etching (CAIBE), and inductively coupled plasma reactive ion etching (ICP-RIE).
  *   Maintain, repair, and operate deposition equipment including plasma enhanced chemical vapor deposition (PECVD) and low pressure chemical vapor deposition (LPCVD).
  *   Maintain, repair, and operate optical lithography equipment including spinners, mask aligners, and UV exposure systems.
  *   Train users on lab procedures and lab safety as well as on existing processes and equipment.
  *   Assist users in process related troubleshooting, developing new processes, calibrating processes and process equipment.
  *   Qualify processes on new equipment, document processes, tool performance, lab procedures, and add to a process recipe database.

Basic administrative work such as the creation, distribution, and processing of lab forms, log sheets, etc. In some circumstances, the research engineer may be required to work with other engineers on repair and maintenance of various other tools in the cleanroom, as well as the modification, upgrade, and development of tools.



Minimum Qualifications:

  *   Bachelor?s degree in Engineering or a related field.
  *   4 years experience working in micro/nanofabrication at an academic or industrial research laboratory; experience in process development and troubleshooting; data analysis, related to dry etch (RIE) and plasma deposition (PECVD).
  *   Comprehensive understanding of electrical and mechanical schematics for diagnosis and repair of semiconductor equipment.
  *   Excellent organization, planning and oral/written communication skills

The Research Engineer position is a full-time, benefits-eligible academic professional position appointed on a 12-month service basis, and is located in the vibrant Urbana-Champaign area. The opening is immediate. Applicants are reviewed weekly, and may be interviewed before the closing date; however, no hiring decision will be made until after that date.  Salary is commensurate with experience and qualifications.



To apply for this position, please create your candidate profile at http://jobs.illinois.edu<http://jobs.illinois.edu/> and upload your cover letter, resume, and names/contact information for three references by October 30, 2015.  Full consideration will be given to complete applications received by the closing date.  For further information regarding application procedures, contact Michael Sullivan, msulli at illinois.edu<mailto:lewin at illinois.edu>, 217-300-2259.



Illinois is an equal opportunity employer and all qualified applicants will receive consideration for employment without regard to race, religion, color, national origin, sex, sexual orientation, gender identity, age, status as a protected veteran, or status as a qualified individual with a disability. Illinois welcomes individuals with diverse backgrounds, experiences, and ideas who embrace and value diversity and inclusivity.  (www.inclusiveillinois.illinois.edu<http://www.inclusiveillinois.illinois.edu/>).



LINK: https://jobs.illinois.edu/academic-job-board/job-details?jobID=51376&job=research-engineer-micro-and-nanotechnology-laboratory-a1500196



Close Date: 10/30/2015
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From JBlais at hallam-ics.com  Fri Oct 23 11:23:38 2015
From: JBlais at hallam-ics.com (Blais, Jim)
Date: Fri, 23 Oct 2015 15:23:38 +0000
Subject: [labnetwork] Fire Alarm and HAZMAT panels
In-Reply-To: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>
References: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>
Message-ID: <3158b3480d4d49709b419543b206c300@mail.hallam2000.com>

Dear Dr. Michael Khbeis:

Concerning adopted codes ?

Given the wealth of knowledge and experience available and gained over the many years of designing stand-alone gas safety systems for both semiconductor fabrication and research facilities? our recommendation is to not limit your gas monitoring ? HAZMAT system designs to the local ?adopted jurisdictional codes? (minimum code requirements).

For example ?

Specific guidance addressing semiconductor facilities can be found in the International Fire Code (IFC) - developed by the International Code Council.  The 2015 edition of the IFC includes a Chapter (27) on ?Semiconductor Fabrication Facilities?.

Several other chapters also provide guidance and as a sample include? Emergency Planning and Preparedness, Hazardous Materials, Highly Toxic and Toxic Materials, Flammable Gases and Flammable Cryogenic Fluids, Pyrophoric Materials and several others.

Regarding pyrophorics - the IFC pyrophoric chapter (64) will direct you to comply with ANSI/CGA-G13-2015 for any SiH4 gas or gas mixtures of 1.37% or greater.  This is the CGA standard for ?Storage and Handling of Silane and Silane Mixtures?.

The CGA is another great best practice resource for guidance on such things as the classification of toxic gas mixtures (CGA-P20) and a calculation reference for categorizing gas mixtures containing flammable and non-flammable components (CGA-P23).

NFPA now has ?NFPA 1 ? Fire Code? ? along with ?NFPA 318: Standard for the Protection of Semiconductor Fabrication Facilities, 2015.?

We also (of course) always reference NFPA 70 (NEC) ? along with its ?Special Occupancies? sections; addressing the approved ?protection techniques? for gas monitoring and equipment located within Hazardous (Classified) locations.  Among several other NFPA codes ? NFPA 72 is now the National Fire Alarm and Signaling Code?.

Additional guidance can also be found in the ICC ? International Building Code? ?use and occupancy classifications, means of egress, etc.

We also find great guidance and subscribe to "SEMI View" and its Guidelines, the ACGIH and SESHA.  FM Global is also a very good resource for specific guidance on safe practices within semiconductor facilities.



Concerning Global Shutdowns ?

Depending upon your facility ? if equipped with gas detection within contained and ventilated enclosures ? we would begin by referencing the IFC ?Semiconductor Fabrication Facilities? 2703.13.2.2 Shutoff Gas Supply.

Example ? TWL-TLV gas detection within a contained, ventilated and exhausted tool gas box.

This essentially permits you to shut down only the specific upstream gas source detected.  Depending upon gas detection technology ? this would include all cross sensitive gases as well.  For example if the gas target is a hydride? and there are other hydrides (AsH3, PH3, B2H6, SiH4, etc.) also feeding the tool gas box ? all upstream gas sources (VMB sticks, gas cabinet outlet/s) would also require shutdown ? but not necessarily the entire building.  Ambient breathing gas alarms ? do more typically involve a global shutdown and evacuation.

Concerning Remote Gas Detection ?

As you know ? there are many gas detection technologies available ? some of which are better suited than others ? depending upon your specific gas targets and facility needs.  A supplier assessment is a good first step with the following considerations:

1.       Target gas ? and mixtures; TWA-TLV, LEL? alarm level protocol

2.       Gas detection capability:

a.       Lower Detection Limit

b.      Lower Alarm Limit

c.       Cross sensitivities/known interferences

d.      Full measuring range

e.      Drift ? zero and span, over sample time periods

f.        Calibration frequency

g.       Sensor response time to T90

3.       Diffusion or Extractive (FEP sample tubing);

a.       If extractive ? maximum sample line distance ? for each applied  gas family...

b.      If extractive ? transport time

4.       Sensor diagnostics

5.       Power requirements

6.       Communication ? integrations options - Ethernet/CIP, Analog, other...

7.       Exhaust duct adapter ? configuration / size / penetration requirements; for diffusion sensors (LEL, electrochemical) - remote cable assembly lengths, etc.

8.       Cost of Ownership - Periodic sensor replacements ? chemcassette tapes / sensor cells

9.       Warranty



Summary ?

We typically apply a mix of the best gas detection technology available ? that best meets the detection assessment needs for each specific gas target.

In many cases ? this is a combination of a ?central system? (chemcassette or FTIR) and individual transmitters capable of detecting oxygen depletion, flammable gases (H2, CH4) and other remote locations or with special occupancy needs (Classified areas).

?         For example ? the ACGIH ? TWA-TLV for AsH3 usually directs us to chemcassette.  If there are several hydride monitoring and AsH3 points needed ? this could justify a small central system, ideally, located near the gas targets.



Michael ?

We are consulting engineers / system integrators providing TGMS integration with UL listed control platforms ? with a dedicated group focused on Toxic Gas Monitoring ? Safety Shutdown Systems.

Our systems are configured as ?stand-alone? dedicated safety systems. All gas monitoring is interfaced and performed via a dedicated control platform.

This includes both informative local and remote alarm audible/visual notification appliances ? along with ThinClient visualization nodes ? configured with key detailed alarm information (location, gas type, gas concentration, etc.) ? providing emergency response teams with the critical information they need (at safe locations) ? to help enable a safe entry and fast recovery.

Our systems are focused on reliability (no covert or fail-danger faults), flexibility and security.

?         In terms of ?flexibility? ? we recognize change and maintenance is always required. We can disable and isolate only the specific tool points or field devices being revised ? without compromise to or disabling of the overall integrity and safety monitoring of the facility or adjoining labs or tools.

We also typically interface with the Fire Alarm System (FAS) and Building Management System (bi-direction signaling) ? yet our system logic controllers ? are configured similarly to a FAS, with ?supervised? wiring, full diagnostics and fail-safe wiring practices ? to ensure all gas detection and field safety devices are ?available?.

I hope some of this is helpful to you.

Please feel free to contact me directly with any questions or if you would like any additional information.

Thank you,

Jim Blais

Senior Controls Engineer

Hallam-ICS

jblais at hallam-ics.com

South Burlington, VT 05403

Office: 802-658-4891 x1270

Direct: 802-657-4970

Mobile: 802-343-2718

www.Hallam-ICS.com



-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Khbeis
Sent: Thursday, October 22, 2015 7:55 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Fire Alarm and HAZMAT panels



Dear Colleagues,



We are finalizing designs for our cleanroom renovation and a question regarding how Fire Alarm and HAZMAT panels are integrated came up.  Currently our HAZMAT panel with toxic gas monitors, gas cabinets, and burn-box monitor also has yellow pull stations and HAZMAT alarms on it. HAZMAT alarms trigger a relocation alarm but not a fire alarm for the whole building. High level gas leak will trigger the fire alarm panel and dump the building. We have several issues with this architecture - for example currently it is all or nothing so if one of the gas cabinets has a problem they all get tripped. Also, if we are working on a system the pull stations and strobes have to be bypassed.  Clearly less than ideal. Another issue is the fire code isn?t really geared toward semiconductor fab facilities, so our code description is lacking.



For those of you with experience or relatively new facilities, can you please share a little about your system architecture and HAZMAT/TGM systems?  Also, we are planning on migrating from our Zellweger/MDA System 16 to remote gas monitoring.  Can I please have some feedback on experience with remote monitors and replacement/maintenance vs the central systems?



Gratefully,



Dr. Michael Khbeis

Associate Director, Washington Nanofabrication Facility (WNF) National Nanotechnology Infrastructure Network (NNIN) University of Washington Fluke Hall, Box 352143

(O) 206.543.5101

(F) 206.221.1681

(C) 443.254.5192

khbeis at uw.edu<mailto:khbeis at uw.edu>

www.wnf.washington.edu/<http://www.wnf.washington.edu/>





_______________________________________________

labnetwork mailing list

labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>

https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

________________________________


CONFIDENTIALITY NOTICE:
The information contained in this transmission, as well as any accompanying documents, constitutes confidential and/or legally privileged information which is the property of Hallam-ICS. The information is intended solely for the individual entity named on this transmittal sheet. If you are not the designated recipient, you are hereby notified that any disclosure, copying, distribution or taking any action in reliance on this information is strictly prohibited. If you received this in error, please contact the sender and delete the material from any computer. Opinions, conclusions and the information in this message that do not relate to the official business of my firm shall be understood as neither given nor endorsed by it.
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From vito.logiudice at uwaterloo.ca  Mon Oct 26 14:33:17 2015
From: vito.logiudice at uwaterloo.ca (Vito Logiudice)
Date: Mon, 26 Oct 2015 18:33:17 +0000
Subject: [labnetwork] Fire Alarm and HAZMAT panels
In-Reply-To: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>
References: <96820660-D577-4C95-A38D-B9152FDFA152@uw.edu>
Message-ID: <D253DCB5.659EC%vlogiudi@connect.uwaterloo.ca>

Hi Michael,

In our particular case, the complex in which the cleanroom sits serves
many different purposes ranging from undergraduate labs, seminar rooms,
graduate labs, office space and a 220-seat auditorium. The building?s
design is such that the cleanroom sits at the ?front? of the building on
its own foundation and with its own separate air handling system. Thus,
the decision was made early on to separate the TGMS panel from the fire
panel to avoid dumping the entire 280,000 sq.ft. complex should the TGMS
system be triggered. The TGMS is tied into each gas cabinet and is
designed to stop the offending gas flow in the event of a level 2 alarm.
All gases within the facility will be shut off at source should one of the
EGO pushbuttons around the perimeter of the facility be triggered by a lab
occupant.

We do not have a HAZMAT system with separate emergency pull stations. We
instruct our lab members to defer to the TGMS EGO pushbuttons in the event
of any non-gas, non-fire related emergency (chemical or otherwise) as a
means of evacuating the cleanroom quickly. This may not be the best
approach since gas flows are needlessly interrupted in the event of a
non-gas emergency but it helps make our emergency response protocol
somewhat simpler to convey and execute.

FYI, our system monitors for leaks at each gas cabinet exhaust as well as
at all exhausted MFC cabinets or enclosures (we don?t have any VMB?s but
do have exhausted gas ?pods? which hold MFC?s such as those for our RIE
systems). Between these enclosures, all toxic gas lines are run in orbital
welded, coax lines. Since these lines are welded and given the large
number of (diluting) air changes occurring within the facility, we decided
not to include room sensors early on during the design phase.

Best,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca
Website: https://fab.qnc.uwaterloo.ca





-----Original Message-----
From: Michael Khbeis <khbeis at uw.edu>
Date: Thursday, October 22, 2015 at 7:55 PM
To: "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Fire Alarm and HAZMAT panels

>Dear Colleagues, 
>
>We are finalizing designs for our cleanroom renovation and a question
>regarding how Fire Alarm and HAZMAT panels are integrated came up.
>Currently our HAZMAT panel with toxic gas monitors, gas cabinets, and
>burn-box monitor also has yellow pull stations and HAZMAT alarms on it.
>HAZMAT alarms trigger a relocation alarm but not a fire alarm for the
>whole building. High level gas leak will trigger the fire alarm panel and
>dump the building. We have several issues with this architecture - for
>example currently it is all or nothing so if one of the gas cabinets has
>a problem they all get tripped. Also, if we are working on a system the
>pull stations and strobes have to be bypassed.  Clearly less than ideal.
>Another issue is the fire code isn?t really geared toward semiconductor
>fab facilities, so our code description is lacking.
>
>For those of you with experience or relatively new facilities, can you
>please share a little about your system architecture and HAZMAT/TGM
>systems?  Also, we are planning on migrating from our Zellweger/MDA
>System 16 to remote gas monitoring.  Can I please have some feedback on
>experience with remote monitors and replacement/maintenance vs the
>central systems?
>
>Gratefully, 
>
>Dr. Michael Khbeis
>Associate Director, Washington Nanofabrication Facility (WNF)
>National Nanotechnology Infrastructure Network (NNIN)
>University of Washington
>Fluke Hall, Box 352143
>(O) 206.543.5101
>(F) 206.221.1681
>(C) 443.254.5192
>khbeis at uw.edu
>www.wnf.washington.edu/
>
>
>_______________________________________________
>labnetwork mailing list
>labnetwork at mtl.mit.edu
>https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork




From tierney at mtl.mit.edu  Mon Oct 26 15:51:43 2015
From: tierney at mtl.mit.edu (Paul Tierney)
Date: Mon, 26 Oct 2015 15:51:43 -0400
Subject: [labnetwork] MTI Flexifab units
Message-ID: <7B47ACFD-BEBF-494B-B523-68248230084D@mtl.mit.edu>

Hi all,

The ten MTI Flexifab units that were offered on 10/20 last week have been claimed.

Thanks,

Paul Tierney
MIT-MTL


From vito.logiudice at uwaterloo.ca  Mon Oct 26 16:42:58 2015
From: vito.logiudice at uwaterloo.ca (Vito Logiudice)
Date: Mon, 26 Oct 2015 20:42:58 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
Message-ID: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

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From cme133 at psu.edu  Mon Oct 26 20:17:03 2015
From: cme133 at psu.edu (CHAD EICHFELD)
Date: Mon, 26 Oct 2015 20:17:03 -0400 (EDT)
Subject: [labnetwork] Suggestions for interlocking mask aligners
Message-ID: <edce2acf-6dcb-4ded-b989-0aad65b9220b@psu.edu>

Hello Vito,
We interlocked our Suss-Microtec MA6 by interupting the mask vacuum sensor. ?I prefer this over the mask vacuum solenoid or shutting the tool off. ?

Thanks,
Chad

--
Chad Eichfeld, PhD
Facilites Lead, Nanofabritication Lab
Materials Research Institute
The Pennsylvania State University
cme133 at psu.edu

From: Vito Logiudice <vito.logiudice at uwaterloo.ca>
Sent: Oct 26, 2015 5:53 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice ?P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON ? ? ? ? ? Canada N2L 3G1
Tel.: (519) 888-4567 ?ext. 38703
Email:?vito.logiudice at uwaterloo.ca
Website:?https://fab.qnc.uwaterloo.ca

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From spaolini at cns.fas.harvard.edu  Tue Oct 27 11:10:17 2015
From: spaolini at cns.fas.harvard.edu (Paolini, Steven)
Date: Tue, 27 Oct 2015 15:10:17 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
Message-ID: <A806238C0992094FBF9298E5D90F5489F9E68E31@HARVANDMBX01.fasmail.priv>

Vito,
   When we were faced with some situations like this, we always look to block a function that will not cause an alarm on the system. In the case of contact aligners, I would put a solenoid valve on the air line that opens the shutter. If your interlock system just provides dry contacts, you will have to use a relay and separate power source to operate it.
Steve Paolini
Equipment Dood
Harvard Center for Nanoscale Systems

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: Monday, October 26, 2015 4:43 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca<https://urldefense.proofpoint.com/v2/url?u=https-3A__fab.qnc.uwaterloo.ca&d=CwMFAg&c=WO-RGvefibhHBZq3fL85hQ&r=-H4Z_jeDfTYjnKPXor15vLwzBllmg8gFrb9m_k9OGks&m=JBLB6qHiWO8yeqC39SH95uOiCB8DgrJDUmJD9XLZbyk&s=YY6II-7ryKy-84wkPWLu0PYIHIy6ozbdzrL0770beB8&e=>

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From lej at danchip.dtu.dk  Wed Oct 28 10:47:16 2015
From: lej at danchip.dtu.dk (Leif Johansen)
Date: Wed, 28 Oct 2015 14:47:16 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
Message-ID: <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

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From sbhas at uchicago.edu  Wed Oct 28 12:30:00 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Wed, 28 Oct 2015 16:30:00 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
Message-ID: <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don't want to have like this. I don't want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

-------------- next part --------------
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From vito.logiudice at uwaterloo.ca  Wed Oct 28 12:52:05 2015
From: vito.logiudice at uwaterloo.ca (Vito Logiudice)
Date: Wed, 28 Oct 2015 16:52:05 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
Message-ID: <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>

Hello Shiva,

If I?m not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don?t want to have like this. I don?t want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don?t want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

-------------- next part --------------
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From sbhas at uchicago.edu  Wed Oct 28 13:06:12 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Wed, 28 Oct 2015 17:06:12 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
Message-ID: <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>

Hello Vito,

Sorry I should have mentioned more clearly. For example one of my tool I am planning to turn off/on the computer screen using the relay.

But for laptop I cant turn off/on the screen using relay or activate the screen using relay. May be I am wrong,
I checked with outside vendor regarding this but he mentioned it can be done, but it involves quite an effort to be done, there is also code to just turn off/on the laptop screen, but I couldn't find with the relay.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

If I'm not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don't want to have like this. I don't want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

-------------- next part --------------
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From vito.logiudice at uwaterloo.ca  Wed Oct 28 13:41:11 2015
From: vito.logiudice at uwaterloo.ca (Vito Logiudice)
Date: Wed, 28 Oct 2015 17:41:11 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
Message-ID: <D2567E06.65EC2%vlogiudi@connect.uwaterloo.ca>

Hello Shiva,

Apologies, I misunderstood your first email.

We have a sputter system which also runs its operating software on a laptop. As an initial simple approach we plan to interlock this particular system by interlocking the computer track ball  which is connected to the laptop and disabling the laptop?s trackpad via its configuration settings page. Some on this forum have already mentioned that disabling a computer mouse is not the best interlocking approach since users can easily bypass the system by bringing in their own mouse. This makes sense and I think many of us on this forum have likely come across such "resourceful? individuals in the past. Nonetheless, we plan to start with this approach for now and see how it goes before exploring other options.

I look forward to hearing what others in the community might suggest to help you out.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 1:06 PM
To: Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>
Cc: "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello Vito,

Sorry I should have mentioned more clearly. For example one of my tool I am planning to turn off/on the computer screen using the relay.

But for laptop I cant turn off/on the screen using relay or activate the screen using relay. May be I am wrong,
I checked with outside vendor regarding this but he mentioned it can be done, but it involves quite an effort to be done, there is also code to just turn off/on the laptop screen, but I couldn?t find with the relay.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

If I?m not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don?t want to have like this. I don?t want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don?t want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

-------------- next part --------------
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From sbhas at uchicago.edu  Wed Oct 28 13:48:46 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Wed, 28 Oct 2015 17:48:46 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <D2567E06.65EC2%vlogiudi@connect.uwaterloo.ca>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
 <D2567E06.65EC2%vlogiudi@connect.uwaterloo.ca>
Message-ID: <A71ECB2B7F230841A953EFA3D299504A287ECA67@xm-mbx-08-prod>

Vito,

I like this idea of interlocking the track ball of the mouse. Is it possible to tell me how you wired it so that I can try on the sputtering system. Atleast I have something to start with rather than not having any interlock.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 12:41 PM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

Apologies, I misunderstood your first email.

We have a sputter system which also runs its operating software on a laptop. As an initial simple approach we plan to interlock this particular system by interlocking the computer track ball  which is connected to the laptop and disabling the laptop's trackpad via its configuration settings page. Some on this forum have already mentioned that disabling a computer mouse is not the best interlocking approach since users can easily bypass the system by bringing in their own mouse. This makes sense and I think many of us on this forum have likely come across such "resourceful" individuals in the past. Nonetheless, we plan to start with this approach for now and see how it goes before exploring other options.

I look forward to hearing what others in the community might suggest to help you out.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 1:06 PM
To: Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>
Cc: "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello Vito,

Sorry I should have mentioned more clearly. For example one of my tool I am planning to turn off/on the computer screen using the relay.

But for laptop I cant turn off/on the screen using relay or activate the screen using relay. May be I am wrong,
I checked with outside vendor regarding this but he mentioned it can be done, but it involves quite an effort to be done, there is also code to just turn off/on the laptop screen, but I couldn't find with the relay.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

If I'm not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don't want to have like this. I don't want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

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From vito.logiudice at uwaterloo.ca  Wed Oct 28 13:56:11 2015
From: vito.logiudice at uwaterloo.ca (Vito Logiudice)
Date: Wed, 28 Oct 2015 17:56:11 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287ECA67@xm-mbx-08-prod>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
 <D2567E06.65EC2%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287ECA67@xm-mbx-08-prod>
Message-ID: <D25683FE.56A59%vlogiudi@connect.uwaterloo.ca>

Shiva,

Of course. I will ask the experts on my team to describe the method they plan to use and report back. We have not yet interlocked our sputter but the mouse has been interlocked on other tools.

Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 1:48 PM
To: Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>
Cc: "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Vito,

I like this idea of interlocking the track ball of the mouse. Is it possible to tell me how you wired it so that I can try on the sputtering system. Atleast I have something to start with rather than not having any interlock.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 12:41 PM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

Apologies, I misunderstood your first email.

We have a sputter system which also runs its operating software on a laptop. As an initial simple approach we plan to interlock this particular system by interlocking the computer track ball  which is connected to the laptop and disabling the laptop?s trackpad via its configuration settings page. Some on this forum have already mentioned that disabling a computer mouse is not the best interlocking approach since users can easily bypass the system by bringing in their own mouse. This makes sense and I think many of us on this forum have likely come across such "resourceful? individuals in the past. Nonetheless, we plan to start with this approach for now and see how it goes before exploring other options.

I look forward to hearing what others in the community might suggest to help you out.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 1:06 PM
To: Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>
Cc: "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello Vito,

Sorry I should have mentioned more clearly. For example one of my tool I am planning to turn off/on the computer screen using the relay.

But for laptop I cant turn off/on the screen using relay or activate the screen using relay. May be I am wrong,
I checked with outside vendor regarding this but he mentioned it can be done, but it involves quite an effort to be done, there is also code to just turn off/on the laptop screen, but I couldn?t find with the relay.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

If I?m not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don?t want to have like this. I don?t want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don?t want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca

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From James_Goodman at uml.edu  Wed Oct 28 16:22:57 2015
From: James_Goodman at uml.edu (Goodman, James R)
Date: Wed, 28 Oct 2015 20:22:57 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <D2567E06.65EC2%vlogiudi@connect.uwaterloo.ca>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
 <D2567E06.65EC2%vlogiudi@connect.uwaterloo.ca>
Message-ID: <D91E26628B4D6A49879DEB4815149C65A7C9B7CD@ACURA.fs.uml.edu>

For a Sputter system the power supplies generally have an external interlock. If you add your relay to this interlock string they may be able to load and pump the system but would not be able to Sputter anything.

Jay.

James Goodman
Equipment Manager, Saab/ETIC Nanofabrication Laboratory
University of Massachusetts, Lowell
40 University Ave.
Room 121
Lowell, MA -01854
Office (978) 934-3469
Cell (603) 235-1496
[cid:image001.png at 01D1119C.E7C012B0]

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: Wednesday, October 28, 2015 1:41 PM
To: Shivakumar Bhaskaran
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Shiva,

Apologies, I misunderstood your first email.

We have a sputter system which also runs its operating software on a laptop. As an initial simple approach we plan to interlock this particular system by interlocking the computer track ball  which is connected to the laptop and disabling the laptop's trackpad via its configuration settings page. Some on this forum have already mentioned that disabling a computer mouse is not the best interlocking approach since users can easily bypass the system by bringing in their own mouse. This makes sense and I think many of us on this forum have likely come across such "resourceful" individuals in the past. Nonetheless, we plan to start with this approach for now and see how it goes before exploring other options.

I look forward to hearing what others in the community might suggest to help you out.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 1:06 PM
To: Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>
Cc: "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello Vito,

Sorry I should have mentioned more clearly. For example one of my tool I am planning to turn off/on the computer screen using the relay.

But for laptop I cant turn off/on the screen using relay or activate the screen using relay. May be I am wrong,
I checked with outside vendor regarding this but he mentioned it can be done, but it involves quite an effort to be done, there is also code to just turn off/on the laptop screen, but I couldn't find with the relay.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/<https://urldefense.proofpoint.com/v2/url?u=https-3A__searle-2Dcleanroom.uchicago.edu_&d=CwMF-g&c=lqHimbpwJeF7VTDNof4ddnO1LTp7jTaMHJ2UAxZwrfY&r=v6Pf_23t6PwENzSNFbgZfcfOIQOfCJzqB3p__FsRpcc&m=qmAMzT-H7OnIyYuKHFWBo0ZJ9ztw00rcw-VpZH9HXw4&s=3GRDL01YvYUIwkfaZBXpgAIEmt3pOuDWxkpvozp1uwU&e=>

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

If I'm not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don't want to have like this. I don't want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/<https://urldefense.proofpoint.com/v2/url?u=https-3A__searle-2Dcleanroom.uchicago.edu_&d=CwMF-g&c=lqHimbpwJeF7VTDNof4ddnO1LTp7jTaMHJ2UAxZwrfY&r=v6Pf_23t6PwENzSNFbgZfcfOIQOfCJzqB3p__FsRpcc&m=qmAMzT-H7OnIyYuKHFWBo0ZJ9ztw00rcw-VpZH9HXw4&s=3GRDL01YvYUIwkfaZBXpgAIEmt3pOuDWxkpvozp1uwU&e=>

From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca<https://urldefense.proofpoint.com/v2/url?u=https-3A__fab.qnc.uwaterloo.ca&d=CwMF-g&c=lqHimbpwJeF7VTDNof4ddnO1LTp7jTaMHJ2UAxZwrfY&r=v6Pf_23t6PwENzSNFbgZfcfOIQOfCJzqB3p__FsRpcc&m=qmAMzT-H7OnIyYuKHFWBo0ZJ9ztw00rcw-VpZH9HXw4&s=ahezThRG_9e59GyyCYUqirjUXjUzK6QQi12efZZgytY&e=>

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From hirent at gmail.com  Wed Oct 28 16:16:33 2015
From: hirent at gmail.com (Hiren Trada)
Date: Wed, 28 Oct 2015 16:16:33 -0400
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
Message-ID: <036801d111bd$8a6fd110$9f4f7330$@gmail.com>

Windows laptops can be configured to remain operational with the lid closed.

In Windows 7, click on the battery icon in the task bar and select 'More
Power Options'.

In the window that opens up, on the left, there is an option, 'Choose what
closing the lid does'.

Click on this link and select, 'Do nothing' from the drop-down boxes.

Click 'Apply', then 'Ok'. 

 

You should be set.

 

 

Hiren Trada, Ph.D.

University of Louisville

 

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Shivakumar Bhaskaran
Sent: Wednesday, October 28, 2015 1:06 PM
To: Vito Logiudice
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

 

Hello Vito,

 

Sorry I should have mentioned more clearly. For example one of my tool I am
planning to turn off/on the computer screen using the relay. 

 

But for laptop I cant turn off/on the screen using relay or activate the
screen using relay. May be I am wrong,

I checked with outside vendor regarding this but he mentioned it can be
done, but it involves quite an effort to be done, there is also code to just
turn off/on the laptop screen, but I couldn't find with the relay.

 

-Thanks

-Shiva

 

Shivakumar Bhaskaran, Ph.D.

Searle CleanRoom Manager

The University of Chicago

5735 S.Ellis, Room 032

Chicago-60637

Ph:773-795-2297

https://searle-cleanroom.uchicago.edu/

 

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca] 
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: Suggestions for interlocking mask aligners

 

Hello Shiva,

 

If I'm not mistaken some laptops can be configured to remain active even
when the monitor is folded over to the closed position. In this position the
monitor will turn off but the CPU will remain in operation which I think
would solve your problem. Perhaps you can have someone in your local IT
department have a look at your particular laptops to see if they can be
configured this way.

 

Best regards,

Vito

 

From: Shivakumar Bhaskaran <sbhas at uchicago.edu>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk>, Vito Logiudice
<vito.logiudice at uwaterloo.ca>, "labnetwork at mtl.mit.edu"
<labnetwork at mtl.mit.edu>
Subject: RE: Suggestions for interlocking mask aligners

 

Hello All,

 

Since you all are exchanging emails regarding the interlock, I myself
planning to do in my facility. I was able to figure out for some of the tool
that I have. But two of my tool is hooked up to laptop, if I shutdown the
laptop or close the lid of the laptop the software stops working and then
the vacuum valve or heater shuts off which I don't want to have like this. I
don't want to add computer screen or load the software in desktop due to
space constraint. 

 

The two tools that I am having are one is Arradiance Gemstar ALD and another
is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using
relay, because I want the system to in vacuum even if its not in use.

 

-Thanks

-Shiva

 

Shivakumar Bhaskaran, Ph.D.

Searle CleanRoom Manager

The University of Chicago

5735 S.Ellis, Room 032

Chicago-60637

Ph:773-795-2297

https://searle-cleanroom.uchicago.edu/

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

 

Hello Vito, 

 

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked
the electrical signal for the solenoid controlling the CDA for the shutter.
It works fine. If you want, we can mail you some pictures of how we did it. 

 

Of course, if a user really wanted to cheat, he or she could perform all
work before the exposure (i.e. mask load, wafer load and alignment) without
logging in, and then only log in during exposure. In reality, we do not see
such misuse. 

 

Best regards, 

 

Leif

 

 

From:labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Suggestions for interlocking mask aligners

 

Dear Colleagues,

 

I would appreciate hearing how you may have interlocked the mask aligners in
your respective facilities. In our particular case we have a Suss-Microtec
MA6 aligner and we are struggling to identify a parameter that can be
interlocked without causing the system additional wear and tear. Any
insights would be appreciated. Thank you.

 

Best regards,

Vito

--

Vito Logiudice  P.Eng.

Director of Operations, Quantum NanoFab

University of Waterloo

Lazaridis QNC 1207

200 University Avenue West

Waterloo, ON           Canada N2L 3G1

Tel.: (519) 888-4567  ext. 38703

Email: vito.logiudice at uwaterloo.ca

Website: https://fab.qnc.uwaterloo.ca

 

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From hirent at gmail.com  Wed Oct 28 16:39:39 2015
From: hirent at gmail.com (Hiren Trada)
Date: Wed, 28 Oct 2015 16:39:39 -0400
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
Message-ID: <037001d111c0$c4e3ee00$4eabca00$@gmail.com>

One possible solution is to use remote login programs.

Remote login programs like Logmein and TeamViewer allow users to log into
remote computers and lock out the keyboard, mouse and monitor.

If the equipment laptop is connected to the internet, you can connect to the
laptop (or any computer for that matter) from any other computer.

TeamViewer will allow you to remotely lock the computer as well as any local
input devices on the computer, including the keyboard, trackpad & mouse.

TeamViewer is free for use and has apps for Windows, Mac, Android and iOS.

So it can used on any computer, laptop, phone or tablet.

Also, it can connect to multiple computers from one computer, so it is
possible to control and lock more than one piece of equipment.

I'm not sure if there is a connection limitation with the free usage.

 



 

 

 

Hiren Trada, Ph.D.

University of Louisville

 

 

 

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Shivakumar Bhaskaran
Sent: Wednesday, October 28, 2015 1:06 PM
To: Vito Logiudice
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

 

Hello Vito,

 

Sorry I should have mentioned more clearly. For example one of my tool I am
planning to turn off/on the computer screen using the relay. 

 

But for laptop I cant turn off/on the screen using relay or activate the
screen using relay. May be I am wrong,

I checked with outside vendor regarding this but he mentioned it can be
done, but it involves quite an effort to be done, there is also code to just
turn off/on the laptop screen, but I couldn't find with the relay.

 

-Thanks

-Shiva

 

Shivakumar Bhaskaran, Ph.D.

Searle CleanRoom Manager

The University of Chicago

5735 S.Ellis, Room 032

Chicago-60637

Ph:773-795-2297

https://searle-cleanroom.uchicago.edu/

 

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca] 
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: Suggestions for interlocking mask aligners

 

Hello Shiva,

 

If I'm not mistaken some laptops can be configured to remain active even
when the monitor is folded over to the closed position. In this position the
monitor will turn off but the CPU will remain in operation which I think
would solve your problem. Perhaps you can have someone in your local IT
department have a look at your particular laptops to see if they can be
configured this way.

 

Best regards,

Vito

 

From: Shivakumar Bhaskaran <sbhas at uchicago.edu>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk>, Vito Logiudice
<vito.logiudice at uwaterloo.ca>, "labnetwork at mtl.mit.edu"
<labnetwork at mtl.mit.edu>
Subject: RE: Suggestions for interlocking mask aligners

 

Hello All,

 

Since you all are exchanging emails regarding the interlock, I myself
planning to do in my facility. I was able to figure out for some of the tool
that I have. But two of my tool is hooked up to laptop, if I shutdown the
laptop or close the lid of the laptop the software stops working and then
the vacuum valve or heater shuts off which I don't want to have like this. I
don't want to add computer screen or load the software in desktop due to
space constraint. 

 

The two tools that I am having are one is Arradiance Gemstar ALD and another
is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using
relay, because I want the system to in vacuum even if its not in use.

 

-Thanks

-Shiva

 

Shivakumar Bhaskaran, Ph.D.

Searle CleanRoom Manager

The University of Chicago

5735 S.Ellis, Room 032

Chicago-60637

Ph:773-795-2297

https://searle-cleanroom.uchicago.edu/

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

 

Hello Vito, 

 

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked
the electrical signal for the solenoid controlling the CDA for the shutter.
It works fine. If you want, we can mail you some pictures of how we did it. 

 

Of course, if a user really wanted to cheat, he or she could perform all
work before the exposure (i.e. mask load, wafer load and alignment) without
logging in, and then only log in during exposure. In reality, we do not see
such misuse. 

 

Best regards, 

 

Leif

 

 

From:labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Suggestions for interlocking mask aligners

 

Dear Colleagues,

 

I would appreciate hearing how you may have interlocked the mask aligners in
your respective facilities. In our particular case we have a Suss-Microtec
MA6 aligner and we are struggling to identify a parameter that can be
interlocked without causing the system additional wear and tear. Any
insights would be appreciated. Thank you.

 

Best regards,

Vito

--

Vito Logiudice  P.Eng.

Director of Operations, Quantum NanoFab

University of Waterloo

Lazaridis QNC 1207

200 University Avenue West

Waterloo, ON           Canada N2L 3G1

Tel.: (519) 888-4567  ext. 38703

Email: vito.logiudice at uwaterloo.ca

Website: https://fab.qnc.uwaterloo.ca

 

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From ryant at nanofab.utah.edu  Thu Oct 29 12:46:07 2015
From: ryant at nanofab.utah.edu (Ryan Taylor)
Date: Thu, 29 Oct 2015 10:46:07 -0600
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <037001d111c0$c4e3ee00$4eabca00$@gmail.com>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
 <037001d111c0$c4e3ee00$4eabca00$@gmail.com>
Message-ID: <56324D4F.9040107@nanofab.utah.edu>

Speaking of software solutions, we developed a simple screen lock for 
our lab to integrate with the coral lab management software, though it 
could be adopted to other systems without much effort.  It runs a coral 
client in the foreground and only allows access to that client -- no 
other software, until the instrument is enabled in coral.  The 
screenlock can be controlled remotely with a web interface.  There is 
also a local override by password for administrators.  Attached are 
screenshots of the screenlock and the web interface.

Thanks,
Ryan

On 10/28/15 2:39 PM, Hiren Trada wrote:
>
> One possible solution is to use remote login programs.
>
> Remote login programs like Logmein and TeamViewer allow users to log 
> into remote computers and lock out the keyboard, mouse and monitor.
>
> If the equipment laptop is connected to the internet, you can connect 
> to the laptop (or any computer for that matter) from any other computer.
>
> TeamViewer will allow you to remotely lock the computer as well as any 
> local input devices on the computer, including the keyboard, trackpad 
> & mouse.
>
> TeamViewer is free for use and has apps for Windows, Mac, Android and iOS.
>
> So it can used on any computer, laptop, phone or tablet.
>
> Also, it can connect to multiple computers from one computer, so it is 
> possible to control and lock more than one piece of equipment.
>
> I?m not sure if there is a connection limitation with the free usage.
>
> Hiren Trada, Ph.D.
>
> University of Louisville
>
> *From:*labnetwork-bounces at mtl.mit.edu 
> [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Shivakumar 
> Bhaskaran
> *Sent:* Wednesday, October 28, 2015 1:06 PM
> *To:* Vito Logiudice
> *Cc:* labnetwork at mtl.mit.edu
> *Subject:* Re: [labnetwork] Suggestions for interlocking mask aligners
>
> Hello Vito,
>
> Sorry I should have mentioned more clearly. For example one of my tool 
> I am planning to turn off/on the computer screen using the relay.
>
> But for laptop I cant turn off/on the screen using relay or activate 
> the screen using relay. May be I am wrong,
>
> I checked with outside vendor regarding this but he mentioned it can 
> be done, but it involves quite an effort to be done, there is also 
> code to just turn off/on the laptop screen, but I couldn?t find with 
> the relay.
>
> -Thanks
>
> -Shiva
>
> Shivakumar Bhaskaran, Ph.D.
>
> Searle CleanRoom Manager
>
> The University of Chicago
>
> 5735 S.Ellis, Room 032
>
> Chicago-60637
>
> Ph:773-795-2297
>
> https://searle-cleanroom.uchicago.edu/
>
> *From:*Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
> *Sent:* Wednesday, October 28, 2015 11:52 AM
> *To:* Shivakumar Bhaskaran <sbhas at uchicago.edu 
> <mailto:sbhas at uchicago.edu>>
> *Cc:* labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> *Subject:* Re: Suggestions for interlocking mask aligners
>
> Hello Shiva,
>
> If I?m not mistaken some laptops can be configured to remain active 
> even when the monitor is folded over to the closed position. In this 
> position the monitor will turn off but the CPU will remain in 
> operation which I think would solve your problem. Perhaps you can have 
> someone in your local IT department have a look at your particular 
> laptops to see if they can be configured this way.
>
> Best regards,
>
> Vito
>
> *From: *Shivakumar Bhaskaran <sbhas at uchicago.edu 
> <mailto:sbhas at uchicago.edu>>
> *Date: *Wednesday, October 28, 2015 at 12:30 PM
> *To: *Leif Johansen <lej at danchip.dtu.dk <mailto:lej at danchip.dtu.dk>>, 
> Vito Logiudice <vito.logiudice at uwaterloo.ca 
> <mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu 
> <mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu 
> <mailto:labnetwork at mtl.mit.edu>>
> *Subject: *RE: Suggestions for interlocking mask aligners
>
> Hello All,
>
> Since you all are exchanging emails regarding the interlock, I myself 
> planning to do in my facility. I was able to figure out for some of 
> the tool that I have. But two of my tool is hooked up to laptop, if I 
> shutdown the laptop or close the lid of the laptop the software stops 
> working and then the vacuum valve or heater shuts off which I don?t 
> want to have like this. I don?t want to add computer screen or load 
> the software in desktop due to space constraint.
>
> The two tools that I am having are one is Arradiance Gemstar ALD and 
> another is PE 100 O2 plasma etch. I don?t want to pump to be turned 
> off/on using relay, because I want the system to in vacuum even if its 
> not in use.
>
> -Thanks
>
> -Shiva
>
> Shivakumar Bhaskaran, Ph.D.
>
> Searle CleanRoom Manager
>
> The University of Chicago
>
> 5735 S.Ellis, Room 032
>
> Chicago-60637
>
> Ph:773-795-2297
>
> https://searle-cleanroom.uchicago.edu/
>
> *From:*labnetwork-bounces at mtl.mit.edu 
> <mailto:labnetwork-bounces at mtl.mit.edu> 
> [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Leif Johansen
> *Sent:* Wednesday, October 28, 2015 9:47 AM
> *To:* 'Vito Logiudice' <vito.logiudice at uwaterloo.ca 
> <mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu 
> <mailto:labnetwork at mtl.mit.edu>
> *Subject:* Re: [labnetwork] Suggestions for interlocking mask aligners
>
> Hello Vito,
>
> At DTU Danchip we have two MA-6 aligners. On both tools we have 
> interlocked the electrical signal for the solenoid controlling the CDA 
> for the shutter. It works fine. If you want, we can mail you some 
> pictures of how we did it.
>
> Of course, if a user really wanted to cheat, he or she could perform 
> all work before the exposure (i.e. mask load, wafer load and 
> alignment) without logging in, and then only log in during exposure. 
> In reality, we do not see such misuse.
>
> Best regards,
>
> Leif
>
> *From:*labnetwork-bounces at mtl.mit.edu 
> <mailto:labnetwork-bounces at mtl.mit.edu> 
> [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Vito Logiudice
> *Sent:* 26. oktober 2015 21:43
> *To:* labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> *Subject:* [labnetwork] Suggestions for interlocking mask aligners
>
> Dear Colleagues,
>
> I would appreciate hearing how you may have interlocked the mask 
> aligners in your respective facilities. In our particular case we have 
> a Suss-Microtec MA6 aligner and we are struggling to identify a 
> parameter that can be interlocked without causing the system 
> additional wear and tear. Any insights would be appreciated. Thank you.
>
> Best regards,
>
> Vito
>
> --
>
> Vito Logiudice  P.Eng.
>
> Director of Operations, Quantum NanoFab
>
> University of Waterloo
>
> Lazaridis QNC 1207
>
> 200 University Avenue West
>
> Waterloo, ON           Canada N2L 3G1
>
> Tel.: (519) 888-4567  ext. 38703
>
> Email: vito.logiudice at uwaterloo.ca <mailto:vito.logiudice at uwaterloo.ca>
>
> Website: https://fab.qnc.uwaterloo.ca
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

-- 
---------
Ryan Taylor
Software Systems Development Engineer
University of Utah Nanofab
www.nanofab.utah.edu
Phone: (801) 587-0671
Email: ryant at nanofab.utah.edu

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From sbhas at uchicago.edu  Thu Oct 29 13:15:37 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Thu, 29 Oct 2015 17:15:37 +0000
Subject: [labnetwork] Lubricating the Ball Bearings/Chains
Message-ID: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>

In one of the equipment the sample stage which moves up and down from loading the sample in deposition chamber is making noise. The sample stage has chains with motor and bearings/sliders to move up and down. I think if I add lubricant the noise can be reduced. As this system might be baked to high temperature, I want to know what sort of lubricants to you use in the cleanroom for your equipment, I want to make sure the grease wont dry out during baking or atleast I don't want to add the lubricant every time I bake.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

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From sbhas at uchicago.edu  Thu Oct 29 13:45:19 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Thu, 29 Oct 2015 17:45:19 +0000
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <56324D4F.9040107@nanofab.utah.edu>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
 <037001d111c0$c4e3ee00$4eabca00$@gmail.com>
 <56324D4F.9040107@nanofab.utah.edu>
Message-ID: <A71ECB2B7F230841A953EFA3D299504A287EF3B5@xm-mbx-08-prod>

Was the screen lock function that you have was developed by you or it comes with coral lab management software.

-Thanks
-Shiva


Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Ryan Taylor [mailto:ryant at nanofab.utah.edu]
Sent: Thursday, October 29, 2015 11:46 AM
To: Hiren Trada <hirent at gmail.com>; Shivakumar Bhaskaran <sbhas at uchicago.edu>; 'Vito Logiudice' <vito.logiudice at uwaterloo.ca>
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Speaking of software solutions, we developed a simple screen lock for our lab to integrate with the coral lab management software, though it could be adopted to other systems without much effort.  It runs a coral client in the foreground and only allows access to that client -- no other software, until the instrument is enabled in coral.  The screenlock can be controlled remotely with a web interface.  There is also a local override by password for administrators.  Attached are screenshots of the screenlock and the web interface.

Thanks,
Ryan
On 10/28/15 2:39 PM, Hiren Trada wrote:
One possible solution is to use remote login programs.
Remote login programs like Logmein and TeamViewer allow users to log into remote computers and lock out the keyboard, mouse and monitor.
If the equipment laptop is connected to the internet, you can connect to the laptop (or any computer for that matter) from any other computer.
TeamViewer will allow you to remotely lock the computer as well as any local input devices on the computer, including the keyboard, trackpad & mouse.
TeamViewer is free for use and has apps for Windows, Mac, Android and iOS.
So it can used on any computer, laptop, phone or tablet.
Also, it can connect to multiple computers from one computer, so it is possible to control and lock more than one piece of equipment.
I'm not sure if there is a connection limitation with the free usage.

[cid:image001.jpg at 01D11247.88CB5520]



Hiren Trada, Ph.D.
University of Louisville




From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran
Sent: Wednesday, October 28, 2015 1:06 PM
To: Vito Logiudice
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

Sorry I should have mentioned more clearly. For example one of my tool I am planning to turn off/on the computer screen using the relay.

But for laptop I cant turn off/on the screen using relay or activate the screen using relay. May be I am wrong,
I checked with outside vendor regarding this but he mentioned it can be done, but it involves quite an effort to be done, there is also code to just turn off/on the laptop screen, but I couldn't find with the relay.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
Sent: Wednesday, October 28, 2015 11:52 AM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: Suggestions for interlocking mask aligners

Hello Shiva,

If I'm not mistaken some laptops can be configured to remain active even when the monitor is folded over to the closed position. In this position the monitor will turn off but the CPU will remain in operation which I think would solve your problem. Perhaps you can have someone in your local IT department have a look at your particular laptops to see if they can be configured this way.

Best regards,
Vito

From: Shivakumar Bhaskaran <sbhas at uchicago.edu<mailto:sbhas at uchicago.edu>>
Date: Wednesday, October 28, 2015 at 12:30 PM
To: Leif Johansen <lej at danchip.dtu.dk<mailto:lej at danchip.dtu.dk>>, Vito Logiudice <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: RE: Suggestions for interlocking mask aligners

Hello All,

Since you all are exchanging emails regarding the interlock, I myself planning to do in my facility. I was able to figure out for some of the tool that I have. But two of my tool is hooked up to laptop, if I shutdown the laptop or close the lid of the laptop the software stops working and then the vacuum valve or heater shuts off which I don't want to have like this. I don't want to add computer screen or load the software in desktop due to space constraint.

The two tools that I am having are one is Arradiance Gemstar ALD and another is PE 100 O2 plasma etch. I don't want to pump to be turned off/on using relay, because I want the system to in vacuum even if its not in use.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Leif Johansen
Sent: Wednesday, October 28, 2015 9:47 AM
To: 'Vito Logiudice' <vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Suggestions for interlocking mask aligners

Hello Vito,

At DTU Danchip we have two MA-6 aligners. On both tools we have interlocked the electrical signal for the solenoid controlling the CDA for the shutter. It works fine. If you want, we can mail you some pictures of how we did it.

Of course, if a user really wanted to cheat, he or she could perform all work before the exposure (i.e. mask load, wafer load and alignment) without logging in, and then only log in during exposure. In reality, we do not see such misuse.

Best regards,

Leif


From:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vito Logiudice
Sent: 26. oktober 2015 21:43
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Suggestions for interlocking mask aligners

Dear Colleagues,

I would appreciate hearing how you may have interlocked the mask aligners in your respective facilities. In our particular case we have a Suss-Microtec MA6 aligner and we are struggling to identify a parameter that can be interlocked without causing the system additional wear and tear. Any insights would be appreciated. Thank you.

Best regards,
Vito
--
Vito Logiudice  P.Eng.
Director of Operations, Quantum NanoFab
University of Waterloo
Lazaridis QNC 1207
200 University Avenue West
Waterloo, ON           Canada N2L 3G1
Tel.: (519) 888-4567  ext. 38703
Email: vito.logiudice at uwaterloo.ca<mailto:vito.logiudice at uwaterloo.ca>
Website: https://fab.qnc.uwaterloo.ca





_______________________________________________

labnetwork mailing list

labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>

https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork



--

---------

Ryan Taylor

Software Systems Development Engineer

University of Utah Nanofab

www.nanofab.utah.edu<http://www.nanofab.utah.edu>

Phone: (801) 587-0671

Email: ryant at nanofab.utah.edu<mailto:ryant at nanofab.utah.edu>
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From ryant at nanofab.utah.edu  Thu Oct 29 14:36:18 2015
From: ryant at nanofab.utah.edu (Ryan Taylor)
Date: Thu, 29 Oct 2015 12:36:18 -0600
Subject: [labnetwork] Suggestions for interlocking mask aligners
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EF3B5@xm-mbx-08-prod>
References: <D254088B.65BD4%vlogiudi@connect.uwaterloo.ca>
 <879AEF5002D70747B136D02BC86A9C98587B7D@ait-pex02mbx05.win.dtu.dk>
 <A71ECB2B7F230841A953EFA3D299504A287EB96D@xm-mbx-08-prod>
 <D256745D.65E96%vlogiudi@connect.uwaterloo.ca>
 <A71ECB2B7F230841A953EFA3D299504A287EC9E8@xm-mbx-08-prod>
 <037001d111c0$c4e3ee00$4eabca00$@gmail.com>
 <56324D4F.9040107@nanofab.utah.edu>
 <A71ECB2B7F230841A953EFA3D299504A287EF3B5@xm-mbx-08-prod>
Message-ID: <56326722.6030900@nanofab.utah.edu>

We developed it here.  It is built to be used with coral, but if you 
have someone on staff who is comfortable tinkering with some python 
code, it could be adapted to other systems pretty easily.

Here is the installer file:
https://github.com/ufabdyop/screenlock/blob/master/Tags/ScreenLock-1.0.48-Setup.exe

The source code is here:
https://github.com/ufabdyop/screenlock

Thanks,
Ryan

On 10/29/15 11:45 AM, Shivakumar Bhaskaran wrote:
>
> Was the screen lock function that you have was developed by you or it 
> comes with coral lab management software.
>
> -Thanks
>
> -Shiva
>
> Shivakumar Bhaskaran, Ph.D.
>
> Searle CleanRoom Manager
>
> The University of Chicago
>
> 5735 S.Ellis, Room 032
>
> Chicago-60637
>
> Ph:773-795-2297
>
> https://searle-cleanroom.uchicago.edu/
>
> *From:*Ryan Taylor [mailto:ryant at nanofab.utah.edu]
> *Sent:* Thursday, October 29, 2015 11:46 AM
> *To:* Hiren Trada <hirent at gmail.com>; Shivakumar Bhaskaran 
> <sbhas at uchicago.edu>; 'Vito Logiudice' <vito.logiudice at uwaterloo.ca>
> *Cc:* labnetwork at mtl.mit.edu
> *Subject:* Re: [labnetwork] Suggestions for interlocking mask aligners
>
> Speaking of software solutions, we developed a simple screen lock for 
> our lab to integrate with the coral lab management software, though it 
> could be adopted to other systems without much effort.  It runs a 
> coral client in the foreground and only allows access to that client 
> -- no other software, until the instrument is enabled in coral.  The 
> screenlock can be controlled remotely with a web interface.  There is 
> also a local override by password for administrators.  Attached are 
> screenshots of the screenlock and the web interface.
>
> Thanks,
> Ryan
>
> On 10/28/15 2:39 PM, Hiren Trada wrote:
>
>     One possible solution is to use remote login programs.
>
>     Remote login programs like Logmein and TeamViewer allow users to
>     log into remote computers and lock out the keyboard, mouse and
>     monitor.
>
>     If the equipment laptop is connected to the internet, you can
>     connect to the laptop (or any computer for that matter) from any
>     other computer.
>
>     TeamViewer will allow you to remotely lock the computer as well as
>     any local input devices on the computer, including the keyboard,
>     trackpad & mouse.
>
>     TeamViewer is free for use and has apps for Windows, Mac, Android
>     and iOS.
>
>     So it can used on any computer, laptop, phone or tablet.
>
>     Also, it can connect to multiple computers from one computer, so
>     it is possible to control and lock more than one piece of equipment.
>
>     I?m not sure if there is a connection limitation with the free usage.
>
>     Hiren Trada, Ph.D.
>
>     University of Louisville
>
>     *From:*labnetwork-bounces at mtl.mit.edu
>     <mailto:labnetwork-bounces at mtl.mit.edu>
>     [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Shivakumar
>     Bhaskaran
>     *Sent:* Wednesday, October 28, 2015 1:06 PM
>     *To:* Vito Logiudice
>     *Cc:* labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
>     *Subject:* Re: [labnetwork] Suggestions for interlocking mask aligners
>
>     Hello Vito,
>
>     Sorry I should have mentioned more clearly. For example one of my
>     tool I am planning to turn off/on the computer screen using the
>     relay.
>
>     But for laptop I cant turn off/on the screen using relay or
>     activate the screen using relay. May be I am wrong,
>
>     I checked with outside vendor regarding this but he mentioned it
>     can be done, but it involves quite an effort to be done, there is
>     also code to just turn off/on the laptop screen, but I couldn?t
>     find with the relay.
>
>     -Thanks
>
>     -Shiva
>
>     Shivakumar Bhaskaran, Ph.D.
>
>     Searle CleanRoom Manager
>
>     The University of Chicago
>
>     5735 S.Ellis, Room 032
>
>     Chicago-60637
>
>     Ph:773-795-2297
>
>     https://searle-cleanroom.uchicago.edu/
>
>     *From:*Vito Logiudice [mailto:vito.logiudice at uwaterloo.ca]
>     *Sent:* Wednesday, October 28, 2015 11:52 AM
>     *To:* Shivakumar Bhaskaran <sbhas at uchicago.edu
>     <mailto:sbhas at uchicago.edu>>
>     *Cc:* labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
>     *Subject:* Re: Suggestions for interlocking mask aligners
>
>     Hello Shiva,
>
>     If I?m not mistaken some laptops can be configured to remain
>     active even when the monitor is folded over to the closed
>     position. In this position the monitor will turn off but the CPU
>     will remain in operation which I think would solve your problem.
>     Perhaps you can have someone in your local IT department have a
>     look at your particular laptops to see if they can be configured
>     this way.
>
>     Best regards,
>
>     Vito
>
>     *From: *Shivakumar Bhaskaran <sbhas at uchicago.edu
>     <mailto:sbhas at uchicago.edu>>
>     *Date: *Wednesday, October 28, 2015 at 12:30 PM
>     *To: *Leif Johansen <lej at danchip.dtu.dk
>     <mailto:lej at danchip.dtu.dk>>, Vito Logiudice
>     <vito.logiudice at uwaterloo.ca
>     <mailto:vito.logiudice at uwaterloo.ca>>, "labnetwork at mtl.mit.edu
>     <mailto:labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu
>     <mailto:labnetwork at mtl.mit.edu>>
>     *Subject: *RE: Suggestions for interlocking mask aligners
>
>     Hello All,
>
>     Since you all are exchanging emails regarding the interlock, I
>     myself planning to do in my facility. I was able to figure out for
>     some of the tool that I have. But two of my tool is hooked up to
>     laptop, if I shutdown the laptop or close the lid of the laptop
>     the software stops working and then the vacuum valve or heater
>     shuts off which I don?t want to have like this. I don?t want to
>     add computer screen or load the software in desktop due to space
>     constraint.
>
>     The two tools that I am having are one is Arradiance Gemstar ALD
>     and another is PE 100 O2 plasma etch. I don?t want to pump to be
>     turned off/on using relay, because I want the system to in vacuum
>     even if its not in use.
>
>     -Thanks
>
>     -Shiva
>
>     Shivakumar Bhaskaran, Ph.D.
>
>     Searle CleanRoom Manager
>
>     The University of Chicago
>
>     5735 S.Ellis, Room 032
>
>     Chicago-60637
>
>     Ph:773-795-2297
>
>     https://searle-cleanroom.uchicago.edu/
>
>     *From:*labnetwork-bounces at mtl.mit.edu
>     <mailto:labnetwork-bounces at mtl.mit.edu>
>     [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Leif Johansen
>     *Sent:* Wednesday, October 28, 2015 9:47 AM
>     *To:* 'Vito Logiudice' <vito.logiudice at uwaterloo.ca
>     <mailto:vito.logiudice at uwaterloo.ca>>; labnetwork at mtl.mit.edu
>     <mailto:labnetwork at mtl.mit.edu>
>     *Subject:* Re: [labnetwork] Suggestions for interlocking mask aligners
>
>     Hello Vito,
>
>     At DTU Danchip we have two MA-6 aligners. On both tools we have
>     interlocked the electrical signal for the solenoid controlling the
>     CDA for the shutter. It works fine. If you want, we can mail you
>     some pictures of how we did it.
>
>     Of course, if a user really wanted to cheat, he or she could
>     perform all work before the exposure (i.e. mask load, wafer load
>     and alignment) without logging in, and then only log in during
>     exposure. In reality, we do not see such misuse.
>
>     Best regards,
>
>     Leif
>
>     *From:*labnetwork-bounces at mtl.mit.edu
>     <mailto:labnetwork-bounces at mtl.mit.edu>
>     [mailto:labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Vito Logiudice
>     *Sent:* 26. oktober 2015 21:43
>     *To:* labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
>     *Subject:* [labnetwork] Suggestions for interlocking mask aligners
>
>     Dear Colleagues,
>
>     I would appreciate hearing how you may have interlocked the mask
>     aligners in your respective facilities. In our particular case we
>     have a Suss-Microtec MA6 aligner and we are struggling to identify
>     a parameter that can be interlocked without causing the system
>     additional wear and tear. Any insights would be appreciated. Thank
>     you.
>
>     Best regards,
>
>     Vito
>
>     --
>
>     Vito Logiudice  P.Eng.
>
>     Director of Operations, Quantum NanoFab
>
>     University of Waterloo
>
>     Lazaridis QNC 1207
>
>     200 University Avenue West
>
>     Waterloo, ON           Canada N2L 3G1
>
>     Tel.: (519) 888-4567  ext. 38703
>
>     Email: vito.logiudice at uwaterloo.ca
>     <mailto:vito.logiudice at uwaterloo.ca>
>
>     Website: https://fab.qnc.uwaterloo.ca
>
>
>
>
>     _______________________________________________
>
>     labnetwork mailing list
>
>     labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
>
>     https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
>
> -- 
> ---------
> Ryan Taylor
> Software Systems Development Engineer
> University of Utah Nanofab
> www.nanofab.utah.edu <http://www.nanofab.utah.edu>
> Phone: (801) 587-0671
> Email:ryant at nanofab.utah.edu <mailto:ryant at nanofab.utah.edu>

-- 
---------
Ryan Taylor
Software Systems Development Engineer
University of Utah Nanofab
www.nanofab.utah.edu
Phone: (801) 587-0671
Email: ryant at nanofab.utah.edu

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From chris at malocsay.com  Thu Oct 29 17:50:13 2015
From: chris at malocsay.com (Chris Malocsay)
Date: Thu, 29 Oct 2015 14:50:13 -0700
Subject: [labnetwork] Lubricating the Ball Bearings/Chains
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>
References: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>
Message-ID: <CAAqDzFM9TUCkYWjm8W7fe030VwHZvvruCvFr_EC_s0KD9Hs44w@mail.gmail.com>

Hi Shiva; the process you want to use is SL39 or a dry lubricant typically
called dicroniting.
Chris Malocsay



Chris Malocsay
510-506-5894

Please Join us at the following upcoming events.

Mid Atlantic AVS meeting, NC State University
<http://www.avs.org/Chapters/Midatlantic/Symposia-Exhibitions>

MRS Fall Meeting Click Here! <http://www.mrs.org/fall2015/>





On Thu, Oct 29, 2015 at 10:15 AM, Shivakumar Bhaskaran <sbhas at uchicago.edu>
wrote:

> In one of the equipment the sample stage which moves up and down from
> loading the sample in deposition chamber is making noise. The sample stage
> has chains with motor and bearings/sliders to move up and down. I think if
> I add lubricant the noise can be reduced. As this system might be baked to
> high temperature, I want to know what sort of lubricants to you use in the
> cleanroom for your equipment, I want to make sure the grease wont dry out
> during baking or atleast I don?t want to add the lubricant every time I
> bake.
>
>
>
> -Thanks
>
> -Shiva
>
>
>
> Shivakumar Bhaskaran, Ph.D.
>
> Searle CleanRoom Manager
>
> The University of Chicago
>
> 5735 S.Ellis, Room 032
>
> Chicago-60637
>
> Ph:773-795-2297
>
> https://searle-cleanroom.uchicago.edu/
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
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From spaolini at cns.fas.harvard.edu  Thu Oct 29 18:02:27 2015
From: spaolini at cns.fas.harvard.edu (Paolini, Steven)
Date: Thu, 29 Oct 2015 22:02:27 +0000
Subject: [labnetwork] Lubricating the Ball Bearings/Chains
In-Reply-To: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>
References: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>
Message-ID: <A806238C0992094FBF9298E5D90F5489F9E6933C@HARVANDMBX01.fasmail.priv>

Shiva,
       My first reaction upon reading your post was to try to convince you NOT to put any sort of lubricant into the chamber if you can avoid it by re-aligning or replacing components. If it is a vacuum system, you will suffer the effects of outgassing if lubricant is introduced and contamination is a concern as well.  If you find that you have to use a lubricant, my suggestion would be to lube the slides only with an inert PFPE lubricant that does not react with other chemicals or provide any dopant, these products usually have a high temperature tolerance but can form toxic compounds if heated over 300 Deg. C. If you need to heat above this temperature, the next step would be the use of silicone grease. I suggest sparingly lubricating the slides only since chains can run dry if they remain clean.
Best of luck,
Steve Paolini
Equipment Dood
Harvard Center for Nanoscale systems.

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran
Sent: Thursday, October 29, 2015 1:16 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Lubricating the Ball Bearings/Chains

In one of the equipment the sample stage which moves up and down from loading the sample in deposition chamber is making noise. The sample stage has chains with motor and bearings/sliders to move up and down. I think if I add lubricant the noise can be reduced. As this system might be baked to high temperature, I want to know what sort of lubricants to you use in the cleanroom for your equipment, I want to make sure the grease wont dry out during baking or atleast I don't want to add the lubricant every time I bake.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

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From sbhas at uchicago.edu  Thu Oct 29 18:22:54 2015
From: sbhas at uchicago.edu (Shivakumar Bhaskaran)
Date: Thu, 29 Oct 2015 22:22:54 +0000
Subject: [labnetwork] Lubricating the Ball Bearings/Chains
In-Reply-To: <A806238C0992094FBF9298E5D90F5489F9E6933C@HARVANDMBX01.fasmail.priv>
References: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>
 <A806238C0992094FBF9298E5D90F5489F9E6933C@HARVANDMBX01.fasmail.priv>
Message-ID: <A71ECB2B7F230841A953EFA3D299504A287EF77C@xm-mbx-08-prod>

I am sorry to mention, the motor and the slider is outside the chamber not inside the chamber.

-Thanks
-Shiva


Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

From: Paolini, Steven [mailto:spaolini at cns.fas.harvard.edu]
Sent: Thursday, October 29, 2015 5:02 PM
To: Shivakumar Bhaskaran <sbhas at uchicago.edu>; labnetwork at mtl.mit.edu
Subject: RE: Lubricating the Ball Bearings/Chains

Shiva,
       My first reaction upon reading your post was to try to convince you NOT to put any sort of lubricant into the chamber if you can avoid it by re-aligning or replacing components. If it is a vacuum system, you will suffer the effects of outgassing if lubricant is introduced and contamination is a concern as well.  If you find that you have to use a lubricant, my suggestion would be to lube the slides only with an inert PFPE lubricant that does not react with other chemicals or provide any dopant, these products usually have a high temperature tolerance but can form toxic compounds if heated over 300 Deg. C. If you need to heat above this temperature, the next step would be the use of silicone grease. I suggest sparingly lubricating the slides only since chains can run dry if they remain clean.
Best of luck,
Steve Paolini
Equipment Dood
Harvard Center for Nanoscale systems.

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran
Sent: Thursday, October 29, 2015 1:16 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Lubricating the Ball Bearings/Chains

In one of the equipment the sample stage which moves up and down from loading the sample in deposition chamber is making noise. The sample stage has chains with motor and bearings/sliders to move up and down. I think if I add lubricant the noise can be reduced. As this system might be baked to high temperature, I want to know what sort of lubricants to you use in the cleanroom for your equipment, I want to make sure the grease wont dry out during baking or atleast I don't want to add the lubricant every time I bake.

-Thanks
-Shiva

Shivakumar Bhaskaran, Ph.D.
Searle CleanRoom Manager
The University of Chicago
5735 S.Ellis, Room 032
Chicago-60637
Ph:773-795-2297
https://searle-cleanroom.uchicago.edu/

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From stieg at cnsi.ucla.edu  Thu Oct 29 19:10:06 2015
From: stieg at cnsi.ucla.edu (Stieg, Adam)
Date: Thu, 29 Oct 2015 23:10:06 +0000
Subject: [labnetwork] ANNOUNCEMENT: Lab Manager position available at the
 UCLA School of Engineering & Applied Sciences/California NanoSystems
 Institute
Message-ID: <D257F505.54776%stieg@cnsi.ucla.edu>

Dear Colleagues,

Greetings from UCLA and the California NanoSystems Institute (CNSI). As a new member of this network I would like to quickly introduce myself. My name is Adam Stieg and in addition to serving as Associate Director here at CNSI I have recently taken on the role of Interim Technical Director of the Integrated Systems Nanofabrication Cleanroom (ISNC). As part of an ongoing strategic planning initiative, the CNSI and Henry Samueli School of Engineering and Applied Sciences have been working to develop an operational model for the cleanroom facilities at UCLA (ISNC and the Nanoelectronics Research Facility - NRF) that provides a world?class resource for the scientific community on campus and across Southern California.

I am writing to make all members of this network aware of an exciting new opportunity at UCLA. We are looking to identify a capable, motivated candidate to serve as Lab Manager for the NRF facility. The Job Summary can be found below and more information found by following this link: hr.mycareer.ucla.edu/applicants/Central?quickFind=66823

Please feel free to distribute this information to any and all of your colleagues. Should you have any questions or require additional information please feel free to contact me via this forum or directly using the contact information below.

All the best,
Adam


Adam Z. Stieg Ph.D.                                                University of California, Los Angeles
Associate Director                                   California NanoSystems Institute
Scientific Director                                                    Nano and Pico Characterization Lab
Interim Technical Director                        Integrated Systems Nanofabrication Cleanroom
Director                                                                                             Sci|Art NanoLab
(e) stieg at cnsi.ucla.edu                                                                           310.206.2902



Job Summary: The manager of the Nanoelectronics Research Facility ("Nanolab") leads a state of the art nanofabrication facility with goals to support cutting edge research and technology innovation from academic researchers and industry members ranging from early state startups to large companies. The Manager oversees all aspects of the operation of the Nanolab facility including staffing, technical direction, safety and financial health, and budgetary decisions based on the financial structure developed by the Henry Samueli School of Engineering and Applied Sciences (HSSEAS). To achieve this mission, the Manager maintains and expands the capabilities and user base of the Nanolab, advancing its visibility as a facility recognized worldwide for the research and commercial contributions it enables.

An additional cleanroom facility at UCLA, the Integrated Systems Nanofabrication Cleanroom ("ISNC"), is housed in the California NanoSystems Institute. During the first year of this position, the Manager will direct the highly skilled and experienced staff of the ISNC and develop a strategic plan for integration of the two facilities as single, unified cleanroom with world-class research capabilities.

The Manager must communicate with high tech equipment vendors, as well as University facility and trade workers to implement and maintain complex equipment installations that meet demanding clean room specifications, and safe setups for current/voltage systems, toxic gas systems, hazardous chemical operations, etc. He or she also interfaces with faculty and trainees from multiple disciplines and Universities, as well as industry users, translating their research needs into equipment/process capabilities in a shared laboratory setting.
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From mcvittie at stanford.edu  Thu Oct 29 20:33:10 2015
From: mcvittie at stanford.edu (James P McVittie)
Date: Fri, 30 Oct 2015 00:33:10 +0000
Subject: [labnetwork] Lubricating the Ball Bearings/Chains
In-Reply-To: <A806238C0992094FBF9298E5D90F5489F9E6933C@HARVANDMBX01.fasmail.priv>
References: <A71ECB2B7F230841A953EFA3D299504A287EF2FA@xm-mbx-08-prod>,
 <A806238C0992094FBF9298E5D90F5489F9E6933C@HARVANDMBX01.fasmail.priv>
Message-ID: <BN1PR0201MB07409545001D0BE61C8F4FDAAA2F0@BN1PR0201MB0740.namprd02.prod.outlook.com>

Shiva,


We have a 10 yr old AJA sputtering system, which uses a chain drive for the LL transfer and wafer holder positioning. This spring we replaced all the bearings in the chain drive, which made a major difference in the ease  of loading. We got the bearings from McAllister Technical Service, who made the chain drive. With the bearings they sent a tube of MoS2 grease.  We have been using this grease on both the bearings and chain.


Jim McVittie

Stanford Nanofabrication Facility



________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Paolini, Steven <spaolini at cns.fas.harvard.edu>
Sent: Thursday, October 29, 2015 3:02 PM
To: Shivakumar Bhaskaran; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Lubricating the Ball Bearings/Chains


Shiva,

       My first reaction upon reading your post was to try to convince you NOT to put any sort of lubricant into the chamber if you can avoid it by re-aligning or replacing components. If it is a vacuum system, you will suffer the effects of outgassing if lubricant is introduced and contamination is a concern as well.  If you find that you have to use a lubricant, my suggestion would be to lube the slides only with an inert PFPE lubricant that does not react with other chemicals or provide any dopant, these products usually have a high temperature tolerance but can form toxic compounds if heated over 300 Deg. C. If you need to heat above this temperature, the next step would be the use of silicone grease. I suggest sparingly lubricating the slides only since chains can run dry if they remain clean.

Best of luck,

Steve Paolini

Equipment Dood

Harvard Center for Nanoscale systems.



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran
Sent: Thursday, October 29, 2015 1:16 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Lubricating the Ball Bearings/Chains



In one of the equipment the sample stage which moves up and down from loading the sample in deposition chamber is making noise. The sample stage has chains with motor and bearings/sliders to move up and down. I think if I add lubricant the noise can be reduced. As this system might be baked to high temperature, I want to know what sort of lubricants to you use in the cleanroom for your equipment, I want to make sure the grease wont dry out during baking or atleast I don't want to add the lubricant every time I bake.



-Thanks

-Shiva



Shivakumar Bhaskaran, Ph.D.

Searle CleanRoom Manager

The University of Chicago

5735 S.Ellis, Room 032

Chicago-60637

Ph:773-795-2297

https://searle-cleanroom.uchicago.edu/

The University of Chicago - Searle Cleanroom and ...
About us. The Searle Cleanroom is a shared user facility open to all members of the UChicago research community. It houses a variety of lithography, deposition, and ...
Read more...<https://searle-cleanroom.uchicago.edu/>




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