[labnetwork] Etching NbSe2

[Lian, Yaguang]

Mark,

If the fluorine ICP system is used to etch silicon, I don’t think the NbSe2 can give you a big problem. Because after chemical reaction of NbSe2 with fluorine, all the byproducts are volatility. The Boiling point of NbF5 is 236C, SeF6 is -46.6C, and SeF4 is 101C. These numbers are all in the pressure of atmosphere. They will be much lower in the pressure of dry etching. If the pumping system uses turbo and dry pump, it cannot hurt the pump very much.

If the ICP is used to etch SiO2 or Si3N4 films on the top of photoelectric or optical devices (III-V materials), I am afraid the residues of NbF5 can give some side-effects for the devices (dark current?). To avoid the contamination, a clean recipe can be run after NbSe2 dry etching. The recipe should use O2+CF4 as clean gases.

Regards,

Yaguang Lian
Research Engineer
2306 Micro and Nanotechnology Laboratory
University of Illinois at Urbana-Champaign
208 N. Wright St.
Urbana, IL 61801
Phone: 217-333-8051
Email: yglian at illinois.edu


From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mark Morgan
Sent: 2016年2月25日 18:04
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Etching NbSe2

Greetings Friends and Neighbors,

i have a user here at the Washington Nanofabrication Facility desirous of etching NbSe2 in our Flourine ICP system. I am seeking info/experience/suggestions regarding this activity and Selenium with respect to hazards and equipment contamination concerns. There is some info in the literature about RIE of this material via CF4 but i’m not seeing anything regarding hazards to equipment (especially equipment geared to many different users and projects…) and personnel.

Probable etch products are SeF6 and NbF5(?)- The SeF6 appears to be a nasty actor but perhaps proper post-process pumping and purging (mmmm… alliteration!) would take care of that….

Thank you so much for the help and guidance.

Best Regards

Mark



Mark D. Morgan
Research Engineer, Washington Nanofabrication Facility (WNF)
National Nanotechnology Coordinated Infrastructure (NNCI)
University of Washington
Fluke Hall 132, Box 352143
(206) 221-6349
mmorgan3 at uw.edu<mailto:mmorgan3 at uw.edu>
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